CN104611734A - Nano aluminium nitride composite chromium plating solution and electroplating method - Google Patents

Nano aluminium nitride composite chromium plating solution and electroplating method Download PDF

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CN104611734A
CN104611734A CN201310544143.4A CN201310544143A CN104611734A CN 104611734 A CN104611734 A CN 104611734A CN 201310544143 A CN201310544143 A CN 201310544143A CN 104611734 A CN104611734 A CN 104611734A
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aluminum nitride
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nano aluminum
nano
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曾雄燕
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Wuxi Xuejiang Environmental Engineering Equipment Co ltd
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Wuxi Xuejiang Environmental Engineering Equipment Co ltd
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/04Electroplating: Baths therefor from solutions of chromium
    • C25D3/06Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18Electroplating using modulated, pulsed or reversing current

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  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

The invention discloses a nano aluminium nitride composite chromium plating solution and an electroplating method. The nano aluminium nitride composite chromium plating solution comprises the following components by content: 150-210g/L chromic chloride hexahydrate, 120-140g/L citrate, 40-60g/L oxalate, 60-90g/L urea, 10-20g/L formic acid, 90-120g/L ammonium bromide, 4-8g/L nano aluminium nitride, 0.06-0.24g/L fatty alkyl alkyl methyl halide salt and 0.024-0.06g/L alkylbenzene sulfonate. The plating solution contains nano aluminium nitride, due to self rigidity of nano aluminium nitride, the hardness and wear resistance of a plating layer are increased; on one hand, permeation of a corrosion solution can be prevented by filling the aperture of a plating layer and winding the metal crystal grain surface by nano aluminium nitride, on the other hand, a minisize primary battery is formed by nano aluminium nitride and the chromium metal microcrystal, passivation of chromium can be promoted, and corrosion resistance is increased.

Description

A kind of nano aluminum nitride compound chromium plating bath and electro-plating method
Technical field
The present invention relates to the technical field of electrodeposited chromium technique, particularly relate to a kind of nano aluminum nitride compound chromium plating bath and electro-plating method.
Background technology
Cr is micro-bluish silvery white metal, in atmosphere easily passivation, and surface is covered by layer oxide film, has good solidity to corrosion, very stable in an atmosphere, can keep its gloss for a long time; Highly stable in alkali, nitric acid, sulfide, carbonate solution and organic acid.Cr hardness is very large, and frictional coefficient is little, wear resistance, solidity to corrosion, good heat resistance.Cr coating has the advantages such as surface-brightening, hardness are high, corrosion-resistant, is a kind of well protection and decorative coating, is widely used for multiple field such as automobile, space flight.But Cr coating at relatively high temperatures can deliquescing, when 300 DEG C, hardness value starts to decline, and when 510 DEG C, coating has been in Full Annealing state; Meanwhile, Cr coating generally has tiny crack (thickness is greater than 0.7 μm), and these tiny cracks may fill up by adsorbate, thus reduces coating to the protective capability of matrix.
Aluminium nitride has high heat conductance, high electrical insulating properties, high strength, high rigidity, lower low thermal coefficient of expansion, nontoxic and good chemical stability and erosion resistance, and be easy to the physical and chemical performance of excellences such as processing, be widely used in the fields such as advanced ceramic, matrix material, electronic material.
Nano compound electroplating is in electroplate liquid, add non-water-soluble nano-solid particle, forms with metal ion codeposition the composite deposite be made up of with the nanoparticle being scattered in metallographic phase metallographic phase on base material.Because nano-composite plate is compared with single metal plating, also possess optical, electrical, magnetic, thermal characteristics that nano material is special, thus become the direction being devoted to always to explore the investigator of novel material exploitation.Current, this field also obtains certain achievement in research.
Existing nano compound electroplating mainly based on Ni-based plating, the nano material added with metal or nonmetal oxide in the majority, such as Al 2o 3, SiO 2.And the plating of chromium base is due to the restriction by many-sided technical factor, be difficult to realize nano compound electroplating.In order to make up the not high defect of chromium hardness, often in electroplate liquid, add alloyed metal element or non-metallic element, although improve the quality of coating to a certain extent, but still there is the technological deficiency that coating hardness is not high, rub resistance is inadequate, erosion resistance is undesirable, these seriously constrain Ni plating large-scale application industrially.
Summary of the invention
In view of this, one aspect of the present invention provides a kind of nano aluminum nitride electroplate liquid, and the coating hardness of this nano aluminum nitride electroplate liquid is large, rub resistance is strong, corrosion-resistant height.
A kind of nano aluminum nitride compound chromium plating bath, comprises six hydrated chromium trichlorides that content is 150 ~ 210g/L, fatty alkyl methyl halide salt that nano aluminum nitride that brometo de amonio that formic acid that urea that oxalate that Citrate trianion that content is 120 ~ 140g/L, content are 40 ~ 60g/L, content are 60 ~ 90g/L, content are 10 ~ 20g/L, content are 90 ~ 120g/L, content are 4 ~ 8g/L, content are 0.06 ~ 0.24g/L and content is the alkylbenzene sulfonate of 0.024 ~ 0.06g/L.
Wherein, comprise six hydrated chromium trichlorides that content is 180g/L, fatty alkyl many methyl halide salt that nano aluminum nitride that brometo de amonio that formic acid that urea that oxalate that Citrate trianion that content is 125g/L, content are 55g/L, content are 70g/L, content are 18g/L, content are 110g/L, content are 6g/L, content are 0.2g/L and content is the alkylbenzene sulfonate of 0.05g/L.
Wherein, the median size of described nano aluminum nitride is 20 ~ 50nm.
Wherein, fatty alkyl methyl halide salt is selected from one in hexadecyl trimethyl ammonium bromide, trimethyl amine bromide, lauryl dimethyl amine bromide or at least two kinds.
Wherein, described alkylbenzene sulfonate is selected from one in Sodium dodecylbenzene sulfonate, cetyl benzenesulfonic acid sodium, octadecyl benzenesulfonic acid sodium or at least two kinds.
In the technical scheme of above nano aluminum nitride compound chromium plating bath, the density of the nano aluminum nitride powder selected is 3.2 ~ 3.3g/cm3, is cubic crystal structure, and lattice parameter is 0.346 ~ 0.364, and median size is 45nm.Nano aluminum nitride is scattered in plating solution the effect having two aspects, on the one hand, nano aluminum nitride is evenly distributed between the grain and grain boundary of coating, reduces the pore dimension of coating and increases plated layer compact degree, prevents the micropore in corrosive fluid infiltration coating; Or be covered in grain surface so that corrosive medium and crystal grain are isolated by winding.On the other hand, the chemically reactive of nano aluminum nitride is very low, and now the current potential of nano aluminum nitride is corrected than chromium.After chromium and carbon contact, now chromium is as anode generation anodic polarization, may promote the passivating process of chromium, reduces chromium corrosion in media as well, layers of chrome is strengthened the provide protection of matrix metal.Thus, improve the erosion resistance of coating.
Compound selects Citrate trianion, oxalate and urea as coordination agent.Citrate trianion, oxalate lead to carboxyl all can with trivalent chromic ion coordination, urea is mainly through amino and trivalent chromic ion coordination, thus reducing trivalent chromic ion sedimentation potential, three kinds of coordination agents can produce the codeposition that stronger synergistic effect promotes trivalent chromic ion and bivalent nickel ion.The very strong trivalent chromic ion coordination of trivalent chromic ion coordination ability, almost can with the lewis' acid coordination of all Lewis bases.Before adding Citrate trianion, oxalate and urea, the water molecule coordination of trivalent chromic ion mainly and in plating solution forms hydroxyl bridge-type compound; After adding Citrate trianion, oxalate and urea, due to anion-permeable membrane reaction, trivalent chromic ion and carboxyl generation coordination thus by the coordination of replacing water and trivalent chromic ion to destroy hydroxyl bridge-type compound, thus reduce it to the inhibition of trivalent chromic ion in cathodic deposition.The anion binding penetrating power of Citrate trianion and oxalate is comparatively strong, when its concentration acquires a certain degree, can improve the thickness of coating.Urea can also improve the deposition potential of hydrogen, suppresses the water in trivalent chromic ion and solution and hydroxide radical to form Cr (OH) 3, avoid Cr (OH) 3with Cr (OH) 3between continue to coordinate and form light base bridge-type compound, and improve current efficiency, promote the deposition of trivalent chromic ion.
Select brometo de amonio to be conducting salt, ammonium radical ion wherein can improve current efficiency and stable plating solution and improve quality of coating; Bromide anion wherein can suppress the generation of hexavalent chromium and the precipitation of chlorine.The virose chlorine of tool that electroplating process Anodic is separated out not only pollutes the environment, and can increase coating internal stress and make it slowly to come off.The hexavalent chromium generated at anode in electroplating process can hinder the deposition of chromium simple substance, affects the quality of coating.
Formic acid both can be used as the catalyzer of trivalent chromic ion and complexing agent, can be used as again the pH of buffer reagent by its acid stable plating solution.When concentration is less, the effect of main performance buffer reagent; When concentration acquires a certain degree, the carboxyl contained by self and trivalent chromic ion and bivalent nickel ion, play the isosteric effect of association.
Select the main salt of chromium trichloride chromium the most.Compared to chromium sulphate, the solubleness of chromium trichloride is much bigger, after adding plating solution, better can go out trivalent chromic ion and coordination agent complexing by dissolving dissociation.
The present invention on the other hand provides a kind of electro-plating method, and the method can make that the coating hardness of nano aluminum nitride electroplate liquid is large, rub resistance is strong, corrosion-resistant height.
An above-mentioned nano aluminum nitride electroplate liquid electric plating method, comprises the following steps:
(1) electroplate liquid is prepared: in water, dissolve each feed composition form electroplate liquid, it is the alkylbenzene sulfonate of 0.024 ~ 0.06g that described often liter of electroplate liquid contains 150 ~ 210g six hydrated chromium trichloride, 120 ~ 140g Citrate trianion, 40 ~ 60g oxalate, 60 ~ 90g urea, 10 ~ 20g formic acid, 90 ~ 120g brometo de amonio, 4 ~ 8g nano aluminum nitride, 0.06 ~ 0.24g fatty alkyl methyl halide salt and content;
(2) using pretreated copper zine plate as negative electrode, using graphite as anode; Anode and negative electrode are inserted and passes into electric current in described electroplate liquid and electroplate.
Wherein, in water, dissolve each feed composition in described step (1) to be specially: first the powder of nano aluminum nitride is added in the water being dissolved with the halogenation of fatty alkyl methyl and alkylbenzene sulfonate, successively through low velocity shear dispersion and high speed shear dispersion i.e. obtained nano dispersion fluid; The described nano dispersion fluid of metering is added in the water being dissolved with six hydrated chromium trichlorides, Citrate trianion, oxalate, urea, formic acid, brometo de amonio and mixes the dispersion of rear employing ultrasonic wave.
Wherein, the rotating speed of described low velocity shear dispersion is 300 ~ 500rpm, and the time of low velocity shear dispersion is 5 ~ 10min; The rotating speed of high speed shear dispersion is 1500 ~ 2000rpm, and the time of high speed shear dispersion is 10 ~ 15min; Described ultrasonic wave dispersion power is 600 ~ 1000W, and the time of ultrasonic wave dispersion is 3 ~ 6min.
Wherein, described electric current is monopulse rectangular wave current; The pulsewidth of described monopulse rectangular wave current is 1 ~ 3ms, and dutycycle is 5 ~ 30%, and average current density is 4 ~ 8A/dm 2.
Wherein, in described step (2), the pH of electroplate liquid is 2.5 ~ 4, and the temperature of electroplate liquid is 25 ~ 50 DEG C, and the time of described plating is 50 ~ 120min.
In the technical scheme of above electro-plating method, monopulse rectangular wave current is defined as at t 1passing into current density in time is J pelectric current, at t 2without passing into electric current in time, it is a kind of intermittent pulse current.Dutycycle is defined as t 1/ (t 1+ t 2), frequency is 1/(t 1+ t 2), mean current is defined as J pt 1/ (t 1+ t 2).Compare with DC electrodeposition, thickness and the ion concentration distribution of electrostatic double layer all change; While adding electrochemical polarization, reduce concentration polarization, the direct effect of generation is, the coating that pulse plating obtains than DC electrodeposition coating evenly, crystallization is finer and closely woven.Moreover, pulse plating also has: hardness and the wear resistance of (1) coating are all high; (2) solution dispersibility and covering power good; (3) decrease the super plating of part edge, coating distributing homogeneity is good.
Preparing in nano dispersion fluid, low velocity shear dispersion makes the powder of nano aluminum nitride tentatively disperse to form larger particle, high speed shear dispersion makes the grain refine of the powder of nano aluminum nitride, and ultrasonic wave dispersion makes the abundant clad nano pipe of tensio-active agent energy to reach the effect being stable at and being scattered in water.
Pre-treatment comprises anticathode sand papering and subsequent oil removing.This use sand papering can polish twice, and first time with flint paper such as 200 object sand paperings, can be used fine sandpaper, such as, can use W28 abrasive paper for metallograph for the second time.This oil removing can adopt chemical alkali liquor oil removing, and chemical alkali lye can comprise 40 ~ 60g/LNaOH, 50 ~ 70g/LNa 3pO 4, 20 ~ 30g/L Na 2cO 3with 3.5 ~ 10g/L Na 2siO 3.This oil removing also can also comprise uses dehydrated alcohol oil removing.
In the present invention, stirring power reduces the increase that chromium ion concentration gradient near electrode surface, thickness of diffusion layer and a large amount of liberation of hydrogen cause cathodic area pH value, is conducive to the deposition of chromium; Can promote that again coating thickens the uniform composition with coating continuously; The bivalent chromium ion that the electrolysis initial stage can also be made to produce shifts out cathodic area rapidly, thus improves quality of coating.
Nano aluminum nitride compound chromium plating bath of the present invention, comprises six hydrated chromium trichlorides that content is 150 ~ 210g/L, fatty alkyl methyl halide salt that nano aluminum nitride that brometo de amonio that formic acid that urea that oxalate that Citrate trianion that content is 120 ~ 140g/L, content are 40 ~ 60g/L, content are 60 ~ 90g/L, content are 10 ~ 20g/L, content are 90 ~ 120g/L, content are 4 ~ 8g/L, content are 0.06 ~ 0.24g/L and content is the alkylbenzene sulfonate of 0.024 ~ 0.06g/L.Containing nano aluminum nitride in plating solution of the present invention, due to the rigidity of nano aluminum nitride self, improve hardness and the wear resistance of coating; The hole and winding of nano aluminum nitride on the one hand by filling coating are covered in chromium metal grain surface to stop the infiltration of corrosive fluid, on the other hand by forming miniature galvanic cell with chromium metal crystallites, promoting the passivation of chromium, which thereby enhancing erosion resistance.
Embodiment
Below in conjunction with embodiment, the present invention is described in further detail.
According to formulated electroplate liquid described in embodiment 1 ~ 6 and comparative example, be specially:
(1) preparation of nano dispersion fluid.Adopt self-control through the nano aluminum nitride of removal of impurities, the preparation method of nano aluminum nitride and the detailed process of removal of impurities for described in above, do not repeat them here.The halogenation of fatty alkyl methyl and alkylbenzene sulfonate are added after dissolving in there-necked flask with stirrer stirring at low speed several minutes.Then, to be transferred in large beaker and after GR-I type installing new capital, Chengdu Yong Tong machine works shears dispersion machine, the powder of nano aluminum nitride is added in there-necked flask, the rotating speed shearing dispersion machine is regulated to be 300 ~ 500rpm, shearing jitter time is adjusting rotary speed to 1500 ~ 2000rpm after 5 ~ 10min, and shearing jitter time is that namely 10 ~ 15min obtains nano slurry.The median size of Mastersizer2000 type laser particle size analyzer to nano dispersion fluid of Malvern company is adopted to test.
(2) quality of other feed composition is taken according to formula electronic balance.Dissolving this component raw material respectively by suitable quantity of water and mixed pours in beaker, adding nano dispersion fluid adopts the Xo-400SD type multi-frequency ultrasonic cell pulverization instrument of Nanjing Xian Ou instrument plant to carry out ultrasonic wave dispersion, setting power is 600 ~ 1000W, jitter time is 3 ~ 6min, then, add water move to pre-determined volume, add acid for adjusting pH to 2.5 ~ 4.
Formulated electroplate liquid described in embodiment 1 ~ 6 and comparative example is used to carry out electric plating method:
(1) negative electrode adopts the copper zine plate of 6mm × 6mm × 0.2mm.Metalluster is exposed with the polishing of W28 abrasive paper for metallograph to surface again after first tentatively being polished with 200 order waterproof abrasive papers by copper sheet.Successively through temperature be 50 ~ 70 DEG C chemical alkali liquor oil removing, distilled water flushing, 95% dehydrated alcohol oil removing, distilled water flushing.The formula of chemistry alkali lye is 40 ~ 60g/L NaOH, 50 ~ 70g/LNa 3pO 4, 20 ~ 30g/LNa 2cO 3with 3.5 ~ 10g/LNa 2siO 3.
(2) take diameter as the carbon-point of 5mm be anode, before plating, sand papering is level and smooth, deionized water rinsing and oven dry.
(3) by the electroplate liquid in pretreated anode and negative electrode immersion plating groove, bath temperature is regulated to make temperature of electroplating solution maintain 25 ~ 50 DEG C.Mechanical stirring rotating speed is adjusted to 200 ~ 400rpm.Make pulse power supply, the pulsewidth of pulsed current is 1 ~ 3ms, and dutycycle is 5 ~ 30%, and average current density is 4 ~ 8A/dm 2.After 50 ~ 120min to be energised, cut off the power supply of electroplanting device.Take out copper zine plate, use distilled water cleaning, drying.
Embodiment 1
The formula of nano aluminum nitride compound chromium plating bath is as follows:
In nano dispersion fluid preparation, the rotating speed of low velocity shear dispersion is 300rpm, and the time of low velocity shear dispersion is 5min; The rotating speed of high speed shear dispersion is 1500rpm, and the time of high speed shear dispersion is 10min; Described ultrasonic wave dispersion power is 600W, and the time of ultrasonic wave dispersion is 6min, and in obtained dispersion liquid, carbon nanometers in average diameter is 20nm; Plating technology condition: the pulsewidth of monopulse rectangular wave current is 1ms, and dutycycle is 30%, and average current density is 4A/dm 2; PH is 2.5, and temperature is 25 DEG C, and electroplating time is 120min.
Embodiment 2
The formula of nano aluminum nitride compound chromium plating bath is as follows:
In nano dispersion fluid preparation, the rotating speed of low velocity shear dispersion is 500rpm, and the time of low velocity shear dispersion is 10min; The rotating speed of high speed shear dispersion is 2000rpm, and the time of high speed shear dispersion is 15min; Described ultrasonic wave dispersion power is 1000W, and the time of ultrasonic wave dispersion is 3min, and in obtained dispersion liquid, carbon nanometers in average diameter is 30nm; Plating technology condition: the pulsewidth of monopulse rectangular wave current is 1ms, and dutycycle is 25%, and average current density is 5A/dm 2; PH is 3, and temperature is 30 DEG C, and electroplating time is 100min.
Embodiment 3
The formula of nano aluminum nitride compound chromium plating bath is as follows:
In nano dispersion fluid preparation, the rotating speed of low velocity shear dispersion is 400rpm, and the time of low velocity shear dispersion is 7min; The rotating speed of high speed shear dispersion is 1800rpm, and the time of high speed shear dispersion is 12min; Described ultrasonic wave dispersion power is 800W, and the time of ultrasonic wave dispersion is 4min, and in obtained dispersion liquid, carbon nanometers in average diameter is 35nm; Plating technology condition: the pulsewidth of monopulse rectangular wave current is 2ms, and dutycycle is 20%, and average current density is 6A/dm 2; PH is 3, and temperature is 35 DEG C, and electroplating time is 80min.
Embodiment 4
The formula of nano aluminum nitride compound chromium plating bath is as follows:
In nano dispersion fluid preparation, the rotating speed of low velocity shear dispersion is 350rpm, and the time of low velocity shear dispersion is 8min; The rotating speed of high speed shear dispersion is 1700rpm, and the time of high speed shear dispersion is 14min; Described ultrasonic wave dispersion power is 800W, and the time of ultrasonic wave dispersion is 4min, and in obtained dispersion liquid, carbon nanometers in average diameter is 38nm; Plating technology condition: the pulsewidth of monopulse rectangular wave current is 2ms, and dutycycle is 15%, and average current density is 7A/dm 2; PH is 3.5, and temperature is 40 DEG C, and electroplating time is 70min.
Embodiment 5
The formula of nano aluminum nitride compound chromium plating bath is as follows:
In nano dispersion fluid preparation, the rotating speed of low velocity shear dispersion is 420rpm, and the time of low velocity shear dispersion is 6min; The rotating speed of high speed shear dispersion is 1700rpm, and the time of high speed shear dispersion is 10min; Described ultrasonic wave dispersion power is 600W, and the time of ultrasonic wave dispersion is 4min, and in obtained dispersion liquid, carbon nanometers in average diameter is 50nm; Plating technology condition: the pulsewidth of monopulse rectangular wave current is 3ms, and dutycycle is 5%, and average current density is 8A/dm 2; PH is 4, and temperature is 50 DEG C, and electroplating time is 50min.
Embodiment 6
The formula of nano aluminum nitride compound chromium plating bath is as follows:
In nano dispersion fluid preparation, the rotating speed of low velocity shear dispersion is 450rpm, and the time of low velocity shear dispersion is 8min; The rotating speed of high speed shear dispersion is 2300rpm, and the time of high speed shear dispersion is 14min; Described ultrasonic wave dispersion power is 900W, and the time of ultrasonic wave dispersion is 5min, and in obtained dispersion liquid, carbon nanometers in average diameter is 41nm; Plating technology condition: the pulsewidth of monopulse rectangular wave current is 3ms, and dutycycle is 10%, and average current density is 7A/dm 2; PH is 3, and temperature is 35 DEG C, and electroplating time is 60min.
Comparative example:
Except not containing except nano aluminum nitride in plating solution, other condition is all identical with embodiment 6.
Dispersive ability test is carried out with reference to the plating solution of following methods to embodiment 1 ~ 6 and comparative example:
The dispersive ability of plating solution adopts far and near cathode method (Haring-Blue method) to measure.Measure groove and adopt Haring cell, interior dimensions is 150mm × 50mm × 70mm.Negative electrode selects thickness to be the copper sheet of 0.5mm, and working face is of a size of 50mm × 50mm; Anode is plating nickel plate with holes; Plating electric current 1A, electroplating time 30min.
The dispersive ability calculation formula of plating solution is:
Dispersive ability=[K-(the Δ M of plating solution 1/ Δ M 2)]/(K-1) (result represents with percentage);
In formula, K is negative electrode far away to the distance of anode and nearly negative electrode to the ratio of distances constant of anode, and in this test, K gets 2; Δ M 1for the increment (g) after plating on nearly negative electrode; Δ M 2for the increment (g) after plating on negative electrode far away.
Covering power test is carried out with reference to the plating solution of following methods to embodiment 1 ~ 6 and comparative example 1:
Endoporus method is adopted to measure.Negative electrode selects internal diameter l10mm, and pipe range is the copper pipe of 50mm, and one end is closed.During test, the distance of the mouth of pipe and anode is fixed on 80mm, test current 0.2A, electroplating time 30min.According to following formulae discovery:
Covering power=endoporus coating length/pipe range (result represents with percentage).
Current efficiency test is carried out with reference to the plating solution of following methods to embodiment 1 ~ 6 and comparative example:
Copper voltameter method is adopted to measure.Negative electrode to be tested and copper voltameter cleaned and dry up rear electronic scale weighing, then insert in electrodeposit groove by two negative electrodes simultaneously, be energized 10 ~ 30min, take out and clean dry up after use electronic scale weighing.According to following formulae discovery:
Current efficiency=(1.186 × cathode quality to be measured)/(electrochemical equivalent of copper voltameter quality × cathodic deposition metal to be measured) × 100%; In the embodiment of the present invention, cathodic deposition metal to be measured is Cr equivalent is 0.647g.A -1.h -1.
Test with reference to the Deposit appearance quality of following methods to embodiment 1 ~ 6 and comparative example:
Checked the visual appearance of electrolytic coating by visual method inspection coating surface defect, coating surface glossiness, observe coating surface (especially major surfaces) and whether there is all kinds of pin hole, pit, knurl, peeling, bubble, peel off, vaporific, burn, dendroid etc. judges whether coating surface defect exists.Apart from light source 15cm place under 11 watts of electricity-saving lamps, conversion coating sample different angles, observe the glossiness of evaluation coating sample, according to the result of coating surface reflection ray, contrast specular reflection, coating surface glossiness is divided into following 5 grade: A, bright in mirror surface: coating gloss, as minute surface, clearly can find out face and the eyebrow of people; B, accurate bright in mirror surface: coating surface is as the criterion face, the eyebrow of minute surface, the people that can break forth, but eyebrow part is not fully aware of; C, light: coating surface light, the face profile of the people that can break forth, but eyebrow obscure portions; D, half light: coating surface is brighter, only has shadow, but face profile is not fully aware of; E, brightless: coating surface bright property is poor, and coating reflective is poor, surface occurs without any shadow.
Hardness test is carried out with reference to the coating of following methods to embodiment 1 ~ 6 and comparative example:
Test material is 45# steel, is of a size of 40mm × 40mm × 1mm, should get up and down and the penetration hardness value of middle five points, then average during test.Vickers' hardness is the load according to unit impression pouch area bears, and namely stress value is as the measuring index of hardness value.Adopt Vickers hardness tester (load 25 ~ 10000g), its conical surface angle is the diamond four directions pyramid pressure head of 136 °, notes ensureing that pressure head compression distance should be less than 1/10th of surface layer thickness.Depth of cup angle value load should at about 3cm, load 25gf, keeps l5s to measure the hardness of coating.
Erosion resistance test is carried out with reference to the coating of following methods to embodiment 1 ~ 6 and comparative example:
Adopt complete immersion zero-G test method, nano aluminum nitride composite deposite sample immerse respectively 20% NaOH solution and 3.5% NaCl solution in, the corrosion experiment time length is respectively 240h and 340h, keep corrosive medium temperature to be 30 DEG C simultaneously, then the weightlessness after its corrosion is measured, try to achieve erosion rate.Before and after corrosion, sample is all through deionized water rinsing, EtOH Sonicate cleaning, vacuum-drying, four steps of weighing.Erosion rate is according to following formulae discovery:
Erosion rate=(before corrosion the rear quality of quality-corrosion)/(etching time × corrosion surface amasss).
Wearability test is carried out with reference to the coating of following methods to embodiment 1 ~ 6 and comparative example:
The SRV type wear testing machine that friction-wear test is produced in German OPTIMOL company carries out, and to the hardened steel ball of mill sample to be diameter the be chrome-bearing steel of 10mm, Rockwell hardness is 58 ~ 60, and steel ball surface roughness is less than 0.4um; Test atmosphere at room temperature environment, unlubricated, without abrasive material condition under carry out, hardened steel ball reciprocatingly slides in coated surface, and stroke is 2mm, and frequency is 30Hz, and load is 60N.After wearing test 30min, the volume that coated surface is worn measured by the Proscan2000 optical surface shape characteristic analyzer morphology analysis instrument adopting Scantron company of Britain to produce.
Porosity test is carried out with reference to the coating of following methods to embodiment 1 ~ 6 and comparative example:
The large young pathbreaker of porosity is directly connected to the corrosion resisting property of coating, adopts paster method to press GB5935-86 standard detection.The etchant solution that the potassium ferricyanide solution of 10g/L and the sodium chloride solution of 20g/L are tested as porosity.Operation steps is: after wiped clean of being deoiled by coating surface, is close to coating surface with the filter paper soaking into etchant solution, and the two can not have gap.Buy the fully wetting filter paper of etchant solution solution by glass stick or degreasing swab stick, supplement a solution at interval of 1min, taken off by filter paper after 5min, dry after clean with distilled water flushing, record hole is counted.Be placed on airing on cleaned glass plate, the number of number Bluepoint.Substitute into formulae discovery voidage below:
Number/tested area (individual/the cm of porosity=spot 2)
When calculating number of apertures, do following calculating by spot diameter size:
Hot spot diameter is less than 1mm, and often with a porosimeter; Be greater than 1mm and be less than 3mm often o'clock with three porosimeters; Be greater than 3mm and be less than 5mm, often with ten porosimeters.
Test with reference to the thickness of coating of following methods to embodiment 1 ~ 6 and comparative example:
Adopt weighting method.Be specially, plating piece is taken quality after the processes such as polishing, oil removing, washing, drying, then electroplate, after having electroplated, claim its quality again, then according to following formulae discovery: mean thickness=(quality before the quality after plating piece plating-plating piece plating)/(density of the surface-area × coated metal of coating institute cover part) of coating; The unit of surface-area is cm 2, mass unit is g, and the unit of the density of metallizing is g/ml.
Test with reference to the bonding force of following methods to the coating of embodiment 1 ~ 6 and comparative example:
The method adopting line to draw lattice measures the bonding force of coating, and being 30 degree with one cutting edge by electrodeposition cladding, converted steel draws parallel lines or the 1mm that 2mm of being separated by drawn by cutter 2square lattice.Whether the coating observing line tilts or peels off.Should master the dynamics during line, a cutter just can scratch coating, arrives matrix metal.
The test result of the coating of embodiment 1 ~ 6 and comparative example and the performance of plating solution is as follows:
As can be seen from the above table, after the hardness of the coating of embodiment 1 ~ 6,30min, abrasion loss and erosion rate are apparently higher than comparative example, illustrate that carbon nanometer enhances the hardness of coating, erosion resistance and wearability.The porosity of embodiment 1 ~ 6 is obviously better than comparative example, and this illustrates that nano aluminum nitride enhances the compactness that coating enhances coating, and this possibility indirect proof nano aluminum nitride is to the raising of nano-composite plate wear resistance.Consider from the integration test effect of plating solution and coating, the formula of embodiment 6 is screening formulation of the present invention.
It should be noted that and understand, when not departing from the spirit and scope of accompanying claim the present invention for required protection, various amendment and improvement can be made to the present invention of foregoing detailed description.Therefore, the scope of claimed technical scheme is not by the restriction of given any specific exemplary teachings.
Applicant states, the present invention illustrates detailed process equipment and process flow process of the present invention by above-described embodiment, but the present invention is not limited to above-mentioned detailed process equipment and process flow process, namely do not mean that the present invention must rely on above-mentioned detailed process equipment and process flow process and could implement.Person of ordinary skill in the field should understand, any improvement in the present invention, to equivalence replacement and the interpolation of ancillary component, the concrete way choice etc. of each raw material of product of the present invention, all drops within protection scope of the present invention and open scope.

Claims (10)

1. a nano aluminum nitride compound chromium plating bath, it is characterized in that, comprise six hydrated chromium trichlorides that content is 150 ~ 210g/L, fatty alkyl methyl halide salt that nano aluminum nitride that brometo de amonio that formic acid that urea that oxalate that Citrate trianion that content is 120 ~ 140g/L, content are 40 ~ 60g/L, content are 60 ~ 90g/L, content are 10 ~ 20g/L, content are 90 ~ 120g/L, content are 4 ~ 8g/L, content are 0.06 ~ 0.24g/L and content is the alkylbenzene sulfonate of 0.024 ~ 0.06g/L.
2. nano aluminum nitride compound chromium plating bath according to claim 1, it is characterized in that, comprise six hydrated chromium trichlorides that content is 180g/L, fatty alkyl many methyl halide salt that nano aluminum nitride that brometo de amonio that formic acid that urea that oxalate that Citrate trianion that content is 125g/L, content are 55g/L, content are 70g/L, content are 18g/L, content are 110g/L, content are 6g/L, content are 0.2g/L and content is the alkylbenzene sulfonate of 0.05g/L.
3. nano aluminum nitride compound chromium plating bath according to claim 1, is characterized in that, the median size of described nano aluminum nitride is 20 ~ 50nm.
4. nano aluminum nitride compound chromium plating bath according to claim 1, it is characterized in that, fatty alkyl methyl halide salt is selected from one in hexadecyl trimethyl ammonium bromide, trimethyl amine bromide, lauryl dimethyl amine bromide or at least two kinds.
5. nano aluminum nitride compound chromium plating bath according to claim 1, is characterized in that, described alkylbenzene sulfonate is selected from one in Sodium dodecylbenzene sulfonate, cetyl benzenesulfonic acid sodium, octadecyl benzenesulfonic acid sodium or at least two kinds.
6. use the nano aluminum nitride compound chromium plating bath electric plating method described in claim 1, it is characterized in that, comprise the following steps:
(1) electroplate liquid is prepared: in water, dissolve each feed composition form electroplate liquid, it is the alkylbenzene sulfonate of 0.024 ~ 0.06g that described often liter of electroplate liquid contains 150 ~ 210g six hydrated chromium trichloride, 120 ~ 140g Citrate trianion, 40 ~ 60g oxalate, 60 ~ 90g urea, 10 ~ 20g formic acid, 90 ~ 120g brometo de amonio, 4 ~ 8g nano aluminum nitride, 0.06 ~ 0.24g fatty alkyl methyl halide salt and content;
(2) using pretreated copper zine plate as negative electrode, using graphite as anode; Anode and negative electrode are inserted and passes into electric current in described electroplate liquid and electroplate.
7. method according to claim 6, it is characterized in that, in water, dissolve each feed composition in described step (1) to be specially: first the powder of nano aluminum nitride is added in the water being dissolved with the halogenation of fatty alkyl methyl and alkylbenzene sulfonate, successively through low velocity shear dispersion and high speed shear dispersion i.e. obtained nano dispersion fluid; The described nano dispersion fluid of metering is added in the water being dissolved with six hydrated chromium trichlorides, Citrate trianion, oxalate, urea, formic acid, brometo de amonio and mixes the dispersion of rear employing ultrasonic wave.
8. method according to claim 7, is characterized in that, the rotating speed of described low velocity shear dispersion is 300 ~ 500rpm, and the time of low velocity shear dispersion is 5 ~ 10min; The rotating speed of high speed shear dispersion is 1500 ~ 2000rpm, and the time of high speed shear dispersion is 10 ~ 15min; Described ultrasonic wave dispersion power is 600 ~ 1000W, and the time of ultrasonic wave dispersion is 3 ~ 6min.
9. method according to claim 6, is characterized in that, described electric current is monopulse rectangular wave current; The pulsewidth of described monopulse rectangular wave current is 1 ~ 3ms, and dutycycle is 5 ~ 30%, and average current density is 4 ~ 8A/dm 2.
10. method according to claim 6, is characterized in that, in described step (2), the pH of electroplate liquid is 2.5 ~ 4, and the temperature of electroplate liquid is 25 ~ 50 DEG C, and the time of described plating is 50 ~ 120min.
CN201310544143.4A 2013-11-05 2013-11-05 Nano aluminium nitride composite chromium plating solution and electroplating method Pending CN104611734A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
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CN105386089A (en) * 2015-12-25 2016-03-09 武汉迪赛环保新材料股份有限公司 Trivalent chromium hard chromium electroplating solution and application of trivalent chromium hard chromium electroplating solution in hard chromium electroplating
CN106167908A (en) * 2016-08-31 2016-11-30 苏州市相城区星火粉沫涂料厂 A kind of grill electric chrome solution and electrodeposited chromium method thereof
CN106245068A (en) * 2016-08-31 2016-12-21 苏州市相城区星火粉沫涂料厂 A kind of guard electric chrome solution and electrodeposited chromium method thereof
CN107460527A (en) * 2017-08-24 2017-12-12 成都圻坊生物科技有限公司 A kind of nano aluminum nitride composite plating solution and electro-plating method
CN109735891A (en) * 2018-12-13 2019-05-10 江苏师范大学 A method of for improving microparticle jetting electrodeposited composite coatings mechanical property
CN110424032A (en) * 2019-09-10 2019-11-08 江苏师范大学 A kind of jet stream electric deposition device and its method for principal axis of pressing machine reparation

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105386089A (en) * 2015-12-25 2016-03-09 武汉迪赛环保新材料股份有限公司 Trivalent chromium hard chromium electroplating solution and application of trivalent chromium hard chromium electroplating solution in hard chromium electroplating
CN106167908A (en) * 2016-08-31 2016-11-30 苏州市相城区星火粉沫涂料厂 A kind of grill electric chrome solution and electrodeposited chromium method thereof
CN106245068A (en) * 2016-08-31 2016-12-21 苏州市相城区星火粉沫涂料厂 A kind of guard electric chrome solution and electrodeposited chromium method thereof
CN107460527A (en) * 2017-08-24 2017-12-12 成都圻坊生物科技有限公司 A kind of nano aluminum nitride composite plating solution and electro-plating method
CN109735891A (en) * 2018-12-13 2019-05-10 江苏师范大学 A method of for improving microparticle jetting electrodeposited composite coatings mechanical property
CN110424032A (en) * 2019-09-10 2019-11-08 江苏师范大学 A kind of jet stream electric deposition device and its method for principal axis of pressing machine reparation

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