CN105448371A - 一种静电场加速的高能离子注入机的高压防护及射线屏蔽系统 - Google Patents

一种静电场加速的高能离子注入机的高压防护及射线屏蔽系统 Download PDF

Info

Publication number
CN105448371A
CN105448371A CN201510804022.8A CN201510804022A CN105448371A CN 105448371 A CN105448371 A CN 105448371A CN 201510804022 A CN201510804022 A CN 201510804022A CN 105448371 A CN105448371 A CN 105448371A
Authority
CN
China
Prior art keywords
line
high voltage
machine room
electrostatic
ray shield
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510804022.8A
Other languages
English (en)
Inventor
袁卫华
彭立波
孙雪平
易文杰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CETC 48 Research Institute
Original Assignee
CETC 48 Research Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CETC 48 Research Institute filed Critical CETC 48 Research Institute
Priority to CN201510804022.8A priority Critical patent/CN105448371A/zh
Publication of CN105448371A publication Critical patent/CN105448371A/zh
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21FPROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F3/00Shielding characterised by its physical form, e.g. granules, or shape of the material
    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21FPROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULAR RADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL; DECONTAMINATION ARRANGEMENTS THEREFOR
    • G21F7/00Shielded cells or rooms
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/16Vessels; Containers
    • H01J37/165Means associated with the vessel for preventing the generation of or for shielding unwanted radiation, e.g. X-rays
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002Details
    • H01J37/3007Electron or ion-optical systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Particle Accelerators (AREA)

Abstract

本发明公开了一种静电场加速的高能离子注入机的高压防护及射线屏蔽系统,包括含铅的屏蔽机房,所述屏蔽机房包括依次布置的束流加速预备区、束流静电加速区和束流调整区,所述束流加速预备区内依次设有离子束流、束流离子分析器和束流漂移管道,所述束流静电加速区内设有高压的束流静电加速器,所述束流静电加速器与束流漂移管道连通,所述束流静电加速区、束流加速预备区和束流调整区外周铅板厚度依次减小,而非布置成等厚的结构,在达到射线屏蔽条件下,减轻屏蔽机房的重量,节省成本,当屏蔽机房的高度达到4米或更高时,降低安装风险;本发明的连锁门与为束流静电加速器的高压电源供电的前级供电系统联动,满足可靠的高压安全防护。

