CN104213091A - Method for improving bonding property of magnetron sputtering TiN coating on biomedical magnesium alloy surface - Google Patents

Method for improving bonding property of magnetron sputtering TiN coating on biomedical magnesium alloy surface Download PDF

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CN104213091A
CN104213091A CN201410431850.7A CN201410431850A CN104213091A CN 104213091 A CN104213091 A CN 104213091A CN 201410431850 A CN201410431850 A CN 201410431850A CN 104213091 A CN104213091 A CN 104213091A
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magnesium alloy
tin coating
alloy surface
biological medical
medical magnesium
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CN104213091B (en
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谈淑咏
章晓波
王章忠
巴志新
毛向阳
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Nanjing Institute of Technology
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Nanjing Institute of Technology
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Abstract

The invention discloses a method for improving the bonding property of a magnetron sputtering TiN coating on a biomedical magnesium alloy surface. According to the method, firstly, the biomedical magnesium alloy surface is pretreated, then, a Ti transition layer is deposited on the magnesium alloy surface through a direct-current gradient bias voltage process, the gradient bias voltage range is from zero V to minus 50 V, and finally the TiN coating is deposited on the surface of the Ti transition layer by adopting a direct-current magnetron sputtering method. According to the method, through a direct-current magnetron sputtering process, the TiN coating is successfully manufactured on the novel biomedical magnesium alloy surface, under the technological condition, gradient bias sedimentary transition is carried out on the Ti layer, and therefore the TiN coating is bonded with a substrate well, and the coating with the total thickness about 800 nm to 2.5 micrometers can be manufactured. The surface of the coating is complete, continuous and smooth, and the thickness of the coating can be coordinately controlled through the deposition time and nitrogen flow ratio. The TiN coating on the magnesium alloy surface can reduce magnesium alloy friction coefficients, and therefore the application of biomedical magnesium alloy in the medical implanted part aspect can be met.

Description

Improve the method for biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy
Technical field
The invention belongs to a kind of magnetron sputtering technique method, particularly a kind of technique of biological medical magnesium alloy surface magnetic control sputtering TiN coating, belongs to Magnesiumalloy surface modifying technical field.
Background technology
Witte etc. study discovery, and AZ series magnesium alloy is implanted after in animal body, and early response safety, and the effect with certain induction New born formation, therefore have good medical prospect, thus have opened the prelude of 21st century magnesium alloy medical research.But the soft perishable major issue being it and needing to solve of surperficial matter.Current reported medical magnesium alloy surface treatment technology mainly contains: chemical transformation, electrodip process, differential arc oxidation, organic coating, ion implantation, sol-gel method etc.Coating of magnesium alloy surface comprises bioactive ceramics (as hydroxyapatite (HA)), anode oxide film, degradable high polymer (as poly(lactic acid), PLGA, chitosan), chemical conversion film (fluorinated film, rare-earth conversion coatings), metal plating (as Ti, Zn) and inert bioceramic coating (as TiO 2, Al 2o 3, ZrO 2).Although these process for modifying surface improve the performance of Mg alloy surface, prepared coating all can not meet the application of biological medical magnesium alloy in Medical implant in bonding properties, frictional wear and mechanical property.
Nitride coatings has higher hardness, wear-resisting and solidity to corrosion, and show huge using value at biomedical sector, as TiN coating has been used to Orthopedic Clinical for many years in North America and Europe, can the orthopedics biological material such as substituting cobalt chrome molybdenum (Co-Cr-Mo) or titanium alloy (Ti6Al4V) completely, be used to hip, knee, shoulder and ankle joint.But research nitride coatings being applied to medical bio medical magnesium alloy surface but rarely has report.
Magnetron sputtering be 20 century 70s develop rapidly novel sputtering technology, there is the advantages such as high speed, low temperature, low damage, the widespread use in the industrial production of current magnetron sputtering method.Depositing temperature needed for coating prepared by magnetron sputtering is low, can meet the requirement of the low technological temperature of magnesium alloy.But adopt magnetron sputtering technique to be exactly that bonding properties can not meet the demands in the biggest problem of Mg alloy surface deposited coatings, the continuity of top coat and integrity not, therefore need further Exploration & stu dy.
Summary of the invention
Object of the present invention aims to provide a kind of method improving biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy, coating is combined with substrate well, Mg alloy surface can obtain complete, continuous, smooth coating, hard nitride coatings improves the friction and wear behavior of Mg alloy surface simultaneously, and the magnesium alloy frictional coefficient after surface treatment reduces.
