CN105023871A - Vision system for opposite side alignment - Google Patents

Vision system for opposite side alignment Download PDF

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Publication number
CN105023871A
CN105023871A CN201510352481.7A CN201510352481A CN105023871A CN 105023871 A CN105023871 A CN 105023871A CN 201510352481 A CN201510352481 A CN 201510352481A CN 105023871 A CN105023871 A CN 105023871A
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CN
China
Prior art keywords
imaging device
vision system
imaging
opposite face
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510352481.7A
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Chinese (zh)
Inventor
韩微微
高爱梅
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Beijing Semiconductor Equipment Institute
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Beijing Semiconductor Equipment Institute
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Publication date
Application filed by Beijing Semiconductor Equipment Institute filed Critical Beijing Semiconductor Equipment Institute
Priority to CN201510352481.7A priority Critical patent/CN105023871A/en
Publication of CN105023871A publication Critical patent/CN105023871A/en
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means

Abstract

The invention relates to a vision system for opposite side alignment, which belongs to the technical field of machine vision. The vision system is used for carrying out imaging on a first side and a second side which are opposite. The system comprises a first imaging device, a second imaging device, and a double-side reflector, wherein the first imaging device is used for light imaging so as to generate a first image signal; the second imaging device is used for light imaging so as to generate a second image signal; the double-side reflector has a first reflection side and a second reflection side, the double-side reflector is arranged between the first side and the second side, the first reflection side reflects light from the first side to the first imaging device, and the second reflection side reflects light from the second side to the second imaging device. According to the vision system for opposite side alignment, while the imaging device own performance indexes are not sacrificed, the alignment distance between two opposite sides is shortened, and high-precision double-side alignment is realized.

Description

A kind of vision system aimed at for opposite face
Technical field
The invention belongs to technical field of machine vision, particularly relate to a kind of vision system aimed at for opposite face.
Background technology
Semiconductor device precision in the fabrication process has material impact to performance of semiconductor device.Along with chip is to miniaturization, also more and more higher to the required precision of semiconductor device process equipment.Usually adopt Vision Builder for Automated Inspection to realize alignment function in this kind equipment, the Index Influences such as the resolution of vision system and contrast alignment precision.Therefore, improve the indexs such as the resolution of Vision Builder for Automated Inspection and contrast and there is extremely important meaning.
At present, for needing the application two forward surfaces being taked image simultaneously, published aligning vision system composition mainly contains following two kinds: the first is doublet method: the method adopts the microscopic structure of doublet, and in the part of parallel light path, two light paths are merged into one group, and through the imaging of same pipe mirror.The picture of the high-resolution that the method can obtain, but owing to needing to arrange two object lens between two aligning surfaces, require that two aligning surfaces are comparatively large to punctual spacing, improve the requirement of plant machinery and electric part, and take the longer operating time, affect the operating efficiency of equipment.The second is the combined method of camera lens and light splitting optical path: the method adds light splitting optical path between camera lens and target, makes two opposite faces all can by same lens imaging.The method to requiring that the spacing of two aligning surfaces is less on time, but shortcoming be light by can aberration be produced during light splitting optical path, systemic resolution and picture contrast are declined.
Also have some other method in addition, these methods or system bulk are large, take up room large, or with sacrificial system resolution and contrast for cost, realize two sides in opposite directions and aim at simultaneously.
Summary of the invention
The invention provides a kind of vision system aimed at for opposite face, technical problem to be solved be existing aligning vision system requirement two aligning surface or systemic resolution comparatively large to punctual spacing and picture contrast poor.
The technical scheme that the present invention solves the problems of the technologies described above is as follows: a kind of vision system aimed at for opposite face, and for carrying out imaging to relative first surface and the second face, it comprises:
First imaging device, for image formation by rays to produce the first picture signal;
Second imaging device, for image formation by rays to produce the second picture signal;
Double mirror, described double mirror has the first reflecting surface and the second reflecting surface; Described double mirror is arranged between first surface and second;
Described first reflecting surface by the light reflection from first surface to the first imaging device;
Described second reflecting surface by the light reflection from second to the second imaging device.
As above for the vision system that opposite face is aimed at, further, described first imaging device comprises: the first imaging lens and the first optical-electrical converter; Described first imaging lens is used for image formation by rays; Described first optical-electrical converter is used for light to be converted to the first picture signal.
As above for the vision system that opposite face is aimed at, further, described first imaging device also comprises the first speculum, and described first speculum is used for incident ray to reflex to the first imaging lens.
As above for the vision system that opposite face is aimed at, further, described second imaging device comprises: the second imaging lens and the second optical-electrical converter; Described second imaging lens is used for image formation by rays; Described second optical-electrical converter is used for light to be converted to the second picture signal.
As above for the vision system that opposite face is aimed at, further, described second imaging device also comprises the second speculum, and described second speculum is used for incident ray to reflex to the second imaging lens.
As above for the vision system that opposite face is aimed at, further, described double mirror is made for plating external reflectance film respectively on optical glass two sides; Or, described double mirror for by metal eyeglass two surface respectively polishing make.
As above for the vision system that opposite face is aimed at, further, the straight line of vertical described first surface and second and described double mirror place plane angulation are 45 degree.
The invention has the beneficial effects as follows:
Present system, while not sacrificing the performance index of imaging device own, shortens the alignment distance of two forward surfaces, realizes high-precision double-sided alignment.Owing to only needing to arrange a double mirror between two aligning surfaces, to two aligning surfaces little to punctual pitch requirements, plant machinery and electric part easily realize.In addition, without light splitting optical path between imaging device and target, light can not produce aberration, ensure that resolution and the picture contrast of vision system.
Accompanying drawing explanation
Fig. 1 is a kind of vision system schematic diagram aimed at for opposite face provided by the invention;
Fig. 2 is the vision system schematic diagram that another kind provided by the invention is aimed at for opposite face;
A kind of double mirror light path schematic diagram that Fig. 3 provides for the embodiment of the present invention.
In accompanying drawing, the list of parts representated by each label is as follows:
01, first surface, 02, second, 1, double mirror, the 2, first imaging device, 21, the first speculum, the 22, first imaging lens, the 23, first optical-electrical converter, the 3, second imaging device, 31, the second speculum, the 32, second imaging lens, the 33, second optical-electrical converter.
Embodiment
Be described principle of the present invention and feature below in conjunction with accompanying drawing, example, only for explaining the present invention, is not intended to limit scope of the present invention.
The embodiment of the present invention needs to solve existing aligning vision system requirement two aligning surface in comparatively large to punctual spacing or systemic resolution and picture contrast difference problem.
As shown in Figure 1, for the embodiment of the present invention provide a kind of for opposite face aim at vision system schematic diagram.This vision system is used for carrying out imaging to relative first surface 01 and the second face 02, and it comprises:
First imaging device 2, for image formation by rays to produce the first picture signal;
Second imaging device 3, for image formation by rays to produce the second picture signal;
Double mirror 1, described double mirror has the first reflecting surface and the second reflecting surface; Described double mirror is arranged between first surface and second;
Described first reflecting surface by the light reflection from first surface 01 to the first imaging device;
Described second reflecting surface by the light reflection from the second face 02 to the second imaging device.
The operation principle of the vision system for opposite face aligning of the above embodiment of the present invention is as follows: due to the both sides needing the first surface of imaging and the second face to lay respectively at double mirror, from the light of first surface by the first reflective surface of double mirror to the first imaging device, produce the first picture signal; From the light of second by the second reflective surface of double mirror to the second imaging device, produce the second picture signal; By the correction to two picture signal coordinate positions, make it unified in the same coordinate system, namely can reach the object that two forward surfaces are accurately aimed at.Owing to only needing to arrange a double mirror between two aligning surfaces, to two aligning surfaces little to punctual pitch requirements, plant machinery and electric part easily realize.In addition, without light splitting optical path between imaging device and target, light can not produce aberration, ensure that resolution and the picture contrast of vision system.
In a kind of specific implementation process of above-described embodiment, the first imaging device for the vision system of opposite face aligning comprises: the first imaging lens 22 and the first optical-electrical converter 23; Described first imaging lens is used for image formation by rays; Described first optical-electrical converter is used for light to be converted to the first picture signal.Described second imaging device comprises: the second imaging lens 32 and the second optical-electrical converter 33; Described second imaging lens is used for image formation by rays; Described second optical-electrical converter is used for light to be converted to the second picture signal.
In the another kind of specific implementation process of above-described embodiment, as shown in Figure 2, vision system first imaging device aimed at for opposite face comprises: the first speculum 21, first imaging lens 22 and the first optical-electrical converter 23; Described first speculum is used for incident ray to reflex to the first imaging lens; Described first imaging lens is used for image formation by rays; Described first optical-electrical converter is used for light to be converted to the first picture signal.Described second imaging device comprises: the second speculum 31, second imaging lens 32 and the second optical-electrical converter 33; Described second speculum is used for incident ray to reflex to the second imaging lens; Described second imaging lens is used for image formation by rays; Described second optical-electrical converter is used for light to be converted to the second picture signal.Due to the use of the first speculum, the second speculum, the first imaging lens and the first light path of the first optical-electrical converter and the second light path of the second imaging lens and the second optical-electrical converter can be arranged in parallel, to reduce the size of vision system.
In the specific implementation process of above-described embodiment, described double mirror is made for plating external reflectance film respectively on optical glass two sides; Or, described double mirror for by metal eyeglass two surface respectively polishing make.
In the specific implementation process of above-described embodiment, straight line and the described double mirror place plane angulation of vertical described first surface and second are 45 degree, and other angles also can realize the object of the invention as 30 ~ 55 degree.
As shown in Figure 3, in the rectilinear direction of vertical first surface and second, in order to the optical axis of the optical axis and second light path that ensure first surface light path is on same straight line, the optical axis of the first imaging device 2 during design, should be made parallel with the optical axis of the second imaging device 3.The optical axis of the first imaging device 2 is relevant with the thickness of double mirror 1 with the optical axis distance D of the second imaging device 3.If the thickness of double mirror 1 is d, then its distance D=d/sin .Wherein angle formed by the straight line of double mirror and vertical first surface and second, typically, gets =45 °.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.

