CN104991357A - Liquid crystal display glass substrate etching bearing tool and top-injection etching machine - Google Patents
Liquid crystal display glass substrate etching bearing tool and top-injection etching machine Download PDFInfo
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- CN104991357A CN104991357A CN201510366230.4A CN201510366230A CN104991357A CN 104991357 A CN104991357 A CN 104991357A CN 201510366230 A CN201510366230 A CN 201510366230A CN 104991357 A CN104991357 A CN 104991357A
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- pod apertures
- loading plate
- guiding region
- auxiliary guiding
- glass substrate
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
The invention provides a liquid crystal display glass substrate etching bearing tool comprising a side frame and at least one bearing plate disposed in the side frame. Two opposite ends of the at least one bearing plate are fixed to the side frame; a trench is formed in the surface of the at least one bearing plate; the trench extends along an extending direction of the at least one bearing plate; a plurality of diversion holes communicated with the bearing plate are formed in the bottom surface of the trench; the end part edge where the diversion holes are formed in the bottom surface of the trench, is provided with an auxiliary diversion area; and the auxiliary diversion area is communicated with the diversion holes.
Description
Technical field
The present invention relates to liquid crystal panel manufacturing technology field, particularly a kind of LCD glass substrate etching bearing fixture and top-jet-type etching machine.
Background technology
Liquid crystal display is the main flow flat panel display technology on current market, and the structure that the liquid crystal glass base of available liquid crystal display is general comprises: the TFT substrate of fitting up and down and CF substrate, and is poured into the liquid crystal molecule between this TFT substrate and CF substrate.Before the liquid crystal glass base of standard is shaping, need to carry out thinning and cutting and separating to the glass substrate of sheet material dress.Wherein, the thinning thickness of glass size referring to the outside surface that reduction glass substrate two is relative, to meet the liquid crystal glass base thickness of needs described in design code.In prior art, conventional thinning equipment has dip etch equipment and top-jet-type etching machines.Wherein, top-jet-type etching machines adopts spray mode to etch described glass substrate outside surface, before spray, first glass substrate is vertically fixed on the bearing fixture in sprinkling equipment, through hole is set in the groove of bearing fixture for used etching liquid circulation.But, be positioned at glass substrate after etching and trench contact position there will be water ripples due to the short stay of etching liquid, affect glass baseplate surface quality.
Summary of the invention
Technical matters to be solved by this invention is to provide a kind of bearing fixture, solves the technical matters of the edge fail when quantum dot film improves backlight colour gamut.
The present invention also provides a kind of display device.
To achieve these goals, embodiment of the present invention provides following technical scheme:
The invention provides a kind of LCD glass substrate etching bearing fixture, described bearing fixture comprises frame and is positioned at least one loading plate of frame, at least one loading plate opposite end described and frame are fixed, the surface of at least one loading plate described is provided with groove, described groove along at least one loading plate bearing of trend extend, the bottom surface of described groove is provided with the pod apertures of several through loading plate, the end edge that described pod apertures is positioned at described trench bottom surfaces is provided with auxiliary guiding region, described auxiliary guiding region and pod apertures UNICOM.
Wherein, described pod apertures xsect is oval, the through described loading plate in described auxiliary guiding region, and auxiliary guiding region is the part beyond the maximum circular hole that formed within the scope of pod apertures perisporium centered by pod apertures axis.
Wherein, described auxiliary guiding region is formed for cutting described trench bottom surfaces to pod apertures axis direction, the shaft section of described auxiliary guiding region is funnel-form and comprises the top mouth and end mouth that are positioned at trench bottom surfaces, the diameter of described top mouth is greater than mouth diameter of the described end, and end mouth diameter is identical with described pod apertures diameter.
Wherein, the major axis bearing of trend of described pod apertures is identical with described groove bearing of trend.
Wherein, described glass substrate comprises two relative outside surfaces, and described auxiliary guiding region is positioned at outside described two outside surfaces.
Wherein, described loading plate is severally be spaced the bar shaped plate body in described frame.
The invention provides a kind of top-jet-type etching machine, etch for LCD glass substrate, it comprises bearing fixture, described bearing fixture comprises frame and is positioned at least one loading plate of frame, at least one loading plate opposite end described and frame are fixed, the surface of at least one loading plate described is provided with groove, described groove along at least one loading plate bearing of trend extend, the bottom surface of described groove is provided with the pod apertures of several through loading plate, the end edge that described pod apertures is positioned at described trench bottom surfaces is provided with auxiliary guiding region, described auxiliary guiding region and pod apertures UNICOM.
Wherein, described pod apertures xsect is oval, the through described loading plate in described auxiliary guiding region, and auxiliary guiding region is the part beyond the maximum circular hole that formed within the scope of pod apertures perisporium centered by pod apertures axis.