Realizing technical scheme of the present invention is:
Improve the method for biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy, take biological medical magnesium alloy as substrate, first pass through direct current gradient bias voltage technique at biological medical magnesium alloy surface deposition Ti transition layer, then adopt DC magnetron sputtering method in Ti transition layer surface deposition TiN coating.
The method of described improvement biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy, biological medical magnesium alloy can be Mg-Nd-Sr-Zr.
The above-described method improving biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy, biological medical magnesium alloy can carry out surface preparation before sputtering, be specially polished in biological medical magnesium alloy surface, polishing, cleaning use nitrogen to dry up.
The above-described method improving biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy, biological medical magnesium alloy surface deposition Ti transition layer, be specifically as follows pallet biological medical magnesium alloy substrate being installed on magnetron sputtering equipment and carrying, then the pallet that magnesium alloy substrate is housed is put into sputtering chamber, sputter the metal Ti that target used is purity 99.8%, adopt direct current gradient bias method depositing Ti transition layer, namely in 0 ~-50V, bias voltage is regulated, distance during deposition between target and substrate is 60 mm, substrate by water-cooled, background vacuum 6 × 10 -4-8 × 10 -4pa, operating air pressure 0.5 Pa, dc power 150 W, argon flow amount 30 mlmin -1, regulate transition region thickness by controlling depositing time.
The above-described method improving biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy, in Ti transition layer surface deposition TiN coating, be specifically as follows under nitrogen and argon gas mixing condition, on Ti transition layer surface, by direct current reaction magnetron sputtering depositing TiN coating, distance during deposition between target and substrate is 60 mm, substrate by water-cooled, background vacuum 6 × 10 -4-8 × 10 -4pa, operating air pressure 0.5 Pa, dc power 150 W, by nitrogen throughput ratio and sputtering time cooperation control coat-thickness.
The above-described method improving biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy, wherein argon gas used or nitrogen can be high-purity argon or High Purity Nitrogen.
The above-described method improving biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy, all can deposit 2-2.5min under often kind of bias condition in described gradient bias voltage, the total depositing time of transition layer can be 10min.
The above-described method improving biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy, in described TiN coating deposition process, nitrogen flow is fixed, and can be 10 mlmin -1, by changing argon flow amount, obtaining nitrogen throughput ratio is 5% ~ 30%.
The present invention compared with prior art, by at new bio medical magnesium alloy surface gradient bias voltage depositing Ti transition layer, improve the bonding properties of magnesium alloy and magnetron sputtering TiN coating, Mg alloy surface is made to form complete, continuous, smooth coating, operating procedure is simple, depositing temperature is low, and surface treatment can make the frictional coefficient of biological medical magnesium alloy reduce.
Innovative point of the present invention is before direct current magnetron sputtering process depositing TiN coating, have employed gradient bias voltage process deposits Ti transition layer.In magnetically controlled DC sputtering process, the secondary electron that argon ion bombardment target surface produces is subject to the control of toroidal magnetic field, fortune path is elongated, thus the number of times with working gas molecular impact is added, plasma density is increased, improve magnetron sputtering speed, also improve the energy of the atom inciding substrate surface, thus can improve coating quality to a great extent.When introducing the reactant gases such as nitrogen, oxygen in sputter procedure, then target as sputter atom and gas reaction form respective compound, are direct current reaction magnetron sputtering.The present invention uses DC reactive magnetron sputtering technique depositing TiN coating; Cross Cheng Qian at magnetically controlled DC sputtering and adopt gradient bias voltage, direct current coating column process of growth can be made to produce demixing phenomenon, contribute to forming gradient-structure, thus effectively alleviate unrelieved stress, improve the bonding strength of coating and substrate.The present invention uses direct current gradient bias voltage to deposit transition Ti layer, improves the bonding properties between Biological magnesium alloy substrate and coating well.
Accompanying drawing explanation
Fig. 1 is the appearance of coat comparison diagram that ordinary method and method provided by the invention prepare, wherein a, b, c are the appearance of coat that transition layer and TiN coating all adopt DC magnetron sputtering method to obtain, the appearance of coat that the method that d provides for the embodiment of the present invention 4 prepares.
Fig. 2 is the TiN appearance of coat figure that embodiment 1-4 prepares, and wherein 1,2,3 and 4 for embodiment 1, embodiment 2, embodiment 3 and embodiment 4.
Fig. 3 is the XRD figure spectrum of the TiN coating prepared of embodiment 1-4 and biological medical magnesium alloy substrate.
Fig. 4 is the cross-sectional morphology figure of the TiN coating that embodiment 1-4 prepares, wherein (a) and (b), (c), (d) corresponding embodiment 1, embodiment 2, embodiment 3, embodiment 4 respectively.
The frictional coefficient figure of Fig. 5 TiN coating that to be embodiment 2 prepare with embodiment 4 and magnesium alloy substrate, the wherein corresponding embodiment 4 of corresponding embodiment 2, the 30% nitrogen throughput ratio of 10% nitrogen throughput ratio.
Embodiment
Do to illustrate in detail, intactly further to the present invention below in conjunction with embodiment.
The magnetic control sputtering device adopted in following examples is JGP450A2 type superhigh vacuum magnetron sputtering instrument.
Embodiment 1
(1) surface preparation of biological medical magnesium alloy
By model be the liquid honing of 400#, 600#, 800#, 1000# successively by Mg-1.87Nd-0.36Sr-0.31Zr biological medical magnesium alloy on pre-mill, until till Mg alloy surface do not have obvious cut; Then on polishing machine, diamond polishing agent is adopted to carry out polishing in the sample of milled; Sample after polishing is put into successively acetone and each ultrasonic cleaning 20min of ethanol, finally dry up with nitrogen stand-by.
(2) installation of magnesium alloy substrate
Magnesium alloy substrate through surface preparation is installed on the pallet that magnetron sputtering equipment carries, adopts stitch to carry out side and fix, not only can prevent from coming off, be also convenient to the whole surface of substrate and obtain complete coating.
(3) gradient bias voltage Ti transition layer
The pallet that magnesium alloy substrate is housed is put into sputtering chamber, sputters the metal Ti (diameter 80mm, thickness 5mm) that target used is purity 99.8%.Adopt direct current gradient bias method depositing Ti transition layer, namely gradient bias voltage is 0V/-5V/-15V/-30V/-50V, all deposits 2min under often kind of bias condition, and the total depositing time of transition layer is 10min.Distance during deposition between target and substrate is 60 mm, substrate by water-cooled, background vacuum 6 × 10 -4pa, operating air pressure 0.5 Pa, dc power 150 W, argon flow amount 30 mlmin -1(99.99% high-purity argon).
(4) magnetron sputtering deposition TiN coating
Under nitrogen (99.99% High Purity Nitrogen) and argon gas (99.99% high-purity argon) mixing condition, on gradient bias voltage Ti transition layer surface, by direct current reaction magnetron sputtering depositing TiN coating, nitrogen flow is 10 mlmin -1, argon flow amount is 190 mlmin -1, namely nitrogen throughput ratio is 5%, and distance during deposition between target and substrate is 60 mm, substrate by water-cooled, background vacuum 6 × 10 -4pa, operating air pressure 0.5 Pa, dc power 150 W, sputtering time 60min.
The outside drawing of the coating that 1 in Fig. 2 prepares for the present embodiment, wherein gained appearance of coat is slightly light golden yellow, be combined well with substrate, coatingsurface is continuous, complete, smooth, in Fig. 3, the curve of 5% is the XRD figure spectrum of the present embodiment TiN coating, show it for TiN coating, and (111) orientation is comparatively obvious, in Fig. 4, (a) is the cross-sectional morphology figure of the present embodiment TiN coating, and display coat-thickness is 2.41 μm.
Embodiment 2
The working method of step (1), step (2) as described in Example 1.
(3) gradient bias voltage Ti transition layer
The pallet that magnesium alloy substrate is housed is put into sputtering chamber, sputters the metal Ti (diameter 80mm, thickness 5mm) that target used is purity 99.8%.Adopt direct current gradient bias method depositing Ti transition layer, namely gradient bias voltage is 0V/-10V/-30V/-50V, all deposits 2.5min under often kind of bias condition, and the total depositing time of transition layer is 10min.Distance during deposition between target and substrate is 60 mm, substrate by water-cooled, background vacuum 8 × 10 -4pa, operating air pressure 0.5 Pa, dc power 150 W, argon flow amount 30 mlmin -1(99.99% high-purity argon).
(4) magnetron sputtering deposition TiN coating
Under nitrogen (99.99% High Purity Nitrogen) and argon gas (99.99% high-purity argon) mixing condition, on gradient bias voltage Ti transition layer surface, by direct current reaction magnetron sputtering depositing TiN coating, nitrogen flow is 10 mlmin -1, argon flow amount is 90 mlmin -1, namely nitrogen throughput ratio is 10%, and distance during deposition between target and substrate is 60 mm, substrate by water-cooled, background vacuum 8 × 10 -4pa, operating air pressure 0.5 Pa, dc power 150 W, sputtering time 60min.
The outside drawing of the coating that 2 in Fig. 2 prepares for the present embodiment, wherein appearance of coat is slightly dark golden yellow, be combined well with substrate, coatingsurface is continuous, complete, smooth, in Fig. 3, the curve of 10% is the XRD figure spectrum of the present embodiment TiN coating, show it for TiN coating, without obvious preferred orientation, in Fig. 4, (b) is the cross-sectional morphology figure of the present embodiment TiN coating, display coat-thickness is 2.44 μm, the TiN coating frictional coefficient figure that in Fig. 5 10% prepares for the present embodiment, shows its frictional coefficient and is about 0.2.
Embodiment 3
The working method of step (1), step (2) as described in Example 1.
(3) gradient bias voltage Ti transition layer
The pallet that magnesium alloy substrate is housed is put into sputtering chamber, sputters the metal Ti (diameter 80mm, thickness 5mm) that target used is purity 99.8%.Adopt direct current gradient bias method depositing Ti transition layer, namely gradient bias voltage is-5V/-10V/-20V/-35V/-50V, all deposits 2min under often kind of bias condition, and the total depositing time of transition layer is 10min.Distance during deposition between target and substrate is 60 mm, substrate by water-cooled, background vacuum 7 × 10 -4pa, operating air pressure 0.5 Pa, dc power 150 W, argon flow amount 30 mlmin -1(99.99% high-purity argon).
(4) magnetron sputtering deposition TiN coating
Under nitrogen (99.99% High Purity Nitrogen) and argon gas (99.99% high-purity argon) mixing condition, on gradient bias voltage Ti transition layer surface by reactive magnetron sputtering TiN coating, nitrogen flow is 10 mlmin -1, argon flow amount is 40 mlmin -1, namely nitrogen throughput ratio is 20%, and distance during deposition between target and substrate is 60 mm, substrate by water-cooled, background vacuum 7 × 10 -4pa, operating air pressure 0.5 Pa, dc power 150 W, sputtering time 60min.
The outside drawing of the coating that 3 in Fig. 2 prepares for the present embodiment, wherein appearance of coat is slightly dark golden yellow, be combined well with substrate, coatingsurface is continuous, complete, smooth, in Fig. 3, the curve of 20% is the XRD figure spectrum of the present embodiment TiN coating, show it for TiN coating, and (111) orientation is comparatively obvious, in Fig. 4, (c) is the cross-sectional morphology figure of the present embodiment TiN coating, and display coat-thickness is 1.18 μm.
Embodiment 4
The working method of step (1), step (2) as described in Example 1.
(3) gradient bias voltage Ti transition layer
The pallet that magnesium alloy substrate is housed is put into sputtering chamber, sputters the metal Ti (diameter 80mm, thickness 5mm) that target used is purity 99.8%.Adopt direct current gradient bias method depositing Ti transition layer, namely gradient bias voltage is 0V/-15V/-30V-50V, all deposits 2.5min under often kind of bias condition, and the total depositing time of transition layer is 10min.Distance during deposition between target and substrate is 60 mm, substrate by water-cooled, background vacuum 7.5 × 10 -4pa, operating air pressure 0.5 Pa, dc power 150 W, argon flow amount 30 mlmin -1(99.99% high-purity argon).
(4) magnetron sputtering deposition TiN coating
Under nitrogen (99.99% High Purity Nitrogen) and argon gas (99.99% high-purity argon) mixing condition, on gradient bias voltage Ti transition layer surface by reactive magnetron sputtering TiN coating, nitrogen flow is 10 mlmin -1, argon flow amount is 20 mlmin -1, namely nitrogen throughput ratio is about 30%, and distance during deposition between target and substrate is 60 mm, substrate by water-cooled, background vacuum 7.5 × 10 -4pa, operating air pressure 0.5 Pa, dc power 150 W, sputtering time 60min.
The outside drawing of the coating that 4 in Fig. 2 prepares for the present embodiment, wherein appearance of coat is slightly dark golden yellow, be combined well with substrate, coatingsurface is continuous, complete, smooth, in Fig. 3, the curve of 30% is the XRD figure spectrum of the present embodiment TiN coating, show it for TiN coating, and (111) orientation is comparatively obvious, in Fig. 4, (d) is the cross-sectional morphology figure of the present embodiment TiN coating, display coat-thickness is 923nm, the TiN coating frictional coefficient figure that in Fig. 5 30% prepares for the present embodiment, showing its frictional coefficient is about 0.35.
Above embodiment is that method provided by the invention improves biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy, result shows, by at new bio medical magnesium alloy surface gradient bias voltage depositing Ti transition layer, improve the bonding properties of magnesium alloy and magnetron sputtering TiN coating, Mg alloy surface is made to form complete, continuous, smooth coating, operating procedure is simple, and depositing temperature is low, and surface treatment can make the frictional coefficient of biological medical magnesium alloy reduce.In addition, also carry out biological medical magnesium alloy surface magnetic control sputtering TiN coating by the method for routine, contrast with method provided by the invention, the results are shown in Figure 1, wherein a, b, c all adopts Deposited By Dc Magnetron Sputtering Ti transition layer and TiN coating, d is the coating that the embodiment of the present invention 4 obtains, can be clear that, the coating obtained in a, b, c is discontinuous, imperfect, poor with substrate bonding properties, and the coating that the present invention prepares is continuous, complete, smooth surface, and be combined well with substrate.

Claims (8)

1. improve the method for biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy, it is characterized in that, take biological medical magnesium alloy as substrate, first pass through direct current gradient bias voltage technique at biological medical magnesium alloy surface deposition Ti transition layer, then adopt DC magnetron sputtering method in Ti transition layer surface deposition TiN coating.
2. the method improving biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy according to claim 1, it is characterized in that, biological medical magnesium alloy is Mg-Nd-Sr-Zr.
3. the method improving biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy according to claim 1 and 2, it is characterized in that, biological medical magnesium alloy carries out surface preparation before sputtering, polished in biological medical magnesium alloy surface, polishing, cleaning use nitrogen to dry up.
4. the method improving biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy according to claim 1, it is characterized in that, the deposition process of described Ti transition layer biological medical magnesium alloy substrate is installed on the pallet that magnetron sputtering equipment carries, then the pallet that magnesium alloy substrate is housed is put into sputtering chamber, sputter the metal Ti that target used is purity 99.8%, adopt direct current gradient bias method depositing Ti transition layer, namely in 0 ~-50V, bias voltage is regulated, distance during deposition between target and substrate is 60 mm, substrate is by water-cooled, background vacuum 6 × 10 -4-8 × 10 -4pa, operating air pressure 0.5 Pa, dc power 150 W, argon flow amount 30 mlmin -1, regulate transition region thickness by controlling depositing time.
5. the method improving biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy according to claim 1, it is characterized in that, the deposition process of TiN coating is under nitrogen and argon gas mixing condition, on Ti transition layer surface, by direct current reaction magnetron sputtering depositing TiN coating, distance during deposition between target and substrate is 60 mm, substrate by water-cooled, background vacuum 6 × 10 -4-8 × 10 -4pa, operating air pressure 0.5 Pa, dc power 150 W, by nitrogen throughput ratio and sputtering time cooperation control coat-thickness.
6. the method for the improvement biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy according to claim 4 or 5, it is characterized in that, wherein argon gas used or nitrogen are high-purity argon or High Purity Nitrogen.
7. the method improving biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy according to claim 4, it is characterized in that, all deposit 2-2.5min under often kind of bias condition in described gradient bias voltage, the total depositing time of transition layer is 10min.
8. the method improving biological medical magnesium alloy surface magnetic control sputtering TiN coating adhesion energy according to claim 5, it is characterized in that, in described TiN coating deposition process, nitrogen flow is fixed as 10 mlmin -1, by changing argon flow amount, obtaining nitrogen throughput ratio is 5% ~ 30%.
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CN114807839A (en) * 2022-04-25 2022-07-29 南昌大学 Stepped degradation magnesium alloy barrier film for dentistry and preparation method thereof
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