CN104927881A - Liquid crystal alignment composition - Google Patents
Liquid crystal alignment composition Download PDFInfo
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- CN104927881A CN104927881A CN201510111023.4A CN201510111023A CN104927881A CN 104927881 A CN104927881 A CN 104927881A CN 201510111023 A CN201510111023 A CN 201510111023A CN 104927881 A CN104927881 A CN 104927881A
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- liquid crystal
- nitrogen
- pyrrolidone
- crystal alignment
- propyl
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- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 53
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims abstract description 33
- 239000012046 mixed solvent Substances 0.000 claims abstract description 28
- 239000002904 solvent Substances 0.000 claims abstract description 25
- 229920005575 poly(amic acid) Polymers 0.000 claims abstract description 15
- 239000004642 Polyimide Substances 0.000 claims abstract description 10
- 229920001721 polyimide Polymers 0.000 claims abstract description 10
- 229920000642 polymer Polymers 0.000 claims abstract description 6
- 239000000126 substance Substances 0.000 claims description 10
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 8
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- OXMGUTQVUIWQEK-UHFFFAOYSA-N [N].CC(=O)N(C)C Chemical compound [N].CC(=O)N(C)C OXMGUTQVUIWQEK-UHFFFAOYSA-N 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 239000000758 substrate Substances 0.000 abstract description 26
- 238000000576 coating method Methods 0.000 abstract description 15
- 238000000034 method Methods 0.000 abstract description 9
- 239000011248 coating agent Substances 0.000 abstract description 8
- 230000008569 process Effects 0.000 abstract description 7
- 238000007641 inkjet printing Methods 0.000 abstract description 2
- GHELJWBGTIKZQW-UHFFFAOYSA-N 1-propan-2-ylpyrrolidin-2-one Chemical compound CC(C)N1CCCC1=O GHELJWBGTIKZQW-UHFFFAOYSA-N 0.000 abstract 2
- 238000000710 polymer precipitation Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 21
- 238000007639 printing Methods 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 9
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 5
- 150000004985 diamines Chemical class 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 230000001276 controlling effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- -1 polyoxyethylene Polymers 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- PQNFLJBBNBOBRQ-UHFFFAOYSA-N indane Chemical compound C1=CC=C2CCCC2=C1 PQNFLJBBNBOBRQ-UHFFFAOYSA-N 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- LFBALUPVVFCEPA-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 LFBALUPVVFCEPA-UHFFFAOYSA-N 0.000 description 1
- YGYCECQIOXZODZ-UHFFFAOYSA-N 4415-87-6 Chemical group O=C1OC(=O)C2C1C1C(=O)OC(=O)C12 YGYCECQIOXZODZ-UHFFFAOYSA-N 0.000 description 1
- 229920006310 Asahi-Kasei Polymers 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- 238000007774 anilox coating Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- DKQVJMREABFYNT-UHFFFAOYSA-N ethene Chemical group C=C.C=C DKQVJMREABFYNT-UHFFFAOYSA-N 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- MHRLWUPLSHYLOK-UHFFFAOYSA-N thiomorpholine-3,5-dicarboxylic acid Chemical compound OC(=O)C1CSCC(C(O)=O)N1 MHRLWUPLSHYLOK-UHFFFAOYSA-N 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/582—Recycling of unreacted starting or intermediate materials
Landscapes
- Liquid Crystal (AREA)
Abstract
A liquid crystal alignment composition comprises at least one polymer and a mixed solvent, wherein the polymer is selected from polyamic acid, polyimide or a combination of the two, and the mixed solvent is selected from a combination of ethylene glycol butyl ether and N-isopropyl-2-pyrrolidone or a combination of ethylene glycol butyl ether, N-isopropyl-2-pyrrolidone and an auxiliary solvent, wherein the auxiliary solvent can increase the solubility of the mixed solvent to the polymer. The composition can reduce the risk of polymer precipitation in the process of coating the liquid crystal alignment composition on a substrate by using an ink-jet printing mode, and has stable droplet coating condition and high alignment property in the coating process, and excellent diffusibility and leveling property on the substrate.
Description
Technical field
The invention relates to a kind of liquid crystal alignment composition, refer to a kind of liquid crystal alignment composition being applicable to ink jet type printing coating method especially.
Background technology
Liquid-crystal display mainly utilizes extra electric field that Liquid Crystal Molecules Alignment state is changed, and then causes polarisation of light state and direction to change, and uses the display effect obtaining comparison of light and shade.
Along with the expansion of screen sizes, liquid-crystal display has developed in each picture element the liquid crystal display device that membrane transistor (Thin-Film Transistor, TFT) is all housed.When liquid crystal molecule is inserted between a pair substrate containing electrode, because liquid crystal is parallel different from the permitivity in perpendicular molecules direction, therefore need the arrangement mode controlling liquid crystal molecule by controlling electric field.On the other hand, because liquid crystal molecule has birefringent characteristic, the polar biased direction of polar biased light can be regulated and controled by the change of Liquid Crystal Molecules Alignment state.The change of Liquid Crystal Molecules Alignment state must by allowing liquid crystal molecule have the orientation of uniform tilt angle and fixed-direction to reach on substrate.Mode conventional is at present on substrate, be coated with one deck alignment film, the orientation controlling liquid crystal molecule by this alignment film and the tilt angle providing liquid crystal molecule stable.When extra electric field is closed, liquid crystal molecule returns to original arrangement against the high forces (Anchoring force) and coefficient of elasticity thereof with alignment film interface.
The method that current industry prepares alignment film is by liquid crystal alignment composition coating on the surface of the substrate, utilizes friction or other modes that the molecule of this film surface is directed, provides follow-up liquid crystal molecule of inserting to topple over towards fixed-direction by this.This orientation composition can comprise polyvinyl alcohol, polyoxyethylene glycol, polymeric amide, polyamic acid or polyimide, wherein polyamic acid and polyimide have excellent heat-resistant quality and good machinery, electric and endurance owing to having, and are the most often utilized as alignment film material.Polyamic acid carries out by diamines and tetracarboxylic acid or tetracarboxylic dianhydride the polymer that polyreaction obtains, and polyimide is generally undertaken obtained by high temperature dehydration ring-closure reaction [namely imidization (Imidization)] by polyamic acid.
The mainly roll printing printing of past alignment film coating method, is transferred to substrate by alignment film material, to obtain the alignment film of uniform film thickness by APR plate (ASAHI KASEI photosensitive resin plate).But except APR plate need are cleaned and changed, expensive spreading roller (Doctor Roll) and anilox roll (AniloxRoll) also need periodic replacement, and especially run into large size panel, this problem will be more obvious.Therefore, in order to the demand in response to large size panel, the coating of alignment film turns to ink jet type coating method by the coating method of APR plate transfer printing gradually.
But, existing ink jet type printing technology, though there are many advantages being better than roll printing printing, but still have many technology to be overcome, such as, for be coated on substrate and to form the liquid crystal alignment composition of liquid crystal orienting film in ink jet type printing, in coating process, except the precipitation risk that need reduce the alignment film material of polyamic acid or polyimide, also need stable drop-coated to have troubles and high collimation, and this orientation composition also should have excellent diffustivity and levelling property on substrate, diffusion inequality or the unequal situation generation of thickness is produced to avoid formed alignment film.
Summary of the invention
Therefore, object of the present invention, namely one is being provided to be applicable to ink jet type mode of printing, in coating process, except the precipitation risk that can reduce the alignment film material of polyamic acid or polyimide, there is stable drop-coated simultaneously have troubles and high collimation, and the alignment film formed also has excellent diffustivity and the liquid crystal alignment composition of levelling property.
So liquid crystal alignment composition of the present invention, comprise at least one polymkeric substance and mixed solvent.
This polymkeric substance is selected from polyamic acid, polyimide or both combination aforementioned.
This mixed solvent is the combination being selected from butyl glycol ether and nitrogen-sec.-propyl-2-Pyrrolidone, or the combination of butyl glycol ether, nitrogen-sec.-propyl-2-Pyrrolidone and secondary solvent, and wherein, this secondary solvent can increase this mixed solvent to this structure adaptability degree.
Effect of the present invention utilizes this mixed solvent containing butyl glycol ether, nitrogen-sec.-propyl-2-Pyrrolidone, this liquid crystal alignment composition is allowed to be applied in the process of substrate in use ink jet type mode of printing, this polymkeric substance can be reduced and separate out risk, and make this liquid crystal alignment composition in coating process, have stable drop-coated to have troubles and outside high collimation, also there is excellent diffustivity and levelling property on substrate, and formed alignment film can be avoided to produce diffusion inequality or the unequal situation generation of thickness.
Below will be described in detail with regard to content of the present invention:
[polymkeric substance]
The polymkeric substance of liquid crystal alignment composition of the present invention is selected from polyamic acid, polyimide or both combination aforementioned.This polyamic acid is preferably obtained by after tetracarboxylic dianhydride and diamine reactant.This polyimide is preferably obtained by polyamic acid carries out after imidization reaction.
This tetracarboxylic dianhydride can be any be applicable to prepare polyamic acid containing tetracarboxylic dianhydride's compound, preferably, this tetracarboxylic dianhydride is selected from 1,2,3,4-cyclobutanetetracarboxylic dianhydride, pyromellitic acid anhydride, 3,3', 4,4'-bibenzene tetracarboxylic dianhydride, 3,4-dicarboxyls-1,2,3,4-tetrahydrochysene-1-naphthalene succinic acid dianhydride, 1,2,3,4-ethylene-dimalonic acid dianhydride, ethene-ethylene glycol-bis-(dehydration trimellitate) (TMEG-100), 2,3,5-tricarboxylic cyclopentane guanidine-acetic acids dianhydride (TCA).
This diamines can be any be applicable to prepare polyamic acid containing diamine compound, preferably, this diamines is selected from 5 (6)-amino-1,3,3-trimethylammonium-1-(4-aminophenyl) indane (TMDA), 4'-propyl group-bis-(hexanaphthene)-4-base-3,5-diamino-2-methyl-toluate.
Preferably, be 100 parts by weight with this liquid crystal alignment composition gross weight, this polymer content is 2 ~ 5 weight parts.
[mixed solvent]
This mixed solvent is selected from: the combination of (1) butyl glycol ether and nitrogen-sec.-propyl-2-Pyrrolidone, and the combination of (2) butyl glycol ether, nitrogen-sec.-propyl-2-Pyrrolidone and secondary solvent.To be further described with regard to above-mentioned two kinds of aspects respectively below:
(1) mixed solvent is the combination of butyl glycol ether and nitrogen-sec.-propyl-2-Pyrrolidone:
Preferably, in the gross weight of this mixed solvent for 100wt%, the content range of butyl glycol ether is 20 to 70wt%, and the content range of nitrogen-sec.-propyl-2-Pyrrolidone is 30 to 80wt%.More preferably, the content range of butyl glycol ether is 30 to 60wt%, and the content range of nitrogen-sec.-propyl-2-Pyrrolidone is 40 to 70wt%.Because this butyl glycol ether can increase the levelling property of composition on substrate, therefore, be under the combination aspect of butyl glycol ether and nitrogen-sec.-propyl-2-Pyrrolidone at mixed solvent, if when the content of this butyl glycol ether is less than 20wt%, the leveling ability deteriorate of liquid crystal alignment composition on substrate can be caused; If when content is greater than 70wt%, then nitrogen-sec.-propyl-2-Pyrrolidone the content for dissolving this polymkeric substance is caused to reduce, causing this polymkeric substance to have the risk of precipitation.
(2) combination of butyl glycol ether, nitrogen-sec.-propyl-2-Pyrrolidone and secondary solvent:
This secondary solvent can be and anyly can increase the solvent of this mixed solvent to this structure adaptability degree, and preferably, this secondary solvent is selected from nitrogen-N-methyl-2-2-pyrrolidone N-, gamma-butyrolactone, nitrogen, nitrogen-N,N-DIMETHYLACETAMIDE, dimethyl sulfoxide (DMSO) or aforesaid combination.More preferably, this secondary solvent is nitrogen-N-methyl-2-2-pyrrolidone N-.
Preferably, in the gross weight of this mixed solvent for 100wt%, the content range of butyl glycol ether is 20 to 70wt%, the content summation scope of nitrogen-sec.-propyl-2-Pyrrolidone and secondary solvent is 30 to 80wt%, and the content ratio scope of secondary solvent and nitrogen-sec.-propyl-2-Pyrrolidone is for being greater than 0 to being less than 4.When the content ratio scope of secondary solvent and nitrogen-sec.-propyl-2-Pyrrolidone is for being not less than 4, the not good and levelling property of the diffustivity of liquid crystal alignment composition on substrate can be allowed to reduce.
[liquid crystal alignment composition]
This liquid crystal alignment composition is obtained after this polymkeric substance being dissolved in this mixed solvent.
This liquid crystal alignment composition utilizes jet printer to be applied to substrate surface with ink jet printing mode, to form liquid crystal orienting film.
Accompanying drawing is sketched
Without of the present invention other feature and effect, clearly present in reference to graphic embodiment, wherein:
Embodiment 1 is applied to the photograph after substrate (ink-jet spacing be 230 μm, applying voltage be 22V) through ink jet type mode of printing by Fig. 1; And
Comparative example 1 is applied to the photograph after substrate (ink-jet spacing be 230 μm, applying voltage be 22V) through ink jet type mode of printing by Fig. 2.
Embodiment
The present invention will be described further with regard to following examples, but it is to be understood that this embodiment is only the use illustrated, and should not be interpreted as restriction of the invention process.
< embodiment 1 ~ 4, comparative example 1 ~ 2>
Prepare liquid crystal alignment composition
Respectively according to mixing nitrogen-N-methyl-2-2-pyrrolidone N-of ratio shown in table 1 and 2 (NMP), nitrogen-sec.-propyl-2-Pyrrolidone (NIP) and butyl glycol ether (BC), an obtained mixed solvent.
After polyamic acid solution RA9002 (reaching emerging material to sell) being drained the former solvent of removing, add in above-mentioned gained mixed solvent respectively, and to be diluted to polyamide acid content concentration be 3.5wt%, obtain the liquid crystal alignment composition of embodiment 1 ~ 4 and comparative example 1 ~ 2.
The coating test > of < liquid crystal alignment composition on substrate
[ink-jet spacing (drop spacing) is set as 230 μm to utilize Fujifilm Dimatix nanosecond science and technology jet printer, applying voltage sets is 22V], use ink jet type mode of printing to be applied to substrate surface embodiment 1 ~ 4 and the liquid crystal alignment composition of comparative example 1 ~ 2, give drying and form liquid crystal orienting film.Observation group's compound is after coating, and its drop diffusion diameter and institute form the face of alignment film and central difference of altitude, and result is as shown in table 1 and table 2.Again embodiment 1 and comparative example 1 are 230 μm respectively at ink-jet spacing, apply under voltage is the condition of 22V, above-mentioned Fujifilm Dimatix nanosecond science and technology jet printer is used to be applied to substrate surface, recycling opticmicroscope is taken pictures, and obtains the photograph of Fig. 1 (embodiment 1) and Fig. 2 (comparative example 1).
Table 1
Table 2
By table 1, Fig. 1 and Fig. 2 is known, the embodiment 1 that mixed solvent uses nitrogen-sec.-propyl-2-Pyrrolidone (NIP) and butyl glycol ether (BC) to combine, compare with the comparative example 1 replacing nitrogen-sec.-propyl-2-Pyrrolidone (NIP) with nitrogen-N-methyl-2-2-pyrrolidone N-(NMP), the drop diffusion diameter of composition after coating of comparative example 1 shortens (namely composition diffustivity is deteriorated), proved invention liquid crystal alignment composition need contain nitrogen-sec.-propyl-2-Pyrrolidone (NIP) and butyl glycol ether (BC) two kinds of solvents simultaneously, said composition just can have excellent diffustivity in the process being applied to substrate with ink jet type mode of printing.
As shown in Table 2, when mixed solvent is simultaneously containing butyl glycol ether (BC), nitrogen-sec.-propyl-2-Pyrrolidone (NIP) and nitrogen-N-methyl-2-2-pyrrolidone N-(NMP, secondary solvent) time, the drop diffusion diameter of composition after coating of comparative example 2 shortens (namely composition diffustivity is deteriorated), and the liquid crystal orienting film face formed and center height missionary society become (i.e. composition leveling ability deteriorate) greatly, confirm liquid crystal alignment composition of the present invention, when mixed solvent is butyl glycol ether (BC), during the combination of nitrogen-sec.-propyl-2-Pyrrolidone (NIP) and secondary solvent [nitrogen-N-methyl-2-2-pyrrolidone N-(NMP)], in the gross weight of this mixed solvent for 100wt%, the content range of butyl glycol ether is required to be 20 to 70wt%, the content summation scope of nitrogen-sec.-propyl-2-Pyrrolidone and secondary solvent is required to be 30 to 80wt%, the content ratio scope of secondary solvent and nitrogen-sec.-propyl-2-Pyrrolidone need be less than 4, this liquid crystal alignment composition just can have stable drop-coated and have troubles and high collimation in the process being applied to substrate with ink jet type mode of printing, and there is excellent diffustivity and levelling property on substrate.
In sum, contain butyl glycol ether by this, the mixed solvent of nitrogen-sec.-propyl-2-Pyrrolidone can allow this liquid crystal alignment composition be applied in the process of substrate in use ink jet type mode of printing, there is stable drop-coated have troubles and high collimation, and also there is excellent diffustivity and levelling property on substrate, thus the alignment film avoided the formation of on substrate has diffusion inequality or the unequal situation of thickness to produce, therefore really can reach object of the present invention.
Only as described above, be only preferred embodiment of the present invention, when not limiting scope of the invention process with this, the simple equivalence namely generally done according to the present patent application the scope of the claims and patent specification content changes and modifies, and all still remains within the scope of the patent.
Claims (7)
1. a liquid crystal alignment composition, comprises:
At least one polymkeric substance, this polymkeric substance is selected from polyamic acid, polyimide or both combination aforementioned; And
Mixed solvent is the combination being selected from butyl glycol ether and nitrogen-sec.-propyl-2-Pyrrolidone, or the combination of butyl glycol ether, nitrogen-sec.-propyl-2-Pyrrolidone and secondary solvent, and wherein, this secondary solvent can increase this mixed solvent to this structure adaptability degree.
2. liquid crystal alignment composition as claimed in claim 1, wherein, this secondary solvent is selected from nitrogen-N-methyl-2-2-pyrrolidone N-, gamma-butyrolactone, nitrogen, nitrogen-N,N-DIMETHYLACETAMIDE, dimethyl sulfoxide (DMSO) or aforesaid combination.
3. liquid crystal alignment composition as claimed in claim 1, wherein, this mixed solvent is the combination of butyl glycol ether and nitrogen-sec.-propyl-2-Pyrrolidone.
4. liquid crystal alignment composition as claimed in claim 3, wherein, in the gross weight of this mixed solvent for 100wt%, the content range of butyl glycol ether is 20 to 70wt%, and the content range of nitrogen-sec.-propyl-2-Pyrrolidone is 30 to 80wt%.
5. liquid crystal alignment composition as claimed in claim 1, wherein, this mixed solvent is the combination of butyl glycol ether, nitrogen-sec.-propyl-2-Pyrrolidone and secondary solvent.
6. liquid crystal alignment composition as claimed in claim 5, wherein, in the gross weight of this mixed solvent for 100wt%, the content range of butyl glycol ether is 20 to 70wt%, the content summation scope of nitrogen-sec.-propyl-2-Pyrrolidone and secondary solvent is 30 to 80wt%, and the content ratio scope of secondary solvent and nitrogen-sec.-propyl-2-Pyrrolidone is for being greater than 0 to being less than 4.
7. liquid crystal alignment composition as claimed in claim 1, wherein, be 100 parts by weight with composition gross weight, this polymer content is 2 ~ 5 weight parts.
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TW103110141A TWI522421B (en) | 2014-03-18 | 2014-03-18 | Liquid crystal alignment composition |
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CN113185719A (en) * | 2021-04-30 | 2021-07-30 | 滁州惠科光电科技有限公司 | Solvent of alignment film, alignment film solution, preparation method of alignment film and application of alignment film |
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JP6146135B2 (en) * | 2012-08-30 | 2017-06-14 | Jsr株式会社 | Liquid crystal aligning agent, liquid crystal aligning film, method for producing liquid crystal aligning film, and liquid crystal display element |
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CN113185719A (en) * | 2021-04-30 | 2021-07-30 | 滁州惠科光电科技有限公司 | Solvent of alignment film, alignment film solution, preparation method of alignment film and application of alignment film |
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TW201536859A (en) | 2015-10-01 |
TWI522421B (en) | 2016-02-21 |
JP2015179269A (en) | 2015-10-08 |
JP6161649B2 (en) | 2017-07-12 |
CN104927881B (en) | 2019-04-30 |
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