CN105624626A - 一种基于生物模板的三维光子晶体的制备方法 - Google Patents
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Abstract
本发明公开了一种基于生物模板的三维光子晶体的制备方法,是在氩气和氧气气氛中采用射频溅射的方式向粘有生物模板的玻璃基底上溅射金属Ti或氧化锌ZnO?2-15分钟,形成生物-Ti或生物-ZnO;随后将生物-Ti或生物-ZnO送入马弗炉中极性原位高温退火处理,形成具有三维光子晶体结构的TiO2纳米颗粒或ZnO纳米颗粒。本发明基于生物模板的三维光子晶体制备方法可获得较高质量的具有三维光子晶体结构的TiO2纳米晶或ZnO纳米晶,整个制备方法中工艺简单、重复性良好、成本低廉。TiO2纳米晶颗粒或ZnO纳米晶颗粒因具有良好的长波段光散射能力而使得染料敏化太阳能电池的光电转换效率得以提升。
Description
一、技术领域
本发明涉及一种光子晶体的制备方法,具体地说是一种基于生物模板的三维光子晶体的制备方法,属于光子晶体技术领域。
二、背景技术
随着社会的发展,显赫一时的半导体器件已经不能满足信息技术发展的需要,必须寻找信息传输速率更高,效率更高的新材料。普遍认为,光子技术将续写电子技术的辉煌,光子晶体将成为未来所依赖的新材料。光子晶体(又称光子禁带材料)的出现,使人们操纵和控制光子的梦想成为可能。与半导体晶格对电子波函数的调制相类似,光子带隙材料能够调制具有相应波长的电磁波---当电磁波在光子带隙材料中传播时,由于存在布拉格散射而受到调制,电磁波能量形成能带结构光子晶体。光子晶体具有波长选择的功能,可以有选择地使某个波段的光通过而阻止其它波长的光通过其中。光子晶体和半导体在基本模型和研究思路上有许多相似之处,人们可以通过设计和制造光子晶体及其器件,达到控制光子运动的目的。
近些年来,在人们不断探索和试验的过程中,出现了许多可行的人工制备方法,如:介质棒堆积、精密机械钻孔、胶体颗粒自组织生长、胶体溶液自组织生长和半导体工艺等。用这些方法,通过人工地控制光子晶体中介电材料之间介电常数的配比和光子晶体的微周期性结构,可以制备出带有各种带隙的光子晶体。然而光子晶体的制备有一定的难度,因为光子晶体的晶格尺度和光的波长具有相同的数量级,如:对于光通信波段(波长1.55μm),要求光子晶体的晶格在0.5μm左右。但已有的方法因工艺的复杂不能达到令人满意的程度。尤其是类生物结构(比如蝴蝶、孔雀、甲虫等的翅膀)的光子晶体的精细制备有待长足发展。
迄今为止,已有多种基于光子晶体的全新光子学器件被相继提出,包括无阈值的激光器,无损耗的反射镜和弯曲光路,高品质因子的光学微腔,低驱动能量的非线性开关和放大器,波长分辨率极高而体积极小的超棱镜,具有色散补偿作用的光子晶体光纤,以及提高效率的发光二极管等。光子晶体的出现使信息处理技术的"全光子化"和光子技术的微型化与集成化成为可能,它可能在未来导致信息技术的一次革命,其影响可能与当年半导体技术相提并论。光子晶体在染料敏化太阳能电池的应用方面,虽然CarmenLópez-López(20121222-2)和S.Guldin(20121222-4)等将一维、反猫眼石等光子晶体应用于染料敏化太阳能电池中,但其光电性能不尽人意,并且,具有精准的复制结构、基于生物模板的三维光子晶体在染料敏化太阳能电池中的应用未见报道。
三、发明内容
本发明旨在提供一种基于生物模板的三维光子晶体的制备方法,该三维光子晶体的制备方法工艺过程简单、容易实现,克服了背景技术中光子晶体的工艺方法复杂的问题;且制备而成的三维光子晶体能更加有效增加太阳光在太阳能电池中的光程,提升太阳能电池器件内部的光散射能力,从而提高太阳能电池的光电转换效率。
本发明基于生物模板的三维光子晶体的制备方法,包括以下步骤:
步骤1,将具有三维光子晶体特性的生物模板粘于磁控溅射腔体的玻璃基底上,然后将粘有生物模板的玻璃基底置于磁控溅射系统的衬底上,选择Ti金属靶或ZnO陶瓷靶为磁控溅射靶材,在3×10-3-3×10-5Pa真空环境和40W-120W功率下,向溅射腔体内通入5-60sccm的氩气和氧气,同时采用射频溅射的方式向粘有生物模板的玻璃基底上溅射金属Ti或氧化锌ZnO2-15分钟,形成生物-Ti或生物-ZnO;
