CN105598460A - High-temperature evaporator for manufacturing micro-nanoscale metal powder - Google Patents
High-temperature evaporator for manufacturing micro-nanoscale metal powder Download PDFInfo
- Publication number
- CN105598460A CN105598460A CN201610162116.4A CN201610162116A CN105598460A CN 105598460 A CN105598460 A CN 105598460A CN 201610162116 A CN201610162116 A CN 201610162116A CN 105598460 A CN105598460 A CN 105598460A
- Authority
- CN
- China
- Prior art keywords
- main body
- upper cover
- micro
- air inlet
- temperature evaporator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F9/00—Making metallic powder or suspensions thereof
- B22F9/02—Making metallic powder or suspensions thereof using physical processes
- B22F9/12—Making metallic powder or suspensions thereof using physical processes starting from gaseous material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/05—Metallic powder characterised by the size or surface area of the particles
- B22F1/054—Nanosized particles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Composite Materials (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Plasma Technology (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Abstract
The invention belongs to the technical field of metal powder manufacturing equipment and relates to a high-temperature evaporator for manufacturing micro-nanoscale metal powder. The high-temperature evaporator comprises a main body provided with an opening at the upper end, and an upper cover covering the opening in the upper end of the main body, wherein the middle of the upper cover is concave upwards, the upper cover is provided with an exhaust hole, a plasma gun in the middle, and three or more internal channels or grooves arranged at intervals, an air inlet of each internal channel or groove is open in the lower end face of the upper cover, and an air outlet of each internal channel or groove is open in the inner surface of the upper cover and is lower than the exhaust hole; the lower end face of a nozzle of the plasma gun is flush with the upper end face of the main body or stretches into the portion, under the upper end face, of the main body, a lower opening is formed in the middle of the bottom wall of the main body, and the lower side of the lower opening is blocked by a graphite block; vertically-through air inlet through holes in one-to-one connection with the air inlets in the lower ends of the internal channels or grooves are formed in the side wall of the main body at intervals. The high-temperature evaporator has the advantages that the temperature field and the gas field in the main body are stable, the rate of finished products is high, and the high-temperature evaporator is suitable for manufacturing micro-nanoscale metal powder.
Description
Technical field
The invention belongs to metal dust manufacturing equipment technical field, refer in particular to a kind of for the manufacture of micro/nano level metalThe high-temperature evaporator of powder.
Background technology
Existing metal dust evaporimeter, a kind of method is wherein used plasma gun to produce in containerPlasma transferred arc is heated into solid metallic after metallic vapour, regathers the metal generating in metallic vapourParticle obtains metal dust product, but collecting in the process of metal dust, needs circulation from containerIn air-flow, extract metallic vapour, due to flowing and the reinforced disturbance to gentle of temperature field of circulating current,In container, do not form stable METAL HEATING PROCESS evaporating area and current-carrying gas overcurrent district, cause current-carrying gas overcurrentTemperature field in the air-flow in district is even not, and the temperature temperature high, some region in some region is low, and thisSize is not or not the metallic particles that the metallic vapour of a little different temperatures is formed in follow-up metallic vitellariumAll, and then cause defect rate high, yield rate is low, and production efficiency is low.
Summary of the invention
The object of this invention is to provide a kind of high-temperature evaporator for the manufacture of micro/nano level metal dust.
The object of the present invention is achieved like this:
For the manufacture of the high-temperature evaporator of micro/nano level metal dust, comprise that there is the main body of opening upper end and coversMiddle part in main body upper end open is to the upper cover of fovea superior, above cover be provided with steam vent, placed in the middle arrange etc. fromSub-spray gun and spaced three above internal channel or grooves, the air inlet of each internal channel or groove is openedMouthful be opened on upper interior surface in upper cover lower surface, gas outlet, gas outlet is lower than steam vent, plasma gunThe main body of spout lower surface under flushing or extend main body upper surface with the upper surface of main body in, the end of main bodyOn wall, be provided with between two parties under shed, the graphite block shutoff of the downside of under shed, circumferential interval on the sidewall of main bodyBe provided with air inlet through hole that connect and that dock one by one with the lower end air inlet of internal channel or groove from the bottom to top.
