CN104863905A - Fluid accelerating device - Google Patents
Fluid accelerating device Download PDFInfo
- Publication number
- CN104863905A CN104863905A CN201510032313.XA CN201510032313A CN104863905A CN 104863905 A CN104863905 A CN 104863905A CN 201510032313 A CN201510032313 A CN 201510032313A CN 104863905 A CN104863905 A CN 104863905A
- Authority
- CN
- China
- Prior art keywords
- substrate
- length
- ring portion
- ring
- osculum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012530 fluid Substances 0.000 title claims abstract description 61
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims description 167
- 230000007704 transition Effects 0.000 claims description 26
- 239000007921 spray Substances 0.000 claims description 9
- 239000007788 liquid Substances 0.000 abstract description 10
- 238000005507 spraying Methods 0.000 abstract description 10
- 238000000034 method Methods 0.000 description 37
- 101001070647 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) 60S ribosomal protein L20-A Proteins 0.000 description 10
- 101001070655 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) 60S ribosomal protein L20-B Proteins 0.000 description 10
- 210000003739 neck Anatomy 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 238000004140 cleaning Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- NHDHVHZZCFYRSB-UHFFFAOYSA-N pyriproxyfen Chemical compound C=1C=CC=NC=1OC(C)COC(C=C1)=CC=C1OC1=CC=CC=C1 NHDHVHZZCFYRSB-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/40—Distributing applied liquids or other fluent materials by members moving relatively to surface
Abstract
The invention relates to a fluid accelerating device, which comprises a base, a first ring part and a second ring part; the first ring part is fixedly arranged on the base and provided with at least one water spraying channel and a plurality of air spraying channels which are arranged in the first ring part, the water spraying channel is provided with a water outlet hole which is arranged on the first ring part, the plurality of air spraying channels are provided with a plurality of corresponding air spraying holes which are arranged on the first ring part, and the water outlet hole is arranged on the outer side of the first ring part relative to the plurality of air spraying holes; the second ring part is rotatably connected with the base and surrounds the first ring part. The second ring part can rotate relative to the base, so that the fluid accelerating device can improve the collection rate of the processing liquid.
Description
[technical field]
The invention relates to a kind of fluid accelerating unit, refer to a kind of processing procedure that can be applicable to the flat-shaped substrate such as semiconductor crystal wafer, solar base plate, display glass substrate, LED-baseplate especially, but be not limited to these processing procedures, and when using different chemical product to carry out monolithic spin etch, cleaning in processing procedure, the unnecessary process fluid being used in substrate is transported to the fluid accelerating unit of gathering-device.
[background technique]
In substrate procedure for processing industry, be used in substrate process fluid not easily may obtain because of raw material, preparation procedure is numerous and diverse or need the factors such as specific preparation procedure, process fluid is often incured a considerable or great expense, therefore the process fluid being used for substrate is collected in specific collection container for processing to recycle be very important program, and therefore the collection rate of process fluid also becomes one of processing procedure operating cost height index.
Fig. 5 shows the substrate processing machine 1001A of a prior art, it has one base/support 1010A, one substrate rotating shaft 1016A, one substrate 1018A, one power plant 1050A, and a collecting ring 1500A, substrate 1018A system is fixed on substrate rotating shaft 1016A, process fluid 2000A puts on substrate 1018A, and power plant 1050A drives substrate rotating shaft 1016A and substrate 1018A respect thereto 1010A to rotate, process fluid 2000A is made to be uniformly distributed in substrate 1018A on the one hand, the centrifugal force produced through the rotation of substrate 1018A on the other hand and process fluid 2000A unnecessary on substrate 1018A is got rid of to collecting ring 1500A, to collect unnecessary process fluid 2000A by collecting ring 1500A.But, size between the collecting ring 1500A of this substrate processing machine 1001A and substrate 1018A is also improper, considerable process fluid 2000A is made to be dispersed to the inside of substrate processing machine 1001A, and significantly reduce the collection rate of process fluid 2000A, and bad impact may be caused on substrate processing machine 1001A.For the substrate processing machine an of this type, a collecting ring being suitable for 12 inch substrate processing machines of 12 inch substrate processing can reach 99.99% in the collection rate of collecting process fluid; If but when being used for processing 8 inch substrate by this 12 inch substrate processing machine, collecting ring is in the collection rate only about 60% of collecting process fluid.That is the substrate processing machine of prior art cannot be applicable to the substrate processing of many sizes.
