CN104744648B - Method for preparing double-stimulation responsive surface through secondary photopolymerization - Google Patents
Method for preparing double-stimulation responsive surface through secondary photopolymerization Download PDFInfo
- Publication number
- CN104744648B CN104744648B CN201510024551.6A CN201510024551A CN104744648B CN 104744648 B CN104744648 B CN 104744648B CN 201510024551 A CN201510024551 A CN 201510024551A CN 104744648 B CN104744648 B CN 104744648B
- Authority
- CN
- China
- Prior art keywords
- photopolymerization
- responsive
- ethanol
- light
- monomer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 26
- 239000000463 material Substances 0.000 claims abstract description 24
- 238000006243 chemical reaction Methods 0.000 claims abstract description 22
- 150000001875 compounds Chemical class 0.000 claims abstract description 17
- 239000003999 initiator Substances 0.000 claims abstract description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 70
- 230000004044 response Effects 0.000 claims description 42
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 40
- CSCPPACGZOOCGX-UHFFFAOYSA-N acetone Substances CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 28
- 238000005286 illumination Methods 0.000 claims description 23
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 21
- 229910052757 nitrogen Inorganic materials 0.000 claims description 20
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 claims description 19
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 18
- 238000002604 ultrasonography Methods 0.000 claims description 16
- 239000000178 monomer Substances 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 13
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 12
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- 239000003431 cross linking reagent Substances 0.000 claims description 10
- 230000004936 stimulating effect Effects 0.000 claims description 10
- 238000007654 immersion Methods 0.000 claims description 9
- 229910052742 iron Inorganic materials 0.000 claims description 9
- 239000002904 solvent Substances 0.000 claims description 8
- 239000004743 Polypropylene Substances 0.000 claims description 7
- -1 methyl mercapto Chemical class 0.000 claims description 7
- 238000006116 polymerization reaction Methods 0.000 claims description 7
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 6
- 239000012965 benzophenone Substances 0.000 claims description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 5
- 229910052753 mercury Inorganic materials 0.000 claims description 5
- YIKSHDNOAYSSPX-UHFFFAOYSA-N 1-propan-2-ylthioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)C YIKSHDNOAYSSPX-UHFFFAOYSA-N 0.000 claims description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 230000003647 oxidation Effects 0.000 claims description 4
- 238000007254 oxidation reaction Methods 0.000 claims description 4
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 claims description 3
- 229920002799 BoPET Polymers 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 229920001155 polypropylene Polymers 0.000 claims description 3
- SIMFZBAGLIDEPJ-UHFFFAOYSA-N C1(=CC=CC=C1)CC(C)=O.C(C)OOOCC Chemical compound C1(=CC=CC=C1)CC(C)=O.C(C)OOOCC SIMFZBAGLIDEPJ-UHFFFAOYSA-N 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- 238000009472 formulation Methods 0.000 claims description 2
- LRPWSMQGXLANTG-UHFFFAOYSA-M iodogallium Chemical compound I[Ga] LRPWSMQGXLANTG-UHFFFAOYSA-M 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 150000003512 tertiary amines Chemical class 0.000 claims description 2
- 229910052724 xenon Inorganic materials 0.000 claims description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims description 2
- NNNLYDWXTKOQQX-UHFFFAOYSA-N 1,1-di(prop-2-enoyloxy)propyl prop-2-enoate Chemical compound C=CC(=O)OC(CC)(OC(=O)C=C)OC(=O)C=C NNNLYDWXTKOQQX-UHFFFAOYSA-N 0.000 claims 2
- DFHHICWDTCBHEX-UHFFFAOYSA-N 2-ethoxycyclohexa-2,5-diene-1,4-dione Chemical compound CCOC1=CC(=O)C=CC1=O DFHHICWDTCBHEX-UHFFFAOYSA-N 0.000 claims 2
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims 2
- 150000008366 benzophenones Chemical class 0.000 claims 1
- 238000005336 cracking Methods 0.000 abstract description 5
- 230000004048 modification Effects 0.000 abstract description 5
- 238000012986 modification Methods 0.000 abstract description 5
- 229920000642 polymer Polymers 0.000 abstract description 5
- 238000013270 controlled release Methods 0.000 abstract description 2
- 230000000694 effects Effects 0.000 abstract description 2
- 239000000852 hydrogen donor Substances 0.000 abstract description 2
- 238000001179 sorption measurement Methods 0.000 abstract description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 1
- 239000001257 hydrogen Substances 0.000 abstract 1
- 230000004043 responsiveness Effects 0.000 abstract 1
- 230000002522 swelling effect Effects 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 description 16
- 230000008859 change Effects 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 238000012360 testing method Methods 0.000 description 10
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 8
- 239000007795 chemical reaction product Substances 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 229910000077 silane Inorganic materials 0.000 description 8
- YIYBRXKMQFDHSM-UHFFFAOYSA-N 2,2'-Dihydroxybenzophenone Chemical compound OC1=CC=CC=C1C(=O)C1=CC=CC=C1O YIYBRXKMQFDHSM-UHFFFAOYSA-N 0.000 description 7
- AIDLAEPHWROGFI-UHFFFAOYSA-N 2-methylbenzene-1,3-dicarboxylic acid Chemical class CC1=C(C(O)=O)C=CC=C1C(O)=O AIDLAEPHWROGFI-UHFFFAOYSA-N 0.000 description 7
- 239000008367 deionised water Substances 0.000 description 7
- 229910021641 deionized water Inorganic materials 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- IKRMLSLDSFGOQR-UHFFFAOYSA-N C1=CC=CC2=CC3=CC=CC=C3C=C12.C(C)(C)C1=CC=CC=2SC3=CC=CC=C3C(C12)=O Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C12.C(C)(C)C1=CC=CC=2SC3=CC=CC=C3C(C12)=O IKRMLSLDSFGOQR-UHFFFAOYSA-N 0.000 description 6
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 6
- 239000005357 flat glass Substances 0.000 description 6
- 150000002576 ketones Chemical class 0.000 description 6
- 238000002444 silanisation Methods 0.000 description 6
- 230000007613 environmental effect Effects 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 230000009977 dual effect Effects 0.000 description 4
- 238000010926 purge Methods 0.000 description 4
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 3
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 3
- 241000252506 Characiformes Species 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- 238000010560 atom transfer radical polymerization reaction Methods 0.000 description 3
- DMLAVOWQYNRWNQ-UHFFFAOYSA-N azobenzene Chemical compound C1=CC=CC=C1N=NC1=CC=CC=C1 DMLAVOWQYNRWNQ-UHFFFAOYSA-N 0.000 description 3
- 238000006356 dehydrogenation reaction Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 230000000640 hydroxylating effect Effects 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000002441 reversible effect Effects 0.000 description 3
- 239000001117 sulphuric acid Substances 0.000 description 3
- 235000011149 sulphuric acid Nutrition 0.000 description 3
- 230000008961 swelling Effects 0.000 description 3
- 239000004258 Ethoxyquin Substances 0.000 description 2
- DJOWTWWHMWQATC-KYHIUUMWSA-N Karpoxanthin Natural products CC(=C/C=C/C=C(C)/C=C/C=C(C)/C=C/C1(O)C(C)(C)CC(O)CC1(C)O)C=CC=C(/C)C=CC2=C(C)CC(O)CC2(C)C DJOWTWWHMWQATC-KYHIUUMWSA-N 0.000 description 2
- DECIPOUIJURFOJ-UHFFFAOYSA-N ethoxyquin Chemical compound N1C(C)(C)C=C(C)C2=CC(OCC)=CC=C21 DECIPOUIJURFOJ-UHFFFAOYSA-N 0.000 description 2
- 229940093500 ethoxyquin Drugs 0.000 description 2
- 235000019285 ethoxyquin Nutrition 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 230000000638 stimulation Effects 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- WWIGGKYCNZFUOA-UHFFFAOYSA-N C1(=CC=CC=C1)C1=C(CC(C(=O)C2=CC=C(C=C2)CC2=CC=CC=C2N2CCOCC2)(CC)N(C)C)C=CC=C1 Chemical compound C1(=CC=CC=C1)C1=C(CC(C(=O)C2=CC=C(C=C2)CC2=CC=CC=C2N2CCOCC2)(CC)N(C)C)C=CC=C1 WWIGGKYCNZFUOA-UHFFFAOYSA-N 0.000 description 1
- 241000122205 Chamaeleonidae Species 0.000 description 1
- 229920000858 Cyclodextrin Polymers 0.000 description 1
- 241001465754 Metazoa Species 0.000 description 1
- 230000010748 Photoabsorption Effects 0.000 description 1
- RMKZLFMHXZAGTM-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethyl prop-2-enoate Chemical compound CCC[Si](OC)(OC)OCOC(=O)C=C RMKZLFMHXZAGTM-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001253 acrylic acids Chemical class 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 238000007385 chemical modification Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000000707 layer-by-layer assembly Methods 0.000 description 1
- 239000004005 microsphere Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- VPKZYIQISRGLMK-UHFFFAOYSA-N prop-2-enoic acid;pyridine Chemical compound OC(=O)C=C.C1=CC=NC=C1 VPKZYIQISRGLMK-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007717 redox polymerization reaction Methods 0.000 description 1
- HFHDHCJBZVLPGP-UHFFFAOYSA-N schardinger α-dextrin Chemical compound O1C(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC(C(O)C2O)C(CO)OC2OC(C(C2O)O)C(CO)OC2OC2C(O)C(O)C1OC2CO HFHDHCJBZVLPGP-UHFFFAOYSA-N 0.000 description 1
- 238000001338 self-assembly Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
Abstract
The invention discloses a method for preparing double-stimulation responsive surface through secondary photopolymerization, relating to the field of grafting and modification of various base material surfaces. The method comprises the following steps: I, grafting pH responsive compound onto the surface by adopting a cracking type photoinitiator, wherein the pH responsive compound grafted onto the surface can be used as a hydrogen donor and a co-initiator of the next step reaction; and II, performing photopolymerization reaction on the basis by adopting a hydrogen abstracting type initiator, and grafting the double bond-modified photoresponse compound. The method not only has the advantage that the photopolymerization is efficient, energy-saving, economical, environment-friendly, and the like, but also the compound is difficult to drop after being grafted onto the surface through a covalent bond manner. The prepared intelligent surface has good photoresponsiveness, pH responsiveness, and the swelling property and wettability of the surface polymer can be reversibly controlled. The surface has potential application on the aspects of surface molecule switches, surface controlled release and ion adsorption due to good controllable wettability and mechanical effect.
Description
Technical field
The present invention relates to various substrate surface graft modifications, using different type light trigger by secondary photopolymerization side
Method prepares stimuli-responsive surface.
Background technology
There are some plant and animals that can be responded with environmental stimuluses in nature, such as Herba Mimosae Pudicae, Helianthi,
Chameleon etc..These vegeto-animal phenomenons are imitated, is found and is synthesized some stimulating responsive materials and cause the very big of scientist
Interest, these compounds can occur wettability in the case where extraneous environmental change such as temperature, pH, illumination, electric field, magnetic field etc. stimulate
The change of energy, volume, shape, mechanical performance etc..With the development of society, fully study and utilize these stimulating responsive chemical combination
Thing prepares intellectual material can increasingly by the common concern of people.Main research a few years ago is the property of compound itself
Matter, concentrates on solution and gel rubber system, has also been obtained widely in the surface of solids by being grafted stimulating responsive material in recent years
Research.
Build responsive intelligent surface by stimulating responsive compound being modified in various substrate surfaces be broadly divided into thing
Two kinds of logos and chemical method, in Physical, compound generally relies on non-covalent bond with surface and is combined, and surface compound easily comes off；
And chemical method such as spatial induction redox polymerization, atom transfer radical polymerization, LBL self-assembly etc. are with altogether by compound
Bond form is grafted on the surface, but most of method is more complicated, and time consumption and energy consumption.Such as Abdullah M.Alswieleh
Et al. pH responses compound be grafted on into silicon chip surface in atom transfer radical polymerization (ATRP) method make surface that there is pH
Response performance, course of reaction are complicated, and in reaction, transition metal complex is not easily purified causes polymer easily aging
(A.M.Alswieleh,N.Cheng,G.J.Leggett,Langmuir:the ACS journal of surfaces and
colloids,30(2014)1391-1400)；Yueguo Dong et al. employ light polymerization process in surface grafting temperature-responsive
Property compound N-N-isopropylacrylamide be prepared for temperature stimuli-responsive surface (Y.Dong, X.Zhu, F.Shi, J.Nie,
Applied Surface Science, 307 (2014) 7-12), although employ simple and quick surface photopolymerization reaction side
Method, but only single environment (temperature) response surface has been prepared using a type of light trigger.
We have now invented a kind of method that multiple stimulation response surface is prepared by secondary photopolymerization reaction.It is this
Method not merely with the efficient of photopolymerization, energy-conservation, economy, environmental protection, the advantages of, while according to different photopolymerization reaction mechanism,
Secondary photopolymerization is carried out using cracking type and the two distinct types of free radical photo-initiation of hydrogen-abstraction to change substrate surface
Property prepares dual reversible stimulating responsive surface.The first step makes surface grafting pH response chemical combination using cracking type initiator
Thing, this polymer can be used as the hydrogen donor of subsequent reactions and aided initiatings, and second step is using hydrogen-abstraction initiator in above base
The optical Response compound of photopolymerization reaction grafting double bond modification is carried out on plinth；This method is simple, and by compound
Surface is connected to covalently, it is difficult for drop-off.Prepared surface is existed due to its good Controllable Wettability energy, mechanical effect
There is potential application in terms of surface molecular switch, surface controlled release, ionic adsorption.
The content of the invention
It is an object of the invention to provide a kind of simple gentle secondary light polymerization process is prepared and is rung with dual reversible stimulation
Answer the surface of performance.
The present invention is using different photopolymerization reaction mechanism, using cracking type and the two distinct types of freedom of hydrogen-abstraction
Base light trigger prepares stimuli-responsive surface by the method for secondary photopolymerization.With prepare a kind of pH and light is dual can
As a example by inverse stimulating responsive surface, by secondary photopolymerization reaction by dimethylaminoethyl methacrylate and 2- methyl -4- idols
Pyridine acrylate is grafted on different substrate materials surface in the way of covalent bond.The method is comprised the following steps：
(1) the Photopolymer System solution of pH responses, is prepared, is coated onto on modified substrate surface, illumination certain hour makes which
Third contact of a total solar or lunar eclipse polyreaction, then by supersound process in the base material immersion ethanol of graft polymers, is dried up with nitrogen stand-by.This step light
According to during, spherical or striated photomask can be added to build pattern picture surface.
(2) the Photopolymer System solution of environmental stimuluses response, is prepared, on the substrate surface obtained in being coated in step (1),
Illumination certain hour brings it about second photopolymerization reaction, and the surface for obtaining supersound process in ethanol, nitrogen are dried up and obtained
End-product.
(3), in step (2), product does light and stimulating responsive test, swelling behavior test, wettability test.
The method that secondary photopolymerization reaction prepares stimuli-responsive surface, it is characterised in that comprise the following steps：
(1) the Photopolymer System solution of pH responses, is prepared, is coated onto on substrate surface, illumination 60-900s brings it about light and gathers
Reaction is closed, ultrasound 1-10min in this modified base material immersion ethanol is dried up with nitrogen stand-by；
(2) photo polymerization monomer of light or temperature environment stimulating responsive, the base material obtained in being coated in step (1), are prepared
On surface, illumination 60-900s brings it about secondary photopolymerization reaction, and then by this base material, ultrasound 1-10min is obtained in ethanol
End-product；
In step (1), the initiator of Photopolymer System adopts cracking type free radical photo-initiation, and in step (2), photopolymerization is anti-
Free radical photo-initiation should be adopted.
Further, various photomasks of different shapes are adopted in step (1) and (2) in this two steps photo-polymerization process.
Further, the base material described in step (1) and (2) is：Silicon chip, piezoid, sheet glass, iron plate, copper sheet, PET are thin
Film or polypropylene PP.
Further, the light source described in step (1) and (2) is：Mercury lamp, xenon lamp, UV-LED lamps, plate burning light or Iodine gallium light,
Light intensity 10-1000mW/cm2。
Further, it is characterised in that the Photopolymer System formula described in step (1)：
(1), monomer contains double bond for one end, and the other end contains the monomer of tertiary amine, and the mass fraction for accounting for system is 20%-
98%,
Formula is：
n≥1；R3=H or CH3；
R1、R2For following group：
1≤m≤10
(2), cross-linking agent is the third oxidation trimethylolpropane trimethacrylate, trimethylolpropane trimethacrylate, season penta
Tetrol triacrylate, ethoxyquin trimethylolpropane trimethacrylate, trimethylolpropane trimethacrylate, trihydroxy methyl third
One or more mixing in alkane trimethyl acrylic ester, accounts for system quality fraction for 1%-10%；
(3), initiator is crack type photoinitiator 2- -2 methyl isophthalic acids of hydroxyl-phenyl ketone (1173), 1- hydroxyls-cyclohexylbenzene
Ketone (184), 2- methyl -2- (4- morpholinyls) -1- [4- (methyl mercapto) phenyl] -1- acetone (907), 2- hydroxy-2-methyl -1-
To ethoxy ether phenylacetone (2959), 2- phenyl benzyl -2- dimethylamino -1- (4- morpholine benzyl phenyl) -1- butanone (369),
System quality fraction is accounted for for 0.1%-3%；
(4), remaining is solvent, and solvent is ethanol, acetone, toluene, the one kind in ethyl acetate.
Further, the system formulation described in step (2) in photopolymerization reaction is：
(1), monomer contains the light and temperature-responsive monomer of double bond for end group, and the mass fraction for accounting for system is 20%-
80%；Including optical Response monomer, formula is：
R4=H or CH3
R5For following group：
0≤m≤5；0≤p≤5
This monomer or temperature-responsive compound N-N-isopropylacrylamide；
(2), cross-linking agent is the third oxidation trimethylolpropane trimethacrylate, trimethylolpropane trimethacrylate, season penta
In tetrol triacrylate, ethoxyquin trimethylolpropane trimethacrylate, trimethylol-propane trimethacrylate one
Plant or several mixing, system quality fraction is accounted for for 0-10%；
(3), initiator is hydrogen-capture-type light initiator isopropyl thioxanthone (ITX), benzophenone (BP), 2-ethyl-anthraquinone
(2-EA) one or more mixing in, accounts for system quality fraction for 0.1%-3%；
(4), remaining is solvent, solvent be acetone, ethanol, dichloromethane, chloroform, toluene, in ethyl acetate one
Kind.
This preparation method of the present invention makes full use of its different type by means of the light polymerization process of efficient, energy-saving and environmental protection
The monomer of pH responses and optical Response is grafted on base material in the way of covalent bond by the different photopolymerization reaction mechanism of light trigger
On obtained dual reversible stimulating responsive surface, this surface features is as follows：
1st, whole process reaction condition is gentle, is swift in response, and is chemical modification, and polymer is in the way of covalent bond
Substrate surface is grafted on, surface grafting is firmly difficult for drop-off.
2nd, the substrate surface after graft modification shows good pH response performances, and moistening can occur under condition of different pH
Performance change and swelling behavior change.
3rd, the substrate surface after graft modification also shows good photo absorption property simultaneously, the diphenyl diimide chemical combination being grafted
Thing can occur good photo-isomerisable performance on surface.
Description of the drawings
Fig. 1. the surface photoresponse ultraviolet-visible spectrogram as prepared by embodiment 1.
Fig. 2. the swelling variation diagram of substrate surface polymer pH responses as prepared by embodiment 1.
Fig. 3. XPS analysis spectrogram of the surface as prepared by embodiment 2 under different pH.
Fig. 4. surface wettability of the surface as prepared by embodiment 2 under different illumination conditions and under certain ph solution
Can change.
Fig. 5. a series of contact angle change under different pH and illumination of the surface as prepared by embodiment 2.
Fig. 6. different illumination conditions surface contact angle is contrasted.
Surfaces of the Fig. 7 as prepared by embodiment 3 changes over surface contact angle change under different pH solution.
Specific embodiment
PH response compounds by taking dimethylaminoethyl methacrylate as an example, English name DMAEMA；
Photoresponse compound is named as MPA-Azo by taking 2- methyl -4- azo bezene acrylic acids as an example.
Embodiment 1：Piezoid surface is modified
(1), piezoid silanization:Piezoid is successively immersed in into supersound process 5 minutes in ethanol, acetone, deionized water,
Dried up with nitrogen, be put into " piranha " solution [concentrated sulphuric acid (98%wt.%) and hydrogen peroxide (30%wt.%) volume ratio 7:3] in
Heating 2 hours, then clean with a large amount of deionized water rinsings, nitrogen dries up stand-by, makes surface richness hydroxylating.Take 10mg γ-first
Base acryloxypropyl trimethoxy silane (γ-MPS) is added in 10mL toluene solutions, and hydroxylated piezoid is immersed
Wherein 12 hours, as hydrolytic condensation is acted on, piezoid surface can be grafted the silane coupler with double bond；Silane idol will be grafted with
The base material ethanol purge of connection agent, nitrogen dries up stand-by.
(2) Photopolymer System solution (DMAEMA-80wt.%, ethanol -16wt.%, the light trigger 2- of pH responses, are prepared
- 2 methyl isophthalic acids of hydroxyl-phenyl ketone -3wt.%, cross-linking agent trimethylolpropane trimethacrylate -1wt.%) it is coated onto silanised quartz
On piece, with UV-S1000 point source illumination 120s, light intensity 40mW/cm2, ultrasound 2 minutes in modified piezoid immersion ethanol,
Dried up with nitrogen stand-by.Spherical mask is added to build microsphere pattern picture surface in this step During Illumination.
(3) Photopolymer System solution (MPA-Azo-30wt.%, the light trigger isopropyl thioxanthone anthracene of optical Response, are prepared
Ketone -3wt.%, acetone -67wt.%), on the base material obtained in being coated in step (2), with ultraviolet curing lamp illumination 120s, light intensity
40mW/cm2, then ultrasound obtains end-product in 2 minutes in ethanol.
(4) optical Response test, is carried out to the product in step (3) and pH responses is tested.
Embodiment 2：Glass sheet surface is modified
(1), sheet glass silanization:Sheet glass is successively immersed in ethanol, acetone, deionized water and is cleaned by ultrasonic 5 minutes,
Dried up with nitrogen, be put into " piranha " solution [concentrated sulphuric acid (98%wt.%) and hydrogen peroxide (30%wt.%) volume ratio 7:3] in
Heating 2 hours, then clean with a large amount of deionized water rinsings, nitrogen dries up stand-by.Take 10mg γ-methacryloxypropyl
Trimethoxy silane (γ-MPS) is added in 10mL toluene solutions, hydroxylating sheet glass is immersed 12 hours, sheet glass
Silane coupler of the surface grafting with double bond；The sheet glass ethanol purge of silane coupler will be grafted with, nitrogen dries up stand-by.
(2) Photopolymer System solution (DMAEMA-80wt.%, ethanol the 9.9wt.% ,-light trigger of pH responses, are prepared
2- -2 methyl isophthalic acids of hydroxyl-phenyl ketone -0.1wt.%, cross-linking agent trimethylolpropane trimethacrylate -10wt.%) it is coated onto silane
Change on base material, with UV-LED illumination 300s, light intensity 40mW/cm2, in modified base material immersion ethanol, ultrasound 2 minutes, uses nitrogen
Dry up stand-by.
(3) Photopolymer System solution (MPA-Azo-30wt.%, the light trigger isopropyl thioxanthone anthracene of optical Response, are prepared
Ketone -0.1wt.%, acetone -69.9wt.%), on the base material obtained in being coated in step (2), with ultraviolet curing lamp illumination 300s, light
Strong 40mW/cm2, then ultrasound obtains end-product in 2 minutes in ethanol.
(4), above-mentioned product is carried out host and guest's identification reaction of diphenyl diimide and the beta-schardinger dextrin-of classics, study 365nm with
Under 450nm difference illumination due to cyclodextrin and surface diphenyl diimide cladding and come off and cause the change of surface wettability.
(5) optical Response test, is carried out to the product in step (3) and pH responses is tested.
Embodiment 3：Silicon chip surface is modified
(1), silicon chip surface silanization:Silicon chip is successively immersed in ethanol, acetone, deionized water and is cleaned by ultrasonic 5 minutes,
Dried up with nitrogen, be put into " piranha " solution [concentrated sulphuric acid (98%wt.%) and hydrogen peroxide (30%wt.%) volume ratio 7:3] in
Heating 4 hours, then clean with a large amount of deionized water rinsings, nitrogen dries up stand-by.Take 10mg γ-methacryloxypropyl
Trimethoxy silane (γ-MPS) is added in 10mL toluene solutions, hydroxylating silicon chip is immersed 12 hours, silicon chip surface
Silane coupler of the grafting with double bond；The silicon chip ethanol purge of silane coupler will be grafted with, nitrogen dries up stand-by.
(2) Photopolymer System solution (DMAEMA-20wt.%, ethanol the 74wt.% ,-light trigger 2- of pH responses, are prepared
- 2 methyl isophthalic acids of hydroxyl-phenyl ketone -3wt.%, cross-linking agent trimethylolpropane trimethacrylate -3wt.%) it is coated onto silanization silicon chip
On, with mercury lamp illumination 900s, light intensity 10mW/cm2, in modified base material immersion ethanol, ultrasound 2 minutes, is dried up with nitrogen and is treated
With.
(3) Photopolymer System solution (MPA-Azo-30wt.%, the light trigger isopropyl thioxanthone anthracene of optical Response, are prepared
Ketone -0.1wt.%, acetone -69.9wt.%), on the silicon chip surface obtained in being coated in step (2), use ultraviolet curing lamp illumination
900s, light intensity 10mW/cm2, then ultrasound obtains end-product in 2 minutes in ethanol.
(4) optical Response test and the test of pH responses, are carried out to product.
Embodiment 4：Iron plate surface is modified
(1), iron plate surface silanization：Iron plate is put in NaOH solution carries out cleaning by degreasing, and then deionized water surpasses
Sound is cleaned 5 minutes, is taken 10mg γ-methacryloxypropyl trimethoxy silane (γ-MPS) and is added to 10mL methanol solutions
In, it is 4 with second acid for adjusting pH, the iron plate after process is immersed 24 hours, iron plate surface grafting silane coupler, then
With ethanol purge, nitrogen dries up stand-by.
(2) Photopolymer System solution (DMAEMA-80wt.%, ethanol -17wt.%, the light trigger 2- of pH responses, are prepared
- 2 methyl isophthalic acids of hydroxyl-phenyl ketone -1wt.%, cross-linking agent trimethylolpropane trimethacrylate -2wt.%) it is coated onto silanization iron plate
On surface, with mercury lamp illumination 60s, light intensity 100mW/cm2, in modified base material immersion ethanol, ultrasound 2 minutes, is dried up with nitrogen
It is stand-by.
(3) Photopolymer System solution (MPA-Azo-30wt.%, the light trigger isopropyl thioxanthone anthracene of optical Response, are prepared
Ketone -1wt.%, acetone -69wt.%), on the iron plate surface obtained in being coated in step (2), with cure lamp illumination 60s, light intensity
100mW/cm2, then ultrasound obtains end-product in 2 minutes in ethanol.
(4) optical Response test, is carried out to the product in step (3) and pH responses is tested.
Embodiment 5：PET film surface is modified
(1) Photopolymer System solution (DMAEMA-80wt.%, ethanol -14wt.%, the light trigger 2- of pH responses, are prepared
- 2 methyl isophthalic acids of hydroxyl-phenyl ketone -1wt.%, cross-linking agent trimethylolpropane trimethacrylate -5wt.%) it is coated to PET film
On, with mercury lamp illumination 300s, light intensity 40mW/cm2, in modified thin film immersion ethanol, ultrasound 1 minute, is dried up with nitrogen and is treated
With.
(2) Photopolymer System solution (MPA-Azo-30wt.%, the light trigger isopropyl thioxanthone anthracene of optical Response, are prepared
Ketone -3wt.%, acetone -67wt.%), on the base material obtained in being coated in step (1), with cure lamp illumination 300s, light intensity 40mW/
cm2, then ultrasound obtains end-product in 1 minute in ethanol.
(3) optical Response test, is done to the product in step (2) and pH responses is tested.
Embodiment 6：Polypropylene PP surfaces are modified
(1) Photopolymer System solution (DMAEMA-80wt.%, ethanol 16.9wt.%, the light trigger of pH responses, are prepared
2- -2 methyl isophthalic acids of hydroxyl-phenyl ketone -0.1wt.%, cross-linking agent trimethylolpropane trimethacrylate -3wt.%) it is coated to PP pieces
On, 120s, light intensity 50mW/cm are shone with UV-LED light2, in modified base material immersion ethanol, ultrasound 1 minute, is dried up with nitrogen
It is stand-by.
(2) Photopolymer System solution (MPA-Azo-20wt.%, the light trigger isopropyl thioxanthone anthracene of optical Response, are prepared
Ketone -0.1wt.%, acetone -79.9wt.%), on the base material obtained in being coated in step (1), with ultraviolet curing lamp illumination 120s, light
Strong 50mW/cm2, then ultrasound obtains end-product in 1 minute in ethanol.
(3) optical Response test, is done to the product in step (2) and pH responses is tested.
4,5,6 surveyed pH of embodiment changes similar with 3 result of embodiment with optical Response wettability, and contact angle size becomes
Change within 3 °.
Claims (4)
1. the method that two photopolymerization reactions prepare stimuli-responsive surface, it is characterised in that comprise the following steps：
(1) the Photopolymer System solution of pH responses, is prepared, is coated onto on substrate surface, it is anti-that illumination 60-900s brings it about photopolymerization
Should, ultrasound 1-10min in this modified base material immersion ethanol is dried up with nitrogen stand-by；
(2) photo polymerization monomer of light or temperature environment stimulating responsive, the substrate surface obtained in being coated in step (1), are prepared
On, illumination 60-900s brings it about secondary photopolymerization reaction, and then by this base material, ultrasound 1-10min obtains whole product in ethanol
Thing；
Photopolymer System formula described in step (1)：
(1), monomer contains double bond for one end, and the other end contains the monomer of tertiary amine, and the mass fraction for accounting for system is 20%-98%,
Formula is：
n≥1；R3=H or CH3；
R1、R2For following group：
1≤m≤10
(2), cross-linking agent is the third oxidation trimethylolpropane trimethacrylate, pentaerythritol triacrylate, three hydroxyl first of ethoxyquin
One kind in base propane triacrylate, trimethylolpropane trimethacrylate, trimethylol-propane trimethacrylate or
Various mixing, account for system quality fraction for 1%-10%；
(3), initiator is crack type photoinitiator 1- hydroxy-cyciohexyl benzophenones (184), 2- methyl -2- (4- morpholinyls) -1-
[4- (methyl mercapto) phenyl] -1- acetone (907), 2- hydroxy-2-methyl -1- are to ethoxy ether phenylacetone (2959), 2- benzene
Base benzyl -2- dimethylamino -1- (4- morpholine benzyl phenyl) -1- butanone (369), accounts for system quality fraction for 0.1%-3%；
(4), remaining is solvent, and solvent is ethanol, acetone, toluene, the one kind in ethyl acetate；
System formulation described in step (2) in photopolymerization reaction is：
(1), monomer contains the light and temperature-responsive monomer of double bond for end group, and the mass fraction for accounting for system is 20%-80%；It is logical
Formula is：
R4=H or CH3
R5For following group：
0≤m≤5；0≤p≤5
This monomer or temperature-responsive compound N-N-isopropylacrylamide；
(2), cross-linking agent is the third oxidation trimethylolpropane trimethacrylate, pentaerythritol triacrylate, three hydroxyl first of ethoxyquin
One or several mixing in base propane triacrylate, trimethylol-propane trimethacrylate, account for system quality point
Number is 0-10%；
(3), initiator is hydrogen-capture-type light initiator isopropyl thioxanthone (ITX), benzophenone (BP), 2-ethyl-anthraquinone (2-
EA one or more mixing in), accounts for system quality fraction for 0.1%-3%；
(4), remaining is solvent, and solvent is acetone, ethanol, dichloromethane, chloroform, toluene, the one kind in ethyl acetate.
2. method according to claim 1, it is characterised in that using various in this two steps photo-polymerization process in step (1) and (2)
Photomask of different shapes.
3. method according to claim 1, it is characterised in that the base material described in step (1) and (2) is：Silicon chip, piezoid, glass
Glass piece, iron plate, copper sheet, PET film or polypropylene PP.
4. method according to claim 1, it is characterised in that the light source described in step (1) and (2) is：Mercury lamp, xenon lamp, UV-
LED or Iodine gallium light, light intensity 10-1000mW/cm2。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510024551.6A CN104744648B (en) | 2015-01-18 | 2015-01-18 | Method for preparing double-stimulation responsive surface through secondary photopolymerization |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510024551.6A CN104744648B (en) | 2015-01-18 | 2015-01-18 | Method for preparing double-stimulation responsive surface through secondary photopolymerization |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104744648A CN104744648A (en) | 2015-07-01 |
| CN104744648B true CN104744648B (en) | 2017-04-12 |
Family
ID=53584962
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510024551.6A Expired - Fee Related CN104744648B (en) | 2015-01-18 | 2015-01-18 | Method for preparing double-stimulation responsive surface through secondary photopolymerization |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104744648B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109786552B (en) | 2019-01-22 | 2020-10-16 | 合肥京东方光电科技有限公司 | Organic thin film, manufacturing method thereof, display device and optical device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102249733A (en) * | 2011-04-20 | 2011-11-23 | 上海交通大学 | Sulfur-alkene click chemistry-based method for preparing stimulation responsive polyether amine macromolecular brush |
| CN102875195A (en) * | 2012-09-20 | 2013-01-16 | 华东理工大学 | Method for preparing polymer brush films with multiple stimulation responses |
-
2015
- 2015-01-18 CN CN201510024551.6A patent/CN104744648B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102249733A (en) * | 2011-04-20 | 2011-11-23 | 上海交通大学 | Sulfur-alkene click chemistry-based method for preparing stimulation responsive polyether amine macromolecular brush |
| CN102875195A (en) * | 2012-09-20 | 2013-01-16 | 华东理工大学 | Method for preparing polymer brush films with multiple stimulation responses |
Non-Patent Citations (2)
| Title |
|---|
| A Novel pH/Light-Triggered Surface for DNA Adsorption and Release;Prof.Gokcen Birlik Demirel;《ChemPhysChem》;20140606;第15卷(第8期);第1693-1699页 * |
| Surface photo-anchored PNIPAM crosslinked membrane on glass substrate by covalent bonds;YueGuo Dong等;《Applied Surface Science》;20140715;第307卷;第7-12页 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104744648A (en) | 2015-07-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Christensen et al. | Gelation of copolymers with pendent benzophenone photo-cross-linkers | |
| CN101560061B (en) | Method for preparing patterned polymer brush | |
| CN102592964B (en) | Method for transferring graphene film to substrate | |
| JP6202621B2 (en) | Cell culture substrate and method for producing the same | |
| CN104086088B (en) | A kind of photopolymerization preparation has the method for the glass of antibacterial surface performance | |
| JP2004199073A5 (en) | ||
| JP4963781B2 (en) | Method for producing polysilsesquioxane graft copolymer, pressure-sensitive adhesive, and pressure-sensitive adhesive sheet | |
| CN105175637A (en) | Modified cellulose nanometer crystal and preparation method thereof | |
| CN104016595A (en) | Method of preparing glass with surface solvent response property by photopolymerization | |
| JP2012079782A (en) | Photosensitive resin composition for uv nanoimprint, method for manufacturing resist substrate using the photosensitive resin composition, and method for manufacturing copying template | |
| CN104744648B (en) | Method for preparing double-stimulation responsive surface through secondary photopolymerization | |
| Xiong et al. | Phototriggered growth and detachment of polymer brushes with wavelength selectivity | |
| CN101560062B (en) | Method for preparing stimulating responsive polymer brush | |
| JP2007319942A (en) | Micropassage device | |
| CN106460178B (en) | Metallization of surfaces | |
| CN104716043B (en) | Graphene field effect transistor with flexible substrates and preparation method thereof | |
| CN110452406B (en) | Steam response intelligent thin film material, double-stimulation self-driven actuator and robot hand | |
| CN104003345B (en) | A kind of carrier with three-dimensional micro-nano structure surface and its preparation method and application | |
| CN115710457A (en) | Ultraviolet curing composition and preparation method and application thereof | |
| CN101276159B (en) | Apparatus and method of polymer photoresist ultrasonic ageing effect | |
| WO2021000851A1 (en) | Method for preparing patterned polymer | |
| JP2006316010A (en) | Substance-fixing agent, method for fixing substance and substrate for fixing substance | |
| CN110372836B (en) | Vinyl sulfone surface initiated aqueous phase anion polymerization method | |
| JP6725129B2 (en) | Nano-embossed structure, method for producing nano-embossed structure, and polymerizable material for producing nano-embossed structure | |
| CN107057556A (en) | Ultraviolet light UV feel elastomeric paints |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170412 |