CN105788708B - A kind of manufacture method for the conductive film being distributed in order - Google Patents
A kind of manufacture method for the conductive film being distributed in order Download PDFInfo
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- CN105788708B CN105788708B CN201610322091.XA CN201610322091A CN105788708B CN 105788708 B CN105788708 B CN 105788708B CN 201610322091 A CN201610322091 A CN 201610322091A CN 105788708 B CN105788708 B CN 105788708B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
Abstract
A kind of manufacture method for the conductive film being distributed in order, comprises the following steps：The method that conductive filler passes through 1 time or is repeatedly coated with is coated on substrate, conductive film is formed after dry solidification；The painting method is coated with for light orientation orientating type；What is be coated with every time concretely comprises the following steps：(1) the chain type high molecular polymer that chain is connected to photosensitive functional group is dissolved in organic solvent, and is mixedly configured into suspension with conductive filler；(2) suspension is coated in substrate surface；(3) by UV polarised light directive substrate surfaces, the conductive filler is made to form orientation texture.Using this technique, the network structure being distributed in order is formed using only a small amount of linear conductance filler, it is possible to make high transparency, the transparent conductive film of low sheet resistance.
Description
It based on Application No. 201310728460.1, the applying date is on December 25th, 2013, entitled that the application, which is,《It is a kind of
The conductive film and its manufacture method being distributed in order》Chinese invention patent application divisional application.
Technical field
The invention belongs to a kind of conductive film, is specifically a kind of conductive film being distributed in order.
Background technology
While transparent conductive film is referred to superior electrical conductivity energy, there is higher light transmittance in visible light wave range
Film.It is commonly applied to contact panel, the transparency electrode of solar film battery, flat-panel monitor can electroluminescence device etc..And with
Various devices towards lightening, flexibleization to develop, flexible transparent conductive film is frivolous etc. excellent due to flexible
Put and obtain the extensive concern of all circles.
Transparent conductive film is made at present conductive coating structure is generally done using metal-oxide film, be using most
ITO, that is, indium zinc metal oxide, shows to form one by the way that the method either sputtered is deposited in transparent glass or plastic supporting base
The conductive indium-zinc oxide film of layer.But whole coating process needs to carry out under condition of high vacuum degree, and coating temperature and
After annealing will carry out at high temperature, very high to equipment requirement.And metal oxide is being subject to extraneous stress effect or curved
Qu Shi, it is easy to be damaged, limit its development in flexible device field.
The conductive material for being currently used for making transparent conductive film mainly has：Metal nanometer line, metal nanoparticle, conduction
High molecular polymer, graphene, carbon nanotubes etc..The transparent conductive film wherein made of linear conductance filler has excellent
Electric conductivity and light transmittance, by repeatedly bending after be maintained to relatively low sheet resistance value.Therefore it is most latent
Power substitutes ITO and is used to make transparent conductive film.
In traditional transparent conductive film, linear conductance filler forms network structure to realize electric conductivity by random distribution
Can, therefore conductive layer needs and reaches a certain amount of linear conductance filler to ensure it with relatively low sheet resistance.But line
Property conductive filler content increase, film light transmittance can be caused to decline, mist degree improves, influence application value.Therefore one kind is needed
New is made technique, and the network structure being distributed in order is formed using only a small amount of linear conductance filler, makes high transparency, low table
The transparent conductive film of surface resistance.
The content of the invention
It is an object of the invention to overcome the deficiencies of the prior art and provide a kind of high transparency, the conduction of low sheet resistance
Film.
In order to achieve the above object, the present invention uses following technical scheme：A kind of conductive film being distributed in order, including base
Plate and the conductive layer being disposed on the substrate；The conductive layer is distributed in order by conductive filler to be formed.Compared with the prior art, this hair
A kind of bright conductive film being distributed in order, its conductive layer are to be distributed to be formed in order by conductive filler, are divided in order so as to be formed
The structure of cloth.Using this technique, the network structure being distributed in order is formed using only a small amount of linear conductance filler, it is possible to make
Make high transparency, the transparent conductive film of low sheet resistance.The light transmittance of membrane of conducting layer can reach more than 95%, its square
Below resistance value as low as 45 Ω/mouth, excellent translucency and electric conductivity can be realized at the same time.
Further, the conductive filler is distributed as one-dimension oriented distribution in the same direction in order.
Further, the conductive filler is distributed as the two-dimentional crossed orientation distribution along 0 ° to 90 ° in order.
Further, the conductive filler is distributed as the distribution of second vertical crossed orientation in order.
Further, the conductive filler be metal nanometer line, it is carbon nanotubes, metal nanoparticle, graphene, conductive poly-
Compound or oxidized metal.
Another technical solution of the present invention is as follows：A kind of conductive film being distributed in order, including substrate is with being arranged on base
Conductive layer on plate, further include one be used for be orientated orientation film layer；The conductive layer is by conductive filler coated in shape on alignment film
Into to form the structure being distributed in order.Orientation film layer has the function that to arrange conductive filler in optical anisotropic layer.
Further, the conductive filler is distributed as one-dimension oriented distribution in the same direction in order.
Further, the conductive filler is distributed as the two-dimentional crossed orientation distribution along 0 ° to 90 ° in order.
Further, the conductive layer is arranged on the top of the alignment film either bottom or be integral with alignment film.
It is another object of the present invention to provide a kind of preparation process simple and fast, can produce highly conductive, high
The manufacture method of light rate film.
In order to achieve the above object, the present invention uses following technical scheme：The coating by 1 time or repeatedly by conductive ink
Method coated on substrate, conductive film is formed after dry solidification；The painting method is coated with for orientating type.
Further, every layer of conductive filler distribution differently- oriented directivity with it is preceding once parallel.
Further, every layer of conductive filler be distributed to direction with it is preceding once at an angle；The scope of the angle is at 0 ° to 90 °
Between.
Further, every layer of conductive filler distribution differently- oriented directivity with it is preceding once vertical.
Further, the mode for realizing orientation is mechanics orientation, light orientation orientation or chemistry are orientated.
Further, coating method is beaten for hairbrush coating, roller rod coating, silk-screen printing, intaglio printing, letterpress or ink-jet
Print.
Brief description of the drawings
Fig. 1 is conductive material distribution map of the prior art
Fig. 2 is the one-dimension oriented distribution map of conductive material in the same direction in the present invention
Fig. 3 is the second vertical crossed orientation distribution map of the conductive material in the present invention
Fig. 4 is two-dimentional crossed orientation distribution map of the conductive material along different directions in the present invention
Referring to drawings and the specific embodiments, the invention will be further described.
Embodiment
Embodiment 1
By the HPMC aqueous solutions of the Nano silver solution of concentration 10mg/ml and concentration 1wt% according to 1:6 mass ratio mixing,
Nano-silver thread average diameter 35nm, length 10um.The suspension of gained is mixed 10 minutes on eddy blending machine, so as to obtain
Finely dispersed suspension.The suspension is coated on glass substrate using No. 2 Mayer rods.It is then that glass substrate is rapid
Dry solidification 2 minutes on 90 DEG C of hot plates are transferred to, nano silver transparent conductive film is made.
Test sample surface resistivity, light transmittance.After glass substrate transmission loss is deducted, membrane of conducting layer is 550
The light transmittance of nano wave length is 95.2%, and the square resistance that four probe method measures is 75 Ω/mouth.
Embodiment 2
By the HPMC aqueous solutions of the Nano silver solution of concentration 10mg/ml and concentration 1wt% according to 1:6 mass ratio mixing,
Nano-silver thread average diameter 35nm, length 10um.The suspension of gained is mixed 10 minutes on eddy blending machine, so as to obtain
Finely dispersed suspension.The suspension is coated on glass substrate using No. 1 Mayer rod, glass substrate is shifted rapidly
Dry solidification 2 minutes on to 90 DEG C of hot plates, then reuses Mayer rods and applies the suspension along coating of parallel first time direction
It is layed onto on the conductive film after dry solidification, and is again transferred to dry solidification 2 minutes on 90 DEG C of hot plates, nano silver is made
Transparent conductive film.As shown in Fig. 2, it is the one-dimension oriented distribution map of conductive material in the same direction in the present invention.
Test sample surface resistivity, light transmittance.After glass substrate transmission loss is deducted, membrane of conducting layer is 550
The light transmittance of nano wave length is 95.53%, and the square resistance that four probe method measures is 78 Ω/mouth.
Embodiment 3
By the HPMC aqueous solutions of the Nano silver solution of concentration 10mg/ml and concentration 1wt% according to 1:6 mass ratio mixing,
Nano-silver thread average diameter 35nm, length 10um.The suspension of gained is mixed 10 minutes on eddy blending machine, so as to obtain
Finely dispersed suspension.The suspension is coated on glass substrate using No. 1 Mayer rod, glass substrate is shifted rapidly
Dry solidification 2 minutes on to 90 DEG C of hot plates, then reuses Mayer rods and applies the suspension along the vertical direction that coats for the first time
It is layed onto on the conductive film after dry solidification, and is again transferred to dry solidification 2 minutes on 90 DEG C of hot plates, nano silver is made
Transparent conductive film.As shown in figure 3, it is the second vertical crossed orientation distribution map of the conductive material in the present invention.
Test sample surface resistivity, light transmittance.After glass substrate transmission loss is deducted, membrane of conducting layer is 550
The light transmittance of nano wave length is 96.37%, and the square resistance that four probe method measures is 70 Ω/mouth.
Embodiment 4
By the HPMC aqueous solutions of the Nano silver solution of concentration 10mg/ml and concentration 1wt% according to 1:6 mass ratio mixing,
Nano-silver thread average diameter 35nm, length 10um.The suspension of gained is mixed 10 minutes on eddy blending machine, so as to obtain
Finely dispersed suspension.The suspension is coated on glass substrate using No. 0 Mayer rod, glass substrate is shifted rapidly
Dry solidification 2 minutes on to 90 DEG C of hot plates, then reuses Mayer rods and applies the suspension along coating of parallel first time direction
It is layed onto on the conductive film after dry solidification, and is again transferred to dry solidification 2 minutes on 90 DEG C of hot plates, repeats again
After one step, nano silver transparent conductive film is made.Fig. 2 is conductive material in the same direction one-dimension oriented point in the present invention
Butut.
Test sample surface resistivity, light transmittance.After glass substrate transmission loss is deducted, membrane of conducting layer is 550
The light transmittance of nano wave length is 94.54%, and the square resistance that four probe method measures is 90 Ω/mouth.
Embodiment 5
By the HPMC aqueous solutions of the Nano silver solution of concentration 10mg/ml and concentration 1wt% according to 1:6 mass ratio mixing,
Nano-silver thread average diameter 35nm, length 10um.The suspension of gained is mixed 10 minutes on eddy blending machine, so as to obtain
Finely dispersed suspension.The suspension is coated on glass substrate using No. 0 Mayer rod, glass substrate is shifted rapidly
Dry solidification 2 minutes on to 90 DEG C of hot plates, then reuses Mayer rods and applies the suspension along the vertical last direction that coats
It is layed onto on the conductive film after dry solidification, and is again transferred to dry solidification 2 minutes on 90 DEG C of hot plates, repeats again
After one step, nano silver transparent conductive film is made.Referring to Fig. 3, the second vertical that it is the conductive material in the present invention is handed over
Fork to distribution map.
Test sample surface resistivity, light transmittance.After glass substrate transmission loss is deducted, membrane of conducting layer is 550
The light transmittance of nano wave length is 95.07%, and the square resistance that four probe method measures is 45 Ω/mouth.
Embodiment 6
The high molecular polymer of orientation is dissolved in organic solvent, and certain density suspension is configured to nano-silver thread
Liquid.The suspension is coated in substrate surface by way of water-laid film, prepares conductive layer.The orientating type polyphosphazene polymer used
Compound is chain type high molecular polymer, on side chain with cumarin of the carbochain section of the certain length link with light sensitive characteristic or
Other photosensitive functional groups.Some strength under photosensitive group sensitive wave length is obtained by optical filter and polarizer using high pressure hernia lamp
UV polarised lights, and by the vertical directive substrate surface of the UV polarised lights, certain time length is irradiated, photosensitive group will be in UV light polarization directions
On crosslink reaction, form orientation texture.
Embodiment 7
Alignment liquid is coated on substrate surface first, friction is carried out in a certain direction using hairbrush and alignment film, orientation is made
Film surface can be brushed out the microcosmic order structure arranged in a certain direction because of the filoplume friction of the friction cloth on orientation roller bearing,
Conductive filler on orientation film surface coated with nano conductive filler, alignment film can reach directional orientation because of intermolecular force
Effect.
As the variant embodiment of the present invention, the orderly distribution of conductive material of the invention is not limited to parallel distribution or vertical
Cross-distribution, can be the two-dimentional crossed orientation distribution of the unspecified angle along 0 ° to 90 °, as shown in Figure 4.
It the above is only the preferred embodiment of the present invention, it is noted that above-mentioned preferred embodiment is not construed as pair
The limitation of the present invention, protection scope of the present invention should be subject to claim limited range.For the art
For those of ordinary skill, without departing from the spirit and scope of the present invention, some improvements and modifications can also be made, these change
Protection scope of the present invention is also should be regarded as into retouching.
Claims (5)
1. a kind of manufacture method for the conductive film being distributed in order, it is characterised in that comprise the following steps：
The method that conductive filler passes through 1 time or is repeatedly coated with is coated on substrate, conductive thin is formed after dry solidification
Film；The painting method is coated with for light orientation orientating type；What is be coated with every time concretely comprises the following steps：
(1) high molecular polymer of orientation is dissolved in organic solvent, and certain density suspension is configured to nano-silver thread
Liquid；
(2) suspension is coated in substrate surface by way of water-laid film, prepares conductive layer；The orientating type high score used
Sub- polymer is chain type high molecular polymer, with cumarin of the carbochain section link with light sensitive characteristic of certain length on side chain
Or other photosensitive functional groups；
(3) UV for being obtained some strength under photosensitive group sensitive wave length by optical filter and polarizer using high pressure hernia lamp is polarized
Light, and the vertical directive substrate surface of the UV polarised lights, irradiation certain time length, photosensitive group will be occurred in UV light polarization directions
Cross-linking reaction, forms orientation texture.
2. the manufacture method of the conductive film as claimed in claim 1 being distributed in order, it is characterised in that：Every layer of conductive filler point
Cloth differently- oriented directivity with it is preceding once parallel.
3. the manufacture method of the conductive film as claimed in claim 1 being distributed in order, it is characterised in that：Every layer of conductive filler point
Cloth differently- oriented directivity with it is preceding once at an angle；The scope of the angle is between 0 ° to 90 °.
4. the manufacture method of the conductive film as claimed in claim 1 being distributed in order, it is characterised in that：Every layer of conductive filler point
Cloth differently- oriented directivity with it is preceding once vertical.
5. the manufacture method of the conductive film as claimed in claim 1 being distributed in order, it is characterised in that：Coating method is hairbrush
Coating, roller rod coating, silk-screen printing, intaglio printing, letterpress or inkjet printing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610322091.XA CN105788708B (en) | 2013-12-25 | 2013-12-25 | A kind of manufacture method for the conductive film being distributed in order |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610322091.XA CN105788708B (en) | 2013-12-25 | 2013-12-25 | A kind of manufacture method for the conductive film being distributed in order |
| CN201310728460.1A CN103700430B (en) | 2013-12-25 | 2013-12-25 | A kind of conductive film being distributed in order and its manufacture method |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201310728460.1A Division CN103700430B (en) | 2013-12-25 | 2013-12-25 | A kind of conductive film being distributed in order and its manufacture method |
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| CN105788708A CN105788708A (en) | 2016-07-20 |
| CN105788708B true CN105788708B (en) | 2018-05-15 |
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| CN109949973B (en) * | 2019-03-15 | 2021-09-28 | 广州国显科技有限公司 | CNTs/metal nanowire composite conductive film, preparation method thereof and electronic device |
| CN111422824B (en) * | 2020-05-07 | 2023-09-26 | 南方科技大学 | Orientation method of anisotropic nano material |
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| JP2001059908A (en) * | 1999-06-15 | 2001-03-06 | Nippon Kayaku Co Ltd | Method for rubbing |
| EP1081546A1 (en) * | 1999-08-30 | 2001-03-07 | Eastman Kodak Company | Coating composition containing electrically-conductive polymer and solvent mixture |
| DE60216257T2 (en) * | 2001-04-17 | 2007-06-14 | Matsushita Electric Industrial Co., Ltd., Kadoma | Conductive organic thin film, process for its manufacture, as well as electric and electrical cables that make use of it |
| CN101353477B (en) * | 2008-09-10 | 2010-10-13 | 中南大学 | Preparation of polyaniline / argentum nano composite material |
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