CN105549325A - Adamantanederivative monomer, colored photoresist, preparation method of colored photoresist and colored optical filter - Google Patents
Adamantanederivative monomer, colored photoresist, preparation method of colored photoresist and colored optical filter Download PDFInfo
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- CN105549325A CN105549325A CN201510937233.9A CN201510937233A CN105549325A CN 105549325 A CN105549325 A CN 105549325A CN 201510937233 A CN201510937233 A CN 201510937233A CN 105549325 A CN105549325 A CN 105549325A
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- monomer
- resist
- colorama resist
- colorama
- adamantane derivative
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
- C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
- C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
- C07C69/54—Acrylic acid esters; Methacrylic acid esters
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- Spectroscopy & Molecular Physics (AREA)
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Abstract
The invention provides an adamantane derivative monomer, a colored photoresist, a preparation method of the colored photoresist and a color optical filter, belonging to the technical field of photoresist. By the adamantane derivative monomer, the resolution of the colored photoresist for a colored layer can be improved, and thus, the demand of people on high definition is met. The adamantane derivative monomer has a structure as the following formula (I) in the specification. The adamantane derivative monomer can be used for a preparation process of the colored photoresist.
Description
Technical field
The present invention relates to photolithographic techniques field, particularly relate to a kind of adamantane derivative monomer, colorama resist and preparation method thereof, colored filter.
Background technology
Colored filter is the key component that liquid crystal display realizes colorize, is also the key component that in liquid crystal display, cost is larger.Colorama resist for the preparation of color layer in colored filter generally includes the compositions such as dispersible pigment dispersion, alkali soluble resin, multiple functional radical monomer, light trigger and solvent.
In above-mentioned colorama resist composition, multiple functional radical monomer mostly is bipentaerythrite five or six esters of acrylic acid multiple functional radical monomer, but due to such multiple functional radical monomer itself, not there is developing performance, and heat resistance is not good enough simultaneously, therefore the resolution of the colorama resist prepared is made also to be affected, thus the size of the live width of chromatic photoresist image and the close reticle image of this live width after having had influence on development step, make the resolution of the colorama resist prepared at present only at about 10-50 μm.
Along with the requirement of people to liquid crystal display display effect is more and more higher, if the demand of people to high definition can be met, then need the resolution of colorama resist to bring up to about 3-7 μm.But how this improves the resolution of colorama resist, this has become the technological difficulties needing solution at present badly.
Diamantane has the structure that four cyclohexane rings are condensed into cage type, it is the compound that a kind of symmetry is high and stable, its derivant is owing to demonstrating special function, such as: the character such as optical characteristics, thermotolerance, once attempted being used in optic disc base board, optical fiber, lens, in addition, also attempt utilizing the acid-sensitive of adamantane derivative, resistance to dry etching, ultraviolet permeability etc., it can be used as photoresist resin raw material to use.Therefore, whether adamantane derivative can be joined to improve the resolution of colorama resist in colorama resist, this important topic that will be those skilled in the art's future studies.
Summary of the invention
The object of the present invention is to provide a kind of adamantane derivative monomer, colorama resist and preparation method thereof, colored filter, the resolution of the colorama resist for color layer can be improved, thus meet the needs of people to high definition.
An aspect of of the present present invention provides a kind of adamantane derivative monomer, has as shown in the formula (I) structure:
Wherein, R
1, R
2, R
3, R
4separately be selected from C1 ~ C10 or hydrogen atom.
Another aspect provides a kind of colorama resist, be made up of the raw material of following component and weight portion:
Dispersible pigment dispersion: 20-40 part;
Light trigger: 0.1-2 part;
Alkali soluble resin: 5-15 part;
Solvent: 40-60 part;
Multiple functional radical monomer: 4-7 part;
Wherein, at least comprise in described multiple functional radical monomer:
Bipentaerythrite five or six acrylic monomers: 2-4 part;
Adamantane derivative monomer as described in technique scheme: 2-3 part.
Another aspect of the invention provides a kind of preparation method of the colorama resist as described in technique scheme, comprises the following steps:
Dispersible pigment dispersion is joined in container;
Under agitation, in container, add alkali soluble resin, polyfunctional monomer, light trigger and solvent successively, and at room temperature continue to stir 6-8 hour, obtain the colorama resist mixed.
