CN104793336B - A kind of design of diffractive optical element method suitable for multi-wavelength - Google Patents

A kind of design of diffractive optical element method suitable for multi-wavelength Download PDF

Info

Publication number
CN104793336B
CN104793336B CN201510182055.3A CN201510182055A CN104793336B CN 104793336 B CN104793336 B CN 104793336B CN 201510182055 A CN201510182055 A CN 201510182055A CN 104793336 B CN104793336 B CN 104793336B
Authority
CN
China
Prior art keywords
wavelength
design
diffraction
diffraction element
height
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201510182055.3A
Other languages
Chinese (zh)
Other versions
CN104793336A (en
Inventor
邓启凌
王佳舟
庞辉
史立芳
秦燕云
罗雪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tengzhou Tenghai Analytical Instruments Co.,Ltd.
Original Assignee
Institute of Optics and Electronics of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Institute of Optics and Electronics of CAS filed Critical Institute of Optics and Electronics of CAS
Priority to CN201510182055.3A priority Critical patent/CN104793336B/en
Publication of CN104793336A publication Critical patent/CN104793336A/en
Application granted granted Critical
Publication of CN104793336B publication Critical patent/CN104793336B/en
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0012Optical design, e.g. procedures, algorithms, optimisation routines
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

The invention discloses a kind of design of diffractive optical element method suitable for multi-wavelength, 1) determines the wavelength and the corresponding optical field distribution of each wavelength laser of design of diffractive optical element laser;2) the corresponding target image of each wavelength and image-forming range are determined;3) overall dimensions and phase place exponent number of diffraction optical element are determined;4) according to the corresponding target image of each wavelength, the Single wavelength diffraction element suitable for each wavelength is separately designed using GS algorithms;5) take out step 4) in the corresponding diffraction element height of the most long wavelength that obtains as elemental height, add certain height on diffraction element each pixel;6) by step 5) in the equivalent phase Single wavelength diffraction element corresponding with each wavelength of each pixel structure height correspondence each wavelength after adjustment make the difference in the equivalent phase of the pixel;7) repeat step 5) and step 6), when each wavelength poor quadratic sum of correspondence is minimum, iteration is completed;8) phase place that design is obtained is quantified.