Claims (7)

1., for the vision system that opposite face is aimed at, for carrying out imaging to relative first surface and the second face, it is characterized in that, comprise:
First imaging device, for image formation by rays to produce the first picture signal;
Second imaging device, for image formation by rays to produce the second picture signal;
Double mirror, described double mirror has the first reflecting surface and the second reflecting surface; Described double mirror is arranged between first surface and second;
Described first reflecting surface by the light reflection from first surface to the first imaging device;
Described second reflecting surface by the light reflection from second to the second imaging device.
2. the vision system aimed at for opposite face according to claim 1, it is characterized in that, described first imaging device comprises: the first imaging lens and the first optical-electrical converter; Described first imaging lens is used for image formation by rays; Described first optical-electrical converter is used for light to be converted to the first picture signal.
3. the vision system aimed at for opposite face according to claim 2, it is characterized in that, described first imaging device also comprises the first speculum, and described first speculum is used for incident ray to reflex to the first imaging lens.
4. the vision system aimed at for opposite face according to any one of claim 1-3, it is characterized in that, described second imaging device comprises: the second imaging lens and the second optical-electrical converter; Described second imaging lens is used for image formation by rays; Described second optical-electrical converter is used for light to be converted to the second picture signal.
5. the vision system aimed at for opposite face according to claim 4, it is characterized in that, described second imaging device also comprises the second speculum, and described second speculum is used for incident ray to reflex to the second imaging lens.
6. the vision system aimed at for opposite face according to claim 1, it is characterized in that, described double mirror is made for plating external reflectance film respectively on optical glass two sides; Or, described double mirror for by metal eyeglass two surface respectively polishing make.
7. the vision system aimed at for opposite face according to claim 1, is characterized in that, straight line and the described double mirror place plane angulation of vertical described first surface and second are 45 degree.
CN201510352481.7A 2015-06-24 2015-06-24 Vision system for opposite side alignment Pending CN105023871A (en)

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Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
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Publications (1)

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CN105023871A true CN105023871A (en) 2015-11-04

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018019277A1 (en) * 2016-07-29 2018-02-01 上海微电子装备(集团)股份有限公司 Machine vision system for substrate alignment and alignment device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040156028A1 (en) * 2002-12-24 2004-08-12 Shoichi Okada Both side projection exposure apparatus
CN102520509A (en) * 2011-12-07 2012-06-27 燕山大学 photonic crystal optical fiber splicing imaging system
CN104316003A (en) * 2014-10-31 2015-01-28 北京航空航天大学 Online detection device and method for polarization axis alignment in direct coupling process of polarization-preserving fiber ring and Y waveguide

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040156028A1 (en) * 2002-12-24 2004-08-12 Shoichi Okada Both side projection exposure apparatus
CN102520509A (en) * 2011-12-07 2012-06-27 燕山大学 photonic crystal optical fiber splicing imaging system
CN104316003A (en) * 2014-10-31 2015-01-28 北京航空航天大学 Online detection device and method for polarization axis alignment in direct coupling process of polarization-preserving fiber ring and Y waveguide

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018019277A1 (en) * 2016-07-29 2018-02-01 上海微电子装备(集团)股份有限公司 Machine vision system for substrate alignment and alignment device
US10985044B2 (en) 2016-07-29 2021-04-20 Shanghai Micro Electronics Equipment (Group) Co., Ltd. Machine vision system for substrate alignment and alignment device

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Application publication date: 20151104