CN105097619A - Wet etching device - Google Patents
Wet etching device Download PDFInfo
- Publication number
- CN105097619A CN105097619A CN201510556437.8A CN201510556437A CN105097619A CN 105097619 A CN105097619 A CN 105097619A CN 201510556437 A CN201510556437 A CN 201510556437A CN 105097619 A CN105097619 A CN 105097619A
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- CN
- China
- Prior art keywords
- chip
- pressure sensor
- wet etching
- etching device
- liquid
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F23/00—Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm
- G01F23/14—Indicating or measuring liquid level or level of fluent solid material, e.g. indicating in terms of volume or indicating by means of an alarm by measurement of pressure
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Fluid Mechanics (AREA)
- Weting (AREA)
- ing And Chemical Polishing (AREA)
- Measuring Fluid Pressure (AREA)
Abstract
The invention provides a wet etching device. The wet etching device comprises a chemical tank, a resistance type pressure sensor, a chip, a single-chip and a displayer, wherein the chip is connected with the resistance type pressure sensor through a wire; the chip is connected with the single-chip through the wire; the single-chip is connected with the displayer through the wire; the resistance type pressure sensor, the chip and the single-chip are connected with a power source. The wet etching device is not affected by viscidity of an etching solution and can monitor the liquid level of the etching solution exactly.
Description
[technical field]
The present invention relates to LCDs technical field, particularly one wets etching device.
[background technology]
In the manufacture craft of liquid crystal display, wet etching process is wherein important a kind of etching technics.Under the state that wet etching apparatus runs automatically, the liquid level of the etching liquid to chemical tank is needed to carry out Real-Time Monitoring, to discharge or supply etching liquid as required.At present, in wet etching process field, the method that the liquid level for etching liquid carries out monitoring is, completes the monitoring of the liquid level to etching liquid by organizing magnetic induction float type inductor more, wherein often organizes the corresponding one group of liquid level index of magnetic induction float type inductor.Generally, important liquid level index has six groups, be followed successively by the too high alarming levels of liquid level (HH) from top to bottom, liquid supplies the high liquid level (H) of stopping automatically, the liquid level (MH) of supply stopping in a small amount, the liquid level (ML) that a small amount of supply starts, low liquid level warning liquid level (L), the emptying sign liquid level (LL) of spray tank.Like this, six groups of liquid level indexs just need six groups of magnetic induction float type inductors.Moreover, in real world applications, etching liquid belongs to the higher liquid of viscosity ratio, and magnetic induction float type inductor is easily stuck in the liquid that viscosity is higher, causes testing result inaccuracy, or sends the liquid level signal of mistake.
[summary of the invention]
The object of the present invention is to provide a kind of wet etching device, what this device did not glue stickiness by etching liquid affects the liquid level that monitor goes out to etch liquid.
Technical scheme of the present invention is as follows:
A kind of wet etching device, comprising:
One chemical tank, for holding liquid, described liquid is used for etching semiconductor device;
One resistive pressure sensor, is installed on the bottom of described chemical tank, for measuring the pressure of described liquid, and described pressure is changed into voltage signal and is sent to chip and carries out data quantification treatment;
One chip, for receiving described voltage signal and carrying out data quantification treatment to it, is sent to single-chip microcomputer by the result of described data quantification treatment simultaneously and carries out analyzing and processing;
One single-chip microcomputer, for receiving the result of described data quantification treatment, and carrying out data processing to it, judging simultaneously to the liquid level of the liquid of described chemical tank, and determines the peak of the described liquid level that display will show;
Display, for showing the peak of described liquid level;
Wherein, described chip is connected with described resistive pressure sensor by electric wire, described chip is connected by electric wire with described single-chip microcomputer, and described single-chip microcomputer is connected by electric wire with described display, and described resistive pressure sensor, chip are all connected with power supply with single-chip microcomputer.
Preferably, described resistive pressure sensor is installed on the side bottom described chemical tank.
Preferably, the number of described resistive pressure sensor is two.
Preferably, described resistive pressure sensor surface is provided with protective film.
Preferably, described protective film is made up of resistant material.
Preferably, the outside of described resistive pressure sensor is provided with guard box, and the side bottom described guard box is provided with aperture.
Preferably, the making material of described guard box is polyvinyl chloride.
Preferably, described guard box is fixed on the bottom of described chemical tank.
Preferably, the connection electric wire of described chip and described resistive pressure sensor is provided with protection tube, and described connection electric wire immerses described liquid part is sealed by described protection tube.
Preferably, described protection tube is made up of resistant material.
Beneficial effect of the present invention:
One of the present invention wets etching device, the pressure data collection of liquid is completed by the resistive pressure sensor be arranged on bottom chemical tank, again by the liquid level change of the change indirect determination liquid of liquid pressure, only need a resistive pressure sensor can complete the mensuration of many group liquid liquid levels, and the mensuration effect of resistive pressure sensor does not glue the impact of stickiness by liquid.
[accompanying drawing explanation]
Fig. 1 is the composition block schematic illustration of a kind of wet etching device of the present invention;
Fig. 2 is the workflow schematic diagram of a kind of wet etching device of the present invention;
[embodiment]
The explanation of following embodiment is graphic with reference to what add, can in order to the specific embodiment implemented in order to illustrate the present invention.The direction term that the present invention mentions, such as " on ", D score, "front", "rear", "left", "right", " interior ", " outward ", " side " etc., be only the direction with reference to annexed drawings.Therefore, the direction term of use is in order to illustrate and to understand the present invention, and is not used to limit the present invention.In the drawings, the unit of structural similarity represents with identical label.
Embodiment 1
As shown in Figure 1, be the composition block schematic illustration of a kind of wet etching device of the present invention.As shown in Figure 2, the workflow schematic diagram of a kind of wet etching device of the present invention.As can be seen from Figure 1, one of the present invention wets etching device, comprise chemical tank 1, resistive pressure sensor 3, chip 7, single-chip microcomputer 8 and a display 9, wherein, described chip 7 is connected with described resistive pressure sensor 3 by electric wire, described chip 7 is connected by electric wire with described single-chip microcomputer 8, and described single-chip microcomputer 8 is connected by electric wire with described display 9, and described resistive pressure sensor 3, chip 7 are all connected with power supply with single-chip microcomputer 8.
Below, each several part of a kind of wet etching device of the present invention is introduced:
Chemical tank 1 of the present invention is for holding liquid 2, and described liquid 2 is for etching semiconductor device.The shape of cross section of chemical tank 1 can be square or circular, and the present embodiment is preferably square, puts more convenient because square, and is conducive to the movement of guard box 4 of resistive pressure sensor 3 below.
Resistive pressure sensor 3 of the present invention is installed on the bottom of described chemical tank 1, preferably, described resistive pressure sensor 3 is installed on the side bottom described chemical tank 1, for measuring the pressure of described liquid 2, and described pressure is changed into voltage signal and be sent to chip 7 and carry out data quantification treatment.In the present embodiment; in order to prevent liquid 2 flow when liquid 2 (mainly supplement the stirring of liquid 2) damage and mistake induction are caused to resistive pressure sensor 3; to cause the measurement result of resistive pressure sensor 3 inaccurate; special resistive pressure sensor 3 of giving is provided with polyvinyl chloride guard box 4; and described resistive pressure sensor 3 surface is also provided with protective film (not indicating in figure) avoids it to be subject to the erosion of described liquid 2, and described protective film is made up of resistant material.In addition; keep being communicated with the liquid 2 of the chemical tank 1 of outside to make the resistive pressure sensor 3 in described polyvinyl chloride guard box 4; the side of the present invention bottom described polyvinyl chloride guard box 4 is provided with aperture 5; so no matter how low the liquid level of the liquid 2 of chemical tank 1 is, and the pressure at described resistive pressure sensor 3 place can be consistent with the pressure in other place of described chemical tank 1.
The present embodiment also preferred described polyvinyl chloride guard box 4 is fixed on the bottom of described chemical tank 1, protective resistance formula pressure sensor 3 better, makes it not by the damage of liquid 2 internal circulation flow.
In addition; because the connection electric wire of chip 7 and resistive pressure sensor 3 is among liquid 2; in order to protect connection electric wire; the present embodiment also preferred described chip 7 is provided with protection tube 6 with the connection electric wire of described resistive pressure sensor 3; described protection tube 6 is made up of resistant material, and described connection electric wire immerses described liquid 2 part is sealed by described protection tube 6.
The voltage signal that chip 7 of the present invention sends for receiving described resistive pressure sensor 3, and data quantification treatment is carried out to voltage signal, the result of described data quantification treatment is sent to single-chip microcomputer 8 simultaneously and carries out analyzing and processing.The preferred described chip 7 of the present embodiment is HX711 chip 7, after HX711 chip 7 receives the voltage signal that resistive pressure sensor 3 sends, voltage signal is amplified, then convert the analog voltage signal after amplification to programmable digital signal, namely represent the size of analog voltage signal by the value of digital signal.
Single-chip microcomputer 8 of the present invention for receiving the result of the data quantification treatment of described HX711 chip 7 transmission, and carries out data processing to it, judges simultaneously, and determine the peak of the described liquid level that display 9 will show to the liquid level of the liquid 2 of described chemical tank 1.The preferred described single-chip microcomputer 8 of the present embodiment is STC89C52 single-chip microcomputer 8, STC89C52 single-chip microcomputer 8 is according to factors such as the density of the actual cross sections sum liquid 2 of chemical tank 1, the digital signal received is calculated through pressure formula p=ρ gh, be converted to the height value of the liquid level of liquid 2, and this height value and the liquid level step values set on single-chip microcomputer 8 are in advance compared judgement, draw the fluid level of current liquid 2.Finally described height value and fluid level are stored temporarily, and the result obtained is sent to programmable logic device (PLC) analyzes, make further action command by PLC, as supplemented or reducing liquid 2 etc.
Display 9 of the present invention is for showing the peak of described liquid level.In order to make display effect better, the preferred described display 9 of the present embodiment is 12864 liquid crystal display 9.
The preferred described wet etching device of the present embodiment also comprises computer, described single-chip microcomputer 8 is connected with computer, described computer is used for carrying out PLC analysis to the result of the described data processing of described single-chip microcomputer 8, and carries out supplementary liquid 2 or minimizing liquid 2 according to PLC analysis result to chemical tank 1.
Embodiment 2
The present embodiment is roughly the same with embodiment 1, and difference is, the number of the described resistive pressure sensor 3 of the present embodiment is two.In order to draw measurement result more accurately, the present embodiment side bottom chemical tank 1 has installed two resistive pressure sensors 3, so just can obtain two groups of measurement data, if two groups of data difference very little just explanation measurement results are normal, can using their mean value as measured value.If two groups of data differ greatly, then illustrate that wherein at least one resistive pressure sensor 3 is out of joint, at this moment will check resistive pressure sensor 3 and repair.
The another one reason that the present embodiment installs two resistive pressure sensors 3 at chemical tank 1 is, once one of them resistive pressure sensor 3 is bad, another can also continue normal work, ensure that the continuation of surveying work.
In sum; although the present invention discloses as above with preferred embodiment; but above preferred embodiment is also not used to limit the present invention; those of ordinary skill in the art; without departing from the spirit and scope of the present invention; all can do various change and retouching, the scope that therefore protection scope of the present invention defines with claim is as the criterion.
Claims (10)
1. a wet etching device, is characterized in that, comprising:
One chemical tank, for holding liquid, described liquid is used for etching semiconductor device;
One resistive pressure sensor, is installed on the bottom of described chemical tank, for measuring the pressure of described liquid, and described pressure is changed into voltage signal and is sent to chip and carries out data quantification treatment;
One chip, for receiving described voltage signal and carrying out data quantification treatment to it, is sent to single-chip microcomputer by the result of described data quantification treatment simultaneously and carries out analyzing and processing;
One single-chip microcomputer, for receiving the result of described data quantification treatment, and carrying out data processing to it, judging simultaneously to the liquid level of the liquid of described chemical tank, and determines the peak of the described liquid level that display will show;
Display, for showing the peak of described liquid level;
Wherein, described chip is connected with described resistive pressure sensor by electric wire, described chip is connected by electric wire with described single-chip microcomputer, and described single-chip microcomputer is connected by electric wire with described display, and described resistive pressure sensor, chip are all connected with power supply with single-chip microcomputer.
2. wet etching device according to claim 1, is characterized in that, described resistive pressure sensor is installed on the side bottom described chemical tank.
3. wet etching device according to claim 1 and 2, is characterized in that, the number of described resistive pressure sensor is two.
4. wet etching device according to claim 1, is characterized in that, described resistive pressure sensor surface is provided with protective film.
5. wet etching device according to claim 4, is characterized in that, described protective film is made up of resistant material.
6. wet etching device according to claim 1, is characterized in that, the outside of described resistive pressure sensor is provided with guard box, and the side bottom described guard box is provided with aperture.
7. wet etching device according to claim 6, is characterized in that, the making material of described guard box is polyvinyl chloride.
8. wet etching device according to claim 6, is characterized in that, described guard box is fixed on the bottom of described chemical tank.
9. wet etching device according to claim 1, is characterized in that, the connection electric wire of described chip and described resistive pressure sensor is provided with protection tube, and described connection electric wire immerses described liquid part is sealed by described protection tube.
10. wet etching device according to claim 9, is characterized in that, described protection tube is made up of resistant material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510556437.8A CN105097619B (en) | 2015-09-01 | 2015-09-01 | A kind of wet etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510556437.8A CN105097619B (en) | 2015-09-01 | 2015-09-01 | A kind of wet etching device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105097619A true CN105097619A (en) | 2015-11-25 |
| CN105097619B CN105097619B (en) | 2018-01-26 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201510556437.8A Active CN105097619B (en) | 2015-09-01 | 2015-09-01 | A kind of wet etching device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109060074A (en) * | 2018-08-10 | 2018-12-21 | 广州极飞科技有限公司 | Device for storing liquid, by storage solution balance detection method, liquid storage detection device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003083794A (en) * | 2001-09-11 | 2003-03-19 | Texcell Kk | Differential pressure type liquid level-measuring apparatus having added correction operation function, and liquid level controller |
| CN101344419A (en) * | 2008-08-22 | 2009-01-14 | 佛山市海天调味食品有限公司 | Liquid level detection system of reservoir |
| US20140196537A1 (en) * | 2013-01-14 | 2014-07-17 | Auto Industrial Co., Ltd. | Integrated measuring apparatus for measuring vapor pressure and liquid level of liquid tank |
| CN104375521A (en) * | 2013-08-12 | 2015-02-25 | 苏州维艾普新材料股份有限公司 | Pressure sensing liquid level height control device |
-
2015
- 2015-09-01 CN CN201510556437.8A patent/CN105097619B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003083794A (en) * | 2001-09-11 | 2003-03-19 | Texcell Kk | Differential pressure type liquid level-measuring apparatus having added correction operation function, and liquid level controller |
| CN101344419A (en) * | 2008-08-22 | 2009-01-14 | 佛山市海天调味食品有限公司 | Liquid level detection system of reservoir |
| US20140196537A1 (en) * | 2013-01-14 | 2014-07-17 | Auto Industrial Co., Ltd. | Integrated measuring apparatus for measuring vapor pressure and liquid level of liquid tank |
| CN104375521A (en) * | 2013-08-12 | 2015-02-25 | 苏州维艾普新材料股份有限公司 | Pressure sensing liquid level height control device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109060074A (en) * | 2018-08-10 | 2018-12-21 | 广州极飞科技有限公司 | Device for storing liquid, by storage solution balance detection method, liquid storage detection device |
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| CN105097619B (en) | 2018-01-26 |
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