CN105068378B - A kind of flame retardant type SLA photosensitive resin for 3D printing - Google Patents

A kind of flame retardant type SLA photosensitive resin for 3D printing Download PDF

Info

Publication number
CN105068378B
CN105068378B CN201510463866.0A CN201510463866A CN105068378B CN 105068378 B CN105068378 B CN 105068378B CN 201510463866 A CN201510463866 A CN 201510463866A CN 105068378 B CN105068378 B CN 105068378B
Authority
CN
China
Prior art keywords
acrylate
photosensitive resin
hydroxy
acrylic ester
polymerization inhibitor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201510463866.0A
Other languages
Chinese (zh)
Other versions
CN105068378A (en
Inventor
尤庆亮
徐亨
刘继延
曹一平
于洁
刘甜
刘晶晶
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honghu Yitai Technology Co., Ltd.
Original Assignee
Jianghan University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jianghan University filed Critical Jianghan University
Priority to CN201510463866.0A priority Critical patent/CN105068378B/en
Publication of CN105068378A publication Critical patent/CN105068378A/en
Application granted granted Critical
Publication of CN105068378B publication Critical patent/CN105068378B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Landscapes

  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

The invention discloses a kind of flame retardant type SLA photosensitive resins for 3D printing, it is characterized in that, consist of the following components in percentage by weight: phosphoric acrylic ester prepolymer 15-75%, acrylate 15-75%, radical initiator 1-5%, auxiliary agent 0.5-2%, reactive diluent 5-15%, the sum of the above components weight percent are 100%;The phosphoric acrylic ester prepolymer structure general formula isWherein, R1=H2C=CH- orR2=-CH2- CH2,Or-CH2- CH2- CH2- CH2One of.

