CN105631085B - The layout optimization of IC design - Google Patents
The layout optimization of IC design Download PDFInfo
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- CN105631085B CN105631085B CN201510489551.3A CN201510489551A CN105631085B CN 105631085 B CN105631085 B CN 105631085B CN 201510489551 A CN201510489551 A CN 201510489551A CN 105631085 B CN105631085 B CN 105631085B
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Abstract
A kind of method includes receiving target pattern, target pattern is limited by main pattern, the first cutting pattern and the second cutting pattern, target pattern is checked by computing system to abide by the first constraint, first constraint is related to the first cutting pattern, target pattern is checked by computing system to abide by the second constraint, second constraint is related to the second cutting pattern, and in response to determining that the first constraint or the second constraint are violated in discovery during checking, modifies pattern by computing system.The embodiment of the present invention further relates to the layout optimization of IC design.
Description
Cross reference to related applications
The application is U. S. application the 14/552nd, 095 continuation-in-part application submitted on November 24th, 2014, beauty
State applies for that No. 14/552,095 is entitled " the Layout Optimization for submitted on July 15th, 2013
U. S. application the 13/941st, 941 divisional application of Integrated Circuit Design ", U. S. application the 13/th
No. 941,941 entitled " the Layout Optimization for Integrated for requiring to submit on March 15th, 2013
U.S. Provisional Application No. 61/794,037 equity of Circuit Design ", their full content are hereby expressly incorporated by
With reference to.
Technical field
The embodiment of the present invention is related to integrated circuit device, more particularly, to the layout optimization of IC design.
Background technique
Multiple patterning is to allow bigger component density for the technology of photoetching process.When manufacturing integrated circuits,
The all parts of such as metal wire are formed in semiconductor substrate.In order to form these components, photomask is used in photoresist layer
Interior formation pattern.For example, following substrate is exposed to etch process by the region for eliminating photoresist layer, which is used for
Groove is formed, then metal is placed in groove.
As the pattern being formed in photoresist layer becomes more and more intensive, due to point of the light source with exposed photoresist layer
Resolution is compared, and the component in nanometer range is relatively small, so being become using single photomask to form pattern in photoresist layer
It obtains difficult.Therefore, multiple masks can be used for the forming member in pattern.Specifically, each of multiple masks are used in target
Different components is generated in pattern.
In some cases, cutting pattern and main pattern are used in combination to form target pattern.Cut pattern removal by
The component that main pattern is formed is to realize desired target pattern.It is provided using such technology for photoetching process specific excellent
Gesture.For example, it is desired for having big process window.Process window refers to that desired component will be generated in photoresist layer
Focus and expose the range of setting.Process window can be improved by the way that component in holding pattern is relatively uniform in density.
This may relate in pattern or be placed around " puppet " component.Pseudo- component is the additional components placed for maintaining member density,
But pseudo- component may not provide any function in circuit, wherein pattern is for circuit design.In order to by pseudo- component and reality
Component separates and generates desired pattern, uses cutting mask.
Cutting part is placed in cutting part mask and is important Consideration.If two cutting parts are each other too
It is close, then it is likely difficult to be properly formed cutting part.In addition, cutting part may negatively affect neighbouring component.Therefore,
When for target pattern design layout, consider that the placement of cutting part is beneficial.
Summary of the invention
The embodiment provides a kind of methods, comprising: receives target pattern, the target pattern is by mainly scheming
Case, the first cutting pattern and the second cutting pattern limit；Check the target pattern by computing system with abide by first constraint,
First constraint is related to the first cutting pattern；Check the target pattern to abide by second by the computing system
Constraint, second constraint are related to the second cutting pattern；And it finds to violate during the inspection in response to determination
First constraint or second constraint, modify the target pattern by the computing system.
Another embodiment of the present invention provides a method, comprising: receives target pattern by computing system；It will be described
Target pattern resolves into main pattern and original cutting pattern, and the original cutting pattern includes multiple cutting parts；Pass through institute
Stating computing system keeps constraint related with each of the multiple cutting part；And it original is cut based on the constraint by described
It cuts pattern and resolves into the first cutting pattern and the second cutting pattern, the first cutting pattern is related to the first mask, and institute
It is related to the second mask to state the second cutting pattern.
Another embodiment of the present invention provides a method, comprising: receives target pattern；One group of constraint is received, it is described
One group of constraint is related to the target pattern is resolved into main pattern, the first cutting pattern and the second cutting pattern；Pass through meter
Target pattern described in systems inspection is calculated to abide by the first constraint of one group of constraint, first constraint and first cutting
Pattern is related；The target pattern is checked by the computing system to abide by the second of one group of constraint the constraint, described the
Two constraints are related to the second cutting pattern；And first constraint is violated in discovery during the inspection in response to determining
Or second constraint, the target pattern is modified by the computing system.
Detailed description of the invention
When reading in conjunction with the accompanying drawings, from it is described in detail below can best understanding each aspect of the present invention.It should be noted that
According to the standard practices in industry, all parts are not drawn on scale.In fact, in order to clearly discuss, the ruler of all parts
It is very little to arbitrarily increase or reduce.
Fig. 1 is to distribute to the exemplary exclusion zone of cutting part according to showing for an example of principle described herein
The figure in domain.
Fig. 2A is to show using turning whether determine ends according to an example of principle described herein
The figure of illustrative methods in exclusionary zone.
Fig. 2 B is to show using edge whether determine ends according to an example of principle described herein
The figure of illustrative methods in exclusionary zone.
Fig. 3 A be according to an example of principle described herein show above main pattern exemplary cut
Cut the figure of pattern.
Fig. 3 B is to be formed according to the showing for an example of principle described herein by main pattern and cutting pattern
The figure of exemplary goal pattern.
Fig. 4 is the exemplary computing system shown for arrangement pattern according to an example of principle described herein
Figure.
Fig. 5 is showing for adjusting pattern layout so that component according to an example of principle described herein
The flow chart of illustrative methods of the end delocalization in exclusionary zone.
Fig. 6 is showing for arrangement pattern so that ends according to an example of principle described herein
The flow chart of illustrative methods of the delocalization in exclusionary zone.
Fig. 7 A to Fig. 7 C is showing on different cutting part masks according to an example of principle described herein
Place the figure of cutting part.
Fig. 8 is the example shown on different cutting part masks according to an example of principle described herein
The figure of property exclusionary zone.
Fig. 9 is showing for optimizing the cutting part in multiple patterns according to an example of principle described herein
Layout illustrative methods flow chart.
Specific embodiment
It should be understood that following disclosure provide many different embodiments for realizing different characteristic of the invention or
Example.The specific example of component and arrangement is described below to simplify the present invention.Certainly, these are only example, and are not intended to
The limitation present invention.In addition, in the following description, implementing the first technique before the second technique may include after the first technique
Implement the embodiment of the second technique immediately, and also may include can be implemented between the first technique and the second technique it is additional
The embodiment of technique.It for purposes of simplicity and clarity, can arbitrarily drawn all parts in varing proportions.In addition, following
In description, above second component or the upper formation first component may include that the first component and second component directly contact to be formed
Embodiment, and also may include that additional component can be formed between the first component and second component, so that
The embodiment that one component and second component can be not directly contacted with.
Moreover, for ease of description, can be used herein such as " ... under ", " in ... lower section ", " lower part ", " ... it
On ", the spatially relative term on " top " etc., to describe an element or component and another (or other) member as shown in the figure
The relationship of part or component.Other than the orientation shown in figure, spatially relative term is intended to include device in use or operation
Different direction.For example, being described as being located at the member of other elements or component " below " or " under " if the device in figure is overturn
Part will be orientated positioned at other elements or component " on ".Therefore, what exemplary term " in ... lower section " may include is upper and lower
The orientation of side.Device can otherwise orient (be rotated by 90 ° or in other directions), and space used herein is opposite
Descriptor can be explained similarly accordingly.
Fig. 1 is the figure for showing the exemplary goal pattern 100 for integrated circuit (IC) layout.Target pattern 100 includes
Multiple target components 102,106,108.For example, target component can be metal wire.Since target pattern will use main pattern
With cutting pattern combination, it is assumed that by by the end of 110 forming member of cutting part.
This figure also illustrates exclusionary zones 104 relevant to the end of component 102.Exclusionary zone 104 limits neighbouring component.
Specifically, component 106 is not terminated in exclusionary zone 104 by " permission ".As long as however, component 108 in exclusionary zone 104 not
With end, exclusionary zone 104 allows component 108 to pass through.It is because, assuming that the end of other component will be by cutting part shape
At.Therefore, in order to allow end to be located in exclusionary zone 104, two cutting parts will be potentially allowed for be formed as connecing very much each other
Closely.
Main pattern and cutting pattern can be formed in a variety of ways.In an example, by exposing photoresist layer
In the light source by photomask, main pattern is formed in photoresist layer.In an example, Other substrate materials can be negativity
Other substrate materials.In such material, the region for being exposed to light becomes insoluble in photoresist developer.Wherein by forming member
Other substrate materials should become soluble in developing solution, and therefore photomask prevents such regional exposure.Photoetching glue material
The insoluble region of material, which retains, to be influenced with protecting following layer not by etch process, and etch process is used for the shape in following layer
At component.
As described above, main pattern can obey restricted design rule.These restricted design rules can be
Consider a variety of constraints of the global density of pattern.For example, restricted design rule layouts may require pattern by parallel and
A series of target components for the set distance that is separated from each other are constituted.In order to generate last circuit, cutting part by these components
Mask is used for the pattern by cutting part exposure at cutting main component.Main component is cut to separate real part part and pseudo- component
It opens.Real part part is that those of function component will be being provided in the circuit generated by pattern.For example, if component is metal wire,
Real part part can be with carry electrical signals.In some instances, cutting main component generates the component with improved line end.
When using negative photoresist, cutting mask can expose unexposed region.Therefore, main mask will be expected
All areas around main component are exposed to light source so that those regions 112 are insoluble.Similarly, cutting part mask exposure light
Photoresist layer will become insoluble region, and therefore " cut " target component formed by target component mask.
In another example, the first photoresist layer is used to for following hard mask material to be exposed to etch process, etches work
Skill forms main component.Then the second photoresist layer in hard mask for forming cutting part.Then hard mask performance can be with
It is transferred to the target pattern of following substrate.In some instances, cutting part can be formed before main component, and can
To use more than one hard mask material.
As described above, it is important that the cutting part in cutting mask follows ad hoc rules.For example, cutting part is each other not
It should be too close to.Therefore, when design object pattern and corresponding main pattern and cutting pattern, consider that those rules are important
's.This is completed by limiting the exclusionary zone for each cutting part, and cutting pattern only " prevents " other target components
End enters.As it is assumed that other component end is generated by using another cutting part, so exclusionary zone makes other component
End is left outside.Therefore, by staying in other component end outside exclusionary zone, it can be ensured that without other cutting parts
Close to another cutting part.By paying close attention to ends rather than whole part, as long as those components 108 are not in exclusionary zone
" stopping ", exclusionary zone 104 allow component 108 to pass through.
In the example of fig. 1, a component 106 is unsatisfactory for exclusionary zone rule.Specifically, component 106 terminates at exclusion
In region.If such case occurs during pattern layout, layout is adjusted to avoid such exclusionary zone violation.
Fig. 2A, which is shown using turning, determines whether component 202,206 and/or 208 terminates in exclusionary zone 204
The figure of illustrative methods.During the layout of target pattern, each mechanism can be used to determine whether component violates exclusion zone
Domain rule.In an example, the turning 212 of component is determined for whether component violates exclusionary zone 204.
In the case where the shape of exclusionary zone substantially rectangular cross-sectional configuration (such as shown in Fig. 2A), turning can be passed through
The distance between 212 determine whether component violates exclusionary zone 204.Specifically, relevant to exclusionary zone 204 can be measured
The distance between one component 202 and the turning of another component 208.Vertical range 210 and horizontal distance 212 may be incorporated for determining
Whether second component 208 is in exclusionary zone 204.In the example of Fig. 2A, the turning of second component 208 is located at exclusionary zone
In 204.Therefore, such layout must be adjusted to abide by exclusionary zone rule.It is located at however, intermediate member 206 does not have
End in exclusionary zone and will not be problematic.
Fig. 2 B is to show using edge the figure for determining whether component terminates at the illustrative methods in exclusionary zone 228.
In this example, the shape of exclusionary zone 228 is oval.However, in some instances, exclusionary zone can be square
, rectangle or it is circular.
In order to determine whether any part terminates in exclusionary zone, edge to edge distance can be measured.Using from first
Direction and distance 226 of the edge 222 of part 202 to the edge 224 of second component 208, can determine the end of second component 208
Whether terminate in exclusionary zone 228.The distance can be for from the center at an edge 222 to the center of other edge 224
Distance.
It is given above to be used to determine that the example whether component terminates in exclusionary zone is only some sides that can be used
Method.It can be used for determining whether component violates various other mechanism of exclusionary zone.In addition, practical layout will have it is several
Exclusionary zone.
In some instances, exclusionary zone and each component are related, wherein component expection is cut by cutting part.It can
Can occur adjusting repeatedly there is a situation where several during layout stage, be located in exclusion zone without ends to have
Layout in domain.In some cases, can component design layout one by one, and therefore will be located at exclusionary zone to avoid having
The mode at interior edge places the component of each new placement.
Fig. 3 A is the figure for showing the exemplary cutting patterns above main pattern.Main pattern is designed to technique
Effectively.Specifically, by addition additional components to maintain uniform density, main pattern is designed as having biggish process window
Mouthful.However, cutting pattern is designed as using cutting part 306, so that generating target pattern when covering main pattern.
As discussed above, it is desired to which cutting pattern not be too close to together.Therefore, exclusionary zone 308 is related to each ends.
Consider the cutting part for being used to form those line ends designing exclusionary zone 308.Specifically, exclusionary zone can be with
It concentrates on to place on the region of cutting part.The placement of cutting part can be determined by ends.
In some instances, multiple patterning techniques can be used and form main pattern.For example, the first mask shape can be used
At some components 302, while other component 304 can be formed with the second mask.It can be used and multiple masks are used to form master
The various technologies of desirable pattern.Such technology includes but is not limited to multiple patterning, the multiple patterning of autoregistration and self orientation
Assembling.
Fig. 3 B is the figure for showing the exemplary goal pattern formed by main pattern and cutting pattern.If target pattern is suitable
Locality is designed as having exclusionary zone relevant to the end of real part part, then cutting pattern will be suitably designed to not be too close to
Cutting part together.In addition, the desired function of target pattern will be still in final pattern.Target pattern includes by shape
As the space 314 with cutting part.Space 314 can separate real part part 316 and pseudo- component 318.
Fig. 4 is the figure for showing the exemplary computing system for arrangement pattern.According to particular exemplary example, physical computing
System 400 includes memory 402, and memory 402 has the layout software 404 and data 406 being stored thereon.Physical computing system
System 400 also includes processor 408 and user interface 410.
There are the memories of available many types.The some type of memory of such as solid state drive is designed to
Storage.The memory of these types usually has big memory capacity, but has relatively low performance.It is other kinds of to deposit
Speed is optimized in reservoir (such as those of random access memory (RAM) memory), and commonly referred to as " work
Make memory ".Various forms of memories can store the information of the form of software 404 and data 406.
Physical computing systems 400 also include for executing software 404 and use or updating storage in memory 402
The processor 408 of data 406.Other than storage layout's software 404, memory 402 be can store an operating system.Operating system
Other application is allowed suitably to interact with the hardware of physical computing systems.Layout software 404 may include being used to form final figure
The tool and main pattern layout and cutting pattern layout of case layout.For example, layout software 404 can have for inspection figure
Case, modification pattern or the tool for decomposing pattern.Data 406 may include design constraint.
User interface 410 can for user 412 provide tool with system interaction.Such as keyboard or mouse can be used in user
The various tools of target are to enter information into physical computing systems.In addition, the various output devices of such as monitor can be used
In to user 412 provide information.
Fig. 5 is shown for adjusting pattern layout so that exemplary side of the ends delocalization in exclusionary zone
The flow chart of method.This method includes the steps that the end 502 of the first component for distributing exclusionary zone to target pattern,
Target pattern has restricted design rule layouts.This method further includes the end for determining another component in target pattern
Whether portion is located at the step 504 in exclusionary zone.If the end of another component in target pattern is located in exclusionary zone,
This method include thes steps that for modifying target pattern so that the end of other component is not located at 506 in exclusionary zone.
Target pattern is formed into having corresponding main pattern and cutting pattern.As will be described in further detail below, one
In a little situations, cutting pattern can resolve into the first cutting pattern and the second pattern.In this case, constraint is not being violated
The modification for implementing pattern under conditions of pattern cannot be decomposed.
Fig. 6 is shown for arrangement pattern so that illustrative methods of the ends delocalization in exclusionary zone
Flow chart.According to particular exemplary example, method 600 includes for exclusionary zone to be distributed to the first component to target pattern
End step 602.This method further include for position other component so that the other component of target pattern end
Step 604 without the end being located in exclusionary zone.Target pattern is formed into having corresponding main pattern and cutting
Pattern.
Fig. 7 A to Fig. 7 C is to show the figure that cutting part is placed on different cutting part masks.As set forth above, it is possible to logical
It crosses one or more masks and forms main pattern.In this case, main component is distributed to being used to generate complete master
A mask in multiple masks of desirable pattern.Furthermore, it is possible to form cutting pattern with multiple masks.Therefore, it can will cut
Cutting part in pattern distributes a mask into the multiple masks for forming complete cutting pattern.It can be according to design about
Beam is completed to distribute cutting part to particular mask.Such design constraint can be provided by manufacture entity, manufacture entity base
Integrated circuit is manufactured in target pattern.
Fig. 7 A shows the main pattern 700 with one group of main component 702.In this example, single mask is used for
Generate main pattern.In addition, the cutting part 704,706,708,710 of cutting pattern 701 is for cutting main component 702 with shape
At desired target pattern.Each cutting part 704,706,708,710 is related to the limitation constraint of placement of cutting part.
For example, each cutting part 704,706,708,710 is related to exclusionary zone 712.Exclusionary zone can be with limited area, at this
In region, exclusionary zone should not be overlapped with other cutting parts.Therefore, cutting part 704,706,708,710 can be distributed
To different cutting patterns, so that exclusionary zone and each cutting pattern be not be overlapped.Different cutting patterns from it is different
Mask is related.
Fig. 7 B shows the first cutting pattern 703 for being located in 700 top of main pattern.First, which cuts pattern 703, includes
Cutting part 704 and cutting part 710.Fig. 7 C shows the second cutting pattern 705 for being located in 700 top of main pattern.The
Two cutting patterns include cutting part 706 and cutting part 708.As shown, being divided into the first cutting drawing pattern 701 will be cut
After case 703 and the second cutting pattern 705, the exclusionary zone of pattern and the exclusionary zone weight of another cutting part are not cut
It is folded.Therefore, constraint has been met.
Exclusionary zone can otherwise be used.For example, exclusionary zone 712 can permit overlapping to a certain degree.Tool
Body, before being considered as and violating constraint, there may be the predetermined thresholds of the amount in the region for allowing to be overlapped.In some examples
In, there is the quantity of the adjacent cutting part of the exclusionary zone of overlapping may remain in minimum value or less.For example, it may be possible to occur
Only a cutting part is allowed to have the case where Chong Die exclusionary zone with another component.In some cases, instead of making
With exclusionary zone, constraint can only consider the distance between cutting part.Specifically, if cutting part and another cutting part
In specific range, cutting part may violate constraint.
In some instances, in fact it could happen that all cutting parts cannot be distributed to cutting in the case where not violating constraint
The case where pattern.In this case, main pattern and/or cutting pattern can be redesigned.Redesign cutting pattern
The size that may relate to readjust cutting part relocates cutting part or remolds the shape of cutting part.It redesigns
Main pattern may relate to add pseudo- component, extend existing main component, or extend existing pseudo- component.Also use can be used
In other selections for redesigning target pattern.
Fig. 8 is the figure for showing the exemplary exclusionary zone on different cutting part masks.In this example, main figure
Case includes the first main pattern with first group of main component 802 and the with second group of main component 804 second main figure
Case.In addition, cutting pattern includes that first with the first cutting part 806 cuts pattern and with the second cutting part 808
Second cutting pattern.Based on the processing technique used beyond the scope of this invention, the cutting part 806 of the first cutting pattern is only
The first main pattern is influenced without influencing the second main pattern.On the contrary, the cutting part 808 of the second cutting pattern only influences the
Two main patterns and do not influence the first main pattern.This can the consideration when determining whether to violate constraint.
For example, as described above, a constraint can be main component cannot terminate in exclusionary zone but can pass through
Exclusionary zone.This example that can be applied to Fig. 8, wherein only considering the main component for corresponding to cutting part.For example, for
The cutting part 806 of one cutting pattern, main component 802 do not have the end being located in corresponding exclusionary zone 810.Although coming
It is terminated in exclusionary zone 810 from the main component 804 of the second main pattern, but this is incoherent, because those are main
Component 804 is not influenced by the first cutting pattern.Similarly, for the cutting part 808 of the second cutting pattern, the second main figure
Main component 804 in case is not terminated in corresponding exclusionary zone 812.Although the main component from the first main pattern
802 terminate in exclusionary zone 812, but this is incoherent, because the second cutting pattern does not influence the first main component
802.Therefore, constraint is not violated, and can not implement to redesign.
Fig. 9 is the flow chart for showing the illustrative methods 900 of the layout for optimizing the cutting part in multiple patterns.Root
According to this example, it is related to three entities: design person 902, mask shop 904 and manufacturer 906 in process.In some examples
In, entity can be under the control of the identical tissue of such as same companies.But in some cases, different tissues can be controlled
Different entities processed.
Design person 902 is commonly designed integrated circuit.This may include circuit function itself and practical layout.Mask
Department 904 is generally responsible for manufacturing the mask that will be used by manufacturer 906.Manufacturer 906 is generally responsible for providing based on designer 902
Pattern and one or more fabrication mask integrated circuits for being provided using mask shop 904.
According to this example, a kind of method includes the steps that implementing 908 by manufacturer 906, mentions for mask shop and designer
For constraint.Constraint can be above-mentioned constraint.For example, constraint can be related to the first cutting pattern and the second cutting pattern.Specifically
Ground, constraint can limit placement of the cutting part relative to corresponding main component.Manufacturer is based on to be used to generate integrated electricity
The such constraint of technique limitation setting of the technique on road.
In step 910, designer 902 and mask shop 904 receive the constraint provided by manufacturer 906.In step 912
In, designer 902 also receives target pattern.Target pattern may create and by engineering relevant to designer 902
Teacher or designer provide.Target pattern can be limited by main pattern and multiple cutting patterns.In other words, it can be incited somebody to action understanding
In the case where manufacturing component by the way that target pattern is resolved into main pattern and cutting pattern, design object pattern.Some
In the case of, main pattern can be limited by the first main pattern and the second main pattern.I.e., it is possible to understand, main pattern will divide
Solution will be formed at the first main pattern and the second main pattern, each pattern by different masks.In addition, cutting pattern can be by
First cutting pattern and the second cutting pattern limit.I.e., it is possible to understand, cutting pattern will resolve into the first cutting pattern and second
Cut pattern.
In step 914, check target pattern to determine whether to have violated any constraint.It in some instances, can be with
In the presence of the first constraint relevant to the first cutting pattern and the second constraint relevant with the second cutting pattern.In some instances,
First constraint and the second constraint can be identical.However, in some instances, constraint can be different.If constraint with will how
Component is distributed to pattern correlation, then constraint is related to cutting pattern.In other words, because first constrains and extremely cut to that will distribute
The limitation of the component of pattern is related, so the first constraint is related to the first cutting pattern.
In step 916, it is determined whether target pattern should be redesigned.If not violating constraint, at this moment do not need
It redesigns, and target pattern can be sent to mask shop 904.However, if violating constraint, method is to being walked
In rapid 918, wherein modification target pattern.Target pattern can be modified in many ways.For example, can modify target pattern with
Cutting part is relocated, the size of cutting part is readjusted or remolds the shape of cutting part.Target figure can also be modified
The component for becoming main component so as to be extended or added pseudo- component by case.After modifying pattern, method is back to step
914, wherein check the target pattern of modification to determine whether to violate any constraint.
In step 920, mask shop 904 receives target pattern and distributes component to each mask.This is by mesh
Case of marking on a map resolves into main pattern and cuts the place of pattern, and further decomposes into the first main figure in some cases
Case, the second main pattern, the first cutting pattern and the second cutting pattern.The decomposition is based on from the received constraint of manufacturer.It changes
Sentence is talked about, and the component of decomposition goal pattern is to abide by constraint.
In step 922, after decomposing, it is determined whether should application target pattern further modification.This can be
If the case where suitably pattern cannot be decomposed in the case where not violating constraint.In case of further modification, then in step
In rapid 926, the notice that should further modify target pattern is sent to designer by mask shop.Then this method is back to step
Rapid 918.However, each figure can be formed in corresponding mask in step 924 if further modification does not occur
Case, and mask is supplied to manufacturer 906.
In step 928, manufacturer receives mask.Then, in step 930, manufacturer uses the integrated electricity of fabrication mask
Road.Due to above-mentioned technique, each manufacturing process can be used and effectively manufacture integrated circuit.
According to this example, a kind of method includes receiving target pattern, target pattern by main pattern, the first cutting pattern and
Second cutting pattern limits, and checks target pattern by computing system to abide by the first constraint, the first constraint and the first cutting drawing
Case is related, checks target pattern by computing system to abide by the second constraint, and the second constraint is related to the second cutting pattern, and
In response to determining that the first constraint or the second constraint are violated in discovery during checking, pattern is modified by computing system.
In the above-mentioned methods, wherein described first be constrained to it is below at least one: between neighbouring cutting part away from
From and and adjacent cutting part of the cutting part in specific range quantity.
In the above-mentioned methods, wherein first constraint and second constraint include exclusionary zone, the exclusionary zone
Limit the region for surrounding corresponding cutting part.
In the above-mentioned methods, wherein first constraint and second constraint include exclusionary zone, the exclusionary zone
Limit the region for surrounding corresponding cutting part, wherein if the end of main component is positioned at relevant to the cutting part
In the exclusionary zone, then first constraint is violated in the placement of the cutting part.
In the above-mentioned methods, wherein first constraint and second constraint include exclusionary zone, the exclusionary zone
Limit the region for surrounding corresponding cutting part, wherein if the exclusionary zone and row relevant to neighbouring cutting part
Except region is overlapped, then first constraint is violated in the placement of cutting part.
In the above-mentioned methods, wherein first constraint and second constraint include exclusionary zone, the exclusionary zone
Limit the region for surrounding corresponding cutting part, wherein the shape of the exclusionary zone is one of the following: square, rectangle, circle
Shape or ellipse.
In the above-mentioned methods, wherein the modification includes following one: relocating cutting part, readjust cutting
The size of component, the shape for remolding cutting part extend the end of the main component of the main pattern or by pseudo- component
It is added to the main pattern.
In the above-mentioned methods, wherein first constraint is different from second constraint.
According to an example, a kind of method includes that target pattern is resolved into master by computing system reception target pattern
Desirable pattern and original cutting pattern, original cutting pattern includes multiple cutting parts, cuts constraint with multiple by computing system
It is related to cut each of component, and original cutting pattern is resolved by the first cutting pattern and the second cutting drawing based on constraint
Case, the first cutting pattern is related to the first mask, and the second cutting pattern is related to the second mask.
In the above-mentioned methods, wherein first constraint and second constraint include exclusionary zone, the exclusionary zone
Limit the region for surrounding corresponding cutting part.
In the above-mentioned methods, wherein first constraint and second constraint include exclusionary zone, the exclusionary zone
Limit the region for surrounding corresponding cutting part, wherein implement the decomposition to reduce exclusionary zone in cutting pattern accordingly
On overlapping.
In the above-mentioned methods, wherein first constraint and second constraint include exclusionary zone, the exclusionary zone
Limit the region for surrounding corresponding cutting part, wherein if the area of the overlapping of the exclusionary zone of two neighbouring cutting parts
Domain exceeds predetermined threshold, then violating for first constraint occurs.
In the above-mentioned methods, further includes: in response to determining in the feelings for not violating first constraint or second constraint
The decomposition cannot be completed under condition, modify the main pattern, the first cutting pattern or the second cutting pattern.
In the above-mentioned methods, wherein first constraint and second constraint include exclusionary zone, the exclusionary zone
Limit the region for surrounding corresponding cutting part, wherein implement the decomposition to reduce exclusionary zone in cutting pattern accordingly
On overlapping, wherein the modification includes following one: the size, again for relocating cutting part, readjusting cutting part
Mould the shape of cutting part, the end for the main component for making the main pattern extends or is added to pseudo- component described main
Pattern.
In the above-mentioned methods, further includes: the main pattern is resolved into the first main pattern and the second main pattern,
In, first main pattern is related to the first cutting pattern, and second main pattern and second cutting
Pattern is related.
In the above-mentioned methods, further includes: the main pattern is resolved into the first main pattern and the second main pattern,
In, first main pattern is related to the first cutting pattern, and second main pattern and second cutting
Pattern is related, wherein the decomposition be so that: if cutting part covers main component relevant to first main pattern
End, then by the cutting part distribute to it is described second cutting pattern.
In the above-mentioned methods, further includes: the first cutting pattern is also resolved into third cutting pattern and the 4th cutting
Pattern.According to an example, a kind of method includes receiving target pattern, receives one group of constraint, group constraint with by target pattern
It is related to resolve into main pattern, the first cutting pattern and the second cutting pattern, checks target pattern to abide by by computing system
First constraint of group constraint, the first constraint is related to the first cutting pattern, checks target pattern to abide by by computing system
Second constraint of group constraint, the second constraint is related to the second cutting pattern, and discovery is disobeyed during checking in response to determining
Violate the first constraint or the second constraint, pattern is modified by computing system.
In the above-mentioned methods, wherein first constraint is exclusionary zone, and the exclusionary zone indicates to surround cutting part
Region, another cutting part should not be placed in this region.
In the above-mentioned methods, wherein first constraint is exclusionary zone, and the exclusionary zone indicates to surround cutting part
Region, wherein the cutting part should not be placed such that main component end be located at it is relevant to the cutting part
In exclusionary zone.
It should be understood that can be in various orders or concurrently using each different groups of above-named embodiment and step
It closes, and is crucial or necessary without particular step.Although in addition, term used herein " electrode ", it will be recognized that should
Term includes the concept of " electrode contact ".In addition, above in conjunction with it is some implement the features that exemplify and discuss can with above
The feature combination for showing and discussing in conjunction with other embodiments.Therefore, all such modification expections are included in the scope of the present invention
It is interior.
Foregoing has outlined the features of several embodiments, so that side of the invention may be better understood in those skilled in the art
Face.It should be appreciated by those skilled in the art that they can be easily using designing or modifying based on the present invention for real
It grants the identical purpose of embodiment defined herein and/or realizes other process and structures of identical advantage.Those skilled in the art
Member it should also be appreciated that this equivalent constructions without departing from the spirit and scope of the present invention, and without departing substantially from essence of the invention
In the case where mind and range, they can make a variety of variations, replace and change herein.
Claims (20)
1. a kind of layout method of integrated circuit, comprising:
Target pattern is received, the target pattern is limited by main pattern, the first cutting pattern and the second cutting pattern；
The target pattern is checked by computing system to abide by the first constraint, first constraint and the first cutting pattern
It is related and unrelated with the second cutting pattern；
The target pattern is checked by the computing system to abide by the second constraint, second constraint and second cutting
Pattern is related and unrelated with the first cutting pattern；And
In response to determining, first constraint or second constraint are violated in discovery during the inspection, are by the calculating
System modifies the target pattern,
Integrated circuit relevant to the target pattern of modification is manufactured, the manufacture is utilized and the first cutting pattern phase
The first mask and the second mask relevant to the second cutting pattern, first mask closed is different from described second and covers
Mould.
2. according to the method described in claim 1, wherein, described first be constrained to it is below at least one: neighbouring cutting part
The distance between part and and adjacent cutting part of the cutting part in specific range quantity.
3. according to the method described in claim 1, wherein, first constraint and second constraint include exclusionary zone, institute
It states exclusionary zone and limits the region for surrounding corresponding cutting part.
4. according to the method described in claim 3, wherein, if the end of main component be located at it is relevant to the cutting part
In the exclusionary zone, then first constraint is violated in the placement of the cutting part.
5. according to the method described in claim 3, wherein, if the exclusionary zone and row relevant to neighbouring cutting part
Except region is overlapped, then first constraint is violated in the placement of cutting part.
6. according to the method described in claim 3, wherein, the shape of the exclusionary zone is one of the following: square, rectangle,
Round or ellipse.
7. the modification includes following one according to the method described in claim 1, wherein: relocating cutting part, again
Adjust cutting part size, remold cutting part shape, make the main pattern main component end extend or
Pseudo- component is added to the main pattern.
8. according to the method described in claim 1, wherein, first constraint is different from second constraint.
9. a kind of layout method of integrated circuit, comprising:
Target pattern is received by computing system；
The target pattern is resolved into main pattern and original cutting pattern, the original cutting pattern includes multiple cutting parts
Part；
Keep constraint related with each of the multiple cutting part by the computing system；And
The original cutting pattern is resolved into the first cutting pattern and second based on the constraint and cuts pattern, in the constraint
First constraint with it is described first cutting pattern it is related and with it is described second cut pattern it is unrelated, in the constraint second constrain
It is related and unrelated with the first cutting pattern to the second cutting pattern, the first cutting pattern and the first mask phase
It closes, and the second cutting pattern is related to the second mask,
Utilize first mask and the second fabrication mask integrated circuit, wherein first mask is different from described the
Two masks.
10. according to the method described in claim 9, wherein, first constraint and second constraint include exclusionary zone, institute
It states exclusionary zone and limits the region for surrounding corresponding cutting part.
11. according to the method described in claim 10, wherein, implementing the decomposition to reduce exclusionary zone in corresponding cutting drawing
Overlapping in case.
12. according to the method described in claim 10, wherein, if the overlapping of the exclusionary zone of two neighbouring cutting parts
Region exceeds predetermined threshold, then violating for first constraint occurs.
13. according to the method described in claim 9, further include:
The decomposition cannot be completed in the case where not violating first constraint or second constraint in response to determining, is modified
The main pattern, the first cutting pattern or the second cutting pattern.
14. according to the method for claim 13, wherein the modification includes following one: relocating cutting part, again
The size of new adjustment cutting part, the shape for remolding cutting part, make the end of the main component of the main pattern extend or
Pseudo- component is added to the main pattern by person.
15. according to the method described in claim 9, further include:
The main pattern is resolved into the first main pattern and the second main pattern, wherein first main pattern and institute
It is related to state the first cutting pattern, and second main pattern is related to the second cutting pattern.
16. according to the method for claim 15, wherein the decomposition be so that: if cutting part covering and described the
The end of the relevant main component of one main pattern then distributes the cutting part to the second cutting pattern.
17. according to the method described in claim 9, further include:
The first cutting pattern is also resolved into third cutting pattern and the 4th cutting pattern.
18. a kind of layout method of integrated circuit, comprising:
Receive target pattern；
Receive one group of constraint, one group of constraint resolves into main pattern, the first cutting pattern and the with by the target pattern
Two cutting patterns are related；
The target pattern is checked by computing system to abide by the first of one group of constraint the constraint, first constraint and institute
It is related to state the first cutting pattern；
The target pattern is checked by the computing system to abide by the second of one group of constraint the constraint, second constraint
It is related to the second cutting pattern；And
In response to determining, first constraint or second constraint are violated in discovery during the inspection, are by the calculating
System modifies the target pattern,
Integrated circuit relevant to the target pattern of modification is manufactured, the manufacture is utilized and the first cutting pattern phase
The first mask and the second mask relevant to the second cutting pattern, first mask closed is different from described second and covers
Mould.
19. according to the method for claim 18, wherein first constraint is exclusionary zone, and the exclusionary zone indicates
Around the region of cutting part, another cutting part should not be placed in this region.
20. according to the method for claim 18, wherein first constraint is exclusionary zone, and the exclusionary zone indicates
Around the region of cutting part, wherein the cutting part should not be placed such that the end of main component is located at and cut with described
It cuts in the relevant exclusionary zone of component.
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| Application Number | Priority Date | Filing Date | Title |
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| US14/552,095 | 2014-11-24 | ||
| US14/552,095 US9292645B2 (en) | 2013-03-15 | 2014-11-24 | Layout optimization for integrated circuit design |
| US14/598,773 US9418196B2 (en) | 2013-03-15 | 2015-01-16 | Layout optimization for integrated circuit design |
| US14/598,773 | 2015-01-16 |
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| KR (1) | KR101802582B1 (en) |
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| CN103268380A (en) * | 2013-05-24 | 2013-08-28 | 中国兵器工业集团第二一四研究所苏州研发中心 | Analogue integrated circuit layout designing method capable of improving layout efficiency |
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| CN104050309A (en) * | 2013-03-14 | 2014-09-17 | 台湾积体电路制造股份有限公司 | Layout optimization of a main pattern and a cut pattern |
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| JP2004046731A (en) * | 2002-07-15 | 2004-02-12 | Toshiba Corp | Disposition verification apparatus and method |
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| US7765515B2 (en) * | 2007-02-03 | 2010-07-27 | Anchor Semiconductor, Inc. | Pattern match based optical proximity correction and verification of integrated circuit layout |
| US8286119B2 (en) * | 2009-01-30 | 2012-10-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Systematic method for variable layout shrink |
| KR101801017B1 (en) * | 2010-02-09 | 2017-11-24 | 코닌클리케 필립스 엔.브이. | 3d video format detection |
| TWI498854B (en) * | 2013-01-18 | 2015-09-01 | Chunghwa Picture Tubes Ltd | Method of auto-determination a three-dimensional image format |
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| CN103311236A (en) * | 2012-03-14 | 2013-09-18 | 台湾积体电路制造股份有限公司 | Dissection splitting with optical proximity correction to reduce corner rounding |
| CN103970923A (en) * | 2013-01-30 | 2014-08-06 | 台湾积体电路制造股份有限公司 | Self-aligned multiple patterning layout design |
| CN104050309A (en) * | 2013-03-14 | 2014-09-17 | 台湾积体电路制造股份有限公司 | Layout optimization of a main pattern and a cut pattern |
| CN103268380A (en) * | 2013-05-24 | 2013-08-28 | 中国兵器工业集团第二一四研究所苏州研发中心 | Analogue integrated circuit layout designing method capable of improving layout efficiency |
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| KR101802582B1 (en) | 2017-11-28 |
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| CN105631085A (en) | 2016-06-01 |
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