Description

A kind of design of diffractive optical element method suitable for multi-wavelength
Technical field
The invention belongs to Application Optics field, more particularly to a kind of design of diffractive optical element for being employed flexibly for multi-wavelength Method.
Background technology
Diffraction optical element (Diffractive optical elements, DOE) is that a kind of diffraction based on light wave is managed By the device for growing up, the characteristics of with not available for traditional optical elements, be greatly promoted optical system miniaturization, Integrated and array, improves and laser machines the neck such as improved efficiency in laser facula shaping, facula correction, beam quality Domain is widely used.
Traditional DOE operation wavelengths are single, greatly limit its use range.1978, Dammann proposed color for the first time Coloured light separates the concept of phase board, and different light is isolated to different diffraction times with the success of one piece of phase-plate only, but only Only it is that simply light is separated, imaging is not studied.Subsequently, domestic and international researcher is to multi-wavelength diffraction unit Part has carried out correlative study, and Doskolovich, L.L. determine the depth of each step of diffraction element structure by wavelength ratio Degree, then be iterated by each face face type error, achievement realizes the separate imaging of simple light field, but due to step depth It is non-linear, it is unfavorable for processing and makes;Bengtsson proposes a kind of by input face and the algorithm of output face discretization, is ensureing On the premise of step depth is linear, two wavelength are realized on certain distance into specific picture;Subsequently Yusuke Ogura are at which On the basis of, the weight in algorithm is optimized, the diffraction element design of multi-wavelength separate imaging is realized, the method is beneficial to Processing, but the image points for obtaining are limited, and the distance of its output light field is shorter;Xuegong Deng and Ray T.Chen On the basis of Single wavelength GS algorithms using the cascade of two diffraction elements mode, to the flat of the imaging of different wave length in addition weight Weighing apparatus, realizes the separation of multi-wavelength and focuses on, and this method cannot realize practicality in practice due to the restriction of alignment error Change.
Based on above present situation, the present invention proposes a kind of method for designing of multi-wavelength diffraction element, and the method is mainly in list On the basis of wavelength DOE designs, an optimum organization is highly carried out to the Single wavelength DOE of each wavelength, has been allowed to form applicable In the diffraction element structure of multiple wavelength.The method is not limited by wavelength and points, it is only necessary to a diffraction element, you can Far field forms color colored light field true to nature.
The content of the invention
The technical problem to be solved in the present invention is:When overcoming multi-wavelength diffraction element to design, output light field is simple, export away from From short problem.A kind of new Iterative Design method is proposed, by multi-wavelength diffraction element being found with each Single wavelength diffraction unit The point of the equivalent phase difference minimum of part, calculates the multi-wavelength diffraction element phase height of optimum, realizes desin speed same soon When can guarantee that the diffraction element design of higher diffraction efficiency and relatively low root-mean-square error.
The present invention solve the technical scheme that adopts of above-mentioned technical problem for:A kind of diffraction optical element generated for image Method for designing, design procedure are as follows:
Step (1), the wavelength (λ for determining laser used in design of diffractive optical element1、λ2、λ3…λn) and each wavelength swash Corresponding optical field distribution (the U of light1、U2、U3…Un);
Step (2), according to specific needs, determines that the corresponding target image of each wavelength is distributed (A1、A2、A3…An) and imaging Apart from z;
Step (3), the overall dimensions L and phase place exponent number q that according to specific needs, determine diffraction element;
Step (4), according to the corresponding target image of each wavelength, separately design the unicast suitable for each wavelength using GS algorithms The Single wavelength diffraction element that design is completed highly is designated as h by long diffraction element1、h2、h3…hn;Diffraction element height h and phase place Relation such as formula (1) shown in;
The most long wavelengths obtained in step (5), taking-up step (4)1Corresponding diffraction element height as elemental height, Certain height is added on diffraction element each pixel;
In formula (2), m is the integer in the range of [0, M], and M is arbitrary integer, and △ is the controllable factor of face type adjustment, is taken Value scope is [- δ %, δ %], and δ is any real number more than 0 and less than 100, and h is multi-wavelength diffraction element height, (x, y) generation The coordinate position of each pixel of table diffraction element, when adding m λ/(n-1) on Single wavelength DOE height, refractive indexes of the n for material, its The integral multiple for changing into 2 π to the amount of phase modulation of wavelength X, imaging will not be affected, and add the height of △ λ/(n-1) Degree, can make imaging produce center zero level, but when △ is in certain face type disparity range, center zero order intensity can be ignored, ripple The light beam imaging of a length of λ meets imaging needs;
Step (6), by the equivalent phase of each pixel structure height correspondence each wavelength after adjustment in step (5) with The corresponding Single wavelength diffraction element of each wavelength makes the difference in the equivalent phase of the pixel and is designated as RMS1、RMS2、RMS3、…RMSn
Wherein, RMSk(k=1,2,3...n) is λ for the structure and wavelength after iterationkSingle wavelength diffraction element structure etc. Effect difference;modaB () is MOD functions of the b to a.nk(k=1,2,3 ... n) is material to wavelength XkRefractive index;
Step (7), repeat step (5) and step (6), when the poor quadratic sum of each wavelength correspondence is minimum, iteration is completed, and is put down Under side and definition such as (4):
The m for obtaining and △ substitutes into the height that formula (2) is obtained each pixel of multi-wavelength DOE;
After step (8), iteration terminate, q rank quantizations, the phase place after quantization point are carried out to the phase distribution of input plane light field Cloth, as final diffraction optical element phase distribution.
Wherein, the LASER Light Source u (x in the step (1)o,yo) it is Gaussian Profile.
Wherein, the target image in the step (2) is two dimensional image and parallel to diffraction element place plane, in image The heart and element central line are vertical with element plane.
Wherein, the diffraction element phase place exponent number in the step (3) can only take 2n, n is integer.
Wherein, the u (x in the step (4)o,yo)、u1(x1,y1) and A (x1,y1) design when be all m × m point Matrix, can adopt fresnel diffraction formula or Fu Langhe fraunhofer-diffraction formula to be calculated in GS algorithms.
Wherein, in the step (5) when being adjusted to height, adjusting range is selective.
Wherein, each wavelength is combined by the step (6) by equivalent phase, by the right of multi-wavelength diffraction element The difference of the equivalent phase of each wavelength and the equivalent phase of the Single wavelength diffraction element of each wavelength is being iterated.
Wherein, the step (7) is by observation when the quadratic sum of the corresponding equivalent phase difference of each wavelength is minimum, repeatedly In generation, completes;Actual conditions can also be had more and add weight, be judged using weighted sum of squares.
Present invention advantage compared with prior art is:
(1) instant invention overcomes the diffraction element of traditional multi-wavelength diffraction element method for designing design gained cannot be processed Shortcoming, the structure after the method quantifies still has good imaging effect, can be used for reality processing, solve at present for The problem that multi-wavelength diffraction element cannot be processed;
(2), compared with traditional design algorithm, not by counting and distance is limited, being imaged light field can be simple for output field for the present invention Can be complicated, the step depth linear distribution of the structure after quantization a, it is only necessary to diffraction element, you can realize to multiple wavelength Light beam is regulated and controled.
Description of the drawings
Fig. 1 is the flow chart of the design of diffractive optical element method for multi-wavelength;
Fig. 2 is the target image for diffraction element design, wherein, (a) wavelength X1Target field;(b) wavelength X2Target ;(c) wavelength X3Target field;(d) general objective field;
Fig. 3 is that the picture that the present invention diffraction element that obtains of design does not quantify phase distribution and carries out obtained by computer simulation is put down Face optical field distribution, wherein, (a) wavelength X1Simulation light field of the light beam through DOE;(b) wavelength X2Simulation light field of the light beam through DOE; (c) wavelength X3Light beam through DOE simulation light field;Simulation light field of (d) mixed light beam through DOE;
Fig. 4 is that the diffraction element quantization phase distribution that present invention design is obtained carries out the image plane obtained by computer simulation Optical field distribution, wherein, (a) wavelength X1Simulation light field of the light beam through DOE;(b) wavelength X2Simulation light field of the light beam through DOE; (c) wavelength X3Light beam through DOE simulation light field;Simulation light field of (d) mixed light beam through DOE;
Fig. 5 is the phase distribution when diffraction element that present invention design is obtained does not quantify;
Fig. 6 is the phase distribution after the diffraction element that present invention design is obtained quantifies.
Specific embodiment
Below in conjunction with the accompanying drawings and specific embodiment is discussed in detail the present invention.But below example is only limitted to explain this Bright, protection scope of the present invention should include the full content of claim, and pass through following examples those skilled in the art The full content of the claims in the present invention can be realized.
Embodiment:
Diffraction element design process for three wavelength is as follows:
Step (1), the wavelength (λ for determining laser used in design of diffractive optical element1=632nm, λ2=546.1nm, λ3=435.8nm) and the corresponding light field of each wavelength laser be planar light;
Step (2), design object field are figure2 Shown colored magic square image, figure2 A () is wavelength X1Corresponding target , figure2 B () is wavelength X2Corresponding target field, figure2 C () is wavelength X3Corresponding target field, image-forming range 70cm;
Step (3), the overall dimensions 4mm*4mm of diffraction element and phase place exponent number are 16;
Step (4), according to the corresponding target image of each wavelength, separately design the unicast suitable for each wavelength using GS algorithms The Single wavelength diffraction element that design is completed highly is designated as h by long diffraction element1、h2、h3…hn;Diffraction element height h and phase place Relation such as formula (9) shown in;
The most long wavelengths obtained in step (5), taking-up step (4)nCorresponding diffraction element height as elemental height, Certain height is added on diffraction element each pixel;
In formula (10), m is the integer in the range of [0, M], and M is arbitrary integer, and △ is the controllable factor of face type adjustment, is taken Value scope is [- δ %, δ %], and δ is any real number more than 0 and less than 100, and h is multi-wavelength diffraction element height, (x, y) generation The coordinate position of each pixel of table diffraction element.When adding m λ/(n-1) on Single wavelength DOE height, its phase place to wavelength X is adjusted The integral multiple for changing into 2 π of amount processed, imaging will not be affected.Plus the height of △ λ/(n-1), produce can imaging Center zero level, but when △ is in certain face type disparity range, center zero order intensity can be ignored, and wavelength is imaged for the light beam of λ Meet imaging needs.
Step (6), by the equivalent phase of each pixel structure height correspondence each wavelength after adjustment in step (5) with The corresponding Single wavelength diffraction element of each wavelength makes the difference in the equivalent phase of the pixel and is designated as RMS1、RMS2、RMS3、…RMSn, such as Shown in formula (11);
Wherein, RMSk(k=1,2,3) are λ for the structure and wavelength after iterationkThe equivalent difference of Single wavelength diffraction element structure Value;modaB () is MOD functions of the b to a.nk(k=1,2,3) it is material to wavelength XkRefractive index.
Step (7), repeat step (5) and step (6), when the poor quadratic sum of each wavelength correspondence is minimum, iteration is completed.It is flat Under side and definition such as (12):
The m for obtaining and △ substitutes into the height that formula (10) is obtained each pixel of multi-wavelength DOE.Obtain as shown in Figure 5 Diffraction optical element phase distribution, computer simulation is carried out to the phase distribution shown in Fig. 5 image field as shown in Figure 3 is obtained Output.
After step (8), iteration terminate, 16 rank quantizations, the phase place after quantization are carried out to the phase distribution of input plane light field Distribution, obtains phase distribution as shown in Figure 6 and carries out computer simulation to the phase distribution shown in Fig. 6 being obtained as shown in Figure 4 Image field output.
What the present invention was not elaborated partly belongs to techniques known.

Claims (9)

1. a kind of design of diffractive optical element method suitable for multi-wavelength, it is characterised in that the method overcomes multi-wavelength diffraction When element is designed, output light field is simple, exports apart from short problem, by finding multi-wavelength diffraction element and each Single wavelength diffraction The point of the equivalent phase difference minimum of element, calculates the multi-wavelength diffraction element phase height of optimum, realizes desin speed fast The diffraction element design of higher diffraction efficiency and relatively low root-mean-square error, the design step of the diffraction element are can guarantee that simultaneously It is rapid as follows:
Step (1), the wavelength (λ for determining laser used in design of diffractive optical element1、λ2、λ3…λn) and each wavelength laser pair Optical field distribution (the U for answering1、U2、U3…Un);
Step (2), according to specific needs, determines that the corresponding target image of each wavelength is distributed (A1、A2、A3…An) and image-forming range z;
Step (3), the overall dimensions L and phase place exponent number q that according to specific needs, determine diffraction element;
Step (4), according to the corresponding target image of each wavelength, the Single wavelength separately designed suitable for each wavelength using GS algorithms is spread out Element is penetrated, the Single wavelength diffraction element that design is completed highly is designated as into h1、h2、h3…hn;Diffraction element height h and phase placePass System is as shown in formula (1);
The most long wavelengths obtained in step (5), taking-up step (4)1Corresponding diffraction element height as elemental height, in diffraction Certain height is added on element each pixel;
h ( x , y ) = h 1 ( x , y ) + [ m ( x , y ) + Δ ( x , y ) ] λ 1 n 1 - 1 - - - ( 2 )
In formula (2), m is the integer in the range of [0, M], and M is arbitrary integer, and △ is the controllable factor of face type adjustment, value model Enclose for [- δ %, δ %], δ is any real number more than 0 and less than 100, and h is multi-wavelength diffraction element height, and (x, y) is represented and spread out The coordinate position of each pixel of element is penetrated, when adding m λ/(n-1) on Single wavelength DOE height, refractive indexes of the n for material, which is to ripple The integral multiple for changing into 2 π of the amount of phase modulation of long λ, imaging will not be affected, and add the height of △ λ/(n-1), meeting Make imaging produce center zero level, but when △ is in certain face type disparity range, center zero order intensity can be ignored, and wavelength is λ Light beam imaging meet imaging needs;
Step (6), equivalent phase and each ripple that each the pixel structure height after adjustment in step (5) is corresponded to each wavelength The corresponding Single wavelength diffraction element of length makes the difference in the equivalent phase of the pixel and is designated as RMS1、RMS2、RMS3、…RMSn
RMS k = mod λ k [ h ( x , y ) × ( n k - 1 ) ] - h k ( x , y ) × ( n k - 1 ) - - - ( 3 )
Wherein, RMSk(k=1,2,3...n) is λ for the structure and wavelength after iterationkThe equivalent difference of Single wavelength diffraction element structure Value;modaB () is MOD functions of the b to a, nk(k=1,2,3 ... n) is material to wavelength XkRefractive index;
Step (7), repeat step (5) and step (6), when the poor quadratic sum of each wavelength correspondence is minimum, iteration is completed, quadratic sum Under definition such as (4):
R M S = RMS 1 2 + RMS 2 2 + ... + RMS n 2 - - - ( 4 )
The m for obtaining and △ substitutes into the height that formula (2) is obtained each pixel of multi-wavelength DOE;
After step (8), iteration terminate, q rank quantizations are carried out to the phase distribution of input plane light field, the phase distribution after quantization, As final diffraction optical element phase distribution;
The shortcoming that the diffraction element of traditional multi-wavelength diffraction element method for designing design gained cannot be processed is the method overcomed, Structure after the method quantifies still has good imaging effect, can be used for reality processing, solves at present for multi-wavelength The problem that diffraction element cannot be processed;
The method output field not by counting and distance is limited, imaging light field can simply can be complicated, the step of the structure after quantization Depth linear distribution a, it is only necessary to diffraction element, you can realize regulating and controlling the light beam of multiple wavelength.
2. a kind of design of diffractive optical element method suitable for multi-wavelength according to claim 1, it is characterised in that:Institute It is Gauss light or planar light to state the LASER Light Source in step (1).
3. a kind of design of diffractive optical element method suitable for multi-wavelength according to claim 1, it is characterised in that:Institute Stating the target image in step (2) is two dimensional image and connects parallel to diffraction element place plane, picture centre and element central Line is vertical with element plane.
4. a kind of design of diffractive optical element method suitable for multi-wavelength according to claim 1, it is characterised in that:Institute The diffraction element phase place exponent number stated in step (3) can only take 2n, n is integer.
5. a kind of design of diffractive optical element method suitable for multi-wavelength according to claim 1, it is characterised in that:Institute State the u (x in step (4)o,yo)、u1(x1,y1) and A (x1,y1) design when be all m × m point matrix, can in GS algorithms Calculated using fresnel diffraction formula or Fu Langhe fraunhofer-diffraction formula.
6. a kind of design of diffractive optical element method suitable for multi-wavelength according to claim 1, it is characterised in that:Institute State in step (5) when being adjusted to height, according to specific application requirement and processing request, to M and δ values, so as to true The span of fixed each parameter.
7. a kind of design of diffractive optical element method suitable for multi-wavelength according to claim 1, it is characterised in that:Institute State step (6) to combine each wavelength by equivalent phase, by the equivalent phase to each wavelength of multi-wavelength diffraction element Position is iterated with the difference of the equivalent phase of the Single wavelength diffraction element of each wavelength.
8. a kind of design of diffractive optical element method suitable for multi-wavelength according to claim 1, it is characterised in that:Institute It is that iteration is completed when the quadratic sum of the corresponding equivalent phase difference of each wavelength is minimum to state step (7);Also dependent on actual conditions plus Enter weight, judged using weighted sum of squares.
9. a kind of design of diffractive optical element method suitable for multi-wavelength according to claim 1, it is characterised in that:Institute It is to carry out 2 to the result for designing to state step (8)nIndividual step quantifies, and the height of each step is linear relationship.
CN201510182055.3A 2015-04-17 2015-04-17 A kind of design of diffractive optical element method suitable for multi-wavelength Expired - Fee Related CN104793336B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510182055.3A CN104793336B (en) 2015-04-17 2015-04-17 A kind of design of diffractive optical element method suitable for multi-wavelength

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510182055.3A CN104793336B (en) 2015-04-17 2015-04-17 A kind of design of diffractive optical element method suitable for multi-wavelength

Publications (2)

Publication Number Publication Date
CN104793336A CN104793336A (en) 2015-07-22
CN104793336B true CN104793336B (en) 2017-03-29

Family

ID=53558286

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510182055.3A Expired - Fee Related CN104793336B (en) 2015-04-17 2015-04-17 A kind of design of diffractive optical element method suitable for multi-wavelength

Country Status (1)

Country Link
CN (1) CN104793336B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105866946B (en) * 2016-06-02 2018-04-10 清华大学 A kind of design method of white light LEDs diffraction optical device
CN107719851A (en) * 2017-09-27 2018-02-23 中国科学院光电技术研究所 One kind becomes pattern anti-fake relief type security devices
CN110824721B (en) * 2019-09-24 2021-11-23 杭州驭光光电科技有限公司 Method for designing diffractive optical element and diffractive optical element
CN111679427A (en) * 2020-06-19 2020-09-18 中南大学 Optical imaging element design method, manufacturing method and optical imaging element thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1740844A (en) * 2004-08-27 2006-03-01 中国科学院光电技术研究所 Diffractive micro-optical element is realized the beam shaping method of laser diode stack
CN102375171A (en) * 2011-11-09 2012-03-14 中国科学院物理研究所 Diffractive optical element and design method thereof and application of diffractive optical element in solar battery
JP2013186350A (en) * 2012-03-08 2013-09-19 Canon Inc Calculation method for structure data of diffraction optical element, program, and manufacturing method
CN103676498A (en) * 2013-11-18 2014-03-26 中国科学院上海光学精密机械研究所 Pupil shaping unit structure of lithography machine and design method for diffraction optical element of pupil shaping unit structure

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1740844A (en) * 2004-08-27 2006-03-01 中国科学院光电技术研究所 Diffractive micro-optical element is realized the beam shaping method of laser diode stack
CN102375171A (en) * 2011-11-09 2012-03-14 中国科学院物理研究所 Diffractive optical element and design method thereof and application of diffractive optical element in solar battery
JP2013186350A (en) * 2012-03-08 2013-09-19 Canon Inc Calculation method for structure data of diffraction optical element, program, and manufacturing method
CN103676498A (en) * 2013-11-18 2014-03-26 中国科学院上海光学精密机械研究所 Pupil shaping unit structure of lithography machine and design method for diffraction optical element of pupil shaping unit structure

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
利用级联衍射光学元件对多波长混合光实现聚焦、整形和分光谱;丁立 等;《量子电子学报》;20140131;第31卷(第1期);第25-32页 *
用于光束整形的衍射光学元件设计的混合算法;庞辉 等;《光子学报》;20100630;第39卷(第6期);第977-981页 *

Also Published As

Publication number Publication date
CN104793336A (en) 2015-07-22

Similar Documents

Publication Publication Date Title
CN104793336B (en) A kind of design of diffractive optical element method suitable for multi-wavelength
Ikoma et al. Depth from defocus with learned optics for imaging and occlusion-aware depth estimation
CN106157307A (en) A kind of monocular image depth estimation method based on multiple dimensioned CNN and continuous CRF
CN106204447A (en) The super resolution ratio reconstruction method with convolutional neural networks is divided based on total variance
CN106960243A (en) A kind of method for improving convolutional neural networks structure
Li et al. End-to-end learned single lens design using fast differentiable ray tracing
CN111814626B (en) Dynamic gesture recognition method and system based on self-attention mechanism
CN108280814A (en) Light field image angle super-resolution rate method for reconstructing based on perception loss
CN110458765A (en) The method for enhancing image quality of convolutional network is kept based on perception
CN108983228A (en) A kind of RCS Near-far fields transfer method based on deep neural network
CN113706406A (en) Infrared and visible light image fusion method based on feature space multi-classification countermeasure mechanism
CN104634285A (en) Speckle generating device and method with adjustable contrast value
CN108830216A (en) A kind of adjustable continuous vari-focus target identification system of visual field and method
Lee et al. Design and single-shot fabrication of lensless cameras with arbitrary point spread functions
Zhang et al. Deep learning-enabled anti-ambient light approach for fringe projection profilometry
Yan et al. Performance-improved smart pseudoscopic to orthoscopic conversion for integral imaging by use of lens array shifting technique
Saha et al. Turbulence strength C n2 estimation from video using physics-based deep learning
CN107679286A (en) A kind of lens design method and control system for realizing LED array Uniform Illumination
Buat et al. Learning scene and blur model for active chromatic depth from defocus
CN108460829B (en) A kind of 3-D image register method for AR system
CN116009246A (en) Polarization optical system automatic optimization design method based on deep learning
CN110211122A (en) A kind of detection image processing method and processing device
CN109885890A (en) A kind of light source light spectrum optimization method and system based on color entropy
CN109447085A (en) A kind of mask convolution operation method
Fan RETRACTED ARTICLE: Image processing algorithm of Hartmann method aberration automatic measurement system with tensor product model

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
EXSB Decision made by sipo to initiate substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20181221

Address after: 277599 No. 1199 Ivy East Road, Tengzhou Economic Development Zone, Shandong Province

Patentee after: Tengzhou Tenghai Analytical Instruments Co.,Ltd.

Address before: 610209 Shuangliu 350 Mailbox in Chengdu, Sichuan Province

Patentee before: Photoelectric Technology Inst., Chinese Academy of Sciences

CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20170329

Termination date: 20210417