CN105618418A

CN105618418A - Full-automatic solar silicon wafer cleaning machine

Info

Publication number: CN105618418A
Application number: CN201410600370.9A
Authority: CN
Inventors: 王耀斌
Original assignee: Shaanxi Shengmai Petroleum Co Ltd
Current assignee: Shaanxi Shengmai Petroleum Co Ltd
Priority date: 2014-10-31
Filing date: 2014-10-31
Publication date: 2016-06-01

Abstract

The invention relates to the technical field of photovoltaic manufacturing process equipment, in particular to a full-automatic solar silicon wafer cleaning machine. The full-automatic solar silicon wafer cleaning machine is composed of a rack, a cantilever mechanical arm, a feeding table, an ultrasonic cleaning tank, a throwing mechanism, a slow lifting mechanism, a drying system, an exhausting system, a temperature control system and an electric control system. In order to guarantee that clean silicon wafers are obtained, aqueous alkali is adopted for cleaning, in addition, the cleaning processes of soaking, ultrasonic cleaning, throwing, bubbling and the like are added to the cleaning equipment, and therefore the cleaning quality and reliability of the silicon wafers are improved, and the cleaning yield of the silicon wafers is guaranteed. The advanced automatic control system is adopted, the existing process requirements of clients can be met, and different kinds of process configuration can be carried out according to the needs of users.

Description

A kind of full automatic solar silicon wafer cleaner

Technical field

The present invention relates to photovoltaic manufacturing process equipment technical field, be specifically related to full automatic solar silicon wafer cleaner.

Background technology

Full automatic solar silicon wafer cleaner operation principle is that silicon chip surface is impacted in the mechanical vibration utilizing ultrasonic permeability power strong and the chemical decontamination effect in conjunction with abluent reaches the removing to impurity such as the carborundum of silicon chip surface attachment, silica flour, metal dust, greasy dirt, suspensions, thus obtaining the silicon chip of clean surface. Along with the high speed development of solar energy industry, the continuous progress of cleaning technique, the requirement for solar silicon wafers cleaning equipment also will increase day by day. Progressively become the today of " processing factory of the world " in China, solar energy cleaning equipment will have a wide market. In the production process of industrial products, the pollution level of workpiece will directly influence quality and the performance of product.

Summary of the invention

It is contemplated that propose a kind of full automatic solar silicon wafer cleaner.

Technical program of the present invention lies in:

A kind of full automatic solar silicon wafer cleaner, is made up of frame, cantilever mechanical hand, feeding platform, ultrasonic cleaning tank, throwing mechanism, slow handle system, drying system, exhausting system, temperature control system and electric-control system.

Preferably, the described material used by frame is high-quality rustless steel. The overall material of frame is carbon steel, and is coated with porcelain white PP plate.

Preferably, the outside of described ultrasonic cleaning cell body is coated with heat-preservation cotton, and cell body has relief function simultaneously, adopts the cleaning of adverse current washing.

Or preferably, what described cantilever mechanical hand transverse direction run action adopted is gear, rack structure, and is furnished with the axis of guide; The ball screw arrangement that vertical promotion action adopts, and it is furnished with the axis of guide.

It is highly preferred that described cantilever mechanical hand adopts AC servo motor, the horizontal speed of service 6��8m/min; Vertical promotion speed 3��4m/min, the action that mechanical hand breaks off relations is to be completed by cylinder, and cylinder is with flow speed control valve, it is possible to the speed of adjustment action.

Or preferably, described throwing mechanism is by reducing motor, eccentric, and bearing, support body etc. form.

Or preferably, described drying system adopts inside and outside layer to be stainless-steel sheet, in ask the structure filling heat-preservation cotton; Both sides are also provided with automatically-controlled door, cylinder promote. At baking oven top, hot air apparatus is installed.

Or preferably, described electric-control system adopts PLC.

The method have technical effect that:

The present invention is in order to ensure to obtain the silicon chip of cleaning. except adopting aqueous slkali to clean, cleaning equipment also add the cleanings such as immersion, ultrasonic cleaning, throwing, bubbling. improve cleaning quality and the reliability of silicon chip, it is ensured that the cleaning qualification rate of silicon chip. Adopt advanced automatic control system, the existing technological requirement of client can not only be met, it is also possible to carry out different Process configuration according to the demand of user.

Detailed description of the invention

Wherein, the material used by frame is high-quality rustless steel. The overall material of frame is carbon steel, and is coated with porcelain white PP plate. The outside of cell body is coated with heat-preservation cotton, and cell body has relief function simultaneously, adopts the cleaning of adverse current washing. What cantilever mechanical hand transverse direction run action adopted is gear, rack structure, and is furnished with the axis of guide; The ball screw arrangement that vertical promotion action adopts, and it is furnished with the axis of guide. Cantilever mechanical hand adopts AC servo motor, the horizontal speed of service 6��8m/min; Vertical promotion speed 3��4m/min, the action that mechanical hand breaks off relations is to be completed by cylinder, and cylinder is with flow speed control valve, it is possible to the speed of adjustment action. Throwing mechanism is by reducing motor, eccentric, and bearing, support body etc. form. Drying system adopt inside and outside layer be stainless-steel sheet, in ask fill heat-preservation cotton structure; Both sides are also provided with automatically-controlled door, cylinder promote. At baking oven top, hot air apparatus is installed. Described electric-control system adopts PLC.

Claims

1. a full automatic solar silicon wafer cleaner, it is characterised in that: it is made up of frame, cantilever mechanical hand, feeding platform, ultrasonic cleaning tank, throwing mechanism, slow handle system, drying system, exhausting system, temperature control system and electric-control system.

2. such as claim 1 full automatic solar silicon wafer cleaner, it is characterised in that: the described material used by frame is high-quality rustless steel, and the overall material of frame is carbon steel, and is coated with porcelain white PP plate.

3. such as claim 1 full automatic solar silicon wafer cleaner, it is characterised in that: the outside of described ultrasonic cleaning cell body is coated with heat-preservation cotton, and cell body has relief function simultaneously, adopts the cleaning of adverse current washing.

4. such as claim 1 full automatic solar silicon wafer cleaner, it is characterised in that: what described cantilever mechanical hand transverse direction run action adopted is gear, rack structure, and is furnished with the axis of guide; The ball screw arrangement that vertical promotion action adopts, and it is furnished with the axis of guide.

5. such as claim 4 full automatic solar silicon wafer cleaner, it is characterised in that: described cantilever mechanical hand adopts AC servo motor, the horizontal speed of service 6��8m/min; Vertical promotion speed 3��4m/min, the action that mechanical hand breaks off relations is to be completed by cylinder, and cylinder is with flow speed control valve, it is possible to the speed of adjustment action.

6. such as claim 1 full automatic solar silicon wafer cleaner, it is characterised in that: described throwing mechanism is by reducing motor, eccentric, and bearing, support body etc. form.

7. such as claim 1 full automatic solar silicon wafer cleaner, it is characterised in that: described drying system adopts inside and outside layer to be stainless-steel sheet, in ask the structure filling heat-preservation cotton; Both sides are also provided with automatically-controlled door, cylinder promote, and are provided with hot air apparatus at baking oven top.

8. such as claim 1 full automatic solar silicon wafer cleaner, it is characterised in that: described electric-control system adopts PLC.