CN104804124B - The polymer insulation layer material of heat cross-linking functionalization and preparation method and purposes - Google Patents

The polymer insulation layer material of heat cross-linking functionalization and preparation method and purposes Download PDF

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CN104804124B
CN104804124B CN201510179443.6A CN201510179443A CN104804124B CN 104804124 B CN104804124 B CN 104804124B CN 201510179443 A CN201510179443 A CN 201510179443A CN 104804124 B CN104804124 B CN 104804124B
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functionalization
preparation
copolymer
difunctional
mol ratio
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CN104804124A (en
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李胜夏
冯林润
赵家庆
郭小军
张清
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Shanghai Jiaotong University
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Abstract

The present invention relates to polymer insulation layer material, the Preparation method and use of two kinds of heat cross-linking difunctional functionalization.The polymer formulae of described heat cross-linking difunctional functionalization is as follows respectively:The invention still further relates to the preparation method of the polymer insulation layer material of described heat cross-linking difunctional functionalization and it is as purposes in organic field effect tube for the gate insulator.The polymer insulation layer material of the heat cross-linking difunctional functionalization of the present invention is incorporated into azido group and acetylene bond on main polymer chain and realizes crosslinking by the annulation of nitrine alkynes in a heated condition, thus lower temperature, non-metal catalyst and without add crosslinking agent under conditions of obtained crosslinking polymer insulation layer material, preparation technology is simple, resulting materials has good solvent orthogonality and excellent performance, fitting through solwution method and preparing various OFETs device, application prospect is quite varied.

Description

The polymer insulation layer material of heat cross-linking functionalization and preparation method and purposes
Technical field
The present invention relates to the polymer insulation layer material of the difunctional functionalization of two kinds of heat cross-linkings, especially two kinds heat cross-linkings The polymeric material of difunctional functionalization and preparation method thereof, purposes.
Background technology
Organic field effect tube (organic field-effect transistor, OFETs) is with organic semiconductor material The transistor device that material is active layer, is one of important organic semiconductor device.Organic field effect tube with without airport Effect transistor is compared has lot of advantages: 1. have mechanical flexibility, can be compatible with plastic supporting base, and can be applicable to can In the product folding;2. manufacture craft is simple, it is not necessary to the lithographic printing of high temperature, high vacuum and complexity;3. make Standby technique is simple, and cost is relatively low;4. organic matter is easy to get, by adjusting the chemical modification of organic molecule easily The performance of joint field-effect transistor;5. can realize large area, can large scale bending etc..These inorganic devices do not have Feature so that it is large area, low cost and flexibility organic electronic product (as flexible display device drive circuit, RFID tag and sensor) aspect has potential application prospect.
In organic field effect tube, insulating layer material is an important part, and this is mainly due to organic field The mainly transmission in the organic semiconductor layer (2-6 molecular layer) closing on insulating barrier side of the electric charge of effect transistor.Absolutely The impact on device for the edge layer mainly has following several respects: 1. the pattern of insulating barrier, orientation and surface roughness are half-and-half led Body thin film form, the size of semiconductor grain, molecules align and electric charge transmission all have large effect;2. insulating barrier Stability, carrier transport on organic field effect tube for the interfacial property have very big impact;3. insulating barrier Dielectric constant has close ties with the threshold voltage of device with operation voltage.Therefore, study and prepare and organic semiconductor The insulating barrier of excellent performance thinking coupling is also the important directions that organic field effect tube only has development.
The organic insulation layer material being applied to OTFT research at present mainly has following a few class: polymethylacrylic acid Methyl esters, polyimides, polyvinyl phenol, polystyrene, polyvinyl alcohol etc..Simple polymer is bigger owing to having Free volume causes being easy to leak electricity and breakdown.Crosslinked solvent orthogonality and the heat endurance that can strengthen thin polymer film And electricity intensity.Crosslinking can be realized by illumination and heating, the crosslinked temperature of the insulating layer material of some current heat cross-linkings Spending higher (150 DEG C), high processing temperature can be limited in the application of flexible field-effect transistor.Other heat cross-linking is anti- Need during Ying to add catalyst or in course of reaction, generate new material and remain in a insulating layer, thus affecting device The performance of part.
Content of the invention
For defect of the prior art, it is an object of the invention to provide the polymerization of two kinds of heat cross-linking difunctional functionalization Thing insulating layer material and preparation method and purposes.
The present invention is achieved by the following technical solutions:
First aspect, the invention provides the polymethyl methacrylate copolymer of a kind of difunctional functionalization, its structure It is shown below:
Wherein: x:y:z=(30~6): 3:3.
Second aspect, a kind of method of polymethyl methacrylate copolymer preparing above-mentioned difunctional functionalization, its bag Include following steps:
A) by methyl methacrylate, trimethyl silica-based propargylmethyl acrylate, 3-nitrine propyl methacrylate Adding in organic solvent A with initiator, under anaerobic, at 60~80 DEG C, preferably 70 DEG C issue raw free radical Copolyreaction, it is thus achieved that the acetylene bond containing trimethyl silicane protection and the polymethyl methacrylate copolymer of azido group (TMS-PMMA);
B) polymethyl methacrylate copolymer of the described acetylene bond containing trimethyl silicane protection and azido group is dissolved in organic In solvent B, add deprotecting regent, under room temperature, slough trimethyl silane, it is thus achieved that contain the difunctionality of acetylene bond and azido group The polymethyl methacrylate copolymer (Di-PMMA) of group's functionalization.
Reaction scheme is as follows:
Preferably, in step a), described methyl methacrylate, trimethyl silica-based propargylmethyl acrylate Mol ratio with 3-nitrine propyl methacrylate is (30~6): 3:3, preferably 14:3:3.
Described initiator is azodiisobutyronitrile, and the mol ratio of methyl methacrylate and initiator is 1: (0.01~0.02), preferably 1:0.02;
Described organic solvent A is toluene;
In step b), described deprotecting regent is the tetrahydrofuran solution of tetrabutyl ammonium fluoride;
The mol ratio of described copolymer and deprotecting regent is 1:(100~200), preferably 1:200;
Described organic solvent B is oxolane.
Preferably, the preparation method of described trimethyl silica-based propargylmethyl acrylate is: described trimethyl silicane The preparation method of base propargylmethyl acrylate is: use methacrylic chloride and propargyl alcohol in the presence of pyridine, in room temperature React 8~12 hours, generate propargylmethyl acrylate;By described propargylmethyl acrylate at silver chlorate and 1,8- Under the catalysis of diazabicylo 11 carbon-7-alkene, carry out back flow reaction 24~36 hours with trim,ethylchlorosilane, obtain front three Base silica-based propargylmethyl acrylate;
Wherein, the mol ratio of described methacrylic chloride and propargyl alcohol is 1:(1~1.5);Described propargylmethyl acrylic acid The mol ratio of ester and trim,ethylchlorosilane is 1:(1~1.5).
The preparation method of described 3-nitrine propyl methacrylate is: by 3-chloropropyl alcohol and sodium azide at 60 DEG C anti- Answer 36~48 hours, obtain 3-Azidopropanol;By described 3-Azidopropanol and methacrylic chloride in the presence of pyridine, Carry out reacting 8~12 hours in room temperature, obtain 3-nitrine propyl methacrylate;
Wherein, the mol ratio of described 3-chloropropyl alcohol and sodium azide is 1:(2~4);Described methacrylic chloride and 3-fold The mol ratio of nitrogen base propyl alcohol is 1:(1~1.5).
The third aspect, present invention also offers a kind of polymethyl methacrylate materials such as above-mentioned difunctional functionalization and makees For purposes in organic field effect tube for the gate insulator.
Fourth aspect, the invention provides the polystyrene copolymer of a kind of difunctional functionalization, its structure such as following formula institute Show:
Wherein: x:y:z=(30~6): 3:3.
5th aspect, a kind of method of polystyrene copolymer preparing described difunctional functionalization, it includes as follows Step:
C) styrene, 4-trimethyl silica-based propynyloxy base styrene, 4-azido-methyl styrene and initiator are added organic In solvent orange 2 A, under anaerobic, at 60~80 DEG C, preferably 70 DEG C issue raw free radicals copolymerization reaction, it is thus achieved that contain The acetylene bond of trimethyl silicane protection and the polystyrene copolymer (TMS-PS) of azido group;
D) will be dissolved in organic solvent B, and add deprotecting regent, at room temperature slough trimethyl silane, it is thus achieved that contain alkynes The polystyrene copolymer (Di-PS) of the difunctional functionalization of key and azido group.
Reaction scheme is as follows:
In step c), described styrene, 4-trimethyl silica-based propynyloxy base styrene, cinnamic mole of 4-azido-methyl Ratio is (30~6): 3:3, preferably 18:3:3.
Described initiator is azodiisobutyronitrile, and the mol ratio of monomer and initiator is 1:(0.01~0.02), it is preferably 1:0.02.
Described organic solvent C is toluene;
In step d), described deprotecting regent is the tetrahydrofuran solution of tetrabutyl ammonium fluoride;
The mol ratio of described copolymer and deprotecting regent is 1:(100~200), preferably 1:200.
Described organic solvent D is oxolane.
Preferably, the cinnamic preparation method of the silica-based propynyloxy base of described 4-trimethyl is: described 4-trimethyl The cinnamic preparation method of silica-based propynyloxy base is: by 4-Vinyl phenol at Anhydrous potassium carbonate and be TBAB Act on the back flow reaction carrying out in a solvent with propine bromine down under nitrogen protection 18~30 hours, obtain 4-propynyloxy base benzene second Alkene;By described 4-propynyloxy base styrene under the catalysis of silver chlorate and 1,8-diazabicylo 11 carbon-7-alkene with trimethyl Chlorosilane carries out the back flow reaction 18~24 hours under nitrogen protection in a solvent, obtains 4-trimethyl silica-based propynyloxy base benzene Ethene;
Wherein, 4-Vinyl phenol and the mol ratio of propine bromine and Anhydrous potassium carbonate are 1:(2~3): (2~3);Described 4-alkynes third The mol ratio of epoxide styrene and trim,ethylchlorosilane is 1:(1~3);
The cinnamic preparation method of described 4-azido-methyl is: by 4-1-chloro-4-methyl-benzene with sodium azide according to 1:(4~6) Mol ratio, in DMF, 60 DEG C react 36~48 hours, obtain 4-azido-methyl styrene.
6th aspect, present invention also offers the polystyrene material of the difunctional functionalization of a kind of heat cross-linking described above As purposes in organic field effect tube for the gate insulator.
Compared with prior art, the present invention has a following beneficial effect:
(1) the inventive method simply effectively, raw material be readily synthesized preparation, low cost, the target product purity obtaining is high;
(2) present invention uses the polymeric material of difunctional functionalization in a heated condition, introduces the cyclization of nitrine-alkynes Reaction is as crosslinking method, it is to avoid what blending type insulating layer material caused is separated, it is achieved that at lower temperature, without gold Metal catalyst and the cross-linked polymer insulating layer material without preparation densification under conditions of interpolation crosslinking agent;
(3) polymeric material of the heat cross-linking of gained of the present invention fits through solwution method and prepares various OFETs device, is A kind of organic field effect tube gate insulating layer material of excellent performance.
Brief description
By reading the detailed description made non-limiting example with reference to the following drawings, other of the present invention are special Levy, objects and advantages will become more apparent upon:
Fig. 1 is the proton nmr spectra of the polymethyl methacrylate copolymer (Di-PMMA) of difunctional functionalization (1H-NMR);
Fig. 2 be the polystyrene copolymer (Di-PS) of difunctional functionalization proton nmr spectra (1H-NMR);
Fig. 3 is the infrared absorption spectroscopy (FT-IR) of difunctional functionalized copolymer material;
Fig. 4 is the differential scanning calorimetry curve of difunctional functionalized copolymer material;
Fig. 5 is the thermal gravimetric analysis curve of difunctional functionalized copolymer material;
Fig. 6 is the structural representation of the OFET device with the difunctional functionalized copolymer of heat cross-linking as gate insulator Figure;
Fig. 7 is the leakage current density of the OFET device with the difunctional functionalized copolymer of heat cross-linking as gate insulator Curve;
The curve of output of the OFET device with the difunctional functionalized copolymer of heat cross-linking as gate insulator for the Fig. 8;
The transfer curve of the OFET device with the difunctional functionalized copolymer of heat cross-linking as gate insulator for the Fig. 9.
Detailed description of the invention
Below in conjunction with specific embodiment, the present invention is described in detail.Following example will assist in those skilled in the art Member is further appreciated by the present invention, but does not limit the present invention in any form.It should be pointed out that, the common skill to this area For art personnel, without departing from the inventive concept of the premise, some deformation can also be made and improve.These broadly fall into Protection scope of the present invention.
The 1st, embodiment prepares the polymethyl methacrylate copolymer insulating layer material of difunctional functionalization of heat cross-linking
Present embodiments provide polymethyl methacrylate copolymer (Di-PMMA) the insulating barrier material of difunctional functionalization Material, is by after free-radical polymerized by the monomer of two kinds of functionalization and methyl methacrylate, then is obtained by deprotection steps Arriving, its structure is shown below.
Wherein x=17, y=3, z=3.
1.1st, preparation contains the acetylene bond of trimethyl silicane protection and the polymethyl methacrylate copolymer of azido group (TMS-PMMA)
The structural formula of described copolymer TMS-PMMA is as follows:
Wherein x=17, y=3, z=3.Fig. 2 be copolymer TMS-PMMA proton nmr spectra (1H-NMR), it is prepared Method is as follows:
By methyl methacrylate (1.4g, 14.0mmol), trimethyl silica-based propargylmethyl acrylate (0.61g, 3.0 Mmol), the acid of 3-nitrine propyl methyl (0.51g, 3.0mmol) and azodiisobutyronitrile (0.066g, 0.40mmol) It is dissolved in 20mL toluene, nitrogen bubble 0.5h, 70 DEG C of reaction 14h.Reactant liquor is cooled to room temperature, after concentration Absolute methanol precipitates three times.Suction filtration final vacuum is dried to obtain white solid 2.0g (Mn=13,390g/mol, PDI= 4.6)。
Wherein, the preparation method of trimethyl silica-based propargylmethyl acrylate is as follows:
With methacrylic chloride and propargyl alcohol in the presence of pyridine, with the mol ratio of 1:1 in room temperature reaction 8~12 hours, Generate propargylmethyl acrylate;By described propargylmethyl acrylate at silver chlorate and 1,8-diazabicylo 11 Under the catalysis of carbon-7-alkene, carry out back flow reaction 24~36 hours with trim,ethylchlorosilane with the mol ratio of 1:1.5, obtain three Methylsilyl propargylmethyl acrylate;
The preparation method of 3-nitrine propyl methacrylate is: exist 3-chloropropyl alcohol and sodium azide with the mol ratio of 1:2 React 36~48 hours at 60 DEG C, obtain 3-Azidopropanol;By 3-Azidopropanol with methacrylic chloride with 1:1's Mol ratio, in the presence of pyridine, carries out reacting 8~12 hours in room temperature, obtains 3-nitrine propyl methacrylate;
Nucleus magnetic hydrogen spectrum is as shown in Figure 1:1H NMR(δ,CDCl3):4.70-4.48(m,2H),4.12-3.94(m,2H), 3.72-3.50(m,19H),3.48-3.33(m,2H),2.12-0.70(m,52H),0.30-0.10(m,9H);Infrared spectrum is such as Shown in Fig. 3 a: FTIR2998,2944,2091,1727,1487,1440,1247,1146,983cm-1
1.2nd, preparation contains the polymethyl methacrylate copolymer (Di-PMMA) of acetylene bond and azido group
The structural formula of described copolymer Di-PMMA is as follows:
Wherein x=17, y=3, z=3.Fig. 3 be copolymer Di-PMMA proton nmr spectra (1H-NMR), its system Preparation Method is as follows:
It is dissolved in copolymer TMS-PMMA (0.60g, 0.045mmol) in 10mL oxolane, then drip four fourths The tetrahydrofuran solution (1.0M, 0.010mol) of base ammonium fluoride, after dropping finishes, is stirred at room temperature 12 hours, adds after concentration Entering 10mL distilled water, dichloromethane extracts three times, and anhydrous sodium sulfate is dried, and solution is loaded bag filter after concentrating by suction filtration (MwCutoff3500), dialysed two days by acetone.Concentrating the solution in bag filter, vacuum drying obtains white solid 0.51 g(Mn=10,202g/mol, PDI=3.3).
Nucleus magnetic hydrogen spectrum is as shown in Figure 1:1H NMR(δ,CDCl3):4.72-4.46(m,2H),4.15-3.93(m,2H), 3.75-3.50(m,19H),3.50-3.35(m,2H),2.58-2.40(m,1H),2.15-0.53(m,51H);Infrared spectrum is such as Fig. 3 a:FTIR 3277,2998,2952,2091,1720,1487,1440,1239,1139,975cm-1
The 2nd, embodiment prepares the polystyrene copolymer insulating layer material of difunctional functionalization of heat cross-linking
Present embodiments provide polystyrene copolymer (Di-PS) insulating layer material of difunctional functionalization, be by two kinds of work( The monomer of energyization and styrene are by after free-radical polymerized, then are obtained by deprotection steps, and its structure is shown below,
Wherein x=18, y=3, z=3.
2.1st, preparation contains the acetylene bond of trimethyl silicane protection and the polystyrene copolymer (TMS-PS) of azido group
The structural formula of described copolymer TMS-PS is as follows:
Wherein x=18, y=3, z=3.Fig. 1 be copolymer TMS-PS proton nmr spectra (1H-NMR), it is prepared Method is as follows:
By styrene (1.46g, 14.0mmol), 4-trimethyl silica-based propynyloxy base styrene (0.69g, 3.0mmol), 4- Azido-methyl styrene (0.48g, 3.0mmol) and azodiisobutyronitrile (0.066g, 0.40mmol) are dissolved in 20mL first In benzene, reactant liquor is cooled to room temperature, precipitates after concentration in absolute methanol by nitrogen bubble 0.5h, 70 DEG C of reaction 14h. Three times.Suction filtration final vacuum is dried to obtain faint yellow solid 1.2g (Mn=16,905g/mol, PDI=1.6).
Wherein, the cinnamic preparation method of 4-trimethyl silica-based propynyloxy base is: by the 4-hydroxy benzenes second of 1 molfraction Alkene under the effect of the Anhydrous potassium carbonate of 2 molfractions and the TBAB of 3 molfractions with propine bromine in a solvent Carry out the back flow reaction 18~30 hours under nitrogen protection, obtain 4-propynyloxy base styrene;Again by 4-propynyloxy base benzene second Alkene presses the mol ratio of 1:1 molten under the catalysis of silver chlorate and 1,8-diazabicylo 11 carbon-7-alkene with trim,ethylchlorosilane Agent carries out the back flow reaction 18~24 hours under nitrogen protection, obtains 4-trimethyl silica-based propynyloxy base styrene;
The cinnamic preparation method of 4-azido-methyl is: by 4-1-chloro-4-methyl-benzene and sodium azide rubbing according to 1:4~6 That ratio, in DMF, 60 DEG C are reacted 36~48 hours, obtain 4-azido-methyl styrene.
Nucleus magnetic hydrogen spectrum is as shown in Figure 2:1HNMR(δ,CDCl3):7.24-6.16(m,34H),4.72-4.45(m,2H), 4.35-4.07(m,2H),2.28-0.74(m,27H),0.28-0.09(m,9H);Infrared spectrum is as shown in Figure 3 b: FTIR 3068,3029,2921,2843,2091,1596,1503,1449,1239,1030cm-1
2.2nd, preparation contains the polystyrene copolymer (Di-PS) of acetylene bond and azido group
The structural formula of described copolymer Di-PS is as follows:
Wherein x=18, y=3, z=3.Fig. 3 be copolymer Di-PS proton nmr spectra (1H-NMR), its preparation side Method is as follows:
It is dissolved in copolymer TMS-PS (0.90g, 0.053mmol) in 10mL oxolane, then drip tetrabutyl fluorine Change the tetrahydrofuran solution (1.0M, 0.020mol) of ammonium, after dropping finishes, be stirred at room temperature 12 hours, add after concentration 10mL distilled water, dichloromethane extracts three times, and anhydrous sodium sulfate is dried, and solution loads after suction filtration concentration bag filter (Mw Cutoff3500), dialysed two days by acetone.Concentrating the solution in bag filter, vacuum drying obtains faint yellow solid 0.53 g(Mn=11,534g/mol, PDI=1.4).
Nucleus magnetic hydrogen spectrum is as shown in Figure 2:1H NMR(δ,CDCl3):7.26-6.16(m,38H),4.76-4.50(m,2H), 4.36-4.08(m,2H),2.60-2.37(m,1H),2.15-0.70(m,30H);Infrared spectrum is as shown in Figure 3 b: FTIR 3292,3060,3022,2921,2851,2091,1603,1503,1449,1216,1107,1015cm-1
The infrared absorption spectroscopy of embodiment the 3rd, difunctional functionalized copolymer, differential scanning calorimetry analysis and thermogravimetric analysis
Double officials that difunctional functionalized copolymer used by the present embodiment is respectively embodiment 1 and embodiment 2 prepares The polymethyl methacrylate copolymer (Di-PMMA) of functionalization and the polystyrene copolymerization of difunctional functionalization can be rolled into a ball Thing (Di-PS).
Fig. 3 give Di-PMMA and Di-PS spin-coating film after infrared absorption spectroscopy, 2100cm in collection of illustrative plates-1With 3290cm-1Absworption peak be respectively the characteristic absorption peak of azido group and acetylene bond, show prepared Di-PMMA and Di-PS film (SM) contains azido and acetylene bond.After sample is heated 0.5h at 100 DEG C, it can be seen that azido The absorption intensity of the characteristic peak of group and acetylene bond substantially weakens, and shows to there occurs nitrine-alkynes annulation.After heating 1h, folded The absorption intensity of the characteristic peak of nitrogen groups and acetylene bond weakens inconspicuous, shows that reaction reaches balance.In device fabrication process, Cross linking conditions is set to 100 DEG C of heating 0.5h.Fig. 4 shows gathering of the simple function group functionalization only modified by azido group Methyl methacrylate and polystyrene copolymer only have an exothermic peak 200~280 DEG C of scopes, are dividing of azido group Solution causes.And Di-PMMA and Di-PS copolymer has an obvious exothermic peak 90~210 DEG C of scopes, show There occurs nitrine-alkynes annulation.Fig. 5 shows Di-PMMA and Di-PS copolymer owing to occurring in temperature-rise period Cross-linking reaction, thus have preferably thermally-stabilised than a copolymer for the simple function group functionalization only modified by azido group Property.
The difunctional functionalized copolymer insulating layer material of embodiment the 4th, heat cross-linking is imitated at organic field as gate insulator Answer the purposes in transistor
Double officials that difunctional functionalized copolymer used by the present embodiment is respectively embodiment 1 and embodiment 2 prepares The polymethyl methacrylate copolymer (Di-PMMA) of functionalization and the polystyrene copolymerization of difunctional functionalization can be rolled into a ball Thing (Di-PS).
Fig. 6 gives with the polymethyl methacrylate copolymer of heat cross-linking (C-PMMA) and polystyrene copolymer (C-PS) material as gate insulator at organic field effect tube (OFET) structural representation.As shown in Figure 6, OFET The preparation method of device is: in glass matrix, the aluminum metal layer of evaporation last layer 40nm thickness is as grid, by double officials The copolymer that can roll into a ball functionalization is dissolved in chlorobenzene (40mg/mL) and is spin-coated in matrix, subsequently 100 DEG C of heating in an oven 0.5h carries out crosslinking.Then the silver of the upper 40nm thickness of evaporation passes through as source electrode and drain electrode, electrode on the insulating layer Phenyl-pentafluoride thiophenol is modified.The semiconductor layer of device is by double (triisopropylsilyl acetenyl) pentacene of 6,13-and polyphenyl The chloroformic solution of ethene drips casting and forms, the semiconductor channel length of device 60 μm, and width is 1200 μm.Fig. 7~9 are respectively Give polymethyl methacrylate copolymer (C-PMMA) and polystyrene copolymer (C-PS) the material material of heat cross-linking Expect leakage current curve, curve of output and the transfer curve of the OFET device as gate insulator.It can be seen that Under the grid voltage of 1.5MV/cm, leakage current density is 10-7A/cm2.Mobility reaches 0.59cm respectively2V-1S-1 And 0.15cm2V-1S-1, on-off ratio is respectively~105With~103, threshold voltage is respectively 0.5V and-0.6V.
The 5th, embodiment prepares the polystyrene copolymer insulating layer material of difunctional functionalization of heat cross-linking
Present embodiments provide polystyrene copolymer (Di-PS) insulating layer material of difunctional functionalization, be by two kinds of work( The monomer of energyization and styrene are by after free-radical polymerized, then are obtained by deprotection steps, and its structure is shown below,
Wherein x=93, y=5, z=5.
5.1st, preparation contains the acetylene bond of trimethyl silicane protection and the polystyrene copolymer (TMS-PS) of azido group
The structural formula of described copolymer TMS-PS is as follows:
Wherein x=93, y=5, z=5.Fig. 2 be copolymer TMS-PS proton nmr spectra (1H-NMR), it is prepared Method is as follows:
By styrene (1.87g, 18.0mmol), 4-trimethyl silica-based propynyloxy base styrene (0.23g, 1.0mmol), 4- Azido-methyl styrene (0.16g, 1.0mmol) and azodiisobutyronitrile (0.066g, 0.40mmol) are dissolved in 20mL first In benzene, reactant liquor is cooled to room temperature, precipitates after concentration in absolute methanol by nitrogen bubble 0.5h, 65 DEG C of reaction 12h. Three times.Suction filtration final vacuum is dried to obtain faint yellow solid 1.6g (Mn=16,314g/mol, PDI=1.3).
Nucleus magnetic hydrogen spectrum:1H NMR(δ,CDCl3):7.20-6.17(m,100H),4.68-4.46(m,2H),4.27-4.07(m, 2H),2.22-0.72(m,71H),0.26-0.07(m,9H);Infrared spectrum: FTIR 3069,3030,2923,2845,2093, 1599,1506,1447,1236,1034cm-1
5.2nd, preparation contains the polystyrene copolymer (Di-PS) of acetylene bond and azido group
The structural formula of described copolymer Di-PS is as follows:
Wherein x=93, y=5, z=5.Fig. 2 be copolymer Di-PS proton nmr spectra (1H-NMR), its preparation side Method is as follows:
It is dissolved in copolymer TMS-PS (0.90g, 0.053mmol) in 10mL oxolane, then drip tetrabutyl fluorine Change the tetrahydrofuran solution (1.0M, 0.020mol) of ammonium, after dropping finishes, be stirred at room temperature 12 hours, add after concentration 10mL distilled water, dichloromethane extracts three times, and anhydrous sodium sulfate is dried, and solution loads after suction filtration concentration bag filter (Mw Cutoff3500), dialysed two days by acetone.Concentrating the solution in bag filter, vacuum drying obtains faint yellow solid 0.53 g(Mn=10,177g/mol, PDI=1.6).
Nucleus magnetic hydrogen spectrum:1H NMR(δ,CDCl3):7.21-6.24(m,101H),4.72-4.50(m,2H),4.33-4.10(m, 2H),2.55-2.39(m,1H),2.10-0.75(m,80H);Infrared spectrum: FTIR 3295,3062,3020,2918,2847, 2094,1605,1501,1451,1218,1110,1013cm-1
The 6th, embodiment prepares the polystyrene copolymer insulating layer material of difunctional functionalization of heat cross-linking
Present embodiments provide polystyrene copolymer (Di-PS) insulating layer material of difunctional functionalization, be by two kinds of work( The monomer of energyization and styrene are by after free-radical polymerized, then are obtained by deprotection steps, and its structure is shown below,
Wherein x=20, y=5, z=5.
6.1st, preparation contains the acetylene bond of trimethyl silicane protection and the polystyrene copolymer (TMS-PS) of azido group
The structural formula of described copolymer TMS-PS is as follows:
Wherein x=20, y=5, z=5.Fig. 2 be copolymer TMS-PS proton nmr spectra (1H-NMR), it is prepared Method is as follows:
By styrene (0.63g, 6.0mmol), 4-trimethyl silica-based propynyloxy base styrene (0.69g, 3.0mmol), 4- Azido-methyl styrene (0.48g, 3.0mmol) and azodiisobutyronitrile (0.066g, 0.40mmol) are dissolved in 20mL first In benzene, reactant liquor is cooled to room temperature, precipitates after concentration in absolute methanol by nitrogen bubble 0.5h, 70 DEG C of reaction 14h. Three times.Suction filtration final vacuum is dried to obtain faint yellow solid 0.7g (Mn=17,029g/mol, PDI=1.6).
Nucleus magnetic hydrogen spectrum:1H NMR(δ,CDCl3):7.22-6.14(m,26H),4.70-4.45(m,2H),4.32-4.05(m, 2H),2.08-0.74(m,27H),0.30-0.07(m,9H);Infrared spectrum: FTIR 3068,3035,2923,2844,2093, 1599,1504,1447,1236,1035cm-1
6.2nd, preparation contains the polystyrene copolymer (Di-PS) of acetylene bond and azido group
The structural formula of described copolymer Di-PS is as follows:
Wherein x=20, y=5, z=5.Fig. 2 be copolymer Di-PS proton nmr spectra (1H-NMR), its preparation side Method is as follows:
It is dissolved in copolymer TMS-PS (0.90g, 0.053mmol) in 10mL oxolane, then drip tetrabutyl fluorine Change the tetrahydrofuran solution (1.0M, 0.020mol) of ammonium, after dropping finishes, be stirred at room temperature 12 hours, add after concentration 10mL distilled water, dichloromethane extracts three times, and anhydrous sodium sulfate is dried, and solution loads after suction filtration concentration bag filter (Mw Cutoff3500), dialysed two days by acetone.Concentrating the solution in bag filter, vacuum drying obtains faint yellow solid 0.53 g(Mn=11,785g/mol, PDI=1.8).
Nucleus magnetic hydrogen spectrum:1H NMR(δ,CDCl3):7.20-6.10(m,28H),4.71-4.44(m,2H),4.33-4.07(m, 2H),2.57-2.27(m,1H),2.02-0.65(m,32H);Infrared spectrum: FTIR 3293,3063,3024,2922,2850, 2093,1605,1504,1452,1214,1109,1016cm-1
In sum, the heat cross-linking difunctional functionalized copolymer insulating materials of the present invention introduce nitrine under heating condition- The annulation of alkynes is as crosslinking method, it is achieved that in lower temperature, non-metal catalyst and the condition without interpolation crosslinking agent The crosslinked polymer insulation layer material of lower preparation, resulting materials is applicable to solwution method and prepares various OFETs device, is one Planting the organic field effect tube gate insulating layer material of excellent performance, application prospect is quite varied.