Another aspect of the present invention provides a kind of colored filter, comprises the colorama resist as described in technique scheme.
The invention provides a kind of adamantane derivative monomer, due to the phenyl group containing rigidity in adamantane derivative monomer structure and the easy carboxylic group developed, there is the character such as optical characteristics, thermotolerance, acid-sensitive, therefore, can use it in colorama resist, to strengthen the hardness of colorama resist rete; The contrast before and after chromatic photoresist image developing can be improved simultaneously, effectively shorten the hypotenuse length of chromatic photoresist image, make the live width of chromatic photoresist more more have higher resolution close to the image of light shield.
Accompanying drawing explanation
The process flow diagram of the preparation method of the colorama resist that Fig. 1 provides for the embodiment of the present invention;
The schematic diagram of the chromatic photoresist image that Fig. 2 obtains through identical colorama resist processing procedure for the colorama resist utilizing the embodiment of the present invention and comparative example and provide.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, be clearly and completely described the technical scheme in the embodiment of the present invention, obviously, described embodiment is only the present invention's part embodiment, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making the every other embodiment obtained under creative work prerequisite, belong to the scope of protection of the invention.
Embodiments provide a kind of adamantane derivative monomer, have as shown in the formula (I) structure:
Wherein, R
1, R
2, R
3, R
4separately be selected from C1 ~ C10 or hydrogen atom.
From above-mentioned formula (I) structure, adamantane derivative has the structure that four cyclohexane rings are condensed into cage type, is the compound that a kind of symmetry is high and stable, specific in the present embodiment, and R
1, R
2, R
3, R
4can separately be selected from C1 ~ C10 or hydrogen atom.
Embodiments provide a kind of adamantane derivative monomer, due to the phenyl group containing rigidity in adamantane derivative monomer structure and the easy carboxylic group developed, there is the character such as optical characteristics, thermotolerance, acid-sensitive, therefore, can use it in colorama resist, to strengthen the hardness of colorama resist rete; The contrast before and after chromatic photoresist image developing can be improved simultaneously, effectively shorten the hypotenuse length of chromatic photoresist image, make the live width of chromatic photoresist more more have higher resolution close to the image of light shield.
But, by R
1, R
2, R
3, R
4separately be selected from numerous adamantane derivative monomers of C1 ~ C10 or hydrogen atom formation, in an embodiment of the present embodiment, preferred R
1, R
2, R
3, R
4separately be selected from the adamantane derivative monomer that C1 or hydrogen atom are formed, this mainly considers to work as R
1, R
2, R
3, R
4for be made up of multiple carbon atom alkyl chain time, may be larger sterically hindered and affect the performance of the performance of adamantane derivative monomer itself because existing with the adjacent group in formula (I) structure itself on space structure, therefore, preferably there is less sterically hindered C1 or hydrogen atom.
Wherein, R is worked as
1, R
2, R
3, R
4when selecting hydrogen atom respectively, the adamantane derivative monomer formed is: 1,3,5,7-tetra-(4-acrylic phenyl) diamantane, and its structural formula is such as formula shown in (II):
Further, giving in the present embodiment can the preparation method of 1,3,5,7-tetra-shown by preparation formula (II) (4-acrylic phenyl) diamantane, and is verified preparation-obtained compound nuclear magnetic spectrum, specific as follows:
By 1,3,5,7-tetra-(4-iodophenyl) diamantane (0.008mol), acrylic acid (0.032mol), triethylamine (0.0128mol), PdCl
2(0.0016mol) join in 1000mL flask, at N with DMF (50mL)
2in 160 DEG C of backflows 12 hours under protection.Reaction terminates rear cool to room temperature, filters, is added dropwise to 1mol/L watery hydrochloric acid, so that the pH of filtrate is adjusted to 1, obtains the thick product of faint yellow solid in filtrate; Continue thick product DMF recrystallization, obtain white solid, productive rate is 55%.
Subsequently the nuclear magnetic spectrum of this white solid is resolved, specific as follows:
1hNMR (500MHz, CDCl
3): δ 10.8 (s, 4H), δ 7.86 (m, 8H), δ 7.44 (m, 12H), δ 6.27 (d, 4H), δ 1.54 (s, 12H), thus demonstrate this white solid and be 1,3,5,7-tetra-(4-acrylic phenyl) diamantane.
