CN104841657A - Method for washing SMT chip mounter suction nozzle - Google Patents
Method for washing SMT chip mounter suction nozzle Download PDFInfo
- Publication number
- CN104841657A CN104841657A CN201510175140.7A CN201510175140A CN104841657A CN 104841657 A CN104841657 A CN 104841657A CN 201510175140 A CN201510175140 A CN 201510175140A CN 104841657 A CN104841657 A CN 104841657A
- Authority
- CN
- China
- Prior art keywords
- suction nozzle
- chip mounter
- smt chip
- washing
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses a method for washing an SMT chip mounter suction nozzle. The method comprises the steps that A. water atomization is carried out, a high-pressure water sprayer is used, an atomization structure is arranged on the water sprayer, and fine water mist is generated; B. washing is carried out, atomized water which is sprayed out at high speed is used for being aligned with the suction nozzle of an SMT chip mounter, a continuous energy field is formed above the suction nozzle to be washed, and dirt on the surface of the suction nozzle and in the suction nozzle is smashed; and C. checking is carried out, after washing, the suction nozzle is checked, and if the suction nozzle is clean by washing, the whole process is completed. The method for washing the SMT chip mounter suction nozzle is good in washing effect and low in cost.
Description
[technical field]
The invention relates to a kind of method of cleaning SMT chip mounter suction nozzle.
[background technology]
Along with the development of SMT, minimization, the high density attachment of parts become trend.Thereupon, the suction nozzle of SMT chip mounter is more accurate, also larger on the impact of mounting quality.In actual attachment process, be infected with scolding tin, scaling powder or other dirt etc. due to suction nozzle and cause suction nozzle to block, easily cause material casting.
And the scrapping of SMT chip mounter suction nozzle, be many times due to excessively dirty, or the therefore related accidents occurred and producing.Original-pack suction nozzle is expensive, mostly more than thousand yuan.
[summary of the invention]
The object of the invention is overcome the deficiencies in the prior art and provide a kind of cleaning performance good, the method for the cleaning SMT chip mounter suction nozzle that cost is low.
For above-mentioned purpose, the present invention by the following technical solutions:
Clean a method for SMT chip mounter suction nozzle, it is characterized in that comprising the steps: A, water atomization, utilize high-pressure water nozzle, sprinkler head arranges atomization structure, produce superfine little water smoke;
B, cleaning, utilize high speed, high pressure spray atomized water out to aim at the suction nozzle of SMT chip mounter, the energy field that formation one is lasting above suction nozzle to be cleaned, pulverize suction nozzle surface and inner dirt;
C, inspection, after having cleaned, checking suction nozzle, as cleaned up, then completing whole process.
A kind of method of cleaning SMT chip mounter suction nozzle as above, is characterized in that described atomization structure for access gases at high pressure on sprinkler head, gases at high pressure is mixed with water under high pressure in the chamber of sprinkler head.
A kind of method of cleaning SMT chip mounter suction nozzle as above, is characterized in that the speed of the described water smoke from sprinkler head ejection is V=300m/s-360m/s, makes it to form powerful kinetic energy and be sprayed onto on suction nozzle.
Beneficial effect of the present invention has:
The present invention utilizes at a high speed, and the atomized water of high pressure rinses suction nozzle, the energy field that formation one is lasting above suction nozzle to be cleaned, pulverizes suction nozzle surface and inner dirt.Utilize this method to solve prior art Problems existing, make the present invention reduce suction nozzle acquisition cost, reduce unnecessary artificial, the production efficiency that improves SMT chip mounter.
[detailed description of the invention]
Embodiment is utilized to elaborate to the present invention below:
Clean a method for SMT chip mounter suction nozzle, following steps: A, water atomization, utilize high-pressure water nozzle, and sprinkler head arranges atomization structure, produce superfine little water smoke.
B, cleaning, utilize high speed, high pressure spray atomized water out to aim at the suction nozzle of SMT chip mounter, the energy field that formation one is lasting above suction nozzle to be cleaned, pulverize suction nozzle surface and inner dirt.Dirt on suction nozzle is tin cream and dust mainly, under the effect of powerful energy field, suction nozzle surface and inner dirt can be separated from completely.
C, inspection, after having cleaned, checking suction nozzle, as cleaned up, then completing whole process.
Furthermore, described atomization structure for access gases at high pressure on sprinkler head, and gases at high pressure are mixed in the chamber of sprinkler head with water under high pressure, and high-voltage high-speed erupts out more afterwards.The speed of the described water smoke from sprinkler head ejection is V=300m/s-360m/s, and speed can reach the level of velocity of sound, makes it to form powerful kinetic energy and is sprayed onto on suction nozzle.Utilize this method to solve prior art Problems existing, make the present invention reduce suction nozzle acquisition cost, reduce unnecessary artificial, the production efficiency that improves SMT chip mounter.
Claims (3)
1. clean a method for SMT chip mounter suction nozzle, it is characterized in that comprising the steps: A, water atomization, utilize high-pressure water nozzle, sprinkler head arranges atomization structure, produce superfine little water smoke;
B, cleaning, utilize high speed, high pressure spray atomized water out to aim at the suction nozzle of SMT chip mounter, the energy field that formation one is lasting above suction nozzle to be cleaned, pulverize suction nozzle surface and inner dirt;
C, inspection, after having cleaned, checking suction nozzle, as cleaned up, then completing whole process.
2. a kind of method of cleaning SMT chip mounter suction nozzle according to claim 1, is characterized in that described atomization structure for access gases at high pressure on sprinkler head, gases at high pressure is mixed with water under high pressure in the chamber of sprinkler head.
3. a kind of method of cleaning SMT chip mounter suction nozzle according to claim 1 and 2, is characterized in that the speed of the described water smoke from sprinkler head ejection is V=300m/s-360m/s, makes it to form powerful kinetic energy and be sprayed onto on suction nozzle.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510175140.7A CN104841657A (en) | 2015-04-14 | 2015-04-14 | Method for washing SMT chip mounter suction nozzle |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510175140.7A CN104841657A (en) | 2015-04-14 | 2015-04-14 | Method for washing SMT chip mounter suction nozzle |
Publications (1)
Publication Number | Publication Date |
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CN104841657A true CN104841657A (en) | 2015-08-19 |
Family
ID=53841858
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201510175140.7A Pending CN104841657A (en) | 2015-04-14 | 2015-04-14 | Method for washing SMT chip mounter suction nozzle |
Country Status (1)
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CN (1) | CN104841657A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106645172A (en) * | 2016-12-24 | 2017-05-10 | 大连日佳电子有限公司 | Novel negative-pressure atomization suction nozzle cleaning and detection method |
CN106733843A (en) * | 2016-12-24 | 2017-05-31 | 大连日佳电子有限公司 | Novel negative pressure is atomized suction nozzle cleaning detection means |
CN111036606A (en) * | 2019-12-25 | 2020-04-21 | 苏州特斯捷电子科技有限公司 | Novel full-automatic suction nozzle cleaning machine |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102059226A (en) * | 2010-11-02 | 2011-05-18 | 大连佳世电子有限公司 | High-temperature atomization suction nozzle cleaning device |
CN203899822U (en) * | 2014-04-11 | 2014-10-29 | 深圳市巨基自动化设备有限公司 | Suction nozzle cleaning device |
CN203972362U (en) * | 2014-06-30 | 2014-12-03 | 歌尔声学股份有限公司 | Paster suction nozzle washer |
-
2015
- 2015-04-14 CN CN201510175140.7A patent/CN104841657A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102059226A (en) * | 2010-11-02 | 2011-05-18 | 大连佳世电子有限公司 | High-temperature atomization suction nozzle cleaning device |
CN203899822U (en) * | 2014-04-11 | 2014-10-29 | 深圳市巨基自动化设备有限公司 | Suction nozzle cleaning device |
CN203972362U (en) * | 2014-06-30 | 2014-12-03 | 歌尔声学股份有限公司 | Paster suction nozzle washer |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106645172A (en) * | 2016-12-24 | 2017-05-10 | 大连日佳电子有限公司 | Novel negative-pressure atomization suction nozzle cleaning and detection method |
CN106733843A (en) * | 2016-12-24 | 2017-05-31 | 大连日佳电子有限公司 | Novel negative pressure is atomized suction nozzle cleaning detection means |
CN111036606A (en) * | 2019-12-25 | 2020-04-21 | 苏州特斯捷电子科技有限公司 | Novel full-automatic suction nozzle cleaning machine |
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PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
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RJ01 | Rejection of invention patent application after publication |
Application publication date: 20150819 |
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RJ01 | Rejection of invention patent application after publication |