CN104952908B - A kind of OLED display panel and preparation method thereof - Google Patents
A kind of OLED display panel and preparation method thereof Download PDFInfo
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Abstract
The present invention relates to OLED field of display technology, more particularly to a kind of OLED display panel and preparation method thereof, there is the electrochromic layer of hole injection and/or hole transport function by increasing in traditional OLED display panel, simultaneously using electrochromic layer in the characteristic different with transmitance possessed when being not powered on or reflectivity that be powered, realize that OLED display panel transparency is adjustable, to improve the contrast of transparent OLED display panel, in addition the variation of electrochromic layer reflectivity when being powered, also the luminous efficiency that microcavity effect further increases transparent OLED display panel can be formed with cathode.
Description
Technical field
The present invention relates to OLED field of display technology more particularly to a kind of OLED display panel and preparation method thereof.
Background technique
OLED, that is, Organic Light Emitting Diode (Organic Light-Emitting Diode), because having frivolous, power saving
Etc. characteristics, therefore this display equipment has obtained extensive utilization on digital product.OLED display technology is compared to more traditional
LCD (Liquid CrystalDisplay, i.e. liquid crystal display) display mode is different, is not necessarily to backlight, use is very thin to be had
Machine material coating and glass substrate, when a current passes through, these organic materials will shine.It is shown as display equipment OLED
Screen equally will receive the influence of environmental factor, and especially under the environment of strong light, the display effect of OLED display screen is equally had
Declined.
As shown in Figure 1, common transparent OLED structures mainly include TFT (the Thin film being sequentially stacked from the bottom to top
Transistor, i.e. thin film transistor (TFT)) backboard 11, transparent anode 12, oled layer (include hole injection/transport layer 13, shine
Layer 14, electron injection/transport layer 15) and transparent cathode 16, since transparent anode 12 and transparent cathode 16 are all made of transparent electricity
Pole material is formed, and has the characteristics that double-side, therefore the efficiency of OLED device and contrast are undesirable.Improve OLED's
Efficiency can also be realized other than using better luminescent material by forming microcavity effect.
OLED Anodic and cathode in view of normal transparent are transparent material, therefore can not form microcavity effect, transparent
OLED device efficiency is lower compared with top emitting and bottom emitting device, therefore ideal shape is not achieved in the luminous efficiency of OLED and contrast
State.How to provide the novel technical solution of one kind becomes the direction that those skilled in the art are dedicated to research.
Summary of the invention
In view of deficiency in the prior art, technical solution of the present invention provides a kind of OLED display panel and preparation method thereof.
For the technical solution by during prepared by OLED display panel, increasing by one layer of electrochromic layer preparation process, utilization is electroluminescent
Photochromic layer transmitance or the different of emissivity when being powered and being not powered on realize the adjustable of OLED transparency, to improve OLED
The contrast and efficiency of display panel.
The present invention to solve above-mentioned technical problem used by technical solution are as follows:
A kind of OLED display panel, which is characterized in that the OLED display panel includes:
Substrate；
Anode layer is set on the substrate；
Organic layer is set on the anode layer, and an electrochromic layer is provided in the organic layer；And
Cathode layer is set on the organic layer.
Preferably, above-mentioned OLED display panel, wherein the anode layer is transparent anode layer, and the cathode layer is half
Transparent half reflection cathode layer.
Preferably, above-mentioned OLED display panel, wherein the electrochromic layer with a thickness of 0.5~500nm.
Preferably, above-mentioned OLED display panel, wherein the organic layer includes OLED device layer；
The OLED device layer include the hole injection layer, hole transmission layer, luminescent layer that are sequentially stacked from the bottom to top with
And electron transfer layer, the electrochromic layer is set between the anode layer and the hole injection layer and/or the hole
Between implanted layer and the hole transmission layer, or
The electrochromic layer doping is set among the hole injection layer and/or the hole transmission layer.
Preferably, above-mentioned OLED display panel, wherein the electrochromic layer is single conductive organic matter
Or inorganic matter.
