CN104347949B - A kind of Meta Materials - Google Patents

A kind of Meta Materials Download PDF

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Publication number
CN104347949B
CN104347949B CN201310314182.5A CN201310314182A CN104347949B CN 104347949 B CN104347949 B CN 104347949B CN 201310314182 A CN201310314182 A CN 201310314182A CN 104347949 B CN104347949 B CN 104347949B
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conductive
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conductive geometry
man
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CN104347949A (en
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不公告发明人
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Kuang Chi Institute of Advanced Technology
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Kuang Chi Innovative Technology Ltd
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Abstract

The invention provides a kind of Meta Materials, including:Multilayer conductive geometry layer, each layer in the multilayer conductive geometry layer includes substrate and multiple conductive geometries on the substrate, spacing on each layer of conductive geometry layer between adjacent conductive geometry is equal, and the spacing in the spacing and other conductive geometry layers at least one layer of conductive geometry layer between adjacent conductive geometry between adjacent conductive geometry is unequal.Present invention also offers a kind of Meta Materials, including:Multilayer conductive geometry layer, each layer in the multilayer conductive geometry layer includes substrate and multiple conductive geometries on the substrate, and the spacing among multiple conductive geometries at least one layer of conductive geometry layer in the multilayer conductive geometry layer between adjacent conductive geometry is unequal.

Description

A kind of Meta Materials
Technical field
The present invention relates to a kind of absorbing material, more particularly to a kind of Meta Materials for inhaling ripple.
Background technology
Absorbing material refers to a kind of material that can absorb the electromagnetic wave energy for projecting its surface.It is each in aircraft, guided missile etc. Kind weaponry and military installations applied atop absorbing material, it is possible to absorb and scout electric wave, reflection attenuation signal, realize to thunder The stealth effect reached, so as to break through the defence area of enemy radar.In the stealth technology to become more and more important, electromagnetic wave absorbent material into For the magic weapon in electronic countermeasure in modern military and " wuwa ".In addition, with the development of modern science and technology, electromagnetism amplitude Penetrate the influence to environment increasingly to increase, endangered to caused by health more and more noticeable.Absorbing material is administering electromagnetism It can also be played a great role in terms of pollution.
Material electromagnetic wave absorption needs good matching properties and attenuation characteristic, i.e., electromagnetic wave incident is when on material surface Material internal can be entered to greatest extent, and the electromagnetic wave for entering material internal promptly almost all can attenuate. Existing absorbing material causes mixed material to possess microwave absorbing property using the component of different materials.Such design of material is complicated And tend not to the performance requirement for meeting special occasions.
The Meta Materials being made up of medium substrate and the artificial conductive geometry that is arranged on substrate for realize it is high inhale ripple rate, Small size, absorbing material simple in construction provide direction.Fig. 1 shows a kind of design of the Meta Materials of prior art.This is super Material is made up of two layer medium substrate and the multiple conductive geometries being periodically arranged on corresponding substrate.It is specific and Speech, the spacing between conductive geometry on each laminar substrate are identicals, and conductive geometry on each laminar substrate Between spacing and other laminar substrates on spacing between conductive geometry be also identical, as shown in Figure 1.
Publication No. discloses for Chinese patent disclosed in " CN102620824 " " a kind of Terahertz frequency range adjustable multi-band wave absorber " The absorbing meta-material of periodic arrangement conduction geometry on a laminar substrate.
The Chinese patent application " electromagnetic wave absorb " of Publication No. " CN1926933 ", which discloses, a kind of includes first and the The electromagnetic wave absorb of two conductor element layers, wherein each conductor element is in x directions and the interval in y directions in the first conductor element group It is equal at the interval in x directions and y directions with each monomeric unit in the second conductor element group.
The above-mentioned conductive geometry with the arrangement of identical pitch period can only be to a frequency or the electromagnetism of narrower frequency range Ripple produces response, has the shortcomings that response band is narrow.Therefore, this area needs a kind of Meta Materials with wider response band badly.
The content of the invention
In order to solve the above problems, the invention provides a kind of Meta Materials with wider response band.
According to an aspect of the present invention, there is provided a kind of Meta Materials, including:Multilayer conductive geometry layer, the multilayer Each layer in conductive geometry layer includes substrate and multiple conductive geometries on the substrate, each layer are led Spacing on electric geometry layer between adjacent conductive geometry is equal, adjacent conductive at least one layer of conductive geometry layer Spacing in spacing and other conductive geometry layers between geometry between adjacent conductive geometry is unequal.
Further, the multiple conductive geometry on each layer of conductive geometry layer is in a first direction with second Arranged distribution on direction, multiple conductive geometries on each layer of conductive geometry layer are in the first direction and described Spacing in two direction both directions between adjacent conductive geometry is equal.
Further, the first direction is orthogonal with the second direction.
Further, the spacing on each layer in the multilayer conductive geometry layer between adjacent conductive geometry Spacing between adjacent conductive geometry on other conductive geometry layers is different.
Further, perpendicular to the multilayer conductive geometry layer by layer in the normal direction in face, the multilayer conductive Spacing gradually increase or reduction on geometry layer between adjacent conductive geometry.
Further, at least one conductive geometry in the multiple conductive geometry is to be constructed from a material that be electrically conducting The man-made structures with geometrical pattern or the man-made structures group with multiple man-made structures.
Further, the man-made structures have closed geometry pattern, non-close geometrical pattern or by various sizes of envelopes Close geometrical pattern and/or pattern that non-close geometrical pattern nesting forms.
Further, the man-made structures are to be rotated by 90 ° symmetrical structure.
Further, the man-made structures are non-rotating 90 degree of symmetrical structures.
Further, the geometrical pattern of the man-made structures is triangle, rectangle, pentagon, hexagon or ellipse.
Further, each in the multiple conductive geometry on each layer of conductive geometry layer is all people Make structure, the geometrical pattern of the man-made structures of the multiple conductive geometry is identical or the multiple conductive geometry in The pattern of the man-made structures of at least two conductive geometries is different.
Further, the line width of the geometrical pattern of the man-made structures on each layer of conductive geometry layer is identical, and different The line width of the geometrical pattern of man-made structures on conductive geometry layer is identical or different.
Further, the geometrical pattern of the man-made structures on each layer of conductive geometry layer is by various sizes of figure What nesting formed, the spacing between the various sizes of figure is identical.
Further, the substrate is ceramic material, high polymer material, ferroelectric material, ferrite material or ferromagnetic material.
Further, the base material also includes layers of reinforcement.
Further, the conductive material is metal or non-metallic conducting material.
Further, the conductive metal material is that gold, silver, copper, billon, silver alloy, copper alloy, kirsite or aluminium close Gold.
Further, the non-metallic conducting material is electrically conductive graphite, electrically conductive ink, indium tin oxide or mixes alumina Zinc.
Further, the conductive geometry layer surface covering matcoveredn.
Further, it is filled with electromagnetic consumable material between the adjacent conductive geometry layer.
The invention further relates to another Meta Materials, including:
Multilayer conductive geometry layer, each layer in the multilayer conductive geometry layer include substrate and positioned at institutes Multiple conductive geometries on substrate are stated, at least one layer of conductive geometry layer in the multilayer conductive geometry layer The multiple conductive geometry among spacing between adjacent conductive geometry it is unequal.
Further, the multiple conductive geometry on each layer of conductive geometry layer is in a first direction with second Arranged distribution on direction, for the conductive geometry layer of at least one layer, in the first direction and the second direction At least one direction on, the spacing of adjacent conductive geometry is unequal.
Further, the first direction is orthogonal with the second direction.
Further, the multiple on each layer of conductive geometry layer in the multilayer conductive geometry layer is led Spacing among electric geometry between adjacent conductive geometry is unequal.
Further, at least one conductive geometry in the multiple conductive geometry is to be constructed from a material that be electrically conducting The man-made structures with geometrical pattern or the man-made structures group with multiple man-made structures.
Further, the man-made structures have closed geometry pattern, non-close geometrical pattern or by various sizes of envelopes Close the geometrical pattern pattern formed nested with non-close geometrical pattern.
Further, the man-made structures are to be rotated by 90 ° symmetrical structure.
Further, each in the multiple conductive geometry on each layer of conductive geometry layer is all people Make structure, the geometrical pattern of the man-made structures of the multiple conductive geometry is identical or the multiple conductive geometry in The pattern of the man-made structures of at least two conductive geometries is different.
Further, the line width of the geometrical pattern of the man-made structures on each layer of conductive geometry layer is identical, and not Geometrical pattern with the man-made structures on conductive geometry layer is identical or different.
Further, the geometrical pattern of the man-made structures on each layer of conductive geometry layer is by various sizes of figure What nesting formed, the spacing between the various sizes of figure is identical.
Further, the thickness of the corresponding substrate of the multiple conductive geometry layer is identical or different.
Further, the conductive geometry layer surface covering matcoveredn.
Further, it is filled with electromagnetic consumable material between the adjacent conductive geometry layer.
Brief description of the drawings
After the detailed description of embodiment of the disclosure is read in conjunction with the following drawings, it better understood when the present invention's Features described above and advantage.In the accompanying drawings, each component is not necessarily drawn to scale, and has similar correlation properties or feature Component may have same or like reference.
Fig. 1 is the schematic diagram for the Meta Materials for showing prior art.
Fig. 2 is the schematic diagram for showing Meta Materials according to an aspect of the present invention.
Fig. 3(Including Fig. 3 A, 3B)It is the schematic diagram for showing man-made structures according to an aspect of the present invention.
Fig. 4(Including Fig. 4 A, 4B)It is the schematic diagram for showing man-made structures according to an aspect of the present invention.
Fig. 5(Including Fig. 5 A, 5B)It is the schematic diagram for showing man-made structures according to an aspect of the present invention.
Fig. 6(Including Fig. 6 A, 6B, 6C)It is the schematic diagram for showing man-made structures according to an aspect of the present invention.
Fig. 7 is the schematic diagram for the conductive geometry layer for showing Meta Materials according to an aspect of the present invention.
Fig. 8 is the schematic diagram for showing Meta Materials according to an aspect of the present invention.
Fig. 9 is the schematic diagram of the simulation result for the absorbing property for showing Meta Materials according to an aspect of the present invention.
Embodiment
Below in conjunction with the drawings and specific embodiments, the present invention is described in detail.Pay attention to, it is below in conjunction with accompanying drawing and specifically real It is only exemplary to apply the aspects of example description, and is understood not to carry out any restrictions to protection scope of the present invention.
Meta Materials are as a kind of multilayer people being made up of medium substrate and the artificial conductive geometry being arranged on substrate Work material, there is the extraordinary physical property that some natural materials do not possess.Artificial conductive geometry is in size 1/5 to 1/10 Under the yardstick of wavelength, there is electroresponse and magnetic response to extra electric field and magnetic field, so that Meta Materials are shown on the whole Imitate dielectric constant and equivalent permeability.By the pattern and/or size and by conductive geometry knot that design each conductive geometry Structure is arranged according to certain rules so that the overall electromagnetic parameter of material is arranged in certain rule.The electromagnetic parameter of rule arrangement causes Meta Materials have response macroscopically to electromagnetic wave, for example, convergence electromagnetic wave, divergent electromagnetic ripple, electromagnetic wave absorption etc..
The present invention proposes a kind of Meta Materials with wider response band.According to an aspect of the present invention, the Meta Materials Including multilayer conductive geometry layer, each of which layer conduction geometry layer includes substrate and multiple on substrate lead Electric geometry, the spacing on each layer of conductive geometry layer between adjacent conductive geometry is equal, and at least one layer is led Spacing on electric geometry layer between adjacent conductive geometry and adjacent conductive geometry knot on other conductive geometry layers Spacing between structure is unequal.
Fig. 2 shows the stereogram of Meta Materials according to an aspect of the present invention.As shown in Fig. 2 Meta Materials 200 include three The conductive geometry layer 210,220,230 of layer.Conductive geometry layer 210 includes substrate 211 and is arranged on substrate 211 Multiple conductive geometries 212, the spacing between adjacent conductive geometry 212 are identical.Two adjacent conductive geometries Spacing between 212 can refer to the distance between central point of the two conductive geometries 212.For example, this multiple conduction is several What structure 212 all at an equal pitch D1 can arrange successively on orthogonal x directions and y directions.Conductive geometry knot in Fig. 2 The arrangement mode of structure 212 is only illustrative and not restrictive.It will be understood by those skilled in the art that conductive geometry 212 Can equally spacedly it be arranged with other modes.For example, conductive geometry 212 can and first-class of non-orthogonal both direction Arranged away from ground.
Substrate 211 can be made up of ceramic material, high polymer material, ferroelectric material, ferrite material or ferromagnetic material.One In embodiment, the thickness of the substrate of each conductive geometry layer be it is equal, as shown in Figure 2.But each conductive geometry The thickness of the substrate of layer can not also wait.Conductive geometry 212 is by etching, electroplating, carve, photoetching, electronics is carved or ion Carving technology is attached on substrate 211.
Meta Materials 200 in Fig. 2 also include conductive geometry layer 220,230.Conductive geometry layer 210,220,230 It can be stacked between each other by heat pressing process.The structure of conductive geometry layer 220,230 and above-mentioned conductive geometry Structure sheaf 210 is similar, i.e., multiple conductive geometries 222 of conductive geometry layer 220 and conductive geometry layer 230 Multiple conductive geometries 232 are also equidistantly to arrange.But the adjacent conductive geometry of conductive geometry layer 220 Spacing between 222 is that the spacing between D2, and the adjacent conductive geometry 232 of conductive geometry layer 230 is D3, its Middle D1, D2, D3 are not mutually equal.Conductive geometry on each conductive geometry layer 210,220,230 enters at different pitches Row arrangement can make Meta Materials 200 produce response to multiple frequencies or the electromagnetic wave of frequency range.By designing different conductive geometry knots The response frequency range of structure enables response frequency range continuous, it is possible to achieve responds the extension of frequency range.
According to an aspect of the present invention, layer by layer in the vertical normal direction in face, each conduction is several with conductive geometry Spacing gradually increase or reduction on what structure sheaf between adjacent conductive geometry.For example, as illustrated, conductive geometry Spacing on layer 210,220,230 between adjacent conductive geometry gradually increases, i.e. D1<D2<D3.In one embodiment, lead On electric geometry layer 210,220,230 between adjacent conductive geometry between can also be away from being gradually reduced, i.e. D1>D2>D3.
Conductive geometry 212,222,232 can be the man-made structures with geometrical pattern being constructed from a material that be electrically conducting. Conductive material can be conductive metal material or non-metallic conducting material.For example, conductive metal material can be gold, silver, copper, gold Alloy, silver alloy, copper alloy, kirsite or aluminium alloy.Non-metallic conducting material can be electrically conductive graphite, electrically conductive ink, indium tin Oxide or Al-Doped ZnO.Conductive geometry 212,222,232 in Fig. 2 is the man-made structures with square pattern, so And this be only illustrative rather than it is restricted.According to concrete application demand, man-made structures can have various other patterns.
According to an aspect of the present invention, man-made structures can have closed geometry pattern.In one embodiment, closed geometry Pattern can be a figure, such as a circle or one are just(4*N)Side shape, N are positive integer.It is for example, conductive several in Fig. 2 The square geometrical pattern of what structure is a kind of closed geometry pattern.In another embodiment, closed geometry pattern can be by The different figure of multiple sizes is for example circular and/or just(4*N)The figure that side shape CMP is nested to form.Including Fig. 3 A and 3B Fig. 3 show the geometrical patterns of man-made structures according to an aspect of the present invention.As shown in figs.3 a and 3b, both artificial knots Structure respectively have by the pattern that two circular nesteds form with by two square nested patterns formed.
According to an aspect of the present invention, man-made structures can have non-close geometrical pattern.In one embodiment, non-close Geometrical pattern can be by an a figure such as circle or one just(4*N)Formed in the shape of side(4*N)Individual identical breach shape Into.Or non-close geometrical pattern can be that the different figure of multiple sizes is for example circular and/or just(4*N)Side shape is concentrically Point nesting forms, each circular and/or just(4*N)Formed in the shape of side(4*N)Individual identical breach, different circles and/or just (4*N)The breach formed in the shape of side is identical or different.Shown according to an aspect of the present invention in Fig. 4 including Fig. 4 A and 4B The geometrical pattern of man-made structures.As illustrated in figures 4 a and 4b, two kinds of man-made structures respectively have by two non-close circular nesteds and Into pattern with by the square nested pattern formed of two non-close.
According to an aspect of the present invention, during man-made structures can be with being total to by closed geometry pattern and non-close geometrical pattern The pattern that heart point nesting forms.Fig. 5 including Fig. 5 A, 5B shows the geometric graph of man-made structures according to an aspect of the present invention Case.As shown in Figure 5 A and 5B, two kinds of man-made structures have respectively the pattern that is formed by closing with the circle do not closed and by closing with The pattern for the square composition do not closed.
According to an aspect of the present invention, man-made structures can be 90 degree of rotational symmetry structures, i.e., man-made structures are around its center The novel artificial structure that point obtains after being rotated by 90 ° overlaps with former man-made structures.Man-made structures with such a characteristic show it is each to The same sex, the i.e. electromagnetic wave incident to all directions all have identical electromagnetic response.For example, there is closing shown in above-mentioned Fig. 3 Shown in man-made structures with non-close pattern and Fig. 5 shown in the man-made structures of pattern, Fig. 4 with closed geometry figure The man-made structures of the case pattern formed nested with non-close geometrical pattern CMP are all 90 degree of rotational symmetry structures.
According to an aspect of the present invention, man-made structures can also be non-90 degree rotational symmetry structure, i.e., man-made structures are around it The novel artificial structure and former man-made structures that central point obtains after being rotated by 90 ° are misaligned.Man-made structures performance with such a characteristic Go out anisotropy, i.e. the electromagnetic wave incident to all directions has different electromagnetic responses.Common non-90 degree rotational symmetry is tied The man-made structures geometrical pattern of structure has triangle, rectangle, pentagon, hexagon, ellipse etc..Fig. 6 is shown according to this The geometrical pattern of the man-made structures of the one side of invention.It is with Closed Graph respectively that three-type-person in Fig. 6 A, 6B, 6C, which makes structure, Case, the artificial knot with non-close pattern and with the closed geometry pattern pattern formed nested with non-close geometrical pattern Structure, they are all non-90 degree rotational symmetry structure simultaneously.
According to an aspect of the present invention, on each layer of conductive geometry layer the geometrical pattern of each man-made structures line width It is identical.For example, the line width of the geometrical pattern of man-made structures in Fig. 3-6 is identical.But different conductive geometries The line width of the geometrical pattern of man-made structures can be different on layer.
According to an aspect of the present invention, man-made structures can have the geometry formed by multiple various sizes of figure nestings Pattern, the spacing between these figures nested together be it is equal, as seen in figures 3-6.But different conductive geometries The spacing formed on layer between the figure of the geometrical pattern of man-made structures can be with unequal.
Return to Fig. 2, each conductive geometry 212,222,232 on each layer of conductive geometry layer 210,220,230 Each of be all the man-made structures with geometrical pattern being constructed from a material that be electrically conducting.In one embodiment, each layer of conduction The geometrical pattern of the man-made structures of each conductive geometry is all identical on geometry layer, for example, square, such as Fig. 2 institutes Show.In another embodiment, on each layer of conductive geometry layer the man-made structures of at least two conductive geometries geometry Pattern differs.
According to an aspect of the present invention, at least one conductive geometry can be tool on each layer of conductive geometry layer There is the man-made structures group of multiple man-made structures.In one example, all conductive geometry knots on each layer of conductive geometry layer Structure is all man-made structures group.Fig. 7 shows a conductive geometry layer 710, wherein each conductive geometry 712 is all to have 5 man-made structures(That is, circular pattern)Man-made structures group.In this case, it is adjacent on each layer of conductive geometry layer Conductive geometry(That is, adjacent artificial's structure group)Between spacing it is equal, but adjacent on different conductive geometry layer lead Electric geometry(That is, adjacent artificial's structure group)Between spacing it is unequal.
Adjacent conductive geometry on the conductive geometry layer of each layer of Meta Materials of the present invention is described above in association with Fig. 2 Between the equal one side of spacing.According to another aspect of the present invention, the Meta Materials include:Multilayer conductive geometry layer, Each layer includes substrate and multiple conductive geometries on the substrate, in this multilayer conductive geometry layer extremely Spacing on few one layer of conductive geometry layer between adjacent conductive geometry is unequal.
Fig. 8 shows one layer of conductive geometry layer 810 of Meta Materials according to an aspect of the present invention.Conductive geometry knot Structure layer 810 includes substrate 811 and the multiple conductive geometries 812 being arranged on substrate 811, adjacent conductive geometry Spacing between 812 is unequal.Although for illustration purposes, Fig. 8 illustrate only one layer of conductive geometry of Meta Materials Layer 810, but it should be readily apparent to one skilled in the art that the Meta Materials can include being stacked on the conductive geometry layer 810 Other conductive geometry layers together.
In one example, this multiple conductive geometry 812 can arrange successively on orthogonal x directions and y directions, Spacing on x directions between adjacent conductive geometry 812 is unequal, and adjacent conductive geometry in y-direction Spacing between 812 be also it is unequal, as shown in Figure 8.But in another example, a direction in x and y directions On, the spacing between adjacent conductive geometry 812 is unequal, and the adjacent conductive geometry 812 on other direction Between spacing be equal.The arrangement mode of conductive geometry 812 in Fig. 8 is only illustrative and not restrictive.This Art personnel are appreciated that conductive geometry 812 can equally spacedly not arranged with other modes.It is for example, conductive several What structure 212 can and non-orthogonal both direction on do not arrange at equal intervals.
Each conductive geometry 812 is by various sizes of four figures on conductive geometry layer 810 shown in Fig. 8 Two figures of the man-made structures that shape nesting forms, wherein outer layer are that non-close is round and two figures of internal layer are closed circular. Spacing on conductive geometry layer 810 between this four circles of the man-made structures of each conductive geometry 812 is equal. But can be different for different conductive geometry layers, the spacing.In addition, each led on conductive geometry layer 810 This four round line widths of the man-made structures of electric geometry 812 are equal, but can not also be waited in other embodiments.
In addition, the conductive geometry layer surface on Meta Materials outer surface can cover matcoveredn, such as damp-proof paint, modeling Seal shell etc..Also electromagnetic consumable material can be filled between adjacent conductive geometry layer, i.e., the absorptivity of electromagnetic wave is more than 50% material, so as to further improve wave-absorbing effect.
Fig. 9 is the schematic diagram of the simulation result for the absorbing property for showing the Meta Materials according to the present invention.By with CST (Computer Simulation Technology)Simulation software obtains the analogous diagram of S11 parameters.It is from fig. 9, it can be seen that electric Magnetic wave has the dough softening higher than 10-30dB between 3-16GHz, and extraordinary wave absorbtion is realized in wider frequency range Energy.
Description before offer be in order that any technical staff in this area can put into practice it is described herein Various aspects.However, it should be understood that protection scope of the present invention should be determined by the appended claims, and should not be limited to The concrete structure and component of upper explained embodiment.Those skilled in the art within the spirit and scope of the present invention, can be to each Embodiment carries out various changes and modifications, and these are changed and modification is also fallen within the scope and spirit of the invention.

Claims (18)

1. a kind of Meta Materials, including:
Multilayer conductive geometry layer, each layer in the multilayer conductive geometry layer include substrate and positioned at the bases Multiple conductive geometries on plate, the spacing on each layer of conductive geometry layer between adjacent conductive geometry is equal, Spacing at least one layer of conductive geometry layer between adjacent conductive geometry is adjacent with other conductive geometry layers Spacing between conductive geometry is unequal, perpendicular to the multilayer conductive geometry layer by layer in the normal direction in face, Spacing gradually increase or reduction on the multilayer conductive geometry layer between adjacent conductive geometry.
2. Meta Materials as claimed in claim 1, it is characterised in that the multiple conduction on each layer of conductive geometry layer Geometry arranged distribution in the first direction and a second direction, multiple conductive geometry knots on each layer of conductive geometry layer Spacing of the structure on the first direction and the second direction both direction between adjacent conductive geometry is equal.
3. Meta Materials as claimed in claim 2, it is characterised in that the first direction is orthogonal with the second direction.
4. Meta Materials as claimed in claim 1, it is characterised in that at least one conduction in the multiple conductive geometry Geometry is the man-made structures with geometrical pattern or the man-made structures with multiple man-made structures being constructed from a material that be electrically conducting Group.
5. Meta Materials as claimed in claim 4, it is characterised in that the man-made structures have closed geometry pattern, non-close Geometrical pattern or the pattern formed by various sizes of closed geometry pattern and/or non-close geometrical pattern nesting.
6. Meta Materials as claimed in claim 5, it is characterised in that the man-made structures are to be rotated by 90 ° symmetrical structure.
7. Meta Materials as claimed in claim 5, it is characterised in that the man-made structures are non-rotating 90 degree of symmetrical structures.
8. Meta Materials as claimed in claim 5, it is characterised in that the geometrical pattern of the man-made structures is triangle, four sides Shape, pentagon, hexagon or circle, ellipse.
9. Meta Materials as claimed in claim 4, it is characterised in that the multiple conduction on each layer of conductive geometry layer Each in geometry is all man-made structures, the geometrical patterns of the man-made structures of the multiple conductive geometry is identical, Or in the multiple conductive geometry the man-made structures of at least two conductive geometries pattern it is different.
10. Meta Materials as claimed in claim 4, it is characterised in that man-made structures on each layer of conductive geometry layer The line width of geometrical pattern is identical, and the line width of the geometrical pattern of the man-made structures on different conductive geometry layer is identical or not Together.
11. Meta Materials as claimed in claim 4, it is characterised in that man-made structures on each layer of conductive geometry layer Geometrical pattern is formed by various sizes of figure nesting, and the spacing between the various sizes of figure is identical.
12. Meta Materials as claimed in claim 11, it is characterised in that the substrate is ceramic material, high polymer material, ferroelectricity Material, ferrite material or ferromagnetic material.
13. Meta Materials as claimed in claim 12, it is characterised in that the substrate also includes layers of reinforcement.
14. Meta Materials as claimed in claim 4, it is characterised in that the conductive material is metal or non-metallic conducting material.
15. Meta Materials as claimed in claim 14, it is characterised in that the conductive metal material be gold, silver, copper, billon, Silver alloy, copper alloy, kirsite or aluminium alloy.
16. Meta Materials as claimed in claim 15, it is characterised in that the non-metallic conducting material is electrically conductive graphite, conduction Ink, indium tin oxide or Al-Doped ZnO.
17. Meta Materials as claimed in claim 1, it is characterised in that the conductive geometry layer surface covering matcoveredn.
18. Meta Materials as claimed in claim 1, it is characterised in that filled with electricity between the adjacent conductive geometry layer Magnetic loss consumption material.
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CN102843899B (en) * 2012-08-03 2015-09-09 深圳光启创新技术有限公司 A kind of suction ripple Meta Materials and suction wave apparatus
CN102821588B (en) * 2012-08-03 2015-07-01 深圳光启高等理工研究院 Wave absorbing material
CN102843900B (en) * 2012-08-03 2018-07-24 深圳光启创新技术有限公司 A kind of absorbing material

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