CN104536257A - Improvement method for performance of surface of silver-halide light-sensitive material - Google Patents
Improvement method for performance of surface of silver-halide light-sensitive material Download PDFInfo
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- CN104536257A CN104536257A CN201410820498.6A CN201410820498A CN104536257A CN 104536257 A CN104536257 A CN 104536257A CN 201410820498 A CN201410820498 A CN 201410820498A CN 104536257 A CN104536257 A CN 104536257A
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Abstract
The invention discloses an improvement method for the performance of the surface of a silver-halide light-sensitive material. The silver-halide light-sensitive material consists of a film base, at least one light-sensitive emulsion layer and at least one hydrophilic-gel protective layer, wherein the used amount of perfluoro ammonium caprylate in the hydrophilic-gel protective layer is 6-20mg/m<2>; the used amount of oleamide polyoxyethylene ether is 15-30mg/m<2>; the used amount of perfluoroalkyl polyoxyethylene ether is 10-50mg/m<2>; the used amount of water-soluble polyurethane is 0.4-0.9g/m<2>; the used amount of polyoxyethylene wax is 80-200mg/m<2>; the particle diameter of silica sol is 7nm, and the used amount of the silica sol is 10-20mg/m<2>; and the particle diameter of the silica sol is 7nm, and the used amount of the silica sol is 10-20mg/m<2>. The improvement method disclosed by the invention has the advantages that water-soluble polymer is used for replacing partial gelatin, so that the silver-halide light-sensitive material has good anti-static performance and excellent scratch resistance, and after washing and processing, no residual water stains and highly-bright surfaces are caused.
Description
Technical field
The present invention relates to photosensitive silve halide material field, in particular, relate to a kind of ameliorative way being applicable to the photosensitive silve halide material surface propertys such as X-ray industry film, laser photo film, medical x-ray film.
Background technology
Photosensitive silve halide material by sheet base, at least apply one deck silver halide magenta-sensitive emulsion at the one or both sides of sheet base and on photosensitive emulsion, be at least coated with one deck hydrophilic gel protective seam and form.Hydrophilic glue-line is generally hydrophilic colloid, can produce electrostatic with the megohmite insulant friction of low conductivity, such as: dacron, plastics roll shaft, rubber roll shaft etc.In a dry environment, particularly rapid movement mechanical system, very easily produces electrostatic accumulation.Make photosensitive silve halide material expose time serious, egative film is shown as dot, as branch or penniform spot.
Photosensitive silve halide material, in actual production and use procedure, inevitably contacts with other materials and produces and rub, such as: cut, pack.The process of special extensive application easily produces electrostatic, such as: medical treatment, industrial flaw detection, printing and dyeing etc.The electrostatic produced may dust in absorbed air or directly produce electric spark, makes untapped photosensitive silve halide material occur image quality issues.
Photosensitive silve halide material is consumptive material, has nonrepeatability.In order to reduce the generation of electrostatic, in hydrophilic colloid protective seam, introduce the conductive compound not affecting its transparency.
Use perfluorinated surfactant can control due to the electric charge rubbed or contact different materials produces, such as: contact the negativity produced with roller bearing.Manyly patent reports such as, about ion-type and non-ionics, the application of fluorocarbon surfactant in film, US.Pat 4,272,615; 4,649,102; 4,847,186; 4,596,766; 4,367,283; 4,335,201; 5,258,276; EP 319,951 etc.
The special electrostatic reducing photosensitive silve halide material and produce in the process of mechanical motion; the visible US 5 of report of this aspect; 541,049: in hydrophilic gel protective seam, use perfluor alkane (alkene) base polyoxyethylene ether, polyoxyethylene to improve polysiloxane surfactant and per-fluoroalkyl sulfonyl imines.At EP 0,319,951: at hydrophilic colloid layer three kinds of surfactants, i.e. anion fluorinated surfactants, Nonionic alkoxylated compound and nonionic alkoxy fluorochemicals.At EP0,644,456A1: use perfiuoroalkyl ammonium salts, oleyl polyoxyethylene ether and a kind of terpolymer sulfonate in protective seam, etc.
In specific film system, use some material to obtain good result, but adverse influence can not be caused to photographic property, such as light sensitivity, photographic fog, granularity, sharpness etc.Also have a problem to be exactly that photographic material after manufacturing will in the bin storage a very long time in addition, especially the environment in warehouse is relatively more severe, as hot and humid.Adopt thicker hydrophilic gel protective seam can solve keeping quality problem, but process and rate of drying can be delayed.
But fast processing becomes more and more important, the thickness that must reduce hydrophilic colloid layer, to improve coating penetration, needs the consumption improving hardener when not affecting physical and mechanical properties.Resistance to compression protectiveness is poor under the thickness reducing hydrophilic colloid layer can cause the condition of the drying in processing procedure or under moistening condition; easily occur in a wetted condition scratching, on emulsion layer, apply the thicker hydrophilic gel of one deck (as gelatin) diaphragm for this reason.Although increase the Surface glare effect that cuticula thickness can improve egative film, backsheet surface easily adheres to filth.And thicker cuticular layer may hinder processing procedure, reduce ductile and rate of drying.This is obviously be unfavorable for that rapid development is processed, so coating should shallow layer.
If carrying out development processing containing hardener developer solution and stop bath, its result is being on egative film, leave uneven dry water spot and water wave, is called " water stain defect ".From the actual use experience of photosensitive silve halide material, use containing after the show fixing solution development processing of hardener on the contrary not as good as using containing hardener.
Summary of the invention
Object of the present invention: the first, gives photosensitive silve halide material a kind of beautiful apparent, is presented as that backsheet surface has the effect of light, simultaneously without " water stain defect ";
The second, improve photosensitive silve halide material adhesion strength, reduce the cut produced because of mechanical motion;
3rd, improve the development osmotic effect of photosensitive silve halide material, be presented as and reduce the aobvious fixing time, do not cause the growth of photographic fog simultaneously;
4th, while reaching above target, do not affect the photosensitive property of photosensitive silve halide material.
The ameliorative way of a kind of photosensitive silve halide material surface property of the present invention, some technical schemes are adopted to be achieved, photosensitive silve halide material be by sheet base, at least one deck sensitive emulsion layer and at least one deck hydrophilic gel protective seam form, containing perfluorooctanoic acid, oleamide polyoxyethylene ether, perfluoroalkyl polyoxy vinethene, soluble polyurethane, polyoxyethylene wax and silicasol in hydrophilic gel protective seam; The consumption of perfluorooctanoic acid is 6 ~ 20mg/m
2; Oleamide polyoxyethylene ether consumption is 15 ~ 30mg/m
2; Perfluoroalkyl polyoxy vinethene consumption is 10 ~ 50mg/m
2; Soluble polyurethane consumption is 0.4 ~ 0.9g/m
2; Polyoxyethylene wax consumption is 80 ~ 200mg/m
2; The particle diameter of silicasol is 7nm, and consumption is 10 ~ 20mg/m
2; The particle diameter of silicasol is 7nm, and consumption is 10 ~ 20mg/m
2.
The consumption of described perfluorooctanoic acid is 7mg/m
2; Oleamide polyoxyethylene ether consumption is 20mg/m
2; Perfluoroalkyl polyoxy vinethene consumption is 40mg/m
2; Soluble polyurethane consumption is 0.6g/m
2; Polyoxyethylene wax consumption is 120mg/m
2.
Containing polyaminoester emulsion and hardener in hydrophilic gel protective seam, the molecular weight of polyurethane is 3 ~ 100,000, and solid content is 30 ~ 40%, PH is 6.5 ~ 9.0, and consumption is 0.2 ~ 0.9g/m
2, the optimum amount of polyurethane is 0.6g/m
2, described hardener is two ethene sulfuryl propyl alcohol and the two vinyl sulfone(RemzaolHuo Xingranliaohuoxingjituan) of methyl, and consumption is respectively 12 ~ 35mg/m
2with 0 ~ 8.2mg/m
2.
In hydrophilic gel protective seam, the consumption of gelatin is 1.1g/m
2.
The present invention has following beneficial effect:
In hydrophilic gel protective seam, photosensitive silve halide material can be made to have good antistatic behaviour, excellent adhesion strength and the surface that noresidue is water stain and highlighted after washing processing containing perfluorooctanoic acid, oleamide polyoxyethylene ether, perfluoroalkyl polyoxy vinethene, soluble polyurethane and polyoxyethylene wax.
Embodiment
Below in conjunction with experimental example, the present invention is described in further details.
The ameliorative way of a kind of photosensitive silve halide material surface property of the present invention, some technical schemes are adopted to be achieved, photosensitive silve halide material be by sheet base, at least one deck sensitive emulsion layer and at least one deck hydrophilic gel protective seam form, containing perfluorooctanoic acid, oleamide polyoxyethylene ether, perfluoroalkyl polyoxy vinethene, soluble polyurethane, polyoxyethylene wax and silicasol in hydrophilic gel protective seam; The consumption of perfluorooctanoic acid is 6 ~ 20mg/m
2; Oleamide polyoxyethylene ether consumption is 15 ~ 30mg/m
2; Perfluoroalkyl polyoxy vinethene consumption is 10 ~ 50mg/m
2; Soluble polyurethane consumption is 0.4 ~ 0.9g/m
2; Polyoxyethylene wax consumption is 80 ~ 200mg/m
2; The particle diameter of silicasol is 7nm, and consumption is 10 ~ 20mg/m
2; The particle diameter of silicasol is 7nm, and consumption is 10 ~ 20mg/m
2.
The first-selected polymkeric substance of the present invention is aqueous polyurethane emulsion.In addition, other polymkeric substance are also applicable, as polyvinylpyrrolidone, polyacrylamide, and polyacrylic acid, polymethylmethacrylate, and styrene-maleic acid or styrene-maleic acid type multipolymer.
Hydrophilic colloid is that mixed adhesive is as the colloid of protein uniformly for energy, and gel, polysaccharide, synthetic substitute, as gelatin polyvinyl alcohol (PVA), poly N-vinyl pyrrolidone, polyvinyl imidazole, gathers pyrazoles, polyacrylamide, polyacrylic acid, and derivant.Prepreerence in these bonding agents is gelatin, mainly uses alkaline-process gelatin.Because gelatin has intrinsic defect (the water suction amount of rising is large, bad mechanical strength etc.), but the effect of gelatin in emulsion is again irreplaceable, so needs part changes above-cited natural or semisynthetic polymkeric substance.The natural substitute of gelatin is as other protein, as zeins, and albumin and casein, cellulose, sugar, starch, alginates.Modified gelatin is semisynthetic substitute as natural products alkylating agent or acylating agent and gelatin graft polymerization monomer, gelatin, cellulose derivative, as hydroxyl cellulose, and carboxymethyl cellulose, O-phthalic cellulose, cellulose sulfate conversion or obtain gelatine derivative.
According to above-mentioned definition, the polymer applications of first-selection of the present invention at least accounts for hydrophilic colloid obtains weight 10% in protective seam.
Protective seam should be have the gel that certain degree of hardness and water-intake rate be less than 2.5 grams of every square meters, is preferably not higher than every square metre of about 1.20g, preferably every square metre of 1.20 to 0.60 gram of scope at gelatin protective mulch.
Cataloid can improve surface property further.Best silicasol mean grain size is not more than 10 nanometers, and in protective seam, silicasol is preferably in the scope of 50 milligrams to 500 milligrams every square metre.Particularly top-priority colloidal silica particles has the surface area of 500 square metres every gram, and its mean grain size is less than 7 nanometers.
In protective seam, plus polymer may reduce friction further, especially at the environment that relative humidity is high, as paraffin, and Tissuemat E, polyoxyethylene wax, teflon wax, polysilicon acid etc.
Gelatin adds suitable hardener and can be cured, as those epoxy types, and imine; Inorganic salts, as chromic acetate, alum; Aldehydes, as formaldehyde, glyoxal, glutaraldehyde; N-methylol compound; Two vinyl sulfone(RemzaolHuo Xingranliaohuoxingjituan) based compound, as two vinyl sulfone(RemzaolHuo Xingranliaohuoxingjituan) propyl alcohol, the two vinyl sulfone(RemzaolHuo Xingranliaohuoxingjituan) of methyl; Active halogen compound, as dichloro s-triazine class.Above hardener separately or with the use of.
Antistatic agent can use inorganic salts, ion or non-ionic polymers or multipolymer, surfactant, the most suitable with surfactant: both had good anlistatig effect, and be also of value to coating.Non-ionics is the most suitable.
Non-ionic surfactant has good antistatic property, generally using polyalkylene oxypolymer as antistatic agent.As polyglycol, polyethylene/polypropylene glycol condensed products, polyethylene glycol alkyl ether or polypropylene glycol alkyl ether, macrogol ester, polypropylene glycol ester, poly alkylene glycol alkyl, propanol derivative etc.The compound of polyethenoxy ether class is the most suitable, and it has following chemical formula structure:
R-O-(CH
2CH
2O)
n-H
Wherein n=8-50, R is the alkyl of 8-30 C, fatty acid, fatty acid amide and alkyl phenol etc., and its representation is as follows:
When the H on alkyl is replaced by F, be called " perfluoroalkyl polyoxy vinethene non-ionics ", have better antistatic effect and have when being coated with and better sprawl effect, its structure is as follows:
The perfluoroalkyl that Rf wherein can be made up of 4-16 C, perfluor, perfluorocycloalkyl groups and perfluor cycloalkenyl group, X can be-O-,-CONH-,-CH2O-or singly-bound, R, R ' and R " be the low alkyl group of H or 1 to 4 carbon atom, its representation of y=6-30. is as follows:
Above compound and gelatin form protective seam jointly, are applicable to multiple coating applications technology, and as scraper for coating, airblade coating, dropping curtain is coated with, and slope flow coat cloth and bent moon coating, these are all that photosensitive silve halide material produces known coating technique.
Can use thickening agent adjusting viscosity in above-mentioned coating, the thickening agent used can not have impact to photosensitive silve halide material.The thickening agent be suitable for comprises waterborne polymeric as mandelic resin, sulfuric ester, polysaccharide, polymer sulfonic acid salt, carboxyl or phosphate, polyacrylamide, polymethylacrylic acid and salt thereof, acrylamide and methacrylic acid copolymer, polyvinyl alcohol (PVA) and water-soluble macromolecule are as cellulose and its derivates etc.Comparatively conventional is mandelic resin, polyacrylamide and cellulose derivative.And this polymer coating can independently use or mix crosslinked use.
Matting agent or coating additive is used to improve the effect of antistatic coating, as fluorocarbon surfactant.Containing the matting agent between 0.2 to 10 μm of particle diameters in protective seam.Matting agent divides solvable and is insoluble to alkali.The matting agent being insoluble to alkali is generally used for improving photographic resolution, is dissolved in the usual of alkali and dissolves in alkaline bath.Suitable matting agent is polymethylmethacrylate, methacrylic acid and methylmethacrylate copolymer, hydroxypropyl methylcellulose-dimethyl hexahydrophthalate.
The each condition of the inventive method is tested:
The present invention uses perfluorooctanoic acid, perfluoroalkyl polyoxy vinethene, oleamide polyoxyethylene ether and aqueous polyurethane emulsion, polythene wax emulsion in the protective film of industrial X-ray sensitive film; it is made to have good antistatic property; manually water stain-free after development processing; excellent Surface glare effect and adhesion strength, reduce the time developed photographic film.Equally, also applicable under rapid development processing conditions.
Use compound structure as follows:
Compound (I) is perfluorooctanoic acid
C
7F
15COONH
4(I)
Compound (II) is oleamide polyoxyethylene ether
R-CONH-(OCH
2cH
2) n-H (II) n=10-20, R be the unsaturated alkyl of 14-17
Compound (III) is perfluoroalkyl polyoxy vinethene
CF
3(CF
2)m-(OCH
2CH
2)n-H (III)n＝10-30m＝1-9
Compound (IV) is no more than 100, the aqueous polyurethane of 000 for total molecular weight
HO-(R
1-OOC-NH-R
2-NH-COO-R
1)-OH (IV) R
1for polyethers or polyester
Compound (V) is polyoxyethylene wax
-(CH
2CH
2O)n- (V)n＝50-300
Above compound joins in protective film, and its consumption is as shown in table 1,
The addition of part of compounds is added in table 1 emulsion cuticula
Remarks: emulsion layer coating Tianjin T7 standard photosites emulsion, silver coating amount is 5.0-8.0g/m
2.
Following test is carried out to the product that the emulsion cuticula configured according to table 1 is painted
1) surface resistance test
Determine its antistatic behaviour by test film surface resistance, surface resistivity its antistatic behaviour less is better.Method of testing: film is cut into 10cm × 1cm, at 50 DEG C, uses accurate ohmmeter to test two ends resistance under 79% relative humidity after placing 48h.
2) water stain test
Rinse the film (egative film transmission optical densities is about 3.0) for fully exposure, observe water spot residual on egative film and dried floral print, represent that it is good and bad by 0-5,0 represents best, and 5 represent the poorest.Washing condition: use D19b developing liquid developing 3-8 minute, use the fixing 5-10 minute of F5 stop bath, with tap water shower 3-10 minute, natural drying or hot blast rapid draing.
3) Surface glare test
Rinse the film (egative film transmission density >6.0) exposed completely, observe egative film specular gloss degree, represent that it is good and bad by 0-4,0 represents the poorest, and 4 represent best.With the dazzle of Kodak AA400 industrial sheet backsheet surface be the dazzle of 4, Agfa C7 industrial sheet backsheet surface for 2, Tianjin T7 industrial sheet backsheet surface dazzle is 0, in this, as contrast.
4) moisture-resistant scratches aptitude tests
Rinse the film (egative film transmission density about 3.0) exposed completely, the minimum power of moisture-inhibiting sheet is drawn in test.Film is cut into the rectangular of 2.8cm × 24.0cm, be positioned in the test trough scratching instrument and carry out variable force (0-1.0N) scuffing test, under viewbox, read starting point after dry print to the length starting to draw part thoroughly, be then scaled the power of minimum stroke of antireflective coating layer.Scratching instrument needle point is the ruby of 0.5mm.
Photographic property washing condition: at 20 DEG C, D19b developing liquid developing 5min, the fixing 8min of F5 stop bath.
Developing powder: at 20 DEG C, the time that the photographic property that flushing print makes it reach T7 standard development 5min is used, the time, shorter expression perviousness was better.
5) superiority-inferiority of post bake
Determine with reference to the method in EP 0,806 705.That is: film is cut into the small pieces of 3.5 × 4.0cm, makes it in the NaOH solution of 50ml 1.5%, the time of coating dissolution at 50 DEG C, the time is longer, and post bake is better.
Washing processing liquid selects D19b developer solution and F5 stop bath, specifically fills a prescription as shown in table 2 and table 3
Table 2 D19b developer formula forms
Table 3 F5 stop bath formula forms
The result of above-mentioned experiment is as follows:
Use Compound I, II, III, IV, V in gelatin protective seam, to improve antistatic, the residual water stain and Surface glare effect of coating, specific experiment data are as shown in table 4, component parameter (mg/m
2)
The concrete addition of table 4 four kinds of different compounds
At 50 DEG C, preserve after 3 days under 79% relative humidity, test surfaces resistance and water stain, test result is as shown in table 5
Several water stain situation statistical form of surface resistance of table 5 different compound addition
As seen from the above table, be improved at antistatic property, water stain, Surface glare, introduce polyaminoester emulsion in 10#, 11#, improve Surface glare and water stain further, improve coating machine intensity, concrete outcome is as shown in table 6
The quantitative measurement of table 6 different experiments
From table 6, use polyurethane to have obvious effect for improving coating performance, but introduce Nano-meter SiO_2 on this basis
2after, Surface glare effect can be made to reach " 4 ".The particle diameter of silicasol is 6-8nm, and consumption is 5-20mg/m
2.
In previous step, use polyurethane can improve coating physical mechanical strength, but do not obtain desired result.Realize optimum by adjustment gelatin, polyurethane and hardener, concrete outcome is as shown in table 7 and table 8.
The different ratio hardener consumption of table 7 gelatin and polyurethane
Remarks: H-11 is two ethene sulfuryl propyl alcohol, and H-15 is two ethene sulfuryl propane, and H-15 and gelatin react speed very soon, should add before coating.
Test performance after 7 days preserved naturally by table 8
Post bake velocity test, test the alkali molten time (min) after naturally preserving certain hour, its result is as shown in table 9.
Table 9 hardener velocity test result
By above-mentioned experiment, reach a conclusion as follows:
1) photosensitive silve halide material be by sheet base, at least one deck sensitive emulsion layer and at least one deck hydrophilic gel protective seam form, in hydrophilic gel protective seam, photosensitive silve halide material can be made to have good antistatic behaviour, excellent adhesion strength and the surface that noresidue is water stain and highlighted after washing processing containing perfluorooctanoic acid, oleamide polyoxyethylene ether, perfluoroalkyl polyoxy vinethene, soluble polyurethane and polyoxyethylene wax.
2), in conclusion 1, the consumption of perfluorooctanoic acid is 6 ~ 20mg/m
2, optimum amount is 7mg/m
2; Oleamide polyoxyethylene ether consumption is 15 ~ 30mg/m
2, optimum amount is 20mg/m
2; Perfluoroalkyl polyoxy vinethene consumption is 10 ~ 50mg/m
2, optimum amount is 40mg/m
2; Soluble polyurethane consumption is 0.4 ~ 0.9g/m
2, optimum amount is 0.6g/m
2; Polyoxyethylene wax consumption is 80 ~ 200mg/m
2, optimum amount is 120mg/m
2.
3) photosensitive silve halide material has good antistatic property is by mentioning in conclusion 1 and conclusion 2 that used perfluorooctanoic acid, oleamide polyoxyethylene ether, perfluoroalkyl polyoxy vinethene realize.
4) photosensitive silve halide material egative film obtains highlighted surface is add silicasol realization again after adding the material described in conclusion 1 and conclusion 2, and the particle diameter of silicasol is 7nm, and consumption is 10 ~ 20mg/m
2.
5) photosensitive silve halide material has excellent adhesion strength by using polyaminoester emulsion and change hardener kind and consumption realizes jointly in protective film.The molecular weight of polyurethane is 3 ~ 100,000, and solid content is 30 ~ 40%, PH is 6.5 ~ 9.0, and applicable consumption is 0.2 ~ 0.9g/m
2, optimum amount is 0.6g/m
2.Hardener is two ethene sulfuryl propyl alcohol and the two vinyl sulfone(RemzaolHuo Xingranliaohuoxingjituan) of methyl, and consumption is respectively 12 ~ 35mg/m
2with 0 ~ 8.2mg/m
2.
6) after photosensitive silve halide material washing processing, water stain-free is significantly alleviated by the material added in conclusion 1 and conclusion 2, and realizing complete water stain-free is reducing the gelatin in protective seam on this basis.The consumption of gelatin is 1.1g/m
2.
Claims (5)
1. the ameliorative way of a photosensitive silve halide material surface property, it is characterized in that, photosensitive silve halide material be by sheet base, at least one deck sensitive emulsion layer and at least one deck hydrophilic gel protective seam form, containing perfluorooctanoic acid, oleamide polyoxyethylene ether, perfluoroalkyl polyoxy vinethene, soluble polyurethane, polyoxyethylene wax and silicasol in hydrophilic gel protective seam; The consumption of perfluorooctanoic acid is 6 ~ 20mg/m
2; Oleamide polyoxyethylene ether consumption is 15 ~ 30mg/m
2; Perfluoroalkyl polyoxy vinethene consumption is 10 ~ 50mg/m
2; Soluble polyurethane consumption is 0.4 ~ 0.9g/m
2; Polyoxyethylene wax consumption is 80 ~ 200mg/m
2; The particle diameter of silicasol is 7nm, and consumption is 10 ~ 20mg/m
2; The particle diameter of silicasol is 7nm, and consumption is 10 ~ 20mg/m
2.
2. the ameliorative way of photosensitive silve halide material surface property according to claim 1, is characterized in that, the consumption of perfluorooctanoic acid is 7mg/m
2; Oleamide polyoxyethylene ether consumption is 20mg/m
2; Perfluoroalkyl polyoxy vinethene consumption is 40mg/m
2; Soluble polyurethane consumption is 0.6g/m
2; Polyoxyethylene wax consumption is 120mg/m
2.
3. the ameliorative way of photosensitive silve halide material surface property according to claim 1 and 2, is characterized in that, containing polyaminoester emulsion and hardener in hydrophilic gel protective seam; the molecular weight of polyurethane is 3 ~ 100,000; solid content is 30 ~ 40%, PH is 6.5 ~ 9.0, and consumption is 0.2 ~ 0.9g/m
2, described hardener is two ethene sulfuryl propyl alcohol and the two vinyl sulfone(RemzaolHuo Xingranliaohuoxingjituan) of methyl, and consumption is respectively 12 ~ 35mg/m
2with 0 ~ 8.2mg/m
2.
4. the ameliorative way of photosensitive silve halide material surface property according to claim 3, is characterized in that, the consumption of polyurethane is 0.6g/m
2.
5. the ameliorative way of photosensitive silve halide material surface property according to claim 1 and 2, is characterized in that, in hydrophilic gel protective seam, the consumption of gelatin is 1.1g/m
2.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105365427A (en) * | 2015-12-25 | 2016-03-02 | 天津美迪亚影像材料有限公司 | Environment-friendly and medical laser printing film |
| CN106626861A (en) * | 2016-12-27 | 2017-05-10 | 合肥乐凯科技产业有限公司 | Film base of medical film and application of film base |
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| EP0692735A1 (en) * | 1994-07-11 | 1996-01-17 | Konica Corporation | A composite of silver halide photographic light-sensitive material and radiation fluorescent screen |
| CN1168987A (en) * | 1996-05-27 | 1997-12-31 | 富士胶片公司 | Silver halide photographic photosensitive material and its production |
| US20060024623A1 (en) * | 2002-11-20 | 2006-02-02 | Konica Minolta Photo Imaging, Inc. | Silver halide photosensitive material |
| CN101023393A (en) * | 2004-03-11 | 2007-08-22 | 富士胶片株式会社 | Photosensitive material for silver halide color photograph |
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| EP0692735A1 (en) * | 1994-07-11 | 1996-01-17 | Konica Corporation | A composite of silver halide photographic light-sensitive material and radiation fluorescent screen |
| CN1168987A (en) * | 1996-05-27 | 1997-12-31 | 富士胶片公司 | Silver halide photographic photosensitive material and its production |
| US20060024623A1 (en) * | 2002-11-20 | 2006-02-02 | Konica Minolta Photo Imaging, Inc. | Silver halide photosensitive material |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105365427A (en) * | 2015-12-25 | 2016-03-02 | 天津美迪亚影像材料有限公司 | Environment-friendly and medical laser printing film |
| CN106626861A (en) * | 2016-12-27 | 2017-05-10 | 合肥乐凯科技产业有限公司 | Film base of medical film and application of film base |
| CN106626861B (en) * | 2016-12-27 | 2019-05-07 | 合肥乐凯科技产业有限公司 | A kind of Medical film chip base and its application |
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