Description

一种静电场加速的高能离子注入机的高压防护及射线屏蔽系统
技术领域
本发明涉及集成电路制造装备技术领域,尤其涉及一种静电场加速的高能离子注入机的高压防护及射线屏蔽系统。
背景技术
静电加速的高能离子注入机是粒子加速器的一种,离子在系统中实现加速的同时对外发射对人身和环境产生危害的射线,如χ射线、γ射线等。特别是,当离子处在静电加速通道,一旦有离子轰击到通道表面,产生的大量二次电子则相应的实现反向加速,在二次电子反加速的过程中,会产生比离子高得多的射线。因此,必须采取可靠的射线防护措施,防止系统工作时对周围的工作人员造成伤害,对环境形成污染。
早期,高能离子注入机是高压部件区和射线产生区放置在厚墙灌铅的混凝土房中,将非高压操作区放置在房外,设备调试及防护建造成本高,设备被人为分开调试极不便利;近年来,含铅金属屏蔽机房被引入并在高压区用于隔离防护,对光路产生的有害射线区进行厚铅屏蔽,为了辐射指标达到相关国家标准和国际标准,屏蔽机房内不分区域一律设置等厚度铅板,而铅板密度高,重量重,设备高度达到4米,重块的铅板在设备安装时超重带来极大的物体打击风险,也大大增加设备制造成本。
发明内容
本发明要解决的技术问题是克服现有技术的不足,提供一种高压防护及射线屏蔽性能良好,重量减轻的静电场加速的高能离子注入机的高压防护及射线屏蔽系统。
为解决上述技术问题,本发明采用以下技术方案:
一种静电场加速的高能离子注入机的高压防护及射线屏蔽系统,包括含铅的屏蔽机房,所述屏蔽机房包括依次布置的束流加速预备区、束流静电加速区和束流调整区,所述束流加速预备区内依次设有离子束流、束流离子分析器和束流漂移管道,所述束流静电加速区内设有高压的束流静电加速器,所述束流静电加速器与束流漂移管道连通,所述束流静电加速区、束流加速预备区和束流调整区外周铅板厚度依次减小。
作为上述技术方案的进一步改进:
所述束流静电加速区外周铅板厚度为5~6mm,所述束流加速预备区外周铅板厚度为2.5~3mm,所述束流调整区外周铅板厚度为0.5~1mm。
所述束流静电加速器的高压电源的电压区间是5KV~400KV。
所述屏蔽机房还包括与束流调整区连接的非高压及射线危害区,所述非高压及射线危害区的外周用无铅板制备。
所述屏蔽机房的侧面开设若干由程序控制的连锁门,所述连锁门与为束流静电加速器的高压电源供电的前级供电系统联动,连锁门先检测关门是否关到位,关到位后再通过电控指令上锁锁好门,保证束流静电加速器加载高压安全性。
与现有技术相比,本发明的优点在于:
本发明的静电场加速的高能离子注入机的高压防护及射线屏蔽系统,其束流静电加速区、束流加速预备区和束流调整区外周铅板厚度依次减小,而非布置成等厚的结构,在满足可靠的安全防护及射线屏蔽条件下,减轻屏蔽机房的重量,节省成本,当屏蔽机房的高度达到4米或更高时,降低安装风险。
附图说明
图1是本发明的主视结构示意图。
图2是本发明的俯视结构示意图。
图3是本发明的三维轴测图。
图中各标号表示:
1、屏蔽机房;2、束流加速预备区;21、离子束流;22、束流离子分析器;23、束流漂移管道;3、束流静电加速区;31、束流静电加速器;4、束流调整区;5、非高压及射线危害区;6、连锁门。
具体实施方式
以下结合说明书附图和具体实施例对本发明作进一步详细说明。
图1至图3示出了本发明的一种静电场加速的高能离子注入机的高压防护及射线屏蔽系统的实施例,其包括含铅的屏蔽机房1,屏蔽机房1包括依次布置的束流加速预备区2、束流静电加速区3和束流调整区4,束流加速预备区2内依次设有离子束流21、束流离子分析器22和束流漂移管道23,束流静电加速区3内设有高压的束流静电加速器31,束流静电加速器31与束流漂移管道23连通,束流静电加速区3、束流加速预备区2和束流调整区4外周厚度依次减小。此束流加速预备区2和束流静电加速区3位于屏蔽机房1的高压及射线危害区。与现有技术相比,本发明的静电场加速的高能离子注入机的高压防护及射线屏蔽系统,束流静电加速区3、束流加速预备区2和束流调整区4外周铅板厚度依次减小,而非布置成等厚的结构,在满足可靠的安全防护及射线屏蔽条件下,减轻屏蔽机房1的重量,节省成本,当屏蔽机房1的高度达到4米或更高时,降低安装风险。
本实施例中,束流静电加速区3外周铅板厚度为5~6mm,束流加速预备区2外周铅板厚度为2.5~3mm,束流调整区4外周铅板厚度为0.5~1mm。上述厚度既能满足安全防护及射线屏蔽的要求,又尽量减轻屏蔽机房1的重量,节省成本。
本实施例中,束流静电加速器31的高压电源的电压区间是5KV~400KV。离子束流21通过时,加载的电压越高,生成的静电场越强,对通过其内的离子束流加速越大,反之越小。
本实施例中,屏蔽机房1还包括与束流调整区4连接的非高压及射线危害区5,非高压及射线危害区5的外周用无铅板制备,可减轻屏蔽机房1的重量。
本实施例中,屏蔽机房1的侧面开设若干由程序控制的连锁门6,连锁门6与为束流静电加速器31的高压电源供电的前级供电系统联动。连锁门6先检测关门是否关到位,关到位后再通过电控指令上锁锁好门,保证束流静电加速器31加载高压安全性。具体地,当连锁门6打开时,屏蔽机房1内屏蔽不完善或被破坏,此时,前级供电系统与束流静电加速器31断开,禁止加高压。当连锁门6关闭并上锁锁好门时,屏蔽机房1内屏蔽完好,则前级供电系统为束流静电加速器31供电,开始加高压。
虽然本发明已以较佳实施例揭露如上,然而并非用以限定本发明。任何熟悉本领域的技术人员,在不脱离本发明技术方案范围的情况下,都可利用上述揭示的技术内容对本发明技术方案做出许多可能的变动和修饰,或修改为等同变化的等效实施例。因此,凡是未脱离本发明技术方案的内容,依据本发明技术实质对以上实施例所做的任何简单修改、等同变化及修饰,均应落在本发明技术方案保护的范围内。

