CN104746033A - Vacuuming control method and system of ITO-PVD equipment - Google Patents
Vacuuming control method and system of ITO-PVD equipment Download PDFInfo
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- CN104746033A CN104746033A CN201310745230.6A CN201310745230A CN104746033A CN 104746033 A CN104746033 A CN 104746033A CN 201310745230 A CN201310745230 A CN 201310745230A CN 104746033 A CN104746033 A CN 104746033A
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Abstract
The invention discloses a vacuuming control method and a system of ITO-PVD equipment, wherein the method comprises the following steps: a transmission cavity in the ITO-PVD equipment is set as a default cavity of a system dry pump, and is not allocated with a cold pump, and a cold pump is allocated for an ITO process cavity; for the default cavity, when other cavities besides the default cavity do not occupy the system dry pump, the system dry pump continuously vacuums the default cavity; and in the processing procedure, when the cavity in the ITO-PVD equipment requests for vacuuming, the vacuuming is performed according to the cold pump allocating condition of the cavity. The method saves the equipment cost and can effectively prevent the collision between hardware equipment when guaranteeing the vacuum degree requirement in the equipment processing.
Description
Technical field
The present invention relates to semiconductor applications, particularly relate to a kind of method that ITO-PVD equipment vacuumizes control.
Background technology
Physical vapor deposition (Physical Vapor Deposition, PVD) refer under vacuum, adopt the arc-discharge technique of low voltage, big current, utilize geseous discharge that target is evaporated, and evaporated material and gas are all ionized, utilize the booster action of electric field, make to be deposited on workpiece by evaporated material and reaction product thereof.This technology is widely used in the fields such as IC, LED, photovoltaic, flat pannel display.
In recent years, due to the great market demand of photodiode (LED), GaN base LED is widely used in high power lighting lamp, automobile instrument display, large-area outdoor display screen, signal lamp, and the different field such as general lighting.Tin-doped indium oxide (IndiumTinOxide), generally referred to as ITO.As a kind of transparent conductive film, ito thin film has compared with traditional metallic film that visible light transmissivity is high, good conductivity, resistance to wear, the advantage such as corrosion-resistant, and between ito thin film and GaN, adhesivity is good.Due to these characteristics, ITO is widely used in the electrode materials of GaN base chip.
ITO PVD equipment is in processes process, and load chamber, preheating chamber, transmission chamber and ITO processing chamber etc. all can require vacuum condition.Because the requirement of each chamber to vacuum tightness is not quite similar, so chamber ensures that the vacuum pump that vacuum condition uses also is distinguished to some extent.Namely load chamber, preheating chamber be relatively low to vacuum level requirements, so the dry pump of use system can meet the demands; PM(Process Module) chamber is ITO processing chamber, higher to vacuum level requirements, high-vacuum pump must be used satisfy condition; Transmission chamber is more special, and because mechanical manipulator wherein needs to carry out alternately (especially the PM chamber of high vacuum) with each chamber, its vacuum requirement is: substantially do not affect ITO process results to the change of its vacuum tightness when carrying out passing sheet with PM chamber.In traditional technology, be also furnished with a cold pump to transmission chamber, arranging in pairs or groups with the dry pump of system vacuumizes transmission chamber.This kind of method equipment cost is high, is unfavorable for process for processing.
In sum, how to provide a kind of and meet processes vacuum condition and the method that the low ITO-PVD equipment of equipment cost vacuumizes is a problem demanding prompt solution.
Summary of the invention
Based on this, be necessary to provide one accurately to vacuumize by operating device, and the low ITO-PVD equipment of equipment cost vacuumizes the method and system of control.
A kind of ITO-PVD equipment provided for realizing the object of the invention vacuumizes the method for control, comprises the following steps:
The transmission chamber arranged in ITO-PVD equipment is system dry pump acquiescence chamber, and does not configure cold pump, configures cold pump to ITO processing chamber;
To described acquiescence chamber, when the dry pump of the vacant described system of other chambers except described acquiescence chamber, the dry pump of described system continues to vacuumize described acquiescence chamber;
In processes process, when the chamber request in ITO-PVD equipment vacuumizes, carry out vacuumizing process according to the situation of the cold pump of described chamber configuration.
Wherein, the described situation according to the cold pump of chamber configuration carries out vacuumizing process, comprises the following steps:
Whether be configured with cold pump to asking the chamber vacuumized to judge, and obtain the first judged result;
According to described first judged result, when described chamber configuration during cold pump, then after using the dry pump of system to be evacuated down to the first predetermined vacuum level, continue to use cold pump to vacuumize;
According to described first judged result, when described chamber does not configure cold pump, then the dry pump of system is used to vacuumize described chamber;
Described chamber comprises loading chamber, transmission chamber, preheating chamber, and processing chamber.
As a kind of embodiment, described to described acquiescence chamber, when the dry pump of the vacant described system of other chambers except described acquiescence chamber, the dry pump of described system continues to vacuumize described acquiescence chamber, comprises the following steps:
When the chamber request in ITO-PVD equipment discharges the dry pump of described system, judge whether described chamber is that the dry pump of current system uses chamber, obtains the second judged result;
According to described second judged result, when described chamber is current system dry pump use chamber, judges whether the chamber waiting in line to use the dry pump of described system, obtain the 3rd judged result;
According to described 3rd judged result, when there being the chamber waiting in line to use the dry pump of described system, then first chamber distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system uses, and returns;
According to described 3rd judged result, when not waiting in line the chamber using the dry pump of described system, judging whether described chamber is described system dry pump acquiescence chamber, and obtaining the 4th judged result;
According to described 4th judged result, when described chamber is not described system dry pump acquiescence chamber, then dry for described system pump is distributed to described transmission chamber and use, and return; Otherwise directly return;
According to described second judged result, when described chamber is not current system dry pump use chamber, judge whether described chamber is the chamber waiting in line to use the dry pump of described system, obtains the 5th judged result;
According to described 5th judged result, when described chamber is the chamber waiting in line to use the dry pump of described system, then by described chamber from described wait in line to use the queue of the dry pump of described system delete, and to return; Otherwise directly return.
As a kind of embodiment, described according to described 3rd judged result, when there being the chamber waiting in line to use the dry pump of described system, then first chamber distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system uses, and return, comprise the following steps:
Close the valve of the dry pump of all described systems and chamber;
Wait for Preset Time;
First chamber distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system uses, and returns.
The method embodiment of control is vacuumized as a kind of ITO-PVD equipment, further comprising the steps of:
Before described transmission chamber transmits material in described processing chamber, close the dry pump valve of default system between the dry pump of described system and described transmission chamber, and the state of dry for described default system pump valve is set to open danger;
After described transmission chamber completes and transmits material in described processing chamber, open the dry pump valve of default system between the dry pump of described system and described transmission chamber, and the state of dry for described default system pump valve is set to open safety;
Before the dry pump of the described system of use vacuumizes described transmission chamber, judge the state of the dry pump valve of described default system, opening the dry pump valve of described default system when the state of the dry pump valve of described default system is for opening safe uses the dry pump of described system to vacuumize described transmission chamber, otherwise keeps the dry pump valve of described default system to close.
As a kind of embodiment, thread interlocking is used to realize the mutual exclusion of the dry pump valve switch motion of described default system, make when the dry pump valve of described default system is when opening safe state, the action of closing the dry pump valve of described default system can not be performed before opening the dry pump valve of described default system.
As a kind of embodiment, described according to described first judged result, when described chamber configuration during cold pump, then after using the dry pump of system to be evacuated down to the first predetermined vacuum level, continue to use cold pump to vacuumize, comprise the following steps:
According to described first judged result, when described chamber configuration during cold pump, the dry pump of use system vacuumizes described chamber;
After the first predetermined vacuum level is evacuated down to described chamber, discharge the dry pump of described system;
Continue to use cold pump to vacuumize described chamber.
A kind of ITO-PVD equipment based on same inventive concept vacuumizes the system of control, comprises configuration module, acquiescence chamber control module, and vacuumizes control module, wherein:
Described configuration module, is system dry pump acquiescence chamber for the transmission chamber arranged in ITO-PVD equipment, and does not configure cold pump, configure cold pump to ITO processing chamber;
Described acquiescence chamber control module, for described acquiescence chamber, when the dry pump of the vacant described system of other chambers except described acquiescence chamber, the dry pump of described system continues to vacuumize described acquiescence chamber;
Describedly vacuumize control module, in processes process, when the chamber request in ITO-PVD equipment vacuumizes, carry out vacuumizing process according to the situation of the cold pump of described chamber configuration.
Wherein in an embodiment, described in vacuumize control module and comprise judgement submodule, the first process submodule, the second process submodule, wherein:
Described judgement submodule, for judging asking the chamber vacuumized whether to be configured with cold pump, and obtains the first judged result;
Described first process submodule, for according to described first judged result, when described chamber configuration during cold pump, then, after using the dry pump of system to be evacuated down to the first predetermined vacuum level, continues to use cold pump to vacuumize;
Described second process submodule, for according to described first judged result, when described chamber does not configure cold pump, then uses the dry pump of system to vacuumize described chamber;
Described chamber comprises loading chamber, transmission chamber, preheating chamber, and processing chamber.
As a kind of embodiment, described acquiescence chamber control module comprises the first judgement submodule, and second judges submodule, the first implementation sub-module, and the 3rd judges submodule, the second implementation sub-module, and the 4th judges submodule, the 3rd implementation sub-module, wherein:
Described first judges submodule, during for discharging the dry pump of described system when the chamber request in ITO-PVD equipment, judges whether described chamber is that the dry pump of current system uses chamber, obtains the second judged result;
Described second judges submodule, for according to described second judged result, when described chamber is current system dry pump use chamber, judges whether the chamber waiting in line to use the dry pump of described system, obtains the 3rd judged result;
First implementation sub-module, for according to described 3rd judged result, when there being the chamber waiting in line to use the dry pump of described system, then first chamber distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system uses, and returns;
3rd judges submodule, for according to described 3rd judged result, when not waiting in line the chamber using the dry pump of described system, judging whether described chamber is described system dry pump acquiescence chamber, and obtaining the 4th judged result;
Second implementation sub-module, for according to described 4th judged result, when described chamber is not described system dry pump acquiescence chamber, then distributes to described transmission chamber and uses, and return by dry for described system pump; Otherwise directly return;
4th judges submodule, for according to described second judged result, when described chamber is not current system dry pump use chamber, judges whether described chamber is the chamber waiting in line to use the dry pump of described system, obtains the 5th judged result;
3rd implementation sub-module, for according to described 5th judged result, when described chamber is the chamber waiting in line to use the dry pump of described system, then by described chamber from described wait in line to use the queue of the dry pump of described system delete, and to return; Otherwise directly return.
As a kind of embodiment, the first implementation sub-module comprises valve closes unit, time control unit, the dry pump allocation units of system, wherein:
Described valve control unit, for closing the valve of the dry pump of all described systems and chamber;
Described time control unit, for waiting for Preset Time;
The dry pump allocation units of described system, use for first chamber distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system, and return.
Wherein in an embodiment, also wrap the first state setting module, the second state setting module, and valve control module, wherein:
Described first state setting module, before transmitting material at described transmission chamber in described processing chamber, close the dry pump valve of default system between the dry pump of described system and described transmission chamber, and the state of dry for described default system pump valve is set to open danger;
Described second state setting module, after completing at described transmission chamber and transmitting material in described processing chamber, open the dry pump valve of default system between the dry pump of described system and described transmission chamber, and the state of dry for described default system pump valve is set to open safety;
Described valve control module, before described transmission chamber being vacuumized at the dry pump of the described system of use, judge the state of the dry pump valve of described default system, opening the dry pump valve of described default system when the state of the dry pump valve of described default system is for opening safe uses the dry pump of described system to vacuumize described transmission chamber, otherwise keeps the dry pump valve of described default system to close.
As a kind of embodiment, thread interlocking is used to realize the mutual exclusion of the dry pump valve switch motion of described default system, make when the dry pump valve of described default system is when opening safe state, the action of closing the dry pump valve of described default system can not be performed before opening the dry pump valve of described default system.
As a kind of embodiment, described first process submodule, comprises the dry pump actuator unit of system, the dry pump releasing unit of system, cold pump actuator unit, wherein:
The dry pump actuator unit of described system, for according to described first judged result, when described chamber configuration during cold pump, the dry pump of use system vacuumizes described chamber;
The dry pump releasing unit of system, for after being evacuated down to the first predetermined vacuum level to described chamber, discharges the dry pump of described system;
Described cold pump actuator unit, uses cold pump to vacuumize described chamber for continuing.
Beneficial effect of the present invention comprises:
A kind of ITO-PVD equipment provided by the invention vacuumizes the method and system of control, high-vacuum pump is not equipped with to transmission chamber, i.e. cold pump, when not having other chambers to take system dry pump, the dry pump of use system continues to vacuumize transmission chamber, while the vacuum level requirements ensureing apparatus and process processing, save equipment cost.And adopt this control flow can the configuration of effective coordination processing unit between each chamber, circulation, avoid the conflict between hardware device to cause hardware damage.
Accompanying drawing explanation
Fig. 1 is the schema that a kind of ITO-PVD equipment of the present invention vacuumizes a specific embodiment of the method for control;
Fig. 2 is the system architecture schematic diagram that a kind of ITO-PVD equipment of the present invention vacuumizes a specific embodiment of the system of control;
Fig. 3 is the structural representation that a kind of ITO-PVD equipment of the present invention vacuumizes the acquiescence chamber control module of a specific embodiment of the system of control;
Fig. 4 is the structural representation that a kind of ITO-PVD equipment of the present invention vacuumizes the first implementation sub-module of a specific embodiment of the system of control;
Fig. 5 is the system architecture schematic diagram that a kind of ITO-PVD equipment of the present invention vacuumizes another specific embodiment of the system of control;
Fig. 6 is the structural representation that a kind of ITO-PVD equipment of the present invention vacuumizes the first process submodule of a specific embodiment of the system of control.
Embodiment
In order to make object of the present invention, technical scheme and advantage clearly understand, below in conjunction with accompanying drawing, the embodiment that ITO-PVD equipment of the present invention vacuumizes the method and system of control is described.Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
A kind of ITO-PVD equipment of the embodiment of the present invention vacuumizes the method for control, as shown in Figure 1, comprises the following steps:
S100, the transmission chamber arranged in ITO-PVD equipment is system dry pump acquiescence chamber, and does not configure cold pump, configures cold pump to ITO processing chamber.Configure different from legacy equipment, cold pump is not configured to transmission chamber, but described transmission chamber is set to the acquiescence chamber of the dry pump of system, can be so then that transmission chamber more takies the dry pump of system and vacuumizes, ensure transmission chamber relative to the vacuum tightness that to load chamber etc. higher.
S200, to described acquiescence chamber, when the dry pump of the vacant described system of other chambers except described acquiescence chamber, the dry pump of described system continues to vacuumize described acquiescence chamber.
S300, in processes process, when the chamber request in ITO-PVD equipment vacuumizes, carries out vacuumizing process according to the situation of the cold pump of described chamber configuration.
The experiment proved that, under at use system dry pump transmission chamber being continued to the vacuum degree condition vacuumized, from transmission chamber enter into wafer that PM chamber gathers perform technique after main technique result still can present good performance.The ITO-PVD equipment of the embodiment of the present invention vacuumizes the method for control, high-vacuum pump is not equipped with to transmission chamber, i.e. cold pump, when not having other chambers to take system dry pump, the dry pump of use system continues to vacuumize transmission chamber, so can ensure the vacuum level requirements that apparatus and process is processed, save equipment cost.And adopt this control flow can ensure the configuration of processing unit between each chamber, circulation, avoid the conflict between hardware device.
Wherein in an embodiment, the described situation according to the cold pump of chamber configuration carries out vacuumizing process, comprises the following steps:
Whether S310, be configured with cold pump to asking the chamber vacuumized and judge, and obtain the first judged result.Judge whether being configured with high-vacuum pump in sequence of control implementation, and automatically perform corresponding actions according to judged result, and without the need to considering the particular case performing object, routine call is simple and convenient.
S320, according to described first judged result, when described chamber configuration during cold pump, then after using the dry pump of system to be evacuated down to the first predetermined vacuum level, continues to use cold pump to vacuumize.If be configured with high-vacuum pump, i.e. cold pump, then first use the dry pump of system to vacuumize chamber, and after being extracted into a certain default vacuum tightness, re-use cold pump and continue to vacuumize chamber, this is mature technology, describes in detail no longer one by one at this.It should be noted that, the chamber being configured with the cold pump of high vacuum only has PM chamber herein, and therefore, the cold pump in system device can be continued to take by PM chamber.
S330, according to described first judged result, when described chamber does not configure cold pump, then uses the dry pump of system to vacuumize described chamber.Under normal circumstances, system dry pump can be used chamber to be evacuated down to vacuum tightness for after 0.1Torr, to discharge the dry pump of described system.
In the embodiment of the present invention, equipment to carry out in processes process work flow can automatically perform corresponding operation according to whether being configured with the cold pump of high vacuum, and whole process invocation is simple and convenient, does not need the particular case considering to vacuumize object when calling.
Wherein in an embodiment, step S200, comprises the following steps:
S210, when the chamber request in ITO-PVD equipment discharges the dry pump of described system, judges whether described chamber is that the dry pump of current system uses chamber, obtains the second judged result.The dry pump of release system can be asked when chamber is evacuated down to certain vacuum degree rear chamber, give other chambers by dry for system pump and use.
S220, according to described second judged result, when described chamber is current system dry pump use chamber, judges whether the chamber waiting in line to use the dry pump of described system, obtains the 3rd judged result.It should be noted that herein, when a certain chamber request uses the dry pump of system, first carry out the dry pump of system and use request, and the dry pump of all systems use request to rank, after can arrange the use of the dry pump of configuration-system according to Queue sequence.
S230, according to described 3rd judged result, when there being the chamber waiting in line to use the dry pump of described system, then first chamber distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system uses, and returns.Described returning does not have other special meanings, just the returning, according to normal procedure executable operations of program.
S240, according to described 3rd judged result, when not waiting in line the chamber using the dry pump of described system, judging whether described chamber is described system dry pump acquiescence chamber, and obtaining the 4th judged result.
S250, according to described 4th judged result, when described chamber is not described system dry pump acquiescence chamber, then distributes to described transmission chamber and uses, and return by dry for described system pump; Otherwise directly return.
The current system dry pump dry pump of user's release system and when not having other chambers to wait in line the dry pump of use system, then dry for system pump is distributed to the dry pump user of default system, namely transmission chamber uses.At utmost ensure the time that transmission chamber vacuumizes.
S260, according to described second judged result, when described chamber is not current system dry pump use chamber, judges whether described chamber is the chamber waiting in line to use the dry pump of described system, obtains the 5th judged result.
S270, according to described 5th judged result, when described chamber is the chamber waiting in line to use the dry pump of described system, then by described chamber from described wait in line to use the queue of the dry pump of described system delete, and to return; Otherwise directly return.
In time dry for described system pump is distributed to transmission chamber after the embodiment of the present invention makes the dry pump of other chamber release systems to vacuumize, ensure the vacuum tightness of transmission chamber.System dry pump release procedure is simple, clear.
Wherein in an embodiment, step S230 is according to described 3rd judged result, when there being the chamber waiting in line to use the dry pump of described system, first chamber then distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system uses, and return, comprise the following steps:
S231, closes the valve of the dry pump of all described systems and chamber.When the dry pump of system of release is distributed again, first the valve of the dry pump of all systems and chamber is closed, can guarantee follow-up when opening the dry pump valve of system, the dry pump of system vacuumizes separately a certain chamber, ensures the effect that vacuumizes and hardware device safety.
S232, waits for Preset Time.Preferably, in one embodiment, described Preset Time is 0.3S.Wait for that certain hour makes hardware device get ready.
S233, first chamber distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system uses, and returns.
An ITO-PVD equipment vacuumizes in the embodiment of the method for control wherein, further comprising the steps of:
S400, before described transmission chamber transmits material in described processing chamber, closes the dry pump valve of default system between the dry pump of described system and described transmission chamber, and the state of dry for described default system pump valve is set to open danger.Transmission chamber is that the dry pump of system of acquiescence uses chamber, and its valve be connected with the dry pump of system is the dry pump valve of default system.Before transmission chamber puts wafer in processing chamber, first close the dry pump valve of described default system, then the groove valve opened between transmission chamber and processing chamber transmits wafer in processing chamber.
S500, after described transmission chamber completes and transmits material in described processing chamber, opens the dry pump valve of default system between the dry pump of described system and described transmission chamber, and the state of dry for described default system pump valve is set to open safety.The valve dry pump of described default system again between first closing transmission chamber and processing chamber.
S600, before the dry pump of the described system of use vacuumizes described transmission chamber, judge the state of the dry pump valve of described default system, opening the dry pump valve of described default system when the state of the dry pump valve of described default system is for opening safe uses the dry pump of described system to vacuumize described transmission chamber, otherwise keeps the dry pump valve of described default system to close.
In the embodiment of the present invention, when transmission chamber and processing chamber carry out passing sheet, the switching sequence of groove valve and the dry pump valve of default system is limited, when preventing the valve open between transmission chamber and processing chamber, use cold pump and the dry pump of system to vacuumize an airtight chamber simultaneously and cause hardware to damage.And the state of system default valve is marked, prevent the accident of the dry pump valve of system default system from opening and cause system hardware to damage, ensure the safety of transmission chamber transmission wafer process.
Wherein in an embodiment, thread interlocking is used to realize the mutual exclusion of the dry pump valve switch motion of described default system, make when the dry pump valve of described default system is when opening safe state, the action of closing the dry pump valve of described default system can not be performed before opening the dry pump valve of described default system.Prevent from release system dry pump process, judging that the state of the dry pump valve of default system is as opening safely, CPU goes the state performing the dry pump valve of setting default system passed in sheet set-up procedure to be set to open dangerous also valve-off, and then CPU returns again to continue to perform the valve opening action in the dry pump flow process of release system.Prevent the valve between transmission chamber and processing chamber and the dry pump valve of default system from opening simultaneously.
Wherein in an embodiment, step S320, according to described first judged result, when described chamber configuration during cold pump, then after using the dry pump of system to be evacuated down to the first predetermined vacuum level, continues to use cold pump to vacuumize, comprises the following steps:
S321, according to described first judged result, when described chamber configuration during cold pump, the dry pump of use system vacuumizes described chamber.First the dry pump of system is used to vacuumize chamber.
S322, after being evacuated down to the first predetermined vacuum level to described chamber, discharges the dry pump of described system.Described first predetermined vacuum level can be 0.1Torr.
S323, continues to use cold pump to vacuumize described chamber.
Based on same inventive concept, the embodiment of the present invention provides a kind of ITO-PVD equipment to vacuumize the system of control, the principle of dealing with problems due to this system is similar to the method that aforementioned a kind of ITO-PVD equipment vacuumizes control, therefore, the enforcement of this system can realize according to the concrete steps of preceding method, repeats part and repeats no more.
A kind of ITO-PVD equipment of the embodiment of the present invention vacuumizes the system of control, as shown in Figure 2, comprise configuration module 100, acquiescence chamber control module 200, and vacuumize control module 300, wherein said configuration module 100, be system dry pump acquiescence chamber for the transmission chamber arranged in ITO-PVD equipment, and do not configure cold pump, cold pump is configured to ITO processing chamber; Described acquiescence chamber control module 200, for described acquiescence chamber, when the dry pump of the vacant described system of other chambers except described acquiescence chamber, the dry pump of described system continues to vacuumize described acquiescence chamber; Describedly vacuumize control module 300, in processes process, when the chamber request in ITO-PVD equipment vacuumizes, carry out vacuumizing process according to the situation of the cold pump of described chamber configuration.
The ITO-PVD equipment of the embodiment of the present invention vacuumizes the system of control, high-vacuum pump is not equipped with to transmission chamber, i.e. cold pump, when not having other chambers to take system dry pump, the dry pump of use system continues to vacuumize transmission chamber, so can ensure the vacuum level requirements that apparatus and process is processed, save equipment cost.And adopt this control flow can ensure the configuration of processing unit between each chamber, circulation, avoid the conflict between hardware device.
Wherein in an embodiment, described in vacuumize control module 300 and comprise and judge submodule 310, the first process submodule 320, second processes submodule 330, wherein:
Described judgement submodule 310, for judging asking the chamber vacuumized whether to be configured with cold pump, and obtains the first judged result; Described first process submodule 320, for according to described first judged result, when described chamber configuration during cold pump, then, after using the dry pump of system to be evacuated down to the first predetermined vacuum level, continues to use cold pump to vacuumize; Described second process submodule 330, for according to described first judged result, when described chamber does not configure cold pump, then uses the dry pump of system to vacuumize described chamber.Wherein, described chamber comprises loading chamber, transmission chamber, preheating chamber, and processing chamber.
Wherein in an embodiment, as shown in Figure 3, described acquiescence chamber control module 200 comprises the first judgement submodule 210, second judges submodule 220, first implementation sub-module 230,3rd judges submodule 240, second implementation sub-module 250,4th judges submodule 260,3rd implementation sub-module 270, wherein: described first judges submodule 210, during for discharging described system dry pump when the chamber request in ITO-PVD equipment, judge whether described chamber is that the dry pump of current system uses chamber, obtains the second judged result; Described second judges submodule 220, for according to described second judged result, when described chamber is current system dry pump use chamber, judges whether the chamber waiting in line to use the dry pump of described system, obtains the 3rd judged result; First implementation sub-module 230, for according to described 3rd judged result, when there being the chamber waiting in line to use the dry pump of described system, then first chamber distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system uses, and returns; 3rd judges submodule 240, for according to described 3rd judged result, when not waiting in line the chamber using the dry pump of described system, judging whether described chamber is described system dry pump acquiescence chamber, and obtaining the 4th judged result; Second implementation sub-module 250, for according to described 4th judged result, when described chamber is not described system dry pump acquiescence chamber, then distributes to described transmission chamber and uses, and return by dry for described system pump; Otherwise directly return; 4th judges submodule 260, for according to described second judged result, when described chamber is not current system dry pump use chamber, judges whether described chamber is the chamber waiting in line to use the dry pump of described system, obtains the 5th judged result; 3rd implementation sub-module 270, for according to described 5th judged result, when described chamber is the chamber waiting in line to use the dry pump of described system, then by described chamber from described wait in line to use the queue of the dry pump of described system delete, and to return; Otherwise directly return.
In time dry for described system pump is distributed to transmission chamber after the embodiment of the present invention makes the dry pump of other chamber release systems to vacuumize, ensure the vacuum tightness of transmission chamber.System dry pump release procedure is simple, clear.
Wherein in an embodiment, as shown in Figure 4, the first implementation sub-module 230 comprises valve closes unit 231, time control unit 232, the dry pump allocation units 233 of system, wherein: described valve control unit 231, for closing the valve of the dry pump of all described systems and chamber; Described time control unit 232, for waiting for Preset Time; The dry pump allocation units 233 of described system, use for first chamber distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system, and return.
An ITO-PVD equipment vacuumizes in the embodiment of the system of control wherein, as shown in Figure 5, also wrap the first state setting module 400, second state setting module 500, and valve control module 600, wherein: described first state setting module 400, before transmitting material at described transmission chamber in described processing chamber, close the dry pump valve of default system between the dry pump of described system and described transmission chamber, and the state of dry for described default system pump valve is set to open danger; Described second state setting module 500, after completing at described transmission chamber and transmitting material in described processing chamber, open the dry pump valve of default system between the dry pump of described system and described transmission chamber, and the state of dry for described default system pump valve is set to open safety; Described valve control module 600, before described transmission chamber being vacuumized at the dry pump of the described system of use, judge the state of the dry pump valve of described default system, opening the dry pump valve of described default system when the state of the dry pump valve of described default system is for opening safe uses the dry pump of described system to vacuumize described transmission chamber, otherwise keeps the dry pump valve of described default system to close.
In the embodiment of the present invention, when transmission chamber and processing chamber carry out passing sheet, the switching sequence of groove valve and the dry pump valve of default system is limited, when preventing the valve open between transmission chamber and processing chamber, use cold pump and the dry pump of system to vacuumize an airtight chamber simultaneously and cause hardware to damage.And the state of system default valve is marked, prevent the accident of the dry pump valve of system default system from opening and cause system hardware to damage, ensure the safety of transmission chamber transmission wafer process.
An ITO-PVD equipment vacuumizes in the embodiment of the system of control wherein, thread interlocking is used to realize the mutual exclusion of the dry pump valve switch motion of described default system, make when the dry pump valve of described default system is when opening safe state, the action of closing the dry pump valve of described default system can not be performed before opening the dry pump valve of described default system.Prevent from release system dry pump process, judging that the state of the dry pump valve of default system is as opening safely, CPU goes the state performing the dry pump valve of setting default system passed in sheet set-up procedure to be set to open dangerous also valve-off, and then CPU returns again to continue to perform the valve opening action in the dry pump flow process of release system.Prevent the valve between transmission chamber and processing chamber and the dry pump valve of default system from opening simultaneously.
Wherein in an embodiment, as shown in Figure 6, described first process submodule 320, comprise the dry pump actuator unit 321 of system, the dry pump releasing unit 322 of system, cold pump actuator unit 323, wherein: the dry pump actuator unit 321 of described system, for according to described first judged result, when described chamber configuration during cold pump, the dry pump of use system vacuumizes described chamber; The dry pump releasing unit 322 of system, for after being evacuated down to the first predetermined vacuum level to described chamber, discharges the dry pump of described system; Described cold pump actuator unit 323, uses cold pump to vacuumize described chamber for continuing.
The above embodiment only have expressed several embodiment of the present invention, and it describes comparatively concrete and detailed, but therefore can not be interpreted as the restriction to the scope of the claims of the present invention.It should be pointed out that for the person of ordinary skill of the art, without departing from the inventive concept of the premise, can also make some distortion and improvement, these all belong to protection scope of the present invention.Therefore, the protection domain of patent of the present invention should be as the criterion with claims.
Claims (14)
1. ITO-PVD equipment vacuumizes a method for control, it is characterized in that, comprises the following steps:
The transmission chamber arranged in ITO-PVD equipment is system dry pump acquiescence chamber, and does not configure cold pump, configures cold pump to ITO processing chamber;
To described acquiescence chamber, when the dry pump of the vacant described system of other chambers except described acquiescence chamber, the dry pump of described system continues to vacuumize described acquiescence chamber;
In processes process, when the chamber request in ITO-PVD equipment vacuumizes, carry out vacuumizing process according to the situation of the cold pump of described chamber configuration.
2. ITO-PVD equipment according to claim 1 vacuumizes the method for control, it is characterized in that, the described situation according to the cold pump of chamber configuration carries out vacuumizing process, comprises the following steps:
Whether be configured with cold pump to asking the chamber vacuumized to judge, and obtain the first judged result;
According to described first judged result, when described chamber configuration during cold pump, then after using the dry pump of system to be evacuated down to the first predetermined vacuum level, continue to use cold pump to vacuumize;
According to described first judged result, when described chamber does not configure cold pump, then the dry pump of system is used to vacuumize described chamber;
Described chamber comprises loading chamber, transmission chamber, preheating chamber, and processing chamber.
3. ITO-PVD equipment according to claim 1 vacuumizes the method for control, it is characterized in that, described to described acquiescence chamber, when the dry pump of the vacant described system of other chambers except described acquiescence chamber, the dry pump of described system continues to vacuumize described acquiescence chamber, comprises the following steps:
When the chamber request in ITO-PVD equipment discharges the dry pump of described system, judge whether described chamber is that the dry pump of current system uses chamber, obtains the second judged result;
According to described second judged result, when described chamber is current system dry pump use chamber, judges whether the chamber waiting in line to use the dry pump of described system, obtain the 3rd judged result;
According to described 3rd judged result, when there being the chamber waiting in line to use the dry pump of described system, then first chamber distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system uses, and returns;
According to described 3rd judged result, when not waiting in line the chamber using the dry pump of described system, judging whether described chamber is described system dry pump acquiescence chamber, and obtaining the 4th judged result;
According to described 4th judged result, when described chamber is not described system dry pump acquiescence chamber, then dry for described system pump is distributed to described transmission chamber and use, and return; Otherwise directly return;
According to described second judged result, when described chamber is not current system dry pump use chamber, judge whether described chamber is the chamber waiting in line to use the dry pump of described system, obtains the 5th judged result;
According to described 5th judged result, when described chamber is the chamber waiting in line to use the dry pump of described system, then by described chamber from described wait in line to use the queue of the dry pump of described system delete, and to return; Otherwise directly return.
4. ITO-PVD equipment according to claim 3 vacuumizes the method for control, it is characterized in that, described according to described 3rd judged result, when there being the chamber waiting in line to use the dry pump of described system, first chamber then distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system uses, and return, comprise the following steps:
Close the valve of the dry pump of all described systems and chamber;
Wait for Preset Time;
First chamber distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system uses, and returns.
5. ITO-PVD equipment according to claim 1 vacuumizes the method for control, it is characterized in that, further comprising the steps of:
Before described transmission chamber transmits material in described processing chamber, close the dry pump valve of default system between the dry pump of described system and described transmission chamber, and the state of dry for described default system pump valve is set to open danger;
After described transmission chamber completes and transmits material in described processing chamber, open the dry pump valve of default system between the dry pump of described system and described transmission chamber, and the state of dry for described default system pump valve is set to open safety;
Before the dry pump of the described system of use vacuumizes described transmission chamber, judge the state of the dry pump valve of described default system, opening the dry pump valve of described default system when the state of the dry pump valve of described default system is for opening safe uses the dry pump of described system to vacuumize described transmission chamber, otherwise keeps the dry pump valve of described default system to close.
6. ITO-PVD equipment according to claim 5 vacuumizes the method for control, it is characterized in that, thread interlocking is used to realize the mutual exclusion of the dry pump valve switch motion of described default system, make when the dry pump valve of described default system is when opening safe state, the action of closing the dry pump valve of described default system can not be performed before opening the dry pump valve of described default system.
7. ITO-PVD equipment according to claim 2 vacuumizes the method for control, it is characterized in that, described according to described first judged result, when described chamber configuration during cold pump, after then using the dry pump of system to be evacuated down to the first predetermined vacuum level, continue to use cold pump to vacuumize, comprise the following steps:
According to described first judged result, when described chamber configuration during cold pump, the dry pump of use system vacuumizes described chamber;
After the first predetermined vacuum level is evacuated down to described chamber, discharge the dry pump of described system;
Continue to use cold pump to vacuumize described chamber.
8. ITO-PVD equipment vacuumizes a system for control, it is characterized in that, comprises configuration module, acquiescence chamber control module, and vacuumizes control module, wherein:
Described configuration module, is system dry pump acquiescence chamber for the transmission chamber arranged in ITO-PVD equipment, and does not configure cold pump, configure cold pump to ITO processing chamber;
Described acquiescence chamber control module, for described acquiescence chamber, when the dry pump of the vacant described system of other chambers except described acquiescence chamber, the dry pump of described system continues to vacuumize described acquiescence chamber;
Describedly vacuumize control module, in processes process, when the chamber request in ITO-PVD equipment vacuumizes, carry out vacuumizing process according to the situation of the cold pump of described chamber configuration.
9. ITO-PVD equipment according to claim 8 vacuumizes the system of control, it is characterized in that, described in vacuumize control module and comprise judgement submodule, the first process submodule, the second process submodule, wherein:
Described judgement submodule, for judging asking the chamber vacuumized whether to be configured with cold pump, and obtains the first judged result;
Described first process submodule, for according to described first judged result, when described chamber configuration during cold pump, then, after using the dry pump of system to be evacuated down to the first predetermined vacuum level, continues to use cold pump to vacuumize;
Described second process submodule, for according to described first judged result, when described chamber does not configure cold pump, then uses the dry pump of system to vacuumize described chamber;
Described chamber comprises loading chamber, transmission chamber, preheating chamber, and processing chamber.
10. ITO-PVD equipment according to claim 8 vacuumizes the system of control, it is characterized in that, described acquiescence chamber control module comprises the first judgement submodule, second judges submodule, the first implementation sub-module, and the 3rd judges submodule, second implementation sub-module, 4th judges submodule, the 3rd implementation sub-module, wherein:
Described first judges submodule, during for discharging the dry pump of described system when the chamber request in ITO-PVD equipment, judges whether described chamber is that the dry pump of current system uses chamber, obtains the second judged result;
Described second judges submodule, for according to described second judged result, when described chamber is current system dry pump use chamber, judges whether the chamber waiting in line to use the dry pump of described system, obtains the 3rd judged result;
First implementation sub-module, for according to described 3rd judged result, when there being the chamber waiting in line to use the dry pump of described system, then first chamber distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system uses, and returns;
3rd judges submodule, for according to described 3rd judged result, when not waiting in line the chamber using the dry pump of described system, judging whether described chamber is described system dry pump acquiescence chamber, and obtaining the 4th judged result;
Second implementation sub-module, for according to described 4th judged result, when described chamber is not described system dry pump acquiescence chamber, then distributes to described transmission chamber and uses, and return by dry for described system pump; Otherwise directly return;
4th judges submodule, for according to described second judged result, when described chamber is not current system dry pump use chamber, judges whether described chamber is the chamber waiting in line to use the dry pump of described system, obtains the 5th judged result;
3rd implementation sub-module, for according to described 5th judged result, when described chamber is the chamber waiting in line to use the dry pump of described system, then by described chamber from described wait in line to use the queue of the dry pump of described system delete, and to return; Otherwise directly return.
11. ITO-PVD equipment according to claim 10 vacuumize the system of control, and it is characterized in that, the first implementation sub-module comprises valve closes unit, time control unit, the dry pump allocation units of system, wherein:
Described valve control unit, for closing the valve of the dry pump of all described systems and chamber;
Described time control unit, for waiting for Preset Time;
The dry pump allocation units of described system, use for first chamber distributed to by dry for described system pump in the chamber queue waiting in line to use the dry pump of described system, and return.
12. ITO-PVD equipment according to claim 8 vacuumize the system of control, it is characterized in that, also wrap the first state setting module, the second state setting module, and valve control module, wherein:
Described first state setting module, before transmitting material at described transmission chamber in described processing chamber, close the dry pump valve of default system between the dry pump of described system and described transmission chamber, and the state of dry for described default system pump valve is set to open danger;
Described second state setting module, after completing at described transmission chamber and transmitting material in described processing chamber, open the dry pump valve of default system between the dry pump of described system and described transmission chamber, and the state of dry for described default system pump valve is set to open safety;
Described valve control module, before described transmission chamber being vacuumized at the dry pump of the described system of use, judge the state of the dry pump valve of described default system, opening the dry pump valve of described default system when the state of the dry pump valve of described default system is for opening safe uses the dry pump of described system to vacuumize described transmission chamber, otherwise keeps the dry pump valve of described default system to close.
13. ITO-PVD equipment according to claim 12 vacuumize the system of control, it is characterized in that, thread interlocking is used to realize the mutual exclusion of the dry pump valve switch motion of described default system, make when the dry pump valve of described default system is when opening safe state, the action of closing the dry pump valve of described default system can not be performed before opening the dry pump valve of described default system.
14. ITO-PVD equipment according to claim 9 vacuumize the system of control, it is characterized in that, described first process submodule, comprises the dry pump actuator unit of system, the dry pump releasing unit of system, cold pump actuator unit, wherein:
The dry pump actuator unit of described system, for according to described first judged result, when described chamber configuration during cold pump, the dry pump of use system vacuumizes described chamber;
The dry pump releasing unit of system, for after being evacuated down to the first predetermined vacuum level to described chamber, discharges the dry pump of described system;
Described cold pump actuator unit, uses cold pump to vacuumize described chamber for continuing.
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| CN104746033B (en) | 2017-02-08 |
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