CN105808002A - Wearable support plate - Google Patents
Wearable support plate Download PDFInfo
- Publication number
- CN105808002A CN105808002A CN201610138147.6A CN201610138147A CN105808002A CN 105808002 A CN105808002 A CN 105808002A CN 201610138147 A CN201610138147 A CN 201610138147A CN 105808002 A CN105808002 A CN 105808002A
- Authority
- CN
- China
- Prior art keywords
- support plate
- layer
- wearable support
- thickness
- micron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Abstract
The invention discloses a wearable support plate. The wearable support plate comprises a flexible fabric base material layer, a sputtering coating layer formed on a single surface or double surfaces of the base material layer, and a protective layer, wherein the protective layer coats the sputtering coating layer; the material of the base material layer is glass fiber, polymer fiber or blended fabric, the material of the sputtering coating layer is copper, and the material of the protective layer is metal or metal oxide; sputtering coating is performed by utilizing a pulse power supply, and operation voltage is between 400 v to 700 v. The wearable support plate utilizes the conducting-material copper, which is cheaper relative to an ITO transparent electrode, and is provided with a specifically-designed circuit diagram, so that the wearable support plate has high impact resistance and low total resistance; the number of coating layers is small, so that the production processes are few, the costs are low, the production efficiency is high, and high visibility and cost competitiveness are provided.
Description
Technical field
The invention belongs to semiconductor device processing technology field, be specifically related to a kind of Wearable support plate.
Background technology
Along with social development and scientific and technical advancing by leaps and bounds, the mankind are day by day urgent to the demand of functional material.New functional material has become new technique and the key of infant industry's development.Electronic electric equipment digitized increasingly, Highgrade integration, signal level small quantization, to meet the requirement of its high speed, lightweight and miniaturization, very easily produced misoperation by outside electromagnetic interference, have serious consequences.Along with the continuous progress of science and technology, smart electronics product has been had wearable demand by people gradually.Wearable product requirement material has certain mechanical strength, it is possible to is stretched, distorts, folds, wrinkles, without performance degradation.These products can adapt to the non-planar surfaces of complexity, has the application that rigid mount does not have.People are by further thinking and exploration, it is manufactured that dummy keyboard, such as laser virtual keyboard, based on the gesture identification dummy keyboard of video, bionic surface electromyographic signal dummy keyboard, Microsoft surface touch control keyboard etc., but existing dummy keyboard needs extra equipment to provide photographic head or laser to realize the function of keyboard, there is certain defect.Owing to traditional ITO (90% Indium sesquioxide .) film design need to can be only achieved preferably electric conductivity at higher temperature plated film, it is unfavorable for the use of flexible substrate, and Indium sesquioxide. price is high how to reduce that to make consumption be also crucial.Additionally, the material such as fine aluminium and fine silver is mostly used in traditional electrode with wire, required film wire and membrane electrode is formed by the mode such as sputter or silk screen printing, but fine silver and pure aluminum material weatherability are poor, in use easily because of the raw electron transfer of delivery in hot weather, in life-time service process, thin film is easily generated abnormal projection or broken string, causes the service life reduction of assembly.
Summary of the invention:
It is an object of the invention to simplify the product of prior art, replace ITO with copper, by direct for copper sputter on flexible parent metal, it is provided that a kind of sputter number of plies is few, and corrosion resisting property is good, and coat binding strength is higher, and cost is low, the Wearable support plate that production efficiency is high.
The purpose of the present invention can be achieved by the following technical measures:
A kind of Wearable support plate, including flexible fabric substrate layer, the sputtered layer that the single or double at substrate layer is formed, and protective layer；Described protective layer overlays in sputtered layer；The material of described substrate layer is glass fibre, polymer fiber or blended cloth; the material of described sputtered layer is copper; the material of described protective layer is metal or metal-oxide, and described sputter adopts the pulse power to carry out, and operation voltage is between 400 volts to 700 volts.
Further, the length of described substrate layer is 10-1000m, and width is 100mm-2000mm, and thickness is 10-1000 μm.
Further, described polymer fiber includes polyester fiber, polyethylene fibre, polypropylene fibre, polyacrylonitrile fibre, vinal, polyvinyl chloride fibre and the cruel fiber of poly-ammonia.
Further, described sputtered layer is distributed netted copper conductor, the width 1-4 micron of described copper conductor, the spaced 50-100 micron of each copper conductor.
Further, the thickness of described sputtered layer is 0.03-1.5 micron, it is preferable that 0.05-0.5 micron.
