CN104589776B - A kind of photomask feeding machanism - Google Patents
A kind of photomask feeding machanism Download PDFInfo
- Publication number
- CN104589776B CN104589776B CN201410831731.0A CN201410831731A CN104589776B CN 104589776 B CN104589776 B CN 104589776B CN 201410831731 A CN201410831731 A CN 201410831731A CN 104589776 B CN104589776 B CN 104589776B
- Authority
- CN
- China
- Prior art keywords
- photomask
- base material
- coiler device
- stripping
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B38/00—Ancillary operations in connection with laminating processes
- B32B38/10—Removing layers, or parts of layers, mechanically or chemically
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses a kind of photomask feeding machanism, including frame, photomask coiler device, base material coiler device, film-removing device, diaphragm bearing platform；Film-removing device includes stripping upper plate and stripping lower plate, and the baseplane of stripping upper plate is parallel with the top plane of stripping lower plate and at intervals；Diaphragm bearing platform is positioned at the side of film-removing device, and the height of bearing platform is slightly less than the height of stripping lower plate top plane.In operation, photomask free end passes between stripping upper plate and stripping lower plate, the diaphragm of photomask free end is separated by operator with base material, diaphragm is across the bearing plate of stripping lower plate Yu diaphragm bearing platform, and base material is oliquely downward wound on base material coiler device by the gap of stripping lower plate and bearing plate, afterwards, photomask coiler device constantly inputs photomask to film-removing device, diaphragm is constantly peeled off from base material by film-removing device, diaphragm flows to diaphragm bearing platform, and base material is wound on base material coiler device.
Description
Technical field
The present invention relates to laminator, in particular to the photomask of a kind of backlight module laminator
Feeding machanism.
Background technology
The liquid crystal display that backlight is on mobile phone, MP4, GPS a kind of light source behind, it
Illumination effect will directly influence LCD MODULE visual effect.Liquid crystal display is not sent out itself
Light, its display figure or character are its results to light modulation.Current backlight module is mainly
The purpose for reaching the most even concentration of light is made with the collocation of diffusion barrier, bright enhancement film, photomask etc..Mesh
Before, typically utilize laminator to be attached on backlight module by the diaphragms such as diffusion barrier, bright enhancement film, photomask,
Laminator has generally comprised dust arrester, film sticking apparatus, apparatus for conveying articles, finished product shift-out mechanism,
Backlight module is placed on apparatus for conveying articles and is transferred into dedusting at dust arrester, is transmitted afterwards
Pad pasting to film sticking apparatus, is finally exported by finished product shift-out mechanism.
Above-mentioned diffusion barrier, bright enhancement film, photomask diaphragm do not use previous as be attached to one layer the thinnest
Base material on, time to be used, above-mentioned all kinds of diaphragms need to separate with base material.
In prior art, it is attached to backlight module for by diaphragms such as diffusion barrier, bright enhancement film, photomasks
On the achievement in research of film sticking apparatus rich, but, for providing various diaphragms (to expand to film sticking apparatus
Dissipate film, bright enhancement film, photomask) equipment or research but Liao Liao of mechanism, if with manual side
Formula to film sticking apparatus feed, not only inefficiency, and labor intensity is bigger.
Summary of the invention
Technical problem solved by the invention: backlight film sticking machine, pastes to it in manual mode
Film device provides photomask, and not only labor intensity is big, and inefficiency.
The present invention provides following technical scheme:
A kind of photomask feeding machanism, including frame, photomask coiler device, base material coiler device,
Film-removing device, diaphragm bearing platform；
Described photomask coiler device includes rotary shaft, winding assembly, described rotary shaft one end pivot joint
In frame, described winding assembly is fixed on the other end of rotary shaft, and described winding assembly is rolled up
Around photomask；
Described base material coiler device includes that rotary shaft, cylindrical wound part, described cylindrical wound part are fixed on
In rotary shaft, described rotary shaft passes cylindrical wound part, and one end of described rotary shaft is articulated in frame；
The rotary shaft of described photomask coiler device and the rotary shaft of base material coiler device are connected to electricity
Machine；
Described film-removing device includes support, stripping molectron, and described stripping molectron is rack-mount,
Described support is fixed in frame, and described stripping molectron includes stripping upper plate and stripping lower plate, described
Stripping upper plate and stripping lower plate are horizontally disposed with, and the baseplane of described stripping upper plate is put down with the top of stripping lower plate
Face is parallel and at intervals；
Described diaphragm bearing platform be positioned at film-removing device side and with film-removing device at a distance of the most certain away from
From, described diaphragm bearing platform includes that bearing plate, described bearing plate are horizontally disposed with, described bearing plate
Highly it is slightly less than the height of stripping lower plate top plane；
The rotary shaft of described photomask coiler device and the rotary shaft of base material coiler device are articulated in frame
In same upright side walls, the rotary shaft of described photomask coiler device and the rotary shaft of base material coiler device
Being parallel to each other, described photomask coiler device is positioned at the oblique upper of base material coiler device；Described stripping fills
Setting in the side of photomask coiler device and distance away, described base material coiler device is positioned at
The lower section of centre between film-removing device and photomask coiler device, described stripping upper plate and stripping lower plate
All parallel with the rotary shaft of the rotary shaft of photomask coiler device and base material coiler device.
