CN104582227B - Touchable plasma processing system - Google Patents
Touchable plasma processing system Download PDFInfo
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- CN104582227B CN104582227B CN201510005599.2A CN201510005599A CN104582227B CN 104582227 B CN104582227 B CN 104582227B CN 201510005599 A CN201510005599 A CN 201510005599A CN 104582227 B CN104582227 B CN 104582227B
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- plasma
- liquid bottle
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- application device
- ultrasonic platform
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- 239000007788 liquid Substances 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims description 12
- 150000002500 ions Chemical class 0.000 abstract description 27
- 230000000694 effects Effects 0.000 abstract description 17
- 208000003351 Melanosis Diseases 0.000 abstract description 7
- 238000004659 sterilization and disinfection Methods 0.000 abstract description 6
- 241000894006 Bacteria Species 0.000 abstract description 5
- 231100000241 scar Toxicity 0.000 abstract description 5
- 230000010355 oscillation Effects 0.000 abstract description 2
- 238000002604 ultrasonography Methods 0.000 abstract 5
- 208000032544 Cicatrix Diseases 0.000 abstract 1
- 206010014970 Ephelides Diseases 0.000 abstract 1
- 230000037387 scars Effects 0.000 abstract 1
- 208000027418 Wounds and injury Diseases 0.000 description 5
- 230000003796 beauty Effects 0.000 description 5
- 230000001954 sterilising effect Effects 0.000 description 5
- 206010020843 Hyperthermia Diseases 0.000 description 2
- 206010052428 Wound Diseases 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000036031 hyperthermia Effects 0.000 description 2
- 238000001356 surgical procedure Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 230000005495 cold plasma Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 201000010099 disease Diseases 0.000 description 1
- 208000037265 diseases, disorders, signs and symptoms Diseases 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000023597 hemostasis Effects 0.000 description 1
- 230000002779 inactivation Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000002427 irreversible effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Abstract
The invention discloses a touchable plasma processing system. The touchable plasma processing system comprises a plasma generator, an ultrasound platform and a conductive liquid bottle, wherein the conductive liquid bottle is arranged on the ultrasound platform, the ultrasound platform is connected with the plasma generator through a wire, one end of the conductive liquid bottle is provided with a supercharging device, the supercharging device is connected with the conductive liquid bottle through a floating conductive ionic tube, one side of the ultrasound platform is provided with a plasma application device, a plasma constraint cover is arranged in the plasma application device, and the plasma application device is connected with the supercharging device through the conductive ionic tube and connected with the ultrasound platform through a radio-frequency cable. A low-temperature plasma region can be formed around an electrode and can be touched directly without hurting a human body; high-speed motion of charged ions can kill bacteria to achieve the effects of disinfection and wound rehabilitation, and high-speed motion and oscillation of the charged ions can accelerate motion of molecules of the touched skin of the human body, enhance the activity of the skin, make the skin smooth and achieve the effects of beautifying the face and removing freckles and scars.
Description
Technical field
The present invention relates to a kind of plasma process system, more particularly, to one kind can directly be touched and can strengthen skin
Activity, glabrous skin, beauty treatment, nti-freckle, wound reparation, sterilization, burn rehabilitation can touch plasma process system.
Background technology
Plasma is that material exists（Solid, liquid, gas body）The 4th kind of state, the non-bundle being made up of a large amount of charged particles
Tie up the meta system of state, at present, low temperature plasma, cold plasma, heat plasma technology be widely used to medical science,
The various fields such as electronics, industry, military affairs and daily life, wherein low-temperature plasma system is extensively applied in recent years abroad
In：The treatment of the diseases such as hals,Nasen und Ohrenheilkunde surgery, spinal surgery gynaecology, Dermatology ＆ STD Dept. and anorectum department, and it has been proved to good
Effect, it has the characteristics that safe, operating time is short, wound is little, instant effect, but, existing plasma temperature is high,
Energy is big, directly contact meeting hurt human body, in addition, the cutting in being medically only used for performing the operation, hemostasis, rubble and apparatus at present
Sterilization, there is certain limitation in its purposes.
So how to design one kind can directly touch, without there being hurt human body can kill bacterium again, strengthen skin
Activity, glabrous skin, play beauty treatment, nti-freckle, touch plasma device can the becoming current and need urgent solution of the effect of scar of dispelling
Problem certainly.
Content of the invention
The technical problem to be solved in the present invention is to provide a kind of plasma process system, and this system forms low-temperature plasma
Region can directly be touched and not have hurt human body, and the high-speed motion of its charged ion, oscillation energy strengthen skin activity, play U.S.
Appearance, nti-freckle, the effect of scar of dispelling.
In order to solve above-mentioned technical problem, the invention provides one kind can touch plasma process system, it includes
Ion generator, ultrasonic platform and conduction liquid bottle, described plasma generator is arranged at ultrasonic platform one end, described conduction liquid bottle
It is arranged on ultrasonic platform, described ultrasonic platform is connected by wire with plasma generator, described conduction liquid bottle one end sets
There is supercharging device, described supercharging device is passed through floating conductive ion pipe and is connected with conduction liquid bottle, and described ultrasonic platform side is provided with
Plasma application device, is provided with plasma containment shroud, described plasma containment shroud is by extremely in described plasma application device
Few two equal electrode and containment shroud endoporus composition, described plasma containment shroud top is provided with return port, and described plasma should
It is connected with supercharging device by conductive ion pipe with device, it is flat with ultrasonic that described plasma application device passes through radio-frequency cable
Platform connects, and described ultrasonic platform is provided with activate switch, for controlling and setting ultrasonic platform.
Preferably, described plasma generator produces high frequency voltage scope is 4000V～15000V, frequency be 100KHz～
500KHz, general power 5W～400W.
Preferably, described plasma containment shroud external diameter is 0.1 mm～50mm, and internal diameter is 0.05 mm～49mm.
The present invention compared with prior art has the advantages that：
Described conduction liquid bottle is arranged on ultrasonic platform and can produce showy conductive ion, described system work post plasma
Generator produces RF energy and conducts through wire and converges generation plasma to plasma containment shroud and showy conductive ion, sets
Good parameter, ultrasonic platform is started working, and after showy conductive ion is full of whole pipeline and have a spilling, starts radio frequency plasma and sends out
Raw device, radio frequency plasma energy meets the showy conductive ion of high concentration, radio-frequency voltage in procedures electrode tip plasma containment shroud
Disruptive discharge, produces plasma discharge, entirely will produce plasma in whole space, and plasma is divided relatively due to electric current
Dissipate, energy uniform balance does not form localized hyperthermia, the showy conductive ion gas flowing constantly producing also can be taken away electric discharge and produce
Heat, low-temperature plasma region can be formed around electrode, can directly touch, without there being hurt human body.
Although low-temperature plasma temperature is low, wherein contains a large amount of charged ions, the high-speed motion of charged ion, can kill
Bacterium, plays the effect that sterilization and wound recover, in addition, the high-speed motion of charged ion, vibration also can play acceleration contact skin
The molecular motion of skin, strengthens skin activity, glabrous skin, plays beauty treatment, nti-freckle, the effect of scar of dispelling, can be good at for facing
Beauty treatment in bed, nti-freckle, wound reparation, sterilization, burn rehabilitation.
Brief description
Fig. 1 for the present invention can touch plasma process system structural representation.
Fig. 2 for the present invention can touch plasma process system medium ion bondage cover structural representation.
Fig. 3 is the response diagram producing plasma with showy conductive ion after plasma containment shroud of the present invention is converged.
Specific embodiment
The present invention is described in detail with reference to the accompanying drawings and detailed description it is impossible to be not understood as to the present invention's
Limit；
As depicted in figs. 1 and 2, one kind can touch plasma process system, it includes plasma generator 1, ultrasonic flat
Platform 2 and conduction liquid bottle 3, described plasma generator 1 is arranged at ultrasonic platform 2 one end, and described conduction liquid bottle 3 is arranged at ultrasonic flat
On platform 2, described ultrasonic platform 2 is connected by wire 4 with plasma generator 1, and described plasma generator 1 produces high-frequency electrical
Pressure scope be 4000V～15000V, frequency be 100KHz～500KHz, general power 5W～400W, showy conductive ion amount be 5～
200 liters/min/atmospheric pressure, described conduction liquid bottle 3 one end is provided with supercharging device 9, described supercharging device 9 pass through floating conductive from
Sub- pipe 10 is connected with conduction liquid bottle 3, and described ultrasonic platform 2 side is provided with plasma application device 11, and described plasma should
With being provided with plasma containment shroud 5 in device 11, described plasma containment shroud 5 external diameter is 0.1 mm～50mm, and internal diameter is 0.05 mm
～49mm, described plasma containment shroud 5 is made up of at least two equal electrode 6 and containment shroud endoporus 7, described plasma containment shroud
5 tops are provided with return port 8, and described plasma application device 11 is connected with supercharging device 9 by conductive ion pipe 10-1, institute
State plasma application device 11 to be connected with ultrasonic platform 2 by radio-frequency cable 12, described ultrasonic platform 2 is provided with activate switch
13, for controlling and setting ultrasonic platform 2.
First, turn on the power, activate switch 13, set parameter, ultrasonic platform 2 is started working, directly by conduction liquid bottle 3
Be positioned over and can produce showy conductive ion on ultrasonic platform 2, when showy conductive ion be full of whole pipeline after and overflow, now
Start RF plasma reactor 1, plasma generator 1 produces RF energy and conducts to plasma containment shroud 5 through wire 4, etc.
Ion bondage cover 5 and showy conductive ion produce plasma after converging, as shown in figure 3, radio frequency plasma energy is in operation electricity
Pole tip plasma containment shroud 5 meets the showy conductive ion of high concentration, and because dielectric coefficient reduces, electrode insulation lost efficacy, radio frequency
Voltage breakdown discharges, and produces plasma discharge, and because relative impedances in space uniformly, will generation etc. in whole space entirely
Gas ions, plasma does not form localized hyperthermia due to electric current relative distribution, energy uniform balance, the showy conduction constantly producing
Ionized gas flowing also can take away the heat that electric discharge produces, and can form low-temperature plasma region around electrode, can be direct
Touching, without there being hurt human body, but has irreversible inactivation effect to bacterium and microorganism.
Although low-temperature plasma temperature is low, wherein contains a large amount of charged ions, the high-speed motion of charged ion, can kill
Bacterium, plays the effect that sterilization and wound recover.The high-speed motion of used charged ion, vibration also can play acceleration contact skin
Molecular motion, strengthen skin activity, glabrous skin, play beauty treatment, nti-freckle, the effect of scar of dispelling.
Claims (3)
1. one kind can touch plasma process system it is characterised in that：It includes plasma generator（1）, ultrasonic platform（2）
With conduction liquid bottle（3）, described plasma generator（1）It is arranged at ultrasonic platform（2）One end, described conduction liquid bottle（3）It is arranged at
Ultrasonic platform（2）On, described ultrasonic platform（2）With plasma generator（1）By wire（4）It is connected, described conduction liquid bottle
（3）One end is provided with supercharging device（9）, described supercharging device（9）By floating conductive ion pipe（10）With conduction liquid bottle（3）Even
Connect, described ultrasonic platform（2）Side is provided with plasma application device（11）, described plasma application device（11）Inside it is provided with
Plasma containment shroud（5）, described plasma containment shroud（5）By at least two equal electrode（6）With containment shroud endoporus（7）Composition,
Described plasma containment shroud（5）Top is provided with return port（8）, described plasma application device（11）By conductive ion pipe
（10-1）With supercharging device（9）It is connected, described plasma application device（11）By radio-frequency cable（12）With ultrasonic platform
（2）Connect, described ultrasonic platform（2）It is provided with activate switch（13）, for controlling and setting ultrasonic platform（2）.
2. according to claim 1 can touch plasma process system it is characterised in that：Described plasma generator
（1）Generation high frequency voltage scope is 4000V～15000V, and frequency is 100KHz～500KHz, general power 5W～400W.
3. according to claim 1 can touch plasma process system it is characterised in that：Described plasma containment shroud
（5）External diameter is 0.1 mm～50mm, and internal diameter is 0.05 mm～49mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510005599.2A CN104582227B (en) | 2015-01-07 | 2015-01-07 | Touchable plasma processing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510005599.2A CN104582227B (en) | 2015-01-07 | 2015-01-07 | Touchable plasma processing system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104582227A CN104582227A (en) | 2015-04-29 |
| CN104582227B true CN104582227B (en) | 2017-02-22 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510005599.2A Active CN104582227B (en) | 2015-01-07 | 2015-01-07 | Touchable plasma processing system |
Country Status (1)
| Country | Link |
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| CN (1) | CN104582227B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6385597B2 (en) * | 2015-05-29 | 2018-09-05 | コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． | Apparatus for treating skin using non-thermal plasma |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005077436A1 (en) * | 2004-02-17 | 2005-08-25 | Genshirou Ogawa | Method, device, and bag for warming infusion liquid |
| CN102553075A (en) * | 2010-12-20 | 2012-07-11 | 西安航科等离子体科技有限公司 | Plasma mucocutaneous disease therapeutic apparatus |
| CN202409613U (en) * | 2011-12-27 | 2012-09-05 | 广州市康乃馨健康发展有限公司 | Multifunctional pulse physiotherapy cosmetic instrument |
| CN203458688U (en) * | 2013-07-02 | 2014-03-05 | 武汉凯瑞斯科技有限公司 | Plasma radio frequency emission beautifying electrode |
| CN103656857A (en) * | 2013-11-29 | 2014-03-26 | 南京航空航天大学 | Portable low-temperature plasma sterilizing and beatifying device |
| CN104027195A (en) * | 2013-03-07 | 2014-09-10 | 廖峻德 | Method for producing microplasma with biocompatibility |
| CN204539604U (en) * | 2015-01-07 | 2015-08-05 | 江苏邦士医疗科技有限公司 | One can touch plasma process system |
-
2015
- 2015-01-07 CN CN201510005599.2A patent/CN104582227B/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005077436A1 (en) * | 2004-02-17 | 2005-08-25 | Genshirou Ogawa | Method, device, and bag for warming infusion liquid |
| CN102553075A (en) * | 2010-12-20 | 2012-07-11 | 西安航科等离子体科技有限公司 | Plasma mucocutaneous disease therapeutic apparatus |
| CN202409613U (en) * | 2011-12-27 | 2012-09-05 | 广州市康乃馨健康发展有限公司 | Multifunctional pulse physiotherapy cosmetic instrument |
| CN104027195A (en) * | 2013-03-07 | 2014-09-10 | 廖峻德 | Method for producing microplasma with biocompatibility |
| CN203458688U (en) * | 2013-07-02 | 2014-03-05 | 武汉凯瑞斯科技有限公司 | Plasma radio frequency emission beautifying electrode |
| CN103656857A (en) * | 2013-11-29 | 2014-03-26 | 南京航空航天大学 | Portable low-temperature plasma sterilizing and beatifying device |
| CN204539604U (en) * | 2015-01-07 | 2015-08-05 | 江苏邦士医疗科技有限公司 | One can touch plasma process system |
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| Publication number | Publication date |
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| CN104582227A (en) | 2015-04-29 |
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Address after: 225300 building 7, phase I standard plant, medical device area, 898 Yaocheng Avenue, Taizhou City, Jiangsu Province Patentee after: Bangshi Medical Technology Co.,Ltd. Country or region after: China Address before: 225300 6 / F, building G21, east side of Tai Road and north side of Xinyang Road, China Medical Chengkou, Taizhou City, Jiangsu Province Patentee before: JIANGSU BONSS MEDICAL TECHNOLOGY Co.,Ltd. Country or region before: China |
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