Fig. 6 shows the substrate processing machine 1001B of another prior art, it has a base 1010B, one rotating ring 1014B, one substrate 1018B, one power plant 1050B, and a collecting ring 1500B, substrate 1018B system is fixed on substrate rotating shaft 1016B, rotating ring 1014B system is mounted to substrate rotating shaft 1016B, process fluid (not shown) puts on substrate 1018B, and power plant 1050B drives substrate rotating shaft 1016B, substrate 1018B, and rotating ring 1014B together rotates, and extend to the position close to collecting ring 1500B through rotating ring 1014B system, so as to promoting the collection rate of this process fluid.But in the configuration of this prior art, substrate 1018B and rotating ring 1014B system driven by same power plant 1050B, one side may the load of power plant 1050B be excessive or volume is excessive by making; On the other hand, under the rotating speed of certain limit, because the rotating speed of rotating ring 1014B is identical with substrate 1018B, the rotating speed of rotating ring 1014B is made to be limited to substrate 1018B and effectively process fluid cannot to be transported to collecting ring 1500B.
Fig. 7 shows the clean ring portion 1012C clean for substrate back of the substrate processing machine 1001C of a prior art again, and it is affixed or affixed with base (not shown) with substrate rotating shaft (not shown); That is, clean ring portion 1012C system and substrate and substrate rotating shaft with dynamic; Or substrate system can rotate by relative clean ring portion 1012C.Wherein, clean ring portion 1012C has multiple osculum 1024C and ring-likely jetly stitch 1026C with one, and osculum 1024C is used for providing cleaning liquid in substrate back, and ring-like jet seam 1026C is used for providing gas in substrate back, so as to cleaning of maintenance substrate back.But may there be too small problem in the aperture of osculum 1024C, cause the cleaning liquid being provided in substrate back not enough, cannot the effective cleaning base plate back side.In addition, ring-like jet seam 1026C not easily has uniform annular space, as long as the size of associated component or assembly process slightly error, ring-like jet its ring-like one end that is sewn in easily is made to have a larger gap section, and in its ring-like the other end, there is a less gap section, gas so just can be made not easily to be blown out by ring-like jet seam 1026C equably.
[summary of the invention]
In order to solve the problem, one of the object of the invention is provide a kind of fluid accelerating unit, it has one first ring portion being fixed on base, and this first ring portion has multiple fumarole, and can solve the disappearance of the ring-like jet seam air blowing inequality of prior art through these fumaroles; In addition, utilizing can one second ring portion of respect thereto and substrate rotating, and the substrate of fluid accelerating unit energy suitable for multiple sizes of the present invention process, and does not need as prior art palpus is subject to the influence of rotation speed of substrate.
According to one embodiment of the invention, a kind of fluid accelerating unit, comprising: a base, one first ring portion and one second ring portion; This first ring portion is fixedly arranged on this base, and has at least one osculum and multiple fumarole is arranged in this first ring portion, and the relatively the plurality of fumarole of this osculum system is arranged at the outside of this first ring portion; This second ring portion is rotatably connected with this base, and around this first ring portion.
Preferably, fluid accelerating unit of the present invention comprises one second power plant further, so as to rotating this second ring portion.According to this configuration, this second ring portion of the present invention has independently power plant, so as to reducing the load of the power plant of substrate, and through making the rotating speed of rotating speed higher than substrate of this second ring portion, and then promotes the collection rate of Working liquids.
Preferably, this first ring portion of fluid accelerating unit of the present invention has a ring seat portion and a pressure ring portion, system of this ring seat portion is fixed on base and has one first converging transition, system of this pressure ring portion is removably fixedly arranged on this ring seat portion, and there is one second converging transition, this second converging transition and there is multiple groove; When this pressure ring portion is fixedly arranged on this ring seat portion, this second converging transition contacts with this first converging transition, makes the plurality of groove of this second converging transition and this first converging transition form the plurality of jet channel and the plurality of fumarole.According to this configuration, the plurality of fumarole of the present invention can reach evenly jet effect.
Graphicly to illustrate in detail, when the effect being easier to understand object of the present invention, technology contents, feature and reach appended by coordinating by specific embodiment below.
[accompanying drawing explanation]
Figure 1A, 1B are respectively a schematic diagram, the stereogram of the fluid accelerating unit of display one embodiment of the invention and sectional view.
Fig. 2 is a schematic diagram, shows the partial cross-sectional perspective view that example implemented by one of the second power plant of the present invention.
Fig. 3 A, 3B are respectively a schematic diagram, show the exploded perspective view that example implemented by one of the assembly of the first ring portion of the present invention.
Fig. 3 C is a schematic diagram, shows the local assembling sectional block diagram that example implemented by one of the assembly of the first ring portion of the present invention.
Fig. 4 A, 4B are respectively a schematic diagram, and the substrate cover of display different size is used for the sectional view of fluid accelerating unit of the present invention.
Fig. 5 is a schematic diagram, shows the substrate processing machine of a prior art.
Fig. 6 is a schematic diagram, shows the substrate processing machine with the rotating ring together rotated with substrate of a prior art.
Fig. 7 is a schematic diagram, shows the substrate processing machine with the clean ring portion of osculum and ring-type fumarole of a prior art.
[symbol description]
1 fluid accelerating unit
10 bases
12 first ring portions
14 second ring portions
16 substrate rotating shafts
18 substrates
20 water spray passages
22 jet channels
24 osculums
26 fumaroles
40 suction channel
50 first power plant
52 first motors
54 running shafts
56 rotating shaft passages
60 second power plant
62 second motors
64 second driving mechanism groups
66 driving gears
68 driven gears
70 blades
80 ring seat portions
82 first converging transitions
84 first necks
90 pressure ring portions
92 second converging transitions
94 second necks
96 grooves
100 gas chamber
L12 first ring minister degree
L14 second ring portion length
L18a first substrate length
L18b second substrate length
L24a first osculum length
L24b second osculum length
L26 fumarole length
1001A, 1001B, 1001C substrate processing machine
1010A, 1010B base
1012C cleans ring portion
1014A, 1014B rotating ring
The rotating shaft of 1016A, 1016B substrate
1018A, 1018B substrate
1024C osculum
The ring-like jet seam of 1026C
1050A, 1050B power plant
1500A, 1500B collecting ring
2000A process fluid
[embodiment]
Please refer to Figure 1A, 1B, it shows stereogram and the exploded view of the fluid accelerating unit 1 of foundation one embodiment of the invention respectively.Fluid accelerating unit 1 comprises base 10,1 first ring portion 12 and one second ring portion 14.First ring portion 12 is fixedly arranged on base 10, and there is at least one water spray passage 20 be arranged in the first ring portion 12 with multiple jet channel 22, water spray passage 20 has an osculum 24 and is arranged in the first ring portion 12, multiple jet channel 22 has corresponding multiple fumaroles 26 and is arranged in the first ring portion 12, and osculum 24 is the outside that relatively multiple fumarole 26 is arranged at the first ring portion 12.Wherein, be the inner side that relative osculum 24 is arranged at the first ring portion 12 by multiple fumarole 26, the gas sprayed by multiple fumarole 26 can form multiple air-flow barrier haply or form a common air-flow account wall, to guarantee liquid system that osculum 24 the flows out outside spraying to the first ring portion 12.Preferably, the first ring portion 12 has the water spray passage 20 of more than two, and each water spray passage 20 has an osculum 24, and osculum 24 is be arranged in the first ring portion 12 symmetrically; For example, implement in example one, it is 180 degree of settings symmetrically each other that the first ring portion 12 has two osculums 24.Preferably, the aperture of osculum 24 is 0.25 English inch, the problem that the aperture in order to the osculum 1024C (as Fig. 7) solving prior art is too small.Second ring portion 14 is rotatably be connected with base 10, and around the first ring portion 12.It should be noted, multiple jet channel 22 can partly be interconnected each other, to form the part with a common jet channel; Multiple water spray passage 20 can partly or wholly be interconnected each other, to form the part with a common water spray passage.
Preferably, fluid accelerating unit 1 comprises a substrate rotating shaft 16 further, and it is rotatably be connected with base 10, and can rotate relative to the second ring portion 14.Preferably, to have a suction channel 40 disposed therein in substrate rotating shaft 16.Preferably, fluid accelerating unit 1 comprises one first power plant 50 further, so as to rotational substrate rotating shaft 16; Preferably, the first power plant 50 are one first motor 52, and the first motor 52 has a motor shaft 54, and substrate rotating shaft 16 is affixed with running shaft 54; Or, first power plant 50 are comprise one first motor 52, the first driving mechanism group (not shown) corresponding with, connect between the first motor 52 and substrate rotating shaft 16 through this first driving mechanism group, the power of the first motor 52 is sent to substrate rotating shaft 16.Preferably, fluid accelerating unit 1 comprises a substrate 18 further, and it is be fixed on substrate rotating shaft 16.Implement in example one, substrate rotating shaft 16 is affixed with motor shaft 54, and one end of suction channel 40 is provided with a suction device (not shown), and this suction device system is in order to extract the gas in suction channel 40; By this, substrate 18 is be fixed on substrate rotating shaft 16 by suction through the suction from suction channel 40.Implement in example at another, running shaft 54 is that hollow is to define a rotating shaft passage 56, substrate rotating shaft 16 is affixed with running shaft 54, and suction channel 40 is be communicated with rotating shaft passage 56, and is provided with a suction device (not shown) in one end of running shaft 54; By this, substrate 18 is be fixed on substrate rotating shaft 16 by suction through the suction coming self-suction channel 40 and rotating shaft channel 56.It should be noted, when substrate rotating shaft 16 and running shaft 54 are affixed, substrate rotating shaft 16 and running shaft 54 can be considered one; That is substrate rotating shaft 16 is running shaft 54, and namely suction channel 40 comprises rotating shaft passage 56.In addition, the mode being fixed on substrate rotating shaft 16 of substrate 18 is not limited in the solid mode of above-mentioned suction; Such as substrate 18 can pass through other fixed mechanism (not shown) and is fixedly arranged on substrate rotating shaft 16.
Preferably, fluid accelerating unit 1 comprises one second power plant 60 further, so as to rotating the second ring portion 14.Preferably, the rotating speed of the second ring portion 14 is greater than 300RPM.Implement in example one, second power plant 60 are comprise one second motor 62, the second driving mechanism group 64 corresponding with, second motor 62 is affixed with base 10, second driving mechanism group 64 is between connection second motor 62 and the second ring portion 14, so that the power of the second motor 62 is sent to the second ring portion 14; Preferably, the second driving mechanism group 64 comprises driving gear 66 and a driven gear 68, and driving gear 66 is be connected with the second motor 62, and driven gear 68 is engage with driving gear 66, and driven gear 68 is a part for the second ring portion 14; Preferably, the driven gear 68 of the second ring portion 14 is a kind of kenel of internal gear; Preferably, at least one idle gear (not shown) is rotatably connected with base 10, and is connected between driving gear 66 and driven gear 68.
Implement in example one, substrate 18 and substrate rotating shaft 16 are have a substrate rotating speed through the driving of the first power plant 50, second ring portion 14 is have one second ring portion rotating speed through the driving of the second power plant 60, and this second ring portion rotating speed system is higher than this substrate rotating speed; By this, when the unnecessary process fluid putting on substrate 18 fails to get rid of to a gathering-device (not shown) from substrate 18 is accelerated through this substrate rotating speed, these unnecessary process fluid systems drop down onto on the second ring portion 14, and through being greater than the impact of this second ring portion rotating speed of this substrate rotating speed, these unnecessary process fluid systems get rid of to this gathering-device by the second ring portion 14 is accelerated again, flow into internal body and situation about cannot collect so as to avoiding unnecessary process fluid.
Please refer to Fig. 2, it shows one of this second power plant (not shown) and separately implements example, these second power plant are a gas compressing apparatus (not shown), second ring portion 14 has multiple blade 70, the air-flow produced by this gas compressing apparatus blows to multiple blades 70 of the second ring portion 14, drives multiple blade 70 and the second ring portion 14 is rotated.
Please refer to Fig. 3 A, 3B, 3C, it shows the stereogram of assembly and the sectional view of combination of the first ring portion 12, in order to the structure of fumarole 26 to be described.First ring portion 12 has ring seat portion 80 and a pressure ring portion 90 further; Ring seat portion 80 is fixed on base 10 and has one first converging transition 82 and one first neck 84, first converging transition 82 is connected with the first neck 84; Pressure ring portion 90 is removably fixedly arranged on ring seat portion 80, and has one second converging transition 92 and one second neck 94, second converging transition 92 is connected with the second neck 94, and has multiple groove 96; When pressure ring portion 90 is fixedly arranged on ring seat portion 80, second converging transition 92 contacts with the first converging transition 82, make multiple grooves 96 of the second converging transition 92 and the first converging transition 82 form multiple jet channel 22 and multiple fumarole 26, and define a gas chamber 100 between the first neck 84 and the second neck 94.Preferably, the cross-sectional length system of gas chamber 100 is greater than the cross-sectional length of fumarole 26, make ejection gas from gas chamber 100 via fumarole 26 to external eruption time, have evenly and the air-flow be reinforced.It should be noted, gas chamber 100 also belongs to a part for jet channel 22; That is jet channel 22 is the part comprising and defined by multiple grooves 96, first converging transition 82, first neck 84 and second neck 94 of the second converging transition 92.
Please refer to Fig. 4 A, the size relationship of each assembly of the fluid accelerating unit 1 of example is implemented in its display according to the present invention one.Substrate 18 has a first substrate length L18a and a second substrate length L18b, first substrate length L18a and second substrate length L18b system is respectively any point of the outer boundaries of substrate 18 to the maxima and minima in the perpendicular distance of the center line of substrate rotating shaft 16, first ring portion 12 has a first ring minister degree L12, one first osculum length L24a, one second osculum length L24b, one fumarole length L26, first ring minister degree L12 is some maximum normal distance to the center line of substrate rotating shaft 16 of the outer boundaries of the first ring portion 12, first osculum length L24a and the second osculum length L24b system are respectively any point on the border of the first osculum 24 to the maxima and minima in the perpendicular distance of the center line of substrate rotating shaft 16, fumarole length L26 is the maximum normal distance of border to the center line of substrate rotating shaft 16 of fumarole 26, second ring portion 14 has one second ring portion length L14, and the second ring portion length L14 is some minimum perpendicular distance to the center line of substrate rotating shaft 16 of the outer boundaries of the second ring portion 14, wherein, second ring portion length L14 system is greater than first substrate length L18a, first substrate length L18a system is more than or equal to second substrate length L18b, second substrate length L18b system is more than or equal to first ring minister degree L12, first ring minister degree L12 system is more than or equal to the first osculum length L24a, first osculum length L24a system is greater than the second osculum length L24b, and the second osculum length L24b system is greater than fumarole length L26.Please refer to Fig. 4 B, according to the present invention, another implements the size relationship of each assembly of the fluid accelerating unit 1 of example in its display.Wherein, first substrate length L18a is more than or equal to second substrate length L18b, first substrate length L18a is more than or equal to the second ring portion length L14, second substrate length L18b is greater than first ring minister degree L12, second ring portion length L14 is greater than first ring minister degree L12, first ring minister degree L12 system is more than or equal to the first osculum length L24a, and the first osculum length L24a system is greater than the second osculum length L24b, and the second osculum length L24b system is greater than fumarole length L26.Preferably, first substrate length L18a equals second substrate length L18b.It should be noted, when first substrate length L18a is not equal to second substrate length L18b, substrate 18 is a non-circular substrate; Or substrate 18 is a circular substrate, but to be not position online at the center of substrate rotating shaft 16 in its center of circle.
By the configuration of above fluid accelerating unit 1 of the present invention, substrate 18 is rotate relative to the first ring portion 12, therefore the back of substrate 18 can be subject to the liquid of osculum 24 ejection in the first ring portion 12 or the gas sanitizes of fumarole 26 ejection, the process fluid avoiding putting on substrate 18 front pollutes substrate 18 back side, and by process fluid outwardly spraying in gathering-device (not shown) or the second ring portion 14; Wherein, arranging of fumarole 26 can guarantee liquid system that osculum 24 the flows out lateral direction spraying to the first ring portion 12.Wherein, there is substrate 18 and second ring portion 14 of independent power device out of the ordinary, the first power plant 50 can be made only to need to drive substrate 18 to rotate, reduce the load (as Fig. 6) of the power plant palpus rotational substrate 1018B and its rotating ring 1014B in prior art; And there is the second ring portion 14 of the second power plant 60, the second ring portion 14 can be made to rotate independent of substrate 18, and by the rotation of the second ring portion 14, make to drop to or get rid of by substrate 18 to the process fluid of the second ring portion 14 and the liquid by the first ring portion 12 spraying, can be got rid of to gathering-device.Wherein, the enforcement example out of the ordinary by Fig. 4 A, 4B should be understood, and when the length of substrate 18 is less than the length of the second ring portion 14, the turn by the second ring portion 14 is got rid of to gathering-device by the process fluid being dropped to the second ring portion 14 by substrate 18; When the length of substrate 18 is more than or equal to the length of the second ring portion 14, the process fluid on substrate 18 will almost drop in gathering-device totally.Therefore, the enforcement example of complex chart 4A, 4B, can illustrate that liquid accelerating unit 1 of the present invention is applicable to the processing of different size substrate 18, and the board solving the fluid collection device of prior art cannot be suitable for the processing of different size substrate 18 simultaneously.In an actual measurement, 12 inch and 8 inch substrates 18 are applied mechanically respectively and have in the liquid accelerating unit 1 of base 10, first ring portion 12, second ring portion 14, substrate rotating shaft 16, first power plant 50 and the second power plant 60 to of the present invention, the collection rate of its process fluid is all 99.99%; Wherein, when substrate 18 is 8 inch substrate, the length (L18a, L18b) of substrate 18 is be less than the second ring portion length L14.
Above-described embodiment is only for technological thought of the present invention and feature are described, its object understands content of the present invention implementing according to this enabling the personage haveing the knack of this skill, when can not with restriction the scope of the claims of the present invention, namely the equalization generally done according to disclosed spirit changes or modifies, and must be encompassed in the scope of the claims of the present invention.
Claims (10)
1. a fluid accelerating unit, is characterized in that comprising:
One base;
One first ring portion, is fixedly arranged on this base, and has at least one osculum and multiple fumarole is arranged in this first ring portion, and the relatively the plurality of fumarole of this osculum is arranged at the outside of this first ring portion; And
One second ring portion, is rotatably connected with this base, and around this first ring portion.
2. fluid accelerating unit as claimed in claim 1, it is characterized in that, this first ring portion has the water spray passage of more than two, and respectively this water spray passage has an osculum, and this osculum is arranged in this first ring portion symmetrically.
3. fluid accelerating unit as claimed in claim 1, it is characterized in that, comprise a substrate rotating shaft further, it is rotatably connected with this base, and can rotate relative to this second ring portion.
4. fluid accelerating unit as claimed in claim 3, it is characterized in that, it is disposed therein that this substrate rotating shaft has a suction channel.
5. fluid accelerating unit as claimed in claim 3, is characterized in that, comprise one first power plant further, so as to rotating this substrate rotating shaft.
