CN105242068A - Mems加速度传感器的隔离硅墙 - Google Patents
Mems加速度传感器的隔离硅墙 Download PDFInfo
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- CN105242068A CN105242068A CN201410331234.4A CN201410331234A CN105242068A CN 105242068 A CN105242068 A CN 105242068A CN 201410331234 A CN201410331234 A CN 201410331234A CN 105242068 A CN105242068 A CN 105242068A
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- microns
- silicon
- isolation
- mems
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- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 147
- 239000010703 silicon Substances 0.000 title claims abstract description 147
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 116
- 238000002955 isolation Methods 0.000 title claims abstract description 80
- 230000001133 acceleration Effects 0.000 title claims abstract description 69
- 238000001514 detection method Methods 0.000 claims abstract description 53
- 239000000758 substrate Substances 0.000 claims abstract description 52
- 150000003376 silicon Chemical class 0.000 claims description 31
- 238000000034 method Methods 0.000 abstract description 11
- 239000007788 liquid Substances 0.000 abstract description 4
- 230000001681 protective effect Effects 0.000 abstract description 4
- 238000003754 machining Methods 0.000 abstract description 2
- 230000007812 deficiency Effects 0.000 abstract 1
- 238000005516 engineering process Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000005530 etching Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
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- Pressure Sensors (AREA)
- Micromachines (AREA)
Abstract
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Priority Applications (1)
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CN201410331234.4A CN105242068B (zh) | 2014-07-11 | 2014-07-11 | Mems加速度传感器的隔离硅墙 |
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CN201410331234.4A CN105242068B (zh) | 2014-07-11 | 2014-07-11 | Mems加速度传感器的隔离硅墙 |
Publications (2)
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CN105242068A true CN105242068A (zh) | 2016-01-13 |
CN105242068B CN105242068B (zh) | 2018-06-08 |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101133332A (zh) * | 2005-11-22 | 2008-02-27 | 凯奥尼克公司 | 三轴加速度计 |
CN102356324A (zh) * | 2009-03-24 | 2012-02-15 | 飞思卡尔半导体公司 | 垂直集成的mems加速度变换器 |
CN102928623A (zh) * | 2012-10-26 | 2013-02-13 | 中国科学院上海微系统与信息技术研究所 | 一种避免寄生电容结构的微加速度传感器及其制作方法 |
CN204008695U (zh) * | 2014-07-11 | 2014-12-10 | 广芯电子技术(上海)有限公司 | Mems加速度传感器的隔离硅墙 |
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2014
- 2014-07-11 CN CN201410331234.4A patent/CN105242068B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101133332A (zh) * | 2005-11-22 | 2008-02-27 | 凯奥尼克公司 | 三轴加速度计 |
CN102356324A (zh) * | 2009-03-24 | 2012-02-15 | 飞思卡尔半导体公司 | 垂直集成的mems加速度变换器 |
CN102928623A (zh) * | 2012-10-26 | 2013-02-13 | 中国科学院上海微系统与信息技术研究所 | 一种避免寄生电容结构的微加速度传感器及其制作方法 |
CN204008695U (zh) * | 2014-07-11 | 2014-12-10 | 广芯电子技术(上海)有限公司 | Mems加速度传感器的隔离硅墙 |
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CN105242068B (zh) | 2018-06-08 |
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Address after: 200030 Shanghai Road, Leshan, building 305, room 1, building 33, room Applicant after: BROADCHIP TECHNOLOGY GROUP Corp.,Ltd. Address before: 200030 Shanghai Road, Leshan, building 305, room 1, building 33, room Applicant before: Broadchip Technology Group Ltd. |
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Address after: Floor 14, Building 10, No. 2337 Gudai Road, Minhang District, Shanghai, 2011 Patentee after: BROADCHIP TECHNOLOGY GROUP Corp.,Ltd. Country or region after: China Address before: Room 305, Building 1, No. 33 Leshan Road, Xuhui District, Shanghai 200030 Patentee before: BROADCHIP TECHNOLOGY GROUP Corp.,Ltd. Country or region before: China |