CN104846337A - Evaporation device and evaporation production line - Google Patents
Evaporation device and evaporation production line Download PDFInfo
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- CN104846337A CN104846337A CN201510218060.5A CN201510218060A CN104846337A CN 104846337 A CN104846337 A CN 104846337A CN 201510218060 A CN201510218060 A CN 201510218060A CN 104846337 A CN104846337 A CN 104846337A
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Abstract
The invention relates to the technical field of manufacture of display devices, and discloses an evaporation device and an evaporation production line to decrease the occupied area of the evaporation production line and save device cost. The evaporation device comprises a manipulator, two evaporation chambers, a substrate incoming chamber, a substrate outgoing chamber and a mask plate storage chamber, the two evaporation chambers are positioned on the outer side of a spindle of the manipulator, distributed in a square ring column form and arranged on a first side and a second side of a square ring column respectively, two substrate evaporation stations, a linear evaporation source and a mask plate aligning device are arranged in each evaporation chamber, the substrate incoming chamber is arranged on a third side of the square ring column, a substrate incoming station is arranged in the substrate incoming chamber, the substrate outgoing chamber is arranged on a fourth side of the square ring column, a substrate outgoing station is arranged in the substrate outgoing chamber, and the mask plate storage chamber, the substrate incoming chamber or the substrate outgoing chamber are parallelly arranged.
Description
Technical field
The present invention relates to the manufacturing technology field of display unit, particularly relate to a kind of evaporated device and evaporation production line.
Background technology
OLED (Organic Light-Emitting Diode, organic light emitting diode, be called for short OLED) display screen due to have thin, light, wide viewing angle, active illuminating, glow color continuously adjustabe, cost are low, fast response time, energy consumption are little, driving voltage is low, operating temperature range is wide, production technique is simple, luminous efficiency is high and can the advantage such as Flexible Displays, have been listed in the technique of display of future generation having development prospect.
Substrate is formed OLED and usually adopts evaporation process, it refers at certain heated under vacuum deposition material, deposition material is made to melt the steam of (or distillation) one-tenth atom, molecule or atomic group composition, then condense in substrate surface film forming, thus form the functional layer of OLED.
As shown in Figure 1a, existing a kind of evaporated device comprises: mechanical manipulator (not shown), and an evaporation chamber 2, two substrates outside the main shaft being distributed in mechanical manipulator load chambers 3 and a mask plate deposits chamber 4, wherein: two substrates loading chambers 3 that position is relative, one of them imports chamber into as substrate, and another spreads out of chamber as substrate; Mechanical manipulator is used for loading between chamber 3 and evaporation chamber 2 at substrate transporting substrate, and deposits between chamber 4 and evaporation chamber 2 at mask plate and transport mask plate; Be configured with two substrate evaporation stations be arranged side by side, 21, line vapor deposition source 22 and adjustment contraposition equipment (not shown) in evaporation chamber 2, the relative side of two substrate evaporation stations 21 is perpendicular to the evaporation scanning direction of line vapor deposition source 22; Adjustment contraposition equipment is for adjusting substrate alignment base plate evaporation station 21, and adjustment mask plate alignment base plate.
Fig. 1 b is depicted as the evaporation production line adopting existing evaporated device composition, and in two adjacent evaporated devices, the substrate that the substrate of one of them evaporated device spreads out of chamber and another evaporated device imports between chamber and transmits substrate by travelling belt 11.The overall floor space of this evaporation production line is comparatively large, and equipment cost is higher.
Prior art part:
2-evaporation chamber; 3-substrate loads chamber; 4-mask plate deposits chamber; 21-substrate evaporation station;
22-line vapor deposition source; 11-travelling belt.
Embodiment of the present invention part:
100a, 100b-evaporation chamber; 101-line vapor deposition source; 102a, 102b-substrate evaporation station;
200a-substrate imports chamber into; 200b-substrate spreads out of chamber; 202a-substrate imports station into;
202b-substrate spreads out of station; 300a, 300b-mask plate deposits chamber;
301a, 301b-mask plate storage trays; 400-mechanical manipulator; 401-main shaft;
402a, 402b-end effector; 403a, 403b-turning axle; 31-travelling belt.
Summary of the invention
The object of the embodiment of the present invention is to provide a kind of evaporated device and evaporation production line, to reduce the floor space of evaporation production line, saves equipment cost.
The evaporated device that the embodiment of the present invention provides, outside the main shaft comprising mechanical manipulator and be positioned at mechanical manipulator and two evaporation chambers of the circular row distribution that is square, substrate imports chamber into, substrate spreads out of chamber, and mask plate deposits chamber, wherein:
Two evaporation chambers are arranged at described square annular first avris and the second avris respectively, are configured with two substrate evaporation stations, line vapor deposition source in each evaporation chamber, and mask plate contraposition equipment;
Described substrate imports chamber into and is arranged at described square annular 3rd avris, and internal configuration has substrate to import station into;
Described substrate spreads out of chamber and is arranged at described square annular 4th avris, and internal configuration has substrate to spread out of station;
Described mask plate is deposited chamber and described substrate and is imported chamber or described substrate into and spread out of chamber and be arranged side by side.
Preferably, it is two that described mask plate deposits chamber, imports chamber and described substrate respectively into spread out of chamber and be arranged side by side with described substrate.
Preferably, described two evaporation chambers are oppositely arranged; Described substrate imports chamber and described substrate into and spreads out of chamber and be oppositely arranged; Described two mask plates are deposited chamber and are oppositely arranged.
Preferably, described mechanical manipulator comprises the mechanical arm with main shaft pivot joint, and described mechanical arm comprises the more piece joint arm of hinge connections and saves two hinged end effectors of arm with minor details.
Preferably, it is hinged that described two end effectors save arm respectively by the minor details of a turning axle and mechanical arm, and described two end effectors in the height direction separately.
Preferably, corresponding described mask plate deposits the mask plate storage trays set by chamber.
In the technical scheme of the embodiment of the present invention, the evaporation chamber of evaporated device, substrate import chamber into, substrate spreads out of chamber, and mask plate deposit chamber be square outside the main shaft of mechanical manipulator circular row distribution, the evaporation production line be made up of this evaporated device multiple, compared with prior art, compact construction, floor space is less, thus greatly can save equipment cost.
The embodiment of the present invention additionally provides a kind of evaporation production line, comprise multiple evaporated device as described in aforementioned arbitrary technical scheme, in adjacent two evaporated devices, it is shared integrative-structure that the substrate that the substrate of upstream evaporated device spreads out of chamber and downstream evaporated device imports chamber into.
Preferably, when for each evaporated device, it is two that described mask plate deposits chamber, and imports chamber and described substrate respectively with described substrate into and spread out of chamber when being arranged side by side, and it is shared integrative-structure that the mask plate between adjacent two evaporated devices deposits chamber.
Compared to existing technology, the compact construction of the evaporation production line of above-mentioned two schemes, floor space is less, and equipment cost is lower.
The embodiment of the present invention additionally provides a kind of evaporation production line, comprise multiple evaporated device as described in aforementioned arbitrary technical scheme, in adjacent two evaporated devices, the substrate that the substrate of upstream evaporated device spreads out of chamber and downstream evaporated device imports between chamber and is configured with travelling belt.Compared to existing technology, the compact construction of this evaporation production line, floor space is less, and equipment cost is lower.
Accompanying drawing explanation
Fig. 1 a is the plan structure schematic diagram of existing a kind of evaporated device;
Fig. 1 b is the schematic diagram of existing a kind of evaporation production line;
Fig. 2 is the plan structure schematic diagram of one embodiment of the invention evaporated device;
Fig. 3 is the structural representation of mechanical manipulator in one embodiment of the invention;
Fig. 4 is the schematic diagram of one embodiment of the invention evaporation production line;
Fig. 5 is the schematic diagram of another embodiment of the present invention evaporation production line.
Reference numeral:
Embodiment
In order to reduce the floor space of evaporation production line, saving equipment cost, embodiments providing a kind of evaporated device and evaporation production line.For making the object, technical solutions and advantages of the present invention clearly, by the following examples the present invention is described in further detail.
As shown in Figure 2, the evaporated device that the embodiment of the present invention provides, outside the main shaft 401 comprising mechanical manipulator 400 and be positioned at mechanical manipulator and two evaporation chamber 100a, 100b of the circular row distribution that is square, substrate import chamber 200a into, substrate spreads out of chamber 200b, and mask plate deposits chamber 300a, 300b, wherein:
Two evaporation chambers 100a, 100b are arranged at square annular first avris and the second avris respectively, two substrate evaporation station 102a, 102b, line vapor deposition source 101 are configured with in each evaporation chamber, and mask plate contraposition equipment (not shown); Substrate imports chamber 200a into and is arranged at square annular 3rd avris, and internal configuration has substrate to import station 202a into; Substrate spreads out of chamber 200b and is arranged at square annular 4th avris, and internal configuration has substrate to spread out of station 202b; Mask plate is deposited chamber and substrate and is imported chamber or substrate into and spread out of chamber and be arranged side by side (concrete, mask plate is deposited chamber 300a and substrate and imported chamber 200a into and be arranged side by side, and mask plate is deposited chamber 300b and substrate and spread out of chamber 200b and be arranged side by side).
In embodiments of the present invention, evaporated device also comprises corresponding mask plate and deposits mask plate storage trays 301a, 301b set by chamber.Evaporated device can comprise a center cavity, this center cavity is in square, the main shaft 401 of mechanical manipulator 400 is positioned at the central position of this center cavity, evaporation chamber 100a, 100b, substrate import chamber 200a into, substrate spreads out of chamber 200b, and mask plate deposits all sides that chamber 300a, 300b decile is distributed in this center cavity, so that mechanical manipulator 400 carries out carrying operation.The particular type of mechanical manipulator 400 is not limit, and preferably adopts vacuum mechanical-arm.
Substrate evaporation station 102a, 102b in evaporation chamber refer to: when line vapor deposition source 101 pairs of substrates carry out evaporation, the standard of substrate places station.When line vapor deposition source 101 pairs of substrates carry out evaporation, the side side of evaporation scanning direction perpendicular to substrate of line vapor deposition source 101 should be made, like this, line vapor deposition source 101 after the lower straight of substrate moves, can by deposition material through the void region evaporation of mask plate on substrate.Two substrate evaporation stations 102a, 102b in evaporation chamber are arranged side by side, line vapor deposition source 101 successively two substrate evaporation stations 102a, 102b place substrate below make straight line back and forth movement, thus the evaporation of completing substrate.After one of them substrate evaporation, the substrate that this evaporation is complete can be taken out, then be reentered into substrate to be deposited, thus make evaporation operation can continue to carry out, to improve evaporation efficiency, reduce the waste of deposition material.
As shown in Figure 3, in the preferred embodiment, mechanical manipulator 400 comprises the mechanical arm with main shaft 401 pivot joint, and mechanical arm comprises the more piece joint arm of hinge connections and saves arm hinged two end effectors 402a, 402b with minor details.
Mechanical arm preferably adopts liftable mechanical arm, and it is hinged that two end effectors 402a, 402b save arm respectively by the minor details of turning axle 403a, 403b and mechanical arm, and in the height direction separately.Substrate, after picking up two substrates according to the order of sequence, can be transported to two substrate evaporation stations 102a, 102b in evaporation chamber 100a, thus make the side of substrate perpendicular to the evaporation scanning direction of line vapor deposition source by two end effectors 402a, 402b of mechanical manipulator 400.When substrate is in evaporation chamber 100a after evaporation, mechanical manipulator 400 can adopt similar action substrate to be transported to evaporation chamber 100b, makes substrate proceed next step evaporation process.Because two end effectors 402a, 402b can distinguish relative mechanical arm flexible rotating, therefore, substrate can being transported flexibly, making substrate in evaporation chamber without the need to carrying out adjustment alignment operation again.In addition, two end effectors 402a, 402b of mechanical manipulator 400 also can perform the transport operation of mask plate and substrate simultaneously.
In an embodiment of the present invention, mask plate is deposited chamber and substrate and is imported chamber or substrate into and spread out of chamber and be arranged side by side.In a preferred embodiment of the invention, it is two that mask plate deposits chamber, imports chamber and substrate respectively into spread out of chamber and be arranged side by side with substrate, and is respectively used to deposit the mask plate that two evaporation chambers use.As shown in Figure 2, mask plate is deposited chamber 300a and substrate and is imported chamber 200a into and be arranged side by side, and mask plate is deposited chamber 300b and substrate and spread out of chamber 200b and be arranged side by side.
Shown in Fig. 2, two evaporation chambers 100a, 100b are oppositely arranged; Substrate imports chamber 200a and substrate into and spreads out of chamber 200b and be oppositely arranged; Two mask plates are deposited chamber 300a, 300b and are oppositely arranged.Substrate imports chamber 200a and substrate into and spreads out of chamber 200b and be located along the same line, and is convenient to the topological design of evaporation production line like this.
In the technical scheme of the embodiment of the present invention, the evaporation chamber of evaporated device, substrate import chamber into, substrate spreads out of chamber, and mask plate deposit chamber be square outside the main shaft of mechanical manipulator circular row distribution, the evaporation production line be made up of this evaporated device multiple, compared with prior art, compact construction, floor space is less, thus greatly can save equipment cost.
As shown in Figure 4, the evaporation production line that one embodiment of the invention provides, comprise the evaporated device of multiple aforementioned any embodiment, in adjacent two evaporated devices, it is shared integrative-structure that the substrate that the substrate of upstream evaporated device spreads out of chamber 200b and downstream evaporated device imports chamber 200a into.
It is shared integrative-structure that the substrate that the substrate of upstream evaporated device spreads out of chamber and downstream evaporated device imports chamber into, refers to: the substrate of upstream evaporated device spreads out of chamber and also imports chamber into as the substrate of downstream evaporated device.When substrate is sent to this shared chamber by the mechanical manipulator of upstream evaporated device, the mechanical manipulator of downstream evaporated device can take out substrate from this shared chamber and be sent in its evaporation chamber.Comparison diagram 1b and Fig. 4, can significantly find out, adopt the scheme of the embodiment of the present application, the structure of evaporation production line is comparatively compact, and floor space is less, and equipment cost is lower.
Shown in Fig. 4, when for each evaporated device, it is two (namely mask plate deposits chamber 300a, 300b) that mask plate deposits chamber, and import chamber 200a and substrate respectively with substrate into and spread out of chamber 200b when being arranged side by side, it is shared integrative-structure that the mask plate between adjacent two evaporated devices deposits chamber.This mask plate shared deposits chamber can deposit mask plate that upstream evaporated device uses and the mask plate that downstream evaporated device uses simultaneously, thus makes the structure of evaporation production line compacter, and equipment cost is lower.
As shown in Figure 5, the evaporation production line that another embodiment of the present invention provides, comprise multiple evaporated device as aforementioned any embodiment, in adjacent two evaporated devices, the substrate that the substrate of upstream evaporated device spreads out of chamber 200b and downstream evaporated device imports between chamber 200a and is configured with travelling belt 31.Due to the constructional feature of evaporated device, compared to existing technology, the length of travelling belt can shorten relatively, thus decreases the floor space of evaporation production line, reduces equipment cost.
Obviously, those skilled in the art can carry out various change and modification to the present invention and not depart from the spirit and scope of the present invention.Like this, if these amendments of the present invention and modification belong within the scope of the claims in the present invention and equivalent technologies thereof, then the present invention is also intended to comprise these change and modification.
Claims (9)
1. an evaporated device, is characterized in that, outside the main shaft comprising mechanical manipulator and be positioned at mechanical manipulator and two evaporation chambers of the circular row distribution that is square, substrate imports chamber into, substrate spreads out of chamber, and mask plate deposits chamber, wherein:
Two evaporation chambers are arranged at described square annular first avris and the second avris respectively, are configured with two substrate evaporation stations, line vapor deposition source in each evaporation chamber, and mask plate contraposition equipment;
Described substrate imports chamber into and is arranged at described square annular 3rd avris, and internal configuration has substrate to import station into;
Described substrate spreads out of chamber and is arranged at described square annular 4th avris, and internal configuration has substrate to spread out of station;
Described mask plate is deposited chamber and described substrate and is imported chamber or described substrate into and spread out of chamber and be arranged side by side.
2. evaporated device as claimed in claim 1, it is characterized in that, it is two that described mask plate deposits chamber, imports chamber and described substrate respectively into spread out of chamber and be arranged side by side with described substrate.
3. evaporated device as claimed in claim 2, it is characterized in that, described two evaporation chambers are oppositely arranged; Described substrate imports chamber and described substrate into and spreads out of chamber and be oppositely arranged; Described two mask plates are deposited chamber and are oppositely arranged.
4. evaporated device as claimed in claim 1, it is characterized in that, described mechanical manipulator comprises the mechanical arm with main shaft pivot joint, and described mechanical arm comprises the more piece joint arm of hinge connections and saves two hinged end effectors of arm with minor details.
5. evaporated device as claimed in claim 4, is characterized in that, it is hinged that described two end effectors save arm respectively by the minor details of a turning axle and mechanical arm, and described two end effectors in the height direction separately.
6. evaporated device as claimed in claim 1, is characterized in that, also comprise: corresponding described mask plate deposits the mask plate storage trays set by chamber.
7. an evaporation production line, it is characterized in that, comprise multiple evaporated device as described in any one of claim 1 ~ 6, in adjacent two evaporated devices, it is shared integrative-structure that the substrate that the substrate of upstream evaporated device spreads out of chamber and downstream evaporated device imports chamber into.
8. evaporation production line as claimed in claim 7, it is characterized in that, when for each evaporated device, it is two that described mask plate deposits chamber, and import chamber and described substrate respectively with described substrate into and spread out of chamber when being arranged side by side, it is shared integrative-structure that the mask plate between adjacent two evaporated devices deposits chamber.
9. an evaporation production line, it is characterized in that, comprise multiple evaporated device as described in any one of claim 1 ~ 6, in adjacent two evaporated devices, the substrate that the substrate of upstream evaporated device spreads out of chamber and downstream evaporated device imports between chamber and is configured with travelling belt.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510218060.5A CN104846337A (en) | 2015-04-30 | 2015-04-30 | Evaporation device and evaporation production line |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510218060.5A CN104846337A (en) | 2015-04-30 | 2015-04-30 | Evaporation device and evaporation production line |
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| CN104846337A true CN104846337A (en) | 2015-08-19 |
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| CN201510218060.5A Pending CN104846337A (en) | 2015-04-30 | 2015-04-30 | Evaporation device and evaporation production line |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108374157A (en) * | 2017-01-23 | 2018-08-07 | 朗姆研究公司 | The low energy of optimization/high production rate depositing system |
| CN111411327A (en) * | 2020-04-29 | 2020-07-14 | 胡均松 | Continuous vacuum coating device |
| CN113025955A (en) * | 2019-12-24 | 2021-06-25 | 佳能特机株式会社 | Film forming apparatus and method for manufacturing electronic device |
| CN117535644A (en) * | 2023-12-07 | 2024-02-09 | 合肥致真精密设备有限公司 | Film preparation device and system |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102479927A (en) * | 2010-11-22 | 2012-05-30 | 圆益Ips股份有限公司 | Substrate processing system |
| TW201406980A (en) * | 2012-07-25 | 2014-02-16 | Canon Tokki Corp | Vapor-deposition device |
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2015
- 2015-04-30 CN CN201510218060.5A patent/CN104846337A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102479927A (en) * | 2010-11-22 | 2012-05-30 | 圆益Ips股份有限公司 | Substrate processing system |
| TW201406980A (en) * | 2012-07-25 | 2014-02-16 | Canon Tokki Corp | Vapor-deposition device |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108374157A (en) * | 2017-01-23 | 2018-08-07 | 朗姆研究公司 | The low energy of optimization/high production rate depositing system |
| US11024531B2 (en) | 2017-01-23 | 2021-06-01 | Lam Research Corporation | Optimized low energy / high productivity deposition system |
| CN108374157B (en) * | 2017-01-23 | 2022-01-21 | 朗姆研究公司 | Optimized low energy/high productivity deposition system |
| CN113025955A (en) * | 2019-12-24 | 2021-06-25 | 佳能特机株式会社 | Film forming apparatus and method for manufacturing electronic device |
| CN111411327A (en) * | 2020-04-29 | 2020-07-14 | 胡均松 | Continuous vacuum coating device |
| CN117535644A (en) * | 2023-12-07 | 2024-02-09 | 合肥致真精密设备有限公司 | Film preparation device and system |
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