CN105887032A - Shielding optical window and preparation method thereof - Google Patents
Shielding optical window and preparation method thereof Download PDFInfo
- Publication number
- CN105887032A CN105887032A CN201610306125.6A CN201610306125A CN105887032A CN 105887032 A CN105887032 A CN 105887032A CN 201610306125 A CN201610306125 A CN 201610306125A CN 105887032 A CN105887032 A CN 105887032A
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- Prior art keywords
- optical window
- shielding optical
- preparation
- substrate
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
- C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K9/00—Screening of apparatus or components against electric or magnetic fields
- H05K9/0073—Shielding materials
- H05K9/0094—Shielding materials being light-transmitting, e.g. transparent, translucent
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses a shielding optical window and a preparation method thereof. The method comprises the steps of (1) cleaning a substrate; (2) coating the substrate with a protective layer; (3) etching the protective layer and the substrate; (4) carrying out sputtering coating on the surface of the etched substrate; and (5) removing the protective layer to obtain the shielding optical window. According to the method for preparing the shielding optical window, metal precipitation is not required, and the material of the substrate is not required.
Description
Technical field
The present invention relates to electromagnetic shielding field, be specifically related to a kind of shielding optical window and preparation method thereof.
Background technology
Along with day by day complicated space electromagnetic environment, remote measurement remote sensing, medical diagnosis, secure communication,
The optical window in the fields such as Aero-Space equipment also exists serious electromagnetic interference problem, does not only has
From cosmic ray, satellite communication, the electromagnetic wave signal of the outsides such as television broadcasting is to internal system
Device work produces interference, and the electromagnetic signal of inside also can be made to be leaked to its exterior, to external world
Produce impact.Due to the optical window permeability to electromagnetic wave, Military Application will become war
One of key factor that machine exposes.The raising required along with modern military, it is desired to optical window resistance to
Mill property and resistance to sudden heating are the best, enable to ensure that electromagnetic shielding is imitated in the presence of a harsh environment
Really.
Metallic mesh window is to make to have the conductive metal mesh of periodic array outside window material
Grid, have excellent electrically conducting transparent performance, meet high permeability and the wide-band electricity of optical window
The double requirements of magnetic shield.
The metallic mesh preparation method of infra-red material, the steps include: first to mix in glass at present
The silver ion of hetero moiety, then carries out induced with laser+heat treatment and separates out by metal, recycle wet method
(electroless plating) carries out thickening process, obtains required metallic mesh structure.The method exist with
Under several limitation: 1, base material is restricted, and not all material can be carried out argent
Doping；2, for infra-red material, especially glass material, generally there is deliquescent shortcoming,
The wet method plated film suitability is limited.Therefore, the method is only applicable to portion of material.
Summary of the invention
It is an object of the invention to provide a kind of shielding optical window and preparation method thereof.The method uses table
Face coating technique, it is not necessary to metal separates out, the material not requirement to glass.
The invention provides a kind of preparation method shielding optical window, comprise the steps:
(1) substrate is cleaned；
(2) armor coated；
(3) described protective layer and substrate are performed etching；
(4) substrate surface after etching carries out sputter coating；
(5) protective layer described in removing i.e. obtains described shielding optical window.
Further, the thickness of described protective layer is 5-15 μm, and material is polyvinyl alcohol or light
Photoresist.
Further, described step (2) uses centrifugal rotary coating or spraying process to be coated.
Further, the linear that described etching uses is square or circular, lines width
Degree is 5-12 μm, and the cycle is 250-800 μm, and etching depth is 3-15 μm.
Further, described sputter coating uses magnetron sputtering, and film layer includes that thickness is 1-5 μm
Metal level.
Further, described metal level material is Cu, Au or Al.
Further, described film layer includes the adhesive layer that thickness is 20-200nm, and described is attached
Layer and be attached to substrate surface, described metal level is attached to described adhesive layer surface.
Further, described adhesive layer material is Cr.
On the other hand, the invention provides a kind of shielding optical window, described shielding optical window is by above-mentioned
Method be prepared.
Compared with prior art, the present invention's is helpful:
Compared with photoetching process, the present invention is uniform to overlay performance, overlay thickness and thickness
Require low, the photoresist of photoetching process can be used, it is possible to use and wherein common are machine material；
The present invention uses ultra-short pulse laser to directly act on overlay and substrate, to overlay and
Substrate non-selectivity；
Metallic mesh prepared by the present invention, is embedded in inside substrate deeply, the firmness of grid and wear-resisting
Excellent performance.
Accompanying drawing explanation
Fig. 1 is the step schematic diagram that the present invention shields the preparation method of optical window.
Detailed description of the invention
For convenience of the understanding to the present invention program, below in conjunction with preferred embodiment to the present invention program
It is further described, it will be appreciated that following example are the understanding for convenience of the present invention program,
The invention provides a kind of preparation method shielding optical window, comprise the steps (such as Fig. 1
Shown in):
(1) substrate is cleaned；
(2) armor coated；
(3) described protective layer and substrate are performed etching；
(4) substrate surface after etching carries out sputter coating；
(5) protective layer described in removing i.e. obtains described shielding optical window.
Above scheme can complete to shield the preparation of optical window, provides preferred side on this basis
Case:
As preferably, the thickness of described protective layer is 5-15 μm, and material is polyvinyl alcohol or light
Photoresist.
As preferably, described step (2) uses centrifugal rotary coating or spraying process to be coated.
As preferably, the linear that described etching uses is square or circular, lines width
Degree is 5-12 μm, and the cycle is 250-800 μm, and etching depth is 3-15 μm.
As preferably, described sputter coating uses magnetron sputtering, and film layer includes that thickness is 1-5 μm
Metal level.
As preferably, described metal level material is Cu, Au or Al.
As preferably, described film layer includes the adhesive layer that thickness is 20-200nm, and described is attached
Layer and be attached to substrate surface, described metal level is attached to described adhesive layer surface.
As preferably, described adhesive layer material is Cr.
Specific embodiment is presented herein below
Embodiment 1
Make 8-10.5 μm at CVD ZnS substrate to pass through, the metallic mesh of 1-10GHZ shielding
(1) utilize ultrasound wave that ZnS substrate is carried out and is dried: to utilize frequency for 50KHz
Ultrasonic waves for cleaning unit ZnS substrate is carried out, the ul-trasonic irradiation time is 15 minutes,
Then the baking oven at 120 DEG C toasts and dries substrate in 10 minutes.
(2) centrifugal rotary coating is utilized, at the AZ4620 that ZnS substrate surface applied thickness is 5 μm
Photoresist protective layer: utilize spraying process, is 5 μm in ZnS substrate surface applied thickness
AZ4620 photoresist protective layer, its parameter is: PEEK pipe caliber 175 μm, air pressure 0.2MPa,
Spray distance 40mm, nozzle X-axis rate travel 50mm/s, Y-axis moving step length 2mm, spray
It is coated with number of times 1 time.
(3) use wavelength be 1064nm, pulse width be 10-15The laser of S, to AZ4620
Photoresist protective layer and substrate perform etching, and metallic mesh structure is square, and line thickness is
5 μm, the cycle is 450 μm, and etching depth is 3 μm；
(4) use magnetron sputtering technique, carry out plated film to etching substrate surface, first deposit one
Layer thickness be the Cr film of 40nm as adhesion layer, rear deposit thickness is that the Cu of 2 μm is as leading
Electric layer；Wherein, Cr film splash-proofing sputtering process parameter is: target size Φ 60mm, sputtering pressure 0.78pa,
Sputtering power 80W；Cu film splash-proofing sputtering process parameter is: target size Φ 60mm, sputtering pressure
0.78pa, sputtering power 120W.
(5) sealer removal is obtained required metallic mesh；
(6) making the metallic mesh obtained is 18dB at the average shield effectiveness of 1-10GHZ.
Embodiment 2
Make 3-5 μm at calcium aluminum barium infrared glass substrate to pass through, the wire netting of 1-18GHZ shielding
Grid
(1) utilize ultrasound wave that calcium aluminum barium infrared glass substrate is carried out and is dried；Utilize frequency
Rate is that calcium aluminum barium infrared glass substrate is carried out by the ultrasonic waves for cleaning unit of 50KHz, ultrasonic
Ripple action time is 15 minutes, and then the baking oven at 120 DEG C toasts and dries substrate in 12 minutes
Dry.
(2) utilize spraying process, be 15 μm in calcium aluminum barium infrared glass substrate surface applied thickness
Polyvinyl alcohol as protective layer；Polyvinyl alcohol is used for doing protective layer, with low cost, significantly drops
The processing cost of low shielding optical window, utilizes spraying process, in calcium aluminum barium substrate surface applied thickness
Being the polyvinyl alcohol protective layer of 15 μm, its parameter is: PEEK pipe caliber 175 μm, air pressure
0.3MPa, spray distance 60mm nozzle X-axis rate travel 80mm/s, Y-axis moving step length
3mm, spraying number of times 3 times.
(3) use wavelength be 355nm, pulse be 10-15The laser of S, protects polyvinyl alcohol
Layer and substrate perform etching, and metallic mesh structure is orthohexagonal, and line thickness is 12 μm, week
Phase is 800 μm, and etching depth is 8 μm；
(4) use magnetron sputtering technique, carry out plated film to etching substrate surface, first deposit one
Layer thickness be the Cr film of 100nm as adhesion layer, rear deposit thickness is that the Au of 5 μm is as leading
Electric layer；Wherein, Cr film splash-proofing sputtering process parameter is: target size Φ 60mm, sputtering pressure 0.78pa,
Sputtering power 80W, Cu film splash-proofing sputtering process parameter is: target size Φ 60mm, sputtering pressure
0.78pa, sputtering power 150W.
(5) sealer removal is obtained required metallic mesh；
(6) making the metallic mesh obtained is 15dB at the average shield effectiveness of 1-18GHZ.
