CN1051203A - 1,1-two chloro-2,2,2-three fluoro ethane and 1, the stabilization Azeotrope compositions of 1-two chloro-1-fluoroethanes - Google Patents
1,1-two chloro-2,2,2-three fluoro ethane and 1, the stabilization Azeotrope compositions of 1-two chloro-1-fluoroethanes Download PDFInfo
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- CN1051203A CN1051203A CN90109210A CN90109210A CN1051203A CN 1051203 A CN1051203 A CN 1051203A CN 90109210 A CN90109210 A CN 90109210A CN 90109210 A CN90109210 A CN 90109210A CN 1051203 A CN1051203 A CN 1051203A
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- weight
- azeotrope compositions
- stabilization
- chloro
- nitromethane 99min
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
- C23G5/02809—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing chlorine and fluorine
- C23G5/02825—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing chlorine and fluorine containing hydrogen
- C23G5/02829—Ethanes
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5036—Azeotropic mixtures containing halogenated solvents
- C11D7/504—Azeotropic mixtures containing halogenated solvents all solvents being halogenated hydrocarbons
- C11D7/5045—Mixtures of (hydro)chlorofluorocarbons
Abstract
1 of a kind of stabilization is disclosed, 1-two chloro-2,2,2-three fluoro ethane and 1, the Azeotrope compositions of 1-two chloro-1-fluoroethanes.This azeotropic, azeotropic class mixture can be used for solvent cleaning and use as whipping agent.
Description
On February 15th, 1989, the sequence number of application was 07/297,366 unexamined patent application disclose the effective cleaning solvent composition of conduct, Huan who is specially adapted to the electronic circuit board cleaning is boiled, the azeotropic based composition, said composition comprises 1,1-two chloro-2,2,2-three fluoro ethane (HCFC-123) and 1,1-two chloro-1-fluoroethanes (HCFC-141b), and methyl alcohol and ethanol.
As described in above-mentioned application, the method for industrial general soldering of electronic components in the circuit board comprises: apply whole wiring board with a kind of solder flux composition, the one side that wiring board is applied is by preheater, again by the fused solder flux then.Solder flux composition cleans the conducting metal part and promotes solder flux to adhere to.Normally used soldering flux major part is made up of separately rosin or by rosin and activating additive-as the hydrochloride of amine or oxalic acid derivative-form.
After the welding, welding makes the thermal destruction of part rosin, will remove on soldering flux and the soldering flux residue slave plate with a kind of organic solvent composition usually.Because it is very necessary removing pollutent from wiring board, most of industrial wiring board purging method relates to the steam deflux technology of using at present.In steam deflux operation commonly used, the wiring board that welds is by the groove of a boiling organic solvent, remove the rosin of most rosin-comprise thermal destruction-fill the groove of distilled fresh solvent just by one then, it is passed from the steam of described boiling groove top, steam condenses in the circuit board, provides last rinsing with clear solvent distillation.In addition, if desired, before final rinsing, also can carry out hydro-peening to wiring board with solvent distillation.
On April 10th, 1989, the sequence number of application was 07/335, U.S.'s unexamined patent application described 1 of 940,1-two chloro-2,2,2-three fluoro ethane and 1, azeotropic, the azeotropic based composition of 1-two chloro-1-fluoroethanes are the fine solvent systems of cleaning wiring board, industrial application for reality, as other many solvent systems, these solvent systems must be stabilized, to prevent the variation of composition in use and long storage process.As oxidation, polymerization, component interphase interaction etc. similarly variation may produce the product that the wiring board that is cleaned or solvent compositions itself are caused disadvantageous effect.
Therefore the purpose of this invention is to provide 1,1-two chloro-2,2,2-three fluoro ethane and 1, azeotropic, the azeotropic based composition of 1-two chloro-1-fluoroethanes, said composition is formed stable in use and long storage process, and reduces the formation that may clean the undesirable reaction product that cause harmful effect to electronic circuit board.
Found a kind of comprising by 1 of effective dose, 1-two chloro-2,2,2-three fluoro ethane and 1, the azeotropic based composition of the stabilization of the azeotropic based composition that 1-two chloro-1-fluoroethanes are formed, this class azeotropic based composition has boiling point about 31 ℃ under basic normal atmosphere and comprises Nitromethane 99Min., the diisopropylamine, 1 of effective consistent dose, one or more stabilizer component in 2-butylene oxide ring and/or the 4-methoxyphenol.Stabilizer component also can comprise with or without diisopropylamine, 1, the 1,2 epoxy prapane and the Nitromethane 99Min. of one or more effective stabilization dosage in 2-butylene oxide ring and/or the 4-methoxyphenol.
Effective dose is meant 1,1-two chloro-2,2,2-three fluoro ethane (HCFC-123) and 1, the amount of 1-two chloro-1-fluoroethanes (HCFC-141b), when it combined, the sequence number that causes forming the application in 10 days April in 1989 of quoting as a reference here was 07/335,940 U.S. Patent application is disclosed, directly the azeotropic based composition of relevant invention.
Effectively stabilization dosage is meant at least some one or more Nitromethane 99Min., diisopropylamine, 1,2-butylene oxide ring and/or 4-methoxyphenol.Effectively stabilization dosage also refers at least some with or without diisopropylamine, 1, one or more 1,2 epoxy prapane and Nitromethane 99Min. in 2-butylene oxide ring and/or the 4-methoxyphenol.When the disclosed compound and 1 of effective stabilization agent amount, 1-two chloro-2,2,2-three fluoro ethane (CHCl
2CF
3) and 1,1-two chloro-1-fluoroethane (CCl
2FCH
3) the azeotropic based composition mix after, they can make this azeotropic based composition be suitable for coml and use and store, and promptly provide commercial acceptable outward appearance, corrodibility and to the resistivity of this azeotropic based composition integrity loss.
Commercial available HCFC-123 may contain a spot of 1,2-two chloro-1,1,2-three fluoro ethane, 1 more than 20.0% weight for example, 2-two chloro-1,1,2-three fluoro ethane (HCFC-123a), this mixture is generally with 1,1-two chloro-2,2,2-three fluoro ethane (HCFC-123) and a small amount of other material impurities that can significantly not change cleaning solvent composition azeotropic characteristic are summarized expression.
The composition of stabilization of the present invention can comprise 1 of effective dose, 1-two chloro-2,2,2-three fluoro ethane and 1,1-two chloro-1-fluoroethane mixtures.This composition forms the azeotropic based composition, this Azeotrope compositions can contain the Nitromethane 99Min. of about 0.1 to 0.8% weight, 1 of about 0.05 to 0.4% weight, the 2-propylene oxide, in the 4-methoxyphenol of the diisopropylamine of about 0.025 to 0.2% weight and about 0.002 to 0.016% weight one or more, the weight percent of described stablizer are that the weight with Azeotrope compositions is that radix calculates.
Azeotrope compositions of the present invention comprises 1,1-two chloro-2,2,2-three fluoro ethane and 1,1-two chloro-1-fluoroethane mixtures, in more detail, composition of the present invention comprises 1 of about 1-99% weight, 1-two chloro-2,2,1 of 2-three fluoro ethane and about 99-1% weight, the mixture of 1-two chloro-1-fluoroethanes.
Azeotrope compositions of the present invention also can comprise 1 of about 20-80% weight, 1-two chloro-2,2,2-three fluoro ethane and approximately 80-20% weight 1,1-two chloro-1-fluoroethane mixtures, this mixture under basic normal atmosphere, about 31 ℃ of boilings.
Have been found that and contain 1 of about 35% weight of Schwellenwert, 1-two chloro-2,2, the Azeotrope compositions of the present invention of 2-three fluoro ethane is non-flammable, this is according to determining with the similar flammability test of ASTME918.
The preferred azeotropic based composition of the present invention has following composition: 1 of about 65% weight, 1-two fluoro-2,2,1 of 2-three fluoro ethane and about 35% weight, 1-two chloro-1-fluoroethanes.This azeotropic based composition boiling point under basic normal atmosphere is approximately 31 ℃.
Above-mentioned azeotropic based composition is the active solvent that cleans electronic circuit board.This solvent compositions is characterised in that to have following desirable performance: relatively low boiling point, non-inflammability, low relatively toxicity and to the high resolution of soldering flux and soldering flux residue.Various components also can easily reclaim and re-use and not lose their desirable characteristics, and this is because their azeotropic properties and relative low boiling point.
Because 1,1-two chloro-2,2,2-three fluoro ethane and 1, the azeotropic based composition of 1-two chloro-1-fluoroethanes is respond well in the application of printed-wiring board (PWB) steam deflux-degrease, people recognize the peculiar property that utilizes these solvent compositions for actual, when particularly these solvent systems being used for commercial purpose, should give said composition some other desirable character.
A this desirable character is package stability.People know any often essential storage of material that will be used for commerce.This storage may be the stage of a weak point, or some months or even the long term in several years.Therefore, it is useful making solvent compositions, and they should be stabilized, changes to resist any significant being harmful to that may cause owing to oxidation, polymerization or component interphase interaction in storing or using.This variation may cause solvent to fade, and forms the undesirable byproduct that resembles chloride ion and acid, and/or generates insoluble polymer matter.Have been found that the above-claimed cpd that adds in one or more aforementioned concentration ranges can be used as effective shelf-stable agent.
Another characteristic that conforms with commercial requirement that will give solvent system is to use stability.For example, as mentioned above, in steam deflux cleaning process, the circuit that is cleaned by at first by a groove that fills boiling solvent, to remove most of rosin, comprise thermal destruction rosin.Organic solvent contacts for a long time with thermal source in this groove.After passing through first groove, wiring board makes the solvent vapo(u)r of wiring board by the groove top of seething with excitement at last by a groove that fills the fresh solvent that has just distilled out, and makes wiring board obtain the final rinsing of condensation cleaning solvent thereon.Therefore in use, no matter be in keeping the ebullient groove or at evaporating solvent, in the circuit board it to be carried out in the final rinsing heating that organic solvent is continued fresh solvent distillation to be provided or to produce vapor condensation.Therefore very wish to reduce any variation that may cause harmful effect or reduction solvent integrity in the solvent system to cleaning.As previously mentioned, this variation may cause owing to oxidation, polymerization or each component of solvent system act on each other.
For example, a kind of this type of interaction that should reduce is Chlorofluorocarbons (CFCs) and intermetallic interaction, can produce sour byproduct and chloride ion under this interaction high temperature.Responsive especially through being commonly used for the reactive metal wiring board construction material, for example zinc and aluminium and some aluminium alloy and so on to this interaction.Found that Nitromethane 99Min. can mix this solvent system with the concentration of about 0.1 to 0.8% weight, and can stop this class chemical corrosion effectively, in addition can also prevent the formation of gelinite.
Comprise that concentration is the diisopropylamine of about 0.025 to 0.2% weight, concentration is the 4-methoxyphenol of about 0.002 to 0.016% weight, concentration is approximately the stability that the 1,2 epoxy prapane of 0.05 to 0.4% weight and stabiliser composition that concentration is approximately the Nitromethane 99Min. of 0.05 to 0.8% weight have improved this solvent system.All weight percents all are with 1,1-two chloro-2,2, and 2-three fluoro ethane and 1, the weight of 1-two chloro-1-fluoroethane Azeotrope compositions is that radix calculates.
As shown in example,, show the stability that has improved solvent system when stablizer (4-methoxyphenol, 1,2 epoxy prapane, diisopropylamine and Nitromethane 99Min.) when together being used for this solvent system.The acceptable execution scope of stabilizer concentration, common when using (as disclosed herein) being at their with use separately.Should be understood that the concentration that can adopt the stabilizer concentration that is higher than those regulations; Yet under normal circumstances the higher stable agent concentration generally can not provide extra inhibition benefit.
For providing other acceptable inhibitor-stabiliser systems of storage and stability in use, aforementioned Azeotrope compositions has:
The inhibitor weight percent
Nitromethane 99Min. 0.2
Diisopropylamine 0.05
1,2-butylene oxide ring 0.05
4-methoxyphenol 0.004
Nitromethane 99Min.+1,2 epoxy prapane 0.2+0.05
Nitromethane 99Min.+1,2-butylene oxide ring 0.2+0.05
Nitromethane 99Min.+1,2 epoxy prapane+
Diisopropylamine 0.2+0.05+0.05
Nitromethane 99Min.+1, the 2-butylene oxide ring+
Diisopropylamine 0.2+0.05+0.05
Nitromethane 99Min.+1,2 epoxy prapane+
1,2-butylene oxide ring 0.2+0.05+0.05
Nitromethane 99Min.+1,2 epoxy prapane+
4-methoxyphenol 0.2+0.05+0.004
The preferred stabilization azeotropic of the present invention, azeotropic based composition contain 1 of about 65% weight, 1-two chloro-2,2,2-three fluoro ethane, 1 of about 35% weight, 1-two chloro-1-fluoroethanes, the Nitromethane 99Min. of about 0.1 to 0.8% weight, the 1,2 epoxy prapane of about 0.05 to 0.4% weight, the 4-methoxyphenol of the diisopropylamine of about 0.025 to 0.2% weight and about 0.002 to 0.016% weight.
The azeotropic based composition of the preferred stabilization of the present invention contains 1 of about 65% weight, 1-two chloro-2,2,2-three fluoro ethane, 1 of about 35% weight, 1-two chloro-1-fluoroethanes, the Nitromethane 99Min. of about 0.2% weight, the 1,2 epoxy prapane of about 0.05% weight, the 4-methoxyphenol of the diisopropylamine of about 0.05% weight and about 0.004% weight.
The invention provides 1 of stabilization like this, 1-two chloro-2,2,2-three fluoro ethane and 1, the azeotropic based composition of 1-two chloro-1-fluoroethanes, said composition can long storage, no matter still all seldom or not changes in commercial use in long storage, and reduced the corrosion of aluminium and the formation of gelinite.
Is inhibitor and azeotropic based composition blended method of the present invention technique known.They can mix or cooperate any method that makes things convenient for of required component dosage to prepare with being included in the suitable containers.Method is the dosage that weighs up required component preferably, in a proper container they is mixed then.
The azeotropic based composition of aforementioned stableization is very low to the consumption potentiality of ozone, and can expect that be over their just almost whole decomposition before arriving stratosphere.
Because the azeotropic properties of the azeotropic based composition of stabilization of the present invention, they can easily reclaim and re-use from the solvent of steam deflux and degrease operation.As an example, azeotropic mixture of the present invention can be used for the cleaning as 3,881, No. 949 patents descriptions of the U.S., and this United States Patent (USP) is incorporated in this as a reference.
Embodiment
1 of about 65% weight, 1-two chloro-2,2,1 of 2-three fluoro ethane and about 35% weight, seven days contrast stability experiments of the solvent system that 1-two chloro-1-fluoroethanes and various inhibitor are combined to form are by the pyrex board (Pyrex at a series of 500ml
) reflux in the flask and carry out, solvent for use is 25 ℃ of 90% water saturated solvents down.The flask water-cooled prolong of ining succession, the prolong top is fixed with Drierite
The board desiccant tube is used for removing steam the atmosphere from experimental system.In addition, the sample of stainless steel (SS-304) is placed on the interface of the reflux solvent steam/air in the condenser, and the stainless steel that is bound up (SS-304)/aluminium alloy (AL-7075) sample is placed in the ebullient liquid.
Use in these experiments 1,1-two chloro-1-fluoroethanes contain the vinylidene chloride of about 500ppm weight, this is that raw product contains a kind of impurity usually; But do not use vinylidene chloride in No. 1 experiment below.Tested solvent inhibitor system has explanation in table.
After experiment is finished, carry out following test to each independent experimental system.
1. at the end test chloride ion concentration in experiment, method is with isopyknic deionized water extraction solvent, then divides the concentration of chloride ion in the bleed.The solvent chloride ion concentration of initial not inhibiting is lower than 0.2ppm, and the forfeiture of solvent system component stability is generally represented in the increase of chloride ion.Loss of stability generally is accompanied by acidity to be increased.
2. to change (at the end pH value deducts the pH value when initial) be with the acid in the deionized water extraction solvent of isopyknic PH neutrality (PH=7) to the PH of solvent, checks the method for the pH value of water to measure again.
3. the mensuration of erosion rate is that the outwash surface uses 1,1 in order, 2-trichlorotrifluoroethane, deionized water and acetone rinsing sample with ink and Eraser with pencil holder friction metallic surface.Use Drierite
Dry 24 hours of board siccative, and the weighing sample is to 0.0001g.Test button weight loss is represented with mils per year.The aluminium of 4 mils per year (Al-7075) erosion rate is considered to acceptable.
4. the judgement criteria below using is carried out visual valuation to the outward appearance of solvent and aluminium sample (Al-7075):
Outward appearance
Whether estimate qualified liquid aluminium-7075(*)
The 0th, no change or changes little
Transparent, colourless.The gel-free light
The body pearl.
The 1st, very, very slight but acceptable variation
Very slight, transparent, do not have on about 1% surface
The gelinite pearl of look is formed with very, and is very slight
Corrosion
2 critically observe very slight threshold variations.To predetermined finally should
With can be qualified maybe can be underproof.
Transparent.Slight gelinite is at about 10-20%
The surface that pearl forms has very slight
Corrosion or black splotch deposition.
3 do not observe slight, underproof variation
The surface of coagulating that moderate is arranged in the liquid about 50%
Slight spot and corruption are arranged on the colloid pearl
Erosion
4 do not have in the liquid a large amount of gels-
The body pearl
(*) total overall reaction all occurs in the liquid on the Al-7075 and SS-304 bonded surface.Except testing 13, the SS-304 sample is constant basically in whole experiment.
Claims (17)
1, a kind of Azeotrope compositions of stabilization comprises by 1 of about 80-20% weight, 1-two chloro-2,2,1 of 2-three fluoro ethane and about 20-80% weight, the Azeotrope compositions that 1-two chloro-1-fluoroethanes are formed, the boiling point of described Azeotrope compositions under basic normal atmosphere is approximately 31 ℃, described Azeotrope compositions is mixed with the Nitromethane 99Min. of effective stabilization dosage, diisopropylamine, 1, one or more in 2-butylene oxide ring and the 4-methoxyphenol.
2, the Azeotrope compositions of stabilization as claimed in claim 1, wherein 1,1-two chloro-2,2,2-three fluoro ethane account for about 65% weight, and 1,1-two chloro-1-fluoroethanes account for about 35% weight.
3, the Azeotrope compositions of stabilization as claimed in claim 1, it is to calculate according to the weight of Azeotrope compositions that the Nitromethane 99Min. of about 0.2% weight, described weight percent are wherein arranged.
4, the Azeotrope compositions of stabilization as claimed in claim 1, it is to calculate according to the weight of Azeotrope compositions that the diisopropylamine of about 0.05% weight, described weight percent are wherein arranged.
5, the Azeotrope compositions of stabilization as claimed in claim 1 wherein has 1 of about 0.05% weight, and 2-butylene oxide ring, described weight percent are to calculate according to the weight of Azeotrope compositions.
6, the Azeotrope compositions of stabilization as claimed in claim 1, it is to calculate according to the weight of Azeotrope compositions that the 4-methoxyphenol of about 0.004% weight, described weight percent are wherein arranged.
7, a kind of Azeotrope compositions of stabilization comprises by 1 of about 80-20% weight, 1-two chloro-2,2,1 of 2-three fluoro ethane and about 20-80% weight, the Azeotrope compositions that 1-two chloro-1-fluoroethanes are formed, the boiling point of described Azeotrope compositions under basic normal atmosphere is approximately 31 ℃, described Azeotrope compositions be mixed with effective stabilization dosage with or without diisopropylamine, 1, one or more 1,2 epoxy prapane and Nitromethane 99Min. in 2-butylene oxide ring and the 4-methoxyphenol.
8, the Azeotrope compositions of stabilization as claimed in claim 7, the Nitromethane 99Min. that about 0.05 to 0.8% weight is wherein arranged, 1 of about 0.05 to 0.4% weight, the 2-propylene oxide, the 4-methoxyphenol of the diisopropylamine of about 0.025 to 0.2% weight and/or about 0.002 to 0.016% weight, described weight percent are to calculate according to the weight of Azeotrope compositions.
9, the Azeotrope compositions of stabilization as claimed in claim 7 wherein has the Nitromethane 99Min. of about 0.2% weight, the 1,2 epoxy prapane of about 0.05% weight, the 4-methoxyphenol of the diisopropylamine of about 0.05% weight and about 0.004% weight.
10, the Azeotrope compositions of stabilization as claimed in claim 7 wherein has the Nitromethane 99Min. of about 0.2% weight and the 1,2 epoxy prapane of about 0.05% weight, and described weight percent is to calculate according to the weight of Azeotrope compositions.
11, the Azeotrope compositions of stabilization as claimed in claim 7, the Nitromethane 99Min. that about 0.2% weight is wherein arranged, the diisopropylamine of the 1,2 epoxy prapane of about 0.05% weight and about 0.05% weight, described weight percent are to calculate according to the weight of Azeotrope compositions.
12, the Azeotrope compositions of stabilization as claimed in claim 7, the Nitromethane 99Min. that about 0.2% weight is wherein arranged, 1 of the 1,2 epoxy prapane of about 0.05% weight and about 0.05% weight, 2-butylene oxide ring, described weight percent are to calculate according to the weight of Azeotrope compositions.
13, the Azeotrope compositions of stabilization as claimed in claim 7, the Nitromethane 99Min. that about 0.2% weight is wherein arranged, the 4-methoxyphenol of the 1,2 epoxy prapane of about 0.05% weight and about 0.004% weight, described weight percent are to calculate according to the weight of Azeotrope compositions.
14, a kind of method of cleaning solid surface comprises the Azeotrope compositions of the stabilization of using claim 1.
15, a kind of method of cleaning solid surface comprises the Azeotrope compositions of the stabilization of using claim 7.
16, a kind of method of polymer foaming, the Azeotrope compositions that comprises the stabilization of using claim 1 is as whipping agent.
17, a kind of method of polymer foaming, the Azeotrope compositions that comprises the stabilization of using claim 7 is as whipping agent.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US41770589A | 1989-10-05 | 1989-10-05 | |
| US417,705 | 1989-10-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1051203A true CN1051203A (en) | 1991-05-08 |
Family
ID=23655075
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN90109210A Pending CN1051203A (en) | 1989-10-05 | 1990-10-05 | 1,1-two chloro-2,2,2-three fluoro ethane and 1, the stabilization Azeotrope compositions of 1-two chloro-1-fluoroethanes |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP0421790A2 (en) |
| JP (1) | JPH03237199A (en) |
| KR (1) | KR910008169A (en) |
| CN (1) | CN1051203A (en) |
| AU (1) | AU6387190A (en) |
| BR (1) | BR9005006A (en) |
| CA (1) | CA2026865A1 (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5177270A (en) * | 1991-10-09 | 1993-01-05 | Elf Atochem North America, Inc. | Stabilized 141b |
| JP2710090B2 (en) * | 1991-10-09 | 1998-02-10 | エルフ・アトケム・ノース・アメリカ・インコーポレイテッド | 141b stabilized |
| US5169995A (en) * | 1991-10-09 | 1992-12-08 | Elf Atochem North America, Inc. | Inhibited 141b |
| BE1006190A5 (en) * | 1992-09-29 | 1994-06-07 | Solvay | 1,1-dichloro-1-fluoroethane STABILIZED, PREMIXTURES FOR THE PREPARATION OF POLYMER FOAM AND FOAM POLYMER OBTAINED BY THEIR IMPLEMENTATION. |
| US5602189A (en) * | 1996-03-04 | 1997-02-11 | Intercool Energy Corporation | Process for forming polyisocyantate-based foam and product formed thereby |
| US5684056A (en) * | 1996-08-20 | 1997-11-04 | Intercool Energy Corporation | Polyisocyanate-based foam and blowing agent therefor |
| ES2632922T5 (en) | 2006-09-01 | 2020-12-02 | Chemours Co Fc Llc | Terephthalate stabilizers for fluoroolefins |
| CN104107970A (en) * | 2014-07-24 | 2014-10-22 | 苏州南新电机有限公司 | Technology for removing residual soldering flux after tin soldering |
-
1990
- 1990-10-03 CA CA002026865A patent/CA2026865A1/en not_active Abandoned
- 1990-10-04 EP EP90310884A patent/EP0421790A2/en not_active Withdrawn
- 1990-10-05 BR BR909005006A patent/BR9005006A/en unknown
- 1990-10-05 KR KR1019900015942A patent/KR910008169A/en not_active Application Discontinuation
- 1990-10-05 AU AU63871/90A patent/AU6387190A/en not_active Abandoned
- 1990-10-05 JP JP2266543A patent/JPH03237199A/en active Pending
- 1990-10-05 CN CN90109210A patent/CN1051203A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| AU6387190A (en) | 1991-04-11 |
| BR9005006A (en) | 1991-09-10 |
| EP0421790A2 (en) | 1991-04-10 |
| JPH03237199A (en) | 1991-10-23 |
| CA2026865A1 (en) | 1991-04-06 |
| KR910008169A (en) | 1991-05-30 |
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