CN104635430A - Method and apparatus for improving image quality of machine vision system - Google Patents
Method and apparatus for improving image quality of machine vision system Download PDFInfo
- Publication number
- CN104635430A CN104635430A CN201310563605.7A CN201310563605A CN104635430A CN 104635430 A CN104635430 A CN 104635430A CN 201310563605 A CN201310563605 A CN 201310563605A CN 104635430 A CN104635430 A CN 104635430A
- Authority
- CN
- China
- Prior art keywords
- image quality
- automated inspection
- vision builder
- light
- machine vision
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
The invention provides a method for improving image quality of a machine vision system, which is characterized in that stray light is inhibited by using polarization characteristic of the illumination light beam. The invention also provides an apparatus for improving image quality of the machine vision system, which comprises a polarization testing apparatus positioned at front of the machine vision system. According to the invention, the image quality of the machine vision system can be improved according to the polarization characteristic of the illumination light beam, environment stray light can be inhibited, and image quality is increased.
Description
Technical field
The present invention relates to technical field of manufacturing semiconductors, especially, relate to a kind of method improving Vision Builder for Automated Inspection image quality in etching system.
Background technology
Vision Builder for Automated Inspection (MVS, Machine Vision System), as the sensor aimed at or monitor, is widely used in field of lithography.Vision Builder for Automated Inspection is generally used for the mark on alignment mask and silicon chip, is used for the coordinate system relation determined between mask and silicon chip, thus exposure system can the circuitous pattern Correct exposure on mask on the requirement position of silicon chip.Positioning precision between the Accuracy mask of Vision Builder for Automated Inspection and silicon chip, and finally affect circuitous pattern and can be exposed on tram on silicon chip.The precision of Vision Builder for Automated Inspection is decided by its image quality, and affect image quality because have many aspects, comprise Vision Builder for Automated Inspection MVS(Machine Vision System) whether in position of focal plane, the defect of MVS self photosensitive unit, the intensity of illuminating bundle and angle etc.
The factor affecting Vision Builder for Automated Inspection performance is a lot, wherein affect the larger parasitic light had from surrounding environment, even locally can flood the useful signal that Vision Builder for Automated Inspection receives when these parasitic lights are stronger, cause Vision Builder for Automated Inspection image quality poor, cause feature pattern to be lost.
The core of the Vision Builder for Automated Inspection of current widespread use is CCD(Charge Coupled Device, charge-coupled device (CCD)), CCD comprises many photosensitive units, these photosensitive units are converted into electric current the optical radiation received, the light intensity that on the irradiation face of whole CCD, each photosensitive unit receives differs, final formation comparison of light and shade image.Due to the existence of environment parasitic light, the imaging of CCD can be fuzzy.
Polarisation of light characteristic is used to suppress the method for parasitic light to be more applied to field of optical equipment, but report not relevant before this and patent in machine vision in Vision Builder for Automated Inspection particularly etching system.
Summary of the invention
The object of the invention is to propose a kind of method and the device thereof that improve aligning Vision Builder for Automated Inspection image quality, the method improves the image quality of aiming at Vision Builder for Automated Inspection according to the polarization state characteristic of illuminating bundle, suppress environment parasitic light, improves image quality.
The present invention proposes a kind of method improving Vision Builder for Automated Inspection image quality, it is characterized in that: use the polarization characteristic of illuminating bundle to suppress parasitic light.
Further, before light enters Vision Builder for Automated Inspection, Calibrator is added.
Further, after light source, deflection device has been added.
The present invention also proposes a kind of device improving Vision Builder for Automated Inspection image quality, it is characterized in that: also comprise Calibrator, before being positioned at Vision Builder for Automated Inspection.
Further, also comprise deflection device, after being positioned at light-source system.
The present invention improves the image quality of aiming at Vision Builder for Automated Inspection according to the polarization state characteristic of illuminating bundle, suppress environment parasitic light, improves image quality.
Accompanying drawing explanation
Can be further understood by following detailed Description Of The Invention and institute's accompanying drawings about the advantages and spirit of the present invention.
Fig. 1 is for aiming at Vision Builder for Automated Inspection structural representation;
Fig. 2 is Vision Builder for Automated Inspection structural representation of the present invention;
Fig. 3 is the structural representation of another embodiment of Vision Builder for Automated Inspection of the present invention.
Embodiment
Specific embodiments of the invention are described in detail below in conjunction with accompanying drawing.
Aim at Vision Builder for Automated Inspection structure as shown in Figure 1, the light beam that lighting source 1 sends is imaging thing 2(can be silicon chip, mask, substrate in a lithography system, it comprises the signature for aiming at) illumination is provided, the reflected light of imaging thing 2 enters Vision Builder for Automated Inspection 5 imaging through light path 3.In above-mentioned light path, there is the parasitic light comprising surround lighting, these light beams also can enter Vision Builder for Automated Inspection, reduce the signal to noise ratio (S/N ratio) of the signal entering CCD, cause lower image quality, and affect alignment precision.
The present invention proposes a kind of method, can reduce the intensity of the parasitic light being irradiated to CCD, thus improves image quality.As shown in Figure 2, before the entrance pupil of Vision Builder for Automated Inspection 5, add Calibrator 4, this Calibrator 4 makes the light consistent with analyzing direction pass through, and suppresses and the inconsistent parasitic light in analyzing direction.Meanwhile, above-mentioned Calibrator 4 also inhibits illuminating bundle.
Generally, parasitic light and efficient beam can not be all nonpolarized lights completely, and even illuminating bundle is exactly linearly polarized light, and now their polarization direction has an angle.The polarization direction of careful adjustment Calibrator, then can find an angle, suppresses parasitic light maximum in this angle, and suppress illuminating bundle less or do not suppress, thus improve signal to noise ratio (S/N ratio), improves image quality.
In another embodiment of the present invention, as shown in Figure 3, between light source 1 and imaging thing 2, increased deflection device 6, played deflection device 6 and illuminating bundle is become polarized light; Add Calibrator 4 in the folded light beam of imaging thing 2 light path incided before Vision Builder for Automated Inspection 5, this Calibrator 4 can by the polarization direction light consistent with analyzing direction, suppresses and parasitic light that analyzing direction is inconsistent.The polarization direction of careful adjustment Calibrator, then can find an angle, not suppress illuminating bundle in this angle, and the suppressed half of parasitic light, thus improve signal to noise ratio (S/N ratio), improve image quality.
Just preferred embodiment of the present invention described in this instructions, above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (5)
1. improve a method for Vision Builder for Automated Inspection image quality, it is characterized in that: use the polarization characteristic of illuminating bundle to suppress parasitic light.
2. improve the method for Vision Builder for Automated Inspection image quality as claimed in claim 1, it is characterized in that: before light enters Vision Builder for Automated Inspection, add Calibrator.
3. improve the method for Vision Builder for Automated Inspection image quality as claimed in claim 1, it is characterized in that: after light source, added deflection device.
4. improve a device for Vision Builder for Automated Inspection image quality, it is characterized in that: also comprise Calibrator, before being positioned at Vision Builder for Automated Inspection.
5. improve the device of Vision Builder for Automated Inspection image quality as claimed in claim 4, it is characterized in that: also comprised deflection device, after being positioned at light-source system.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310563605.7A CN104635430A (en) | 2013-11-14 | 2013-11-14 | Method and apparatus for improving image quality of machine vision system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310563605.7A CN104635430A (en) | 2013-11-14 | 2013-11-14 | Method and apparatus for improving image quality of machine vision system |
Publications (1)
Publication Number | Publication Date |
---|---|
CN104635430A true CN104635430A (en) | 2015-05-20 |
Family
ID=53214340
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310563605.7A Pending CN104635430A (en) | 2013-11-14 | 2013-11-14 | Method and apparatus for improving image quality of machine vision system |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN104635430A (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001322177A (en) * | 2000-05-17 | 2001-11-20 | Minolta Co Ltd | Method and apparatus for three-dimensional modeling |
US20030127436A1 (en) * | 2001-07-31 | 2003-07-10 | 3D Systems, Inc. | Selective laser sintering with optimized raster scan direction |
CN101078636A (en) * | 2007-06-28 | 2007-11-28 | 中国科学院光电技术研究所 | Hartmann wavefront sensor capable of eliminating self-stray light of system |
CN201141832Y (en) * | 2007-12-14 | 2008-10-29 | 西北工业大学 | Microfluid temperature field measuring apparatus |
CN102679907A (en) * | 2012-06-01 | 2012-09-19 | 哈尔滨工业大学深圳研究生院 | High-precision differential interference measuring system and method based on LED light source |
-
2013
- 2013-11-14 CN CN201310563605.7A patent/CN104635430A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001322177A (en) * | 2000-05-17 | 2001-11-20 | Minolta Co Ltd | Method and apparatus for three-dimensional modeling |
US20030127436A1 (en) * | 2001-07-31 | 2003-07-10 | 3D Systems, Inc. | Selective laser sintering with optimized raster scan direction |
CN101078636A (en) * | 2007-06-28 | 2007-11-28 | 中国科学院光电技术研究所 | Hartmann wavefront sensor capable of eliminating self-stray light of system |
CN201141832Y (en) * | 2007-12-14 | 2008-10-29 | 西北工业大学 | Microfluid temperature field measuring apparatus |
CN102679907A (en) * | 2012-06-01 | 2012-09-19 | 哈尔滨工业大学深圳研究生院 | High-precision differential interference measuring system and method based on LED light source |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR102071942B1 (en) | Inspection method and inspection device | |
US8072592B2 (en) | Reticle defect inspection apparatus and reticle defect inspection method | |
US20150279024A1 (en) | Inspection method | |
CN103543609B (en) | For two mercury lamp splicing exposure systems of lithographic equipment | |
KR20160150018A (en) | Inspection apparatus and inspection method | |
JP2014174052A (en) | Defect inspection method and device using the same | |
WO2014073532A1 (en) | Method and device for detecting defects and method and device for observing defects | |
KR102190328B1 (en) | Coaxial mask alignment device, photolithographic apparatus and alignment method | |
JP2017090133A (en) | Inspection device and inspection method | |
TW201502499A (en) | Integrated multi-pass inspection | |
CN102095377A (en) | Line width measuring device | |
CN102207695A (en) | Alignment system and alignment method for photolithographic device | |
JP2023515488A (en) | Beam stabilization and fiducial correction method and apparatus for EUV inspection | |
US20230266682A1 (en) | Lithography system and method | |
CN104635430A (en) | Method and apparatus for improving image quality of machine vision system | |
JP2008249454A (en) | Illumination optical device and sample inspection device | |
JP3445047B2 (en) | Illumination device and observation device using the same | |
JP5278784B1 (en) | Pattern inspection apparatus, pattern inspection method, and pattern substrate manufacturing method | |
CN113655695B (en) | Composite photoetching alignment system and method based on medium microsphere super-resolution imaging | |
CN103163742B (en) | Lithographic equipment and photoetching method thereof | |
US20230306579A1 (en) | Registration metrology tool using darkfield and phase contrast imaging | |
TWI397716B (en) | Image detecting apparatus | |
JP6893842B2 (en) | Pattern inspection method and pattern inspection equipment | |
KR101374787B1 (en) | inspection apparatus for form of Laser beam | |
US9395266B2 (en) | On-tool wavefront aberrations measurement system and method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20150520 |