Preferably, above-mentioned OLED display panel, wherein the material of the electrochromic layer has including at least two to be led
Electrical organic matter or inorganic matter or organic inorganic hybridization object.
Preferably, above-mentioned OLED display panel, wherein when the OLED device layer shines, the electrochromic layer exists
Transmitance in visible-range is less than 30%.
Preferably, above-mentioned OLED display panel, wherein when the OLED device layer does not shine, the electrochromic layer
Transmitance in visible-range is greater than 80%.
Preferably, above-mentioned OLED display panel, wherein there is the electrochromic layer hole injection and/or hole to pass
Transmission function.
Preferably, above-mentioned OLED display panel, wherein the substrate is TFT backplate.
A kind of preparation method of OLED display panel, which is characterized in that the described method includes:
One TFT substrate is provided；
An anode layer is formed on the TFT substrate；
An organic layer is formed on the anode layer, and includes electrochromic layer in the organic layer；And
A cathode layer is formed on the organic layer.
Preferably, above-mentioned method, wherein the organic layer includes OLED device layer, the preparation step of the organic layer
Suddenly are as follows:
It is sequentially prepared hole injection layer, hole transmission layer, luminescent layer and electron transfer layer according to sequence from the bottom to top, with
Form the OLED device layer；And
Between the anode layer and the hole injection layer and/or the hole injection layer and the hole transmission layer it
Between prepare the electrochromic layer.
Preferably, above-mentioned method, wherein the forming method of the electrochromic layer is that independent vapor deposition is one or more layers
Film.
Preferably, above-mentioned method, wherein further include:
After forming the OLED device layer, pass through among the hole injection layer and/or the hole transmission layer
Doping process prepares the electrochromic layer.
The invention discloses a kind of OLED display panel and preparation method thereof, the technical solution in traditional OLED by showing
Increase the electrochromic layer with hole injection and/or hole transport function in panel, while being powered using electrochromic layer
Be not powered in the case of possessed transmitance or the different characteristic of reflectivity, realize that OLED display panel transparency is adjustable,
To improve the contrast of OLED display panel, in addition the electrochromic layer can form microcavity effect with cathode and further increase
The luminous efficiency of OLED display panel.
Detailed description of the invention
Upon reading the detailed description of non-limiting embodiments with reference to the following drawings, the present invention and its feature, outer
Shape and advantage will become more apparent upon.Identical label indicates identical part in all the attached drawings.Not deliberately proportionally
Draw attached drawing, it is preferred that emphasis is show the gist of the present invention.
Fig. 1 is the structural schematic diagram of traditional OLED display panel；
Fig. 2 is the structural schematic diagram of Electrochromic device；
Fig. 3~Fig. 6 is the structural schematic diagram of OLED display panel in the embodiment of the present invention；
Fig. 7 is the preparation process flow schematic diagram of OLED display panel in the embodiment of the present invention.
Specific embodiment
In the following description, a large amount of concrete details are given so as to provide a more thorough understanding of the present invention.So
And it is obvious to the skilled person that the present invention may not need one or more of these details and be able to
Implement.In other examples, in order to avoid confusion with the present invention, for some technical characteristics well known in the art not into
Row description.
In order to thoroughly understand the present invention, detailed step and detailed structure will be proposed in following description, so as to
Illustrate technical solution of the present invention.Presently preferred embodiments of the present invention is described in detail as follows, however other than these detailed descriptions, this
Invention can also have other embodiments.
Embodiment one:
To solve in the prior art because common OLED Anodic and cathode are transparent material, therefore microcavity effect can not be formed
It should cause the luminous efficiency of OLED and contrast that the defect of perfect condition is not achieved, the embodiment of the invention provides a kind of novel
OLED display panel structure, the structure by traditional OLED display panel increase have hole injection and/or hole pass
The electrochromic layer (Electrochromic Layer) of transmission function, to reach ideal effect.
It wherein, include substrate as shown in Fig. 2, the Electrochromic device structure of electrochromic layer application generally has the structure that is of five storeys
21, first transparency electrode 22, electrochromic layer 23, electrolyte 24, ion storage 25 and second transparency electrode 26.Ion storage
The effect of layer 25 is ion needed for providing or store discoloration, and the effect of electrolyte 24 is to transmit ion, while insulated electronic.It should
Under the effect of extra electric field, ion is injected into electrochromic layer 23 structure by ion storage 25, while electronics is by
One transparent electrode 22 is injected into electrochromic layer 23, and electrochromic layer 23 is caused to colour or fade after reaction.
For example, the off-color material of electrochromic layer is WO3(transparent) and NiO, reaction process can be by transparent WO3Turn
It is changed to nontransparent other materials, and then changes the reflectivity and transparency of electrochromic layer 23.
For above-mentioned principle, in embodiments of the present invention provided by OLED display panel basic structure, such as Fig. 3 and figure
Shown in 4, comprising:
Substrate (not shown), as a preferred scheme, in this embodiment preferably using TFT backplate as base
Plate；
Anode layer 31 is arranged on the substrate；
Organic layer (i.e. each layer structure within the scope of A), setting are provided with electroluminescent on anode layer 31 and in the organic layer
Photochromic layer 32；
Cathode layer 37 is arranged on organic layer.
In an embodiment of the present invention, organic layer is between anode layer 31 and cathode layer 37, as shown in figure 3, it is main
Including electrochromic layer 32, hole injection layer 33, hole transmission layer 34, luminescent layer 35, electron transfer layer 36；Wherein, hole is infused
Enter layer 33, hole transmission layer 34, luminescent layer 35 and electron transfer layer 36 to be sequentially stacked from the bottom to top and form OLED device layer.
In an embodiment of the present invention, referring to Fig. 3 and Fig. 4, which can be located at anode layer 31 and luminescent layer
Between 35, hole injection layer 33 and hole transmission layer 34 can be may be alternatively located between anode layer 31 and hole injection layer 33
Between, and the electrochromic layer 32 has the function of hole injection and hole transport.Certain electrochromic layer 32 can also be mixed
It is miscellaneous (structure to be not shown in the figure) among hole injection layer 33 and/or hole transmission layer 34, that is to say, that electrochromic layer 32
It can be located at or be doped in any one layer between anode layer 31 and luminescent layer 35, as long as not influencing hole injection and transmission,
In actual technique, setting position can be required according to specific technique to set, but has no substance to the present invention
It influences.
In an embodiment of the present invention, it is preferred that anode layer 31 is transparent anode layer, and cathode layer 37 is translucent half anti-
Penetrate cathode layer.
In an embodiment of the present invention, the preferred thickness of electrochromic layer maintain 0.5~500nm (such as 0.5nm,
100nm or 400nm and other thickness in the range) between.
Material selection for the electrochromic layer of the OLED display panel in the embodiment of the present invention, has diversification,
Such as: electrochromic layer can be single conductive organic matter or inorganic matter；Or two or more tool
Conductive organic matter doping or organic matter and inorganics doped formation.Specifically, the electrochromic layer can be conductive nothing
Machine object such as WO3 or conductive organic matter such as polythiophene class and its derivative, purple sieve essence class, tetrathiafulvalene, metal phthalocyanine class
Close object, terpyridyl derivative and complex etc..
Working mechanism and process based on above-mentioned electrochromic layer, in an embodiment of the present invention, because of OLED display surface
There are electrochromic layer in plate, which is transparent when OLED device layer does not shine；And when luminous, OLED is aobvious
Show that panel has electric current to pass through, the transmitance of electrochromic layer 32 greatly reduces, and reflectivity rises, even up to impermeable light state,
To form microcavity effect between translucent cathode layer 37, and then improve the luminous efficiency of OLED display panel；Simultaneously because of electricity
The transmitance decline of mutagens chromatograph 32 is even opaque, so the contrast of OLED display panel is also greatly promoted.
In an embodiment of the present invention, wherein when OLED device layer shines, electrochromic layer is saturating in visible-range
Rate is crossed less than 30%；When OLED device layer does not shine, transmitance of the electrochromic layer in visible-range is greater than 80%；Therefore
Dexterously using electrochromic layer, when being powered and being not powered on, the difference of transmitance or emissivity realizes OLED transparency
It is adjustable, to improve the contrast and efficiency of OLED display panel.
Embodiment two:
Based on above-mentioned OLED display panel structure, a kind of system of OLED display panel is additionally provided in the embodiment of the present invention
Preparation Method, technical solution described in embodiment one is equally applicable in the present embodiment, with technology described in sample embodiment
Scheme similarly adapts in example 1, therefore for portion of techniques scheme in this embodiment by it will not go into details.
Specifically, as shown in Figure 7:
Step S1, TFT substrate is provided, and forms anode layer on TFT substrate；
Step S2, an organic layer is formed on the anode layer；
Step S3, a cathode layer is formed on organic layer；
Wherein, electrochromic layer is formed in the organic layer.
In embodiments of the present invention, during preparing organic layer (including OLED device layer and electrochromic layer),
Its specific step are as follows: be sequentially prepared hole injection layer, hole transmission layer, luminescent layer and electronics according to sequence from the bottom to top and pass
Defeated layer, to form OLED device layer.
It in this step, further include between anode layer and hole injection layer and/or hole injection layer and hole transmission layer
Between prepare above-mentioned electrochromic layer；Or
Above-mentioned electrochromic layer step is prepared by doping among hole injection layer and/or hole transmission layer.
Embodiment three:
Based on above-mentioned OLED display panel structure, a kind of OLED display surface with specific material is provided in the embodiment
Plate, as shown in Figure 5.
For OLED display panel in the embodiment as an electrochromic device, basic structure includes: substrate
(Glass) 51/ transparent anode (ITO), 52/ hole injection layer, electrochromic layer (PEDOT:PEO:LiCF3SO3) 53/ hole transport
Layer (NPB) 54/ luminescent layer (Bebq2:Ir(MDQ)2(acac)) 55/ electron transfer layer (Alq3) 56/ semitransparent cathode (Mg:Ag=
1:9) 57/ refractive index matching layers (NPB) 58.
The derivative PEDOT of polythiophene is important hole-injecting material, the surface ITO can will be modified, conducive to the note in hole
Enter；It is also electrochromic material simultaneously, and the complex compound LiCF of polyethylene oxide (PEO) and lithium salts3SO3It is most to represent
The copolymer solid electrolyte of property, the two, which is spin-coated on ito anode, can be used as the ion storage and transfer function of electrochromic device,
Such device can realize electrochromism and electroluminescent dual function, so as to adjust OLED device by electrochromic layer
Transparency, realize the promotion of contrast.
In an embodiment of the present invention, the preparation of anode layer ITO can be 10 in vacuum chamber pressure-4Under conditions of Pa,
Using the ITO of traditional sputtering (Sputter) technique one layer of 15nm thickness of sputter on substrate as transparent anode 52.
In an embodiment of the present invention, in the preparation process of electrochromic layer 53 by the derivative PEDOT of polythiophene with
The mixed solution of electrolyte is by the way of spin coating, by adjusting parameters such as revolving speed and times, formed on ITO thickness 15~
Film between 50nm continues to toast 2 hours under 80 DEG C of vacuum turntables to remove remaining solvent, then raises the temperature to
It 150 DEG C of heat treatment certain times, such as 10min, is then made annealing treatment, to increase the planarization and compactness of film, in turn
Form the electrochromic layer 53.
It in an embodiment of the present invention, is 10 in vacuum chamber pressure after forming electrochromic layer 53-4Under conditions of Pa,
One layer of hole transmission layer (thickness 40nm) 54, luminescent layer (thickness 40nm) 55, electron transfer layer (thickness 30nm) 56 is successively deposited,
And then synthesis forms OLED device layer.
In an embodiment of the present invention, continue to keep vacuum chamber pressure constant, the Mg:Ag that vapor deposition a layer thickness is 25nm
Alloy is as semitransparent cathode 57, and the ratio of Mg:Ag is 1:9, and the NPB after one layer of 60nm is then deposited again is as index matching
Layer 58, and then improve the light emission rate of OLED display panel.
An OLED display panel can be to sum up formed, and because the presence of electrochromic layer can effectively improve OLED display surface
The contrast and efficiency of plate.
Example IV:
Based on above-mentioned OLED display panel structure, a kind of OLED display surface with specific material is provided in the embodiment
Plate, as shown in Figure 6.
For OLED display panel in the embodiment as an electrochromic device, basic structure includes: substrate
(Glass) 61/ transparent anode (ITO), 62/ hole injection layer, electrochromic layer (WO3) 63/ solid electrolyte (MPEO-LiClO4)
64/ luminescent layer, 65/ electron transfer layer (Alq of ion storage (MEH-PPV or EO-PPEV)3) 66/ semitransparent cathode (Mg:Ag)
67/ refractive index matching layers (NPB) 68.
In an embodiment of the present invention, electrochromic layer 63 is inorganic matter WO3, electroluminescence layer and ion storage are
MEH-PPV or EO-PPEV.WO3It is a kind of hole-injecting material, can be used as p-doping material, single film forming can also be prepared into
Modify ITO；It is also electrochromic material simultaneously, and MPEO-LiClO4It is a kind of solid electrolyte, can be used as electrochromism device
Electrochromism and EL function equally can be achieved in the ion storage and transfer function of part, such device, so as to
The transparency that OLED device is adjusted by electrochromic layer, realizes the promotion of contrast.
In an embodiment of the present invention, the preparation of anode ITO can be 10 in vacuum chamber pressure-4Under conditions of Pa, adopt
Use the ITO of traditional sputtering (Sputter) technique one layer of 15nm thickness of sputter on substrate as transparent anode 62.
In an embodiment of the present invention, it is 10 in vacuum chamber pressure-4Under conditions of Pa, one layer of WO of thermal evaporation deposition3It is thin
Film, then by MPEO (poly glycol monomethyl ether) and a certain amount of LiClO4WO is spin-coated on after mixed solvent stirring3On film, dry
To remove remaining solvent, then one layer of MEH-PPV or EO-PPEV of spin coating is deposited as electroluminescence layer and ion again within roasting 2 hours
Reservoir.
In an embodiment of the present invention, continue under conditions of keeping vacuum chamber pressure constant, one layer of electronics is successively deposited
Transport layer Alq3(thickness 30nm) and Mg:Al alloy (thickness 25nm)；The NPB of one layer of 60nm thickness is finally deposited again as refractive index
Matching layer.
An OLED display panel can be to sum up formed, and because the presence of electrochromic layer can effectively improve OLED display surface
The contrast and efficiency of plate.
In conclusion the technical solution is by passing the invention discloses a kind of OLED display panel and preparation method thereof
Increase the electrochromic layer with hole injection and/or hole transport function in OLED display panel of uniting, while utilizing electroluminescent change
Chromatograph realizes that OLED display panel is transparent in the characteristic different with transmitance possessed when being not powered on or reflectivity that be powered
Degree is adjustable, to improve the contrast of OLED display panel, in addition the electrochromic layer can be formed with cathode microcavity effect into
The luminous efficiency of one step raising OLED display panel.
It should be appreciated by those skilled in the art that those skilled in the art combine the prior art and above-described embodiment can be real
The existing change case, such change case do not affect the essence of the present invention, and it will not be described here.
Presently preferred embodiments of the present invention is described above.It is to be appreciated that the invention is not limited to above-mentioned
Particular implementation, devices and structures not described in detail herein should be understood as gives reality with the common mode in this field
It applies；Anyone skilled in the art, without departing from the scope of the technical proposal of the invention, all using the disclosure above
Methods and technical content many possible changes and modifications are made to technical solution of the present invention, or be revised as equivalent variations etc.
Embodiment is imitated, this is not affected the essence of the present invention.Therefore, anything that does not depart from the technical scheme of the invention, foundation
Technical spirit of the invention any simple modifications, equivalents, and modifications made to the above embodiment, still fall within the present invention
In the range of technical solution protection.
Claims (13)
1. a kind of OLED display panel, which is characterized in that the OLED display panel includes:
Substrate；
Anode layer is set on the substrate；
Organic layer is set on the anode layer, and an electrochromic layer is provided in the organic layer；And
Cathode layer is set on the organic layer；
The anode layer is transparent anode layer, and the cathode layer is translucent half reflection cathode layer；
The electrochromic layer and the cathode layer form microcavity effect.
2. OLED display panel as described in claim 1, which is characterized in that the electrochromic layer with a thickness of 0.5~
500nm。
3. OLED display panel as described in claim 1, which is characterized in that the organic layer includes OLED device layer；
The OLED device layer includes the hole injection layer being sequentially stacked from the bottom to top, hole transmission layer, luminescent layer and electricity
Sub- transport layer, the electrochromic layer is set between the anode layer and the hole injection layer and/or hole injection
Between layer and the hole transmission layer, or
The electrochromic layer doping is set among the hole injection layer and/or the hole transmission layer.
4. OLED display panel as claimed in claim 3, which is characterized in that the electrochromic layer is single conductive
Organic matter or inorganic matter.
5. OLED display panel as claimed in claim 3, which is characterized in that the material of the electrochromic layer includes at least two
Kind conductive organic matter or inorganic matter or organic inorganic hybridization object.
6. OLED display panel as claimed in claim 3, which is characterized in that described electroluminescent when the OLED device layer shines
Transmitance of the photochromic layer in visible-range is less than 30%.
7. OLED display panel as claimed in claim 3, which is characterized in that when the OLED device layer does not shine, the electricity
Transmitance of the mutagens chromatograph in visible-range is greater than 80%.
8. OLED display panel as described in claim 1, which is characterized in that the electrochromic layer have hole injection and/
Or hole transport function.
9. OLED display panel as described in claim 1, which is characterized in that the substrate is TFT backplate.
10. a kind of preparation method of OLED display panel, which is characterized in that the described method includes:
One TFT substrate is provided；
An anode layer is formed on the TFT substrate；
An organic layer is formed on the anode layer, and includes electrochromic layer in the organic layer；And
A cathode layer is formed on the organic layer；
The anode layer is transparent anode layer, and the cathode layer is translucent half reflection cathode layer；
The electrochromic layer and the cathode layer form microcavity effect.
11. method as claimed in claim 10, which is characterized in that the organic layer includes OLED device layer, described organic
The preparation step of layer are as follows:
It is sequentially prepared hole injection layer, hole transmission layer, luminescent layer and electron transfer layer according to sequence from the bottom to top, to be formed
The OLED device layer；And
It is made between the anode layer and the hole injection layer and/or between the hole injection layer and the hole transmission layer
The standby electrochromic layer.
12. method as claimed in claim 11, which is characterized in that the forming method of the electrochromic layer is that independent vapor deposition is
One or more layers film.
13. method as claimed in claim 11, which is characterized in that further include:
After forming the OLED device layer, pass through doping among the hole injection layer and/or the hole transmission layer
Technique prepares the electrochromic layer.
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| CN1671256A (en) * | 2004-03-17 | 2005-09-21 | 铼宝科技股份有限公司 | Organic electroluminescent display element |
| US20070077452A1 (en) * | 2005-10-04 | 2007-04-05 | Jie Liu | Organic light emitting devices having latent activated layers and methods of fabricating the same |
| CN103681766A (en) * | 2013-12-13 | 2014-03-26 | 京东方科技集团股份有限公司 | Organic light emitting diode, display panel and display device |
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Address after: 201506, building two, building 100, 1, Jinshan Industrial Road, 208, Shanghai, Jinshan District Patentee after: Shanghai Hehui optoelectronic Co., Ltd Address before: 201506, building two, building 100, 1, Jinshan Industrial Road, 208, Shanghai, Jinshan District Patentee before: EverDisplay Optronics (Shanghai) Ltd. |