CN104750894B - It is a kind of to be used to fill dummy pattern and the domain structure of reference layer correlation inspection - Google Patents
It is a kind of to be used to fill dummy pattern and the domain structure of reference layer correlation inspection Download PDFInfo
- Publication number
- CN104750894B CN104750894B CN201310746373.9A CN201310746373A CN104750894B CN 104750894 B CN104750894 B CN 104750894B CN 201310746373 A CN201310746373 A CN 201310746373A CN 104750894 B CN104750894 B CN 104750894B
- Authority
- CN
- China
- Prior art keywords
- layer
- dummy pattern
- correlation
- domain
- inspection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Abstract
It is used to fill dummy pattern and the domain structure and method of reference layer correlation inspection automatically the present invention relates to a kind of.The domain structure includes：All reference layers, the reference layer includes internal figure layer and border figure layer, wherein internal figure layer includes all routine reference figure layers and all initial virtual patterned layers, and the routine reference figure layer and the initial virtual patterned layer are enclosed among the border figure layer；Wherein, the critical size of each internal figure layer edge of window length be 100 400um, and the spacing between adjacent inside figure layer be 100 400um, so that the density inspection rule of the appropriate compatible all light shield figure layers of domain structure is so as to realizing correctly inspection correlation；Automatic filling dummy pattern, whether the automatic filling dummy pattern will be inserted in the domain structure goes to examine correlation correct.A kind of new domain structure is provided in the present invention, with realize during QA automatically, it is complete, correctly complete correlation inspection between the dummy pattern and reference layer.
Description
Technical field
The present invention relates to semiconductor applications, in particular it relates to which a kind of be used to fill dummy pattern and reference automatically
The domain structure and method of figure layer correlation inspection.
Background technology
Ic manufacturing technology is a complicated technique, and technology innovation is quickly.Characterize ic manufacturing technology
One key parameter is minimum feature size, i.e. critical size（Critical dimension, CD）.With semiconductor technology
Continue to develop, the critical size of device is less and less, and the reduction just because of critical size just to set hundred on each chip
Ten thousand devices are possibly realized.
With the continuous diminution of semiconductor technology device size, when the dimensions of semiconductor devices is contracted to Nano grade,
Manufacturability design（Design for Manufacturing, DFM）In semi-conductor industry nano-engineer flow and method
Become more and more important.The DFM refer to by the production efficiency of fast lifting chip yield and reduce production cost for the purpose of,
Rule, tool and method in the design of Unify legislation chip, so as to better control over duplication of the integrated circuit to physics wafer, it is
The design of process variability in a kind of predictable manufacturing process so that reach and optimize from the whole process for being designed into wafer manufacture.
Dummy pattern is automatically added to during the DFM（dummy）Become more and more important, the dummy pattern can be with
The Density Distribution of target pattern is helped improve, makes the device performance more homogeneous, the technique such as increase planarization, photoetching, etching
Process capability.
The up-to-standard ensuring method of complete dummy pattern（Complete dummy QA）What is become is extremely important, but logical
Often need to take a substantial amount of time and manpower reaches the requirement of the QA, " dummy pattern and reference particularly in QA
In correlation inspection between figure layer " step, numerous reference layer needs to carry out the inspection of correlation, but existing skill
Conventional test domain tends not to enough include all reference patterns in art.
Quality assurance described in prior art（QA）Flow, as shown in figure 1, including：（1）Design dummy pattern and establish filling
Formula（script）；（2）Choose typical pattern domain；（3）It is that pattern domain prepares dummy pattern with filling formula；（4）Will
The dummy pattern is inserted into original pattern domain；（5）DRC is performed to check；Wherein, the DRC is checked and included（1）Original graph
The main DRC of example edition figure；（2）Insert the inspection of the inspection rule of dummy pattern in the domain after dummy pattern；（3）
Whole domain（Dummy pattern including original pattern domain and insertion）Density rule check.
Wherein in the QA of prior art, " the correlation inspection between dummy pattern and reference layer " is depended on completely
In sample domain, following shortcoming is thus brought：First, even with multiple sample domain（combine multi-sample-
layouts）, reference layer all in the inspection rule and dummy pattern insertion rule of dummy pattern, example can not be included
40 reference layers are included such as in 20nm technology nodes, but can not possibly be included in conventional sample domain system so more
Reference layer；Secondly, in sample domain, even if specifically referring to domain in the presence of some（one certain reference
layer）, the reference layer do not allow dummy pattern to insert in principle, but sometimes automatic dummy pattern is not inserted into
Real causes, it is not as this reference layer and prevents the function that dummy pattern inserts from being come into force in formula fill, but because of institute
Stating does not have enough spaces to make the automatic dummy pattern insertion in reference layer domain, so as to cause mistakenly to pass through virtual graph
Correlation inspection between case and reference layer.
Therefore, it is necessary to be improved innovation to domain structure in the detection process, to solve to exist in above-mentioned QA detections
The problem of.
The content of the invention
A series of concept of reduced forms is introduced in Summary, this will enter in specific embodiment part
One step describes in detail.The Summary of the present invention is not meant to attempt to limit technical scheme claimed
Key feature and essential features, the protection domain for attempting to determine technical scheme claimed is not meant that more.
The present invention is in order to solve problems of the prior art, there is provided one kind is used to fill dummy pattern and ginseng automatically
The domain structure of figure layer correlation inspection is examined, including：
All reference layers, the reference layer includes internal figure layer and border figure layer, wherein the interior view layer
Including all routine reference figure layers and all initial virtual patterned layers, the routine reference figure layer and the initial virtual figure
Pattern layer is enclosed among the border figure layer；
Wherein, the critical size of each internal figure layer edge of window length is 100-400um, between the adjacent internal figure layer
Spacing is 100-400um, so that the density inspection rule of the appropriate compatible all light shield figure layers of the domain structure is so as to realizing just
Really examine correlation；
Automatic filling dummy pattern, the automatic filling dummy pattern, which will be inserted in the domain structure, to be gone to examine phase
Whether closing property is correct.
Preferably, the distance between reference layer and the border figure layer on the inside of the border layer edges is
100-400um。
Preferably, the initial virtual patterned layer is located in the border figure layer, it is empty for detecting initial manual designs
Intend pattern（drawing dummy）Be automatically inserted into dummy pattern（auto-insert dummy）Between relation.
Preferably, the realization of the initial virtual patterned layer can be used in each 100-400um × 100-400um figure layers
The method that window is directly drawn manually, the automatic filling dummy pattern that can also choose corresponding figure layer replace realizing to simulate.
Preferably, the initial virtual patterned layer includes front end of line figure layer, inner metal layer, the first top metal
Layer, the second metal layer at top, super thick metal level and metal welding disc layer.
Preferably, the critical size of each figure layer window length of side is 100-400um in the initial virtual patterned layer, it is adjacent
Each figure layer window between spacing be 100-400um, or each figure layer and the adjacent conventional reference layer it
Between spacing be 100-400um.Preferably, correlation inspection includes between the automatic filling dummy pattern and reference layer
Prevention, spacing, contact, wrap up, be folded, across, top is vertical, parallel length, the inspection extended.
Present invention also offers a kind of method of the correlation inspection between automatic filling dummy pattern and reference layer, bag
Include：Step（a）Choose the domain structure stated and check domain as dummy pattern-reference layer correlation；
Step（b）Domain is checked according to the correlation, dummy pattern is automatically generated using the filling formula of dummy pattern；
Step（c）By step（b）Obtained automatic filling dummy pattern insertion is merged into the dummy pattern-reference layer
Correlation, which is checked in domain, forms overall domain；
Step（d）To step（c）The overall domain carries out correlation inspection.If the dummy pattern of insertion does not meet correlation
Property rule, then alarm is sent, to realize that the dummy pattern fills the up-to-standard automatic detection of formula.
Preferably, the correlation inspection method content includes checking rule, figure to main design rule, dummy pattern
Density inspection three rules of rule are detected.
Preferably, the correlation detection between the dummy pattern and reference layer includes：
Check after dummy pattern filling is inserted into the dummy pattern-reference layer correlation inspection domain,
Dummy pattern checks whether the reference layer correlation in domain meets main design rule with correlation；
If the dummy pattern checks that the reference layer correlation in domain does not meet the main design rule with correlation
Requirement, then can not return in the design of the dummy pattern and modify by quality assurance；If meet the main design
The requirement of rule, then can pass through correlation inspection.
Preferably, the correlation detection between the dummy pattern and reference layer also includes：
Check after dummy pattern filling is inserted into the dummy pattern-reference layer correlation inspection domain,
The dummy pattern checks whether the reference layer correlation in domain meets dummy pattern and check rule with the correlation；
If the dummy pattern checks that the reference layer correlation in domain does not meet the dummy pattern with correlation
The requirement of rule is checked, then returns in the dummy pattern filling design and modifies；If meet the dummy pattern inspection
The requirement of rule, then can pass through correlation inspection.
Preferably, the correlation detection between the dummy pattern and reference layer also includes：
Check and dummy pattern filling is inserted into the dummy pattern-reference layer correlation to check that domain is formed whole
Body domain, whether overall domain, which meets pattern density, checks rule；
If the density of the overall domain meets the demand that the pattern density checks rule, can be examined by correlation
Look into；
If with pattern density check rule it is opposite from, need to check it is described deviate from Producing reason, if described, to deviate from be base
In design code, then can pass through；
If the pattern density inspection rule deviates from, it is undesirable obtained result, then needs to the dummy pattern
Design and insertion rule modify.
A kind of new domain structure is provided in the present invention, it is automatic, complete, correctly complete during QA to realize
Into the correlation inspection between the dummy pattern and reference layer；In the domain structure by design appropriate width with
And spacing, so that automatic detection can realize complete correct QA, thus the domain structure can help to reduce QA inspections
Burden.
By the setting, DRC (DRC, Design Rule Check) can be examined described automatic automatically
The relation between dummy pattern and the reference layer is filled, the relation includes prevention/spacing/contact/across/parcel
（block/space/touch/straddle/enclosed）Deng.If the relation runs counter to the main design rule, described virtual
Pattern checks that regular, described pattern density checks regular three rules, then sends alarm.
Brief description of the drawings
The drawings below of the present invention is used to understand the present invention in this as the part of the present invention.Shown in the drawings of this hair
Bright embodiment and its description, for explaining the device of the present invention and principle.In the accompanying drawings,
Fig. 1 is the dummy pattern quality assurance flow figure of manufacturability design in the prior art；
Fig. 2 is the dummy pattern quality assurance flow figure of manufacturability design in an embodiment of the invention；
Fig. 3 is the present invention with domain structure schematic diagram described in embodiment；
Fig. 4 is formed block schematic illustration for the present invention with domain structure described in embodiment；
Fig. 5 a-5c are the schematic diagram detected from a kind of domain structure of the present invention.