By technique scheme, the photomask being attached on base material is wound on the volume of photomask coiler device
In molectron, photomask free end is after the stripping of film-removing device, and its base material is wound to base material volume
On winding apparatus, its diaphragm flows to diaphragm bearing platform.Wherein, the stripping principle of film-removing device is as follows:
Photomask free end passes between stripping upper plate and stripping lower plate, and operator are by photomask free end
Diaphragm separate with base material, diaphragm is across the bearing plate of stripping lower plate Yu diaphragm bearing platform, and base material
Oliquely downward it is wound on base material coiler device by the gap of stripping lower plate and bearing plate, afterwards, hides
Light film roll winding apparatus constantly to film-removing device input photomask, film-removing device constantly by diaphragm from base material
Upper stripping, diaphragm flows to diaphragm bearing platform, and base material is wound on base material coiler device.
By technique scheme, motor drives rotary shaft and the base material winding dress of photomask coiler device
The rotary shaft put rotates, and makes photomask feeding machanism of the present invention continuously to film sticking apparatus
Thering is provided the shading diaphragm separated with base material, the labor intensity not only alleviating operator is big, Er Qiegong
It is improved as efficiency.
As a modification of the present invention, described photomask feeding machanism also includes transferring device, described
Transferring device is arranged in frame, described transferring device between film-removing device and base material coiler device,
Before base material is wound by base material coiler device, described base material flows through transferring device；Described transfer
Device also includes that rotating roller, adjusting means, motor, described rotating roller are connected with motor, described regulation
Device includes regulation wheel, regulation molectron, and described regulation wheel is positioned at the side of rotating roller, described regulation
Wheel centrage and rotating roller centerline parallel, described regulation molectron can be between regulation wheel and rotating roller
Away from being adjusted, described base material flows through rotating roller and regulation wheel outer round surface.Along with photomask winding dress
Put the minimizing of photomask quantity, the increase of base material quantity on base material coiler device, wind at photomask
The motor of device and the motor speed of base material coiler device constant in the case of, photomask coiler device to
Speed between linear velocity and the linear velocity of base material coiler device winding base material of film-removing device conveying photomask
Degree difference can be gradually increased, and then affects the properly functioning of whole photomask feeding machanism.Above-mentioned transfer
The rotating roller of device is driven by independent motor, and so, described transferring device tunable photomask winds
Speed difference between device conveying photomask and base material coiler device winding base material, to ensure whole shading
Film feeding machanism properly functioning.
As a kind of explanation to above-mentioned transferring device, described regulation molectron includes regulating block, regulation
Screw, the first mounting seat, the second mounting seat；Described regulating block is strip, described regulating block one end
Offering installing hole, described installing hole sets an opening, and described opening part offers screw, and described regulation is taken turns
It is articulated in the other end of regulating block；Described first mounting seat is provided with round boss, and described regulating block passes through
Installing hole was arranged in the first mounting seat with coordinating of round boss, and described first mounting seat is arranged on machine
On frame, being combined with screw in the screw of described regulating block installing hole opening part, described screw scalable is pacified
The elasticity that dress hole coordinates with round boss；Described second mounting seat offers screw, described regulation spiral shell
Nail screws in screw, and the centrage of described regulation screw hangs down with the centrage space of regulating block installing hole
Directly, the top end face of described regulation screw props up regulating block, turn regulation screw, can order about regulating block and enclose
Rotate around round boss, and then adjust the distance between regulation wheel and rotating roller.Described regulation wheel can be auxiliary
Rotating roller is helped to coordinate between photomask coiler device conveying photomask and base material coiler device winding base material
Speed difference.
Further illustrating as to above-mentioned transferring device, described regulating block is provided with lobe, described
The top end face of regulation screw props up lobe.
As a modification of the present invention, described photomask feeding machanism also includes some relay roller, institute
The one end stating relay roller is articulated in frame, the centrage of described relay roller and photomask coiler device and
The centerline parallel of base material coiler device, described relay roller lays respectively at photomask coiler device and stripping
Between device and between base material coiler device and film-removing device.Wherein, described photomask coiler device
With the relay roller quantity between film-removing device is two, between described base material coiler device and film-removing device
Relay roller quantity be three.
As the present invention a kind of explanation to photomask coiler device, the volume of described photomask coiler device
Including three rolling pieces around molectron, described rolling piece includes wrap plate and contiguous block, described wrap plate
Being arranged in the rotary shaft of photomask coiler device by contiguous block, three wrap plate are along rotary shaft circumference
Being uniformly distributed, the lateral surface of described wrap plate is circular arc camber.As described above, photomask is wound on
On the lateral surface of three wrap plate.
Accompanying drawing explanation
The present invention is described further below in conjunction with the accompanying drawings:
Fig. 1 is the front view of the present invention a kind of photomask feeding machanism；
Fig. 2 is enlarged drawing at A in Fig. 1；
Fig. 3 is enlarged drawing at B in Fig. 1；
Fig. 4 is the structural representation of regulating block in Fig. 3；
Fig. 5 is the structural representation of the first mounting seat in Fig. 3；
Fig. 6 is the left view of the present invention a kind of photomask feeding machanism；
Fig. 7 is the top view of the present invention a kind of photomask feeding machanism.
Symbol description in figure:
10-frame；
20-photomask coiler device；21-rotary shaft；22-winding assembly；221-rolling piece；
2211-wrap plate；2212-contiguous block；
30-base material coiler device；31-rotary shaft；32-cylindrical wound part；
40-film-removing device；41-support；42-stripping molectron；421-stripping upper plate；422-
Stripping lower plate；
50-diaphragm bearing platform；51-bearing plate；
60-transferring device；61-rotating roller；62-adjusting means；621-regulates wheel；622-adjusts
Locking nub；6221-installing hole；6222-opening；6223-screw；6224-lobe；623-adjusts
Joint screw；624-the first mounting seat；6241-round boss；625-the second mounting seat；
70-relay roller.
Detailed description of the invention
Such as Fig. 1 institute, a kind of photomask feeding machanism, including frame 10, photomask coiler device 20,
Base material coiler device 30, film-removing device 40, diaphragm bearing platform 50, transferring device 60, relay roller
70。
As it is shown in fig. 7, described photomask coiler device 20 includes rotary shaft 21, winding assembly 22,
Described rotary shaft 21 one end is articulated in frame 10, and described winding assembly 22 is fixed on rotary shaft
The other end, described winding assembly 22 winds photomask.The volume of described photomask coiler device 20
Include that three rolling pieces 221, described rolling piece 221 include wrap plate 2211 and connect around molectron 22
Connecing block 2212, described wrap plate 2211 is arranged on photomask coiler device 20 by contiguous block 2212
Rotary shaft 21 on, three wrap plate 2211 are uniformly distributed along rotary shaft 21 circumference, described wrap plate
The lateral surface of 2211 is circular arc camber.The rotary shaft 21 of described photomask coiler device 20 connects electricity
Machine.
As it is shown in fig. 7, described base material coiler device 30 includes rotary shaft 31, cylindrical wound part 32,
Described cylindrical wound part 32 is fixed in rotary shaft 31, and described rotary shaft 31 is through cylindrical wound part
32, one end of described rotary shaft 31 is articulated in frame 10.The rotation of described base material coiler device 30
Axle 31 connects motor.
Shown in Fig. 1, Fig. 2, described film-removing device 40 includes support 41, stripping molectron 42,
Described stripping molectron 42 is arranged on support 41, and described support 41 is fixed in frame 10, institute
State stripping molectron 42 and include stripping upper plate 421 and stripping lower plate 422, described stripping upper plate 421 He
Stripping lower plate 422 is horizontally disposed with, the baseplane of described stripping upper plate 421 and the top of stripping lower plate 422
Plane is parallel and at intervals.
As it is shown in figure 1, above-mentioned photomask coiler device 20, base material coiler device 30, film-removing device
Structural relation between 40 threes is as follows: the rotary shaft 21 of described photomask coiler device 20 and base material
The rotary shaft 31 of coiler device 30 is articulated in the same upright side walls of frame 10, described shading film roll
The rotary shaft 21 of winding apparatus 20 is parallel to each other with the rotary shaft 31 of base material coiler device 30, described screening
Light film roll winding apparatus 20 is positioned at the oblique upper of base material coiler device 30；Described film-removing device 40 is positioned at screening
The side of light film roll winding apparatus 20 and distance away, described base material coiler device 30 is positioned at stripping
The lower section of centre between film device 40 and photomask coiler device 20, described stripping upper plate 421 He
Stripping lower plate 422 all with rotary shaft 21 and the rotation of base material coiler device 30 of photomask coiler device 20
Rotating shaft 31 is parallel.
As it is shown in figure 1, described diaphragm bearing platform 50 is positioned at side and and the stripping of film-removing device 40
Device 40 is distance away, and described diaphragm bearing platform 50 includes bearing plate 51, described undertaking
Plate 51 is horizontally disposed with, and the height of described bearing plate 51 is slightly less than stripping lower plate 422 and pushes up the height of plane.
In conjunction with Fig. 1, Fig. 3, Fig. 4, Fig. 5, described transferring device 60 is arranged in frame 10, institute
State transferring device 60 between film-removing device 40 and base material coiler device 30, at base material coiler device
Before 30 pairs of base materials are wound, described base material flows through transferring device 60；Described transferring device 60 wraps
Including rotating roller 61, adjusting means 62, motor, described rotating roller 61 couples with motor, described regulation
Device 62 includes regulating wheel 621, regulation molectron, and described regulation wheel 621 is positioned at rotating roller 61
Side, described regulation takes turns 621 centrages and rotating roller 61 centerline parallel, and described regulation molectron can
Being adjusted the spacing of regulation wheel 621 and rotating roller 61, described base material flows through rotating roller 61 and adjusts
Joint wheel 621 outer round surface.Wherein, described regulation molectron include regulating block 622, regulation screw 623,
First mounting seat the 624, second mounting seat 625；Described regulating block 622 in strip, described regulating block
622 one end offer installing hole 6221, and described installing hole 6221 sets an opening 6222, described opening
Offering screw 6223 at 6222, described regulation wheel 621 is articulated in the other end of regulating block 622；Described
First mounting seat 624 is provided with round boss 6241, described regulating block 622 by installing hole 6221 with
The cooperation of round boss 6241 is arranged in the first mounting seat 624, and described first mounting seat 624 is installed
In frame 10, in the screw 6223 of described regulating block installing hole opening part, it is combined with screw, described
The elasticity that screw scalable installing hole 6221 coordinates with round boss 6241；Described second mounting seat
625 offer screw, and described regulation screw 623 screws in screw, described regulation screw 623
Centrage and the centrage spatial vertical of regulating block installing hole 6221, the top of described regulation screw 623
Face props up regulating block 622, turn regulation screw 623, can order about regulating block 622 around round boss
6241 rotate.Wherein, described regulating block 622 is provided with lobe 6224, described regulation screw 623
Top end face prop up lobe 6224.
As shown in Fig. 1, Fig. 6, one end of described relay roller 70 is articulated in frame 10, described in
The centrage of transfer roller 70 and photomask coiler device 20 and the centerline parallel of base material coiler device 30,
Described relay roller 70 lays respectively between photomask coiler device 20 and film-removing device 40 and base material volume
Between winding apparatus 30 and film-removing device 40.Wherein, described photomask coiler device 20 and film-removing device
Relay roller 70 quantity between 40 is two, described base material coiler device 30 and film-removing device 40 it
Between relay roller 70 quantity be three.
In practical operation, the photomask being attached on base material is wound on the winding of photomask coiler device 20
In molectron 22, photomask free end is after the stripping of film-removing device 40, and its base material is wound to base
On material coiler device 30, its diaphragm flows to diaphragm bearing platform 50.Wherein, the stripping of film-removing device 40
Membrane process is as follows: photomask free end passes between stripping upper plate 421 and stripping lower plate 422, behaviour
Making personnel to be separated with base material by the diaphragm of photomask free end, diaphragm is across stripping lower plate 422 and diaphragm
The bearing plate 51 of bearing platform, and base material passes through the gap of stripping lower plate 422 and bearing plate 51 to tiltedly
Lower section is wound on base material coiler device 30, and afterwards, photomask coiler device 20 constantly fills to stripping
Putting 40 input photomasks, diaphragm is constantly peeled off from base material by film-removing device 40, and diaphragm flows to film
Sheet bearing platform 50, base material is wound on base material coiler device 30.
Above content is only the better embodiment of the present invention, for those of ordinary skill in the art,
According to the thought of the present invention, the most all will change, this theory
Bright book content should not be construed as limitation of the present invention.
Claims (7)
1. a photomask feeding machanism, including frame (10), photomask coiler device (20), base material volume
Winding apparatus (30)；Described photomask coiler device (20) includes rotary shaft (21), winding assembly (22),
Described rotary shaft (21) one end is articulated in frame (10), and described winding assembly (22) is fixed on rotation
The other end of rotating shaft, described winding assembly winds photomask on (22)；Described base material coiler device (30)
Including rotary shaft (31), cylindrical wound part (32), described cylindrical wound part (32) is fixed on rotary shaft (31)
On, described rotary shaft (31) passes cylindrical wound part (32), and one end of described rotary shaft (31) is articulated in
In frame (10)；It is characterized in that: also include film-removing device (40), diaphragm bearing platform (50)；Institute
State film-removing device (40) and include support (41), stripping molectron (42), described stripping molectron (42)
Being arranged on support (41), described support (41) is fixed in frame (10), described stripping molectron
(42) stripping upper plate (421) and stripping lower plate (422), described stripping upper plate (421) and stripping are included
Lower plate (422) is horizontally disposed with, the baseplane of described stripping upper plate (421) and the top of stripping lower plate (422)
Plane is parallel and at intervals；Described diaphragm bearing platform (50) is positioned at film-removing device (40)
Side and distance away with film-removing device (40), described diaphragm bearing platform (50) includes accepting
Plate (51), described bearing plate (51) is horizontally disposed with, and the height of described bearing plate (51) is slightly less than under stripping
The height of plate (422) top plane；The rotary shaft (21) of described photomask coiler device (20) is rolled up with base material
The rotary shaft (31) of winding apparatus (30) is articulated in the same upright side walls of frame (10), described shading
The rotary shaft (21) of film roll winding apparatus (20) is mutual with the rotary shaft (31) of base material coiler device (30)
Parallel, described photomask coiler device (20) is positioned at the oblique upper of base material coiler device (30)；Described stripping
Film device (40) is positioned at the side of photomask coiler device (20) and distance away, described base material
Coiler device (30) is positioned between film-removing device (40) and photomask coiler device (20) under centre
Side, described stripping upper plate (421) and stripping lower plate (422) all with the rotation of photomask coiler device (20)
Rotating shaft (21) is parallel with the rotary shaft of base material coiler device (30) (31)；Described photomask coiler device
(20) rotary shaft (21) and the rotary shaft (31) of base material coiler device (30) are connected to motor.
2. a kind of photomask feeding machanism as claimed in claim 1, it is characterised in that: also include that transfer fills
Putting (60), described transferring device (60) is arranged in frame (10), and described transferring device (60) is positioned at
Between film-removing device (40) and base material coiler device (30), at base material coiler device (30), base material is entered
Before row winding, described base material flows through transferring device (60)；Described transferring device (60) include rotating roller (61),
Adjusting means (62), motor, described rotating roller (61) is connected with motor, and described adjusting means (62) is wrapped
Including regulation wheel (621), regulation molectron, described regulation wheel (621) is positioned at the side of rotating roller (61),
Described regulation wheel (621) centrage and rotating roller (61) centerline parallel, described regulation molectron can be exchanged
The spacing of joint wheel (621) and rotating roller (61) is adjusted, and described base material flows through rotating roller (61) and adjusts
Joint wheel (621) outer round surface.
3. a kind of photomask feeding machanism as claimed in claim 2, it is characterised in that: described regulation combination
Part includes regulating block (622), regulation screw (623), the first mounting seat (624), the second mounting seat (625)；
Described regulating block (622) is in strip, and described regulating block (622) one end offers installing hole (6221),
Described installing hole (6221) sets an opening (6222), and described opening (6222) place offers screw (6223),
Described regulation wheel (621) is articulated in the other end of regulating block (622)；Described first mounting seat (624) sets
Having round boss (6241), described regulating block (622) is by installing hole (6221) and round boss (6241)
Cooperation be arranged in the first mounting seat (624), described first mounting seat (624) is arranged on frame (10)
On, it is combined with screw, described screw scalable in the screw (6223) of described regulating block installing hole opening part
The elasticity that installing hole (6221) coordinates with round boss (6241)；Described second mounting seat (625) is opened
Being provided with screw, described regulation screw (623) screws in screw, the center of described regulation screw (623)
Line and the centrage spatial vertical of regulating block installing hole (6221), the top end face of described regulation screw (623)
Prop up regulating block (622), turn regulation screw (623), regulating block (622) can be ordered about around round boss
(6241) rotate.
4. a kind of photomask feeding machanism as claimed in claim 3, it is characterised in that: described regulating block (622)
Being provided with lobe (6224), the top end face of described regulation screw (623) props up lobe (6224).
5. photomask feeding machanism as claimed in claim 1 a kind of, it is characterised in that: also include some in
Transfer roller (70), one end of described relay roller (70) is articulated in frame (10), described relay roller (70)
Centrage and photomask coiler device (20) and the centerline parallel of base material coiler device (30), described
Relay roller (70) lays respectively between photomask coiler device (20) and film-removing device (40) and base material
Between coiler device (30) and film-removing device (40).
6. a kind of photomask feeding machanism as claimed in claim 5, it is characterised in that: described shading film roll
Relay roller (70) quantity between winding apparatus (20) and film-removing device (40) is two, and described base material is rolled up
Relay roller (70) quantity between winding apparatus (30) and film-removing device (40) is three.
7. a kind of photomask feeding machanism as claimed in claim 1, it is characterised in that: described shading film roll
The winding assembly (22) of winding apparatus (20) includes three rolling pieces (221), described rolling piece (221)
Including wrap plate (2211) and contiguous block (2212), described wrap plate (2211) passes through contiguous block (2212)
Being arranged in the rotary shaft (21) of photomask coiler device (20), three wrap plate (2211) are along rotating
Axle (21) circumference is uniformly distributed, and the lateral surface of described wrap plate (2211) is circular arc camber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410831731.0A CN104589776B (en) | 2014-12-26 | 2014-12-26 | A kind of photomask feeding machanism |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410831731.0A CN104589776B (en) | 2014-12-26 | 2014-12-26 | A kind of photomask feeding machanism |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104589776A CN104589776A (en) | 2015-05-06 |
| CN104589776B true CN104589776B (en) | 2016-11-30 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201410831731.0A Expired - Fee Related CN104589776B (en) | 2014-12-26 | 2014-12-26 | A kind of photomask feeding machanism |
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Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110217452B (en) * | 2019-06-14 | 2024-05-31 | 江苏吉鑫风能科技股份有限公司 | Film peeling device |
| CN113651147B (en) * | 2021-10-18 | 2022-09-30 | 中电科风华信息装备股份有限公司 | Membrane cleaning and feeding equipment compatible with coil stock, sheet stock and bare material |
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|---|---|---|---|---|
| JP2005144858A (en) * | 2003-11-14 | 2005-06-09 | Nitto Denko Corp | Method for producing transparent conductive film |
| US20060185796A1 (en) * | 2002-10-11 | 2006-08-24 | Lintec Corporation | Laminating apparatus |
| US20100288441A1 (en) * | 2006-10-17 | 2010-11-18 | Nitto Denko Corporation | Method and system for laminating optical elements |
| CN103303732A (en) * | 2013-05-31 | 2013-09-18 | 泰兴联创绝缘材料有限公司 | Original film-release film laminating protective film stripping machine |
-
2014
- 2014-12-26 CN CN201410831731.0A patent/CN104589776B/en not_active Expired - Fee Related
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060185796A1 (en) * | 2002-10-11 | 2006-08-24 | Lintec Corporation | Laminating apparatus |
| JP2005144858A (en) * | 2003-11-14 | 2005-06-09 | Nitto Denko Corp | Method for producing transparent conductive film |
| US20100288441A1 (en) * | 2006-10-17 | 2010-11-18 | Nitto Denko Corporation | Method and system for laminating optical elements |
| CN103303732A (en) * | 2013-05-31 | 2013-09-18 | 泰兴联创绝缘材料有限公司 | Original film-release film laminating protective film stripping machine |
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| Publication number | Publication date |
|---|---|
| CN104589776A (en) | 2015-05-06 |
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