CN104911571A - Photocatalytic nano titanium dioxide membrane high-temperature load process - Google Patents
Photocatalytic nano titanium dioxide membrane high-temperature load process Download PDFInfo
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- CN104911571A CN104911571A CN201510169544.5A CN201510169544A CN104911571A CN 104911571 A CN104911571 A CN 104911571A CN 201510169544 A CN201510169544 A CN 201510169544A CN 104911571 A CN104911571 A CN 104911571A
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- titanium dioxide
- nano titanium
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- dioxide film
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Abstract
The invention relates to a photocatalytic nano titanium dioxide membrane high-temperature load process. The process includes the steps of pretreatment on the substrate surface; spraying, spinning coating or impregnation of nano titanium dioxide sol on the substrate surface; and two heat treatment to form nano-titanium dioxide crystal layer on the substrate. The process provided by the invention has rigorous steps, and can produce nano titanium dioxide membrane with high hardness and wear resistance; and the membrane does not come off, and has long service life.
Description
Technical field
The invention belongs to a kind of photocatalysis membrana high temperature load technique, be specifically related to a kind of titanium dioxide film high temperature load technique.
Background technology
Along with the progress of science and technology, the production practice activity of the mankind constantly expands, and consequent environmental pollution and destruction have also arrived the degree being enough to threaten human survival.The photocatalysis membrana that development in recent years is got up, particularly nano titanium dioxide film, it is under the irradiation of light, can be oxidized most organic pollutant and part inorganic pollutant, and most final decline is kept to the innoxious substance such as carbonic acid gas and water.But existing nano titanium dioxide film film-forming process is general, manufacture the photocatalysis membrana hardness produced and wear no resistance, in use, film easily comes off, and does not meet actual operation requirements.
Summary of the invention
Goal of the invention: the object of the invention is, in order to overcome deficiency of the prior art, to provide a kind of processing step rigorous, the nano titanium dioxide film of high rigidity and wear resistance can be produced by this manufacture work, and film can not come off, long service life.
Technical scheme: in order to solve the problems of the technologies described above, photocatalytic nanometer titanium dioxide film high temperature load technique of the present invention, it comprises the following steps,
(1) pre-treatment is carried out to substrate surface;
(2) carry out on substrate surface spraying, spin coating or dipping nano titanic oxide sol, form nanometer titanium dioxide coating, coat-thickness is between 1.0-1.5 μm;
(3) through 500-800 DEG C of thermal treatment, base material forms nano titanium dioxide film;
(4) carry out quick high-temp thermal treatment in the oxygen enrichment heat treatment furnace base material of attachment nano titanium dioxide film being placed in 1200-1800 DEG C, heat treatment time is 3-6s, and base material is formed nano titanium oxide crystallizing layer.
Heat treatment mode in described step (3) and step (4) is the mode of the combustiblesubstance heating such as electrically heated, gas heating, coal heating or timber.
Nano titanium oxide crystallizing layer in described step (4) is pure titinium dioxide crystallizing layer or hydridization titanium dioxide crystal layer.
Nano titanium oxide crystallizing layer in described step (4) is high-hardness, wearable titanium dioxide crystal layer.
Described hydridization titanium dioxide crystal layer is all hydridization coating of titanium dioxide that can improve the element of photocatalysis performance of doping.
Beneficial effect: the present invention compared with prior art, its remarkable advantage is: each processing step of the present invention controls rigorous, pass through thermal treatment, titanium dioxide is made to infiltrate carbon atom, form titanium dioxide crystal layer, substantially increase hardness and the wear resisting property of film, and film can not come off, and substantially increases work-ing life.
Embodiment
Below in conjunction with embodiment, the present invention is further illustrated.
Embodiment 1:
Photocatalytic nanometer titanium dioxide film high temperature load technique of the present invention, it comprises the following steps,
(1) pre-treatment is carried out to substrate surface;
(2) carry out on substrate surface spraying, spin coating or dipping nano titanic oxide sol, form nanometer titanium dioxide coating, coat-thickness is 1.1 μm;
(3) through 600 DEG C of thermal treatments, base material forms nano titanium dioxide film;
(4) carry out quick high-temp thermal treatment in the oxygen enrichment heat treatment furnace base material of attachment nano titanium dioxide film being placed in 1300 DEG C, heat treatment time is 3.5s, and base material is formed nano titanium oxide crystallizing layer.
In the thermal treatment through step (4), titanium dioxide infiltrates carbon atom, and substantially increase hardness and the wear resisting property of film, the Vickers' hardness of the film of generation is 520Kg/mm
2.
Embodiment 2:
Photocatalytic nanometer titanium dioxide film high temperature load technique of the present invention, it comprises the following steps,
(1) pre-treatment is carried out to substrate surface;
(2) carry out on substrate surface spraying, spin coating or dipping nano titanic oxide sol, form nanometer titanium dioxide coating, coat-thickness is 1.2 μm;
(3) through 650 DEG C of thermal treatments, base material forms nano titanium dioxide film;
(4) carry out quick high-temp thermal treatment in the oxygen enrichment heat treatment furnace base material of attachment nano titanium dioxide film being placed in 1400 DEG C, heat treatment time is 4s, and base material is formed nano titanium oxide crystallizing layer.
In the thermal treatment through step (4), titanium dioxide infiltrates carbon atom, and substantially increase hardness and the wear resisting property of film, the Vickers' hardness of the film of generation is 550Kg/mm
2.
Embodiment 3:
Photocatalytic nanometer titanium dioxide film high temperature load technique of the present invention, it comprises the following steps,
(1) pre-treatment is carried out to substrate surface;
(2) carry out on substrate surface spraying, spin coating or dipping nano titanic oxide sol, form nanometer titanium dioxide coating, coat-thickness is 1.3 μm;
(3) through 700 DEG C of thermal treatments, base material forms nano titanium dioxide film;
(4) carry out quick high-temp thermal treatment in the oxygen enrichment heat treatment furnace base material of attachment nano titanium dioxide film being placed in 1600 DEG C, heat treatment time is 5s, and base material is formed nano titanium oxide crystallizing layer.
In the thermal treatment through step (4), titanium dioxide infiltrates carbon atom, and substantially increase hardness and the wear resisting property of film, the Vickers' hardness of the film of generation is 580Kg/mm
2.
Embodiment 4:
Photocatalytic nanometer titanium dioxide film high temperature load technique of the present invention, it comprises the following steps,
(1) pre-treatment is carried out to substrate surface;
(2) carry out on substrate surface spraying, spin coating or dipping nano titanic oxide sol, form nanometer titanium dioxide coating, coat-thickness is 1.4 μm;
(3) through 750 DEG C of thermal treatments, base material forms nano titanium dioxide film;
(4) carry out quick high-temp thermal treatment in the oxygen enrichment heat treatment furnace base material of attachment nano titanium dioxide film being placed in 1700 DEG C, heat treatment time is 5.5s, and base material is formed nano titanium oxide crystallizing layer.
In the thermal treatment through step (4), titanium dioxide infiltrates carbon atom, and substantially increase hardness and the wear resisting property of film, the Vickers' hardness of the film of generation is 600Kg/mm
2.
The invention provides a kind of thinking and method; the method and access of this technical scheme of specific implementation is a lot; the above is only the preferred embodiment of the present invention; should be understood that; for those skilled in the art, under the premise without departing from the principles of the invention, some improvements and modifications can also be made; these improvements and modifications also should be considered as protection scope of the present invention, and all available prior art of each integral part not clear and definite in the present embodiment is realized.
Claims (4)
1. photocatalytic nanometer titanium dioxide film high temperature load technique, is characterized in that: it comprises the following steps,
(1) pre-treatment is carried out to substrate surface;
(2) carry out on substrate surface spraying, spin coating or dipping nano titanic oxide sol, form nanometer titanium dioxide coating, coat-thickness is between 1.0-1.5 μm;
(3) through 500-800 DEG C of thermal treatment, base material forms nano titanium dioxide film;
(4) carry out quick high-temp thermal treatment in the oxygen enrichment heat treatment furnace base material of attachment nano titanium dioxide film being placed in 1200-1800 DEG C, heat treatment time is 3-6s, and base material is formed nano titanium oxide crystallizing layer.
2. photocatalytic nanometer titanium dioxide film high temperature load technique according to claim 1, is characterized in that: the heat treatment mode in described step (3) and step (4) is the mode of the combustiblesubstance heating such as electrically heated, gas heating, coal heating or timber.
3. photocatalytic nanometer titanium dioxide film high temperature load technique according to claim 1, is characterized in that: the nano titanium oxide crystallizing layer in described step (4) is pure titinium dioxide crystallizing layer or hydridization titanium dioxide crystal layer.
4. photocatalytic nanometer titanium dioxide film high temperature load technique according to claim 1, is characterized in that: the nano titanium oxide crystallizing layer in described step (4) is high-hardness, wearable titanium dioxide crystal layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN201510169544.5A CN104911571A (en) | 2015-04-10 | 2015-04-10 | Photocatalytic nano titanium dioxide membrane high-temperature load process |
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| CN201510169544.5A CN104911571A (en) | 2015-04-10 | 2015-04-10 | Photocatalytic nano titanium dioxide membrane high-temperature load process |
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| CN104911571A true CN104911571A (en) | 2015-09-16 |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003037996A1 (en) * | 2001-10-30 | 2003-05-08 | Kansai Paint Co., Ltd. | Coating compound for forming titanium oxide film, method for forming titanium oxide film and metal substrate coated with titanium oxide film |
| CN102268660A (en) * | 2011-06-20 | 2011-12-07 | 南昌大学 | Method for preparing TiO2 coating on surface of iron-based amorphous ribbon through sol-gel method |
| CN103834937A (en) * | 2012-11-21 | 2014-06-04 | 江苏康润净化科技有限公司 | Rapid high temperature heat treatment process of nano titanium dioxide coating |
-
2015
- 2015-04-10 CN CN201510169544.5A patent/CN104911571A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2003037996A1 (en) * | 2001-10-30 | 2003-05-08 | Kansai Paint Co., Ltd. | Coating compound for forming titanium oxide film, method for forming titanium oxide film and metal substrate coated with titanium oxide film |
| CN102268660A (en) * | 2011-06-20 | 2011-12-07 | 南昌大学 | Method for preparing TiO2 coating on surface of iron-based amorphous ribbon through sol-gel method |
| CN103834937A (en) * | 2012-11-21 | 2014-06-04 | 江苏康润净化科技有限公司 | Rapid high temperature heat treatment process of nano titanium dioxide coating |
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Application publication date: 20150916 |