CN1049059A - Antifogging double-layer reflection reducing coating - Google Patents
Antifogging double-layer reflection reducing coating Download PDFInfo
- Publication number
- CN1049059A CN1049059A CN89106212A CN89106212A CN1049059A CN 1049059 A CN1049059 A CN 1049059A CN 89106212 A CN89106212 A CN 89106212A CN 89106212 A CN89106212 A CN 89106212A CN 1049059 A CN1049059 A CN 1049059A
- Authority
- CN
- China
- Prior art keywords
- double
- reducing coating
- reflection reducing
- layer reflection
- hfo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000011248 coating agent Substances 0.000 title claims abstract description 14
- 238000000576 coating method Methods 0.000 title claims abstract description 14
- 239000000463 material Substances 0.000 abstract description 11
- 238000006243 chemical reaction Methods 0.000 abstract description 4
- 239000003595 mist Substances 0.000 abstract description 3
- 239000000203 mixture Substances 0.000 abstract description 3
- 239000005304 optical glass Substances 0.000 abstract description 3
- 238000002360 preparation method Methods 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 abstract description 2
- 230000003287 optical effect Effects 0.000 abstract description 2
- 239000011521 glass Substances 0.000 description 13
- 230000008021 deposition Effects 0.000 description 4
- 238000007872 degassing Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 238000004031 devitrification Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- -1 acid carbonate compound Chemical class 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000001455 metallic ions Chemical class 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- AHKZTVQIVOEVFO-UHFFFAOYSA-N oxide(2-) Chemical compound [O-2] AHKZTVQIVOEVFO-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
Landscapes
- Glass Compositions (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
The invention discloses a kind of antifogging double-layer reflection reducing coating, it is characterized in that adopting HfO
2Or Y
2O
3Or the HfP of 94-80% weight ratio
2Y with the 4-20% weight ratio
2O
3Double-layer reflection reducing coating as high index of refraction.Adopt the present invention to avoid and contain Pb, Ba, the optical glass generation chemical reaction of Cd composition and send out mist, rete is hard firmly, and optical characteristics is stable, good reproducibility, preparation technology is simple, transplants HfO easily
2, Y
2O
3Inexpensive being easy to of material obtains from market.
Description
The invention belongs to the double-layer reflection reducing coating in the optics.
Any optics and laser device all be unable to do without antireflecting film, otherwise will be low because of seeing through luminous energy, and background stray light can't work instrument by force.
Traditional antireflecting film all is individual layer MgF
2, its efficiency ratio is lower, and refractive index is 1.52 K, glass, the single face reflectivity can only drop to about 1.8% from 4.2% at visible region.Therefore, in the last few years, required to replace monofilm, because double-layer reflection reducing coating can make the residual reflectivity of visible region be reduced to below 0.3% with multilayer film.
The oxidation film of multilayer (mainly being double-deck) antireflecting film internal layer high index of refraction commonly used is (as ZrO
2, TiO
2, Ta
2O
3Deng), but chemical reaction can take place with the optical glass (comprising most glass such as BaK, ZK, LaK, KF, QF, F, BaF, ZBaF, ZF) that contains Pb, Cd, Ba in these materials.As refractive index is that 1.9 material utilizes ZrO usually
2, often select TiO for use and refractive index is 2.3 material
2And Ta
2O
3These materials can decompose in the heating evaporation process, thereby exist metallic ion or low oxide ion in rete, and the Pb in these ions and the glass, Cd, Ba plasma exchange, and with airborne steam, CO
2Generate acid carbonate compound or alkaline hydrated oxide Deng reaction, make glass produce corrosion and devitrification.
The objective of the invention is provides a kind of antifogging double-layer reflection reducing coating for overcoming above-mentioned mist phenomenon, has avoided the devitrification phenomenon of glass under the prerequisite that does not increase any process complexity, thereby obtains the high-quality antireflecting film of low reflection.
Feature of the present invention is: adopt HfO
2Or Y
2O
3Or the HfO of 94-80% weight ratio
2Y with the 6-20% weight ratio
2O
3Double-layer reflection reducing coating as high index of refraction.These materials are the high temperature hot-pressed material, and purity is better than 99%.
The film system design of double layer antireflection coating is ground floor half-wavelength ((λ on glass often
O)/2) low-index material of the high-index material of thickness and 1/4 wavelength ((λ O)/4) thickness, its refractive index is respectively 1.9 and 1.38.Perhaps adopt any thickness film system, the ground floor high refractive index film on glass and the thickness of second layer low refractive index film become with glass refraction, and its refractive index is respectively 2.3 and 1.38.Blackish green for reflected colour is repeated, the second layer (λ
O)/4 film adopts SiO
2And MgF
2Synthetic film, its thickness ratio is about 1: 2, makes the protruding peak, centre of w type curve be controlled at reflectivity about 0.6%.Because contain the glass of Pb, Ba, Cd composition, its refractive index is generally all than higher, so generally just can satisfy the antireflection requirement with duplicature.