And work as R
1, R
2, R
3, R
4when selecting C1 respectively, the adamantane derivative monomer formed is: 1,3,5,7-tetra-(4-methacrylic acid group phenyl) diamantane, and its structural formula is such as formula shown in (III):
Further, give also can prepare shown by formula (III) 1,3 in the present embodiment, 5, the preparation method of 7-tetra-(4-methacrylic acid group phenyl) diamantane, and preparation-obtained compound nuclear magnetic spectrum is verified, specific as follows:
By 1,3,5,7-tetra-(4-iodophenyl) diamantane (0.008mol), methacrylic acid (0.032mol), triethylamine (0.0128mol), PdCl
2(0.0016mol) join in 1000mL flask, at N with DMF (50mL)
2in 160 DEG C of backflows 12 hours under protection.Reaction terminates rear cool to room temperature, filters and be added dropwise to 1mol/L watery hydrochloric acid in filtrate, so that the pH of filtrate is adjusted to 1, obtain the thick product of faint yellow solid; Continue thick product DMF recrystallization, obtain white solid, productive rate is 51%.
Subsequently the nuclear magnetic spectrum of this white solid is resolved, specific as follows:
1hNMR (500MHz, CDCl
3): δ 10.7 (s, 4H), δ 7.45 (m, 8H), δ 7.12 (m, 8H), δ 6.15 (m, 4H), δ 2.42 ~ 2.40 (m, 24H), thus demonstrate this white solid and be 1,3,5,7-tetra-(4-methacrylic acid group phenyl) diamantane.
The embodiment of the present invention additionally provides a kind of colorama resist, is made up of the raw material of following component and weight portion:
Dispersible pigment dispersion: 20-40 part;
Light trigger: 0.1-2 part;
Alkali soluble resin: 5-15 part;
Solvent: 40-60 part;
Multiple functional radical monomer: 4-7 part;
Wherein, at least comprise in described multiple functional radical monomer:
Bipentaerythrite five or six acrylic monomers: 2-4 part;
Adamantane derivative monomer as described in above-described embodiment: 2-3 part.
The embodiment of the present invention provides a kind of colorama resist, it is primarily of dispersible pigment dispersion, light trigger, alkali soluble resin, solvent, multiple functional radical monomer composition, wherein in multiple functional radical monomer except containing except bipentaerythrite five or six acrylic monomers, also containing adamantane derivative monomer.
Only bipentaerythrite five or six esters of acrylic acid multiple functional radical monomer is contained, also containing adamantane derivative monomer in the colorama resist in the embodiment of the present application compared in colorama resist of the prior art.Due to the phenyl group containing rigidity in adamantane derivative monomer structure and the easy carboxylic group developed, there is the character such as optical characteristics, thermotolerance, acid-sensitive, therefore, can use it in colorama resist, to strengthen the hardness of colorama resist rete; The contrast before and after chromatic photoresist image developing can be improved simultaneously, effectively shorten the hypotenuse length of chromatic photoresist image, make the live width of chromatic photoresist more more have higher resolution close to the image of light shield.
In the embodiment of above-described embodiment, described dispersible pigment dispersion is selected from least one in red pigment, viridine green, yellow uitramarine, blue pigment, violet pigment and black pigment.Be understandable that, the kind of dispersible pigment dispersion selected in the present embodiment is not limited to above-mentioned cited kind, and those skilled in the art according to the needs of actual production, can select the dispersion liquid of respective color.
In the embodiment of above-described embodiment, described light trigger is selected from least one in acetophenone based compound, benzophenone based compound and diimidazole based compound.Such as, benzil ketals, α, α-Dialkoxy acetophenones, Alpha-hydroxy alkyl phenyl ketone, alpha-aminoalkyl phenyl ketone, benzophenone etc.Be understandable that, the kind of light trigger selected in the present embodiment is not limited to above-mentioned cited kind, and those skilled in the art according to the needs of actual production, can select the light trigger within the scope of mentioned kind.
In the embodiment of above-described embodiment, described alkali soluble resin is selected from least one in acryl resin, acrylic-epoxy resin, acrylic-styrene resin and phenol-phenolics.Be understandable that, the type of above-mentioned cited alkali soluble resin is carboxylic polymkeric substance or multipolymer, therefore its general character is should contain carboxyl in selected resin structure, can interact with multiple functional radical monomer, thus builds the larger colorama resist rete of hardness.Be understandable that, the kind of alkali soluble resin selected in the present embodiment is not limited to above-mentioned cited kind, those skilled in the art can according to the needs of actual production, and selecting can as the polymkeric substance containing carboxyl of light trigger or multipolymer.
In the embodiment of the embodiment of the present invention, described solvent is selected from least one in propanedione methyl ether acetate, propylene-glycol diacetate, 3-ethoxy-3-imines ethyl propionate, 2-heptane, 3-heptane, cyclopentanone and cyclohexanone.Solvent object in the present embodiment is the composition in dissolving or self-dispersible color Photoresisting agent composition, but can not react to each other with mentioned component.Therefore, the kind of solvent selected in the present embodiment is not limited to above-mentioned cited, those skilled in the art can select other solvent according to need of production, as long as can dissolve or composition in self-dispersible color Photoresisting agent composition, and do not react to each other with mentioned component.
As shown in Figure 1, the embodiment of the present invention additionally provides a kind of preparation method of colorama resist, have employed the colorama resist described in above-described embodiment, comprises the following steps:
Step 1: dispersible pigment dispersion is joined in container;
In this step, first join in container by stand-by dispersible pigment dispersion, wherein, the dispersible pigment dispersion added can be one or more stand-by dispersible pigment dispersions.Be understandable that, dispersible pigment dispersion required in often kind of colorama resist number be different, therefore, those skilled in the art can select the dispersible pigment dispersion of approrpiate wts part in above-mentioned scope according to the needs of technique.
Step 2: under agitation, adds alkali soluble resin, polyfunctional monomer, light trigger and solvent successively in container, and at room temperature continues to stir 6-8 hour, obtains the colorama resist mixed.
In this step, under constantly stirring, join in above-mentioned dispersible pigment dispersion by alkali soluble resin, polyfunctional monomer, light trigger and solvent successively, wherein, polyfunctional monomer comprises bipentaerythrite five or six acrylic monomers and adamantane derivative monomer.Be understandable that, those skilled in the art can need according to technique the mentioned component selecting approrpiate wts part.
Be pointed out that, the present embodiment preferably adds mentioned component under lower rotating speed stirs, thus make often kind of added composition all can Homogeneous phase mixing, subsequently after all the components adds, at room temperature, namely, at 20 DEG C-25 DEG C, continue to stir 6-8 hour with lower rotating speed, obtain the colorama resist mixed.Certainly, this mixing time might not need to carry out 6-8 hour, as long as all the components mixes, but in order to ensure the colorama resist mixed completely, mixing time is longer is advisable, and is 6-8 hour under normal circumstances.Be understandable that, when preparing colorama resist, also can add other compositions as required, such as surfactant, levelling agent or other auxiliary agent etc., do not enumerate here.
In the embodiment of above-described embodiment, stir under the rotating speed of 80r/min-200r/min.Stir with lower rotating speed, can ensure that above-mentioned all the components all can mix like this.Be understandable that, those skilled in the art can adjust above-mentioned rotating speed as required, and such as, 100r/min, 120r/min, 140r/min, 160r/min, 180r/min etc., do not enumerate here.
The embodiment of the present invention additionally provides a kind of colored filter, comprises the colorama resist described in above-described embodiment.Owing to adding the polyfunctional monomer comprising adamantane derivative monomer in colorama resist, therefore chromatic photoresist image before development after contrast be improved, effectively can shorten the hypotenuse length of chromatic photoresist image, the live width of chromatic photoresist is made more more to have higher resolution close to the image of light shield, thus improve the performance of the chromatic color filter prepared by it, people are met for the demand of the high definition of liquid crystal display.
Introduce adamantane derivative monomer, colorama resist and preparation method thereof that the embodiment of the present invention provides, colored filter in detail in order to clearer, be described below with reference to specific embodiment.
Embodiment 1
With parts by weight, first the Red Pigment Dispersion liquid of 30 parts is added in bottle, under 80r/min rotating speed stirs, add successively 10 parts of alkali soluble resins, 3 parts of bipentaerythrite five or six acrylic monomerss, 2 part 1,3,5,7-tetra-(4-acrylic phenyl) diamantane, 1 part of light trigger, 1 part of adjuvant, 53 parts of solvents, and continue to stir 6 hours with 80r/min in room temperature, prepare red light resist.
Comparative example 1
With parts by weight, first the Red Pigment Dispersion liquid of 30 parts is added in bottle, under 80r/min rotating speed stirs, add the alkali soluble resin of 10 parts, 5 parts of bipentaerythrite five or six acrylic monomerss, 1 part of light trigger, 1 part of adjuvant, 53 parts of solvents successively, and continue to stir 6 hours with 80r/min in room temperature, prepare red light resist.
Embodiment 2
With parts by weight, first the viridine green dispersion liquid of 15 parts and the Yellow Pigment Dispersion of 10 parts are added in bottle, under 120r/min rotating speed stirs, add successively the alkali soluble resin of 12 parts, 3 parts of bipentaerythrite five or six acrylic monomerss, 2 part 1,3,5,7-tetra-(4-methacrylic acid group phenyl) diamantane, 1 part of light trigger, 1 part of adjuvant, 56 parts of solvents, and continue to stir 7 hours with 120r/min in room temperature, prepare green light resist.
Comparative example 2
With parts by weight, first the viridine green dispersion liquid of 15 parts and the Yellow Pigment Dispersion of 10 parts are added in bottle, under 120r/min rotating speed stirs, add the alkali soluble resin of 12 parts, 5 parts of bipentaerythrite five or six acrylic monomerss, 1 part of light trigger, 1 part of adjuvant, 56 parts of solvents successively, and continue to stir 7 hours with 120r/min in room temperature, prepare green light resist.
Embodiment 3
With parts by weight, first the Blue pigment dispersion liquid of 20 parts is added in bottle, under 100r/min rotating speed stirs, add successively the alkali soluble resin of 15 parts, 4 parts of bipentaerythrite five or six acrylic monomerss, 3 part 1,3,5,7-tetra-(4-acrylic phenyl) diamantane, 1 part of light trigger, 1 part of adjuvant, 56 parts of solvents, and continue to stir 8 hours with 100r/min in room temperature, prepare blue light resist.
Comparative example 3
With parts by weight, first the Blue pigment dispersion liquid of 20 parts is added in bottle, under 100r/min rotating speed stirs, add the alkali soluble resin of 15 parts, 7 parts of bipentaerythrite five or six acrylic monomerss, 1 part of light trigger, 1 part of adjuvant, 56 parts of solvents successively, and continue to stir 8 hours with 100r/min in room temperature, prepare blue light resist.
Performance test
Colorama resist above-described embodiment and comparative example prepared respectively is through identical colorama resist processing procedure, i.e. (1) base-plate cleaning; (2) be coated with; (3) drying under reduced pressure; (4) front baking (100 DEG C × 110 seconds); (5) (50mJ) is exposed; (6) (70 seconds) are developed; (7) toast steps such as (230 DEG C × 30 minutes) afterwards, prepare corresponding chromatic photoresist image, and under microscopic visualization, observations as shown in Figure 2.
As shown in Figure 2, after same color photoresist fabrication process, can find in each photoresistance image obtained, the live width of the chromatic photoresist retained is different, particularly, in the chromatic photoresist image that red light resist prepares, the reservation live width in embodiment 1 is 3 μm, and the reservation live width in comparative example 1 is 20 μm; In the chromatic photoresist image that green light resist prepares, the reservation live width in embodiment 2 is 3 μm, and the reservation live width in comparative example 2 is 20 μm; In the chromatic photoresist image that blue light resist prepares, the reservation live width in embodiment 3 is 3 μm, and the reservation live width in comparative example 3 is 20 μm.
Under normal circumstances, after passing judgment on development, whether chromatic photoresist image has good resolution, observe the reservation live width of chromatic photoresist image, and retain live width thinner, resolution is higher.As shown in Figure 2, the chromatic photoresist image that the colorama resist including adamantane derivative monomer provided by the embodiment of the present invention prepares after development, compare its comparative example, all effectively can shorten the hypotenuse length of chromatic photoresist image, the live width of chromatic photoresist is made more more to have higher resolution close to the image of light shield, simultaneously, this also demonstrates adamantane derivative monomer after adding colorama resist, effectively can improve the resolution of colorama resist, meet the demand of people for high definition.
Obviously, above-described embodiment is only for clearly example being described, and the restriction not to embodiment.For those of ordinary skill in the field, can also make other changes in different forms on the basis of the above description.Here exhaustive without the need to also giving all embodiments.And thus the apparent change of extending out or variation be still in the protection domain of the invention.
Claims (10)
1. an adamantane derivative monomer, is characterized in that, has as shown in the formula (I) structure:
Wherein, R
1, R
2, R
3, R
4separately be selected from C1 ~ C10 or hydrogen atom.
2. adamantane derivative monomer as claimed in claim 1, is characterized in that, R
1, R
2, R
3, R
4separately be selected from C1 or hydrogen atom.
3. a colorama resist, is characterized in that, is made up of the raw material of following component and weight portion:
Dispersible pigment dispersion: 20-40 part;
Light trigger: 0.1-2 part;
Alkali soluble resin: 5-15 part;
Solvent: 40-60 part;
Multiple functional radical monomer: 4-7 part;
Wherein, at least comprise in described multiple functional radical monomer:
Bipentaerythrite five or six acrylic monomers: 2-4 part;
Adamantane derivative monomer as claimed in claim 1 or 2: 2-3 part.
4. colorama resist as claimed in claim 3, it is characterized in that, described dispersible pigment dispersion is selected from least one in red pigment, viridine green, yellow uitramarine, blue pigment, violet pigment and black pigment.
5. colorama resist as claimed in claim 3, it is characterized in that, described light trigger is selected from least one in acetophenone based compound, benzophenone based compound and diimidazole based compound.
6. colorama resist as claimed in claim 3, it is characterized in that, described alkali soluble resin is selected from least one in acryl resin, acrylic-epoxy resin, acrylic-styrene resin and phenol-phenolics.
7. colorama resist as claimed in claim 3, it is characterized in that, described solvent is selected from least one in propanedione methyl ether acetate, propylene-glycol diacetate, 3-ethoxy-3-imines ethyl propionate, 2-heptane, 3-heptane, cyclopentanone and cyclohexanone.
8. a preparation method for the colorama resist as described in any one of claim 3-7, is characterized in that, comprise the following steps:
Dispersible pigment dispersion is joined in container;
Under agitation, in container, add alkali soluble resin, polyfunctional monomer, light trigger and solvent successively, and at room temperature continue to stir 6-8 hour, obtain the colorama resist mixed.
9. the preparation method of colorama resist as claimed in claim 8, is characterized in that, stir under the rotating speed of 80r/min-200r/min.
10. a colored filter, is characterized in that, comprises the colorama resist as described in any one of claim 3-7.
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|---|---|---|---|
| CN201510937233.9A CN105549325A (en) | 2015-12-11 | 2015-12-11 | Adamantanederivative monomer, colored photoresist, preparation method of colored photoresist and colored optical filter |
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| CN201510937233.9A CN105549325A (en) | 2015-12-11 | 2015-12-11 | Adamantanederivative monomer, colored photoresist, preparation method of colored photoresist and colored optical filter |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110950875A (en) * | 2019-11-26 | 2020-04-03 | Tcl华星光电技术有限公司 | Corrole compound monomer, color photoresist composition and color filter |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102503806A (en) * | 2011-10-21 | 2012-06-20 | 西北师范大学 | Method for synthesis of 1,3,5,7-tetra(4-acrylatophenyl)adamantine compound |
| CN103329043A (en) * | 2010-11-19 | 2013-09-25 | 株式会社Lg化学 | Photosensitive composition comprising an acrylate compound |
-
2015
- 2015-12-11 CN CN201510937233.9A patent/CN105549325A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103329043A (en) * | 2010-11-19 | 2013-09-25 | 株式会社Lg化学 | Photosensitive composition comprising an acrylate compound |
| CN102503806A (en) * | 2011-10-21 | 2012-06-20 | 西北师范大学 | Method for synthesis of 1,3,5,7-tetra(4-acrylatophenyl)adamantine compound |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110950875A (en) * | 2019-11-26 | 2020-04-03 | Tcl华星光电技术有限公司 | Corrole compound monomer, color photoresist composition and color filter |
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