CN105607423A - Photosensitive corrosion-resistant nanomaterial and preparation method thereof - Google Patents
Photosensitive corrosion-resistant nanomaterial and preparation method thereof Download PDFInfo
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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Abstract
The invention provides a photosensitive corrosion-resistant nanomaterial and a preparation method thereof. The preparation method comprises the following steps: mixing and stirring tetraethylortho silicate, absolute ethyl alcohol, ammonia water and distilled water, heating the mixture and then dropwise adding tetraethoxysilane to obtain a mixture A; mixing and stirring gamma-chloropropyl trichlorosilane and gamma-aminopropyltriethoxysilane, and dropwise adding glycidyl methacrylate and p-Hydroxyanisole to obtain a mixture B; dripping the mixture B into the mixture A for reaction, adding octadecanamide, citric acid and beta-cyclodextrin for stirring, and then adding propylene glycol methyl ether acetate for rotary evaporation; and mixing and stirring 1-hydroxycyclohexylphenylketone, ethylene glycol dimethacrylate, isopropylthioxanthone and tripropylene glycol diacrylate, mixing all components and finally developing the solution on a copper-clad plate. The photosensitive corrosion-resistant nanomaterial provided by the invention has very high photosensitive parameters, very high photosensitivity, relatively low coefficient of thermal expansion and high thermal stability, and simultaneously has certain corrosion resistance.
Description
Technical field
The present invention relates to Material Field, be specifically related to anticorrosive nano material of a kind of light sensitivity and preparation method thereof.
Background technology
Photosensitive material refers to that photonasty molecule is absorbing after luminous energy, can be in molecule or an intermolecular class functional material that produces chemistry, physical change. In numerous photosensitive materials, comparatively ripe, widely used material mainly contains photo-induced corrosion resistant material and the photic corrosion material etc. that lures, and has been widely used at present many industries, as micro polymer fining-off and printed substrate making etc. But the photo-induced corrosion resistant material using at present also exists many shortcomings, as lower in photonasty, thermal coefficient of expansion is higher and the figure that shifts is accurate not etc. Nano material is a kind of comparatively emerging, is also to develop in recent years material very rapidly, the studied and utilization owing to having the advantages such as unique bulk effect, skin effect and quantum volume. And research and develop by nanometer technology, a kind of photonasty is high, thermal coefficient of expansion is low and anti-corrosion property can be of great significance and value for the development of photoelectricity industry by strong material.
Summary of the invention
The technical problem solving:The object of this invention is to provide the anticorrosive nano material of a kind of light sensitivity, have very high photosensitive parameter, very strong to the sensitiveness of light, thermal coefficient of expansion is lower, and heat endurance is high, has certain corrosion resistance simultaneously.
Technical scheme:The anticorrosive nano material of a kind of light sensitivity, be prepared from weight portion by following composition: 1-Methoxy-2-propyl acetate 1-3 part, GMA 0.2-0.5 part, MEHQ 0.1-0.2 part, stearic amide 0.2-0.5 part, tri (propylene glycol) diacrylate 5-10 part, ethyl orthosilicate 1-2 part, GDMA 10-20 part, tetraethoxysilane 1-2 part, γ-chloropropyl trichloro-silane 1-3 part, gamma-aminopropyl-triethoxy-silane 1-2 part, 1-hydroxy-cyclohexyl phenyl ketone 2-3 part, isopropyl thioxanthone 1-2 part, citric acid 0.1-0.2 part, beta-schardinger dextrin-0.2-0.4 part, absolute ethyl alcohol 20-40 part, ammoniacal liquor 0.1-0.2 part, distilled water 10-20 part.
Further preferred, the described anticorrosive nano material of a kind of light sensitivity, be prepared from weight portion by following composition: 1-Methoxy-2-propyl acetate 1.5-2.5 part, GMA 0.3-0.4 part, MEHQ 0.12-0.18 part, stearic amide 0.3-0.4 part, tri (propylene glycol) diacrylate 6-9 part, ethyl orthosilicate 1.2-1.8 part, GDMA 12-18 part, tetraethoxysilane 1.3-1.9 part, γ-chloropropyl trichloro-silane 1.5-2.5 part, gamma-aminopropyl-triethoxy-silane 1.2-1.8 part, 1-hydroxy-cyclohexyl phenyl ketone 2.2-2.8 part, isopropyl thioxanthone 1.2-1.8 part, citric acid 0.11-0.18 part, beta-schardinger dextrin-0.25-0.35 part, absolute ethyl alcohol 25-35 part, ammoniacal liquor 0.12-0.17 part, distilled water 12-18 part.
The preparation method of the anticorrosive nano material of above-mentioned light sensitivity comprises the following steps:
Step 1: by ethyl orthosilicate, absolute ethyl alcohol, ammoniacal liquor and distilled water mix and blend, drip after being heated to 50-60 DEG C tetraethoxysilane reaction 23-25 hour mixture A;
Step 2: γ-chloropropyl trichloro-silane and gamma-aminopropyl-triethoxy-silane are mixed, and warming while stirring, to 70-80 DEG C, drips GMA and MEHQ, reacts 6-7 hour to obtain mixture B;
Step 3: mixture B is splashed in mixture A to reaction 3-4 hour at temperature 50-60 DEG C;
Step 4: add stearic amide, citric acid and beta-schardinger dextrin-, continue to stir 10-30 minute, then add 1-Methoxy-2-propyl acetate, be rotated evaporation at 30-40 DEG C;
Step 5: 1-hydroxy-cyclohexyl phenyl ketone, GDMA, isopropyl thioxanthone and tri (propylene glycol) diacrylate are mixed, stir 10-30 minute;
Step 6: all components is mixed, at room temperature stir 1-3 hour;
Step 7: solution is printed in copper-clad plate, and preliminary drying 20-40 minute at 70-80 DEG C exposes under 500W uviol lamp, 33 DEG C, 1% sodium carbonate liquor development.
Further preferred, in step 1, temperature is 55 DEG C, and the reaction time is 24 hours.
Further preferred, in step 2, temperature is 75 DEG C, and the reaction time is 6.5 hours.
Further preferred, in step 3, temperature is 55 DEG C, and the reaction time is 3.5 hours.
Further preferred, in step 4, mixing time is 15-25 minute, and temperature is 35 DEG C.
Further preferred, in step 5, mixing time is 15-25 minute.
Further preferred, in step 6, mixing time is 1.5-2.5 hour.
Further preferred, in step 7, preliminary drying temperature is 75 DEG C, and the time is 25-35 minute.
Beneficial effect:The anticorrosive nano material of light sensitivity of the present invention has very high photosensitive parameter, reaches as high as 27.7mJ/cm2, very strong to the sensitiveness of light, thermal coefficient of expansion is lower, is minimumly low to moderate 70.6 μ m/ (m DEG C), and heat endurance is high, has certain corrosion resistance simultaneously.
Detailed description of the invention
Embodiment 1
The anticorrosive nano material of a kind of light sensitivity, be prepared from weight portion by following composition: 1 part of 1-Methoxy-2-propyl acetate, 0.2 part of GMA, 0.1 part of MEHQ, 0.2 part of stearic amide, 5 parts of tri (propylene glycol) diacrylates, 1 part of ethyl orthosilicate, 10 parts of GDMAs, 1 part of tetraethoxysilane, 1 part of γ-chloropropyl trichloro-silane, 1 part of gamma-aminopropyl-triethoxy-silane, 2 parts of 1-hydroxy-cyclohexyl phenyl ketones, 1 part of isopropyl thioxanthone, 0.1 part of citric acid, 0.2 part of beta-schardinger dextrin-, 20 parts of absolute ethyl alcohols, 0.1 part of ammoniacal liquor, 10 parts of distilled water.