Description

A kind of flame retardant type SLA photosensitive resin for 3D printing
Technical field
The present invention relates to 3D printing technique fields, in particular to a kind of fire-retardant type photosensitive resin of the SLA for 3D printing.
Background technique
Photocuring solid forming is using stereosopic printing (Stereo Lithography Apparatus, SLA) principle A kind of technique, and occur earliest, the most mature and most widely used rapid prototyping technology of technology, by U.S. 3D Systems Company releases in the late 1980s.The manufacturing process of SLA is to fill with liquid photosensitive resin in resin liquid bath, make its Rapid curing under the irradiation of laser beam, when forming process starts, liftable workbench is in the next section thickness of liquid level Highly, the laser beam after focusing according to the requirement of cross section profile, is scanned under control of the computer along liquid level, makes to be swept The resin solidification in region is retouched, to obtain the plastic tab of the cross section profile.Then, workbench declines the height of one layer of thin slice, Cured plastic tab is just by one layer of new liquid resin institute top cover, new to solidify to carry out second layer laser scanning solidification One layer securely it is withered knot in preceding layer, so repeat endlessly, until entire product shaping finishes.Since SLA technology solidifies The advantages that speed is fast, high production efficiency and suitable industrial flow-line produce, SLA photosensitive resin is increasingly widely applied quick It forms in manufacturing industry.The characteristic that SLA photosensitive resin needs to have has: viscosity is low, good fluidity, is conducive to resin levelling;Solidification Speed is fast, and curing rate directly affects shaping efficiency, influences economic benefit indirectly;Cure shrinkage is small, liquid resin solidification process In can generate contraction, cause to solidify part warpage, deformation etc., influence formed precision.
Though the photosensitive resin currently used for SLA technology is able to satisfy above-mentioned characteristic, the overwhelming majority is inflammable, and with The fast development and large-scale application of SLA technology, this disadvantage will limit its application range, hinder the development of entire industry. It is added in SLA photopolymer system using phosphorus oxychloride as fire retardant derived from raw material according to conventional means, though it can partially solve Certainly fire-retardant problem, but phosphorus oxychloride has high toxicity in production, can decomposite HCl, pollute the environment, and as additional There are some problems for the compatibility of type fire retardant and SLA photosensitive resin.Therefore, the SLA light with ingrain fireproofing performance is developed Quick resin has great importance.
Summary of the invention
The purpose of the present invention is to solve the deficiency of the above background technology, provides a kind of nontoxic, environmentally friendly use In the flame retardant type SLA photosensitive resin of 3D printing.
The technical solution of the present invention is as follows: a kind of flame retardant type SLA photosensitive resin for 3D printing, which is characterized in that by with The group of lower weight percent is grouped as: phosphoric acrylic ester prepolymer 15-75%, acrylate 15-75%, radical initiator 1-5%, auxiliary agent 0.5-2%, reactive diluent 5-15%, the sum of the above components weight percent are 100%;Described phosphorous third Olefin(e) acid ester prepolymer structure general formula is
Wherein,
R1=H2C=CH- or
R2=-CH2-CH2-、Or-CH2-CH2-CH2-CH2One of.
Preferably, the phosphoric acrylic ester prepolymer is by 2- methyl -2,5- dioxy -1,2- oxygen phospholane (abbreviation OP it) is mixed with hydroxy acrylic acid esters compound with the ratio of molar ratio 1:1, catalyst and polymerization inhibitor is added at 110-130 DEG C It is obtained after lower reaction 5-6h;
The hydroxy acrylic acid esters compound is hydroxy-ethyl acrylate, senecioate-hydroxypropyl acrylate, acrylic acid -4- hydroxyl One of butyl ester, hydroxyethyl methacrylate, methacrylic acid-β-hydroxypropyl acrylate.
Further, the polymerization inhibitor be hydroquinone, p-hydroxyanisole, 1,4-benzoquinone, N- phenyl-2-naphthylamine, to uncle The combination of one or more of butyl-catechol, the polymerization inhibitor dosage are 2- methyl -2,5- dioxy -1,2- oxygen phosphorus heterocycle penta The 0.1-5.0% of alkane OP and hydroxy acrylic acid esters compound quality sum.
Further, the catalyst be storng-acid cation exchange resin PK208LH, PK212LH, RCP106M, One or more of D001, NKC-9 combination, the catalyst amount are 2- methyl -2,5- dioxy -1,2- oxygen phospholane The 5-8% of OP and hydroxy acrylic acid esters compound quality sum.PK208LH, PK212LH, RCP106M are Mitsubishi Chemical's production Storng-acid cation exchange resin, D001, NKC-9 are the storng-acid cation exchange resin of resin processing plant, University Of Tianjin production.
Preferably, the acrylate is aliphatic urethane acrylate, aromatic urethane acrylate, epoxy third The combination of one or more of olefin(e) acid ester or polyester acrylate.The acrylate can choose the fat of Taiwan Changxing company Adoption urethane acrylate: 6141H-80,6148J-75,615-100,6151,6153-3,6157B-80,6168,6170, DR- U356,DR-U390;The aromatic urethane acrylate of Changxing company: 6146-100;The epoxy acrylate of Changxing company: 6202,622A-80,623-100,624A-45,625C-45;The polyester acrylate of Changxing company: 6315,6320,6351, 6371、6390F。
Preferably, the radical initiator include photoinitiator 1173,184,907,369,651,819, in ITX One or more combination.Photoinitiator 1173,184,907,369,651,819, ITX are initiation common in the art Agent.
Preferably, the reactive diluent is acrylate-functional monomer 2- (1,2- hexamethylene -1,2- dicarboxyl acyl Imines) ethyl propylene acid esters, ring trimethylolpropane dimethoxym ethane acrylate, 2- phenoxyethyl acrylate, isobornyl One of acrylate, cyclohexyl methacrylate, dipropylene glycol diacrylate, 1,9- nonanediol diacrylate are several Kind combination.The reactive diluent can select the acrylate-functional monomer of Taiwan Changxing company: EM2140 2- (1,2- Hexamethylene -1,2- dicarboximide) ethyl propylene acid esters, EM212 ring trimethylolpropane dimethoxym ethane acrylate CTFA, EM210 2- phenoxyethyl acrylate PHEA, EM70 iso-bornyl acrylate IBOA, EM71-E methacrylic acid hexamethylene Ester CHMA, EM222 dipropylene glycol diacrylate DPGDA, EM2203 1,9- nonanediol diacrylate NDDA.
Preferably, the auxiliary agent includes levelling agent and defoaming agent, and the levelling agent quality and defoaming agent mass ratio are 1- 3:1.
Further, the levelling agent is dimethyl silicone polymer, polymethylphenylsiloxane, organic-silicon-modified poly- silicon oxygen One of alkane.
Further, the defoaming agent is Polyether Modified Polysiloxanes Defoaming Agent.
In the present invention, in the present invention, 2- methyl -2,5- dioxy -1,2- oxygen phospholane OP and hydroxy acrylic acid esters Compound prepares the reaction process of phosphoric acrylic ester prepolymer are as follows:
Wherein, hydroxy acrylic acid esters compound formula is
R1=H2C=CH- or
R2=-CH2-CH2-、Or-CH2-CH2-CH2-CH2One of.
The invention has the benefit that
1. using the phosphoric acrylic ester prepolymer containing fire-retardant group, there is the prepolymer for being made into photosensitive resin itself Good flame retardant property.
2. prepolymer itself has flame retarding construction, photosensitive resin is cooperatively formed with urethane acrylate, catalyst, auxiliary agent Afterwards, photosensitive resin is solidifying or not will form in use process later the substance for polluting environment or impairing human body health, peace Loopful is protected, and is avoided when in order to which the anti-flammability of photosensitive resin adds the inorganic matter containing brominated flame retardant or the class containing antimony pentoxide When, it threatens to environment, people's health is damaged.
3. existing oil-soluble ester structure in phosphoric acrylic ester prepolymer, and have water-soluble hydroxyl structure, make pre-polymerization Object not only can be used for oil-soluble photopolymer system but also can be used for Water-soluble product system.
4. photosensitive resin made from has preferable while meeting that original viscosity is low, curing rate is fast, shrinking percentage is small Flame retardant property, safety and environmental protection.
Detailed description of the invention
Fig. 1 is the FTIR map of phosphorous hydroxy-ethyl acrylate prepolymer
Fig. 2 is phosphorous hydroxy-ethyl acrylate prepolymer NMR-H1Map
Specific embodiment
The present invention is described in further detail combined with specific embodiments below.
Embodiment 1
It takes 13.40g (0.1mol) OP and 11.60g (0.1mol) hydroxy-ethyl acrylate in three-necked flask, 2.00g is added Catalyst storng-acid cation exchange resin PK208LH (catalyst quality be OP and hydroxy-ethyl acrylate quality and 8%) and 0.0250g hydroquinone of polymerization retarder (polymerization inhibitor quality be OP and hydroxy-ethyl acrylate quality and 0.1%), at 110 DEG C, instead Stop reaction after answering 5h.Product phosphoric acrylic ester prepolymer in system is separated: 100mL ethyl acetate is added, is continued 30min is stirred, after system temperature is reduced to room, is filtered with cloth funnel and separates PK208LH resin cation with reaction solution (the PK208LH resin isolated immersion is washed away into phosphoric acrylic ester prepolymer in ethanol to reuse), by filtrate It is added in the pyriform funnel of 250mL, addition saturated salt solution 50ML two-phase, which is vigorously mixed, washes away polymerization inhibitor and unreacted OP, satisfies It is larger in lower layer with salt water layer specific gravity, lower layer is released for use, each 50mL of saturated salt solution is continuously washed three times.Lower layer's salt It is extracted twice after being hydrated simultaneously with ethyl acetate 200mL, ethyl acetate phase extract mutually merges with the oil that upper layer obtains with anhydrous sulphur After sour sodium is dry, vacuum distillation removes ethyl acetate and hydroxy-ethyl acrylate obtains phosphoric acrylic ester prepolymer 18g, mole receipts Rate is 72%.
By phosphoric acrylic ester prepolymer 61.33g, aliphatic urethane acrylate 6170 made from the above method 26.67g, it reactive diluent EM212 ring trimethylolpropane dimethoxym ethane acrylate 5g, 1173 5g of free radical photo-initiation, helps Agent 2g (is made of) 1g dimethyl silicone polymer levelling agent and 1g Polyether Modified Polysiloxanes Defoaming Agent, is mixed evenly, is obtained Flame retardant type SLA photosensitive resin.Polyether Modified Polysiloxanes Defoaming Agent is that the ZK-203 of Tianjin Zhong Ke Chemical Co., Ltd. production is organic Silicon defoaming agent.
Embodiment 2
It takes 13.40g (0.1mol) OP and 13.00g (0.1mol) senecioate-hydroxypropyl acrylate in three-necked flask, is added 2.00g catalyst storng-acid cation exchange resin PK208LH (catalyst quality be OP and senecioate-hydroxypropyl acrylate quality and 7.58%) and 0.0264g hydroquinone of polymerization retarder (polymerization inhibitor quality be OP and senecioate-hydroxypropyl acrylate quality and 0.1%), at 110 DEG C, reaction 5h obtains phosphoric acrylic ester prepolymer (separation method is with embodiment 1), and molar yield is 68%.
By phosphoric acrylic ester prepolymer 63.33g obtained above, 6170 21.67g of aliphatic urethane acrylate, Reactive diluent EM210 2- phenoxyethyl acrylate 10g, 1173 3g of free radical photo-initiation, auxiliary agent 2g are (by 1g poly- two Methylsiloxane levelling agent and 1g Polyether Modified Polysiloxanes Defoaming Agent composition), it is mixed evenly, it is photosensitive to obtain flame retardant type SLA Resin.
Embodiment 3
It takes 13.40g (0.1mol) OP and 14.40g (0.1mol) acrylic acid -4- hydroxy butyl ester in three-necked flask, is added 2.00g catalyst storng-acid cation exchange resin PK208LH (catalyst quality be OP and acrylic acid -4- hydroxy butyl ester quality and 7.18%) and 0.0278g hydroquinone of polymerization retarder (polymerization inhibitor quality be OP and acrylic acid -4- hydroxy butyl ester quality and 0.1%), at 110 DEG C, reaction 5h obtains phosphoric acrylic ester prepolymer (separation method is with embodiment 1), and molar yield is 79%.
Phosphoric acrylic ester prepolymer 40g obtained above, 6170 43g of aliphatic urethane acrylate, activity is dilute Agent EM70 iso-bornyl acrylate 15g, 1173 1g of free radical photo-initiation, auxiliary agent 1g are released (by 0.5g dimethyl silicone polymer Levelling agent and 0.5g Polyether Modified Polysiloxanes Defoaming Agent composition), it is mixed evenly, obtains flame retardant type SLA photosensitive resin.
Embodiment 4
It takes 13.40g (0.1mol) OP and 13g (0.1mol) hydroxyethyl methacrylate in three-necked flask, 2.11g is added Catalyst storng-acid cation exchange resin PK212LH (catalyst quality be OP and hydroxyethyl methacrylate quality and 8%) and 0.132g polymerization inhibitor p-hydroxyanisole (polymerization inhibitor quality be OP and hydroxyethyl methacrylate quality and 0.5%), at 110 DEG C, reaction 5h obtains phosphoric acrylic ester prepolymer (separation method is with embodiment 1), and molar yield is 65%.
By phosphoric acrylic ester prepolymer 15g obtained above, aromatic urethane acrylate 6146-100 73g, work Property diluent EM222 dipropylene glycol diacrylate 7g, 907 4.5g of free radical photo-initiation, auxiliary agent 0.5g are (by 0.25g levelling Agent polymethylphenylsiloxane and 0.25g Polyether Modified Polysiloxanes Defoaming Agent composition), it is mixed evenly, obtains flame retardant type SLA Photosensitive resin.
Embodiment 5
It takes 13.40g (0.1mol) OP and 14.40g (0.1mol) methacrylic acid-β-hydroxypropyl acrylate in three-necked flask, adds Entering 1.39g catalyst storng-acid cation exchange resin PK212LH, (catalyst quality is OP and methacrylic acid-β-hydroxypropyl acrylate Quality and 5%) and 0.278g polymerization inhibitor 1,4-benzoquinone (polymerization inhibitor quality be OP and methacrylic acid-β-hydroxypropyl acrylate quality and 1%), at 120 DEG C, reaction 6h obtains phosphoric acrylic ester prepolymer (separation method is with embodiment 1), and molar yield is 70%.
By phosphoric acrylic ester prepolymer 50g obtained above, 6202 34.5g of epoxy acrylate, reactive diluent 12g is (by 6g EM212 ring trimethylolpropane dimethoxym ethane acrylate and 6g EM210 2- phenoxyethyl acrylate group At), 369 2g of free radical photo-initiation, auxiliary agent 1.5g (have by 1g levelling agent polymethylphenylsiloxane and 0.5g are polyether-modified Machine silicon defoaming agent composition), it is mixed evenly, obtains flame retardant type SLA photosensitive resin.
Embodiment 6
It takes 13.40g (0.1mol) OP and 11.6g (0.1mol) hydroxy-ethyl acrylate in three-necked flask, 1.5g is added and urges Agent storng-acid cation exchange resin RCP106M (catalyst quality be OP and hydroxy-ethyl acrylate quality and 6%) and 0.5g polymerization inhibitor N- phenyl-2-naphthylamine (polymerization inhibitor quality be OP and hydroxy-ethyl acrylate quality and 2%), at 120 DEG C, instead 5.5h is answered to obtain phosphoric acrylic ester prepolymer (separation method is with embodiment 1), molar yield 75%.
By phosphoric acrylic ester prepolymer 75g obtained above, 6315 15.5g of polyester acrylate, reactive diluent EM210 2- phenoxyethyl acrylate 5g, 184 3g of free radical photo-initiation, auxiliary agent 1.5g (are changed by 1g levelling agent organosilicon Property polysiloxanes and 0.5g Polyether Modified Polysiloxanes Defoaming Agent composition), be mixed evenly, obtain flame retardant type SLA photosensitive resin.
Embodiment 7
It takes 13.40g (0.1mol) OP and 13g (0.1mol) senecioate-hydroxypropyl acrylate in three-necked flask, 1.85g is added Catalyst storng-acid cation exchange resin D001 (catalyst quality be OP and senecioate-hydroxypropyl acrylate quality and 7%) and 1.32g polymerization inhibitor p-tert-Butylcatechol (polymerization inhibitor quality be OP and senecioate-hydroxypropyl acrylate quality and 5%), 110 At DEG C, reaction 5.5h obtains phosphoric acrylic ester prepolymer (separation method is with embodiment 1), molar yield 78%.
By phosphoric acrylic ester prepolymer 63.6g obtained above, 6320 15g of polyester acrylate, reactive diluent 15g (being made of 5g EM70 iso-bornyl acrylate and 10g EM222 dipropylene glycol diacrylate), free radical are light-initiated 651 5g of agent, auxiliary agent 1.4g are (by the organic-silicon-modified polysiloxanes of 0.7g levelling agent and 0.7g Polyether Modified Polysiloxanes Defoaming Agent group At), it is mixed evenly, obtains flame retardant type SLA photosensitive resin.
Embodiment 8
It takes 13.40g (0.1mol) OP and 14.4g (0.1mol) acrylic acid -4- hydroxy butyl ester in three-necked flask, is added 2.22g catalyst storng-acid cation exchange resin D001 (catalyst quality be OP and acrylic acid -4- hydroxy butyl ester quality and 8%) and 1.112g polymerization inhibitor p-hydroxyanisole (polymerization inhibitor quality be OP and acrylic acid -4- hydroxy butyl ester quality and 4%), At 120 DEG C, reaction 6h obtains phosphoric acrylic ester prepolymer (separation method is with embodiment 1), molar yield 80%.
By phosphoric acrylic ester prepolymer 35.2g obtained above, acrylate 50g (by 25g aliphatic polyurethane propylene Acid esters 6170 and 25g epoxy acrylate 6202 form), reactive diluent EM70 iso-bornyl acrylate 10g, free radical light 819 3g of initiator, auxiliary agent 1.8g are (by the organic-silicon-modified polysiloxanes of 1g levelling agent and 0.8g Polyether Modified Polysiloxanes Defoaming Agent Composition), it is mixed evenly, obtains flame retardant type SLA photosensitive resin.
Embodiment 9
It takes 13.40g (0.1mol) OP and 13g (0.1mol) hydroxyethyl methacrylate in three-necked flask, 1.45g is added Catalyst (catalyst quality be OP and hydroxyethyl methacrylate quality and 5.5%), catalyst is handed over by highly acidic cation Resin PK212LH and NKC-9 1:1 in mass ratio composition are changed, 0.66g polymerization inhibitor is added, and (polymerization inhibitor quality is OP and metering system The 2.5% of sour hydroxyl ethyl ester quality sum), polymerization inhibitor is that 1,4-benzoquinone and N- phenyl-2-naphthylamine 1:1 in mass ratio are formed, at 130 DEG C Under, reaction 5h obtains phosphoric acrylic ester prepolymer (separation method is with embodiment 1), molar yield 74%.
By phosphoric acrylic ester prepolymer 16.4g obtained above, acrylate 75g (by 25g aliphatic polyurethane propylene Acid esters 6170 and 50g polyester acrylate 6315 form), reactive diluent EM222 dipropylene glycol diacrylate 6g, free radical Photoinitiator ITX 1g, auxiliary agent 1.6g are (by 1.2g levelling agent dimethyl silicone polymer and 0.4g Polyether Modified Polysiloxanes Defoaming Agent Composition), it is mixed evenly, obtains flame retardant type SLA photosensitive resin.
Embodiment 10
It takes 13.40g (0.1mol) OP and 14.4g (0.1mol) methacrylic acid-β-hydroxypropyl acrylate in three-necked flask, is added 1.81g catalyst (catalyst quality be OP and methacrylic acid-β-hydroxypropyl acrylate quality and 6.5%), catalyst is by highly acid Cation exchange resin PK212LH, RCP106M, D001, NKC-9 1:1:1:1 in mass ratio composition, are added 1.39g polymerization inhibitor (polymerization inhibitor quality be OP and methacrylic acid-β-hydroxypropyl acrylate quality and 5%), polymerization inhibitor is benzenediol, 1,4-benzoquinone and to hydroxyl Base methyl phenyl ethers anisole 1:1:1 in mass ratio composition, at 130 DEG C, reaction 5h obtains phosphoric acrylic ester prepolymer, and (separation method is the same as real Apply example 1), molar yield 69%.
By phosphoric acrylic ester prepolymer 20.2g obtained above, acrylate 60g (by 30g epoxy acrylate 6202 Formed with 30g polyester acrylate 6315), reactive diluent 14g is (by 4g EM70 iso-bornyl acrylate, 5g EM212 ring Trimethylolpropane dimethoxym ethane acrylate and 5g EM210 2- phenoxyethyl acrylate composition), free radical photo-initiation 5g (being made of 1173 2.5g and 907 2.5g), auxiliary agent 0.8g (are gathered by the organic-silicon-modified polysiloxanes of 0.4g levelling agent and 0.4g Ether modified organic silicon defoaming agent composition), it is mixed evenly, obtains flame retardant type SLA photosensitive resin.
Performance test:
The infared spectrum that phosphorous hydroxy-ethyl acrylate prepolymer, hydroxy-ethyl acrylate and OP are made in embodiment 1 is shown in Fig. 1, Phosphorous hydroxy-ethyl acrylate prepolymer is made in embodiment 11H-NMR (DMSO-D6) map is shown in Fig. 2.
B curve can be seen that in 1709cm from Fig. 1 infared spectrum-1Place is C=O stretching vibration, in 1637cm-1Place is C The characteristic absorption peak of=C, in 1130cm-1Place is the characteristic absorption peak of P=O, in 979cm-1Corresponding is that C-P stretching vibration is inhaled Peak is received, illustrates the characteristic group in target molecule there are acrylic acid groups and phosphorus.In addition, comparison b spectrogram can be seen with a, c spectrogram The characteristic absorption peaks such as C=O, C=C, P=O, C-P all generate red shift out, illustrate that hydroxy-ethyl acrylate and OP react.From Fig. 21H-NMR (DMSO-D6) pattern analysis results:
δ/ppm:1.28-1.44 (3H ,-CH3, a), 1.76-2.43 (4H ,-CH2, c, d), 3.59-4.29 (4H ,-CH2, E, f), 5.93-6.39 (3H ,-CH=CH2, g, h, i).From FT-IR analysis and1H-NMR analysis can prove that synthetic product is to contain Phosphorus hydroxy-ethyl acrylate.
SLA photosensitive resin obtained in embodiment 1-10 is tested for the property, as a result as shown in the table:
As can be seen from the above table, the resulting SLA photosensitive resin of embodiment 1-10 is in curing time, gel fraction, viscosity, volume Shrinking percentage keeps excellent flame retardancy in good situation.

Claims (6)

1. a kind of flame retardant type SLA photosensitive resin for 3D printing, which is characterized in that by following components in percentage by weight group At: phosphoric acrylic ester prepolymer 15-75%, acrylate 15-75%, radical initiator 1-5%, auxiliary agent 0.5-2%, work Property diluent 5-15%, the sum of the above components weight percent be 100%;The phosphoric acrylic ester prepolymer structure general formula For
Wherein,
R1=H2C=CH- or
R2=-CH2-CH2-、Or CH2CH2CH2CH2One of;
The auxiliary agent is made of levelling agent and defoaming agent 1-3:1 in mass ratio;
The phosphoric acrylic ester prepolymer is by 2- methyl -2,5- dioxy -1,2- oxygen phospholane OP and hydroxy acrylate Class compound is mixed with the ratio of molar ratio 1:1, be added catalyst and polymerization inhibitor react 5-6h at 110-130 DEG C after obtain;
The hydroxy acrylic acid esters compound be hydroxy-ethyl acrylate, senecioate-hydroxypropyl acrylate, acrylic acid -4- hydroxybutyl, One of hydroxyethyl methacrylate, methacrylic acid-β-hydroxypropyl acrylate;
The polymerization inhibitor is hydroquinone, in p-hydroxyanisole, 1,4-benzoquinone, N- phenyl-2-naphthylamine, p-tert-Butylcatechol One or more combination, the polymerization inhibitor dosage be 2- methyl -2,5- dioxy -1,2- oxygen phospholane OP and hydroxy The 0.1-5.0% of acid esters compound quality sum;
The catalyst is one in storng-acid cation exchange resin PK208LH, PK212LH, RCP106M, D001, NKC-9 Kind or several combinations, the catalyst amount are 2- methyl -2,5- dioxy -1,2- oxygen phospholane OP and hydroxy acrylate The 5-8% of class compound quality sum.
2. photosensitive resin as described in claim 1, which is characterized in that the acrylate is aliphatic polyurethane acrylic acid The combination of one or more of ester, aromatic urethane acrylate, epoxy acrylate or polyester acrylate.
3. photosensitive resin as described in claim 1, which is characterized in that the radical initiator be photoinitiator 1173, 184,907,369,651,819, one or more of ITX combination.
4. photosensitive resin as described in claim 1, which is characterized in that the reactive diluent is acrylate-functional monomer 2- (1,2- hexamethylene -1,2- dicarboximide) ethyl propylene acid esters, ring trimethylolpropane dimethoxym ethane acrylate, 2- benzene Oxygroup ethyl propylene acid esters, iso-bornyl acrylate, cyclohexyl methacrylate, dipropylene glycol diacrylate, 1,9- nonyl The combination of one or more of omega-diol diacrylate.
5. photosensitive resin as described in claim 1, which is characterized in that the levelling agent is dimethyl silicone polymer, poly- methyl One of phenyl siloxane, organic-silicon-modified polysiloxanes.
6. photosensitive resin as described in claim 1, which is characterized in that the defoaming agent is Polyether Modified Polysiloxanes Defoaming Agent.
CN201510463866.0A 2015-07-31 2015-07-31 A kind of flame retardant type SLA photosensitive resin for 3D printing Active CN105068378B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510463866.0A CN105068378B (en) 2015-07-31 2015-07-31 A kind of flame retardant type SLA photosensitive resin for 3D printing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510463866.0A CN105068378B (en) 2015-07-31 2015-07-31 A kind of flame retardant type SLA photosensitive resin for 3D printing

Publications (2)

Publication Number Publication Date
CN105068378A CN105068378A (en) 2015-11-18
CN105068378B true CN105068378B (en) 2019-07-09

Family

ID=54497777

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510463866.0A Active CN105068378B (en) 2015-07-31 2015-07-31 A kind of flame retardant type SLA photosensitive resin for 3D printing

Country Status (1)

Country Link
CN (1) CN105068378B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106814537B (en) * 2015-11-30 2020-02-21 乐凯华光印刷科技有限公司 Photosensitive imaging composition containing cyclohexane amide monofunctional acrylate copolymer
CN107300828B (en) * 2016-04-15 2021-01-15 常州强力电子新材料股份有限公司 Photosensitive resin for 3D printing
CN108727550A (en) * 2018-04-23 2018-11-02 浙江锐胜新材料有限公司 A kind of photosensitive resin and its application
CN108587100A (en) * 2018-05-18 2018-09-28 深圳永昌和科技有限公司 Environment and human body friendly vegetable oil base ultraviolet light cure 3D printing resin
CN111154211B (en) * 2019-12-26 2021-11-19 诺思贝瑞新材料科技(苏州)有限公司 Photocuring composition for 3D printing and photocuring part
CN112080183A (en) * 2020-09-01 2020-12-15 徐振东 Environment-friendly acrylic pressure-sensitive adhesive for paper and preparation method thereof
CN112662260A (en) * 2020-12-29 2021-04-16 山西中涂交通科技股份有限公司 Flame-retardant anti-skid road surface coating for tunnel
EP4369098A1 (en) 2022-11-14 2024-05-15 Cubicure GmbH Resin composition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103502313A (en) * 2012-05-03 2014-01-08 株式会社Lg化学 Novel polyamic acid, photosensitive resin composition, dry film and circuit board
CN104109328A (en) * 2014-06-23 2014-10-22 东莞智维立体成型股份有限公司 Photocuring wax material used for 3D printing
CN104570603A (en) * 2013-10-22 2015-04-29 青岛中科新材料有限公司 Preparation method and application of photosensitive resin for ultrasonic curing 3D printing

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006012878A1 (en) * 2006-03-21 2007-09-27 Clariant International Limited Phosphorus-containing mixtures, a process for their preparation and their use

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103502313A (en) * 2012-05-03 2014-01-08 株式会社Lg化学 Novel polyamic acid, photosensitive resin composition, dry film and circuit board
CN104570603A (en) * 2013-10-22 2015-04-29 青岛中科新材料有限公司 Preparation method and application of photosensitive resin for ultrasonic curing 3D printing
CN104109328A (en) * 2014-06-23 2014-10-22 东莞智维立体成型股份有限公司 Photocuring wax material used for 3D printing

Also Published As

Publication number Publication date
CN105068378A (en) 2015-11-18

Similar Documents

Publication Publication Date Title
CN105068378B (en) A kind of flame retardant type SLA photosensitive resin for 3D printing
CN107619399A (en) Polyfunctionality oxygen heterocycle butane and preparation method thereof
US8796492B2 (en) α-(unsaturated alkoxyalkyl) acrylate composition and process for production thereof
CN102548997A (en) Cyclic (meth)acrylates and process for preparation thereof
KR100263033B1 (en) Diacrylates and dimethacrylates
JP2902269B2 (en) Oxetane compounds
CN105384852B (en) A kind of polymerizable type light trigger based on benzophenone and preparation method thereof
EP0095182B1 (en) Photosensitive resin composition
CN110467692A (en) A kind of polyacrylate macromolecular photoinitiator and its synthetic method and application
JPH03126721A (en) Cationic curable oxyalkylene ether, its preparation, sealing compound and covering material containing it, and diluent
EP0463862A2 (en) Aromatic vinyl ether compounds and compositions, and method of making the same
Kikkawa et al. Effect of alkyl substituents on initiator activity in cationic polymerization of styrene with p‐methoxybenzyldialkylsulfonium salts as initiators
KR100633793B1 (en) Unsaturated monocarboxylic ester compound, process for producing the same, and composition curable with actinic energy ray
JPH0196145A (en) Low polymerized benzylketals and use as photoinitiator
DE19633233B4 (en) UV and electron beam curable propenyl ether silicone release agent compositions, their use, and cured compositions
CN105153223B (en) A kind of SLA type phosphoric acrylic ester prepolymers for 3D printing and preparation method thereof
JP2000191652A (en) Fluorooxetane compound, polymer thereof, composition containing the compound and production of the composition
KR102047349B1 (en) Novel sulfonium salt compound, method for producing same, and photoacid generator
CA2138411A1 (en) Dialkyl alkoxy phenyl sulfonium salt cationic initiators
CN102803313B (en) Epoxy acrylate, acrylic composition, cured substance, and manufacturing method therefor
RU2003112233A (en) METHOD FOR PRODUCING FLUORATED POLYVALENT CARBONYLIC COMPOUND
CN106349285A (en) Hydroxyl-containing acyl phosphine oxides and their preparation and application
JPH0769954A (en) Multi-functional vinyl ether compound
JP2001115006A (en) Thermosetting composition
Tao et al. Synthesis and characterization of alkoxy and phenoxy-substituted ferrocenium salt cationic photoinitiators

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20191205

Address after: 430056 No. 6 Jiangxia Avenue, Xintan New District, Wuhan Economic Development Zone, Wuhan City, Hubei Province

Patentee after: Honghu Yitai Technology Co., Ltd.

Address before: 430056 Research Institute of Jianghan University, Zhuankou economic and Technological Development Zone, Wuhan, Hubei

Patentee before: Jianghan University