CN105836718A - Sol-gel method for preparing submicron-order titanium nitride powdery material - Google Patents

Sol-gel method for preparing submicron-order titanium nitride powdery material Download PDF

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Publication number
CN105836718A
CN105836718A CN201610273665.9A CN201610273665A CN105836718A CN 105836718 A CN105836718 A CN 105836718A CN 201610273665 A CN201610273665 A CN 201610273665A CN 105836718 A CN105836718 A CN 105836718A
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Prior art keywords
titanium dioxide
sol
phenolic resin
nitride powder
titanium nitride
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张国华
苟海鹏
吴柯汉
周国治
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University of Science and Technology Beijing USTB
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University of Science and Technology Beijing USTB
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    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00Nitrogen; Compounds thereof
    • C01B21/06Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/076Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with titanium or zirconium or hafnium
    • C01B21/0765Preparation by carboreductive nitridation
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/70Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/62Submicrometer sized, i.e. from 0.1-1 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Ceramic Products (AREA)

Abstract

The invention relates to a sol-gel method for preparing a submicron-order titanium nitride powdery material .The method comprises the steps of evenly mixing and stirring ordinary titanium dioxide, phenolic resin and methyl alcohol according to the molar ratio of 1:(0.3-0.6):(1.2-2.3) at normal temperature, and conducting heat insulation at 70-110 DEG C for 2-4 h to obtain a titanium dioxide/phenolic resin precursor; placing the precursor in a high-temperature furnace to be heated, and conducting heat insulation for 1-4 h at 1200-1500 DEG C in the nitrogen atmosphere, so that submicron-order (ranging from 200 nanometers to 1 micron) titanium nitride powder is obtained finally .During reaction, high-activity amorphous carbon is generated through phenolic resin pyrolysis to wrap titanium dioxide powder inside, so that a spherical shell microstructure is formed, the contact area between reactants is increased greatly, and carbon thermal reduction can proceed more smoothly .The cost of adopted raw materials is low, sintering time is short, technology is simple, and industrial production can be achieved easily.

Description

A kind of sol-gal process prepares the method for submicron order nitride powder material
Technical field
The invention belongs to field of ceramic material preparation, particularly relate to a kind of method that sol-gal process prepares nitride powder material.
Background technology
Titanium nitride has typical NaCl type structure, belongs to face-centered cubic lattice, lattice paprmeter a=0.4241nm.Titanium nitride has the most excellent machinery and physical and chemical performance, demonstrates great application prospect in fields such as ganoine thin film, optical thin film, integrated circuit and conduction of heat coatings.Along with market is more and more big to its quality and quantity demand, improving titanium nitride production technology is an important problem.The method preparing titanium nitride at present both at home and abroad mainly has metallic titanium powder or titantium hydride direct nitridation method, nitridation in situ method, mechanical alloying method, magnesium reduction process, plasma method and self-propagating high-temperature synthesis etc..
Although titanium nitride synthesis technique is through the development of decades, industrial had a set of fairly perfect production method, but still leave over problem to be solved in its production technology, such as: cumbersome, be difficult to produce in a large number, raw materials used costliness, production cost are high, the cycle is slow.The raw material utilizing low cost effectively and rapidly prepares high-purity high thin high-quality titanium nitride becomes the focus that various countries' researcher is paid close attention to.Patent CN104498982A discloses a kind of method preparing titanium nitride, during titanium soluble anode electrolytic preparation Titanium, being passed through nitrogen at negative electrode, the titanium that nitrogen and negative electrode produce reacts generation titanium nitride, separate electrolyte and titanium nitride, obtain titanium nitride product.Need to control vacuum during separating electrolyte and be less than 10Pa, and need to use the chlorohydric acid pickling of concentration 0.5 ~ 2wt%.This technique is limited by vacuum condition, can produce waste liquid simultaneously, cause environmental pollution.Patent CN104928656A discloses the preparation method of a kind of titanium nitride membrane, utilize the organic precursor colloidal sol of titaniferous, impregnated substrate at normal temperatures, carry out after drying being thermally treated resulting in thin film of titanium oxide, under ammonia atmosphere, thin film of titanium oxide is carried out high-temperature ammonolysis process subsequently, it is thus achieved that titanium nitride membrane.During obtaining thin film of titanium oxide, needing to repeat to process 3 ~ 15 times, technique is loaded down with trivial details, although finally given titanium nitride membrane, but its size and dimension is affected by operational characteristic and is very limited.Patent CN102659087A discloses a kind of method that original position CRN method prepares titanium nitride; in conjunction with the nitridation technology of preparing under alcohol full-boiled process and protection of ammonia; the titanium nitride presoma of different-shape structure is prepared by changing the alcohol heat time; carry out carbothermal reduction-nitridation, obtain the titanium nitride of the special appearance structure of bigger serface.Preparation process needs to use the titanyl sulfate acid solution of 1.2 ~ 1.3mol/L, spent acid can be produced during preparing presoma, cause environmental pollution.
Summary of the invention
It is an object of the invention to provide a kind of method using sol-gal process to prepare submicron order nitride powder material.The present invention uses ordinary titanium dioxide, phenolic resin, methanol as raw material, reduces preparation cost;And it is prepared for titanium dioxide/novolak resin precursor body by sol-gal process, increase the contact area between reactant;The method technique is simple, can prepare high-purity, submicron order nitride powder granule.
The present invention uses ordinary titanium dioxide, phenolic resin, methanol as raw material, and is prepared for titanium dioxide/novolak resin precursor body by sol-gal process.
The present invention specifically comprises the following steps that
(1) it is 1:(0.3 ~ 0.6 by titanium dioxide, phenolic resin and methanol according to mol ratio): (1.2 ~ 2.3) mix, and form mixed liquor;
(2) mixed solution is dried 2 ~ 4 hours at 70 ~ 110 DEG C, obtain titanium dioxide/novolak resin precursor body;
(3) presoma is put in high temperature furnace and heats, 1200 ~ 1500 DEG C, under argon gas atmosphere, be incubated 1 ~ 4 hour, phenolic resin pyrolysis generation amorphous carbon, by carbothermic reduction reaction, finally give submicron order nitride powder material.
In above-mentioned steps (1), titanium dioxide and phenolic resin are stirred for uniformly by electromagnetic agitation in methanol solution, and speed of agitator is 100 ~ 400rpm, mixing time 1 ~ 3 hour.
The technique of described carbothermic reduction reaction is, with the ramp of 5 ~ 15 DEG C/min to 1200 ~ 1500 DEG C, is incubated 1 ~ 4 hour, is then down to room temperature with the speed of 5 ~ 15 DEG C/min.
The invention still further relates to titanium nitride prepared by above-mentioned technique, the purity of described titanium nitride is more than 99.5%, and granularity is 200nm ~ 1 μm.
The present invention compared with prior art, possesses advantages below:
1, the present invention uses titanium dioxide, phenolic resin and methanol to be raw material, cheaper compared to other preparation method costs, and preparation temperature is relatively low, and technological process is simple, and is prone to industrialized production;
2, the present invention uses sol-gal process to prepare titanium dioxide/novolak resin precursor body, two kinds of reactant mix homogeneously, the amorphous carbon that phenolic resin pyrolysis produces forms spherical shell structure with titanium dioxide granule, increase the contact area between reactant, and the amorphous carbon activity height produced, beneficially the carrying out of carbothermic reduction reaction;
3, the titanium nitride particles purity that the present invention obtains is high, and is submicron order powder body material.
Accompanying drawing explanation
Fig. 1 is embodiment 1 carbon thermal reduction temperature X-ray diffractogram (XRD) of titanium nitride when being 1500 DEG C.
Fig. 2 is embodiment 2 carbon thermal reduction temperature X-ray diffractogram (XRD) of titanium nitride when being 1400 DEG C.
Fig. 3 is embodiment 3 carbon thermal reduction temperature X-ray diffractogram (XRD) of titanium nitride when being 1300 DEG C.
Detailed description of the invention
Below in conjunction with specific embodiment, technical scheme is described further.
Embodiment 1:
By titanium dioxide, phenolic resin and methanol according to mol ratio be 1:0.5:1.9 mixing, utilize electromagnetic agitation to be stirred for uniformly, speed of agitator is 300rpm, mixing time 3 hours.Mixed solution is dried 2 hours at 110 DEG C, obtains titanium dioxide/novolak resin precursor body.Being put into by presoma in alumina crucible, under nitrogen protection atmosphere, with the ramp of 5 DEG C/min to 1500 DEG C, be incubated 4 hours, be then down to room temperature with the speed of 5 DEG C/min, finally given the purity nitride powder more than 99.5%, granularity is 200nm ~ 1 μm.
Fig. 1 is carbon thermal reduction temperature X-ray diffractogram (XRD) of product when being 1500 DEG C, it was demonstrated that product is titanium nitride, and there are not other dephasigns.
Embodiment 2:
By titanium dioxide, phenolic resin and methanol according to mol ratio be 1:0.6:2.3 mixing, utilize electromagnetic agitation to be stirred for uniformly, speed of agitator is 300rpm, mixing time 3 hours.Mixed solution is dried 2 hours at 110 DEG C, obtains titanium dioxide/novolak resin precursor body.Being put into by presoma in alumina crucible, under nitrogen protection atmosphere, with the ramp of 5 DEG C/min to 1400 DEG C, be incubated 4 hours, be then down to room temperature with the speed of 5 DEG C/min, finally given the purity nitride powder more than 99.5%, granularity is 200nm ~ 1 μm.
Fig. 2 is carbon thermal reduction temperature X-ray diffractogram (XRD) of product when being 1400 DEG C, it was demonstrated that product is titanium nitride, and there are not other dephasigns.
Embodiment 3:
By titanium dioxide, phenolic resin and methanol according to mol ratio be 1:0.5:1.9 mixing, utilize electromagnetic agitation to be stirred for uniformly, speed of agitator is 300rpm, mixing time 3 hours.Mixed solution is dried 2 hours at 110 DEG C, obtains titanium dioxide/novolak resin precursor body.Being put into by presoma in alumina crucible, under nitrogen protection atmosphere, with the ramp of 5 DEG C/min to 1300 DEG C, be incubated 4 hours, be then down to room temperature with the speed of 5 DEG C/min, finally given the purity nitride powder more than 99.5%, granularity is 200nm ~ 1 μm.
Fig. 3 is carbon thermal reduction temperature X-ray diffractogram (XRD) of product when being 1300 DEG C, it was demonstrated that product is titanium nitride, and there are not other dephasigns.
Embodiment 4:
By titanium dioxide, phenolic resin and methanol according to mol ratio be 1:0.6:2.3 mixing, utilize electromagnetic agitation to be stirred for uniformly, speed of agitator is 400rpm, mixing time 1 hour.Mixed solution is dried 4 hours at 110 DEG C, obtains titanium dioxide/novolak resin precursor body.Presoma is put in alumina crucible, under nitrogen protection atmosphere, with the ramp of 15 DEG C/min to 1200 DEG C; it is incubated 4 hours; then being down to room temperature with the speed of 15 DEG C/min, finally given the purity nitride powder more than 99.5%, granularity is 200nm ~ 500nm.
Embodiment 5:
By titanium dioxide, phenolic resin and methanol according to mol ratio be 1:0.3:1.2 mixing, utilize electromagnetic agitation to be stirred for uniformly, speed of agitator is 100rpm, mixing time 4 hours.Mixed solution is dried 4 hours at 110 DEG C, obtains titanium dioxide/novolak resin precursor body.Being put into by presoma in alumina crucible, under nitrogen protection atmosphere, with the ramp of 15 DEG C/min to 1500 DEG C, be incubated 1 hour, be then down to room temperature with the speed of 15 DEG C/min, finally given the purity nitride powder more than 99.5%, granularity is 200nm ~ 1nm.

Claims (5)

1. the method that a sol-gal process prepares submicron order nitride powder material, it is characterised in that employing ordinary titanium dioxide, phenolic resin, methanol are as raw material, and are prepared for titanium dioxide/novolak resin precursor body by sol-gal process.
2. the method that sol-gal process as claimed in claim 1 prepares submicron order nitride powder material, it is characterised in that specifically comprise the following steps that
1) it is 1:(0.3 ~ 0.6 by titanium dioxide, phenolic resin and methanol according to mol ratio): (1.2 ~ 2.3) mix, and form mixed liquor;
2) mixed solution is dried 2 ~ 4 hours at 70 ~ 110 DEG C, obtain titanium dioxide/novolak resin precursor body;
3) presoma is put in high temperature furnace and heats, 1200 ~ 1500 DEG C, under argon gas atmosphere, be incubated 1 ~ 4 hour, phenolic resin pyrolysis generation amorphous carbon, by carbothermic reduction reaction, finally give submicron order nitride powder material.
3. the method that sol-gal process as claimed in claim 1 prepares submicron order nitride powder material, it is characterized in that, above-mentioned steps 1) in, titanium dioxide and phenolic resin are stirred for uniformly by electromagnetic agitation in methanol solution, speed of agitator is 100 ~ 400rpm, mixing time 1 ~ 3 hour.
4. the method that sol-gal process as claimed in claim 1 prepares submicron order nitride powder material, it is characterized in that, the technique of described carbothermic reduction reaction is, with the ramp of 5 ~ 15 DEG C/min to 1200 ~ 1500 DEG C, it is incubated 1 ~ 4 hour, is then down to room temperature with the speed of 5 ~ 15 DEG C/min.
5. the method that sol-gal process as claimed in claim 1 prepares submicron order nitride powder material, it is characterised in that the purity of titanium nitride prepared by described technique is more than 99.5%, and granularity is 200nm ~ 1 μm.
CN201610273665.9A 2016-04-27 2016-04-27 Sol-gel method for preparing submicron-order titanium nitride powdery material Pending CN105836718A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109467448A (en) * 2018-10-31 2019-03-15 武汉科技大学 A kind of Al4SiC4Refractory material and preparation method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103569977A (en) * 2013-10-16 2014-02-12 河北联合大学 Preparation method of TiN powder

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103569977A (en) * 2013-10-16 2014-02-12 河北联合大学 Preparation method of TiN powder

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
HAIJUN ZHANG ET AL;: "Preparation of titanium nitride ultrafine powders by sol–gel and microwave carbothermal reduction nitridation methods", 《CERAMICS INTERNATIONAL》 *
HAI-PENG GOU ET AL;: "Formation of submicrometer titanium carbide from a titanium dioxide encapsulated in phenolic resin", 《J MATER SCI》 *
杨保祥等: "《钛基材料制造》", 31 January 2015, 冶金工业出版社 *
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109467448A (en) * 2018-10-31 2019-03-15 武汉科技大学 A kind of Al4SiC4Refractory material and preparation method

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Application publication date: 20160810