The preparation method of the anticorrosive nano material of above-mentioned light sensitivity is: first by ethyl orthosilicate, absolute ethyl alcohol, ammoniacal liquor and distilled water mix and blend, drip after being heated to 50 DEG C tetraethoxysilane reaction 23 hours mixture A; γ-chloropropyl trichloro-silane and gamma-aminopropyl-triethoxy-silane are mixed, warming while stirring to 70 DEG C, drip GMA and MEHQ, react 6 hours to obtain mixture B, then under temperature 50 C, mixture B is splashed in mixture A, react 3 hours, add stearic amide, citric acid and beta-schardinger dextrin-, continue to stir 10 minutes, then add 1-Methoxy-2-propyl acetate, at 30 DEG C, be rotated evaporation; 1-hydroxy-cyclohexyl phenyl ketone, GDMA, isopropyl thioxanthone and tri (propylene glycol) diacrylate are mixed, stir 10 minutes, again all components is mixed, at room temperature stir 1 hour, finally solution is printed in copper-clad plate, at 70 DEG C, preliminary drying 20 minutes exposes under 500W uviol lamp, 33 DEG C, 1% sodium carbonate liquor development.
Embodiment 2
The anticorrosive nano material of a kind of light sensitivity, be prepared from weight portion by following composition: 1.5 parts of 1-Methoxy-2-propyl acetates, 0.3 part of GMA, 0.12 part of MEHQ, 0.3 part of stearic amide, 6 parts of tri (propylene glycol) diacrylates, 1.2 parts of ethyl orthosilicates, 12 parts of GDMAs, 1.3 parts of tetraethoxysilanes, 1.5 parts of γ-chloropropyl trichloro-silanes, 1.2 parts of gamma-aminopropyl-triethoxy-silanes, 2.2 parts of 1-hydroxy-cyclohexyl phenyl ketones, 1.2 parts of isopropyl thioxanthones, 0.11 part of citric acid, 0.25 part of beta-schardinger dextrin-, 25 parts of absolute ethyl alcohols, 0.12 part of ammoniacal liquor, 12 parts of distilled water.
The preparation method of the anticorrosive nano material of above-mentioned light sensitivity is: first by ethyl orthosilicate, absolute ethyl alcohol, ammoniacal liquor and distilled water mix and blend, drip after being heated to 55 DEG C tetraethoxysilane reaction 24 hours mixture A; γ-chloropropyl trichloro-silane and gamma-aminopropyl-triethoxy-silane are mixed, warming while stirring to 75 DEG C, drip GMA and MEHQ, react 6.5 hours to obtain mixture B, then at 55 DEG C of temperature, mixture B is splashed in mixture A, react 3.5 hours, add stearic amide, citric acid and beta-schardinger dextrin-, continue to stir 15 minutes, then add 1-Methoxy-2-propyl acetate, at 35 DEG C, be rotated evaporation; 1-hydroxy-cyclohexyl phenyl ketone, GDMA, isopropyl thioxanthone and tri (propylene glycol) diacrylate are mixed, stir 15 minutes, again all components is mixed, at room temperature stir 1.5 hours, finally solution is printed in copper-clad plate, at 75 DEG C, preliminary drying 25 minutes exposes under 500W uviol lamp, 33 DEG C, 1% sodium carbonate liquor development.
Embodiment 3
The anticorrosive nano material of a kind of light sensitivity, be prepared from weight portion by following composition: 2 parts of 1-Methoxy-2-propyl acetates, 0.35 part of GMA, 0.15 part of MEHQ, 0.35 part of stearic amide, 7.5 parts of tri (propylene glycol) diacrylates, 1.5 parts of ethyl orthosilicates, 15 parts of GDMAs, 1.5 parts of tetraethoxysilanes, 2 parts of γ-chloropropyl trichloro-silanes, 1.5 parts of gamma-aminopropyl-triethoxy-silanes, 2.5 parts of 1-hydroxy-cyclohexyl phenyl ketones, 1.5 parts of isopropyl thioxanthones, 0.15 part of citric acid, 0.3 part of beta-schardinger dextrin-, 30 parts of absolute ethyl alcohols, 0.15 part of ammoniacal liquor, 15 parts of distilled water.
The preparation method of the anticorrosive nano material of above-mentioned light sensitivity is: first by ethyl orthosilicate, absolute ethyl alcohol, ammoniacal liquor and distilled water mix and blend, drip after being heated to 55 DEG C tetraethoxysilane reaction 24 hours mixture A; γ-chloropropyl trichloro-silane and gamma-aminopropyl-triethoxy-silane are mixed, warming while stirring to 75 DEG C, drip GMA and MEHQ, react 6.5 hours to obtain mixture B, then at 55 DEG C of temperature, mixture B is splashed in mixture A, react 3.5 hours, add stearic amide, citric acid and beta-schardinger dextrin-, continue to stir 20 minutes, then add 1-Methoxy-2-propyl acetate, at 35 DEG C, be rotated evaporation; 1-hydroxy-cyclohexyl phenyl ketone, GDMA, isopropyl thioxanthone and tri (propylene glycol) diacrylate are mixed, stir 20 minutes, again all components is mixed, at room temperature stir 2 hours, finally solution is printed in copper-clad plate, at 75 DEG C, preliminary drying 30 minutes exposes under 500W uviol lamp, 33 DEG C, 1% sodium carbonate liquor development.
Embodiment 4
The anticorrosive nano material of a kind of light sensitivity, be prepared from weight portion by following composition: 2.5 parts of 1-Methoxy-2-propyl acetates, 0.4 part of GMA, 0.18 part of MEHQ, 0.4 part of stearic amide, 9 parts of tri (propylene glycol) diacrylates, 1.8 parts of ethyl orthosilicates, 18 parts of GDMAs, 1.9 parts of tetraethoxysilanes, 2.5 parts of γ-chloropropyl trichloro-silanes, 1.8 parts of gamma-aminopropyl-triethoxy-silanes, 2.8 parts of 1-hydroxy-cyclohexyl phenyl ketones, 1.8 parts of isopropyl thioxanthones, 0.18 part of citric acid, 0.35 part of beta-schardinger dextrin-, 35 parts of absolute ethyl alcohols, 0.17 part of ammoniacal liquor, 18 parts of distilled water.
The preparation method of the anticorrosive nano material of above-mentioned light sensitivity is: first by ethyl orthosilicate, absolute ethyl alcohol, ammoniacal liquor and distilled water mix and blend, drip after being heated to 55 DEG C tetraethoxysilane reaction 24 hours mixture A; γ-chloropropyl trichloro-silane and gamma-aminopropyl-triethoxy-silane are mixed, warming while stirring to 75 DEG C, drip GMA and MEHQ, react 6.5 hours to obtain mixture B, then at 55 DEG C of temperature, mixture B is splashed in mixture A, react 3.5 hours, add stearic amide, citric acid and beta-schardinger dextrin-, continue to stir 25 minutes, then add 1-Methoxy-2-propyl acetate, at 35 DEG C, be rotated evaporation; 1-hydroxy-cyclohexyl phenyl ketone, GDMA, isopropyl thioxanthone and tri (propylene glycol) diacrylate are mixed, stir 25 minutes, again all components is mixed, at room temperature stir 2.5 hours, finally solution is printed in copper-clad plate, at 75 DEG C, preliminary drying 35 minutes exposes under 500W uviol lamp, 33 DEG C, 1% sodium carbonate liquor development.
Embodiment 5
The anticorrosive nano material of a kind of light sensitivity, be prepared from weight portion by following composition: 3 parts of 1-Methoxy-2-propyl acetates, 0.5 part of GMA, 0.2 part of MEHQ, 0.5 part of stearic amide, 10 parts of tri (propylene glycol) diacrylates, 2 parts of ethyl orthosilicates, 20 parts of GDMAs, 2 parts of tetraethoxysilanes, 3 parts of γ-chloropropyl trichloro-silanes, 2 parts of gamma-aminopropyl-triethoxy-silanes, 3 parts of 1-hydroxy-cyclohexyl phenyl ketones, 2 parts of isopropyl thioxanthones, 0.2 part of citric acid, 0.4 part of beta-schardinger dextrin-, 40 parts of absolute ethyl alcohols, 0.2 part of ammoniacal liquor, 20 parts of distilled water.
The preparation method of the anticorrosive nano material of above-mentioned light sensitivity is: first by ethyl orthosilicate, absolute ethyl alcohol, ammoniacal liquor and distilled water mix and blend, drip after being heated to 60 DEG C tetraethoxysilane reaction 25 hours mixture A; γ-chloropropyl trichloro-silane and gamma-aminopropyl-triethoxy-silane are mixed, warming while stirring to 80 DEG C, drip GMA and MEHQ, react 7 hours to obtain mixture B, then under temperature 60 C, mixture B is splashed in mixture A, react 4 hours, add stearic amide, citric acid and beta-schardinger dextrin-, continue to stir 30 minutes, then add 1-Methoxy-2-propyl acetate, at 40 DEG C, be rotated evaporation; 1-hydroxy-cyclohexyl phenyl ketone, GDMA, isopropyl thioxanthone and tri (propylene glycol) diacrylate are mixed, stir 30 minutes, again all components is mixed, at room temperature stir 3 hours, finally solution is printed in copper-clad plate, at 80 DEG C, preliminary drying 40 minutes exposes under 500W uviol lamp, 33 DEG C, 1% sodium carbonate liquor development.
Comparative example 1
The difference of the present embodiment and embodiment 5 is not contain stearic amide and beta-schardinger dextrin-. Specifically:
The anticorrosive nano material of a kind of light sensitivity, is prepared from weight portion by following composition: 3 parts of 1-Methoxy-2-propyl acetates, 0.5 part of GMA, 0.2 part of MEHQ, 10 parts of tri (propylene glycol) diacrylates, 2 parts of ethyl orthosilicates, 20 parts of GDMAs, 2 parts of tetraethoxysilanes, 3 parts of γ-chloropropyl trichloro-silanes, 2 parts of gamma-aminopropyl-triethoxy-silanes, 3 parts of 1-hydroxy-cyclohexyl phenyl ketones, 2 parts of isopropyl thioxanthones, 0.2 part of citric acid, 40 parts of absolute ethyl alcohols, 0.2 part of ammoniacal liquor, 20 parts of distilled water.
The preparation method of the anticorrosive nano material of above-mentioned light sensitivity is: first by ethyl orthosilicate, absolute ethyl alcohol, ammoniacal liquor and distilled water mix and blend, drip after being heated to 60 DEG C tetraethoxysilane reaction 25 hours mixture A; γ-chloropropyl trichloro-silane and gamma-aminopropyl-triethoxy-silane are mixed, warming while stirring to 80 DEG C, drip GMA and MEHQ, react 7 hours to obtain mixture B, then under temperature 60 C, mixture B is splashed in mixture A, react 4 hours, add citric acid, continue to stir 30 minutes, then add 1-Methoxy-2-propyl acetate, at 40 DEG C, be rotated evaporation; 1-hydroxy-cyclohexyl phenyl ketone, GDMA, isopropyl thioxanthone and tri (propylene glycol) diacrylate are mixed, stir 30 minutes, again all components is mixed, at room temperature stir 3 hours, finally solution is printed in copper-clad plate, at 80 DEG C, preliminary drying 40 minutes exposes under 500W uviol lamp, 33 DEG C, 1% sodium carbonate liquor development.
Comparative example 2
The difference of the present embodiment and embodiment 5 is not contain gamma-aminopropyl-triethoxy-silane, replaces with γ-chloropropyl trichloro-silane. Specifically:
The anticorrosive nano material of a kind of light sensitivity, be prepared from weight portion by following composition: 3 parts of 1-Methoxy-2-propyl acetates, 0.5 part of GMA, 0.2 part of MEHQ, 0.5 part of stearic amide, 10 parts of tri (propylene glycol) diacrylates, 2 parts of ethyl orthosilicates, 20 parts of GDMAs, 2 parts of tetraethoxysilanes, 5 parts of γ-chloropropyl trichloro-silanes, 3 parts of 1-hydroxy-cyclohexyl phenyl ketones, 2 parts of isopropyl thioxanthones, 0.2 part of citric acid, 0.4 part of beta-schardinger dextrin-, 40 parts of absolute ethyl alcohols, 0.2 part of ammoniacal liquor, 20 parts of distilled water.
The preparation method of the anticorrosive nano material of above-mentioned light sensitivity is: first by ethyl orthosilicate, absolute ethyl alcohol, ammoniacal liquor and distilled water mix and blend, drip after being heated to 60 DEG C tetraethoxysilane reaction 25 hours mixture A; γ-chloropropyl trichloro-silane is warming up to 80 DEG C, drip GMA and MEHQ, react 7 hours to obtain mixture B, then under temperature 60 C, mixture B is splashed in mixture A, react 4 hours, add stearic amide, citric acid and beta-schardinger dextrin-, continue to stir 30 minutes, add again 1-Methoxy-2-propyl acetate, at 40 DEG C, be rotated evaporation; 1-hydroxy-cyclohexyl phenyl ketone, GDMA, isopropyl thioxanthone and tri (propylene glycol) diacrylate are mixed, stir 30 minutes, again all components is mixed, at room temperature stir 3 hours, finally solution is printed in copper-clad plate, at 80 DEG C, preliminary drying 40 minutes exposes under 500W uviol lamp, 33 DEG C, 1% sodium carbonate liquor development.
The partial properties index of material of the present invention is as follows, and we can see that the present invention has very high photosensitive parameter, reaches as high as 27.7mJ/cm2, very strong to the sensitiveness of light, thermal coefficient of expansion is lower, is minimumly low to moderate 70.6 μ m/ (m DEG C), and heat endurance is high, has certain corrosion resistance simultaneously.
The partial properties index of the anticorrosive nano material of table 1 light sensitivity
| Name of product | Photosensitive parameter (mJ/cm2） | Thermal coefficient of expansion (μ m/ (m DEG C)) |
| Embodiment 1 | 27.1 | 71.3 |
| Embodiment 2 | 27.3 | 71.1 |
| Embodiment 3 | 27.4 | 70.9 |
| Embodiment 4 | 27.7 | 70.6 |
| Embodiment 5 | 27.6 | 70.8 |
| Comparative example 1 | 23.5 | 76.4 |
| Comparative example 2 | 24.3 | 75.3 |
Claims (10)
1. the anticorrosive nano material of light sensitivity, it is characterized in that: be prepared from weight portion by following composition: 1-Methoxy-2-propyl acetate 1-3 part, GMA 0.2-0.5 part, MEHQ 0.1-0.2 part, stearic amide 0.2-0.5 part, tri (propylene glycol) diacrylate 5-10 part, ethyl orthosilicate 1-2 part, GDMA 10-20 part, tetraethoxysilane 1-2 part, γ-chloropropyl trichloro-silane 1-3 part, gamma-aminopropyl-triethoxy-silane 1-2 part, 1-hydroxy-cyclohexyl phenyl ketone 2-3 part, isopropyl thioxanthone 1-2 part, citric acid 0.1-0.2 part, beta-schardinger dextrin-0.2-0.4 part, absolute ethyl alcohol 20-40 part, ammoniacal liquor 0.1-0.2 part, distilled water 10-20 part.
2. the anticorrosive nano material of a kind of light sensitivity according to claim 1, it is characterized in that: be prepared from weight portion by following composition: 1-Methoxy-2-propyl acetate 1.5-2.5 part, GMA 0.3-0.4 part, MEHQ 0.12-0.18 part, stearic amide 0.3-0.4 part, tri (propylene glycol) diacrylate 6-9 part, ethyl orthosilicate 1.2-1.8 part, GDMA 12-18 part, tetraethoxysilane 1.3-1.9 part, γ-chloropropyl trichloro-silane 1.5-2.5 part, gamma-aminopropyl-triethoxy-silane 1.2-1.8 part, 1-hydroxy-cyclohexyl phenyl ketone 2.2-2.8 part, isopropyl thioxanthone 1.2-1.8 part, citric acid 0.11-0.18 part, beta-schardinger dextrin-0.25-0.35 part, absolute ethyl alcohol 25-35 part, ammoniacal liquor 0.12-0.17 part, distilled water 12-18 part.
3. the preparation method of the anticorrosive nano material of a kind of light sensitivity described in claim 1 to 2 any one, is characterized in that: comprise the following steps:
Step 1: by ethyl orthosilicate, absolute ethyl alcohol, ammoniacal liquor and distilled water mix and blend, drip after being heated to 50-60 DEG C tetraethoxysilane reaction 23-25 hour mixture A;
Step 2: γ-chloropropyl trichloro-silane and gamma-aminopropyl-triethoxy-silane are mixed, and warming while stirring, to 70-80 DEG C, drips GMA and MEHQ, reacts 6-7 hour to obtain mixture B;
Step 3: mixture B is splashed in mixture A to reaction 3-4 hour at temperature 50-60 DEG C;
Step 4: add stearic amide, citric acid and beta-schardinger dextrin-, continue to stir 10-30 minute, then add 1-Methoxy-2-propyl acetate, be rotated evaporation at 30-40 DEG C;
Step 5: 1-hydroxy-cyclohexyl phenyl ketone, GDMA, isopropyl thioxanthone and tri (propylene glycol) diacrylate are mixed, stir 10-30 minute;
Step 6: all components is mixed, at room temperature stir 1-3 hour;
Step 7: solution is printed in copper-clad plate, and preliminary drying 20-40 minute at 70-80 DEG C exposes under 500W uviol lamp, 33 DEG C, 1% sodium carbonate liquor development.
4. the preparation method of the anticorrosive nano material of a kind of light sensitivity according to claim 3, is characterized in that: in described step 1, temperature is 55 DEG C, and the reaction time is 24 hours.
5. the preparation method of the anticorrosive nano material of a kind of light sensitivity according to claim 3, is characterized in that: in described step 2, temperature is 75 DEG C, and the reaction time is 6.5 hours.
6. the preparation method of the anticorrosive nano material of a kind of light sensitivity according to claim 3, is characterized in that: in described step 3, temperature is 55 DEG C, and the reaction time is 3.5 hours.
7. the preparation method of the anticorrosive nano material of a kind of light sensitivity according to claim 3, is characterized in that: in described step 4, mixing time is 15-25 minute, and temperature is 35 DEG C.
8. the preparation method of the anticorrosive nano material of a kind of light sensitivity according to claim 3, is characterized in that: in described step 5, mixing time is 15-25 minute.
9. the preparation method of the anticorrosive nano material of a kind of light sensitivity according to claim 3, is characterized in that: in described step 6, mixing time is 1.5-2.5 hour.
10. the preparation method of the anticorrosive nano material of a kind of light sensitivity according to claim 3, is characterized in that: in described step 7, preliminary drying temperature is 75 DEG C, and the time is 25-35 minute.
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| CN201610162736.8A CN105607423A (en) | 2016-03-22 | 2016-03-22 | Photosensitive corrosion-resistant nanomaterial and preparation method thereof |
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Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102023485A (en) * | 2010-11-12 | 2011-04-20 | 江南大学 | Method for modifying photoresisting materials by photosensitive nano-silica |
| CN103907057A (en) * | 2011-11-01 | 2014-07-02 | Az电子材料美国公司 | Nanocomposite negative photosensitive composition and use thereof |
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- 2016-03-22 CN CN201610162736.8A patent/CN105607423A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102023485A (en) * | 2010-11-12 | 2011-04-20 | 江南大学 | Method for modifying photoresisting materials by photosensitive nano-silica |
| CN103907057A (en) * | 2011-11-01 | 2014-07-02 | Az电子材料美国公司 | Nanocomposite negative photosensitive composition and use thereof |
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Application publication date: 20160525 |