CN105242431B - With the touch control display apparatus of resistive formation and preparation method thereof for eliminating electrostatic - Google Patents
With the touch control display apparatus of resistive formation and preparation method thereof for eliminating electrostatic Download PDFInfo
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- CN105242431B CN105242431B CN201510688504.1A CN201510688504A CN105242431B CN 105242431 B CN105242431 B CN 105242431B CN 201510688504 A CN201510688504 A CN 201510688504A CN 105242431 B CN105242431 B CN 105242431B
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- resistive formation
- display apparatus
- colored filter
- control display
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/13338—Input devices, e.g. touch panels
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
Abstract
The present invention relates to a kind of touch control display apparatus of resistive formation and preparation method thereof for having and eliminating electrostatic.By forming resistive formation on surface of the colored filter substrate far from liquid crystal layer, and resistive formation is electrically connected with electrode, forms touch module.Since resistive formation is formed directly into colored filter substrate surface, it no longer needs to carry resistive formation using one layer of glass, compared to traditional touch control display apparatus with the resistive formation for eliminating electrostatic, reduce one layer of ito glass and the optical cement for bonding, to which the above-mentioned touch control display apparatus with the resistive formation for eliminating electrostatic is relatively thin.In addition, the material of resistive formation includes graphite oxide, tin oxide, surfactant and crosslinking agent, it can play the role of eliminating electrostatic, improve the sensitivity of touch-control.
Description
Technical field
The present invention relates to display device field, more particularly to a kind of touch control display apparatus with the resistive formation for eliminating electrostatic
And preparation method thereof.
Background technology
Touch screen is the important composition portion of the electronic devices such as electronic device such as touch-control screen mobile phone, tablet computer, e-book
Point.Traditional touch screen generally comprises display module and touch module, and touch module generally includes the ito glass of two-layer laminate,
Two layers of ito glass is bonded together by optical cement.
However, with people's pursuit lightening to electronic product, touch screen includes at least two layers of ito glass and use at present
Come the optical cement bonded, thickness is thicker, limits the development of touch screen.
Invention content
Based on this, it is necessary to provide a kind of thinner thickness have the resistive formation for eliminating electrostatic touch control display apparatus and its
Preparation method.
It is a kind of have eliminate electrostatic resistive formation touch control display apparatus, including stack gradually thin film transistor base plate,
Liquid crystal layer and colored filter substrate, the thin film transistor base plate are equipped with a plurality of mutually insulated towards the surface of the liquid crystal layer
Electrode, described have that eliminate the touch control display apparatus of resistive formation of electrostatic further include resistive formation, and the resistive formation is formed in institute
Surface of the colored filter substrate far from the liquid crystal layer is stated, the resistive formation is electrically connected with the electrode, the resistive formation
Material includes graphite oxide, tin oxide, surfactant and crosslinking agent.
In a wherein embodiment, the material of the resistive formation includes 1.5 parts~3 parts of oxygen in parts by weight
Graphite, 0.5 part~2 parts of tin oxide, 28 parts~30 parts of surfactant and 20 parts~30 parts of crosslinking agent.
In a wherein embodiment, the thickness of the resistive formation is 28 μm~32 μm.
In a wherein embodiment, the material of the electrode is ITO.
The above-mentioned preparation method with the touch control display apparatus for the resistive formation for eliminating electrostatic includes the following steps：
Thin film transistor base plate is provided, a plurality of phase is equipped with towards the surface of the liquid crystal layer in the thin film transistor base plate
The electrode mutually to insulate；
Colored filter substrate is provided, in the colored filter substrate towards the surface shape of the thin film transistor base plate
At liquid crystal layer；
Resistive formation, the material packet of the resistive formation are formed on surface of the colored filter substrate far from the liquid crystal layer
Include graphite oxide, tin oxide, surfactant and crosslinking agent；And
The resistive formation is electrically connected with the electrode, obtains the touch control display apparatus with the resistive formation for eliminating electrostatic.
In a wherein embodiment, high resistant is formed on surface of the colored filter substrate far from the liquid crystal layer
Layer operation be：By coating extrusion to the colored filter substrate far from the thin film transistor (TFT) by way of bar film
The surface of substrate, the coating include graphite oxide, tin oxide, surfactant, crosslinking agent and solvent, the speed of bar film
For 0.2m/mim~0.4m/mim, bar ballast is 0.49kg~0.51kg.
In a wherein embodiment, the coating is according to the oxidation stone that mass percentage meter includes 1.5%~3%
Ink, 0.5%~2% tin oxide, 28%~30% surfactant, 20%~30% crosslinking agent and 40%~45%
Solvent.
In a wherein embodiment, high resistant is formed on surface of the colored filter substrate far from the liquid crystal layer
Before layer, including to the thin film transistor base plate milled processed so that the thin film transistor base plate surfacing.
In a wherein embodiment, high resistant is formed on surface of the colored filter substrate far from the liquid crystal layer
After layer, including the colored filter substrate for forming resistive formation dry processing and baking is handled, it is described to dry place
Reason is naturally dry 10min~15min, and the baking processing is that 58mim~63mim is toasted at 78 DEG C~83 DEG C.
In a wherein embodiment, high resistant is formed on surface of the colored filter substrate far from the liquid crystal layer
Before layer, including the colored filter substrate is started the cleaning processing successively, is dried and electrostatic dissipation processing, it is described clear
The operation for washing processing includes carrying out pure water cleaning, caustic dip, two fluid cleaning showers, ultra-pure water cleaning showers and high pressure successively
Cleaning showers, described be dried includes carrying out cold air drying and heated-air drying successively.
It is above-mentioned have eliminate electrostatic resistive formation touch control display apparatus, by colored filter substrate far from liquid crystal layer
Surface form resistive formation, and resistive formation is electrically connected with electrode, formation touch module.Since resistive formation is formed directly into colour
Filter sheet base plate surface no longer needs to carry resistive formation using one layer of glass, compared to traditional resistive formation with elimination electrostatic
Touch control display apparatus reduces one layer of ito glass and the optical cement for bonding, and has the resistive formation for eliminating electrostatic to above-mentioned
Touch control display apparatus it is relatively thin.In addition, the material of resistive formation includes graphite oxide, tin oxide, surfactant and crosslinking agent, it can
To play the role of eliminating electrostatic, the sensitivity of touch-control is improved.
Description of the drawings
Fig. 1 is the structural schematic diagram of the touch control display apparatus with the resistive formation for eliminating electrostatic of an embodiment；
Fig. 2 is the flow of the preparation method of the touch control display apparatus with the resistive formation for eliminating electrostatic of an embodiment
Figure.
Specific implementation mode
Below mainly in combination with specific drawings and the specific embodiments to the touch control display apparatus with the resistive formation for eliminating electrostatic
And preparation method thereof be described in further detail.
Referring to Fig. 1, the touch control display apparatus 100 with the resistive formation for eliminating electrostatic of an embodiment, including successively
Thin film transistor base plate 10, liquid crystal layer 20, colored filter substrate 30 and the resistive formation 40 of stacking.
Thin film transistor base plate (TFT) 10 is equipped with the electrode 11 of a plurality of mutually insulated, high resistant towards the surface of liquid crystal layer 20
Layer 40 is formed in surface of the colored filter substrate 30 far from liquid crystal layer 20, and resistive formation 40 is electrically connected with electrode 11.Specifically, high
Resistance layer 40 can be electrically connected with electrode 11 by lead.
Thin film transistor base plate 10, liquid crystal layer 20 and colored filter substrate 30 and composition display module, resistive formation 40 with
The electrical connection composition touch module of electrode 11 of a plurality of mutually insulated.
Specifically, the electrode 11 of a plurality of mutually insulated can be formed in table of the thin film transistor base plate 10 towards liquid crystal layer 20
Face can also be formed in surface of the thin film transistor base plate 10 far from liquid crystal layer 20.
Specifically in the present embodiment, the electrode 11 of a plurality of mutually insulated is formed in thin film transistor base plate 10 towards liquid crystal
The surface of layer 20, liquid crystal layer 20 are formed in colored filter substrate 30 towards the surface of thin film transistor base plate 10, resistive formation 40
It is formed in surface of the colored filter substrate 30 far from liquid crystal layer 20.The electrode 11 of a plurality of mutually insulated can be embedded into and liquid crystal layer
In 20 so that touch panel function is embedded into liquid crystal pixel, is internally embedded touch sensor function in display screen, constitutes In-
The touch control display apparatus with the resistive formation for eliminating electrostatic of Cell types so that screen is more frivolous.
Certainly, it further includes other yuan such as polaroid, cover board to have the touch control display apparatus 100 for the resistive formation for eliminating electrostatic
Part, this will not be repeated here.
Specifically, the material of resistive formation 40 includes graphite oxide, tin oxide, surfactant and crosslinking agent
Graphite oxide (Graphite oxide, GO) is a kind of novel carbon material, has excellent absorption property.Oxidation
Tin (SnO2) it is a kind of activating oxide, there is characteristic of semiconductor.Graphite oxide, tin oxide, surfactant and crosslinking agent are mixed
The composite material that can be had excellent performance after conjunction.The surface nature of the changeable graphite oxide of tin oxide, graphite oxide high porosity,
The characteristics of high surface area, can promote the dispersibility of tin oxide again.Various component synergistic effects cause resistive formation 40 to have excellent suction
Attached performance and electrology characteristic.
Preferably, the material of resistive formation 40 includes 1.5 parts~3 parts of graphite oxide in parts by weight, and 0.5 part~2
The tin oxide, 28 parts~30 parts of surfactant and 20 parts~30 parts of crosslinking agent of part.
Preferably, the thickness of resistive formation 40 is 28 μm~32 μm.
Preferably, light transmittance >=95% of resistive formation 40, herein light transmittance refer to 30 surface shape of colored filter substrate
At the ratio with the light transmittance before formation resistive formation 40 after resistive formation 40.
Preferably, the material of electrode 11 is ITO, and certainly, the material of electrode 11 is not limited to ITO, or other are led
Electric material such as AZO etc..
It is above-mentioned have eliminate electrostatic resistive formation touch control display apparatus, by colored filter substrate far from liquid crystal layer
Surface form resistive formation, and resistive formation is electrically connected with electrode, formation touch module.Since resistive formation is formed directly into colour
Filter sheet base plate surface no longer needs to carry resistive formation using one layer of glass, compared to traditional resistive formation with elimination electrostatic
Touch control display apparatus reduces one layer of ito glass and the optical cement for bonding, and has the resistive formation for eliminating electrostatic to above-mentioned
Touch control display apparatus is relatively thin, translucency is preferable.In addition, the material of resistive formation includes graphite oxide, tin oxide, surfactant
And crosslinking agent, it can play the role of eliminating electrostatic, improve the sensitivity of touch-control.
The preparation method of the above-mentioned touch control display apparatus with the resistive formation for eliminating electrostatic as shown in Figure 2, including it is as follows
Step：
S10, thin film transistor base plate is provided, in thin film transistor base plate towards the surface of liquid crystal layer equipped with a plurality of mutually exhausted
The electrode of edge.
The material of electrode is ITO, and certainly, the material of electrode is not limited to ITO, or other conductive materials such as AZO
Deng.
Specifically, can be by way of stencil or vacuum magnetic-control sputtering in thin film transistor base plate surface coating, and adopt
Figure preparation is carried out with chemical method for etching, obtains the electrode of a plurality of mutually insulated.
S20, colored filter substrate is provided, liquid is formed towards the surface of thin film transistor base plate in colored filter substrate
Crystal layer.
The material of liquid crystal layer can be the organic matters such as aliphatic, aromatic series, stearic acid.Perfusion liquid crystal method can be used to exist
Liquid crystal layer is formed between thin film transistor base plate and colored filter substrate, i.e., by thin film transistor base plate and colorized optical filtering chip base
After plate is to group, suck liquid crystal to form liquid crystal layer using capillary principle.It is first that liquid crystal is straight or using drop down liquid crystal injection method
It connects and drops on colored filter substrate, then again carry out thin film transistor base plate and colored filter substrate to group.
S30, resistive formation is formed on surface of the colored filter substrate far from liquid crystal layer, the material of resistive formation includes oxidation stone
Ink, tin oxide, surfactant and crosslinking agent.
Specifically, can be by bar film applicator by surface of the coating extrusion to colored filter substrate far from liquid crystal layer, shape
At resistive formation.Coating is squeezed by the OSP bars of bar film applicator, forms resistive formation on colored filter substrate.Certainly,
Other modes may be used, such as vacuum magnetic-control sputtering, silk-screen printing mode form resistive formation on colored filter substrate surface.
The mode of bar film is easy to operate, easy to operate, and a people can complete independently.And flexibility is stronger, is suitble to
Different model, various sizes of display device are arbitrarily processed, and equipment investment cost is low, and fragmentation risk is small.It is particularly suitable in granule
Film layer is formed on thin film transistor base plate (size is generally at 4.5 cun~6 cun or so).
Preferably, a diameter of 9.4mm of OSP bars, and the thickness for adjusting film is 30 μm.Bar film operating environment is nothing
Dirt space (hundred grades), indoor temperature are controlled at 22 DEG C~28 DEG C, and humid control is 20%~30%.Specifically, bar film
Speed is 0.2m/mim~0.4m/mim, and bar ballast is 0.49kg~0.51kg.
Coating includes graphite oxide, tin oxide, surfactant, crosslinking agent and solvent, and solvent can be water or organic molten
Agent etc..
Preferably, coating includes 1.5%~3% graphite oxide, 0.5%~2% oxygen according to mass percentage meter
Change tin, 28%~30% surfactant, 20%~30% crosslinking agent and 40%~45% solvent.
Specifically, surfactant can be stearic acid, neopelex, quaternary ammonium compound, lecithin, aliphatic acid
Glyceride, fatty acid sorbitan (sapn), polysorbate (tween) etc..
Crosslinking agent can be polyethylene, polyvinyl chloride, polyacrylate, polyalkyl acrylate, styrene, acrylonitrile,
Acrylic acid, methacrylic acid, glyoxal, aziridine etc.
Specifically in the present embodiment, surfactant is the low bubble bubble-free surface of Shenzhen Rong Qiang Science and Technology Ltd.s production
Activating agent (PQ-122H).Crosslinking agent is the trifunctional aziridine crosslinker of Jiangsu Kangle New Materials Technology Co., Ltd.'s production
(HD-100)。
Preferably, in colored filter substrate, the surface far from liquid crystal layer is formed before resistive formation, including to film crystal
Pipe substrate is ground so that thin film transistor base plate surfacing.
Thin film transistor base plate surface might have bad for sags and crests, scuffing, the unequal bad problem of etching.Especially
Big thin film transistor base plate is subjected to cutting and forms granule thin film transistor base plate (size is generally at 4.5 cun~6 cun or so)
Afterwards, the probability that bad problem occurs in granule thin film transistor base plate increases.Therefore it needs to be ground thin film transistor base plate
Processing so that thin film transistor base plate surfacing.
Preferably, first use protection materials that will be again ground after the electrode protection on thin film transistor base plate surface.
Protection materials can be vaseline, and vaseline is not soluble in water, being capable of damage of the effective protection electrode in water, acid, alkali.
It should be noted that if thin film transistor base plate itself is surfacing, without bad problem, then grinding operation can save
Slightly.
Preferably, in colored filter substrate, the surface far from liquid crystal layer is formed before resistive formation, in thin film transistor (TFT) base
One layer of high-temperature plastic is pasted at the electrode of plate surface, with guard electrode.High-temperature plastic can be 3M high-temp glues, and 3M high-temp glues can be heat-resisting
400 DEG C~600 DEG C, and there is no adhesive residue after tearing.The high-temp glue at electrode is torn again after the completion of bar coating process,
Carry out next process.
Preferably, in colored filter substrate, the surface far from liquid crystal layer is formed after resistive formation, including will form high resistant
The colored filter substrate of layer carries out drying processing and baking processing, and it is naturally dry 10min~15min, baking to dry processing
Processing is that 58mim~63mim is toasted at 78 DEG C~83 DEG C, and resistive formation is obtained after natural cooling.
It dries and baking handles the drying that can accelerate slurry so that the resistive formation each component of formation is more evenly distributed.
Preferably, in colored filter substrate, the surface far from liquid crystal layer is formed before resistive formation, can be by colored filter
Substrate starts the cleaning processing successively, is dried and electrostatic dissipation processing, and the operation of cleaning treatment includes that carry out pure water successively clear
It washes, caustic dip, two fluid cleaning showers, ultra-pure water cleaning showers and high pressure cleaning showers.Lye can be cleaning agent, such as contain
There is the glass cleaner of potassium hydroxide or sodium hydroxide.Two fluid sprays refer to high-pressure gaseous fluid such as air and fluid liquid such as
After water mixing, so that high pressure gas is formed drop high speed with cleaning solution by nozzle and spray, cleaning object surface.Ultrapure water spray,
Pure water refers to the water of resistivity >=8 megaohm.Be dried includes carrying out cold air drying and heated-air drying successively.It needs to illustrate
It is that, if colored filter substrate itself is clean, without dirty and dust, then the step can be omitted.
S40, resistive formation is electrically connected with electrode, obtains the touch control display apparatus with the resistive formation for eliminating electrostatic.
Specifically, resistive formation can be electrically connected with electrode by lead.Resistive formation forms touch-control mould after being electrically connected with electrode
Group, the display module that thin film transistor base plate, liquid crystal layer and colored filter substrate form, touch module are common with display module
Forming has the touch control display apparatus for the resistive formation for eliminating electrostatic.
It should be noted that the step of preparation method of the above-mentioned touch control display apparatus with the resistive formation for eliminating electrostatic, is not
It is limited to take said sequence, can also be adjusted as needed.
The preparation method of the above-mentioned touch control display apparatus with the resistive formation for eliminating electrostatic, by colored filter substrate
Surface far from liquid crystal layer forms resistive formation, and resistive formation is electrically connected with electrode, forms touch module.The material packet of resistive formation
Graphite oxide, tin oxide, surfactant and crosslinking agent are included, there is excellent absorption property, without using optics glue bond, work
Skill step is relatively simple.By the above method be prepared have eliminate electrostatic resistive formation touch control display apparatus thickness compared with
Thin, translucency is preferable, and has the function of antistatic, the high sensitivity of touch-control.
It is described in detail below in conjunction with specific embodiment.
In following embodiment, unless otherwise instructed, test method without specific conditions, usually according to normal condition.
Instrument：Bar film applicator, cleaning machine, high resistant instrument, film thickness gauge, spectrometer etc..
Reagent：Surfactant is the low bubble bulb-less surface activity agent (PQ- of Shenzhen Rong Qiang Science and Technology Ltd.s production
122H), crosslinking agent is the trifunctional aziridine crosslinker (HD-100) of Jiangsu Kangle New Materials Technology Co., Ltd.'s production.
Embodiment 1
Resistive formation is formed on colored filter substrate surface, is included the following steps：
(1) it uses vaseline by after the electrode protection on thin film transistor base plate surface, then is ground.
(2) cleaning machine is used to carry out the colored filter substrate of the touch control display apparatus with the resistive formation for eliminating electrostatic
Pure water, lye, two fluid sprays, ultrapure water spray, high-pressure spraying clean successively, by substrate surface is dirty and dust clean it is dry
, through cold wind, heated-air drying, electrostatic dissipation, examine surface without dirty and dust only.And one layer of high-temperature plastic is pasted at electrode, etc.
It is to be coated.
(3) bar film applicator plated film is used, by the colorized optical filtering of the touch control display apparatus with the resistive formation for eliminating electrostatic
Plate base is fixed on ground, then selects the OSP bars of a diameter of 9.4mm by coating extrusion to colored filter substrate,
And the thickness for adjusting film is 30 μm, the speed of bar film is 0.3m/min, and bar ballast is 0.5kg, an extrusion process
Obtain a floor height resistance layer, bar film operating environment is dustless space (hundred grades), and indoor temperature control is at 22 DEG C~28 DEG C, humidity
Control is 20%~30%.Coating according to the graphite oxide that mass percentage meter includes 2%, 1.5% tin oxide, 28.5%
Surfactant, 28% crosslinking agent and 40% water.After the completion of plated film, naturally dry 10min~15min is put into later
In oven 60min is toasted under the conditions of 80 DEG C.Resistive formation is formed after cooling.High-temperature plastic at electrode is torn, is carried out down together
Process.
Certainly, it further includes the system of cover board, polarizer, lead that preparing, which has the touch control display apparatus for the resistive formation for eliminating electrostatic,
It is standby, using method commonly used in the trade, do not limit herein.
Use the light transmittance of spectrometer test resistive formation for 96%.
Film hardness is 6H.
Use the resistance of resistance instrument test resistive formation for 5 × 108′Ω/cm2.Using climatic chamber at 90 DEG C, 60% is wet
Degree baking experiment in 240 hours, the resistance change rate of resistive formation is 22%.Alcohol impregnates 5 minutes, and the resistance change rate of resistive formation is
24%.60 DEG C of oven cushioning toasts 240 hours, change in resistance 7%.
Several embodiments of the invention above described embodiment only expresses, the description thereof is more specific and detailed, but simultaneously
It cannot therefore be construed as limiting the scope of the patent.It should be pointed out that coming for those of ordinary skill in the art
It says, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to the protection of the present invention
Range.Therefore, the protection domain of patent of the present invention should be determined by the appended claims.
Claims (9)
1. there is the touch control display apparatus for the resistive formation for eliminating electrostatic a kind of, including thin film transistor base plate, the liquid stacked gradually
Crystal layer and colored filter substrate, the thin film transistor base plate are equipped with a plurality of mutually insulated towards the surface of the liquid crystal layer
Electrode, which is characterized in that the touch control display apparatus with the resistive formation for eliminating electrostatic further includes resistive formation, the resistive formation
It is formed in surface of the colored filter substrate far from the liquid crystal layer, the resistive formation is electrically connected with the electrode by lead
It connects, the material of the resistive formation includes graphite oxide, tin oxide, surfactant and crosslinking agent, and the material of the resistive formation is pressed
Include 1.5 parts~3 parts of graphite oxide, 0.5 part~2 parts of tin oxide, 28 parts~30 parts of surface-active according to parts by weight meter
Agent and 20 parts~30 parts of crosslinking agent.
2. the touch control display apparatus with the resistive formation for eliminating electrostatic according to claim 1, which is characterized in that the height
The thickness of resistance layer is 28 μm~32 μm.
3. the touch control display apparatus with the resistive formation for eliminating electrostatic according to claim 1, which is characterized in that the electricity
The material of pole is ITO.
4. a kind of system of the touch control display apparatus according to any one of claims 1 to 3 with the resistive formation for eliminating electrostatic
Preparation Method, which is characterized in that include the following steps：
Thin film transistor base plate is provided, in the thin film transistor base plate towards the surface of the liquid crystal layer equipped with a plurality of mutually exhausted
The electrode of edge；
Colored filter substrate is provided, liquid is formed towards the surface of the thin film transistor base plate in the colored filter substrate
Crystal layer；
Resistive formation is formed on surface of the colored filter substrate far from the liquid crystal layer, the material of the resistive formation includes oxygen
Graphite, tin oxide, surfactant and crosslinking agent；And
The resistive formation is electrically connected with the electrode, obtains the touch control display apparatus with the resistive formation for eliminating electrostatic.
5. the preparation method of the touch control display apparatus according to claim 4 with the resistive formation for eliminating electrostatic, feature
It is, the operation that resistive formation is formed on surface of the colored filter substrate far from the liquid crystal layer is：Pass through bar film
Mode by coating extrusion to surface of the colored filter substrate far from the thin film transistor base plate, the coating includes
The speed of graphite oxide, tin oxide, surfactant, crosslinking agent and solvent, bar film is 0.2m/mim~0.4m/mim, line
Stick ballast is 0.49kg~0.51kg.
6. the preparation method of the touch control display apparatus according to claim 5 with the resistive formation for eliminating electrostatic, feature
Be, the coating according to the graphite oxide that mass percentage meter includes 1.5%~3%, 0.5%~2% tin oxide,
28%~30% surfactant, 20%~30% crosslinking agent and 40%~45% solvent.
7. the preparation method of the touch control display apparatus according to claim 4 with the resistive formation for eliminating electrostatic, feature
It is, before surface of the colored filter substrate far from the liquid crystal layer forms resistive formation, including to film crystalline substance
Body pipe substrate is ground so that the thin film transistor base plate surfacing.
8. the preparation method of the touch control display apparatus according to claim 4 with the resistive formation for eliminating electrostatic, feature
It is, after surface of the colored filter substrate far from the liquid crystal layer forms resistive formation, including resistive formation will be formed
The colored filter substrate dry processing and baking processing, it is described dry processing be naturally dry 10min~
15min, the baking processing is that 58mim~63mim is toasted at 78 DEG C~83 DEG C.
9. the preparation method of the touch control display apparatus according to claim 4 with the resistive formation for eliminating electrostatic, feature
It is, before surface of the colored filter substrate far from the liquid crystal layer forms resistive formation, including to the colored filter
Mating plate substrate starts the cleaning processing successively, is dried and electrostatic dissipation processing, the operation of the cleaning treatment include successively into
The cleaning of row pure water, caustic dip, two fluid cleaning showers, ultra-pure water cleaning showers and high pressure cleaning showers, the drying process
Including carrying out cold air drying and heated-air drying successively.
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| CN105242809A (en) * | 2015-10-21 | 2016-01-13 | 江西沃格光电股份有限公司 | Touch display device and preparation method thereof |
| CN107367863A (en) * | 2017-08-29 | 2017-11-21 | 武汉华星光电技术有限公司 | Liquid crystal display panel Electro-static Driven Comb structure, liquid crystal display panel and liquid crystal display |
| CN107817621B (en) * | 2017-12-15 | 2021-01-26 | 江西沃格光电股份有限公司 | Repairing method of flat panel display |
| CN110175600A (en) * | 2019-06-25 | 2019-08-27 | Oppo广东移动通信有限公司 | The assemble method of display component device, electronic equipment and display component device |
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| US8460953B2 (en) * | 2008-09-30 | 2013-06-11 | Japan Display West Inc. | Manufacturing method for liquid crystal apparatus |
| CN102200872A (en) * | 2011-07-15 | 2011-09-28 | 南京华东电子信息科技股份有限公司 | Embedded capacitance type liquid crystal touch screen |
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| CN104965617A (en) * | 2015-06-30 | 2015-10-07 | 上海天马微电子有限公司 | Touch display panel |
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