Wherein, described auxiliary guiding region is formed for cutting described trench bottom surfaces to pod apertures axis direction, the shaft section of described auxiliary guiding region is funnel-form and comprises the top mouth and end mouth that are positioned at trench bottom surfaces, the diameter of described top mouth is greater than mouth diameter of the described end, and end mouth diameter is identical with described pod apertures diameter.
Wherein, the major axis bearing of trend of described pod apertures is identical with described groove bearing of trend.
The pod apertures periphery of bearing fixture of the present invention has auxiliary guiding region, etching solution effectively can be prevented to be deposited in groove around pod apertures and form water ripple phenomenon at glass substrate edge, ensure that the quality of glass baseplate surface.
Accompanying drawing explanation
In order to be illustrated more clearly in technical scheme of the present invention, be briefly described to the accompanying drawing used required in embodiment below, apparently, accompanying drawing in the following describes is only some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained as these accompanying drawings.
Fig. 1 is the bearing fixture floor map in better embodiment of the present invention.
Fig. 2 is the loading plate schematic cross-section of the bearing fixture shown in Fig. 1, and wherein, glass substrate dress in the inner.
Fig. 3 is the loading plate floor map shown in Fig. 1, and wherein, pod apertures cross section is oval.
Fig. 4 is the loading plate side schematic view shown in Fig. 3.
Fig. 5 is the loading plate floor map shown in Fig. 1, and wherein, pod apertures cross section is circular, and auxiliary guiding region is funneling.
Fig. 6 is the loading plate side schematic view shown in Fig. 5.
Embodiment
Below in conjunction with the accompanying drawing in embodiment of the present invention, the technical scheme in embodiment of the present invention is clearly and completely described.
Preferred embodiment of the present invention provides a kind of LCD glass substrate etching bearing fixture and top-jet-type etching machine.It is bearing glass substrate that described bearing fixture is used for carrying out etching at top-jet-type etching machine to LCD glass substrate.
Refer to Fig. 1 and Fig. 2, described bearing fixture comprises frame 10 and is positioned at least one loading plate 15 of frame 10, at least one loading plate 15 opposite end described and frame 10 are fixed, the surface of at least one loading plate 15 described is provided with groove 151, described groove 151 extends along the bearing of trend of at least one loading plate 15, the bottom surface of described groove 151 is provided with the pod apertures 152 of several through loading plate 15, the end edge that described pod apertures 152 is positioned at described groove 151 bottom surface is provided with auxiliary guiding region 153 (ginseng Fig. 3), described auxiliary guiding region 153 and pod apertures 152 UNICOM.
In the present embodiment, described frame 10 is rectangular box, and it comprises two relative first limits 11 and two relative Second Edge (not shown), and described two the first limits 11 connect described Second Edge.Described loading plate 15 is one or is more than one several.Be described for several loading plate 15 in the present embodiment.Described loading plate 15 is bar shaped plate body, and several loading plate 15 is spaced in described frame 10, and the two ends of each loading plate 15 are individually fixed on described first limit 11 and described Second Edge.One concave surface of described loading plate 15 forms groove 151.The bearing of trend of described groove 151 is identical with the bearing of trend of loading plate 15.The bottom surface 1510 of described groove 151 is arcwall face.Described several pod apertures 152 is spaced in described groove 151.
Further, refer to Fig. 3, in first embodiment of the invention, described pod apertures 152 xsect is oval, the through described loading plate 15 in described auxiliary guiding region 153, and auxiliary guiding region 153 is the part beyond the maximum circular hole that formed within the scope of pod apertures 152 perisporium centered by pod apertures 152 axis.Further, the major axis bearing of trend of described pod apertures 152 is identical with described groove 151 bearing of trend.
See also Fig. 4, concrete, circle is drawn centered by the axis of described pod apertures 152, this circle is circle maximum in described oval pod apertures 152 scope, the other parts removing the part at this circle place are the auxiliary guiding region 153 in the present embodiment, cross section, described auxiliary guiding region 153 is an oval part, in the present embodiment, described auxiliary guiding region 153 is along the aperture that pod apertures 152 is positioned at bottom surface 1510 to bottom surface 1510 sunken inside and extends to form away from pod apertures 152, cross section, described auxiliary guiding region 153 is the selenodont part of transverse two ends bearing of trend, part A as shown in Figure 2.
Refer to Fig. 2, described glass substrate 20 comprises two relative outside surfaces 21, and described auxiliary guiding region 153 is positioned at outside described two outside surfaces 21.Be positioned at directly over pod apertures 152 in the groove 151 glass substrate 20 being positioned over described loading plate 15, the edge of two outside surfaces 21 of described glass substrate 20 and the bottom surface 1510 of groove 151 support, the side of glass substrate 20 and described pod apertures 152 just to and there is gap, described auxiliary guiding region 153 is positioned at the width of the position outside outside surface 21 much larger than described glass substrate.When using etching solution to spray to glass substrate 20, etching solution trickles in groove 151 along outside surface 21, groove 151 is flowed out through pod apertures 152, due to the existence of auxiliary guiding region 153, for etching solution provides enough spaces, avoid outside surface 21 and groove 151 contact position of glass substrate 20 produces etching solution be deposited in groove make outside surface produce excessive corrosion to form water ripples surperficial, ensure that the etching quality of face glass.
Refer to Fig. 5 and Fig. 6, in another embodiment of the present invention, part different from the embodiment described above is: described auxiliary guiding region 155 is formed for cutting described groove 151 bottom surface to pod apertures 152 axis direction, the shaft section of described auxiliary guiding region 155 is funnel-form and comprises the top mouth 1551 and end mouth 1552 that are positioned at groove 151 bottom surface 1510, the diameter of described top mouth 1551 is greater than mouth 1552 diameter of the described end, and end mouth 1552 diameter is identical with described pod apertures 152 diameter.Concrete, described auxiliary guiding region 155 is a funnel-form and is placed on pod apertures 152 one end periphery to be communicated with pod apertures 152, and the inwall of described auxiliary guiding region 155 is the surface tilted, and namely forms the funnel shaped with elongated hole footpath as shown in Figure 5.Described auxiliary guiding region 155 is positioned at the width of the position outside outside surface 21 much larger than described glass substrate.When using etching solution to spray to glass substrate 20, etching solution trickles in groove 151 along outside surface 21, etching solution flow to after pod apertures 152 through auxiliary guiding region 153 and flows out, due to the existence of auxiliary guiding region 155, for etching solution provides enough spaces, avoid outside surface 21 and groove 151 contact position of glass substrate 20 produces etching solution pile up and make outside surface produce excessive corrosion to form water ripples surperficial, ensure that the etching quality of face glass.In addition, the described auxiliary guiding region 155 in the present embodiment does not have complete through described loading plate 15, ensure that the intensity of loading plate 15 under the depth information not changing loading plate 15.
The pod apertures periphery of bearing fixture of the present invention has auxiliary guiding region, etching solution effectively can be prevented to be deposited in groove around pod apertures and form water ripple phenomenon at glass substrate edge, ensure that the quality of glass baseplate surface.
The above is the preferred embodiment of the present invention; it should be pointed out that for those skilled in the art, under the premise without departing from the principles of the invention; can also make some improvements and modifications, these improvements and modifications are also considered as protection scope of the present invention.
Claims (10)
1. a LCD glass substrate etching bearing fixture, it is characterized in that, described bearing fixture comprises frame and is positioned at least one loading plate of frame, at least one loading plate opposite end described and frame are fixed, the surface of at least one loading plate described is provided with groove, described groove along at least one loading plate bearing of trend extend, the bottom surface of described groove is provided with the pod apertures of several at least one loading plate through, the end edge that described pod apertures is positioned at described trench bottom surfaces is provided with auxiliary guiding region, described auxiliary guiding region and pod apertures UNICOM.
2. LCD glass substrate etching bearing fixture as claimed in claim 1, it is characterized in that, described pod apertures xsect is oval, the through described loading plate in described auxiliary guiding region, and auxiliary guiding region is the part beyond the maximum circular hole that formed within the scope of pod apertures perisporium centered by pod apertures axis.
3. LCD glass substrate etching bearing fixture as claimed in claim 1, it is characterized in that, described auxiliary guiding region is formed for cutting described trench bottom surfaces to pod apertures axis direction, the shaft section of described auxiliary guiding region is funnel-form and comprises the top mouth and end mouth that are positioned at trench bottom surfaces, the diameter of described top mouth is greater than mouth diameter of the described end, and end mouth diameter is identical with described pod apertures diameter.
4. LCD glass substrate etching bearing fixture as claimed in claim 2, it is characterized in that, the major axis bearing of trend of described pod apertures is identical with described groove bearing of trend.
5. the LCD glass substrate etching bearing fixture as described in any one of claim 3 or 4, it is characterized in that, described glass substrate comprises two relative outside surfaces, and described auxiliary guiding region is positioned at outside described two outside surfaces.
6. the bearing fixture as described in any one of claim 5, is characterized in that, described loading plate is severally be spaced the bar shaped plate body in described frame.
7. a top-jet-type etching machine, etch for LCD glass substrate, it comprises bearing fixture, it is characterized in that, described bearing fixture comprises frame and is positioned at least one loading plate of frame, at least one loading plate opposite end described and frame are fixed, the surface of at least one loading plate described is provided with groove, described groove along at least one loading plate bearing of trend extend, the bottom surface of described groove is provided with the pod apertures of several through loading plate, the end edge that described pod apertures is positioned at described trench bottom surfaces is provided with auxiliary guiding region, described auxiliary guiding region and pod apertures UNICOM.
8. top-jet-type etching machine as claimed in claim 7, it is characterized in that, described pod apertures xsect is oval, the through described loading plate in described auxiliary guiding region, and auxiliary guiding region is the part beyond the maximum circular hole that formed within the scope of pod apertures perisporium centered by pod apertures axis.
9. top-jet-type etching machine as claimed in claim 7, it is characterized in that, described auxiliary guiding region is formed for cutting described trench bottom surfaces to pod apertures axis direction, the shaft section of described auxiliary guiding region is funnel-form and comprises the top mouth and end mouth that are positioned at trench bottom surfaces, the diameter of described top mouth is greater than mouth diameter of the described end, and end mouth diameter is identical with described pod apertures diameter.
10. top-jet-type etching machine as claimed in claim 8, it is characterized in that, the major axis bearing of trend of described pod apertures is identical with described groove bearing of trend.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510366230.4A CN104991357B (en) | 2015-06-26 | 2015-06-26 | LCD glass substrate etches bearing fixture and top-jet-type etching machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510366230.4A CN104991357B (en) | 2015-06-26 | 2015-06-26 | LCD glass substrate etches bearing fixture and top-jet-type etching machine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104991357A true CN104991357A (en) | 2015-10-21 |
| CN104991357B CN104991357B (en) | 2018-12-07 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510366230.4A Active CN104991357B (en) | 2015-06-26 | 2015-06-26 | LCD glass substrate etches bearing fixture and top-jet-type etching machine |
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| Country | Link |
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| CN (1) | CN104991357B (en) |
Citations (9)
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|---|---|---|---|---|
| CN1532305A (en) * | 2002-10-15 | 2004-09-29 | 长濑产业株式会社 | Etching liquid managing method and etching liquid managing device |
| CN1907582A (en) * | 2005-08-02 | 2007-02-07 | 未来视野股份有限公司 | Treating liquid feed device |
| CN1955132A (en) * | 2005-08-12 | 2007-05-02 | 智圆技术株式会社 | Etching device of glass substrate |
| CN101197255A (en) * | 2006-12-08 | 2008-06-11 | Lg.菲利浦Lcd株式会社 | Apparatus for etching substrate and fabrication line for fabricating liquid crystal display using the same |
| KR20090044826A (en) * | 2007-11-01 | 2009-05-07 | 주식회사 해진아이엠피 | Glass etching system with co-axial pipe nozzle |
| CN101555101A (en) * | 2008-04-10 | 2009-10-14 | M.M.科技株式会社 | Down-type substrate sliming device and slimming system using the same |
| KR20120051842A (en) * | 2010-11-15 | 2012-05-23 | (주)에프아이에스 | Eching apparatus with guide blade |
| CN203269785U (en) * | 2013-05-28 | 2013-11-06 | 湖北优尼科光电技术有限公司 | Glass substrate slot etching equipment |
| CN103880295A (en) * | 2014-02-26 | 2014-06-25 | 江西沃格光电股份有限公司 | Glass thinning equipment and glass thinning method |
-
2015
- 2015-06-26 CN CN201510366230.4A patent/CN104991357B/en active Active
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1532305A (en) * | 2002-10-15 | 2004-09-29 | 长濑产业株式会社 | Etching liquid managing method and etching liquid managing device |
| CN1907582A (en) * | 2005-08-02 | 2007-02-07 | 未来视野股份有限公司 | Treating liquid feed device |
| CN1955132A (en) * | 2005-08-12 | 2007-05-02 | 智圆技术株式会社 | Etching device of glass substrate |
| CN101197255A (en) * | 2006-12-08 | 2008-06-11 | Lg.菲利浦Lcd株式会社 | Apparatus for etching substrate and fabrication line for fabricating liquid crystal display using the same |
| KR20090044826A (en) * | 2007-11-01 | 2009-05-07 | 주식회사 해진아이엠피 | Glass etching system with co-axial pipe nozzle |
| CN101555101A (en) * | 2008-04-10 | 2009-10-14 | M.M.科技株式会社 | Down-type substrate sliming device and slimming system using the same |
| KR20120051842A (en) * | 2010-11-15 | 2012-05-23 | (주)에프아이에스 | Eching apparatus with guide blade |
| CN203269785U (en) * | 2013-05-28 | 2013-11-06 | 湖北优尼科光电技术有限公司 | Glass substrate slot etching equipment |
| CN103880295A (en) * | 2014-02-26 | 2014-06-25 | 江西沃格光电股份有限公司 | Glass thinning equipment and glass thinning method |
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| Publication number | Publication date |
|---|---|
| CN104991357B (en) | 2018-12-07 |
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