Claims (5)

1.一种静电场加速的高能离子注入机的高压防护及射线屏蔽系统,包括含铅的屏蔽机房(1),其特征在于:所述屏蔽机房(1)包括依次布置的束流加速预备区(2)、束流静电加速区(3)和束流调整区(4),所述束流加速预备区(2)内依次设有离子束流(21)、束流离子分析器(22)和束流漂移管道(23),所述束流静电加速区(3)内设有高压的束流静电加速器(31),所述束流静电加速器(31)与束流漂移管道(23)连通,所述束流静电加速区(3)、束流加速预备区(2)和束流调整区(4)外周铅板厚度依次减小。
2.根据权利要求1所述的静电场加速的高能离子注入机的高压防护及射线屏蔽系统,其特征在于:所述束流静电加速区(3)外周铅板厚度为5~6mm,所述束流加速预备区(2)外周铅板厚度为2.5~3mm,所述束流调整区(4)外周铅板厚度为0.5~1mm。
3.根据权利要求2所述的静电场加速的高能离子注入机的高压防护及射线屏蔽系统,其特征在于:所述束流静电加速器(31)的高压电源的电压区间是5KV~400KV。
4.根据权利要求3所述的静电场加速的高能离子注入机的高压防护及射线屏蔽系统,其特征在于:所述屏蔽机房(1)还包括与束流调整区(4)连接的非高压及射线危害区(5),所述非高压及射线危害区(5)的外周用无铅板制备。
5.根据权利要求1至4中任意一项所述的静电场加速的高能离子注入机的高压防护及射线屏蔽系统,其特征在于:所述屏蔽机房(1)的侧面开设若干由程序控制的连锁门(6),所述连锁门(6)与为束流静电加速器(31)的高压电源供电的前级供电系统联动,所述连锁门(6)先检测关门是否关到位,关到位后再通过电控指令上锁锁好门,保证束流静电加速器(31)加载高压安全性。
CN201510804022.8A 2015-11-20 2015-11-20 一种静电场加速的高能离子注入机的高压防护及射线屏蔽系统 Pending CN105448371A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510804022.8A CN105448371A (zh) 2015-11-20 2015-11-20 一种静电场加速的高能离子注入机的高压防护及射线屏蔽系统

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510804022.8A CN105448371A (zh) 2015-11-20 2015-11-20 一种静电场加速的高能离子注入机的高压防护及射线屏蔽系统

Publications (1)

Publication Number Publication Date
CN105448371A true CN105448371A (zh) 2016-03-30

Family

ID=55558465

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510804022.8A Pending CN105448371A (zh) 2015-11-20 2015-11-20 一种静电场加速的高能离子注入机的高压防护及射线屏蔽系统

Country Status (1)

Country Link
CN (1) CN105448371A (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107484322A (zh) * 2017-07-10 2017-12-15 中国原子能科学研究院 一种高压屏蔽仓

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1075341A (zh) * 1992-02-13 1993-08-18 核工业西南物理研究院 立式强流大束斑金属工业离子注入机
US6541781B1 (en) * 2000-07-25 2003-04-01 Axcelis Technologies, Inc. Waveguide for microwave excitation of plasma in an ion beam guide
CN101051609A (zh) * 2006-04-04 2007-10-10 北京中科信电子装备有限公司 用于离子注入机中的高压保护联锁
CN102561819A (zh) * 2010-12-27 2012-07-11 北京中科信电子装备有限公司 一种门联锁控制的方法
CN104051211A (zh) * 2014-06-04 2014-09-17 中国电子科技集团公司第四十八研究所 一种高温高能离子注入机离子光学系统
CN204087828U (zh) * 2014-07-14 2015-01-07 中国核电工程有限公司 一种放射性屏蔽容器
CN104505135A (zh) * 2014-12-18 2015-04-08 清华大学 一种电子直线加速器的屏蔽装置以及屏蔽方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1075341A (zh) * 1992-02-13 1993-08-18 核工业西南物理研究院 立式强流大束斑金属工业离子注入机
US6541781B1 (en) * 2000-07-25 2003-04-01 Axcelis Technologies, Inc. Waveguide for microwave excitation of plasma in an ion beam guide
CN101051609A (zh) * 2006-04-04 2007-10-10 北京中科信电子装备有限公司 用于离子注入机中的高压保护联锁
CN102561819A (zh) * 2010-12-27 2012-07-11 北京中科信电子装备有限公司 一种门联锁控制的方法
CN104051211A (zh) * 2014-06-04 2014-09-17 中国电子科技集团公司第四十八研究所 一种高温高能离子注入机离子光学系统
CN204087828U (zh) * 2014-07-14 2015-01-07 中国核电工程有限公司 一种放射性屏蔽容器
CN104505135A (zh) * 2014-12-18 2015-04-08 清华大学 一种电子直线加速器的屏蔽装置以及屏蔽方法

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
封章林主编: "《工业辐射防护》", 31 March 2015 *
射线装置防护组: "《X线防护基本知识》", 31 December 1990 *
尚世铉等: "《近代物理实验技术2》", 30 June 1993 *
张彦涛主编: "《电离辐射防护与安全实用基础》", 30 September 2015 *
杜喜臣等: "离子加速器和离子注入机建设项目环境影响评价", 《世界核地质科学》 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107484322A (zh) * 2017-07-10 2017-12-15 中国原子能科学研究院 一种高压屏蔽仓
CN107484322B (zh) * 2017-07-10 2023-11-10 中国原子能科学研究院 一种高压屏蔽仓

Similar Documents

Publication Publication Date Title
Assmann et al. The final collimation system for the LHC
Savage et al. The early-time (E1) high-altitude electromagnetic pulse (HEMP) and its impact on the US power grid
KR101804028B1 (ko) 전기 에너지를 급전하기 위한 송전 스테이션 및 이 송전 스테이션을 포함한 풍력 발전 단지
CN105448371A (zh) 一种静电场加速的高能离子注入机的高压防护及射线屏蔽系统
Lechner et al. BLM thresholds for post-LS1 LHC operation: UFOs and orbit bumps in the arcs and straight sections
CN103848577A (zh) 以离子注入强化玻璃的方法
CN205489248U (zh) 一种新型环网用sf6气体绝缘pt柜
KR200191370Y1 (ko) 파라핀 플라스틱 방사선 차폐 블럭
Patecki et al. Conceptual design of an off-momentum collimation system in the CERN Super Proton Synchrotron for High-Luminosity Large Hadron Collider proton beams
Kain et al. The new transfer line collimation system for the LHC high luminosity era
Satou et al. A novel field cage design for the CPS IPM and systematic errors in beam size and emittance
Pigny et al. Mitigation of radiation and EMI effects on the vacuum control system of LHC
Agosteo et al. Preliminary shielding calculations for a 2 GeV superconducting proton linac
Akesson et al. A primary electron beam facility at cern—esps
Yin et al. Synergistic Effect of Temperature and Operating Voltage on Deep Charging of PEEK in the Space Solar Power Station
WO2023042251A1 (ja) 宇宙施設の隔壁構造
Tobiyama Coupled-bunch instabilities and related effects due to electron cloud in SuperKEKB LER
CN207910087U (zh) 一种电缆快速更换装置
Jia et al. Preliminary Discussion on the Spacecraft Electrostatic Discharge and Standards
Fincher et al. Nuclear Inst. and Methods in Physics Research B
Jaglarz et al. Radiation Safety at SOLARIS 1.5 GeV Storage Ring
Bracco et al. Beam injection and dumping systems
Bracco et al. submitter: Chapter 14: Beam injection and dumping systems
Timoshenko et al. Monte-Carlo Simulations for estimation of the radiation environment around the modernized Nuclotron
Fernández et al. Radiological studies during the conditioning of the RF cavity for the ALBA Storage Ring

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20160330