Glass used in both examples above cannot use metal of the prior art to separate out
Method prepare, and use the shielding adhesive force of optical window prepared by the inventive method and shielding
Usefulness all can reach demand.
The not most part of the present invention, those skilled in the art can select according to existing Professional knowledge
Select suitable raw material or parameter, will not enumerate at this.
The above, the only detailed description of the invention of the present invention, but protection scope of the present invention is also
Being not limited to this, any those familiar with the art is at the technology model that the invention discloses
In enclosing, change can be readily occurred in or replace, all should contain within protection scope of the present invention.
Therefore, protection scope of the present invention should be as the criterion with described scope of the claims.
Claims (9)
1. the preparation method shielding optical window, it is characterised in that comprise the steps:
(1) substrate is cleaned；
(2) armor coated；
(3) described protective layer and substrate are performed etching；
(4) substrate surface after etching carries out sputter coating；
(5) protective layer described in removing i.e. obtains described shielding optical window.
The preparation method of shielding optical window the most according to claim 1, it is characterised in that institute
The thickness of the protective layer stated is 5-15 μm, and material is polyvinyl alcohol or photoresist.
The preparation method of shielding optical window the most according to claim 1, it is characterised in that institute
The step (2) stated uses centrifugal rotary coating or spraying process to be coated.
The preparation method of shielding optical window the most according to claim 1, it is characterised in that institute
The linear that the etching stated uses is square or circular, and line thickness is 5-12 μm, the cycle
For 250-800 μm, etching depth is 3-15 μm.
The preparation method of shielding optical window the most according to claim 1, it is characterised in that institute
The sputter coating stated uses magnetron sputtering, and film layer includes the metal level that thickness is 1-5 μm.
The preparation method of shielding optical window the most according to claim 5, it is characterised in that institute
The metal level material stated is Cu, Au or Al.
The preparation method of shielding optical window the most according to claim 5, it is characterised in that institute
The film layer stated includes the adhesive layer that thickness is 20-200nm, and described adhesive layer is attached to substrate table
Face, described metal level is attached to described adhesive layer surface.
The preparation method of shielding optical window the most according to claim 5, it is characterised in that institute
The adhesive layer material stated is Cr.
9. a shielding optical window, it is characterised in that described shielding optical window is by claim 1-8
Method described in any one is prepared.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610306125.6A CN105887032A (en) | 2016-05-10 | 2016-05-10 | Shielding optical window and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610306125.6A CN105887032A (en) | 2016-05-10 | 2016-05-10 | Shielding optical window and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105887032A true CN105887032A (en) | 2016-08-24 |
Family
ID=56702664
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610306125.6A Pending CN105887032A (en) | 2016-05-10 | 2016-05-10 | Shielding optical window and preparation method thereof |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106653931A (en) * | 2016-12-27 | 2017-05-10 | 中国建筑材料科学研究总院 | Graphene-based infrared transmission electromagnetic shielding filter, zinc sulfide window and fabrication method of graphene-based infrared transmission electromagnetic shielding filter |
| CN107144898A (en) * | 2017-06-29 | 2017-09-08 | 中国建筑材料科学研究总院 | Optics regulation and control electromagnetic shielding glass and preparation method thereof |
| WO2018176267A1 (en) * | 2017-03-29 | 2018-10-04 | 香港中文大学（深圳） | Method for fabricating perfect absorber |
| CN109652774A (en) * | 2018-12-06 | 2019-04-19 | 天津津航技术物理研究所 | The electromagnetic shielding optical window preparation method of embedded metal grid |
| CN110519976A (en) * | 2019-08-08 | 2019-11-29 | 湖北久之洋红外系统股份有限公司 | A kind of sapphire optical window and preparation method with electro-magnetic screen function |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106653931A (en) * | 2016-12-27 | 2017-05-10 | 中国建筑材料科学研究总院 | Graphene-based infrared transmission electromagnetic shielding filter, zinc sulfide window and fabrication method of graphene-based infrared transmission electromagnetic shielding filter |
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| CN107144898A (en) * | 2017-06-29 | 2017-09-08 | 中国建筑材料科学研究总院 | Optics regulation and control electromagnetic shielding glass and preparation method thereof |
| CN109652774A (en) * | 2018-12-06 | 2019-04-19 | 天津津航技术物理研究所 | The electromagnetic shielding optical window preparation method of embedded metal grid |
| CN109652774B (en) * | 2018-12-06 | 2020-07-28 | 天津津航技术物理研究所 | Method for preparing electromagnetic shielding optical window of embedded metal mesh |
| CN110519976A (en) * | 2019-08-08 | 2019-11-29 | 湖北久之洋红外系统股份有限公司 | A kind of sapphire optical window and preparation method with electro-magnetic screen function |
| CN110519976B (en) * | 2019-08-08 | 2020-05-22 | 湖北久之洋红外系统股份有限公司 | Sapphire optical window with electromagnetic shielding function and preparation method |
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Application publication date: 20160824 |