Further, described protective layer thickness is the 30-40% of described sputtered layer thickness.
The Wearable support plate of the present invention employs the conductive material copper more relatively inexpensive than ito transparent electrode and has the circuit diagram of particular design, there is high impact properties and the performance of low all-in resistance, owing to coating number is few, thus production process is few, cost is low, production efficiency is high, has high visibility and cost competitiveness.
Accompanying drawing explanation
Fig. 1 is the cross-sectional view of Wearable support plate of the present invention.
Wherein: 1-protective layer, 2-sputtered layer, 3-substrate layer.
Detailed description of the invention
In order to make those skilled in the art be more fully understood that technical scheme, below in conjunction with the drawings and specific embodiments, the present invention is described in further detail.
Referring to Fig. 1, the Wearable support plate of the present invention, including flexible fabric substrate layer 3, the sputtered layer 2 that the single or double at substrate layer is formed, and protective layer 1；Described protective layer 1 overlays in sputtered layer 2；The material of described substrate layer 3 is glass fibre, polymer fiber or blended cloth; the material of described sputtered layer 2 is copper; the material of described protective layer 1 is metal or metal-oxide, and described sputter adopts the pulse power to carry out, and operation voltage is between 400 volts to 700 volts.The length of described substrate layer 3 is 10-1000m, and width is 100mm-2000mm, and thickness is 10-1000 μm.Described polymer fiber includes polyester fiber, polyethylene fibre, polypropylene fibre, polyacrylonitrile fibre, vinal, polyvinyl chloride fibre and the cruel fiber of poly-ammonia.Described sputtered layer 2 is distributed netted copper conductor, the width 1-4 micron of described copper conductor, the spaced 50-100 micron of each copper conductor.The thickness of described sputtered layer 2 is 0.03-1.5 micron, and described protective layer 1 thickness is the 30-40% of described sputtered layer 2 thickness.
Embodiment 1
Above-mentioned Wearable support plate, the material of wherein said substrate layer is glass fibre, and the length of substrate layer is 10m, and width is 100mm, and thickness is 10 microns, and described sputtered layer thickness is 0.03 micron, and described protective layer is copper, and thickness is 0.01 micron；Described sputtered layer is distributed netted copper conductor, and the width of described copper conductor is 1 micron, spaced 50 microns of each copper conductor, and described sputter adopts the pulse power to carry out, and operation voltage is 400 volts.
Embodiment 2
Above-mentioned Wearable support plate, the material of wherein said substrate layer is polyester fiber, and the length of substrate layer is 1000m, and width is 2000mm, and thickness is 1000 microns, and described sputtered layer thickness is 1.5 microns, and described protective layer is copper, and thickness is 0.6 micron；Described sputtered layer is distributed netted copper conductor, and the width of described copper conductor is 4 microns, spaced 100 microns of each copper conductor, and described sputter adopts the pulse power to carry out, and operation voltage is 700 volts.
Embodiment 3
Above-mentioned Wearable support plate, the material of wherein said substrate layer is polyethylene fibre, and the length of substrate layer is 500m, and width is 1000mm, and thickness is 500 microns, and described sputtered layer thickness is 0.7 micron, and described protective layer is copper oxide, and thickness is 2.5 microns；Described sputtered layer is distributed netted copper conductor, and the width of described copper conductor is 2.5 microns, spaced 75 microns of each copper conductor, and described sputter adopts the pulse power to carry out, and operation voltage is 550 volts.
Embodiment 4
The Wearable support plate of above-described embodiment 1, is different in that the material of described substrate layer is polypropylene fibre, and thickness is 50 microns, and described sputtered layer thickness is 0.05 micron, and described protective layer thickness is 0.002 micron.
Embodiment 5
The Wearable support plate of above-described embodiment 2, is different in that the material of described substrate layer is polyacrylonitrile fibre, and thickness is 50 microns, and described sputtered layer thickness is 0.5 micron, and described protective layer thickness is 0.15 micron.
Embodiment 6
The Wearable support plate of above-described embodiment 2, is different in that the material of described substrate layer is vinal, and thickness is 50 microns, and described sputtered layer thickness is 0.5 micron, and described protective layer thickness is 0.15 micron.
Embodiment 7
The Wearable support plate of above-described embodiment 3, is different in that the material of described substrate layer is polyvinyl chloride fibre, and thickness is 20 microns, and described sputtered layer thickness is 0.05 micron, and described protective layer thickness is 0.02 micron.
Embodiment 8
The Wearable support plate of above-described embodiment 3, is different in that the material of described substrate layer is the poly-cruel fiber of ammonia, and thickness is 20 microns, and described sputtered layer thickness is 0.05 micron, and described protective layer thickness is 0.02 micron.
Embodiment 9
The Wearable support plate of above-described embodiment 6, is different in that the material of described substrate layer is blended cloth, and thickness is 100 microns, and described sputtered layer thickness is 0.4 micron, and described protective layer thickness is 0.15 micron.
Embodiment 10
The Wearable support plate of above-described embodiment 9, is different in that the length of described substrate layer is 800m, and width is 1500m, and thickness is 800 microns, and described sputtered layer thickness is 1 micron, and described protective layer thickness is 0.4 micron.
It is last it should be noted that, embodiment of above is only in order to illustrate that technical scheme is not intended to limit.Equivalent replacement is carried out it should be understood by a person of ordinary skill in the art that the specific embodiment of the present invention can be modified or to portion of techniques feature；Without deviating from the spirit of technical solution of the present invention, it all should be encompassed in the middle of the technical scheme scope that the present invention is claimed.
Claims (7)
1. a Wearable support plate, it is characterised in that include flexible fabric substrate layer, the sputtered layer that the single or double at substrate layer is formed, and protective layer；Described protective layer overlays in sputtered layer；The material of described substrate layer is glass fibre, polymer fiber or blended cloth; the material of described sputtered layer is copper; the material of described protective layer is metal or metal-oxide, and described sputter adopts the pulse power to carry out, and operation voltage is between 400 volts to 700 volts.
2. Wearable support plate according to claim 1, it is characterised in that the length of described substrate layer is 10-1000m, and width is 100mm-2000mm, and thickness is 10-1000 μm.
3. Wearable support plate according to claim 1, it is characterised in that described polymer fiber includes polyester fiber, polyethylene fibre, polypropylene fibre, polyacrylonitrile fibre, vinal, polyvinyl chloride fibre and the cruel fiber of poly-ammonia.
4. Wearable support plate according to claim 1, it is characterised in that described sputtered layer is distributed netted copper conductor, the width 1-4 micron of described copper conductor, the spaced 50-100 micron of each copper conductor.
5. Wearable support plate according to claim 1, it is characterised in that the thickness of described sputtered layer is 0.03-1.5 micron.
6. Wearable support plate according to claim 1, it is characterised in that the thickness of described sputtered layer is 0.05-0.5 micron.
7. Wearable support plate according to claim 1, it is characterised in that described protective layer thickness is the 30-40% of described sputtered layer thickness.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610138147.6A CN105808002A (en) | 2016-03-11 | 2016-03-11 | Wearable support plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610138147.6A CN105808002A (en) | 2016-03-11 | 2016-03-11 | Wearable support plate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105808002A true CN105808002A (en) | 2016-07-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610138147.6A Pending CN105808002A (en) | 2016-03-11 | 2016-03-11 | Wearable support plate |
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| CN (1) | CN105808002A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1444234A (en) * | 2003-04-15 | 2003-09-24 | 夏芝林 | Preparation method of glass fibre fabric conductive material |
| KR100715100B1 (en) * | 2005-11-11 | 2007-05-07 | 주식회사 대현에스티 | Electro magnetic shielding sheet and that manufacturing method |
| CN104516586A (en) * | 2013-10-08 | 2015-04-15 | 宸鸿美国有限责任公司 | Touch panel and method for manufacturing the same |
| CN105138195A (en) * | 2014-05-30 | 2015-12-09 | 株式会社半导体能源研究所 | Touch panel |
| CN105338733A (en) * | 2015-09-30 | 2016-02-17 | 安徽省大富光电科技有限公司 | Graphic conductive material and electronic equipment |
-
2016
- 2016-03-11 CN CN201610138147.6A patent/CN105808002A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1444234A (en) * | 2003-04-15 | 2003-09-24 | 夏芝林 | Preparation method of glass fibre fabric conductive material |
| KR100715100B1 (en) * | 2005-11-11 | 2007-05-07 | 주식회사 대현에스티 | Electro magnetic shielding sheet and that manufacturing method |
| CN104516586A (en) * | 2013-10-08 | 2015-04-15 | 宸鸿美国有限责任公司 | Touch panel and method for manufacturing the same |
| CN105138195A (en) * | 2014-05-30 | 2015-12-09 | 株式会社半导体能源研究所 | Touch panel |
| CN105338733A (en) * | 2015-09-30 | 2016-02-17 | 安徽省大富光电科技有限公司 | Graphic conductive material and electronic equipment |
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Application publication date: 20160727 |
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