6. fluid accelerating unit as claimed in claim 3, it is characterized in that, comprise a substrate further, it is be fixed on this substrate rotating shaft.
7. fluid accelerating unit as claimed in claim 6, it is characterized in that, this substrate has a first substrate length and a second substrate length, and this first substrate length and this second substrate length are respectively any point of the outer boundaries of this substrate to the maxima and minima in the perpendicular distance of the center line of this substrate rotating shaft; This first ring portion has a first ring minister degree, one first osculum length, one second osculum length, a fumarole length, this first ring minister degree is some maximum normal distance to the center line of this substrate rotating shaft of the outer boundaries of this first ring portion, this the first osculum length and this second osculum length are respectively any point on the border of this first osculum to the maxima and minima in the perpendicular distance of the center line of this substrate rotating shaft, and this fumarole length is the maximum normal distance of border to the center line of this substrate rotating shaft of this fumarole; This second ring portion has one second ring portion length, and this second ring portion length is some minimum perpendicular distance to the center line of this substrate rotating shaft of the outer boundaries of this second ring portion; This first substrate length is more than or equal to this second substrate length, and this first ring minister degree is more than or equal to this first osculum length, and this first osculum length is greater than this second osculum length, and this second osculum length is greater than this fumarole length; Wherein, when the size of this substrate is less than this second ring portion, this second ring portion length is greater than this first substrate length, and this second substrate length is more than or equal to this first ring minister degree; Or when the size of this substrate is not less than this second ring portion, this first substrate length is more than or equal to this second ring portion length, and this second substrate length is greater than this first ring minister degree, and this second ring portion length is greater than first ring minister degree.
8. the fluid accelerating unit as described in any one in claim 1 to 7, is characterized in that, comprises one second power plant further, so as to rotating this second ring portion.
9. fluid accelerating unit as claimed in claim 8, it is characterized in that, this second ring portion, by the driving of these the second power plant, has the rotating speed being at least 300RPM.
10. the fluid accelerating unit as described in any one in claim 1 to 7, it is characterized in that, this first ring portion has a ring seat portion and a pressure ring portion, system of this ring seat portion is fixed on base and has one first converging transition, system of this pressure ring portion is removably fixedly arranged on this ring seat portion, and there is one second converging transition, this second converging transition and there is multiple groove; When this pressure ring portion is fixedly arranged on this ring seat portion, this second converging transition contacts with this first converging transition, makes the plurality of groove of this second converging transition and this first converging transition form the plurality of jet channel and the plurality of fumarole.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW103106517 | 2014-02-26 | ||
| TW103106517A TWI556878B (en) | 2014-02-26 | 2014-02-26 | Fluid accelerating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104863905A true CN104863905A (en) | 2015-08-26 |
| CN104863905B CN104863905B (en) | 2018-03-16 |
Family
ID=53909982
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510032313.XA Active CN104863905B (en) | 2014-02-26 | 2015-01-22 | Fluid accelerating device |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN104863905B (en) |
| TW (1) | TWI556878B (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108074856A (en) * | 2016-11-10 | 2018-05-25 | 辛耘企业股份有限公司 | Monobasal processing unit |
| EP3961683A1 (en) * | 2020-08-28 | 2022-03-02 | Ebara Corporation | Workpiece supporting apparatus and workpiece supporting method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101276739A (en) * | 2007-03-29 | 2008-10-01 | 东京毅力科创株式会社 | Substrate processing system and substrate cleaning apparatus |
