CN104926152A - Preparation method of novel doped SiO2 and Sn ion self-cleaning coating liquid - Google Patents
Preparation method of novel doped SiO2 and Sn ion self-cleaning coating liquid Download PDFInfo
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- CN104926152A CN104926152A CN201510275704.4A CN201510275704A CN104926152A CN 104926152 A CN104926152 A CN 104926152A CN 201510275704 A CN201510275704 A CN 201510275704A CN 104926152 A CN104926152 A CN 104926152A
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Abstract
The invention discloses a preparation method of novel doped SiO2 and Sn ion self-cleaning coating liquid. The novel doped SiO2 and Sn ion self-cleaning coating liquid is prepared in the steps of doping photovoltaic antireflection coating liquid and stannic chloride pentahydrate into a photocatalyst self-cleaning coating liquid, also charging little absolute ethyl alcohol and uniformly mixing according to a given ratio. Self-cleaning glass prepared by utilizing the self-cleaning coating liquid has a good effect for absorbing visible light, so that the defects of TiO2 particles of only absorbing ultraviolet of the specific wavelength can be overcome, the photocatalytic performance of the self-cleaning glass also can be improved, and the photodecomposition index of the self-cleaning glass for methylene blue reaches 12 mol/l/min or more.
Description
Technical field
The present invention relates to self-cleaned by photocatalyst and be coated with liquid and preparation method thereof, specifically belong to novel doping SiO2 and Sn ion automatically cleaning painting liquid and preparation method thereof.
Background technology
The market demand of self-cleaning glass constantly increases, and makes the basis of self-cleaning glass for this reason---and automatically cleaning masking liquid is also constantly weeded out the old and bring forth the new again.In order to solve the light transmission characteristics merging automatically cleaning masking liquid and glass self, research and development Novel photocatalyst automatically cleaning masking liquid is the megatrend of market development.Mostly organism solvent is adopted in self-cleaned by photocatalyst masking liquid and relevant mixing solutions early phase thereof.This kind solvent in use because shortcoming is inherently as strong volatility, to the hazardness of human body, inflammableness etc.The direction that researchist constantly finds and explores in follow-up study performance history is changed into: 1, new type water-solubility solvent; 2, the solvent of new type water and simple harmless organism mixing; 3, novel nano doping and strong adsorptivity hydrous solvent.But above-mentioned three are explored developing way, are not respective independence, but mutually merge development.With strengthen the sticking power of masking liquid coating and glass basis, wearing quality, enhancing masking liquid coating glass basis light transmission be basic, never there is change to facilitate for the purpose of processing and actual high volume applications as far as possible.
Summary of the invention
The invention provides novel doping SiO2 and Sn ion automatically cleaning painting liquid and preparation method thereof, compensate for TiO2 particulate only has sorption defect to specific wavelength ultraviolet, adopt the self-cleaning glass photocatalysis performance of this kind of automatically cleaning masking liquid processing to be greatly improved.
In order to achieve the above object, the present invention is by the following technical solutions:
Novel doping SiO2 and Sn ion automatically cleaning are coated with liquid and preparation method thereof, mix the anti-reflection antireflective masking liquid of photovoltaic and stannic chloride pentahydrate, add a small amount of dehydrated alcohol simultaneously, mix make according to certain ratio in self-cleaned by photocatalyst masking liquid.Use the self-cleaning glass that this automatically cleaning masking liquid is obtained, stronger sorption is had to visible ray, TiO2 particulate only has sorption defect to specific wavelength ultraviolet can be made up, improve the photocatalysis performance of self-cleaning glass simultaneously, make the photolysis index of this kind of self-cleaning glass to methylene blue reach more than 12mol/l/min.
Preferably, the proportioning that described novel doping SiO2 colloid and Sn ion automatically cleaning are coated with Related Component in liquid and preparation method thereof is the volume ratio of the anti-reflection antireflective masking liquid of photovoltaic and self-cleaned by photocatalyst masking liquid is 1% ~ 15%, the volume ratio of dehydrated alcohol and self-cleaned by photocatalyst masking liquid is 2%, stannic chloride pentahydrate is analytical pure rank, Contents of Main Components > 95%, the mass ratio of itself and self-cleaned by photocatalyst masking liquid is 0.6 ~ 4%.
The concrete preparation method of novel doping SiO2 colloid and Sn ion automatically cleaning masking liquid is: temperature controls 15 DEG C ~ 25 DEG C time, first in self-cleaned by photocatalyst masking liquid, proportionally add the anti-reflection antireflective masking liquid of photovoltaic, proportionally stannic chloride pentahydrate is added after uniform stirring, proportionally dehydrated alcohol is added while not stopping to stir, after stannic chloride pentahydrate dissolves cmpletely, by still aging for this mixed solution at least 8h.
Compared with the prior art, use the self-cleaning glass that the present invention obtains, stronger sorption is had to visible ray, TiO2 particulate only has sorption defect to specific wavelength ultraviolet can be made up, improve the photocatalysis performance of self-cleaning glass simultaneously, make the photolysis index of this kind of self-cleaning glass to methylene blue reach more than 12mol/l/min.
Embodiment
Example 1: the volume ratio of photovoltaic is anti-reflection antireflective masking liquid and self-cleaned by photocatalyst masking liquid is 1%, the volume ratio of dehydrated alcohol and self-cleaned by photocatalyst masking liquid is 2%, analytical pure level stannic chloride pentahydrate (Contents of Main Components > 95%) is 0.6% with the mass ratio of self-cleaned by photocatalyst masking liquid, the novel doping SiO2 colloid be made after mixing and the self-cleaned by photocatalyst masking liquid of Sn4+ ion, using the self-cleaning glass that this kind of self-cleaned by photocatalyst masking liquid is made, is 12mol/l/min. to the photodissociation index of methylene blue
Example 2: the volume ratio of photovoltaic is anti-reflection antireflective masking liquid and self-cleaned by photocatalyst masking liquid is 12%, the volume ratio of dehydrated alcohol and self-cleaned by photocatalyst masking liquid is 2%, analytical pure level stannic chloride pentahydrate (Contents of Main Components > 95%) is 2.5% with the mass ratio of self-cleaned by photocatalyst masking liquid, the novel doping SiO2 colloid be made after mixing and the self-cleaned by photocatalyst masking liquid of Sn ion, using the self-cleaning glass that this kind of self-cleaned by photocatalyst masking liquid is made, is 19mol/l/min. to the photodissociation index of methylene blue
Example 3: the volume ratio of photovoltaic is anti-reflection antireflective masking liquid and self-cleaned by photocatalyst masking liquid is 15%, the volume ratio of dehydrated alcohol and self-cleaned by photocatalyst masking liquid is 2%, analytical pure level stannic chloride pentahydrate (Contents of Main Components > 95%) is 4% with the mass ratio of self-cleaned by photocatalyst masking liquid, the novel doping SiO2 colloid be made after mixing and Sn ion automatically cleaning masking liquid, using the self-cleaning glass that this kind of self-cleaned by photocatalyst masking liquid is made, is 17mol/l/min to the photodissociation index of methylene blue.
Claims (3)
1. novel doping SiO2 and Sn ion automatically cleaning are coated with liquid and preparation method thereof, mix the anti-reflection antireflective masking liquid of photovoltaic and stannic chloride pentahydrate, add a small amount of dehydrated alcohol simultaneously, mix make according to certain ratio in self-cleaned by photocatalyst masking liquid.Use the self-cleaning glass that this automatically cleaning masking liquid is obtained, stronger sorption is had to visible ray, TiO2 particulate only has sorption defect to specific wavelength ultraviolet can be made up, improve the photocatalysis performance of self-cleaning glass simultaneously, make the photolysis index of this kind of self-cleaning glass to methylene blue reach more than 12mol/l/min.
2. novel doping SiO2 according to claim 1 and Sn ion automatically cleaning are coated with liquid and preparation method thereof, it is characterized in that: in described preparation method, the proportioning of Related Component is the volume ratio of the anti-reflection antireflective masking liquid of photovoltaic and self-cleaned by photocatalyst masking liquid is 1% ~ 15%, the volume ratio of dehydrated alcohol and self-cleaned by photocatalyst masking liquid is 2%, stannic chloride pentahydrate is analytical pure rank, Contents of Main Components > 95%, the mass ratio of itself and self-cleaned by photocatalyst masking liquid is 0.6 ~ 4%.
3. the concrete preparation method of novel doping SiO2 colloid and Sn ion automatically cleaning masking liquid: temperature controls 15 DEG C ~ 25 DEG C time, first in self-cleaned by photocatalyst masking liquid, proportionally add the anti-reflection antireflective masking liquid of photovoltaic, proportionally stannic chloride pentahydrate is added after uniform stirring, proportionally dehydrated alcohol is added while not stopping to stir, after stannic chloride pentahydrate dissolves cmpletely, by still aging for this mixed solution at least 8h.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201510275704.4A CN104926152A (en) | 2015-05-19 | 2015-05-19 | Preparation method of novel doped SiO2 and Sn ion self-cleaning coating liquid |
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| CN201510275704.4A CN104926152A (en) | 2015-05-19 | 2015-05-19 | Preparation method of novel doped SiO2 and Sn ion self-cleaning coating liquid |
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| CN104926152A true CN104926152A (en) | 2015-09-23 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101928517A (en) * | 2009-06-19 | 2010-12-29 | 北京中科赛纳玻璃技术有限公司 | Nano self-cleaning paint and preparation method thereof |
| CN103086613A (en) * | 2013-03-05 | 2013-05-08 | 福建圣元电子科技有限公司 | Preparation method of anti-reflection self-cleaning coated glass |
| CN103613283A (en) * | 2013-11-21 | 2014-03-05 | 南通博凯新能源科技有限公司 | Preparation method of SiO2-TiO2 inorganic anti-reflection film |
| CN103627227A (en) * | 2013-11-27 | 2014-03-12 | 天津市职业大学 | Solar glass self-cleaning antireflection paint and production method thereof |
| CN104140693A (en) * | 2014-07-25 | 2014-11-12 | 天津市职业大学 | Production method for solar battery glass self-cleaning antireflection light-conversion coating |
-
2015
- 2015-05-19 CN CN201510275704.4A patent/CN104926152A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101928517A (en) * | 2009-06-19 | 2010-12-29 | 北京中科赛纳玻璃技术有限公司 | Nano self-cleaning paint and preparation method thereof |
| CN103086613A (en) * | 2013-03-05 | 2013-05-08 | 福建圣元电子科技有限公司 | Preparation method of anti-reflection self-cleaning coated glass |
| CN103613283A (en) * | 2013-11-21 | 2014-03-05 | 南通博凯新能源科技有限公司 | Preparation method of SiO2-TiO2 inorganic anti-reflection film |
| CN103627227A (en) * | 2013-11-27 | 2014-03-12 | 天津市职业大学 | Solar glass self-cleaning antireflection paint and production method thereof |
| CN104140693A (en) * | 2014-07-25 | 2014-11-12 | 天津市职业大学 | Production method for solar battery glass self-cleaning antireflection light-conversion coating |
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Application publication date: 20150923 |
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