CN105336558A - Reaction cavity and semiconductor processing equipment - Google Patents
Reaction cavity and semiconductor processing equipment Download PDFInfo
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- CN105336558A CN105336558A CN201410272545.8A CN201410272545A CN105336558A CN 105336558 A CN105336558 A CN 105336558A CN 201410272545 A CN201410272545 A CN 201410272545A CN 105336558 A CN105336558 A CN 105336558A
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- reaction chamber
- top electrode
- electrode mechanism
- keeper
- protuberance
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Abstract
The invention provides a reaction cavity and semiconductor processing equipment. The reaction cavity comprises a top electrode mechanism, a reaction cavity mechanism, and a positioning element. The top electrode mechanism is stacked on the reaction cavity mechanism; and the positioning elements are arranged on the surface where the top electrode mechanism and the reaction cavity mechanism are in contact and are used for realizing positioning of the top electrode mechanism during a cover closing process. The positioning elements that are arranged at outer edges of the surface where the top electrode mechanism and the reaction cavity mechanism are in contact include grooves and protruding parts that cooperate with each other and are arranged at the top electrode mechanism and the reaction cavity mechanism; and with the protruding parts located in the corresponding grooves, positioning of the top electrode mechanism can be realized when the cover is closed. According to the reaction cavity, the difficulty of visual top electrode mechanism adjustment can be reduced, thereby avoiding repeated adjustment and realizing rapid cover closing. Moreover, safety, reliability, and accuracy of the cover closing can be improved.
Description
Technical field
The invention belongs to microelectronic processing technique field, be specifically related to a kind of reaction chamber and semiconductor processing equipment.
Background technology
Semiconductor processing equipment generally includes reaction chamber, in order to complete the techniques such as deposition, etching to workpiece to be machined in reaction chamber.Reaction chamber generally includes top electrode mechanism, reaction chamber mechanism, bottom electrode mechanism and cap-opening mechanism, when carrying out technique, top electrode mechanism, reaction chamber mechanism, bottom electrode mechanism define closed state space, in the state space that this is closed, complete technical process to workpiece to be machined; When safeguarding reaction chamber mechanism, need top electrode mechanism (that is, uncapping) of moving away, so that the parts in-house to reaction chamber carry out wiping or replacing; After maintenance completes, (that is, closing lid) is resetted to top electrode mechanism.
In order to accurate closing lid, need to position top electrode mechanism in closing lid process, particularly, contact on the surface in reaction chamber mechanism with top electrode mechanism, and the inner side of reaction chamber is provided with alignment pin 121, and, on the surface that top electrode mechanism contacts with reaction chamber mechanism, and the position corresponding with alignment pin 121 is provided with pin-and-hole 111, as shown in Figure 1, move downward in top electrode mechanism in the process of carrying out closing lid, need to ensure that alignment pin 121 enters in pin-and-hole 111, realize locating top electrode mechanism, thus realize the location of closing lid process.
But, in actual applications, adopt above-mentioned reaction chamber in the process of closing lid on inevitably there is following problems: because alignment pin 121 is arranged on the position inside the reaction chamber, and due to the restriction in space, the height of alignment pin 121 is lower, is generally about 25mm, this makes to be not easy to visual observations, thus comparatively large by visual adjustment top electrode mechanism difficulty, need to repeat adjustment, thus cause the efficiency of closing lid low; And careless slightly alignment pin 121 will break the parts in top electrode mechanism, thus cause the fail safe of closing lid, reliability and accuracy rate low.
Summary of the invention
The present invention is intended at least to solve one of technical problem existed in prior art, proposes a kind of reaction chamber and semiconductor processing equipment, can be decreased through the difficulty of visual adjustment top electrode mechanism, thus not only can avoid repeating adjustment and realize quick closing lid; But also the fail safe of closing lid, reliability and accuracy can be improved.
For one of solving the problem, the invention provides a kind of reaction chamber, comprise top electrode mechanism, reaction chamber mechanism and keeper, described top electrode mechanism is stacked in described reaction chamber mechanism, described keeper is arranged on the surface that described top electrode mechanism and described reaction chamber mechanism contact, in order to realize when closing lid described top electrode mechanism location, described keeper is arranged on the outer edge on described top electrode mechanism and described reaction chamber mechanism contacts surface, and, described keeper is included in the groove be used in conjunction with each other and protuberance that described top electrode mechanism and reaction chamber mechanism are arranged, described groove corresponding is with it positioned at by described protuberance, in order to realize when closing lid described top electrode mechanism location.
Wherein, described outer edge is formed with turning, described keeper is arranged on the corner location of the outer edge on described top electrode mechanism and described reaction chamber mechanism contacts surface.
Wherein, groove and the protuberance of described keeper include and are connected and are formed with Part I and the Part II at certain turning, described Part I and Part II lay respectively at form described turning two adjacent edges on.
Wherein, the quantity of described keeper is at least two.
Wherein, described outer edge is formed with turning, keeper described at least one is arranged on the corner location of the outer edge on described top electrode mechanism and described reaction chamber mechanism contacts surface.
Wherein, the described top electrode mechanism at described protuberance and its place or described reaction chamber mechanism adopt integrated mode to process.
Wherein, the described top electrode mechanism at described protuberance and its place or described reaction chamber mechanism adopt fixture to fix.
Wherein, described keeper is arranged on the boundary position place of described outer edge.
Wherein, described protuberance comprises alignment pin, and the described groove corresponding with described protuberance comprises pin-and-hole.
As another one technical scheme, the present invention also provides a kind of semiconductor processing equipment, comprises reaction chamber, and described reaction chamber adopts described reaction chamber provided by the invention.
The present invention has following beneficial effect:
Reaction chamber provided by the invention, its keeper is included in the groove be used in conjunction with each other and protuberance that top electrode mechanism and reaction chamber mechanism are arranged, by outer edge keeper being arranged on top electrode mechanism and reaction chamber mechanism contacts surface, visual observations is convenient to when closing lid, protuberance is made to be positioned at groove corresponding with it, to realize locating top electrode mechanism when closing lid, thus can be decreased through the difficulty of visual adjustment top electrode mechanism, thus not only can avoid repeating adjustment and realize quick closing lid; But also the fail safe of closing lid, reliability and accuracy can be improved.
Semiconductor processing equipment provided by the invention, it, by adopting above-mentioned reaction chamber provided by the invention, can be decreased through the difficulty of visual adjustment top electrode mechanism, thus not only can avoid repeating adjustment and realize quick closing lid; But also the fail safe of closing lid, reliability and accuracy can be improved.
Accompanying drawing explanation
Fig. 1 is the partial sectional view between alignment pin and pin-and-hole;
The partial schematic diagram of the reaction chamber mechanism of the reaction chamber that Fig. 2 provides for the embodiment of the present invention;
Fig. 3 is the vertical view of the reaction chamber mechanism shown in Fig. 2;
The partial schematic diagram of the top electrode mechanism of the reaction chamber that Fig. 4 provides for the present embodiment;
Fig. 5 is the upward view of the top electrode mechanism shown in Fig. 4;
The schematic diagram of the first set-up mode of the keeper of the reaction chamber that Fig. 6 provides for the embodiment of the present invention;
Fig. 7 a is keeper at the schematic diagram of the second set-up mode of the outer edge on top electrode mechanism and reaction chamber mechanism contacts surface;
Fig. 7 b is keeper at the schematic diagram of the third set-up mode of the outer edge on top electrode mechanism and reaction chamber mechanism contacts surface;
Fig. 8 is that top electrode mechanism is positioned at the view above reaction chamber mechanism when closing lid;
Fig. 9 is that the decline of top electrode mechanism makes protuberance be positioned at the view of groove corresponding with it when closing lid;
Figure 10 is the stereogram of reaction chamber after closing lid; And
Figure 11 is the partial enlarged drawing of region I in Figure 10..
Embodiment
For making those skilled in the art understand technical scheme of the present invention better, below in conjunction with accompanying drawing, reaction chamber provided by the invention and semiconductor processing equipment are described in detail.
The partial schematic diagram of the reaction chamber mechanism of the reaction chamber that Fig. 2 provides for the embodiment of the present invention.Fig. 3 is the vertical view of the reaction chamber mechanism shown in Fig. 2.The partial schematic diagram of the top electrode mechanism of the reaction chamber that Fig. 4 provides for the present embodiment.Fig. 5 is the upward view of the top electrode mechanism shown in Fig. 4.The schematic diagram of the first set-up mode of the keeper of the reaction chamber that Fig. 6 provides for the embodiment of the present invention.See also Fig. 2-6, the reaction chamber that the present embodiment provides comprises top electrode mechanism 20, reaction chamber mechanism 21 and keeper 22.Wherein, top electrode mechanism 20 is stacked in reaction chamber mechanism 21, and keeper 22 is arranged on the surface that top electrode mechanism 20 and reaction chamber mechanism 21 contact, in order to realize locating top electrode mechanism 20 when closing lid, thus to realize accurate closing lid; As shown in Figure 6, keeper 22 is arranged on the outer edge of top electrode mechanism 20 and reaction chamber mechanism 21 contact surface, so-called outer edge refers to the whole edge of contact surface outside reaction chamber, and, keeper 22 is included in the groove 221 be used in conjunction with each other and protuberance 222 that top electrode mechanism 20 and reaction chamber mechanism 21 are arranged, in the present embodiment, groove 221 is arranged in top electrode mechanism 20, with it with the use of protuberance 222 be arranged on the position corresponding with this groove 221 position of reaction chamber mechanism 21; In actual applications, also groove 221 can be made to be arranged in reaction chamber mechanism 21, with it with the use of protuberance 222 be arranged on the position corresponding with this groove 221 position of top electrode mechanism 20, with it corresponding groove 221 is positioned at, in order to realize locating top electrode mechanism 20 when closing lid by protuberance 222.As from the foregoing, by outer edge keeper 22 being arranged on top electrode mechanism 20 and reaction chamber mechanism 21 contact surface, visual observations is convenient to when closing lid, protuberance 222 is made to be positioned at groove 221 corresponding with it, to realize locating top electrode mechanism when closing lid, thus can be decreased through the difficulty of visual adjustment top electrode mechanism, thus not only can avoid repeating adjustment and realize quick closing lid; But also the fail safe of closing lid, reliability and accuracy can be improved.
Preferably, keeper 22 is arranged on the boundary position place of outer edge, and particularly, as shown in Figures 2 and 3, protuberance 222 is arranged on the boundary position place of the outer edge on the surface contacted with top electrode mechanism 20 of reaction chamber mechanism 21; Accordingly, as shown in Figures 4 and 5, groove 221 be arranged on top electrode mechanism 20 with the boundary position place of the outer edge of the contact surface of reaction chamber mechanism 21, this makes keeper 22 can be directly exposed in the outer side view field of reaction chamber, visual observations of thus can being more convenient for.Certainly, in actual applications, as long as meet the groove 221 of keeper 22 and protuberance 222 is arranged on outer edge, such as, similar with prior art, protuberance 222 comprises alignment pin, and the groove 221 corresponding with protuberance 222 comprises pin-and-hole.
In the present embodiment, refer to Fig. 6, outer edge is formed with turning O, particularly, reaction chamber is rectangular configuration, outer edge being formed with four angles is vertical turning O, and in this case, keeper 22 is arranged on the corner location of the outer edge of top electrode mechanism 20 and reaction chamber mechanism 21 contact surface.Preferably, groove 221 and the protuberance 222 of keeper 22 include and are connected and are formed with Part I and the Part II at certain turning, Part I and Part II lay respectively at form turning O two adjacent edges on.Particularly, as shown in Figures 2 and 3, the groove 221 of keeper 22 comprises and is connected and is formed with the first groove 2211 (that is, Part I) and second groove 2212 (that is, Part II) of the first turning A; As shown in Figure 4 and Figure 5, the protuberance 222 of keeper 22 comprise be connected and the first protuberance 2221 being formed with the second turning B (namely, Part I) and the second protuberance 2222 is (namely, Part II), wherein, first protuberance 2221 is corresponding with the first groove 2211, and the second protuberance 2222 is corresponding with the second groove 2212.Easy understand, groove 221 and protuberance 222 by keeper 22 include and are connected and are formed with Part I and the Part II at certain turning, can realize when closing lid positioning in the two directions top electrode mechanism 20 simultaneously, thus can location efficiency be improved.
In these cases, groove 221 corresponding is with it positioned at for making protuberance 222, to realize positioning top electrode mechanism 20 when closing lid, the parameter of protuberance 222 and groove 221 corresponding with it needs coupling, particularly, first protuberance 2221 and the first groove 2211, second protuberance 2222 needs to mate with the size of the second groove 2212, and the first turning A and the second turning B needs coupling, preferably, first protuberance 2221 and the first groove 2211, the size of the second protuberance 2222 and the second groove 2212 is equal in error allowed band, first turning A is equal in error allowed band with the second turning B, further preferably, first turning A, the turning O that second turning B and outer edge are formed is equal in error allowed band.Certainly, in actual applications, the first turning A, the second turning B and turning O can be unequal, and such as, in the present embodiment, turning O is right angle, and the first turning A and the second turning B can be obtuse angle or acute angle.In addition, in actual applications, as long as the parameter such as such as size, turning etc. of protuberance 222 and groove 221 can realize positioning top electrode mechanism 20.
Stably top electrode mechanism 20 is positioned for realizing when closing lid, the quantity of keeper 22 is at least two, in the present embodiment, as shown in Figure 6, the quantity of keeper is 2, and one of them keeper 22 is arranged on the corner location of the outer edge of top electrode mechanism 20 and reaction chamber mechanism 21 contact surface.Therefore, when the quantity of keeper 22 is at least two, at least one keeper 22 can be made to be arranged on the corner location of the outer edge of top electrode mechanism 20 and reaction chamber mechanism 21 contact surface, such as, as shown in Figure 7a, the quantity of keeper 22 is 2, and each keeper 22 is arranged on corner location, further, the diagonal angle of 2 keepers 2222 is arranged.
Certainly, in actual applications, also all can not be arranged on corner location by each keeper 22, such as, as shown in Figure 7b, the quantity of keeper 22 is 4, and along outer edge circumferential interval and evenly arrange.
In the present embodiment, the top electrode mechanism 20 at protuberance 222 and its place or reaction chamber mechanism 21 adopt integrated mode to process.Certainly, in actual applications, also can the top electrode mechanism 20 at protuberance 222 and its place or reaction chamber mechanism 21 adopt fixture to fix, preferably, fixture comprises screw.
In the present embodiment, the reaction chamber that the present embodiment provides also comprises cap-opening mechanism (not shown), and cap-opening mechanism is used for top electrode mechanism 20 is moved downward, and is stacked in reaction chamber mechanism 21, thus realizes closing lid to realize top electrode mechanism 20.
The course of work adopting the reaction chamber that provides of the embodiment of the present invention how to realize keeper 22 to position top electrode mechanism 20 when closing lid is described in detail below in conjunction with Fig. 8-11.Particularly, comprise the following steps:
Step S1, makes top electrode mechanism 20 be positioned at directly over reaction chamber mechanism 21, as shown in Figure 8;
Step S2, controls cap-opening mechanism, moves downward to make top electrode mechanism 20, in the process that top electrode mechanism 20 moves downward, carry out manual operation by visual observations, make the protuberance 222 in reaction chamber mechanism 21 be positioned at groove 221 in top electrode mechanism 20 exactly, as shown in Figure 9;
Step S3, control cap-opening mechanism, continue top electrode mechanism 20 is moved downward, the position until top electrode mechanism 20 and reaction chamber mechanism 21 contact, completes closing lid, as shown in Figure 10 and Figure 11.
It should be noted that, the above-mentioned course of work reaction chamber that just application the present embodiment provides can realize a kind of concrete closing lid course of work positioned top electrode mechanism 20, but, the present invention is not limited thereto, in actual applications, as long as the reaction chamber can applied the present embodiment and provide realizes the closing lid course of work positioned top electrode mechanism 20.
Also it should be noted that, in the reaction chamber that the present embodiment provides, do not limit the protuberance 222 of keeper 22 and concrete structure, shape, setting position, the quantity of groove 221, as long as the two positions top electrode mechanism 20 when closing lid with the use of realizing.
As another one technical scheme, the present invention also provides a kind of semiconductor processing equipment, and this semiconductor processing equipment comprises reaction chamber, the reaction chamber that this reaction chamber adopts the above embodiment of the present invention to provide.
The semiconductor processing equipment that the present embodiment provides, its reaction chamber adopting the above embodiment of the present invention to provide, can be decreased through the difficulty of visual adjustment top electrode mechanism, thus not only can avoid repeating adjustment and realize quick closing lid; But also the fail safe of closing lid, reliability and accuracy can be improved.
Be understandable that, the illustrative embodiments that above execution mode is only used to principle of the present invention is described and adopts, but the present invention is not limited thereto.For those skilled in the art, without departing from the spirit and substance in the present invention, can make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.
Claims (10)
1. a reaction chamber, comprise top electrode mechanism, reaction chamber mechanism and keeper, described top electrode mechanism is stacked in described reaction chamber mechanism, described keeper is arranged on the surface that described top electrode mechanism and described reaction chamber mechanism contact, in order to realize when closing lid described top electrode mechanism location, it is characterized in that, described keeper is arranged on the outer edge on described top electrode mechanism and described reaction chamber mechanism contacts surface, and, described keeper is included in the groove be used in conjunction with each other and protuberance that described top electrode mechanism and reaction chamber mechanism are arranged, described groove corresponding is with it positioned at by described protuberance, in order to realize when closing lid described top electrode mechanism location.
2. reaction chamber according to claim 1, is characterized in that, described outer edge is formed with turning, and described keeper is arranged on the corner location of the outer edge on described top electrode mechanism and described reaction chamber mechanism contacts surface.
3. reaction chamber according to claim 2, it is characterized in that, groove and the protuberance of described keeper include and are connected and are formed with Part I and the Part II at certain turning, described Part I and Part II lay respectively at form described turning two adjacent edges on.
4. reaction chamber according to claim 1, is characterized in that, the quantity of described keeper is at least two.
5. reaction chamber according to claim 4, is characterized in that, described outer edge is formed with turning, and keeper described at least one is arranged on the corner location of the outer edge on described top electrode mechanism and described reaction chamber mechanism contacts surface.
6. reaction chamber according to claim 1, is characterized in that, described top electrode mechanism or the described reaction chamber mechanism at described protuberance and its place adopt integrated mode to process.
7. reaction chamber according to claim 1, is characterized in that, described top electrode mechanism or the described reaction chamber mechanism at described protuberance and its place adopt fixture to fix.
8. the reaction chamber according to claim 1-7 any one, is characterized in that, described keeper is arranged on the boundary position place of described outer edge.
9. reaction chamber according to claim 1, is characterized in that, described protuberance comprises alignment pin, and the described groove corresponding with described protuberance comprises pin-and-hole.
10. a semiconductor processing equipment, comprises reaction chamber, it is characterized in that, described reaction chamber adopts the reaction chamber described in claim 1-9 any one.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410272545.8A CN105336558A (en) | 2014-06-18 | 2014-06-18 | Reaction cavity and semiconductor processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410272545.8A CN105336558A (en) | 2014-06-18 | 2014-06-18 | Reaction cavity and semiconductor processing equipment |
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| Publication Number | Publication Date |
|---|---|
| CN105336558A true CN105336558A (en) | 2016-02-17 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410272545.8A Pending CN105336558A (en) | 2014-06-18 | 2014-06-18 | Reaction cavity and semiconductor processing equipment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111863655A (en) * | 2019-04-26 | 2020-10-30 | 北京北方华创微电子装备有限公司 | Uncapping mechanism and semiconductor processing equipment |
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| WO2013078003A1 (en) * | 2011-11-21 | 2013-05-30 | Lam Research Corporation | Plasma processing assemblies including hinge assemblies |
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Patent Citations (5)
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|---|---|---|---|---|
| CN2835068Y (en) * | 2005-11-08 | 2006-11-08 | 建德市五星车业有限公司 | Anti-separating vehicular shifting handle bar |
| CN202415928U (en) * | 2011-06-16 | 2012-09-05 | 新杰克缝纫机股份有限公司 | Connection structure for motor shaft and upper shaft of sewing machine |
| WO2013078003A1 (en) * | 2011-11-21 | 2013-05-30 | Lam Research Corporation | Plasma processing assemblies including hinge assemblies |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN111863655A (en) * | 2019-04-26 | 2020-10-30 | 北京北方华创微电子装备有限公司 | Uncapping mechanism and semiconductor processing equipment |
| CN111863655B (en) * | 2019-04-26 | 2024-04-12 | 北京北方华创微电子装备有限公司 | Cover opening mechanism and semiconductor processing equipment |
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Address after: 100176 No. 8 Wenchang Avenue, Beijing economic and Technological Development Zone Applicant after: Beijing North China microelectronics equipment Co Ltd Address before: 100176 Beijing economic and Technological Development Zone, Wenchang Road, No. 8, No. Applicant before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |
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Application publication date: 20160217 |