| CN101589453A (en) * | 2006-12-15 | 2009-11-25 | Sez股份公司 | The apparatus and method that are used for wet treating plate-like-articles |
| CN102656680A (en) * | 2009-12-18 | 2012-09-05 | 朗姆研究公司 | Reinforced pin for being used in a pin chuck, and a pin chuck using such reinforced pin |
| US20130048607A1 (en) * | 2011-08-22 | 2013-02-28 | Lam Research Ag | Method and device for wet treatment of plate-like articles |
| US20130127102A1 (en) * | 2011-11-17 | 2013-05-23 | Lam Research Ag | Method and device for processing wafer shaped articles |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007115728A (en) * | 2005-10-18 | 2007-05-10 | Sumco Corp | Single wafer etching device and single wafer etching method |
| JP2009081250A (en) * | 2007-09-26 | 2009-04-16 | Toppan Printing Co Ltd | Chuck for spin coater, and spin coat method using the same |
-
2014
- 2014-02-26 TW TW103106517A patent/TWI556878B/en active
-
2015
- 2015-01-22 CN CN201510032313.XA patent/CN104863905B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101589453A (en) * | 2006-12-15 | 2009-11-25 | Sez股份公司 | The apparatus and method that are used for wet treating plate-like-articles |
| CN101276739A (en) * | 2007-03-29 | 2008-10-01 | 东京毅力科创株式会社 | Substrate processing system and substrate cleaning apparatus |
| CN102656680A (en) * | 2009-12-18 | 2012-09-05 | 朗姆研究公司 | Reinforced pin for being used in a pin chuck, and a pin chuck using such reinforced pin |
| US20130048607A1 (en) * | 2011-08-22 | 2013-02-28 | Lam Research Ag | Method and device for wet treatment of plate-like articles |
| US20130127102A1 (en) * | 2011-11-17 | 2013-05-23 | Lam Research Ag | Method and device for processing wafer shaped articles |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108074856A (en) * | 2016-11-10 | 2018-05-25 | 辛耘企业股份有限公司 | Monobasal processing unit |
| CN108074856B (en) * | 2016-11-10 | 2020-06-09 | 辛耘企业股份有限公司 | Single substrate processing apparatus |
| EP3961683A1 (en) * | 2020-08-28 | 2022-03-02 | Ebara Corporation | Workpiece supporting apparatus and workpiece supporting method |
| US11804398B2 (en) | 2020-08-28 | 2023-10-31 | Ebara Corporation | Workpiece supporting apparatus and workpiece supporting method |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201532683A (en) | 2015-09-01 |
| CN104863905B (en) | 2018-03-16 |
| TWI556878B (en) | 2016-11-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN203803842U (en) | Rotary cleaning machine | |
| CN105476857A (en) | Finished medicine sugar coating spraying integrated machine | |
| CN104863905A (en) | Fluid accelerating device | |
| CN105561867A (en) | Novel automatic production line | |
| CN203854888U (en) | Carton opening mechanism of carton packing machine | |
| WO2022252671A1 (en) | Water washing air apparatus and air conditioner | |
| CN105560062A (en) | Novel medicine extracting device | |
| CN105476858A (en) | Medicine preparing and packaging integrated machine | |
| CN204426574U (en) | The chocolate automatic temperature-control machine of continous way | |
| CN105596213A (en) | Novel medicine forming and screening device | |
| CN105596212A (en) | Novel circular assembly line | |
| CN101412030B (en) | High speed automatic bottle gas washer | |
| CN206841854U (en) | Novel high speed bottle managing machine is used in a kind of chewing gum production | |
| CN205288318U (en) | Abandonment medicine is plucked and is selected mechanism | |
| CN109315510A (en) | A kind of tealeaves production cooling device of eclipsed form automation | |
| CN103659596B (en) | A kind of polishing machine upper polishing head lifting device of rotation driving | |
| CN201998060U (en) | Edge trimming machine | |
| CN107753294A (en) | A kind of integrated remote control medicine plucks screening device | |
| CN105712050A (en) | Novel multifunctional pharmacy assembly line | |
| CN105066664A (en) | Cleaning machine and air drying device thereof | |
| CN206622061U (en) | A kind of Textile Dyes mixing arrangement | |
| AU2019397288A1 (en) | Differential apparatus, air purifying apparatus and air purifier | |
| CN108354836A (en) | Powder cooling device central computer regulates and controls manufacturing machine | |
| CN205869015U (en) | Beverage preparation house beverage bottle bottle cleaning machine | |
| CN214469599U (en) | Quick even radiating injection mold cooling device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| EXSB | Decision made by sipo to initiate substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |