CN105463467A - High-accuracy alkalescence stainless steel polishing liquid and preparing method thereof - Google Patents
High-accuracy alkalescence stainless steel polishing liquid and preparing method thereof Download PDFInfo
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- CN105463467A CN105463467A CN201510856379.0A CN201510856379A CN105463467A CN 105463467 A CN105463467 A CN 105463467A CN 201510856379 A CN201510856379 A CN 201510856379A CN 105463467 A CN105463467 A CN 105463467A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/04—Heavy metals
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- Mechanical Treatment Of Semiconductor (AREA)
Abstract
The invention discloses high-accuracy alkalescence stainless steel polishing liquid and a preparing method thereof. The polishing liquid comprises nano-silicon sol, a complexing agent, a surface active agent and water, and the pH value of the polishing liquid ranges from 7 to 11; and the polishing liquid comprises, by weight percent, 5% to 96% of the nano-silicon sol, 0.05% to 2% of the complexing agent, 0.001% to 1% of the surface active agent and the balance water. The solid content of the nano-silicon sol is 40%. The preparing method of the high-accuracy alkalescence stainless steel polishing liquid comprises the steps that the complexing agent is dissolved into the water to be thoroughly dissolved and evenly stirred; the nano-silicon sol is added into a solution obtained the first step to be evenly stirred to make suspension liquid; the surface active agent is added into the suspension liquid to be evenly stirred; and the pH value is adjusted to range from 7 to 11. The pH value is alkalescence, and compared with traditional strong acid polishing liquid, corrosion is weak, the danger to equipment, persons and the environment is small, and the polishing liquid is rapid in cutting rate, high in flattening efficiency and good in surface quality.
Description
Technical field
The present invention relates to precision stainless steel manufacture field, particularly relate to a kind of high-accuracy weakly alkaline brightening solution for stainless steel and preparation method thereof.
Background technology
The traditional finishing method of Vehicles Collected from Market stainless steel mainly contains chemical rightenning, electropolishing, mechanical polishing etc., more or less all there is certain problem in these traditional methods, although chemical rightenning and electropolishing can carry out polishing for various erose stainless steel, but the polishing fluid adopted or electrolytic solution all have strongly-acid, corrodibility is very high, has very large harm for operator and environment; Although and mechanical polishing less pollution, the consumptive materials such as the buffing wax adopted, sand paper dish out come Stainless Steel Watch surface roughness higher, luminance brightness is poor, does not reach the requirement of high precision applications.
Chemically machinery polished is exactly the deficiency for these conventional polishing process, a kind of efficient, the oligosaprobic method of the one of proposition, and has had a well development.But stainless chemical mechanical polishing liquid is main or based on acidity, because in acid condition, stainless chemical reaction more easily carries out, and acid polishing slurry is also more easily prepared.Polishing in the basic conditions, stainless steel because of chemical action insufficient, and easily there is the surface imperfection such as band, orange peel.
Summary of the invention
The technical problem that the present invention mainly solves is to provide a kind of high-accuracy weakly alkaline brightening solution for stainless steel and preparation method thereof, this polishing fluid stock removal rate is fast, graduation efficiency is high, surface quality is good, and pH value is weakly alkaline, compared to traditional strongly-acid polishing fluid, corrodibility is more weak, and the harm for equipment, personnel and environment is all less.
For solving the problems of the technologies described above, the technical scheme that the present invention adopts is: provide a kind of high-accuracy weakly alkaline brightening solution for stainless steel, this polishing fluid comprises Nano silica sol, complexing agent, tensio-active agent and water, pH value is 7 ~ 11, the weight percentage of its each component is: Nano silica sol 5 ~ 96%, complexing agent 0.05 ~ 2%, tensio-active agent 0.001 ~ 1%, water is surplus; Described Nano silica sol solid content is 40%.
In a preferred embodiment of the present invention, the particle diameter of described Nano silica sol is 20 ~ 90nm.
In a preferred embodiment of the present invention, described complexing agent is one or more in diethanolamine, Sunmorl N 60S, Sulfothiorine, sodium polyphosphate, trisodium phosphate, dihydroxyl glycine, hydroxyl sodium EDTA salt.
In a preferred embodiment of the present invention, described tensio-active agent is at least one in alkyl trimethyl quaternary ammonium salt, Tryfac 5573 salt, lipid acid sodium isethionate, dodecyl diethylene glycol ether, N-acyl amino hydrochlorate, alkylphenol polyoxyethylene.
For solving the problems of the technologies described above, another technical solution used in the present invention is: the preparation method providing a kind of high-accuracy weakly alkaline brightening solution for stainless steel, comprises the following steps:
(1) Nano silica sol, complexing agent, tensio-active agent and water is taken according to weight proportion;
(2) complexing agent is soluble in water, thoroughly dissolve, stir;
(3) Nano silica sol is joined in step (2), stir, make suspension;
(4) in suspension, add tensio-active agent, stir all;
(5) adjust ph to 7 ~ 11.
The invention has the beneficial effects as follows: the present invention adopts the mode of adding one or several combinations of suitable complexing agent, makes polishing fluid promote chemical action under alkalescence, improve stock removal rate; Add suitable tensio-active agent and strengthen polishing fluid graduation efficiency, improve hydrodynamic performance, finally can obtain a working (machining) efficiency fast, and very high surface quality; This polishing fluid stock removal rate is fast, and graduation efficiency is high, and surface quality is good, and pH value is weakly alkaline, and compared to traditional strongly-acid polishing fluid, corrodibility is more weak, and the harm for equipment, personnel and environment is all less.
Embodiment
Be clearly and completely described to the technical scheme in the embodiment of the present invention below, obviously, described embodiment is only a part of embodiment of the present invention, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making other embodiments all obtained under creative work prerequisite, belong to the scope of protection of the invention.
Embodiment 1
Prepare six parts of polishing fluids A, B, C, D, E, F:
Nano silica sol is taken according to weight proportion, complexing agent, tensio-active agent and water, 10g diethanolamine is added respectively in 489g water, 10g Sunmorl N 60S, 10g sodium polyphosphate, the mixture of 10g diethanolamine and Sunmorl N 60S, the mixture of 10g diethanolamine and sodium polyphosphate, the mixture of 10g Sunmorl N 60S and sodium polyphosphate, after stirring, respectively adding 500g solid content is 40%, size is the silicon sol of 80nm, stir, respectively add 1g lipid acid sodium isethionate again, sodium hydroxide or nitre acid for adjusting pH is adopted to be 9 after stirring, prepare the polishing fluid A that six parts of solid contents are 20%, B, C, D, E, F.
Preparation a contrast polishing fluid G:
Take Nano silica sol and water according to weight proportion, in 500g water, add 500g solid content is 40%, and size is the silicon sol of 80nm, stirs and adopts sodium hydroxide or nitre acid for adjusting pH to be 9, prepare the polishing fluid G that a solid content is 20%.
By the polishing on LogitechCDP single side polishing machine of obtained sample.Press down: 3psi, lower wall and load plate rotating speed 50RPM, polishing fluid flow velocity: 100mL/min, stainless steel substrates is of a size of 6.5*6.5cm, and polishing pad is black damping cloth polishing pad, and polishing time is 10min.Stock removal rate is measured and is adopted weighting method, namely adopts analytical balance to weigh before and after polishing respectively, and its difference is just stock removal rate.Surface quality detection method is that naked eyes detect under shot-light.This polishing fluid stock removal rate and surface quality are in table 1.
Table 1
As can be seen from table 1 in data, silicon sol does not add any additive, and stock removal rate is low, and surface quality is poor, has obvious orange peel phenomenon.Along with adding of different complexing agent and tensio-active agent, stock removal rate has increase trend, and surface quality has great improvement, and the interpolation of multiple complexing agent can obtain a better effect than single complexing agent.
Embodiment 2
Prepare six parts of polishing fluids A, B, C, D, E, F:
Nano silica sol, complexing agent, tensio-active agent and water is taken according to weight proportion, 499,498.5,494,489,484, add the mixture of 0g, 0.5g, 5g, 10g, 15g, 20g Sunmorl N 60S and sodium polyphosphate in 479g water, stir, respectively adding 500g solid content is 40%, size is the silicon sol of 80nm, 1g lipid acid sodium isethionate is respectively added after stirring, adopt sodium hydroxide or nitre acid for adjusting pH to be 9 after stirring, prepare polishing fluid A, B, C, D, E, F that six parts of solid contents are 20%.
By the polishing on LogitechCDP single side polishing machine of obtained sample.Press down: 3psi, lower wall and load plate rotating speed 50RPM, polishing fluid flow velocity: 100mL/min, stainless steel substrates is of a size of 6.5*6.5cm, and polishing pad is black damping cloth polishing pad, and polishing time is 10min.Stock removal rate is measured and is adopted weighting method, namely adopts analytical balance to weigh before and after polishing respectively, and its difference is just stock removal rate.Surface quality detection method is that naked eyes detect under shot-light.This polishing fluid stock removal rate and surface quality are in table 2.
Table 2
Table 2 data presentation, along with the amount of complexing agent increases gradually, stock removal rate is on the rise, and surface quality promotes to some extent.
Embodiment 3
Prepare five parts of polishing fluids A, B, C, D, E:
Nano silica sol, complexing agent, tensio-active agent and water is taken according to weight proportion, the mixture of 10g Sunmorl N 60S and sodium polyphosphate is respectively added respectively in 490g, 490g, 490g, 489g, 480g water, stir, respectively adding 500g solid content is 40%, size is the silicon sol of 80nm, 0g, 0.01g, 0.1g, 1g, 10g lipid acid sodium isethionate is added respectively after stirring, adopt sodium hydroxide or nitre acid for adjusting pH to be 9 after stirring, prepare polishing fluid A, B, C, D, E that six parts of solid contents are 20%.
By the polishing on LogitechCDP single side polishing machine of obtained sample.Press down: 3psi, lower wall and load plate rotating speed 50RPM, polishing fluid flow velocity: 100mL/min, stainless steel substrates is of a size of 6.5*6.5cm, and polishing pad is black damping cloth polishing pad, and polishing time is 10min.Stock removal rate is measured and is adopted weighting method, namely adopts analytical balance to weigh before and after polishing respectively, and its difference is just stock removal rate.Surface quality detection method is that naked eyes detect under shot-light.This polishing fluid stock removal rate and surface quality are in table 3.
Table 3
Table 3 data presentation, the increase effects on surface of tensio-active agent also has some improvement, but addition too much can cause the reduction of stock removal rate.
Embodiment 4
Prepare five parts of polishing fluids A, B, C, D, E:
Nano silica sol, complexing agent, tensio-active agent and water is taken according to weight proportion, the mixture of 10g Sunmorl N 60S and sodium polyphosphate is respectively added respectively in 939g, 739g, 489g, 239g, 29g water, stir, adding 50g, 250g, 500g, 750g, 960g solid content is respectively 40%, size is the silicon sol of 80nm, 1g lipid acid sodium isethionate is respectively added after stirring, adopt sodium hydroxide or nitre acid for adjusting pH to be 9 after stirring, prepare polishing fluid A, B, C, D, E that six parts of solid contents are 20%.
By the polishing on LogitechCDP single side polishing machine of obtained sample.Press down: 3psi, lower wall and load plate rotating speed 50RPM, polishing fluid flow velocity: 100mL/min, stainless steel substrates is of a size of 6.5*6.5cm, and polishing pad is black damping cloth polishing pad, and polishing time is 10min.Stock removal rate is measured and is adopted weighting method, namely adopts analytical balance to weigh before and after polishing respectively, and its difference is just stock removal rate.Surface quality detection method is that naked eyes detect under shot-light.This polishing fluid stock removal rate and surface quality are in table 4.
Table 4
Table 4 data presentation, the content of silicon sol increases, and can not only significantly improve stock removal rate, and surface quality is also improved.
Polishing fluid of the present invention is uniformly dispersed, stable, whole preparation technology is simple, easy handling, conveniently produces, and production efficiency is high, constant product quality; Adopt compound complex agent, add the method for tensio-active agent, prepare safety, environmental protection, non-corrosive weakly alkaline brightening solution for stainless steel, under one preferably working (machining) efficiency prerequisite, a good surface quality can be obtained.
The foregoing is only embodiments of the invention; not thereby the scope of the claims of the present invention is limited; every utilize description of the present invention to do equivalent structure or equivalent flow process conversion; or be directly or indirectly used in other relevant technical field, be all in like manner included in scope of patent protection of the present invention.
Claims (5)
1. a high-accuracy weakly alkaline brightening solution for stainless steel, it is characterized in that, this polishing fluid comprises Nano silica sol, complexing agent, tensio-active agent and water, pH value is 7 ~ 11, the weight percentage of its each component is: Nano silica sol 5 ~ 96%, complexing agent 0.05 ~ 2%, tensio-active agent 0.001 ~ 1%, water is surplus; Described Nano silica sol solid content is 40%.
2. high-accuracy weakly alkaline brightening solution for stainless steel according to claim 1, is characterized in that, the particle diameter of described Nano silica sol is 20 ~ 90nm.
3. high-accuracy weakly alkaline brightening solution for stainless steel according to claim 1, it is characterized in that, described complexing agent is one or more in diethanolamine, Sunmorl N 60S, Sulfothiorine, sodium polyphosphate, trisodium phosphate, dihydroxyl glycine, hydroxyl sodium EDTA salt.
4. high-accuracy weakly alkaline brightening solution for stainless steel according to claim 1; it is characterized in that, described tensio-active agent is at least one in alkyl trimethyl quaternary ammonium salt, Tryfac 5573 salt, lipid acid sodium isethionate, dodecyl diethylene glycol ether, N-acyl amino hydrochlorate, alkylphenol polyoxyethylene.
5. the preparation method of high-accuracy weakly alkaline brightening solution for stainless steel according to claim 1, is characterized in that, comprise the following steps:
(1) Nano silica sol, complexing agent, tensio-active agent and water is taken according to weight proportion;
(2) complexing agent is soluble in water, thoroughly dissolve, stir;
(3) Nano silica sol is joined in step (2), stir, make suspension;
(4) in suspension, add tensio-active agent, stir all;
(5) adjust ph to 7 ~ 11.
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106011867A (en) * | 2016-07-08 | 2016-10-12 | 哈尔滨飞机工业集团有限责任公司 | Stainless steel polishing solution |
| CN106086897A (en) * | 2016-06-14 | 2016-11-09 | 吴江创源新材料科技有限公司 | A kind of rustless steel light guide plate polishing fluid and its preparation method and application |
| CN106318220A (en) * | 2016-08-18 | 2017-01-11 | 江苏锦阳不锈钢制品有限公司 | Polishing solution for stainless steel surface machining |
| CN106318222A (en) * | 2016-08-18 | 2017-01-11 | 江苏锦阳不锈钢制品有限公司 | Method for preparing high-precision polishing solution |
| CN107418448A (en) * | 2017-08-10 | 2017-12-01 | 深圳市佳欣纳米科技有限公司 | A kind of precision stainless steel polishing fluid |
| WO2019006604A1 (en) * | 2017-07-03 | 2019-01-10 | 深圳市宏昌发科技有限公司 | Polishing agent, stainless steel part and polishing process therefor |
| CN113832466A (en) * | 2021-09-22 | 2021-12-24 | 东莞市四辉表面处理科技有限公司 | Nano water-based silica sol corrosion inhibitor and preparation method and application thereof |
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| CN1849379A (en) * | 2003-07-11 | 2006-10-18 | 格雷斯公司 | Abrasive partilcle for chemical mechanical polishing |
| CN103849875A (en) * | 2012-12-03 | 2014-06-11 | 江苏天恒纳米科技有限公司 | Special nano-material for ultra-precision machining of surface of stainless steel |
| CN104893587A (en) * | 2015-03-09 | 2015-09-09 | 江苏中晶科技有限公司 | Efficient C-oriented sapphire polishing solution and preparation method thereof |
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| CN1849379A (en) * | 2003-07-11 | 2006-10-18 | 格雷斯公司 | Abrasive partilcle for chemical mechanical polishing |
| CN103849875A (en) * | 2012-12-03 | 2014-06-11 | 江苏天恒纳米科技有限公司 | Special nano-material for ultra-precision machining of surface of stainless steel |
| CN104893587A (en) * | 2015-03-09 | 2015-09-09 | 江苏中晶科技有限公司 | Efficient C-oriented sapphire polishing solution and preparation method thereof |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106086897A (en) * | 2016-06-14 | 2016-11-09 | 吴江创源新材料科技有限公司 | A kind of rustless steel light guide plate polishing fluid and its preparation method and application |
| CN106011867A (en) * | 2016-07-08 | 2016-10-12 | 哈尔滨飞机工业集团有限责任公司 | Stainless steel polishing solution |
| CN106318220A (en) * | 2016-08-18 | 2017-01-11 | 江苏锦阳不锈钢制品有限公司 | Polishing solution for stainless steel surface machining |
| CN106318222A (en) * | 2016-08-18 | 2017-01-11 | 江苏锦阳不锈钢制品有限公司 | Method for preparing high-precision polishing solution |
| WO2019006604A1 (en) * | 2017-07-03 | 2019-01-10 | 深圳市宏昌发科技有限公司 | Polishing agent, stainless steel part and polishing process therefor |
| CN107418448A (en) * | 2017-08-10 | 2017-12-01 | 深圳市佳欣纳米科技有限公司 | A kind of precision stainless steel polishing fluid |
| CN113832466A (en) * | 2021-09-22 | 2021-12-24 | 东莞市四辉表面处理科技有限公司 | Nano water-based silica sol corrosion inhibitor and preparation method and application thereof |
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