On have the sectional area sum of air inlet through hole lower end air inlet and the cross section, gas outlet of all internal channels or grooveThe ratio of long-pending sum is 1:3～10, the sectional area sum of all air inlet through holes lower end air inlet and the cross section of steam ventLong-pending ratio is 1:2～5.
Above-mentioned upper cover cavity height is 1:1～5, body height and upper cover with the ratio of the internal diameter of main body upper end openThe ratio of inner chamber height is 1:0.3～2.
Above-mentioned main body is made up of the high-temperature-resistant layer of internal layer, middle supporting layer, outer field protective layer, described inHigh-temperature-resistant layer use and aluminium oxide or magnesia or zirconia type oxide ceramic material or the stone of upper cover homogeneityInk material is made, aluminium oxide or magnesia or zirconia material filling for described supporting layer, described protectionLayer makes by indeformable graphite type material under high temperature, and described air inlet through hole is arranged on protective layer gross thicknessOutside vertically arranges partially.
Above-mentioned internal channel or groove are circumferentially distributed in the sector region of upper cover one side 90～180 degree, described inInternal channel or the height of groove be 10～40mm, described steam vent is arranged on the upper cover of sector region offsideOn.
When above-mentioned plasma gun extends in the main body under main body upper surface, under the spout of plasma gunDistance between end face and the upper surface of main body is 0～50mm.
On above-mentioned, cover and be provided with charge door, on charge door, be provided with continuous charging structure, describedly add continuouslyMaterial structure comprises loading hopper, between the discharging opening of loading hopper bottom and charge door, is connected by conduit, describedOn conduit, be at least arranged at intervals with two manual or motor switches.
Between the through-hole inner surface covering on the outer surface of above-mentioned plasma gun and installation plasma gun, establishBe equipped with the airspace of 1～25mm.
Above-mentioned plasma gun is negative pole or anodal connection the with dc source by wire, and described graphite block is logicalCross wire and be connected with the negative or positive electrode of dc source, graphite block, dc source, plasma gun, etc. fromMetal in plasma transferred arc, main body that sub-spray gun produces is or/and metal liquid, graphite block form energisingLoop.
The present invention compared to existing technology outstanding and useful technique effect is:
1, structure of the present invention forms stable METAL HEATING PROCESS evaporating area and current-carrying gas overcurrent district can makeThe gas flow in the evaporation of metal of METAL HEATING PROCESS evaporating area and current-carrying gas overcurrent district is independent of each other or affects veryLittle, gentle of the temperature field in each district is stable, is conducive to the formation of high quality of products.
2, owing to thering is stable gas temperature field in current-carrying gas overcurrent of the present invention district, therefore in main bodyCurrent-carrying gas overcurrent district in gaseous metal be difficult for forming metallic, but at the gold of follow-up temperature stabilizationBelong in particle vitellarium and all form metallic, and grow up into together the gold of designed size (micro/nano level)Belong to powder, yield rate is high.
3, the present invention utilizes the waste-heat of main body wall to enter the gas in main body inner chamber, makes main body inner chamberInterior gas temperature almost remains unchanged, and makes the good stability of product, and yield rate is high.
4, the charge door continuous charging of the present invention by main body be to main body, the METAL HEATING PROCESS evaporating area in main bodyInterior temperature constant, had both been conducive to the generation of same specification gaseous metal, by whole in metallic vitellariumForm after the metallic of designed size high-purity, the high-quality that can make from the continuous collection of collector againMetal dust.
5, the present invention is applicable to the manufacture of micro/nano level metal dust.
Brief description of the drawings
Fig. 1 is structural principle schematic diagram of the present invention (being arranged at intervals with groove upper covering).