步骤2,将生物-Ti或生物-ZnO送入马弗炉中,在氧气氛围下于400-600℃原位高温退火处理60-300分钟,随后自然冷却到室温,形成具有三维光子晶体结构的TiO2纳米颗粒或ZnO纳米颗粒。
步骤1中氩气和氧气的流量比为(5-60):1。
步骤2中马弗炉升温速率为0.5-5℃/分钟。
步骤2中TiO2纳米颗粒或ZnO纳米颗粒的尺寸为60-80μm。
步骤1中所述生物模板为蝴蝶翅膀,所述蝴蝶类型为大紫蛱、蚊蛱、环蝶或武凯蛱等。
与已有技术相比,本发明的有益效果体现在:
本发明基于生物模板的三维光子晶体制备方法可获得较高质量的具有三维光子晶体结构的TiO2纳米晶或ZnO纳米晶,整个制备方法中工艺简单、重复性良好、成本低廉。TiO2纳米晶颗粒或ZnO纳米晶颗粒因具有良好的长波段光散射能力而使得染料敏化太阳能电池的光电转换效率得以提升。而且,所述纳米晶颗粒亦具有光催化效应,可用于光催化、气体敏感材料等领域应用。
四、附图说明
图1是以大紫蛱蝶翅膀为生物模板制备的TiO2光子晶体的XRD谱图。从图1中可以看出通过本发明的实施例1得到的纳米晶TiO2光子晶体,其结晶性能好,为TiO2的锐钛矿结构。
图2是以大紫蛱蝶翅膀为生物模板制备的TiO2光子晶体的SEM图像。从图2中可以看出根据本实施例1复制得到的纳米晶TiO2光子晶体,其扫描电子显微照片表明,大紫蛱蝶的多个鳞片均被完整复制,且排列整齐(图2A)。图2B-D为不同放大倍数的纳米晶TiO2光子晶体。此图说明具有天然光子晶体结构的大紫蛱蝶的鳞片在不同微观层次上均被精细地复制为纳米晶TiO2光子晶体,其尺寸在40至100微米之间。
图3是以大紫蛱蝶翅膀为生物模板制备的TiO2光子晶体的TEM图像。从图3中可以看出根据本实施例1复制得到的纳米晶TiO2光子晶体,其透射电子显微照片表明,大紫蛱蝶的单个鳞片被完整的复制,但略有卷曲。该鳞片宽度大概在40微米,长度大概为100微米。
图4是以蚊蛱蝶翅膀为生物模板制备的ZnO光子晶体的的XRD图像。从图4中可以看出通过本发明的实施例3得到的纳米晶ZnO光子晶体,其结晶性能好,为ZnO纤锌矿结构。
图5是以蚊蛱蝶翅膀为生物模板制备的ZnO光子晶体的的SEM图像。从图5中可以看出根据本实施例2复制得到的纳米晶ZnO光子晶体,其扫描电子显微照片表明,纹蛱蝶的多个鳞片均被较为完整的复制,无弯曲(图5A)。图5B-D为不同放大倍数的纳米晶ZnO光子晶体。此图说明具有天然光子晶体结构的纹蛱蝶的鳞片在不同微观层次上均被精细地复制为纳米晶ZnO光子晶体,其尺寸在30至70微米之间。
图6是以蚊蛱蝶翅膀为生物模板制备的ZnO光子晶体的的TEM图像。从图6中可以看出通过本发明的实施例2得到的纳米晶ZnO光子晶体其透射电子显微照片表明,大紫蛱蝶的鳞片被较为完整的复制,无弯曲。并且该鳞片的细节被复制的较为完好。
图7是以大紫蛱翅膀为生物模板制备的光子晶体应用于染料敏化太阳能电池的结构示意图。从图7中可以看出,依据本实施例1,得到的新型染料敏化太阳能电池是由导电玻璃、二氧化钛、蝴蝶散射层、电解质、铂对电极、导电玻璃等部分构成。
图8是以大紫蛱翅膀为生物模板制备的光子晶体应用于染料敏化太阳能电池的光散射层后的光电流-光电压图像。从图8中可以看出,较之没有加TiO2光子晶体散射层的染料敏化太阳能电池,加入TiO2光子晶体散射层的染料敏化太阳能电池的开路电压和电流密度均得以提升,特别是光电流密度大幅提升,表明TiO2光子晶体散射层的加入有效的提高的光的利用率。
五、具体实施方式
下面将结合本发明实施例中的附图,对本发明实施例中的技术方案进行清楚、完整地描述,显然,所描述的实施例仅是本发明一部分实施例,而不是全部的实施例。基于本发明中的实施例,本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其他实施例,都属于本发明保护的范围。
实施例1:基于大紫蛱蝶模板的TiO2三维光子晶体
步骤1,将大紫蛱蝶翅膀粘于磁控溅射腔体的玻璃基底上,然后将粘有大紫蛱蝶翅膀的玻璃基底置于磁控溅射系统的衬底上,选择Ti金属靶为磁控溅射靶材,在3*10-3Pa真空环境和40W功率下,向溅射腔体内通入60sccm的氩气和2sccm氧气,同时采用射频溅射的方式向粘有蝴蝶翅膀的玻璃衬底上溅射金属Ti十五分钟,形成蝴蝶-Ti;
步骤2,将蝴蝶-Ti送入马弗炉中,在氧气氛围下于400-600℃原位高温退火处理200分钟,随后自然冷却到室温,马弗炉升温速率为5℃/分钟,形成具有三维光子晶体结构的TiO2纳米颗粒,不存在金属态Ti。所述TiO2纳米颗粒是整个蝴蝶翅膀鳞片的复制,尺寸为100微米,如图2和3所示为其扫描电镜和透射电极的图像。
实施例2:基于纹蛱蝶的ZnO三维光子晶体
步骤1,将蚊蛱蝶翅膀粘于磁控溅射腔体的玻璃基底上,然后将粘有蚊蛱蝶翅膀的玻璃基底置于磁控溅射系统的衬底上,选择ZnO陶瓷靶为磁控溅射靶材,在3*10-3Pa真空环境和120W功率下,向溅射腔体内通入80sccm的氩气和20sccm的氧气,同时采用射频溅射的方式向粘有蝴蝶翅膀的玻璃衬底上溅射ZnO两分钟;形成纹蛱蝶-ZnO;
步骤2,将蝴蝶-ZnO送入马弗炉中,在氧气氛围下于400-600℃原位高温退火处理120分钟,随后自然冷却到室温,马弗炉升温速率为0.5℃/分钟,形成具有三维光子晶体结构的ZnO纳米颗粒。所述ZnO纳米颗粒是整个蝴蝶翅膀鳞片的复制,尺寸在60-80微米之间,如图5和6所示为其扫描电镜和透射电极的图像。
实施例3:基于碧凤蝶模板的TiO2三维光子晶体
步骤1,将碧凤蝶翅膀粘于磁控溅射腔体的玻璃基底上,然后将粘有碧凤蝶翅膀的玻璃基底置于磁控溅射系统的衬底上,调节靶材和衬底之间的距离为50cm,选择Ti金属靶为磁控溅射靶材,在5*10-3Pa真空环境和60W功率下,向溅射腔体内通入40sccm的氩气和2sccm的氧气,同时采用射频溅射的方式向粘有蝴蝶翅膀的玻璃衬底上溅射金属Ti十分钟,形成碧凤蝶-Ti;
步骤2,将碧凤蝶-Ti送入马弗炉中,在氧气氛围下于400-600℃原位高温退火处理150分钟,随后自然冷却到室温,马弗炉升温速率为1℃/分钟,形成具有三维光子晶体结构的TiO2纳米颗粒,不存在金属态Ti。所述TiO2纳米颗粒是整个蝴蝶翅膀鳞片的复制,尺寸在60-150微米之间。
将实施例1中制备的纳米晶TiO2三维光子晶体应用于染料敏化太阳能电池,作为其光阳极上的散射层,其结构示意图如图7所示。具有TiO2-光子晶体散射层的太阳能电池的光伏性能均优于未具备TiO2三维光子晶体的染料敏化太阳能电池,光电转换效率从原来的5.6%增加到了8.7%,其光电流-电压曲线如图8所示。
本发明通过磁控溅射法制备TiO2或ZnO三维光子晶体纳米颗粒采用的是射频磁控溅射系统,由机械泵、分子泵、真空腔体、靶材基底、靶材、衬底旋转机构、真空计、射频电源等部件构成,为现有技术在此不再赘述,其他的溅射系统只要满足方法工艺需求也可实现本发明的工艺方法。
Claims (5)
1.一种基于生物模板的三维光子晶体的制备方法,其特征在于包括如下步骤:
步骤1,将具有三维光子晶体特性的生物模板粘于磁控溅射腔体的玻璃基底上,然后将粘有生物模板的玻璃基底置于磁控溅射系统的衬底上,选择Ti金属靶或ZnO陶瓷靶为磁控溅射靶材,在3×10-3-3×10-5Pa真空环境和40W-120W功率下,向溅射腔体内通入5-60sccm的氩气和氧气,同时采用射频溅射的方式向粘有生物模板的玻璃基底上溅射金属Ti或氧化锌ZnO2-15分钟,形成生物-Ti或生物-ZnO;
步骤2,将生物-Ti或生物-ZnO送入马弗炉中,在氧气氛围下于400-600℃原位高温退火处理60-300分钟,随后自然冷却到室温,形成具有三维光子晶体结构的TiO2纳米颗粒或ZnO纳米颗粒。
2.根据权利要求1所述的制备方法,其特征在于:
步骤1中氩气和氧气的流量比为(5-60):1。
3.根据权利要求1所述的制备方法,其特征在于:
步骤1中所述生物模板为蝴蝶翅膀。
4.根据权利要求1所述的制备方法,其特征在于:
步骤2中马弗炉升温速率为0.5-5℃/分钟。
5.根据权利要求1所述的制备方法,其特征在于:
步骤2中TiO2纳米颗粒或ZnO纳米颗粒的尺寸为60-80μm。
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JP2005222782A (ja) * | 2004-02-04 | 2005-08-18 | Bridgestone Corp | 多孔質薄膜の形成方法、並びに色素増感型太陽電池及び多孔質薄膜光触媒 |
CN101944439A (zh) * | 2009-07-09 | 2011-01-12 | 中国科学院大连化学物理研究所 | 用于染料敏化太阳能电池的TiO2纳米棒阵列的制法 |
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