Embodiment
In the following description, a large amount of concrete details are given to provide more thorough understanding of the invention.So
And it is obvious to the skilled person that the present invention can be able to without one or more of these details
Implement.In other examples, in order to avoid obscuring with the present invention, do not enter for some technical characteristics well known in the art
Row description.
It should give it is noted that term used herein above is merely to describe specific embodiment, and be not intended to restricted root
According to the exemplary embodiment of the present invention.As used herein, unless the context clearly indicates otherwise, otherwise singulative
Intention includes plural form.Additionally, it should be understood that when using term "comprising" and/or " comprising " in this manual
When, it, which is indicated, has the feature, entirety, step, operation, element and/or component, but does not preclude the presence or addition of one or more
Individual other features, entirety, step, operation, element, component and/or combinations thereof.
Now, the exemplary embodiment according to the present invention is more fully described with reference to the accompanying drawings.However, these exemplary realities
Applying example can be implemented with many different forms, and should not be construed to be limited solely to the embodiments set forth herein.Should
Understand be to provide these embodiments be in order that disclosure of the invention is thoroughly and complete, and by these exemplary implementations
The design of example is fully conveyed to those of ordinary skill in the art.In the accompanying drawings, for the sake of clarity, using identical reference
Identical element is represented, thus description of them will be omitted.
A kind of domain structure for being used to fill dummy pattern and reference layer correlation inspection automatically is provided in the present invention,
Including：
All conventional reference layers, all initial virtual patterned layers, border figure layer.Wherein described boundary graph layer will
All routine reference figure layers and all initial virtual patterned layers are enclosed among the border figure layer；Wherein, the routine
Reference layer is the reference layer of traditional sense；
Conventional reference layer in the domain structure, it is that the dummy pattern detected rule and dummy pattern are inserted
Enter all reference layers involved in rule；
The realization of initial virtual patterned layer be able to can also be chosen with the method directly drawn manually in the domain structure
The automatic dummy pattern of corresponding figure layer is filled to simulate instead of realizing.
100-400um window is selected in the domain structure, except the border figure layer in the domain structure
（BORDER layer）Outside, the window size of all reference layers and initial virtual patterned layer figure layer is 100-400um, wherein
The border figure layer has compared with big window, and other all figure layer windows are included, and the internal figure layer window it
Between spacing be 100-400um, wherein positioned at the inside figure layer window at edge and the distance between the edge of the border figure layer
And 100-400um.
The distance between wherein described interior view layer and the distance between the edge of internal figure layer and the border figure layer
It is disposed as 100-400um, the density that appropriate compatible all light shield figure layers (mask layers) are capable of in the setting checks rule
So as to realize correct inspection correlation.
By the setting, if having run counter to figure when the automatic filling dummy pattern is inserted into coherent reference figure layer
Density checks rule or dummy pattern detected rule, then DRC (DRC, Design Rule Check) can be automatic
Alarm is sent, so as to realize the automatic detection function during QA.
Embodiment 1
Dummy pattern quality assurance flow described in the embodiment is described further and analyzed below in conjunction with the accompanying drawings.
As shown in figure 3, include border figure layer 11 in the domain structure, wherein the boundary graph layer 11 is with larger
Critical size, described reference layer R1-Rn can be enclosed among the border figure layer.
Among the reference layer R1 is respectively positioned on the border figure layer 11 to last reference layer, wherein each reference
The critical size of the figure layer window length of side is 100-400um, and the critical size is not any setting, but by the domain
What structure was drawn after being considered, the critical size of the reference layer window length of side can not be excessive or too small, if with reference to
The critical size of the figure layer window length of side is excessive, then during to the correlation detection between the dummy pattern-reference layer
Need to expend more times and detected, the problems such as causing efficiency to reduce；And the crucial chi of the reference layer window length of side
It is very little too small, then the effect of reference pattern is not had, such as：Reference layer window is less than automatic dummy pattern size, causes virtual
Pattern can not be inserted, so as to cause mistakenly to pass through（false qualification）Between dummy pattern and reference layer
Correlation inspection.Therefore, the critical size of the reference layer window length of side needs strictly to be controlled.
In the domain structure, the reference layer reference layer R1 is to can be by one between last reference layer
Fixed sequential arrangement, such as the reference layer is numbered, then effectively arrive it is big or it is descending arranged, still
Which is not limited to, the reference layer with out-of-order can arrange, as long as comprising all in the domain structure
Reference layer, the reference layer window size meets to require.
Meanwhile the selection of the reference layer window critical size is by each mask layer (mask layer) Density Detection
The influence of window size, only appropriate reference layer window could be simultaneously compatible to different mask layers, so the reference
The critical size of figure layer window is also contemplated that the influence to the Density Detection window of mask layer, when the reference layer window length of side
Critical size can realize compatibility to the Density Detection window of all mask layers for 100-400um.
Although the setting of the reference layer does not require to arrange in certain sequence, the distance between neighboring reference figure layer
Need strictly to set, the distance between described neighboring reference figure layer is 100-400um, and the distance is not any setting, phase
The distance between adjacent reference layer is too small, is, for example, less than 100um, then some dummy patterns due to space it is too small and can not be automatic
Insertion, if the distance between described neighboring reference figure layer is too big, 400um is greater than, then correlation detection process needs to expend
More times and resource, the problems such as causing efficiency to reduce.
