CN105296933A - Optical plastic substrate coating device - Google Patents
Optical plastic substrate coating device Download PDFInfo
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- CN105296933A CN105296933A CN201510741326.4A CN201510741326A CN105296933A CN 105296933 A CN105296933 A CN 105296933A CN 201510741326 A CN201510741326 A CN 201510741326A CN 105296933 A CN105296933 A CN 105296933A
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- evaporation source
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Abstract
The invention discloses an optical plastic substrate coating device. The optical plastic substrate coating device comprises a coating umbrella, an evaporation source and conductive bars, wherein the coating umbrella, the evaporation source and the conductive bars are arranged in a vacuum furnace; the coating umbrella is provided with side plates and an umbrella surface which are used for placing to-be-coated substrates; the evaporation source is arranged in the coating umbrella; the conductive bars are arranged between the substrates and the evaporation source; and the included angles between the conductive bars and the surfaces of the substrates are 0-5 degrees, the distances from the conductive bars to the substrates are 20cm-4cm, and the conductive bars are connected with a 1.2kV-1.5kV power supply. According to the optical plastic substrate coating device, the good firmness of the plastic substrate can be achieved without an IAD process.
Description
Technical field
The present invention relates to a kind of film coating apparatus, particularly relate to a kind of film coating apparatus for evaporation optical plastics substrate.
Background technology
Optical plastics refers to the plastics as optical medium material.Mainly be used in opticinstrument, for the manufacture of optical substrate, lens, contact lens, organic light-guide fiber etc.The optical plastics having obtained application mainly contains PMMA, PET, PC, PS etc.Following plastic base can replace glass substrate becomes time generation display material, because plastic base has the advantage such as light, thin, shock-resistant, rollable compared with glass substrate, can be applicable to many portable and Wearable display unit, to improve work-ing life and to increase use range.Current plastic base plated film can be applicable to the field such as touch panel screen, display panels (LCDpanel), Organic Light Emitting Diode (OLED), e-book (e-book), Polarizer, light storage, various light fixture, illuminating equipment, photoconductive fiber in opto-electronics as the transparent material of excellent performance.
Under atmospheric environment, plastic basis material absorption aqueous vapor easier than glass substrate, therefore can have the phenomenon of outgas in coating process because of vacuum environment and the relation of being heated.When outgas can cause plated film, film forming is unstable, makes film-plating process parameter wayward, and can affect the firmness of film forming.At present, general conventional use vacuum vapour deposition is carried out film forming and IAD assisted cryogenic vacuum evaporation process all can be used to improve the combination rate between rete and substrate, and such explained hereafter equipment cost is higher, and production efficiency neither be very high.
Summary of the invention
The object of this invention is to provide a kind of optical plastics substrate film coating device, after solving plastic base evaporation, rete firmness is poor, the problem of stripping easy to foaming.
Technical scheme of the present invention is such: a kind of optical plastics substrate film coating device, comprise the plated film parachute kit, evaporation source and the current conducting rod that are placed in vacuum oven, described plated film parachute kit is provided with side plate and umbrella cover, described side plate and umbrella cover are for placing substrate to be coated, described evaporation source is arranged in plated film parachute kit, described current conducting rod is arranged between substrate and evaporation source, described current conducting rod and substrate surface angle are 0 ~ 5 °, described current conducting rod and substrate distance 20 ~ 40cm, described current conducting rod connects 1.2 ~ 1.5kV power supply.
Preferably, described side plate and horizontal plane angle are 70 ~ 85 °, and described substrate is arranged on side plate, described current conducting rod and substrate distance 25 ~ 40cm.
Preferably, described umbrella cover and horizontal plane angle are 10 ~ 25 °, and described substrate is arranged on umbrella cover, described current conducting rod and substrate distance 20 ~ 30cm.
Preferably, described current conducting rod length is 0.6 ~ 1.0m, diameter 10cm.
Preferably, described current conducting rod is oxygenless copper material.
The advantage of technical scheme provided by the present invention is, the Heating temperature lower than 80 DEG C can be adopted to carry out plated film, and production efficiency high energy consumption is low; Before evaporation, high voltage electric connected by current conducting rod, produces discharge effect, carries out bombardment processing by the high energy particle discharged to plastic base surface, can be controlled the firmness of rete and substrate by adjustment discharge time; No matter that the rectilinear evaporation adopting the tilting evaporation that is positioned over side plate or employing to be positioned over umbrella cover can not use IAD technique and obtain good firmness.
Accompanying drawing explanation
Fig. 1 is plastic base structural representation when being placed in side plate plated film.
Fig. 2 is plastic base structural representation when being placed in umbrella cover plated film.
Embodiment
Below in conjunction with embodiment, the invention will be further described, but not as a limitation of the invention.
Refer to Fig. 1, the tilted optical mode plastic base film coating apparatus of present embodiment, comprise the plated film parachute kit, evaporation source and the current conducting rod that are placed in vacuum oven, plated film parachute kit is provided with side plate and umbrella cover, and substrate to be coated is placed on side plate.Side plate and horizontal sextant angle are 70 ~ 85 °, and evaporation source is arranged on the bottom in plated film parachute kit.Current conducting rod is diameter 10cm, and length is the oxygen free copper bar of 1.0m.Current conducting rod is divided into two, left and right and is fixedly installed between plastic base and evaporation source.Current conducting rod is 0 ~ 5 ° with plastic base surface angle and is treated to parallel as far as possible, and current conducting rod and substrate distance 25 ~ 40cm, current conducting rod connects 1.2 ~ 1.5kV power supply.
