CN105085962A - Cold plasma treatment method of using mixed gas of argon and oxygen to create atmosphere for improving adhesiveness of fluorosilicone rubber - Google Patents

Cold plasma treatment method of using mixed gas of argon and oxygen to create atmosphere for improving adhesiveness of fluorosilicone rubber Download PDF

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Publication number
CN105085962A
CN105085962A CN201510534794.4A CN201510534794A CN105085962A CN 105085962 A CN105085962 A CN 105085962A CN 201510534794 A CN201510534794 A CN 201510534794A CN 105085962 A CN105085962 A CN 105085962A
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China
Prior art keywords
cold plasma
oxygen
trifluoropropyl siloxane
mixed gas
argon
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Pending
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CN201510534794.4A
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Chinese (zh)
Inventor
孟江燕
陈玉如
王云英
孙旭
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Nanchang Hangkong University
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Nanchang Hangkong University
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Priority to CN201510534794.4A priority Critical patent/CN105085962A/en
Publication of CN105085962A publication Critical patent/CN105085962A/en
Pending legal-status Critical Current

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Abstract

The invention discloses a cold plasma treatment method of using mixed gas of argon and oxygen to create atmosphere for improving adhesiveness of fluorosilicone rubber. The cold plasma treatment method aims to improve adhesiveness of the fluorosilicone rubber. The method includes the steps: (1), in the atmosphere with the mixed gas of argon and oxygen and of 15-30Pa in vacuum degree, adopting cold plasma to treat the fluorosilicone rubber; (2), setting treatment power to be 120-140 watts and time to be 2-3 minutes; (3), within 5h after treatment, using Chemlok adhesive CH607 to bond the fluorosilicone rubber with a polytef film, and vulcanizing for 30 minutes at temperature of 160-170 DEG C. The cold plasma treatment method has the advantage that bonding strength of the fluorosilicone rubber and the polytef film is improved from 0 to at least 700Nm, and has no influence on physical and mechanical performance of the fluorosilicone rubber.

Description

A kind of with the cold plasma treating method of argon gas/oxygen mixed gas for atmosphere raising trifluoropropyl siloxane cementability
Technical field
The present invention relates to a kind of surface treatment method improving trifluoropropyl siloxane bonding strength, after particularly relating to the cold plasma process trifluoropropyl siloxane surface of a kind of argon gas/oxygen mixed gas atmosphere, realize the method improving its bonding force.
Background technology
The backbone structure of trifluoropropyl siloxane is siloxane bond Si-O, side chain has the linear polymer of fluoroalkyl or fluoro aryl, is used for the sealing under hot environment as specialty elastomer.In order to improve the medium-resistance of trifluoropropyl siloxane further, can be the polytetrafluoroethylene film of 5 ~ 20 microns in its Surface coating a layer thickness.The trifluoropropyl siloxane that adhesiveproperties is very poor is needed its modifying surface to improve adhesiveproperties.
Present method adopts argon gas/oxygen mixed gas as atmosphere, carries out cold plasma process, make trifluoropropyl siloxane possess the cementability with polytetrafluoroethylene film to trifluoropropyl siloxane.
Summary of the invention
Provided by the invention a kind of with the cold plasma treating method of argon gas/oxygen mixed gas for atmosphere raising trifluoropropyl siloxane cementability, it is characterized in that method steps is as follows:
(1) the bonding trifluoropropyl siloxane of preparation is put into the processing tank of cold plasma equipment, be first evacuated to vacuum tightness and be less than 3Pa;
(2) pass into the mixed gas that volume ratio is the argon gas/oxygen of 1:1, adjustment vacuum tightness is 15 ~ 30Pa;
(3) on load voltage and electric current carry out cold plasma process to trifluoropropyl siloxane, and processing power is 120 ~ 140 watts and treatment time is 120 ~ 180 seconds;
(4), after treatment in 5 hours, with Kai Muluoke sizing agent CH607, the trifluoropropyl siloxane of cold plasma process is carried out bonding with tetrafluoroethylene, and the sulfuration 30 minutes of 160 ~ 170 DEG C.
The industrial oxygen of the straight argon of the purity 99.99% of argon gas of the present invention, the purity 99.5% of oxygen.
Employing the inventive method of the present invention, the bonding strength between trifluoropropyl siloxane and tetrafluoroethylene brings up to more than 700 ns/m from 0.
Employing the inventive method of the present invention, can not reduce the physical and mechanical property of trifluoropropyl siloxane.
Advantage of the present invention is: the bonding strength of not carrying out between the trifluoropropyl siloxane of cold plasma process and tetrafluoroethylene is zero; After adopting the inventive method, the bonding strength of trifluoropropyl siloxane and tetrafluoroethylene is greater than 700 ns/m; The inventive method, can not affect the physical and mechanical property of trifluoropropyl siloxane simultaneously.
Embodiment
embodiment one
(1) the bonding trifluoropropyl siloxane of preparation is put into the processing tank of cold plasma equipment, be first evacuated to vacuum tightness and be less than 3Pa;
(2) pass into the mixed gas that volume ratio is the argon gas/oxygen of 1:1, adjustment vacuum tightness is 15Pa.The industrial oxygen of the straight argon of the purity 99.99% of argon gas, the purity 99.5% of oxygen;
(3) loading current and voltage carry out cold plasma to argon gas/oxygen mixed gas, process trifluoropropyl siloxane, and processing power is 120 watts, and the treatment time is 120 seconds;
(4), after treatment in 5 hours, with Kai Muluoke sizing agent CH607, the trifluoropropyl siloxane of cold plasma process is carried out bonding with tetrafluoroethylene, and the sulfuration 30 minutes of 160 ~ 170 DEG C.
(5) bonding strength between trifluoropropyl siloxane and polytetrafluoroethylene film is 710 ns/m.
embodiment two
(1) the bonding trifluoropropyl siloxane of preparation is put into the processing tank of cold plasma equipment, be first evacuated to vacuum tightness and be less than 3Pa;
(2) pass into the mixed gas that volume ratio is the argon gas/oxygen of 1:1, adjustment vacuum tightness is 20Pa.The industrial oxygen of the straight argon of the purity 99.99% of argon gas, the purity 99.5% of oxygen;
(3) loading current and voltage carry out cold plasma to argon gas/oxygen mixed gas, process trifluoropropyl siloxane, and processing power is 130 watts, and the treatment time is 150 seconds;
(4), after treatment in 5 hours, with Kai Muluoke sizing agent CH607, the trifluoropropyl siloxane of cold plasma process is carried out bonding with tetrafluoroethylene, and the sulfuration 30 minutes of 160 ~ 170 DEG C.
(5) bonding strength between trifluoropropyl siloxane and polytetrafluoroethylene film is 705 ns/m.
embodiment three
(1) the bonding trifluoropropyl siloxane of preparation is put into the processing tank of cold plasma equipment, be first evacuated to vacuum tightness and be less than 3Pa;
(2) pass into the mixed gas that volume ratio is the argon gas/oxygen of 1:1, adjustment vacuum tightness is 30Pa.The industrial oxygen of the straight argon of the purity 99.99% of argon gas, the purity 99.5% of oxygen;
(3) loading current and voltage carry out cold plasma to argon gas/oxygen mixed gas, process trifluoropropyl siloxane, and processing power is 140 watts, and the treatment time is 180 seconds;
(4), after treatment in 5 hours, with Kai Muluoke sizing agent CH607, the trifluoropropyl siloxane of cold plasma process is carried out bonding with tetrafluoroethylene, and the sulfuration 30 minutes of 160 ~ 170 DEG C.
(5) bonding strength between trifluoropropyl siloxane and polytetrafluoroethylene film 703 ns/m.
Note 1: the testing standard of adhesiveproperties
GB/T2791-1995 " tackiness agent T peeling strength test method flexible material is to flexible material ".
Note 2: the quality standard of oxygen, GB/T3863-2008 " industrial oxygen ".
Note 3: the quality standard of argon gas, GB/T4842-2006 " argon ".

Claims (4)

1., with the cold plasma treating method of argon gas/oxygen mixed gas for atmosphere raising trifluoropropyl siloxane cementability, it is characterized in that method steps is as follows:
(1) the bonding trifluoropropyl siloxane of preparation is put into the processing tank of cold plasma equipment, be first evacuated to vacuum tightness and be less than 3Pa;
(2) pass into the mixed gas that volume ratio is the argon gas/oxygen of 1:1, adjustment vacuum tightness is 15 ~ 30Pa;
(3) on load voltage and electric current carry out cold plasma process to trifluoropropyl siloxane, and processing power is 120 ~ 140 watts and treatment time is 120 ~ 180 seconds;
(4), after treatment in 5 hours, with Kai Muluoke sizing agent CH607, the trifluoropropyl siloxane of cold plasma process is carried out bonding with tetrafluoroethylene, and the sulfuration 30 minutes of 160 ~ 170 DEG C.
2. according to claim 1 a kind of with the cold plasma treating method of argon gas/oxygen mixed gas for atmosphere raising trifluoropropyl siloxane cementability, it is characterized in that: the industrial oxygen of the straight argon of the purity 99.99% of argon gas, the purity 99.5% of oxygen.
3. according to claim 1 a kind of with the cold plasma treating method of argon gas/oxygen mixed gas for atmosphere raising trifluoropropyl siloxane cementability, it is characterized in that: adopt the inventive method, the bonding strength between trifluoropropyl siloxane and tetrafluoroethylene brings up to more than 700 ns/m from 0.
4. according to claim 1 a kind of with the cold plasma treating method of argon gas/oxygen mixed gas for atmosphere raising trifluoropropyl siloxane cementability, it is characterized in that: adopt the inventive method, the physical and mechanical property of trifluoropropyl siloxane can not be reduced.
CN201510534794.4A 2015-08-27 2015-08-27 Cold plasma treatment method of using mixed gas of argon and oxygen to create atmosphere for improving adhesiveness of fluorosilicone rubber Pending CN105085962A (en)

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CN201510534794.4A CN105085962A (en) 2015-08-27 2015-08-27 Cold plasma treatment method of using mixed gas of argon and oxygen to create atmosphere for improving adhesiveness of fluorosilicone rubber

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106098442A (en) * 2016-08-19 2016-11-09 河南森源电气股份有限公司 Vacuum interrupter surface treatment method and pole forming method
CN108410372A (en) * 2018-04-03 2018-08-17 苏州睿研纳米医学科技有限公司 The adhering method and silicon rubber bond of silicon rubber
CN108752609A (en) * 2017-09-22 2018-11-06 南昌航空大学 A kind of method that argon medium Low Temperature Plasma Treating natural rubber vulcanized rubber improves adhesive property

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CN103421200A (en) * 2013-09-06 2013-12-04 成都同明新材料技术有限公司 Method for improving teflon adhesive property and method for producing pressure-sensitive adhesive tape
CN104292489A (en) * 2014-08-08 2015-01-21 苏州卫鹏机电科技有限公司 Surface modification method for improving shoe material bonding strength and application thereof
CN104772904A (en) * 2015-04-29 2015-07-15 南昌航空大学 Method for bonding teflon

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Publication number Priority date Publication date Assignee Title
CN102432905A (en) * 2011-08-16 2012-05-02 海宁市粤海彩印有限公司 Modification method for using low-temperature plasma to initiate gas-phase grafting on surface of polyethylene film
CN103421200A (en) * 2013-09-06 2013-12-04 成都同明新材料技术有限公司 Method for improving teflon adhesive property and method for producing pressure-sensitive adhesive tape
CN104292489A (en) * 2014-08-08 2015-01-21 苏州卫鹏机电科技有限公司 Surface modification method for improving shoe material bonding strength and application thereof
CN104772904A (en) * 2015-04-29 2015-07-15 南昌航空大学 Method for bonding teflon

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106098442A (en) * 2016-08-19 2016-11-09 河南森源电气股份有限公司 Vacuum interrupter surface treatment method and pole forming method
CN108752609A (en) * 2017-09-22 2018-11-06 南昌航空大学 A kind of method that argon medium Low Temperature Plasma Treating natural rubber vulcanized rubber improves adhesive property
CN108410372A (en) * 2018-04-03 2018-08-17 苏州睿研纳米医学科技有限公司 The adhering method and silicon rubber bond of silicon rubber

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Application publication date: 20151125