It is similarly positioned in the reference layer of the border figure layer edge position and the distance of border layer edges is also required to
Strict control, is arranged to 100-400um, and the distance is too small, is, for example, less than 100um, then some dummy patterns due to space too
It is small and can not automatically insert, if the distance is too big, 400um is greater than, then can significantly reduce detection efficiency.
The domain structure still further comprises the initial virtual patterned layer of corresponding each mask layer, wherein described external initial
Dummy pattern layer includes front end of line figure layer, inner metal layer, the first metal layer at top, the second metal layer at top, super thick metal
Layer, metal welding disc layer（FEOL/1XMetal/TM1/TM2/MTT2/ALPA dummy）.The initial virtual in the domain structure
The realization of patterned layer can use the method directly drawn manually, and the automatic filling dummy pattern that can also choose corresponding mask layer carrys out mould
Intend replacing realizing.So that domain can be used for detecting the initial virtual patterned layer and the pass being automatically inserted between dummy pattern
Connection.
In of the invention one specifically embodiment, the front end of line figure in the complete initial virtual patterned layer
Layer, inner metal layer, the first metal layer at top, the second metal layer at top, super thick metal level, metal welding disc layer can be according to above-mentioned
Order sets gradually to form initial virtual patterned layer, can also upset said sequence and arbitrarily be arranged.
In addition, as other embodiment, the front end of line figure layer, inner metal layer, the first metal layer at top,
Two metal layer at top, super thick metal level, metal welding disc layer can be with scattering devices among the reference layer, as long as the front end
Processing procedure figure layer, inner metal layer, the first metal layer at top, the second metal layer at top, super thick metal level, metal welding disc layer and adjacent
The distance between figure layer be 100-400um.
By the setting, DRC (DRC, Design Rule Check) can be examined described automatic automatically
The relation between dummy pattern and the reference layer is filled, the relation includes prevention/spacing/contact/across/parcel
（block/space/touch/straddle/enclosed）Deng.If the relation runs counter to the main design rule, described virtual
Pattern checks that regular, described pattern density checks regular three rules, then sends alarm.
Domain structure of the present invention forms framework as shown in figure 4, including all conventional ginsengs in the domain structure
Examine figure layer, all initial virtual patterned layers, border figure layer.Wherein pass through in the reference layer/initial virtual patterned layer
Spacing between appropriate window size and different figure layers is set, and the border figure layer is by setting the internal figure layer of appropriate parcel
Size, to realize the complete detection of relevance between dummy pattern-reference layer.
Embodiment 2
Present invention also offers between a kind of automatic filling dummy pattern based on above-mentioned domain structure and reference layer
The method of correlation inspection, including：
Step（a）Choose above-mentioned domain structure and check domain as dummy pattern-reference layer correlation；
Step（b）Domain is checked according to the correlation, dummy pattern is automatically generated using the filling formula of dummy pattern；
Step（c）By step（b）Obtained automatic filling dummy pattern insertion is merged into the dummy pattern-reference layer
Correlation, which is checked in domain, forms overall domain；
Step（d）To step（c）The overall domain carries out correlation inspection.If the dummy pattern of insertion does not meet correlation
Property rule, then alarm is sent, to realize that the dummy pattern fills the up-to-standard automatic detection of formula.
Wherein, the correlation inspection method content includes checking rule, pattern density to main design rule, dummy pattern
Check that regular three rules are detected.
Specifically, the correlation detection between the dummy pattern and reference layer includes：
Check after dummy pattern filling is inserted into the dummy pattern-reference layer correlation inspection domain,
Dummy pattern checks whether the reference layer correlation in domain meets main design rule with correlation；
If the dummy pattern checks that the reference layer correlation in domain does not meet the main design rule with correlation
Requirement, then can not return in the design of the dummy pattern and modify by quality assurance；If meet the main design
The requirement of rule, then can pass through correlation inspection.
Specifically, the correlation detection between the dummy pattern and reference layer also includes：
Check after dummy pattern filling is inserted into the dummy pattern-reference layer correlation inspection domain,
The dummy pattern checks whether the reference layer correlation in domain meets dummy pattern and check rule with the correlation；
If the dummy pattern checks that the reference layer correlation in domain does not meet the dummy pattern with correlation
The requirement of rule is checked, then returns in the dummy pattern filling design and modifies；If meet the dummy pattern inspection
The requirement of rule, then can pass through correlation inspection.
Specifically, the correlation detection between the dummy pattern and reference layer also includes：
Check and dummy pattern filling is inserted into the dummy pattern-reference layer correlation to check that domain is formed whole
Body domain, whether overall domain, which meets pattern density, checks rule；
If the density of the overall domain meets the demand that the pattern density checks rule, can be examined by correlation
Look into；
If with pattern density check rule it is opposite from, need to check it is described deviate from Producing reason, if described, to deviate from be base
In design code, then can pass through；
If the pattern density inspection rule deviates from, it is undesirable obtained result, then needs to the dummy pattern
Design and insertion rule modify.
As shown in Fig. 2 the correlation inspection between the dummy pattern and reference layer fills formula for dummy pattern
One detecting step of up-to-standard ensuring method, as further preferably, the up-to-standard ensuring method also includes（I）
Dummy pattern design with the consistency check of the main design rule of circuit layout and（II）Dummy pattern after dummy pattern insertion
Check rule and pattern density check the violation inspection of rule, described two inspections and the dummy pattern and reference layer it
Between correlation inspection be checking step arranged side by side.
Wherein dummy pattern design and the consistency check of the main design rule of circuit layout are as shown in left side in Fig. 2, at this
Checking step includes：
Wherein step（I）As shown in left side in Fig. 2, in this step including following sub-step：
Step（I-1）Typical pattern domain is chosen first；
The pattern domain in this step（drawing layout）In domain be not limited to a certain pattern.
Step（I-2）According to the pattern domain, dummy pattern is generated using the filling formula of dummy pattern；
Specifically, based on step（I-1）The pattern domain in graphics environment, use the filling formula of dummy pattern
（script）Dummy pattern is prepared, obtains dummy pattern domain；
Step（I-3）The dummy pattern domain is converted into main circuit domain（drawing layout）, pass through change
The data type of the dummy pattern domain（datatype）, the inspection designed in itself the dummy pattern is realized, specifically,
By dummy pattern layout data type（datatype）Data type is gone to from 1,7,51,57（datatype）0, by data type
After transformation, the dummy pattern domain is also changed into main circuit domain accordingly, and main circuit domain acquiescence is main design rule
The object of inspection, therefore realize and main DRC is carried out to the dummy pattern domain for being converted to main circuit domain.
Step（I）In further comprise step（I-4）The detection of DRC design rules is performed, that is, performs the virtual graph
Case designs the inspection for whether meeting main design rule in itself；The dummy pattern design described in the sub-step and main design rule
Consistency check is that dummy pattern described in digital examination itself designs, such as the width of the dummy pattern of each figure layer, length, spacing
（space）And whether area etc. deviates from main design rule, the parcel between dummy pattern additionally including different figure layers
(enclosed), it is folded（overlap）, across（straddle）, top it is vertical（butted）, it is intersecting（interact with）, it is parallel
Length (run length), extend（extension）Whether main design rule is deviated from, it is necessary to which explanation is described in this step
Dummy pattern designs in itself is not limited to the above-mentioned design enumerated, also comprising the conventional design of other in dummy pattern, herein
No longer enumerated, but situation about often occurring in this area is all contained within the examination scope.
If dummy pattern design mutually deviates from main design rule, check described in deviate from Producing reason, if institute
State away from being based on especially considering（special consideration）, then can pass through, it is believed that the dummy pattern reaches matter
Amount ensures QA demand；If the design deviates from main design rule, obtained result is undesirably（unexpected）'s
As a result, then can not by Quality Assurance, it is necessary to return to dummy pattern design in, to the dummy pattern design repair
Change, untill meeting the requirement of the main design rule.
The step（II）As shown among Fig. 2, dummy pattern checks rule and pattern density after dummy pattern insertion
The violation inspection of rule is checked, in this step including following sub-step：
Step（II-1）Typical pattern domain is chosen first（drawing layout）；
The pattern domain in this step（drawing layout）In domain be not limited to a certain pattern.
Step（II-2）According to the pattern domain, dummy pattern domain is generated using the filling formula of dummy pattern；
Specifically, based on step（II-1）The pattern domain in graphics environment, use the filling journey of dummy pattern
Formula（script）Dummy pattern is prepared, obtains dummy pattern domain；Above-mentioned two step and step（I-1）, step（I-2）Phase
Together, naturally it is also possible to be adjusted as the case may be.
The step（II）Also include step（II-3）By step（II-2）In dummy pattern domain insertion be merged into institute
State and overall domain is formed in pattern domain；Wherein described initial graph example edition figure（original drawing layout）In include
The pattern of pattern domain；After the virtual domain is inserted, check whether the insertion rule of dummy pattern violates dummy pattern inspection
Rule is looked into, while checks whether the global density after inserting virtual domain meets the requirement that pattern density checks rule.
Specifically, check the dummy pattern being inserted into the pattern domain and form whether overall domain meets virtually
Pattern checks rule.
Such as during insertion the dummy pattern whether with pattern figure layer（drawing layer）Contact, if described
Dummy pattern and pattern figure layer（drawing layer）Form contact and then violate the dummy pattern inspection rule, it is impossible to be logical
Cross Quality Assurance and the insertion strategy in dummy pattern design modified, it is necessary to return in dummy pattern design,
Untill meeting the needs of Quality Assurance；Pass through if not violating；It can also check whether dummy pattern meets specifically
The requirement of dummy pattern size（special dummy size request）.
In addition, in step（II）Described in density inspection rule violation inspection be that digital examination inserts the dummy pattern
Whether the density of the overall domain obtained after entering to the pattern domain meets the demand that the pattern density checks rule；
If the density that the dummy pattern is inserted into the overall domain obtained after the pattern domain meets the figure
Shape density checks the demand of rule, then can pass through quality assurance；If check that rule is opposite from needing to check institute with pattern density
State and deviate from Producing reason, if described away from being to be based on especially considering design, can pass through；If the pattern density check gauge
Deviating from then, is undesirable obtained result, then needs the design to the dummy pattern and insertion strategy to modify, extremely
Untill meeting the needs of Quality Assurance.
It should be noted that needing to meet above-mentioned two requirement simultaneously in this step, i.e., meeting simultaneously will not when inserting
Violate dummy pattern and check rule, while also need to meet that density requirement could be violated wherein one, then needed by quality assurance
Return to step（II）In be adjusted.
Embodiment 3
In this embodiment by the domain structure in embodiment 1 to the dummy pattern-reference layer correlation
Detected, it can be found that after the relation between dummy pattern and the reference layer runs counter to design rule, the domain knot
Structure can help DRC (DRC, Design Rule Check) to send mistake generation alarm automatically, be reminded, with
The dummy pattern is modified.
Correlation between dummy pattern-reference layer is checked from the domain structure below in conjunction with the accompanying drawings, its
In the reference layer 10 described in the layout design rules do not allow dummy pattern 30 to insert, the insertion of dummy pattern 30 be by
Forbid.
And in actual mechanical process, dummy pattern is filled automatically by filling formula in the domain structure, is such as schemed
Shown in 5a, the domain structure includes reference layer 10 in this embodiment, dummy pattern can packing space 20, when the void
Intend pattern 30 and insert described to cause the dummy pattern 30 due to filling the mistake of formula during packing space 20 while being inserted into
In the reference layer 10, the dummy pattern 30 and the correlation check that the correlation of the reference layer 10 in domain is disobeyed
Anti- dummy pattern checks rule, and now DRC (DRC, Design Rule Check) can send alarm automatically, carry
Show and the dummy pattern 30 filling formula is modified, to meet the correlation detection between dummy pattern-reference layer.
In this example, the modification of formula is filled to the dummy pattern, by increasing the reference layer 10 and described
The spacing limitation intended between pattern 30 is set, to prevent the dummy pattern 30 from inserting in the reference layer 10, to meet void
Intend the correlation between pattern-reference layer.
Embodiment 4
In this embodiment by the domain structure in embodiment 1 to the dummy pattern-reference layer correlation
Detected, it can be found that after the relation between dummy pattern and the reference layer runs counter to design rule, the domain knot
Structure can help DRC (DRC, Design Rule Check) to send mistake generation alarm automatically, be reminded, with
The dummy pattern is modified.
Correlation between dummy pattern-reference layer is checked from the domain structure below in conjunction with the accompanying drawings, its
In the reference pattern 50 described in the layout design rules prevent active area dummy patterns 60 from inserting, do not prevent grid virtual
Pattern 40 inserts.
And in actual mechanical process, as shown in Figure 5 b, in the region in the lower right corner that the reference pattern 50 covers not only
Correctly active area dummy pattern 60 is prevented to insert, while mistake prevents grid dummy pattern 40 to insert.Subsequent design rule
(DRC, Design Rule Check) then is checked, gate patterns can be violated due to the appearance of a large amount of blank areas in the region
Density checks rule, so as to send alarm automatically.
Formula can be filled after the alarm is sent to the dummy pattern to modify, by deleting the reference
Spacing limitation between pattern 50 and the grid dummy pattern 40 is set, and it is described to realize that the grid dummy pattern 40 is inserted into
In reference pattern 50, rule is checked to meet the pattern density.
Embodiment 5
In this embodiment by the domain structure in embodiment 1 to the dummy pattern-reference layer correlation
Detected, it can be found that after the relation between dummy pattern and the reference layer runs counter to design rule, the domain knot
Structure can help DRC (DRC, Design Rule Check) to send mistake generation alarm automatically, be reminded, with
The dummy pattern is modified.
Correlation between dummy pattern-reference layer is checked from the domain structure below in conjunction with the accompanying drawings, its
In in the layout design rules initial virtual patterned layer 80 do not allow the automatic filling dummy pattern 70 of same layer to contact.
And in actual mechanical process, as shown in Figure 5 c, first in 80 initial virtual figure layer window 100-400um × 100-
Dummy pattern is inserted in 400um as initial virtual patterned layer 80, is then further inserted into the automatic dummy pattern 70 of same layer, by
It is in contact in the initial virtual patterned layer 80 of the automatic dummy pattern 70 and the same layer, formation partly overlaps, and has run counter to void
Intend pattern and check rule, cause DRC (DRC, Design Rule Check) to send alarm.
Formula can be filled after the alarm is sent to the dummy pattern to modify, it is described initial by setting
Spacing limitation between dummy pattern layer 80 and the automatic filling dummy pattern 70 of the same layer, to prevent the automatic filling empty
Intend pattern 70 and the initial virtual patterned layer 80 is overlapped, rule is checked so as to meet the dummy pattern.
Can obtain domain structure of the present invention by embodiment 3-5 can be in QA detection process in the virtual graph
The inspection of layout design rules is automatically carried out after case insertion, if there is a situation where, not meeting the layout design rules occurs,
Alarm is then sent automatically to be improved with the design to dummy pattern.
A kind of brand-new domain structure is provided in the present invention, to realize during QA automatically, completely, correctly
Complete the correlation inspection between the dummy pattern and reference layer；Include all reference charts in the domain structure
Layer and by designing appropriate width and spacing, allows automatic detection to realize complete correct QA, thus the domain knot
Structure can help to reduce the burden that QA is checked.
Domain structure of the present invention has the characteristics that：
First, all reference layers are included in the domain structure.Here reference layer includes：All routines
Reference layer, all initial virtual patterned layers, border figure layer.
Secondly, 100-400um window is selected in the domain structure, except the boundary graph in the domain structure
Layer（BORDER layer）The window size of all internal figure layers of outer residue is 100-400um, wherein the boundary graph layer has
There is the window of maximum, all inside figure layers are included, and the spacing between the internal figure layer is 100-400um,
It is also 100-400um to be wherein located at the distance between the inside figure layer at edge and the edge of the border figure layer.
The distance between wherein described interior view layer and the distance between the edge of internal figure layer and the border figure layer
It is disposed as 100-400um, the setting being capable of appropriate compatible different mask layers（mask layers）Pattern density check window
Mouthful.By the setting, if having run counter to pattern density check gauge when the automatic filling dummy pattern inserts the domain
Then or dummy pattern detected rule, then DRC (DRC, Design Rule Check) can send alarm automatically, from
And realize the automatic detection function during QA.
The last initial virtual figure layer（original dummy layers）For detecting initial manual designs virtual graph
Case（drawing dummy）Be automatically inserted into dummy pattern（auto-insert dummy）Between relation.The initial virtual
Realizing for patterned layer can use the method directly drawn manually in each 100-400um*100-400um figure layers window, can also select
The automatic dummy pattern of corresponding figure layer is taken to fill to simulate instead of realizing.The initial virtual figure layer（original dummy
layers）Including front end of line figure layer（FEOL）, inner metal layer（1XMetal）, the first metal layer at top（TM1）, second top
Portion's metal level（TM2）, super thick metal level（MTT2 or called it UTM）, metal welding disc layer（ALPA）.
By the domain structure, DRC (DRC, Design Rule Check) can be with described in automatic detection
Relation between automatic filling dummy pattern and the reference layer, the relation include prevention/spacing/contact/across/parcel
（block/space/touch/straddle/enclosed）Deng.If the relation runs counter to the main design rule, described virtual
One of pattern inspection is regular, regular three rules of pattern density inspection are any, then sends alarm.
The present invention is illustrated by above-described embodiment, but it is to be understood that, above-described embodiment is only intended to
Citing and the purpose of explanation, and be not intended to limit the invention in described scope of embodiments.In addition people in the art
Member can also make more kinds of it is understood that the invention is not limited in above-described embodiment according to the teachings of the present invention
Variants and modifications, these variants and modifications are all fallen within scope of the present invention.Protection scope of the present invention by
The appended claims and its equivalent scope are defined.
Claims (12)
1. a kind of be used to fill dummy pattern and the domain structure of reference layer correlation inspection automatically, including：
All reference layers, the reference layer includes internal figure layer and border figure layer, wherein the interior view layer includes
All routine reference figure layers and all initial virtual patterned layers, the routine reference figure layer and the initial virtual patterned layer
It is enclosed among the border figure layer；
Wherein, the critical size of each internal figure layer edge of window length is 100-400um, the spacing between the adjacent internal figure layer
For 100-400um, so that the density inspection rule of the appropriate compatible all light shield figure layers of the domain structure is so as to realizing correct inspection
Test correlation；
Automatic filling dummy pattern, the automatic filling dummy pattern, which will be inserted in the domain structure, to be gone to examine correlation
It is whether correct.
2. domain structure according to claim 1, it is characterised in that the initial virtual patterned layer is by using each
The method directly drawn manually in 100-400um × 100-400um figure layer windows is realized, or chooses the automatic virtual of corresponding figure layer
Pattern filling replaces realizing to simulate.
3. domain structure according to claim 1, it is characterised in that the interior view on the inside of the border layer edges
The distance between layer and the border figure layer are 100-400um.
4. domain structure according to claim 1, it is characterised in that the initial virtual patterned layer is located at the boundary graph
In layer, for the relation for detecting initial manual designs dummy pattern and being automatically inserted between dummy pattern.
5. domain structure according to claim 1, it is characterised in that the initial virtual patterned layer includes front end of line figure
Layer, inner metal layer, the first metal layer at top, the second metal layer at top, super thick metal level and metal welding disc layer.
6. domain structure according to claim 1 or 5, it is characterised in that each figure layer window in the initial virtual patterned layer
The critical size of the mouth length of side is 100-400um, and the spacing between adjacent each figure layer window is 100-400um or each figure
Spacing between layer window and the adjacent conventional reference layer is 100-400um.
7. domain structure according to claim 1, it is characterised in that the automatic filling dummy pattern and reference layer it
Between correlation inspection include preventions, spacing, contact, wrap up, be folded, across, top is vertical, parallel length, extension inspection.
8. a kind of method of the correlation inspection between automatic filling dummy pattern and reference layer, including：
Domain structure described in one of step (a) selection claim 1 to 7 is as dummy pattern-reference layer correlation inspection
Domain；
Step (b) checks domain according to the correlation, and dummy pattern is automatically generated using the filling formula of dummy pattern；
The dummy pattern automatically generated in step (b) insertion is merged into the dummy pattern-reference layer phase by step (c)
Closing property, which is checked in domain, forms overall domain；
Step (d) overall domain described to step (c) carries out correlation inspection, if the dummy pattern of insertion does not meet correlation rule
Then, then alarm is sent, to realize that the dummy pattern fills the up-to-standard automatic detection of formula.
9. according to the method for claim 8, it is characterised in that the correlation inspection method content includes advising main design
Then, dummy pattern inspection rule, regular three rules of pattern density inspection are detected.
10. according to the method for claim 8, it is characterised in that the correlation between the dummy pattern and reference layer
Detection includes：
Check after dummy pattern filling is inserted into the dummy pattern-reference layer correlation inspection domain, virtually
Pattern checks whether the reference layer correlation in domain meets main design rule with correlation；
If the dummy pattern checks that the reference layer correlation in domain does not meet wanting for the main design rule with correlation
Ask, then can not return in the design of the dummy pattern and modify by quality assurance；If meet the main design rule
Requirement, then pass through correlation inspection.
11. according to the method for claim 8, it is characterised in that the correlation between the dummy pattern and reference layer
Detection also includes：
Check after dummy pattern filling is inserted into the dummy pattern-reference layer correlation inspection domain, it is described
Dummy pattern checks whether the reference layer correlation in domain meets dummy pattern and check rule with the correlation；
If the dummy pattern checks that the reference layer correlation in domain does not meet the dummy pattern inspection with correlation
The requirement of rule, then return in the dummy pattern filling design and modify；If meeting the dummy pattern checks rule
Requirement, then pass through correlation inspection.
12. according to the method for claim 8, it is characterised in that the correlation between the dummy pattern and reference layer
Detection also includes：
Check that dummy pattern filling is inserted into the dummy pattern-reference layer correlation checks that domain forms overall version
Figure, whether overall domain, which meets pattern density, checks rule；
If the density of the overall domain meets the demand that the pattern density checks rule, pass through correlation inspection；
If with pattern density check rule it is opposite from, need to check it is described deviate from Producing reason, if described away from being to be based on setting
Meter regulation, then pass through；
If the pattern density inspection rule deviates from, it is undesirable obtained result, then needs to set the dummy pattern
Meter and insertion rule are modified.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310746373.9A CN104750894B (en) | 2013-12-30 | 2013-12-30 | It is a kind of to be used to fill dummy pattern and the domain structure of reference layer correlation inspection |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310746373.9A CN104750894B (en) | 2013-12-30 | 2013-12-30 | It is a kind of to be used to fill dummy pattern and the domain structure of reference layer correlation inspection |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104750894A CN104750894A (en) | 2015-07-01 |
| CN104750894B true CN104750894B (en) | 2018-03-30 |
Family
ID=53590577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310746373.9A Active CN104750894B (en) | 2013-12-30 | 2013-12-30 | It is a kind of to be used to fill dummy pattern and the domain structure of reference layer correlation inspection |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104750894B (en) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4620942B2 (en) * | 2003-08-21 | 2011-01-26 | 川崎マイクロエレクトロニクス株式会社 | Semiconductor integrated circuit layout method, layout structure thereof, and photomask |
| US7818711B2 (en) * | 2007-06-29 | 2010-10-19 | Texas Instruments Incorporated | System and method for making photomasks |
| CN102280448B (en) * | 2011-08-31 | 2013-03-06 | 中国科学院微电子研究所 | Layout structure of silicon-base organic light-emitting microdisplay pixel unit |
| CN103023504B (en) * | 2012-12-18 | 2015-09-16 | 中国科学院微电子研究所 | A kind of SAR ADC domain structure |
-
2013
- 2013-12-30 CN CN201310746373.9A patent/CN104750894B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN104750894A (en) | 2015-07-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI743094B (en) | Method of designing layout, integrated circuit designing system and method of manufacturing tegrated circuit | |
| JP5694463B2 (en) | System and method for generating physically deterministic boundary interconnect features for double patterning techniques | |
| TWI732900B (en) | Integrated circuit implementing standard cells with metal layer segments extending out of cell boundary | |
| US10418354B2 (en) | Integrated circuit and computer-implemented method of manufacturing the same | |
| US7302662B2 (en) | Method for post-routing redundant via insertion in integrated circuit layout | |
| US9043741B2 (en) | Legalizing a portion of a circuit layout | |
| KR101816849B1 (en) | Method of forming masks | |
| US8219959B2 (en) | Generating integrated circuit floorplan layouts | |
| TW200951749A (en) | Integrated circuit (IC) design method, system and program product | |
| US8453095B2 (en) | Systems and methods for creating frequency-dependent netlist | |
| CN104750893B (en) | A kind of up-to-standard ensuring method and domain structure of dummy pattern filling formula | |
| JP2005158075A (en) | Integrated circuit design adapted to interconnection | |
| US20060265677A1 (en) | Method and system for increased accuracy for extraction of electrical parameters | |
| CN105843976A (en) | Dummy fill method for modified chip design | |
| CN104750894B (en) | It is a kind of to be used to fill dummy pattern and the domain structure of reference layer correlation inspection | |
| US7793238B1 (en) | Method and apparatus for improving a circuit layout using a hierarchical layout description | |
| KR100989102B1 (en) | Semiconductor integrated circuit and method of designing semiconductor integrated circuit | |
| TW201826155A (en) | Integrated circuits, computer-implemented method of manufacturing the same, and standard cell defining the same | |
| US7886251B2 (en) | System and method for building configurable designs with hardware description and verification languages | |
| JP2005063275A (en) | Integrated circuit layout device and method | |
| US8745559B2 (en) | Systems and methods for creating frequency-dependent netlist | |
| WO2014106040A1 (en) | Pattern-based power-and-ground (pg) routing and via creation | |
| US7328417B2 (en) | Cell-based method for creating slotted metal in semiconductor designs | |
| Wang et al. | Layout resynthesis by applying design-for-manufacturability guidelines to avoid low-coverage areas of a cell-based design | |
| Vaserman et al. | Design ranking and analysis methodology for standard cells and full chip physical optimization |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |