CN105319838A - Demolding method in nanoimprint technology process - Google Patents

Abstract

<b /><b />The invention discloses a demoulding method in the process of nano-imprinting technology. First, the nano-imprinting adhesive material is coated on the substrate to form an embossing adhesive layer; then the template is pressed into the Embossing adhesive layer; after the embossing adhesive layer is cured and shaped, use an ultrasonic transmitter on the upper part of the template to emit ultrasonic waves to the template to assist the separation of the template and the embossed adhesive layer, remove the template, and complete the demoulding process. Compared with the prior art, the present invention solves the problems of severe deformation, tearing and excessive demoulding force of the formed nano-imprint structure caused by the cohesive force of the template and the adhesive layer during the demoulding process of the nano-imprinting technology. The pattern transfer after embossing is exactly the same as that of photolithography, and the release force is effectively reduced, the success rate of release is greatly improved, and large-scale industrial production becomes possible.

Description

A release method in the process of nanoimprint technology

technical field

The invention relates to a demoulding method in the process of nano-imprint technology, which belongs to the field of micro-nano processing.

Background technique

Nanoimprint technology was first proposed in the mid-1990s by Professor Stephen Y. Chou of the Nanostructure Lab of Princeton University in the United States, aiming at the disadvantage of the traditional photolithography process being limited by the exposure wavelength and unable to obtain a smaller size. Due to its low cost, high resolution, simple process and other advantages, this technology has attracted extensive attention of researchers from all over the world. At present, it has been successfully demonstrated that nanoimprinting technology can obtain feature structures with a minimum size of 5nm. This technology is widely used in optics, electronics, biology and many other fields, and is known as one of the top ten technologies that can change the world.

Nanoimprinting technology can be mainly divided into two types: thermal imprinting and UV curing imprinting. Nano-hot embossing technology usually uses thermoplastic polymers such as polymethyl methacrylate (PMMA) as the material of the imprinting adhesive layer. The polymer is melted and softened by heating, and then an external force load is applied to the template to place it on the template. The pattern of the nanostructure is imprinted on the molten adhesive layer, and after the adhesive layer is cured and shaped, the template is removed. The UV curing imprinting technology uses UV curing prepolymer as the imprinting adhesive material. Because the material has the advantages of good fluidity and low viscosity, it can make the nanometer on the template The structural pattern is embossed on the adhesive layer, and then it is quickly cured and shaped by ultraviolet light irradiation, and finally the template is removed.

In the above two nanoimprinting technologies, in order to separate the template from the adhesive layer, the mold is demolded by applying a tensile load to the template, although the cohesion between the adhesive layer and the template decreases after the finalized adhesive layer is cured. , even if the cohesion is reduced, it is necessary to apply a large pulling force on the template, which can easily cause the nanostructures of the template to separate from the nanostructures of the adhesive layer and cause mutual damage, especially easily causing severe deformation of the formed nanostructures. Tearing directly leads to imprint failure. The current technology usually uses a layer of polymer anti-sticking layer on the surface of the nanostructure pattern of the template to reduce the cohesion and reduce the mutual damage during the demoulding process, but the effect is not ideal, especially it cannot effectively prevent the pressure on the pressed surface. Destruction of printed nanostructures.

Contents of the invention

The purpose of the present invention is to solve the problems of severe deformation, tearing and excessive demoulding force of the formed nano-imprint structure caused by the cohesion between the template and the adhesive layer during the demoulding process of the existing nano-imprint technology. By providing a method of ultrasonically assisted demoulding, a significant improvement in demoulding quality and a reduction in demoulding force can be achieved.

In order to achieve the above object, the present invention adopts the following solution: a demoulding method in the process of nano-imprinting technology, first coating the nano-imprinting adhesive material on the substrate to form an embossing adhesive layer; then pressing the template Insert the embossed adhesive layer; after the embossed adhesive layer is cured and shaped, use an ultrasonic transmitter on the upper part of the template to emit ultrasonic waves to the template to assist the separation of the template and the embossed adhesive layer, remove the template, and complete the demoulding process.

In the above technical solution, the ultrasonic wave emitted by the ultrasonic generating device on the upper part of the template acts on the whole demoulding process.

In the above technical solution, the template is a rigid template made of one of hard materials such as silicon, silicon dioxide, silicon oxide, and metal.

In the above technical solution, the surface of the nanostructure pattern of the rigid template is coated with a polymer anti-sticking layer. Therefore, in the imprinting process, the durability of the template is improved, and the number of times of use of the template is increased.

In the above technical solution, the nano-imprint adhesive material is one of UV-curable nano-imprint adhesive and methyl methacrylate.

In the above technical solution, the nano-imprinting technology includes a combination of a rigid template and a substrate using thermal embossing or UV-curing imprinting.

The working principle of the present invention is: using ultrasonic waves as the physical characteristics of mechanical waves, when ultrasonic waves are applied to the template, due to the large difference in elastic modulus between the rigid template and the flexible embossing adhesive layer, the absorption of ultrasonic waves by the template and the adhesive layer The capabilities are different, so that the ultrasonic wave will have completely different effects on the two materials, which will cause different vibrations between the template and the adhesive layer and cause relative displacement. The relative displacement of the template and the adhesive layer will cause a gap between the template and the adhesive layer. The cohesive force of the film is greatly reduced or becomes zero, and the separation of the template and the adhesive layer can be achieved with a very small release force, and a zero-defect nanostructure pattern can be obtained.

Description of drawings

Fig. 1 is a structural schematic diagram of the demoulding method in the nanoimprinting process of the present invention. Among them (1) ultrasonic emitting device; (2) template; (3) embossed adhesive layer; (4) substrate.

detailed description

The present invention will be further described below in conjunction with the accompanying drawings.

The present invention takes ultrasonic-assisted demoulding in the process of nano hot embossing technology as a specific embodiment.

Referring to Fig. 1 , an ultrasonic-assisted demoulding method in the process of nano-hot embossing technology, the nano-imprint polymer is first coated on the substrate, heated to melt and soften it, and an embossed adhesive layer 3 is formed; then Press the template 2 into the embossed rubber layer 3; after the embossed rubber layer 3 is cured and shaped, use the ultrasonic emission device 1 on the upper part of the template 2 to emit ultrasonic waves to the template 2 to assist the separation of the template 2 and the formed embossed rubber layer 3, Remove template 2 to complete the demoulding process.

The ultrasonic waves emitted by the ultrasonic emitting device 1 on the upper part of the template 2 act on the entire demoulding process.

The template 2 is a rigid template made of silicon dioxide. The surface of the nanostructure pattern of the rigid template is coated with a polymer anti-sticking layer. Therefore, in the imprinting process, the durability of the template is improved, and the number of times of use of the template is increased.

The material of the nano-imprint adhesive layer 3 is methyl methacrylate.

The ultrasonic emitting device 1 and the template 2 are rigidly connected, which can be regarded as an integral body. When a demoulding load is applied on the upper part of the ultrasonic emitting device 1, the template 2 and the ultrasonic emitting device 1 produce the same displacement, and the template 2 breaks away from the pressure. Rubber layer 3.

The above is an embodiment of the present invention, and the present invention can also be applied to nano-imprinting technologies such as UV-curing imprinting that combine a rigid template and a substrate. It should be pointed out that: on the basis of the basic principles of the present invention, various improvements and deformations that can be made by those skilled in the art without creative efforts should be regarded as the protection scope of the present invention.

Claims (6)

1. the release method in nanometer embossing process, is characterized in that: be first coated on substrate by nano impression glue material, forms impression glue-line; Then by template press-in impression glue-line; After curable adhesive layer sizing to be imprinted, utilize ultrasonic transmission device to launch ultrasound wave to template on template top, be separated with the glue-line of imprinting moulding with auxiliary template, remove template, complete knockout course.

2. the release method according to claim 1 in nanometer embossing process, is characterized in that: the ul-trasonic irradiation that described template top ultrasonic generator is launched is in whole knockout course.

3. the release method according to claim 1 in nanometer embossing process, is characterized in that: described template is by a kind of rigid template made in the hard materials such as silicon, silicon dioxide, monox, metal.

4. the release method according to claim 3 in nanometer embossing process, is characterized in that: the nanostructured pattern surface of described rigid template scribbles the anti-glutinous layer of one deck macromolecule.

5. the release method according to claim 1 in nanometer embossing process, is characterized in that: described nano impression glue material is the one in ultraviolet light curing nano impression glue, methyl methacrylate.

6. the release method according to claim 1 in nanometer embossing process, is characterized in that: described nanometer embossing comprises and adopts hot padding or ultraviolet light polymerization impression etc. to be the nanometer embossing of combination with rigid template and substrate.