The preparation process of plated film is as follows: with glass alcohol, ether cleans, dries, and puts into vacuum chamber and bleeds.And glass baking is heated to 180 ℃, when vacuum tightness reaches 2 * 10
-5During torr, to HfO
2Or Y
2O
3Or HfO
2With Y
2O
3Compound carries out degasification.Electron gun degasification power is: voltage 5.5KV, electric current rises to 100mA gradually from 20mA, and makes vacuum tightness be not less than 5 * 10
-5Torr.Get final product start vaporizer after the degasification, evaporation power is: voltage 5.8KW, electric current 100mA.Deposition rate is monitored with the quartz crystal frequency meter.And maintain in the 3～4A °/S scope.Plating the thick HfO of half-wave
2Behind the film, increase heating power,, then evaporate SiO about glass heats to 230 ℃
2, deposition rate is 4nm/S, deposition thickness is 1/3 1/4 λ
0, continue evaporation MgF then
2With the material fritting, after treating to fuse fully, opening the baffle controls deposition rate is 5nm/S, and supplies thickness to 1/4 λ with the molybdenum boat resistance heated
0
Facts have proved the glass kind that contains Pb, Ba, Cd: PK
2, BaK
1-9, ZK
1-20, LaK
1-3, KF
1-3, QF
1-5, F
1-13, TF
3, BaF
1-8, ZBaF
1-5, ZF
1-7, all can not use ZrO
2, TiO
2And Ta
2O
3, must adopt HfO
2Or Y
2O
3Or HfO
2With Y
2O
3Compound as the double-layer reflection reducing coating of high index of refraction.
The double-layer reflection reducing coating that adopts the present invention to be coated with can be avoided sending out mist with the optical glass generation chemical reaction that contains Pb, Ba, Cd composition, and rete is hard firmly, and optical characteristics is stable, and good reproducibility is avoided ZrO
2Refractive index inhomogeneity and make the shortcoming of rete characteristic variation, preparation technology is simple, transplants HfO easily
2, Y
2O
3Inexpensive being easy to of material obtains from market.
Claims (2)
1, a kind of antifogging double-layer reflection reducing coating is characterized in that adopting HfO
2Or Y
2O
3Or HfO
2With Y
2O
3Compound as the double-layer reflection reducing coating of high index of refraction.
2, a kind of antifogging double-layer reflection reducing coating according to claim 1 is characterized in that said HfO
2With Y
2O
3Compound be the HfO of 94-80% weight ratio
2Y with the 6-20% weight ratio
2O
3Compound.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN89106212A CN1016104B (en) | 1989-07-25 | 1989-07-25 | The corrosion protection double layer antireflection coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN89106212A CN1016104B (en) | 1989-07-25 | 1989-07-25 | The corrosion protection double layer antireflection coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1049059A true CN1049059A (en) | 1991-02-06 |
| CN1016104B CN1016104B (en) | 1992-04-01 |
Family
ID=4856671
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN89106212A Expired CN1016104B (en) | 1989-07-25 | 1989-07-25 | The corrosion protection double layer antireflection coating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1016104B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100447583C (en) * | 2007-03-30 | 2008-12-31 | 厦门大学 | Double-layer anti-reflection film for ultraviolet detector and its preparation method |
| CN101379582B (en) * | 2006-03-08 | 2011-04-06 | 浜松光子学株式会社 | Photoelectric surface, electron tube comprising same, and method for producing photoelectric surface |
| CN110359016A (en) * | 2019-03-19 | 2019-10-22 | 长春理工大学 | A kind of high-reflecting film and preparation method thereof |
-
1989
- 1989-07-25 CN CN89106212A patent/CN1016104B/en not_active Expired
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101379582B (en) * | 2006-03-08 | 2011-04-06 | 浜松光子学株式会社 | Photoelectric surface, electron tube comprising same, and method for producing photoelectric surface |
| CN100447583C (en) * | 2007-03-30 | 2008-12-31 | 厦门大学 | Double-layer anti-reflection film for ultraviolet detector and its preparation method |
| CN110359016A (en) * | 2019-03-19 | 2019-10-22 | 长春理工大学 | A kind of high-reflecting film and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1016104B (en) | 1992-04-01 |
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| SE01 | Entry into force of request for substantive examination | ||
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| PB01 | Publication | ||
| C13 | Decision | ||
| GR02 | Examined patent application | ||
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| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |