CN104317107B - Orienting ultraviolet optical radiation machine - Google Patents
Orienting ultraviolet optical radiation machine Download PDFInfo
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- CN104317107B CN104317107B CN201410505217.8A CN201410505217A CN104317107B CN 104317107 B CN104317107 B CN 104317107B CN 201410505217 A CN201410505217 A CN 201410505217A CN 104317107 B CN104317107 B CN 104317107B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
- G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
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- Nonlinear Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
The invention relates to an orienting ultraviolet optical radiation machine, which comprises a probe bar, a base plate and a power source, wherein the power source is electrically connected with the probe bar, the probe bar comprises at least one first sub-probe and at least one second sub-probe, and the base plate comprises at least one sub-interface CF-COM (compact flash - common) and at least one sub-interface Array-COM. The orienting ultraviolet optical radiation machine has the advantages that when the probe bar is arranged on the base plate, the first sub-probe is in aligned electric contact with the sub-interface CF-COM, and the second sub-probe is in aligned electric contact with the sub-interface Array-COM, so electric signals provided by the power source are transmitted to each sub-interface; meanwhile, the transmitted electric signals of the power source are shunted by the first sub-probe and the second sub-probe.
Description
Technical field
The present invention relates to LCD alignment field, more particularly to a kind of orientation ultraviolet optics irradiating machine.
Background technology
UVM (Ultraviolet Meter) is orientation ultraviolet optics irradiating machine, is by ultraviolet under conditions of power-up
Light irradiation, makes the Monomer (monomer) of addition liquid crystal form polymer, and in polyimides (polyimide, PI) alignment film table
Face forms liquid crystal pretilt angle, so as to complete LCD alignment.UVM power-up mode is that have on (Probe Bar) by by print power-up smelting
Probe and substrate on interface contraposition electrical contact, print power-up tool is powered by computer controls power supply then, so that right
Substrate is powered.
When print power-up tool is powered to substrate, electric current flows into the wire in substrate by probe.Experiment proves electric current
Size can influence life-span of probe, electric current is bigger, and the life-span of probe is shorter；Electric current is smaller, and the probe life-span is more long.However, electric
Flow through it is small board warning sensitivity can be caused poor so that board may not alarm when probe contacts bad with substrate,
Cause orientation exception；Conversely, when electric current is excessive, probe can be caused aging too fast, detecting probe surface Gold plated Layer comes off, and will also result in spy
Pin is bad with interface contact on substrate, the abnormal phenomenon of orientation.Therefore the electric current on probe need to be controlled in the reasonable scope.
Current industry, the wire in substrate is generally made of aluminium (Al) material, but Al material resistance is larger, energy consumption
It is bigger than normal.For reducing energy consumption, people attempt substituting Al materials using copper (Cu) material making the wire in substrate, i.e., so-called
Cu processing procedures.The resistance of Cu is smaller with respect to Al, is conducive to reducing energy consumption, and the aperture opening ratio of product is also relatively preferable.But Cu materials
The wire being made is smaller with respect to Al due to its resistance, when being powered up to substrate using same voltage, flows through the electric current meeting of probe
It is larger.Experiment proves that the electric current that probe is flowed through under same substrate size, Cu processing procedures is 2~3 times under Al processing procedures, so causes
The life-span of probe is shorter under Cu processing procedures, causes consumptive material expense too high, and production capacity is reduced and orientation exception easily occurs, and then influences to produce
A series of problems, such as quality of product.
The content of the invention
Regarding to the issue above, it is an object of the invention to provide a kind of orientation ultraviolet optics irradiating machine, for Cu processing procedures
Situation, shunted by the number for increasing probe so that the electric current for flowing through each probe is smaller, prevent probe because of electric current mistake
Cause the lost of life greatly.
The present invention provides a kind of orientation ultraviolet optics irradiating machine, including print powers up smelting tool, substrate and prints power-up with described
The power supply of smelting electric property connection, include on print power-up smelting tool the first probe, at least one first sub- probes, the second probe and
At least one second sub- probes, the substrate includes interface CF-COM, at least one sub-interface CF-COM, interface Array-COM
And at least one sub-interface Array-COM, the print power-up smelting tool is installed to when on the substrate, first probe with it is described
Interface CF-COM contraposition electrical contacts, the first sub- probe is aligned with the sub-interface CF-COM and made electrical contact with, second probe
Aligned with the interface Array-COM and made electrical contact with, the second sub- probe is aligned with the sub-interface Array-COM and made electrical contact with,
The electric signal that the power supply is provided is transmitted with to each interface, meanwhile, the first sub- probe and the second sub- probe are to the electricity
The electric signal of source transmission is shunted.
Wherein, also there is interface EVEN, interface ODD, interface B, interface G and interface R, the print powers up smelting on the substrate
Tool also has the 3rd probe, the 4th probe, the 5th probe, the 6th probe and the 7th probe, and the probe is electric with the power supply
Property connection, and when the print power-up smelting tool is installed on the substrate, the 3rd probe and the interface EVEN, described the
Four probes and the interface ODD, the 5th probe and the interface B, the 6th probe and the interface G and the 7th probe
It is corresponding respectively with the interface R to make electrical contact with, with to these interface transmitting telecommunications number.
Wherein, the power supply includes alternating voltage module.The alternating voltage module respectively with first probe, first
Sub- probe, the second probe and the electrical connection of the second sub- probe, and ac signal is provided to the probe, the 5th probe, the
Six probes and the 7th probe are grounded, and when the probe is corresponding with interface make electrical contact with after, first probe, the first sub- probe,
Second probe and the second sub- probe are electrically connected with the 5th probe, the 6th probe and the 7th probe by the wire in substrate,
And constitute loop.
Wherein, the power supply also include DC voltage module, the DC voltage module respectively with the 3rd probe and
4th probe is electrically connected, and provides the DC signal to the 3rd probe and the 4th probe, and the DC signal leads to
The wire transmission crossed in substrate, the Thin Film Transistor-LCD crystal switch in substrate is opened.
Wherein, the wire is copper conductor.
Wherein, the orientation ultraviolet optics irradiating machine also includes controller, the controller and the power electric connection,
To control the power supply so that the power supply sends predetermined electric signal to each probe.
Wherein, the orientation ultraviolet optics irradiating machine also includes uviol lamp group, and the uviol lamp group includes that several are purple
Outer lamp, to launch ultraviolet light.
Wherein, the described first sub- probe is equal or unequal with the number of the second sub- probe.Wherein, the print power-up smelting tool
Also include the 3rd sub- probe, the 4th sub- probe, the 5th sub- probe, the 6th sub- probe, the 7th sub- probe, the 8th sub- probe, the 9th
One or more in sub- probe；The substrate is also with sub-interface EVEN correspondingly with the 3rd sub- probe, corresponding to the 4th son
The sub-interface ODD of probe, the sub-interface B corresponding to the 5th sub- probe, the sub-interface G corresponding to the 6th sub- probe and corresponding to
One or more in the sub-interface R of seven sub- probes.
The orientation ultraviolet optics irradiating machine that the present invention is provided, the wire being made of material in substrate reduces energy consumption.
It is provided with least one sub-interface and sub-interface on the substrate simultaneously, and at least one is provided with the print power-up smelting tool
Individual first sub- probe and the second sub- probe, so as to be shunted to the electric current that the power supply is provided, and then flow through first spy
The electric current of pin, the first sub- probe, the second probe and the second sub- probe reduces, it is ensured that first probe, the first sub- probe, second
Probe and the second sub- probe can have the life-span more long.The design of the orientation ultraviolet optics irradiating machine, can effectively lift spy
In the pin life-span, reduce consumptive material expense, reduces cost；Lifting production capacity and save human cost simultaneously, reduce orientation and occur extremely, increase
Plus production stability.
Brief description of the drawings
In order to illustrate more clearly of technical scheme, the accompanying drawing to be used needed for implementation method will be made below
Simply introduce, it should be apparent that, drawings in the following description are only some embodiments of the present invention, general for this area
For logical technical staff, on the premise of not paying creative work, other accompanying drawings can also be obtained according to these accompanying drawings.
Fig. 1 is the structural representation of orientation ultraviolet optics irradiating machine provided in an embodiment of the present invention.
Fig. 2 is the circuit diagram of orientation ultraviolet optics irradiating machine provided in an embodiment of the present invention.
Fig. 3 is the circuit diagram of the orientation ultraviolet optics irradiating machine of prior art.
Specific embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation is described, it is clear that described embodiment is only a part of embodiment of the invention, rather than whole embodiments.It is based on
Embodiment in the present invention, it is every other that those of ordinary skill in the art are obtained under the premise of creative work is not made
Embodiment, belongs to the scope of protection of the invention.
Fig. 1 and Fig. 2 is referred to, the present invention provides a kind of orientation ultraviolet optics irradiating machine 100, the orientation ultraviolet
Learning irradiating machine 100 includes print power-up smelting tool 20, substrate 40 and power supply 50, include on the print power-up smelting tool 20 first probe 21,
At least one first sub- probes 22, the second probe 23 and at least one sub- probe 24, and the power supply 50 and each above-mentioned spy
Pin is electrically connected with.The substrate 40 includes interface CF-COM 41, at least one sub-interface CF-COM 42, interface Array-
The sub-interface Array-COM 44 of COM 43 and at least one, wherein, the interface CF-COM 41, sub-interface CF-COM 42, connect
Mouth Array-COM 43 and sub-interface Array-COM 44 is connected in parallel to each other.When the print power-up smelting tool 20 is installed to the substrate 40
When upper, first probe 21 aligns electrical contact, the first sub- probe 22 and the described first son with the interface CF-COM 41
The contraposition electrical contacts of interface CF-COM 42, second probe 23 and the interface Array-COM 43 contraposition electrical contacts, described the
Two sub- probes 24 make electrical contact with the second sub-interface Array-COM 44 contrapositions, so that when the power supply 50 is added by the print
When electrometallurgy tool 20 is to 40 transmitting telecommunication of substrate, the sub- probe 24 of the first sub- probe 22 and second can be to the electric signal
Shunted, the electric current of first probe 21 and second probe 23 is flowed through to reduce.
In embodiments of the present invention, also there is interface EVEN 45, interface ODD 46 on the substrate 40, interface B 47, connects
Mouth G 48 and interface R 49, accordingly, the print power-up smelting tool 20 also has the 3rd probe 25, the 4th probe 26, the 5th probe
27th, the 6th probe 28 and the 7th probe 29, the probe are electrically connected with the power supply 50, and when the print power-up smelting tool 20
It is installed to when on the substrate 40, the 3rd probe 25, the 4th probe 26, the 5th probe 27, the 6th probe 28 and the 7th are visited
Pin 29 aligns with interface EVEN 45, interface ODD 46, interface B 47, interface G 48 and interface R 49 make electrical contact with respectively, with to this
A little interfaces transmit corresponding electric signal.Wherein, the interface CF-COM 41 and sub-interface CF-COM42 is used to receive CF-COM letters
Number, the interface Array-COM 43 and sub-interface Array-COM44 is used to receive Array-COM signals, the interface
The EVEN 45 and interface ODD 46 is used to receive Gate Line signals, the interface B 47, interface G 48 and interface R 49
For receiving Date Line signals.
As shown in Fig. 2 in embodiments of the present invention, the power supply 50 includes alternating voltage module 51 and DC voltage module
52.The alternating voltage module 51 is electrically connected with the probe 23 of first probe 21 and second respectively, and to first probe
21 provide Array-COM signals (ac signal) and provide CF-COM signals (ac signal) to second probe 23,
5th probe 27, the 6th probe 28 and the 7th probe 29 are grounded, and when the probe is electrically connected with corresponding interface, institute
State the first probe 21 and the second probe 23 (the first probe 21 and the second probe 23 are in parallel) and the 5th probe 27, the 6th probe
28 and the 7th probe 29 (the 5th probe 27, the 6th probe 28 and the 7th probe 29 are in parallel) by the Cu wires in the substrate 40
Electrical connection, and constitutes loop, thus the probe 23 of first probe 21 and second and the 5th probe 27, the 6th probe 28 and
7th probe 29 forms pressure difference.Also referring to Fig. 3, under present technology, due to the probe of first probe 21 and second
The quantity of the branch road where 23 is two, and the branch road of the 5th probe 27, the 6th probe 28 and the place of the 7th probe 29
Quantity is three, from circuit analysis, flows through the size of electric current of the probe 23 of first probe 21 and second to flow through
State the electric current of the 5th probe 27, the 6th probe 28 and the 7th probe 29 1.5 times.The total current in loop as described in assuming is I, then
The size for flowing through the branch current of the probe 23 of first probe 21 and second is I/2, and flows through the 5th probe the 27, the 6th
The size of the branch current of the probe 29 of probe 28 and the 7th is I/3.It is Cu wires thus for the wire in the substrate 40
In the case of, the electric current for flowing through the probe 23 of first probe 21 and second may be caused excessive, and then cause first probe
21 and the lost of life of the second probe 23.And in embodiments of the present invention, at least one son is further provided with the substrate 40
At least one is further provided with interface CF-COM 42 and sub-interface Array-COM 44, and the print power-up smelting tool 20
First sub- probe 22 and the second sub- probe 24, so as to be shunted to electric current.Such as when the described first sub- probe 22 and the second son are visited
When the quantity of pin 24 is respectively one, then now, first probe 21, the first sub- probe 22, the second probe 23 and the second son are visited
The way of the branch road where pin 24 is 4 tunnels, and then flows through first probe 21, the first sub- probe 22, the second probe 23 and the
The electric current of two sub- probes 24 is I/4, thus first probe 21, the first sub- probe 22, the second probe 23 and the second sub- probe
24 can have the life-span more long.
It is understood that in other embodiments of the invention, the sub- probe 24 of the first sub- probe 22 and second
Number can be designed according to the actual needs, can such as be designed with two the first sub- probes 22 and two the second sub- probes 24 or its
His quantity, or the described first sub- probe 22 can be only set and the described second sub- probe 24 is not provided with, the first sub- probe 22
Number with the second sub- probe 24 can be equal also unequal, and the present invention does not do specific restriction.
In embodiments of the present invention, the DC voltage module 52 is electric with the 3rd probe 25 and the 4th probe 26 respectively
Connection, and provide the Gate Line signals (DC signal), the Gate to the 3rd probe 25 and the 4th probe 26
Line signals by the interface EVEN 45 and interface ODD 46 that are electrically connected with the 3rd probe 25 and the 4th probe 26 transmit into
Wire in the substrate 40, the Gate Line signals are used for the Thin Film Transistor-LCD (Thin in substrate 40
Film Transistor, TFT) crystal switch opening.Because the DC signal that the DC voltage module 52 is provided is only needed to
The crystal switch of TFT is opened, thus voltage need not the very big (friendship that the alternating voltage module 51 as described in about is provided
1/4~1/3 or so of stream electric signal), in the case where TFT semiconductor devices insulating properties is good, flow through the 3rd probe 25
And the 4th probe 26 current value it is smaller, the 3rd probe 25 and the 4th probe 26 will not cause the life-span to contract because electric current is excessive
It is short.
It should be noted that in other embodiments of the invention, when electric current is larger, may also set up corresponding 3rd son
Probe (corresponding to the 3rd probe 23), the 4th sub- probe of sub- probe (corresponding to the 4th probe 24) the 5th (correspond to the 3rd probe
25), the 6th sub- probe (corresponding to the 4th probe 26), the 7th sub- probe (corresponding to the 5th probe 27), the 8th sub- probe (correspondence
In the 6th probe 28), it is any one or more in the 9th sub- probe (corresponding to long probe 29), to be shunted, it is ensured that
The life-span of probe will not shorten because electric current is excessive, these structure designs within protection scope of the present invention, herein no longer
Repeat.
It should be noted that the structure design of the embodiment of the present invention is not limited only to the wire under Cu processing procedures, its is equally applicable
There is the wire that low electrical resistant material is made in other, the present invention is not specifically limited.
In embodiments of the present invention, the orientation ultraviolet optics irradiating machine 100 also includes controller 60, the controller
60 can be computer or single-chip microcomputer etc., and it is electrically connected with the print power-up smelting tool 20, and for controlling the power supply 50 so that
The power supply 50 sends predetermined electric signal to each probe.
In embodiments of the present invention, the orientation ultraviolet optics irradiating machine 100 also includes uviol lamp group 70, described ultraviolet
Lamp group 70 includes several uviol lamps, and to launch ultraviolet light, the ultraviolet light irradiates under conditions of power-up and adds liquid crystal
Monomer (monomer), and the monomer is formed polymer, formed with polyimides (polyimide, PI) alignment film surface
Liquid crystal pretilt angle, so as to complete LCD alignment.
Also referring to Fig. 1 to Fig. 2, when using, the print is powered up into smelting tool 20 and is installed on the substrate 40, and caused
Probe is aligned with the interface and made electrical contact with.Now, the controller 60 controls the print power-up smelting tool 20 of the power supply 50 pairs to enter
Row power supply, electric signal (including Array-COM signals, CF-COM signals, Gate Line signals and Date Line signals) passes through
Corresponding probe flows to corresponding interface, and the Cu wire transmissions in substrate 40, to form loop, so as to be carried out to substrate 40
Electric signal is loaded.The uviol lamp group 70 is opened, the uviol lamp group 70 launches ultraviolet light, bar of the ultraviolet light in power-up
The Monomer (monomer) for adding liquid crystal is irradiated under part, and the monomer is formed polymer, with polyimides
(polyimide, PI) alignment film surface forms liquid crystal pretilt angle, so as to complete LCD alignment.
In sum, orientation ultraviolet optics irradiating machine 100 provided in an embodiment of the present invention, uses Cu materials in substrate 40
The wire that matter is made, reduces energy consumption.At least one sub-interface CF-COM 42 and sub-interface are provided with the substrate 40 simultaneously
Array-COM 44, and at least one first sub- probes 22 and the second sub- probe 24 are provided with the print power-up smelting tool 20,
So as to be shunted to the electric current that the power supply 50 is provided, and then flow through first probe 21, first the 22, second spy of sub- probe
The electric current of the sub- probe 24 of pin 23 and second reduces, it is ensured that first probe 21, the first sub- probe 22, the second probe 23 and second
Sub- probe 24 can have the life-span more long.The design of the orientation ultraviolet optics irradiating machine 100, can effectively lift the probe longevity
Life, reduces consumptive material expense, reduces cost；Lifting production capacity and save human cost simultaneously, reduce orientation and occur extremely, increase life
Produce stability.
The above is the preferred embodiment of the present invention, it is noted that for those skilled in the art
For, under the premise without departing from the principles of the invention, some improvements and modifications can also be made, these improvements and modifications are also considered as
Protection scope of the present invention.
Claims (9)
1. a kind of orientation ultraviolet optics irradiating machine, including print powers up smelting tool, substrate and is connected with the print power-up smelting electric property
Power supply, include the first probe and the second probe on print power-up smelting tool, the substrate includes interface CF-COM and interface
Array-COM, it is characterised in that the print power-up smelting tool also includes that at least one first sub- probes and at least one second sons are visited
Pin, the substrate also includes at least one sub-interface CF-COM and at least one sub-interface Array-COM, and the interface CF-
It is connected in parallel to each other between COM, sub-interface CF-COM, sub-interface Array-COM and interface Array-COM；The print power-up smelting tool peace
Be attached to when on the substrate, first probe and the interface CF-COM contraposition electrical contact, the first sub- probe with it is described
Sub-interface CF-COM contraposition electrical contacts, second probe is aligned with the interface Array-COM and made electrical contact with, and second son is visited
Pin is aligned with the sub-interface Array-COM and made electrical contact with, and the telecommunications that the power supply is provided is transmitted with to the interface or sub-interface
Number, meanwhile, the first sub- probe and the second sub- probe are shunted to the electric signal of the power delivery.
2. orientation ultraviolet optics irradiating machine according to claim 1, it is characterised in that also there is interface on the substrate
Also there is EVEN, interface ODD, interface B, interface G and interface R, the print power-up smelting tool the 3rd probe, the 4th probe, the 5th to visit
Pin, the 6th probe and the 7th probe, the probe are electrically connected with the power supply, and when the print power-up smelting tool is installed to institute
State when on substrate, the 3rd probe and the interface EVEN, the 4th probe and the interface ODD, the 5th probe
With the interface B, the 6th probe and the interface G and the 7th probe and the interface R corresponding electrical contact respectively, with to this
A little interfaces transmit the electric signal that the power supply is provided.
3. orientation ultraviolet optics irradiating machine according to claim 2, it is characterised in that the power supply includes alternating voltage
Module, the alternating voltage module is electrically connected with first probe, the first sub- probe, the second probe and the second sub- probe respectively
Connect, and ac signal is provided to the probe, the 5th probe, the 6th probe and the 7th probe are grounded, and when the spy
After pin electrical contact corresponding with interface, first probe, the first sub- probe, the second probe and the second sub- probe are visited with the described 5th
Pin, the 6th probe and the 7th probe are electrically connected by the wire in substrate, and constitute loop.
4. orientation ultraviolet optics irradiating machine according to claim 3, it is characterised in that the power supply also includes direct current
Die block, the DC voltage module is electrically connected with the 3rd probe and the 4th probe respectively, and to the 3rd probe and
4th probe provides the DC signal, and the DC signal, will be thin in substrate by the wire transmission in substrate
Film transistor liquid crystal display crystal switch is opened.
5. orientation ultraviolet optics irradiating machine according to claim 4, it is characterised in that the wire is copper conductor.
6. orientation ultraviolet optics irradiating machine according to claim 2, it is characterised in that the orientation ultraviolet optics shines
Penetrating machine also includes controller, the controller and the power electric connection, to control the power supply so that the power supply sends pre-
Fixed electric signal is to each probe.
7. orientation ultraviolet optics irradiating machine according to claim 1, it is characterised in that the orientation ultraviolet optics shines
Penetrating machine also includes uviol lamp group, and the uviol lamp group includes several uviol lamps, to launch ultraviolet light.
8. orientation ultraviolet optics irradiating machine according to claim 1, it is characterised in that the first sub- probe and second
The number of sub- probe is equal or unequal.
9. orientation ultraviolet optics irradiating machine according to claim 2, it is characterised in that the print power-up smelting tool also includes
3rd sub- probe, the 4th sub- probe, the 5th sub- probe, the 6th sub- probe, the 7th sub- probe, the 8th sub- probe, the 9th sub- probe
In one or more；The substrate also with the sub-interface EVEN corresponding to the 3rd sub- probe, corresponding to the 4th son is visited
The sub-interface ODD of pin, the sub-interface B corresponding to the 5th sub- probe, the sub-interface G corresponding to the 6th sub- probe and corresponding to the 7th
One or more in the sub-interface R of sub- probe.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410505217.8A CN104317107B (en) | 2014-09-26 | 2014-09-26 | Orienting ultraviolet optical radiation machine |
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| CN201410505217.8A CN104317107B (en) | 2014-09-26 | 2014-09-26 | Orienting ultraviolet optical radiation machine |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108107262A (en) * | 2017-12-27 | 2018-06-01 | 深圳市华星光电技术有限公司 | Voltage measurement gauge based on HVA alignment systems |
| CN107908032A (en) * | 2017-12-28 | 2018-04-13 | 深圳市华星光电技术有限公司 | Power supply unit and orientation ultraviolet optics irradiating machine for LCD alignment |
| CN108873490A (en) * | 2018-08-27 | 2018-11-23 | 惠科股份有限公司 | Ultraviolet light orientation irradiation system and its detection device |
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| CN103135046A (en) * | 2011-12-05 | 2013-06-05 | 日本麦可罗尼克斯股份有限公司 | Inspection apparatus for semiconductor devices and chuck stage used for the inspection apparatus |
| CN102854646A (en) * | 2012-09-25 | 2013-01-02 | 深圳市华星光电技术有限公司 | Curing voltage applying device for liquid crystal substrate |
| CN103293771A (en) * | 2013-06-26 | 2013-09-11 | 深圳市华星光电技术有限公司 | Liquid crystal alignment detecting machine and method |
| CN203337959U (en) * | 2013-06-28 | 2013-12-11 | 深圳市华星光电技术有限公司 | Liquid crystal alignment control system |
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