Fig. 2 is that the A-A of Fig. 1 is to cutaway view.
Fig. 3 is that the B-B of Fig. 1 is to cutaway view.
Fig. 4 is structural principle schematic diagram of the present invention (being arranged at intervals with internal channel upper covering).
Detailed description of the invention
Below in conjunction with accompanying drawing, with specific embodiment, the invention will be further described, referring to Fig. 1-Fig. 4:
For the manufacture of the high-temperature evaporator of micro/nano level metal dust, comprise that there is main body 18 and the lid of opening upper endMiddle part in main body 18 upper end open, to the upper cover 13 of fovea superior, is provided with steam vent 10, occupies on upper cover 13The plasma gun 11 of middle setting and spaced three above internal channel or grooves 15, each internal channel30 or the air inlet of groove 15 is opened on upper cover 13 lower surfaces, gas outlet is opened on upper cover 13 inner surfaces 31,Gas outlet is lower than steam vent 10, the spout lower surface of plasma gun 11 flush with the upper surface of main body 18 orExtend in the main body 18 under main body 18 upper surfaces, on the diapire of main body 18, be provided with between two parties under shed 25,Graphite block 25 shutoff for the downside of under shed 25, are circumferentially arranged at intervals with from the bottom to top on the sidewall of main body 18The air inlet through hole 22 connecting and dock one by one with the lower end air inlet of internal channel or groove 15.
On have the sectional area S1 sum of air inlet through hole 22 lower end air inlets and going out of all internal channels or groove 15The ratio of gas port sectional area S2 sum is 1:3～10, the sectional area of all air inlet through hole 22 lower end air inlets 23S1 sum is 1:2～5 with the ratio of the sectional area S3 of steam vent 10.
Above-mentioned upper cover 13 inner chamber height h are 1:1～5 with the ratio of the inner diameter D 2 of main body 18 upper end open, main body18 height H are 1:0.3～2 with the ratio of upper cover 13 inner chamber height h.
Above-mentioned main body 18 is by the high-temperature-resistant layer 19 of internal layer, middle supporting layer 20, outer field protective layer 21Make, described high-temperature-resistant layer 19 uses aluminium oxide or magnesia or the zirconia class oxygen with upper cover 13 homogeneitiesCompound ceramic material or graphite material are made, described supporting layer 20 use aluminium oxide or magnesia or zirconia materialMaterial is filled, and under described protective layer 21 use high temperature, indeformable graphite type material is made, described air inlet through holeThe 22 inclined to one side outsides that are arranged on protective layer 21 gross thickness vertically arrange.
Above-mentioned internal channel or groove 15 are circumferentially distributed in the sector region M of upper cover 13 1 side 90～180 degreeIn, the height of described internal channel or groove 15 is 10～40mm, described steam vent 10 is arranged on fan-shapedOn the upper cover 13 of region M offside.
Above-mentioned plasma gun 11 extends main body 18 under main body 18 upper surfaces when interior, plasma gunDistance between 11 spout lower surface and the upper surface 26 of main body 18 is 0～50mm.
On above-mentioned upper cover 13, be provided with charge door 12, on charge door 12, be provided with continuous charging structure, instituteState continuous charging structure and comprise loading hopper, between the discharging opening of loading hopper bottom and charge door 12, connect by conduitConnect, on described conduit, be at least arranged at intervals with two manually or motor switch; When the continuous work of high-temperature evaporatorWhile work, can be from continuous interior reinforced to main body 18 of charge door 12, can be from continuous being made of collectorThe metal dust of micro/nano level, two are manually or the alternation switch of motor switch, can make loading hopperInterior continuous the entering in crucible of granular material, can not make again the temperature in crucible produce fluctuation owing to feeding in raw material,On loading hopper, be provided with reinforced lid, so that the further insulation to the temperature in crucible.
Table in through hole on the upper cover 13 of the outer surface of above-mentioned plasma gun 11 and installation plasma gun 11Between face, be provided with the airspace J of 1～25mm.
Above-mentioned plasma gun 11 is negative pole or anodal connection the with dc source 28 by wire 27, describedGraphite block 25 is connected with the negative or positive electrode of dc source 28 by wire 27, graphite block 25, dc source28, the gold in plasma gun 11, plasma gun 11 produce plasma transferred arc 16, main body 18Belong to or/and metal liquid 32, graphite block 25 form power circuit, so as to the metal in main body 18 or/andMetal liquid 32 heating make it be evaporated to gaseous metal.
Because the spout lower surface of plasma gun 11 and the upper surface 26 of main body 18 flush or extend main body 18In main body 18 under upper surface 26, when plasma gun 11 is worked, make the upper surface 26 of main body 18Below or the liquid level of metal liquid 32 below 17, form stable METAL HEATING PROCESS evaporating area, and air-flow is from allAir inlet through hole 22 lower end air inlets 23 enter, enter through the gas outlet 14 of all internal channels or groove 15Entering upper cover 13 flows out and takes away the gaseous metal evaporating in METAL HEATING PROCESS evaporating area from steam vent 10 again after interiorTo metallic vitellarium, and the liquid level of metal liquid 32 in main body 18 is more than 17 or main body 18 upperEnd face more than 26, the following part of upper cover 13 inner surfaces form current-carrying gas overcurrent district.
For example, due to continuous gaseous metal, air-flow (nitrogen or the argon gas of evaporating in METAL HEATING PROCESS evaporating areaOr the inert gas such as helium) through continuous the evaporating in METAL HEATING PROCESS evaporating area in current-carrying gas overcurrent districtGaseous metal is brought metallic vitellarium into and to metal dust collector, is collected metal dust again, in this process,Gas flow in current-carrying gas overcurrent district do not disturb or less interference METAL HEATING PROCESS evaporating area in plasma sprayRifle 11 is to the antipyretic of metal and evaporate gaseous metal, makes gaseous metal leave current-carrying gas overcurrent with air-flowBehind district, form metallic particles less and of uniform size in metallic vitellarium with the reduction of gas flow temperature,Make the metal dust of high-quality, high-level micro/nano level; Meanwhile, air-flow is logical from all air inletsHole 22, all internal channels or groove 15 enter in the process in upper cover 13, receive main body 18 and upper cover 13The heating of Yu Wen, makes gas temperature almost identical with the temperature in upper cover 13, to the temperature in upper cover 13Variable effect is less, is conducive to gaseous metal with gas flow and at flow velocity and the metastable clipped wire of temperatureMetallic particles less and of uniform size is formed in sub-vitellarium, makes to produce high-quality, high-level metal powderThere has been reliable technical support at end; In addition, from charge door 12 continuous to interior a small amount of the adding continuously of main body 18Material, the influence of temperature change in upper cover 13 is less, is also the temperature stabilization ensureing in upper cover 13, evaporationOne of uniform measure of fineness of gaseous metal, is conducive to the generation of same specification gaseous metal, also becomes and producesHigh-quality, the reliable technical support of high-level metal dust.
Above-described embodiment is only preferred embodiment of the present invention, not limits according to this protection of the present inventionScope, therefore: all equivalences of doing according to structure of the present invention, shape, principle change, and all should containWithin protection scope of the present invention.
Claims (9)
1. for the manufacture of the high-temperature evaporator of micro/nano level metal dust, it is characterized in that: comprise that upper end has outMouthful main body and cover middle part in the main body upper end open upper cover to fovea superior, above cover be provided with steam vent,The placed in the middle plasma gun arranging and spaced three above internal channel or grooves, each internal channel orThe air inlet of groove is opened on upper cover lower surface, gas outlet is opened on upper interior surface, and gas outlet is lower than exhaustHole, the master of the spout lower surface of plasma gun under flushing or extend main body upper surface with the upper surface of main bodyIn body, on the diapire of main body, be provided with between two parties under shed, the graphite block shutoff of the downside of under shed, main bodyOn sidewall, be circumferentially arranged at intervals with that connect from the bottom to top and a pair of with the lower end air inlet one of internal channel or grooveThe air inlet through hole connecing.
2. the high-temperature evaporator for the manufacture of micro/nano level metal dust according to claim 1, its spyLevy and be: the sectional area sum of all air inlet through holes lower end air inlet and the gas outlet of all internal channels or grooveThe ratio of sectional area sum is 1:3～10, the sectional area sum of all air inlet through holes lower end air inlet and steam ventThe ratio of sectional area is 1:2～5.
3. the high-temperature evaporator for the manufacture of micro/nano level metal dust according to claim 1, its spyLevy and be: described upper cover cavity height is 1:1～5 with the ratio of the internal diameter of main body upper end open, body height withThe ratio of upper cover cavity height is 1:0.3～2.
4. the high-temperature evaporator for the manufacture of micro/nano level metal dust according to claim 1, its spyLevy and be: described main body is made up of the high-temperature-resistant layer of internal layer, middle supporting layer, outer field protective layer,Described high-temperature-resistant layer uses aluminium oxide or magnesia or the zirconia type oxide ceramic material with upper cover homogeneityOr graphite material makes, aluminium oxide or magnesia or zirconia material are filled for described supporting layer, describedUnder protective layer used high temperature, indeformable graphite type material is made, and described air inlet through hole is arranged on protective layer total thicknessThe inclined to one side outside of degree vertically arranges.
5. the high-temperature evaporator for the manufacture of micro/nano level metal dust according to claim 1, its spyLevy and be: described internal channel or groove are circumferentially distributed in the sector region of upper cover one side 90～180 degree,Described internal channel or the height of groove be 10～40mm, and described steam vent is arranged on sector region offsideOn cover.
6. the high-temperature evaporator for the manufacture of micro/nano level metal dust according to claim 1, its spyLevy and be: when described plasma gun extends in the main body under main body upper surface, the spray of plasma gunDistance between mouth lower surface and the upper surface of main body is 0～50mm.
7. the high-temperature evaporator for the manufacture of micro/nano level metal dust according to claim 1, its spyLevy and be: on described, cover and be provided with charge door, on charge door, be provided with continuous charging structure, described companyContinuous feeding structure comprises loading hopper, is connected institute between the discharging opening of loading hopper bottom and charge door by conduitOn the conduit of stating, be at least arranged at intervals with two manual or motor switches.
8. the high-temperature evaporator for the manufacture of micro/nano level metal dust according to claim 1, its spyLevy and be: the outer surface of described plasma gun with install plasma gun on the through-hole inner surface that covers itBetween be provided with the airspace of 1～25mm.
9. steam according to the high temperature for the manufacture of micro/nano level metal dust described in claim 1-8 any oneHair device, is characterized in that: described plasma gun is negative pole or anodal connection the with dc source by wire,Described graphite block is connected with the negative or positive electrode of dc source by wire, graphite block, dc source, etc.Metal in plasma transferred arc, main body that ion spray gun, plasma gun produce or/and metal liquid,Graphite block forms power circuit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610162116.4A CN105598460B (en) | 2016-03-21 | 2016-03-21 | For manufacturing the high-temperature evaporator of micro/nano level metal dust |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610162116.4A CN105598460B (en) | 2016-03-21 | 2016-03-21 | For manufacturing the high-temperature evaporator of micro/nano level metal dust |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105598460A true CN105598460A (en) | 2016-05-25 |
| CN105598460B CN105598460B (en) | 2018-03-06 |
Family
ID=55979093
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610162116.4A Active CN105598460B (en) | 2016-03-21 | 2016-03-21 | For manufacturing the high-temperature evaporator of micro/nano level metal dust |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105598460B (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107807065A (en) * | 2017-09-21 | 2018-03-16 | 西北工业大学 | For studying the experimental provision of Al O C system kineticses under the conditions of slag deposition |
| CN109513917A (en) * | 2018-12-18 | 2019-03-26 | 江苏博迁新材料股份有限公司 | A kind of decreasing carbon method of PVD production nickel powder |
| CN109648093A (en) * | 2018-12-18 | 2019-04-19 | 江苏博迁新材料股份有限公司 | A kind of superfine metal nickel powder surface treatment method |
| WO2022148097A1 (en) * | 2021-01-08 | 2022-07-14 | 江苏博迁新材料股份有限公司 | High-temperature evaporator using plasma transfer arc heating |
| WO2022148095A1 (en) * | 2021-01-08 | 2022-07-14 | 江苏博迁新材料股份有限公司 | Conductive crucible high-temperature evaporator heated by plasma transferred arc |
| CN115351286A (en) * | 2022-08-08 | 2022-11-18 | 杭州新川新材料有限公司 | High-temperature evaporation furnace for metal powder production |
| CN115770882A (en) * | 2022-11-02 | 2023-03-10 | 杭州新川新材料有限公司 | Method and device for manufacturing superfine spherical metal powder |
| TWI820579B (en) * | 2021-01-25 | 2023-11-01 | 鐘筆 | High temperature resistant liquid reflux and gas outlet structure for preparing fine powder particles by gas phase method |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1250701A (en) * | 1999-11-18 | 2000-04-19 | 华中理工大学 | Process and equipment for preparing superfine powder by heating and evaporation |
| US6379419B1 (en) * | 1998-08-18 | 2002-04-30 | Noranda Inc. | Method and transferred arc plasma system for production of fine and ultrafine powders |
| CN1382547A (en) * | 2002-02-08 | 2002-12-04 | 宁波广博纳米材料有限公司 | Equipment for preparing nano metal powder |
| CN104302427A (en) * | 2012-04-20 | 2015-01-21 | 昭荣化学工业株式会社 | Method for manufacturing metal powder |
| CN104722764A (en) * | 2015-03-11 | 2015-06-24 | 江永斌 | Cyclically-cooled metal powder evaporation preparation device |
| CN205414418U (en) * | 2016-03-21 | 2016-08-03 | 台州市金博超导纳米材料科技有限公司 | A high temperature evaporimeter for making micro -nano level metal powder |
-
2016
- 2016-03-21 CN CN201610162116.4A patent/CN105598460B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6379419B1 (en) * | 1998-08-18 | 2002-04-30 | Noranda Inc. | Method and transferred arc plasma system for production of fine and ultrafine powders |
| CN1250701A (en) * | 1999-11-18 | 2000-04-19 | 华中理工大学 | Process and equipment for preparing superfine powder by heating and evaporation |
| CN1382547A (en) * | 2002-02-08 | 2002-12-04 | 宁波广博纳米材料有限公司 | Equipment for preparing nano metal powder |
| CN104302427A (en) * | 2012-04-20 | 2015-01-21 | 昭荣化学工业株式会社 | Method for manufacturing metal powder |
| CN104722764A (en) * | 2015-03-11 | 2015-06-24 | 江永斌 | Cyclically-cooled metal powder evaporation preparation device |
| CN205414418U (en) * | 2016-03-21 | 2016-08-03 | 台州市金博超导纳米材料科技有限公司 | A high temperature evaporimeter for making micro -nano level metal powder |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107807065A (en) * | 2017-09-21 | 2018-03-16 | 西北工业大学 | For studying the experimental provision of Al O C system kineticses under the conditions of slag deposition |
| CN107807065B (en) * | 2017-09-21 | 2019-02-01 | 西北工业大学 | For studying the experimental provision of Al-O-C system kinetics under the conditions of slag deposition |
| CN109513917A (en) * | 2018-12-18 | 2019-03-26 | 江苏博迁新材料股份有限公司 | A kind of decreasing carbon method of PVD production nickel powder |
| CN109648093A (en) * | 2018-12-18 | 2019-04-19 | 江苏博迁新材料股份有限公司 | A kind of superfine metal nickel powder surface treatment method |
| WO2022148097A1 (en) * | 2021-01-08 | 2022-07-14 | 江苏博迁新材料股份有限公司 | High-temperature evaporator using plasma transfer arc heating |
| WO2022148095A1 (en) * | 2021-01-08 | 2022-07-14 | 江苏博迁新材料股份有限公司 | Conductive crucible high-temperature evaporator heated by plasma transferred arc |
| TWI820579B (en) * | 2021-01-25 | 2023-11-01 | 鐘筆 | High temperature resistant liquid reflux and gas outlet structure for preparing fine powder particles by gas phase method |
| CN115351286A (en) * | 2022-08-08 | 2022-11-18 | 杭州新川新材料有限公司 | High-temperature evaporation furnace for metal powder production |
| CN115770882A (en) * | 2022-11-02 | 2023-03-10 | 杭州新川新材料有限公司 | Method and device for manufacturing superfine spherical metal powder |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105598460B (en) | 2018-03-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105598460A (en) | High-temperature evaporator for manufacturing micro-nanoscale metal powder | |
| CN104722764B (en) | Cyclically-cooled metal powder evaporation preparation device | |
| CN103436904B (en) | A kind of fused salt electrolysis process is prepared the method for carbide-derived carbon | |
| CN101391306A (en) | Globular titanium micro-powder or ultra-micro powder preparation device and method | |
| CN100357050C (en) | Ventilated forced drainage type nano tungsten powder reducing furnace for industrial use | |
| CN106693853A (en) | Fine particle production apparatus and fine particle production method | |
| CN108217612A (en) | Prepare the method and apparatus of spherical titanium nitride powder | |
| CN101184970A (en) | Cold wall induction nozzle | |
| CN204934612U (en) | A kind of device preparing the superfine sized spherical titanium powder that 3D prints | |
| CN109773200B (en) | A gas atomizing nozzle for preparing active metal powder | |
| CN101618458A (en) | Preparation method of sub-micron zinc powder and preparation device thereof | |
| CN109719303A (en) | A kind of submicron order iron-nickel alloy powder producing method of soft magnetic materials | |
| CN104152734B (en) | Globular tungsten powder prepares the method for tungsten-copper alloy | |
| CN205414418U (en) | A high temperature evaporimeter for making micro -nano level metal powder | |
| CN103979587A (en) | Device and method for preparing nano aluminium oxide powder by adopting argon-oxygen plasma | |
| CN204366045U (en) | A kind of preparation facilities of zinc powder | |
| CN201470881U (en) | Submicron zinc powder preparation plant | |
| CN106334800A (en) | The induction atomization titanium powder preparation equipment of cold crucible bottom injection | |
| CN204035571U (en) | A kind of device preparing metal molybdenum ball-shaped micro powder or Ultramicro-powder | |
| CN207783241U (en) | A kind of tangent line feeding type laminar flow plasma spheroidization device | |
| JP3244493U (en) | Manufacturing equipment for conductive material ultrafine powder | |
| CN207113597U (en) | Vertical gradient continuous sintering machine | |
| CN214486909U (en) | Vertical reaction furnace for preparing silicon monoxide and preparation device | |
| CN106348308B (en) | High-melting metal powder, solid propellant and its with boron powder preparation technique | |
| CN209754020U (en) | Preparation device of spherical tungsten powder |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 318000 1st floor, building 4, No. 888, Donghuan Avenue, Jiaojiang District, Taizhou City, Zhejiang Province Patentee after: Taizhou Jinbo New Material Co.,Ltd. Address before: 318000 1st floor, building 4, No. 888, Donghuan Avenue, Jiaojiang District, Taizhou City, Zhejiang Province Patentee before: TAIZHOU JIN BO SUPER NANOMETER MATERIAL TECHNOLOGY Co.,Ltd. |
|
| CP01 | Change in the name or title of a patent holder |