Refer to Fig. 2, the rectilinear optical plastics substrate film coating device of another embodiment of the invention, comprise the plated film parachute kit, evaporation source and the current conducting rod that are placed in vacuum oven, plated film parachute kit is provided with side plate and umbrella cover, and substrate to be coated is placed on umbrella cover.Umbrella cover and horizontal sextant angle are the bottom that 10 ~ 25 ° of evaporation sources are arranged in plated film parachute kit, and current conducting rod is diameter 10cm, and length is the oxygen free copper bar of 1.0m.Current conducting rod is divided into two, left and right and is fixedly installed between plastic base and evaporation source.Current conducting rod is 0 ~ 5 ° with plastic base surface angle and is treated to parallel as far as possible, and current conducting rod and substrate distance 20 ~ 30cm, current conducting rod connects 1.2 ~ 1.5kV power supply.
Above-mentioned two embodiments are adopted to carry out plated film with different parameters, concrete, before evaporation, first current conducting rod is connected high voltage electric, produce discharge effect, by the high energy particle discharged, bombardment processing is carried out to evaporation substrate surface, adjust discharge time.The plated film fruit that different embodiment different parameters obtains is as shown in the table
Claims (5)
1. an optical plastics substrate film coating device, comprise and be placed in plated film parachute kit (1) in vacuum oven and evaporation source (2), described plated film parachute kit (1) is provided with side plate (1b) and umbrella cover (1a), described side plate (1b) and umbrella cover (1a) are for placing substrate to be coated (3), described evaporation source (2) is arranged in plated film parachute kit (1), it is characterized in that, comprise current conducting rod (4), described current conducting rod (4) is arranged between substrate (3) and evaporation source (2), described current conducting rod (4) and substrate (3) surperficial angle are 0 ~ 5 °, described current conducting rod (4) and substrate (3) distance 20 ~ 40cm, described current conducting rod (4) connects 1.2 ~ 1.5kV power supply (5).
2. optical plastics substrate film coating device according to claim 1, it is characterized in that: described side plate (1b) and horizontal plane angle are 70 ~ 85 °, described substrate (3) is arranged on side plate (1b), described current conducting rod (4) and substrate (3) distance 25 ~ 40cm.
3. optical plastics substrate film coating device according to claim 1, is characterized in that: described umbrella cover and horizontal plane angle are 10 ~ 25 °, and described substrate is arranged on umbrella cover, described current conducting rod and substrate distance 20 ~ 30cm.
4. optical plastics substrate film coating device according to claim 1, is characterized in that: described current conducting rod length is 0.6 ~ 1.0m, diameter 10cm.
5. optical plastics substrate film coating device according to claim 1, is characterized in that: described current conducting rod is oxygenless copper material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510741326.4A CN105296933B (en) | 2015-11-04 | 2015-11-04 | A kind of optical plastic substrate film coating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510741326.4A CN105296933B (en) | 2015-11-04 | 2015-11-04 | A kind of optical plastic substrate film coating device |
Publications (2)
| Publication Number | Publication Date |
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| CN105296933A true CN105296933A (en) | 2016-02-03 |
| CN105296933B CN105296933B (en) | 2017-09-19 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201510741326.4A Active CN105296933B (en) | 2015-11-04 | 2015-11-04 | A kind of optical plastic substrate film coating device |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1605652A (en) * | 2004-09-09 | 2005-04-13 | 复旦大学 | Vacuum thermal evaporation film-forming method using strong electric field |
| US20070224342A1 (en) * | 2006-03-21 | 2007-09-27 | Hon Hai Precision Industry Co., Ltd. | Apparatus and method for forming antireflection film |
| US20110076398A1 (en) * | 2009-09-25 | 2011-03-31 | Shenzhen Futaihong Precision Industry Co., Ltd. | Evaporation source and vapor deposition apparatus using the same |
| CN104004996A (en) * | 2014-04-15 | 2014-08-27 | 京浜光学制品（常熟）有限公司 | Evaporation device for low temperature AF film coating |
| CN205115590U (en) * | 2015-11-04 | 2016-03-30 | 京浜光学制品（常熟）有限公司 | Optical plastics base plate coating film device |
-
2015
- 2015-11-04 CN CN201510741326.4A patent/CN105296933B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1605652A (en) * | 2004-09-09 | 2005-04-13 | 复旦大学 | Vacuum thermal evaporation film-forming method using strong electric field |
| US20070224342A1 (en) * | 2006-03-21 | 2007-09-27 | Hon Hai Precision Industry Co., Ltd. | Apparatus and method for forming antireflection film |
| US20110076398A1 (en) * | 2009-09-25 | 2011-03-31 | Shenzhen Futaihong Precision Industry Co., Ltd. | Evaporation source and vapor deposition apparatus using the same |
| CN104004996A (en) * | 2014-04-15 | 2014-08-27 | 京浜光学制品（常熟）有限公司 | Evaporation device for low temperature AF film coating |
| CN205115590U (en) * | 2015-11-04 | 2016-03-30 | 京浜光学制品（常熟）有限公司 | Optical plastics base plate coating film device |
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| CN105296933B (en) | 2017-09-19 |
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Address after: 215500 No. 7, Liuzhou Road, hi tech Industrial Park, Suzhou, Jiangsu, Changshou City Applicant after: Suzhou Jing Bang photoelectric Polytron Technologies Inc Address before: 215500 No. 7, Liuzhou Road, hi tech Industrial Park, Suzhou, Jiangsu, Changshou City Applicant before: Jing Bang optical products (Changshu) Co., Ltd. |
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