CN105319838A - Demolding method in nanoimprint technology process - Google Patents
Demolding method in nanoimprint technology process Download PDFInfo
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- CN105319838A CN105319838A CN201510378214.7A CN201510378214A CN105319838A CN 105319838 A CN105319838 A CN 105319838A CN 201510378214 A CN201510378214 A CN 201510378214A CN 105319838 A CN105319838 A CN 105319838A
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- demolding
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Abstract
The invention discloses a demolding method in a nanoimprint technology process. The demolding method comprises the following steps: firstly, coating a substrate with a nanoimprint adhesive material to form an imprint adhesive layer; secondly, pressing a template into the imprint adhesive layer; thirdly, transmitting an ultrasonic wave to the template by an ultrasonic transmitting device at the upper part of the template after the imprint adhesive layer is cured and fixed, so as to assist separation of the template and the imprint adhesive layer; and finally removing the template and finishing the demolding process. Compared with the prior art, the problems that the molded nanoimprint structure is serious in deformation, overlarge in tear force and demolding force and the like due to cohesion force of the template and the adhesive layer in the demolding process of a nanoimprint technology are solved; imprinted pattern transferring and photoetching are completely consistent; the demolding force is effectively reduced; the demolding success rate is greatly improved; and large-scale industrial production is realized.
Description
Technical field
The present invention relates to the release method in a kind of nanometer embossing process, belong to micro-nano technology field.
Background technology
Nanometer embossing waits by professor StephenY.Chou of Princeton university of the U.S. NanostructureLab restriction being exposed wavelength for traditional photoetching process early than the mid-90 in 20th century, cannot obtain this shortcoming of smaller szie further and propose.This technology, with its low cost, high resolving power, simple technological process and other advantages, causes the extensive concern of various countries researchist.At present, successfully demonstrate and can obtain by this technology of nano impression the feature structure that minimum dimension is 5nm.This technology is widely used in the various fields such as optics, electronics, biology, and being described as ten greatly can one of the science and technology changing the world.
Nanometer embossing mainly can be divided into hot padding and ultraviolet light polymerization to impress two types.Nano hot stamping technology adopts thermoplastic polyester if polymethylmethacrylate (PMMA) is as impression glue line material usually, make high molecular polymer melting by heating, soften, then external force load is applied to template, nanostructured pattern in template is stamped on the glue-line of melting, after curable adhesive layer, sizing, remove template.Ultraviolet light polymerization stamping technique adopts uv curable oligomer as impression glue material, because this material has good fluidity, the advantage that viscosity is low, do not need external force load or need minimum external force load that the nanostructured pattern in template just can be made to be stamped on glue-line, then make its rapid curing, sizing by UV-irradiation, finally remove template.
In above-mentioned two kinds of nanometer embossings, realize being separated to make template and glue-line, all carry out the demoulding by applying tension load to template, although after the curable adhesive layer of sizing, the cohesion of glue-line and template declines to some extent, even if cohesion decreases, also need to apply very large pulling force in template, as easy as rolling off a log making causes mutual damage during the nanostructured of the nanostructured of template disengaging glue-line, particularly easily causes in type nanostructured gross distortion, tears, directly cause impressing unsuccessfully.Current technology is typically employed in the anti-glutinous layer of nanostructured pattern surface coating one deck macromolecule of template to reduce cohesion, reduce the mutual damage in knockout course, but effect is not ideal enough, the destruction to impressing shaping nanostructured particularly effectively can not be prevented.
Summary of the invention
Object of the present invention is exactly to solve in existing nanometer embossing knockout course due to the cohesion of template and glue-line and the in type nano impression structure gross distortion caused, tear the problem such as excessive with knockout press, by providing a kind of method of the ultrasonic assistant demoulding, to realize the reduction with knockout press that significantly improves of demoulding quality.
To achieve these goals, the present invention adopts following solution: the release method in a kind of nanometer embossing process, is first coated on substrate by nano impression glue material, forms impression glue-line; Then by template press-in impression glue-line; After curable adhesive layer sizing to be imprinted, utilize ultrasonic transmission device to launch ultrasound wave to template on template top, be separated with the glue-line of imprinting moulding with auxiliary template, remove template, complete knockout course.
In technique scheme, the ul-trasonic irradiation that described template top ultrasonic generator is launched is in whole knockout course.
In technique scheme, described template is by a kind of rigid template made in the hard materials such as silicon, silicon dioxide, monox, metal.
In technique scheme, the nanostructured pattern surface of described rigid template scribbles the anti-glutinous layer of one deck macromolecule.Thus in moulding process, improve the permanance of template, increase the access times of template.
In technique scheme, described nano impression glue material is the one in ultraviolet light curing nano impression glue, methyl methacrylate.
In technique scheme, described nanometer embossing comprises the nanometer embossing adopting hot padding or ultraviolet light polymerization impression etc. to be combination with rigid template and substrate.
Principle of work of the present invention is: utilize ultrasound wave as the physical characteristics of mechanical wave, when applying ultrasound wave to template, because the elastic modulus between rigid template and flexible imprints glue-line differs greatly, so template and glue-line are different to hyperacoustic receptivity, thus ultrasound wave can produce diverse action effect to this bi-material, and then cause template and glue-line produce different vibrations and cause relative displacement, the relative displacement of template and glue-line can make the cohesion between template and glue-line decline to a great extent or vanishing, minimum knockout press just can realize being separated of template and glue-line, and obtain the nanostructured pattern of zero-fault.
Accompanying drawing explanation
Fig. 1 is the structural representation of release method in nanometer embossing process of the present invention.Wherein (1) ultrasonic transmission device; (2) template; (3) glue-line is impressed; (4) substrate.
Embodiment
Below in conjunction with accompanying drawing, the invention will be further described.
The present invention with the ultrasonic assistant demoulding in nano hot stamping technical process for specific embodiment.
Shown in Figure 1, ultrasonic assistant release method in a kind of nano hot stamping technical process, first by nano impression polymer-coated on substrate, heating makes its melting, softening, forms impression glue-line 3; Then template 2 is pressed into impression glue-line 3; After glue-line 3 solidifying and setting to be imprinted, utilize ultrasonic transmission device 1 to launch ultrasound wave to template 2 on template 2 top, be separated with shaping impression glue-line 3 with auxiliary template 2, remove template 2, complete knockout course.
The ul-trasonic irradiation that described template 2 top ultrasonic transmission device 1 is launched is in whole knockout course.
Described template 2 is the rigid template that material is made by silicon dioxide.The nanostructured pattern surface of rigid template scribbles the anti-glutinous layer of one deck macromolecule.Thus in moulding process, improve the permanance of template, increase the access times of template.
Described nano impression glue-line 3 material is methyl methacrylate.
Be be rigidly connected between described ultrasonic transmission device 1 and template 2, can regard as integrally, apply demoulding load on the top of ultrasonic transmission device 1, template 2 and ultrasonic transmission device 1 produce identical displacement, and template 2 departs from impression glue-line 3.
The above is one embodiment of the present invention, and same the present invention also can be applicable to the nanometer embossing that ultraviolet light polymerization impression etc. is combination with rigid template and substrate.Be noted that on the basis of its general principles, the technology people in this field does not need to pay various improvement that creative work just can make and distortion all should be considered as protection scope of the present invention.
Claims (6)
1. the release method in nanometer embossing process, is characterized in that: be first coated on substrate by nano impression glue material, forms impression glue-line; Then by template press-in impression glue-line; After curable adhesive layer sizing to be imprinted, utilize ultrasonic transmission device to launch ultrasound wave to template on template top, be separated with the glue-line of imprinting moulding with auxiliary template, remove template, complete knockout course.
2. the release method according to claim 1 in nanometer embossing process, is characterized in that: the ul-trasonic irradiation that described template top ultrasonic generator is launched is in whole knockout course.
3. the release method according to claim 1 in nanometer embossing process, is characterized in that: described template is by a kind of rigid template made in the hard materials such as silicon, silicon dioxide, monox, metal.
4. the release method according to claim 3 in nanometer embossing process, is characterized in that: the nanostructured pattern surface of described rigid template scribbles the anti-glutinous layer of one deck macromolecule.
5. the release method according to claim 1 in nanometer embossing process, is characterized in that: described nano impression glue material is the one in ultraviolet light curing nano impression glue, methyl methacrylate.
6. the release method according to claim 1 in nanometer embossing process, is characterized in that: described nanometer embossing comprises and adopts hot padding or ultraviolet light polymerization impression etc. to be the nanometer embossing of combination with rigid template and substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510378214.7A CN105319838A (en) | 2015-07-02 | 2015-07-02 | Demolding method in nanoimprint technology process |
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| CN201510378214.7A CN105319838A (en) | 2015-07-02 | 2015-07-02 | Demolding method in nanoimprint technology process |
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| CN105319838A true CN105319838A (en) | 2016-02-10 |
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| CN201510378214.7A Pending CN105319838A (en) | 2015-07-02 | 2015-07-02 | Demolding method in nanoimprint technology process |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106495088A (en) * | 2016-09-22 | 2017-03-15 | 北京科技大学 | A kind of method of template hot pressing for wiener body structure surface pattern |
| CN110355988A (en) * | 2018-04-11 | 2019-10-22 | 长春工业大学 | A kind of roller of two-dimension vibration auxiliary is to plane hot stamping device and method |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101590714A (en) * | 2008-05-28 | 2009-12-02 | 深圳市凯意科技有限公司 | A kind of ultrasonic wave demoulding equipment and release method |
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2015
- 2015-07-02 CN CN201510378214.7A patent/CN105319838A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101590714A (en) * | 2008-05-28 | 2009-12-02 | 深圳市凯意科技有限公司 | A kind of ultrasonic wave demoulding equipment and release method |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106495088A (en) * | 2016-09-22 | 2017-03-15 | 北京科技大学 | A kind of method of template hot pressing for wiener body structure surface pattern |
| CN110355988A (en) * | 2018-04-11 | 2019-10-22 | 长春工业大学 | A kind of roller of two-dimension vibration auxiliary is to plane hot stamping device and method |
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Application publication date: 20160210 |
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