Above the specific embodiment of the present invention is described.It is to be appreciated that the invention is not limited in Stating particular implementation, those skilled in the art can make various deformation or modification within the scope of the claims, This has no effect on the flesh and blood of the present invention.

Claims (5)

1. the polymethyl methacrylate copolymer of a difunctional functionalization, it is characterised in that described copolymer Structure is shown below:
Wherein, x:y:z=(30~6): 3:3.
2. a preparation method for the polymethyl methacrylate copolymer of difunctional functionalization as claimed in claim 1, It is characterized in that, comprise the steps:
A) by methyl methacrylate, trimethyl silica-based propargylmethyl acrylate, 3-nitrine propyl methacrylate Add in organic solvent A with initiator, under anaerobic, issue raw free radicals copolymerization reaction in 60~80 DEG C, it is thus achieved that Acetylene bond containing trimethyl silicane protection and the polymethyl methacrylate copolymer of azido group;
B) polymethyl methacrylate copolymer of the described acetylene bond containing trimethyl silicane protection and azido group is dissolved in organic In solvent B, add deprotecting regent, under room temperature, slough trimethyl silane, it is thus achieved that contain the difunctionality of acetylene bond and azido group The polymethyl methacrylate copolymer of group's functionalization.
3. preparation method as claimed in claim 2, it is characterised in that in step a), described methyl methacrylate, The mol ratio of trimethyl silica-based propargylmethyl acrylate and 3-nitrine propyl methacrylate is (30~6): 3:3;
Described initiator is azodiisobutyronitrile, and the mol ratio of methyl methacrylate and initiator is 1: (0.01~0.02);
Described organic solvent A is toluene;
In step b): described deprotecting regent is the tetrahydrofuran solution of tetrabutyl ammonium fluoride;
The mol ratio of described copolymer and deprotecting regent is 1:(100~200);
Described organic solvent B is oxolane.
4. preparation method as claimed in claim 2 or claim 3, it is characterised in that the silica-based propargylmethyl of described trimethyl The preparation method of acrylate is: use methacrylic chloride and propargyl alcohol in the presence of pyridine, little in room temperature reaction 8~12 When, generate propargylmethyl acrylate;By described propargylmethyl acrylate at silver chlorate and 1,8-diazabicylo Under the catalysis of 11 carbon-7-alkene, carry out back flow reaction 24~36 hours with trim,ethylchlorosilane, obtain the silica-based alkynes of trimethyl third Methyl acrylate;
Wherein, the mol ratio of described methacrylic chloride and propargyl alcohol is 1:(1~1.5);Described propargylmethyl acrylic acid The mol ratio of ester and trim,ethylchlorosilane is 1:(1~1.5);
The preparation method of described 3-nitrine propyl methacrylate is: by 3-chloropropyl alcohol and sodium azide at 60 DEG C anti- Answer 36~48 hours, obtain 3-Azidopropanol;By described 3-Azidopropanol and methacrylic chloride in the presence of pyridine, Carry out reacting 8~12 hours in room temperature, obtain 3-nitrine propyl methacrylate;
Wherein, the mol ratio of described 3-chloropropyl alcohol and sodium azide is 1:(2~4);Described methacrylic chloride and 3-fold The mol ratio of nitrogen base propyl alcohol is 1:(1~1.5).
5. the polymethyl methacrylate copolymer of a difunctional functionalization as claimed in claim 1 is as grid Purposes in organic field effect tube for the insulating barrier.
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CN104371206A (en) * 2014-11-07 2015-02-25 上海交通大学 Crosslinked polystyrene material as well as preparation method and use

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102216386A (en) * 2008-11-14 2011-10-12 3M创新有限公司 Polymeric compositions and method of making and articles thereof
CN103819684A (en) * 2014-02-17 2014-05-28 上海交通大学 Thermo-crosslinked polystyrene polymer, preparation method and applications thereof
CN104371206A (en) * 2014-11-07 2015-02-25 上海交通大学 Crosslinked polystyrene material as well as preparation method and use

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
"The dielectric properties of low temperature thermally cross-linked polystyrene and poly(methyl methacrylate) thin films";Shengxia Li等;《RSC Advances》;20150317;第5卷(第37期);第28980-28984页 *

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