CN105695950A - 一种金刚石涂层刀具退涂的方法 - Google Patents

一种金刚石涂层刀具退涂的方法 Download PDF

Info

Publication number
CN105695950A
CN105695950A CN201610114275.7A CN201610114275A CN105695950A CN 105695950 A CN105695950 A CN 105695950A CN 201610114275 A CN201610114275 A CN 201610114275A CN 105695950 A CN105695950 A CN 105695950A
Authority
CN
China
Prior art keywords
diamond
plasma
cutting tool
coated tools
moves back
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610114275.7A
Other languages
English (en)
Inventor
滕守斌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Kexuan Precision Tool Co Ltd
Original Assignee
Shanghai Kexuan Precision Tool Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Kexuan Precision Tool Co Ltd filed Critical Shanghai Kexuan Precision Tool Co Ltd
Priority to CN201610114275.7A priority Critical patent/CN105695950A/zh
Publication of CN105695950A publication Critical patent/CN105695950A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0236—Pretreatment of the material to be coated by cleaning or etching by etching with a reactive gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

本发明公开了一种金刚石涂层刀具退涂的方法，将磨损后的金刚石涂层刀具用丙酮或酒精清洗干净；将清洗干净后的金刚石涂层刀具固定于等离子增强化学气相沉积设备的样品台中央，待等离子增强化学气相沉积设备抽真空加热后通入氧气和3GHz微波等离子束，使得刀具表面的金刚石涂层在等离子作用下燃烧成微颗粒，冷却后取出刀具；用丙酮清洗去除微粒，露出刀具基体，退涂过程完成，本发明方法简单方便，适合规模化生产，生产效率高。

Description

一种金刚石涂层刀具退涂的方法
技术领域
本发明涉及涂层刀具技术领域，特别是涉及一种金刚石涂层刀具退涂的方法。
背景技术
金刚石是用化学气相沉积法（简称CVD）在异质基体上合成金刚石涂层，这一技术已应用到切削刀具上，称为金刚石涂层刀具，其性能与天然金刚石接近，主要应用于有色金属及其合金如硅铝合金，铜合金，陶瓷、石墨等材料的切削加工。加工时，切削速度快，加工效率高，切刀具使用寿命较长。
金刚石涂层刀具的主要缺点是相对于高速钢、硬质合金、陶瓷灯刀具材料，其成本较高，金刚石涂层磨损或涂层剥落后，需要立即更换刀具。通过退涂重新通过CVD法重涂翻新后刀具可继续使用，无须再购买新的昂贵的金刚石涂层刀具，因此金刚石涂层刀具的退涂是解决其加工经济型的核心技术环节。
目前有两种方法可去除金刚石涂层：化学退涂和物理退涂。用化学退涂去除硬质合金刀具上的金刚石涂层对操作者要求较高，需要相当的熟练程度，过度的化学退涂不仅将涂层去掉，还可能损坏硬质合金材料的微观结构，影响使用性能；并且化学退涂液对环境造成污染，对人体有一定危害。而物理退涂，一般是应用淹没的方法，用砂轮或者磨石将金刚石涂层从刀具基体行去除掉。由于金刚石非常硬而脆，其研磨去除较困难，效率低，难以满足规模化生产的需要。
发明内容
本发明要解决的技术问题是针对现有金刚石涂层刀具去除涂层方法的不足，提供一种简单方便的金刚石涂层的等离子增强退涂方法，适合规模化生产，生产效率高。
为达上述目的，本发明一种金刚石涂层刀具退涂的方法，包括以下步骤：
（1）将磨损后的金刚石涂层刀具用丙酮或酒精清洗干净；
（2）将清洗干净的金刚石涂层刀具固定于等离子增强化学气相沉积设备的样品台中央，待等离子增强化学气相沉积设备抽真空加热后通入氧气和3GHz微波等离子束，使得刀具表面的金刚石涂层在等离子作用下燃烧成微颗粒，冷却后取出刀具；
（3）取出刀具后用丙酮清洗去除微粒，露出刀具基体，退涂过程完成。
其中所述第（2）步骤中等离子增强化学气相沉积设备的真空室抽真空后的压力不高于100Pa。
其中所述第（2）步骤中所述氧气的输入速度不低于0.3升/分钟，并且通入氧气后保持的压力不低于3000Pa。
其中所述第（2）步骤中金刚石涂层在等离子增强化学气相沉积设备真空室内的燃烧温度超过1100℃。
本发明与现有技术不同之处在于本发明取得了如下技术效果：
本发明利用等离子增强化学气象设备，在真空室中输入氧气，在一定温度一定压力下进行金刚石涂层的退涂，简单方便，退涂效率高，适合规模生产的需求。
下面结合附图对本发明作进一步说明。
附图说明
图1为本发明金刚石涂层刀具退涂方法的原理结构图。
附图标记说明：1、等离子增强化学气相沉积设备真空室；2、金刚石涂层刀具；3、等离子增强离子束；4、氧气入口。
具体实施方式
以下结合实施例，对本发明上述的和另外的技术特征和优点作更详细的说明。
实施例1
本实施例以磨损后的金刚石涂层整理立铣刀为例。退涂前采用丙酮或酒精清洗干净，退涂过程在等离子增强化学气相沉积设备真空室1进行，如附图所示。
具体的退涂过程包括以下步骤：
（1）、将清洗干净后的金刚石涂层刀具2固定于等离子增强化学气相沉积设备真空室样品台上。
（2）将等离子增强化学气相沉积设备真空室1抽真空，使其内的压力低于100Pa，打开氧气入口4，氧气输入速度为0.6升/分钟，同时打开等离子术入口3，输入3GHz等离子术，使金刚石涂层在真空室1内加热、氧化至完全燃烧，燃烧温度超过1100℃，在刀具基体上形成微小颗粒，经15分钟后退涂过程结束。自然冷却，取出刀具用丙酮将形成的颗粒去除，去除金刚石涂层后的刀具即是刀具基体。
以上所述的实施例仅仅是对本发明的优选实施方式进行描述，并非对本发明的范围进行限定，在不脱离本发明设计精神的前提下，本领域普通技术人员对本发明的技术方案作出的各种变形和改进，均应落入本发明权利要求书确定的保护范围内。

Claims (4)

1.一种金刚石涂层刀具退涂的方法，其特征在于包括以下步骤：
（1）将磨损后的金刚石涂层刀具用丙酮或酒精清洗干净；
（2）将清洗干净的金刚石涂层刀具固定于等离子增强化学气相沉积设备的样品台中央，待等离子增强化学气相沉积设备抽真空加热后通入氧气和3GHz微波等离子束，使得刀具表面的金刚石涂层在等离子作用下燃烧成微颗粒，冷却后取出刀具；
（3）取出刀具后用丙酮清洗去除微粒，露出刀具基体，退涂过程完成。
2.根据权利要求1所述的金刚石涂层刀具退涂的方法，其特征是：所述第（2）步骤中等离子增强化学气相沉积设备的真空室抽真空后的压力不高于100Pa。
3.根据权利要求1所述的金刚石涂层刀具退涂的方法，其特征是：所述第（2）步骤中所述氧气的输入速度不低于0.3升/分钟，并且通入氧气后保持的压力不低于3000Pa。
4.根据权利要求1所述的金刚石涂层刀具退涂的方法，其特征是：所述第（2）步骤中金刚石涂层在等离子增强化学气相沉积设备真空室内的燃烧温度超过1100℃。
CN201610114275.7A 2016-03-01 2016-03-01 一种金刚石涂层刀具退涂的方法 Pending CN105695950A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610114275.7A CN105695950A (zh) 2016-03-01 2016-03-01 一种金刚石涂层刀具退涂的方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610114275.7A CN105695950A (zh) 2016-03-01 2016-03-01 一种金刚石涂层刀具退涂的方法

Publications (1)

Publication Number Publication Date
CN105695950A true CN105695950A (zh) 2016-06-22

Family

ID=56223562

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610114275.7A Pending CN105695950A (zh) 2016-03-01 2016-03-01 一种金刚石涂层刀具退涂的方法

Country Status (1)

Country Link
CN (1) CN105695950A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106756866A (zh) * 2016-12-07 2017-05-31 富耐克超硬材料股份有限公司 一种金刚石涂层刀具的退涂方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101029385A (zh) * 2007-03-28 2007-09-05 山东大学 Cvd金刚石涂层刀具的微波等离子退涂、重涂方法
CN101118378A (zh) * 2007-08-22 2008-02-06 武汉工程大学 金刚石表面图形化的制备方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101029385A (zh) * 2007-03-28 2007-09-05 山东大学 Cvd金刚石涂层刀具的微波等离子退涂、重涂方法
CN101118378A (zh) * 2007-08-22 2008-02-06 武汉工程大学 金刚石表面图形化的制备方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106756866A (zh) * 2016-12-07 2017-05-31 富耐克超硬材料股份有限公司 一种金刚石涂层刀具的退涂方法
CN106756866B (zh) * 2016-12-07 2019-03-15 富耐克超硬材料股份有限公司 一种金刚石涂层刀具的退涂方法

Similar Documents

Publication Publication Date Title
JP2005509257A5 (zh)
KR101301507B1 (ko) 반도체 제조장치용 히터 제조방법 및 그에 따라 제조된 히터
CN104561925B (zh) 一种自支撑金刚石膜的制备方法
CN103885099B (zh) 一种基于多次迭代刻蚀的透射光学元件损伤阈值提升方法
Xin et al. Surface roughening of ground fused silica processed by atmospheric inductively coupled plasma
CN105904151B (zh) 基于脉冲焊接和激光增材修复的薄壁零部件复合修复方法
ATE509732T1 (de) Verfahren zur oberflächendotierung
CN103770223B (zh) 纳米金刚石涂层刀具及其在口腔修复陶瓷加工中的应用
CN108220914A (zh) 一种轮胎模具内表面dlc涂层的制备方法
CN105251745A (zh) 一种光学元件精密抛光后的清洗方法
CN102503177A (zh) 一种用于超光滑表面的等离子体加工装置
CN109295453A (zh) 一种钢表面制备氮化钛涂层的方法
CN105274465A (zh) 真空镀膜腔内部件洁净粗糙表面的再生方法
CN109437582A (zh) 一种具有抗眩光的3d玻璃的制作方法
CN106166649B (zh) 一种高均匀度的激光导光板加工方法及装置
CN102501181A (zh) 一种金属件表面除油、除锈工艺
CN105695949A (zh) 一种金刚石涂层刀具退涂的方法
CN103495928A (zh) 一种提高蓝宝石衬底片表面质量和产品良率的加工方法
CN105695950A (zh) 一种金刚石涂层刀具退涂的方法
CN108081070A (zh) 一种数控小工具抛光辅助大气等离子体加工方法
JP6200011B2 (ja) 向上した品質の多スペクトル硫化亜鉛
CN110491754B (zh) 一种基于电感耦合等离子体与离子束耦合的光学加工装置
CN100462478C (zh) Cvd金刚石涂层刀具的微波等离子退涂、重涂方法
CN106756866B (zh) 一种金刚石涂层刀具的退涂方法
CN103898468A (zh) 一种零件表面金属镀层缺陷的修复方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20160622

RJ01 Rejection of invention patent application after publication