CN105442031A - A cleaning device in an electroplating production line - Google Patents
A cleaning device in an electroplating production line Download PDFInfo
- Publication number
- CN105442031A CN105442031A CN201410422155.4A CN201410422155A CN105442031A CN 105442031 A CN105442031 A CN 105442031A CN 201410422155 A CN201410422155 A CN 201410422155A CN 105442031 A CN105442031 A CN 105442031A
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- China
- Prior art keywords
- roller
- workpiece
- pads
- roller ways
- cleaning device
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Electroplating Methods And Accessories (AREA)
Abstract
A cleaning device in an electroplating production line is disclosed. The cleaning device comprises two parallel supporting plates. Roller ways are mounted between the two supporting plates. A U-shaped spraying pipe is disposed on the top ends of the two supporting plates. Two straight segments of the spraying pipe are respectively disposed on the top ends of the two supporting plates, and are provided with spraying holes. The spraying holes in one of the straight segments are corresponding to the spraying holes in the other straight segment. A protective belt sleeves the roller ways. A plated workpiece on the roller ways can be fully cleaned through the spraying pipe, so that a next process of the workpiece can be performed well. In addition, the protective belt sleeves the roller ways, thus avoiding direct contact between the roller ways and the plated workpiece, and effectively protecting the surface of the plated workpiece.
Description
Technical field
The invention belongs to chromium plating technical field, particularly relate to the washing unit on a kind of electroplating assembly line.
Background technology
At present, continuously plating product line is in electroplating process, and workpiece to be plated mobile out having to pass through afterwards from plating solution is repeatedly cleaned repeatedly, liquid medicine subsidiary on workpiece to be plated or other materials could be cleaned up, so that next procedure is better carried out.For reaching this purpose, the mode of employing spray irrigation more traditionally, certainly the pickling also having other modes such as this A Yong rinse bath to carry out or alkali cleaning, wherein spray irrigation mainly adopts spraying and cleaning apparatus to complete, but in spray process, workpiece to be plated is transferred on roller-way, the roller surfaces forming roller-way is generally metal material, therefore, the surface of workpiece to be plated such as to be often worn at the injury.
Summary of the invention
In order to solve problems of the prior art, the object of this invention is to provide the washing unit on a kind of electroplating assembly line, structure is simple, easy to maintenance, and cleaning performance is good.
In order to realize foregoing invention object, the present invention adopts technical scheme as described below:
Washing unit on a kind of electroplating assembly line, comprise two back up pads be arranged in parallel, between two back up pads, roller-way is installed, top end face in two back up pads is provided with a U-shaped shower, two flat segments of shower lay respectively on the face, fixed end of two back up pads, two flat segments of shower offer spray apertures, and spray apertures in two flat segments is corresponding; Roller-way is arranged with buffer zone.
Further, described buffer zone is quality of rubber materials.
Owing to adopting technique scheme, the present invention has following superiority:
The present invention can be cleaned the workpiece to be plated on roller-way by shower comprehensively; workpiece to be plated is made better to carry out next procedure, in addition, by buffer zone sheathed on roller-way; can to avoid between roller-way with workpiece to be plated direct contacts, and effectively protects workpiece to be plated surface.
Accompanying drawing explanation
Fig. 1 is structural representation of the present invention;
In figure: 1-back up pad; 2-shower; 3-buffer zone; 4-spray apertures; 5-roller-way.
Embodiment
Below in conjunction with drawings and Examples, the present invention will be further described in detail.
As shown in Figure 1, washing unit on a kind of electroplating assembly line, comprise two back up pads 1 be arranged in parallel, between two back up pads 1, roller-way 5 is installed, top end face in two back up pads 1 is provided with a U-shaped shower 2, two flat segments of shower 2 lay respectively on the face, fixed end of two back up pads 1, and two flat segments of shower 2 offer spray apertures 4, and spray apertures 4 in two flat segments is corresponding; Roller-way 5 is arranged with buffer zone 3, and described buffer zone 3 is quality of rubber materials.
The present invention can be cleaned the workpiece to be plated on roller-way by shower comprehensively; workpiece to be plated is made better to carry out next procedure, in addition, by buffer zone sheathed on roller-way; can to avoid between roller-way with workpiece to be plated direct contacts, and effectively protects workpiece to be plated surface.
Claims (2)
1. the washing unit on an electroplating assembly line, it is characterized in that: comprise two back up pads (1) be arranged in parallel, roller-way (5) is installed between two back up pads, top end face in two back up pads is provided with a U-shaped shower (2), two flat segments of shower lay respectively on the face, fixed end of two back up pads, two flat segments of shower offer spray apertures (4), and spray apertures in two flat segments is corresponding; Roller-way is arranged with buffer zone (3).
2. the washing unit on electroplating assembly line according to claim 1, is characterized in that: described buffer zone (3) is quality of rubber materials.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410422155.4A CN105442031A (en) | 2014-08-26 | 2014-08-26 | A cleaning device in an electroplating production line |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201410422155.4A CN105442031A (en) | 2014-08-26 | 2014-08-26 | A cleaning device in an electroplating production line |
Publications (1)
Publication Number | Publication Date |
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CN105442031A true CN105442031A (en) | 2016-03-30 |
Family
ID=55552648
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201410422155.4A Pending CN105442031A (en) | 2014-08-26 | 2014-08-26 | A cleaning device in an electroplating production line |
Country Status (1)
Country | Link |
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CN (1) | CN105442031A (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101260554A (en) * | 2007-12-14 | 2008-09-10 | 华南师范大学 | Metal foil band electroplating system and application thereof |
CN201447509U (en) * | 2009-06-24 | 2010-05-05 | 东莞市中村绝缘材料科技有限公司 | Improved composite shielding material manufacturing equipment |
CN202000010U (en) * | 2011-02-15 | 2011-10-05 | 广西柳州市龙发金属表面处理技术有限公司 | Bright dipping and washing device in automatic membrane passivation production line |
CN102912408A (en) * | 2012-11-12 | 2013-02-06 | 江苏矽研半导体科技有限公司 | Washing unit for plating equipment |
-
2014
- 2014-08-26 CN CN201410422155.4A patent/CN105442031A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101260554A (en) * | 2007-12-14 | 2008-09-10 | 华南师范大学 | Metal foil band electroplating system and application thereof |
CN201447509U (en) * | 2009-06-24 | 2010-05-05 | 东莞市中村绝缘材料科技有限公司 | Improved composite shielding material manufacturing equipment |
CN202000010U (en) * | 2011-02-15 | 2011-10-05 | 广西柳州市龙发金属表面处理技术有限公司 | Bright dipping and washing device in automatic membrane passivation production line |
CN102912408A (en) * | 2012-11-12 | 2013-02-06 | 江苏矽研半导体科技有限公司 | Washing unit for plating equipment |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20160330 |