CN104155816A - Array substrate and display panel with same - Google Patents
Array substrate and display panel with same Download PDFInfo
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- CN104155816A CN104155816A CN201410443122.8A CN201410443122A CN104155816A CN 104155816 A CN104155816 A CN 104155816A CN 201410443122 A CN201410443122 A CN 201410443122A CN 104155816 A CN104155816 A CN 104155816A
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- 239000000758 substrate Substances 0.000 title abstract description 8
- 230000000007 visual effect Effects 0.000 abstract description 12
- 238000000034 method Methods 0.000 description 11
- 238000013461 design Methods 0.000 description 10
- 230000001154 acute effect Effects 0.000 description 9
- 239000004973 liquid crystal related substance Substances 0.000 description 9
- 238000005530 etching Methods 0.000 description 7
- 239000010409 thin film Substances 0.000 description 5
- 238000011161 development Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000007769 metal material Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000002161 passivation Methods 0.000 description 3
- 238000001039 wet etching Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000012940 design transfer Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
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- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
Abstract
The invention discloses an array substrate and a display panel with the array substrate. The array substrate comprises a plurality of pixel units, each pixel unit comprises a pixel area formed by scanning lines and data lines and a pixel electrode configured on the pixel area, patterns of the pixel electrodes comprise first slot patterns and second slot patterns, the first slot patterns comprise a plurality of slot patterns in different directions, the second slot patterns form radial patterns connected with the first slot patterns, and the centers of the second slot patterns are the centers of the pixel areas. The array substrate can meet the needs for the all-dimensional visual angle without reducing the opening rate.
Description
Technical field
The present invention relates to technical field of liquid crystal display, relate in particular to a kind of array base palte and possess the display panel of this array base palte.
Background technology
Along with the development of information society, people have obtained growth to the demand of display device, thereby have also promoted the fast development of LCD board industry.The demonstration specification of display panels, constantly towards large scale development, shows the visual angle problem under specification in order to overcome large scale, and the wide viewing angle technology of display panels also must be progressive.
Relative with the state of orientation simplification of traditional TN type liquid crystal, multidomain (Multi-domain, MD) pattern is that a pixel region is divided into multiple farmlands, liquid crystal corresponding to each farmland pressed different orientation and arranged, thereby form the wide viewing angle design of multiple different oriented regions, this wide viewing angle design generally has four domain modes and eight domain modes.
Fig. 1 is the structural representation of pixel cell in TFT-LCD array in prior art.This pixel cell comprises sweep trace 11, data line 13, on-off element 15 and pixel electrode 17, and on-off element 15 passed through 14 holes and is connected with pixel electrode 17.As can be seen from Figure 1, this pixel region is split into four farmlands, and under this four domain mode, liquid crystal is after powering up, and the liquid crystal molecule on each farmland rotates towards four direction respectively.
In addition, eight domain modes of the prior art are mainly by the pressure reduction of He Ci pixel region, main pixel region, make the rotation amount difference of the liquid crystal on every farmland in each pixel region (Huo Ci pixel region, main pixel region).
The present inventor is realizing in process of the present invention, find that prior art at least exists following technological deficiency: although the design of the wide viewing angle of this multidomain can obtain the effect that increases visual angle to a certain extent, but no matter be that four domain modes or eight are raised pattern, in direction, all can only realize visual angle, four orientation, cannot realize omnibearing visual angle.
Therefore, proposing a kind of novel wide viewing angle design that can realize omnibearing visual angle, is one of problem of endeavouring of industry.
Summary of the invention
One of technical matters to be solved by this invention is that a kind of array base palte need to be provided, and it can realize omnibearing visual angle.In addition, also provide a kind of display panel that possesses this array base palte.
1) in order to solve the problems of the technologies described above, the invention provides a kind of array base palte, comprise multiple pixel cells, each described pixel cell comprises: the pixel region being made up of sweep trace and data line; Be disposed at the pixel electrode of described pixel region, the pattern of described pixel electrode is formed as having the first slit pattern and the second slit pattern, described the first slit pattern and described the second slit pattern are made up of the interval between pixel electrode line and pixel electrode line, wherein, described the first slit pattern comprises the multiple slit pattern that are different directions, described the second slit pattern is formed as the radiate pattern joining with described the first slit pattern, the center that its center is described pixel region.
2) the of the present invention the 1st) a preferred implementation in, at described pixel region, while be square, described the first slit pattern comprises four slit pattern that are positioned at the angle part of described pixel region; Described the second slit pattern is connected to described pixel region and joins with four slit pattern radial circular loop pattern or radial polygon pattern in being.
3) the of the present invention the 1st) or the 2nd) a preferred implementation in, described radial circular loop pattern comprises that the pixel electrode line of the annular that the diameter in multiple same centers of circle reduces gradually and two are orthogonal to the rectilinear pixel electrode line in this center of circle.
4) the of the present invention the 1st)-3) in a preferred implementation of any one, the shared Area Ratio of described the second slit pattern is 50%~80%.
5) the of the present invention the 1st)-4) in a preferred implementation of any one, the direction of each of described multiple slit pattern equates with the direction angulation of described sweep trace.
6) on the other hand, the present invention also provides a kind of display panel, comprises array base palte, and this array base palte comprises multiple pixel cells, and each described pixel cell comprises: the pixel region being made up of sweep trace and data line; Be disposed at the pixel electrode of described pixel region, the pattern of described pixel electrode is formed as having the first slit pattern and the second slit pattern, described the first slit pattern and described the second slit pattern are made up of the interval between pixel electrode line and pixel electrode line, wherein, described the first slit pattern comprises the multiple slit pattern that are different directions, described the second slit pattern is formed as the radiate pattern joining with described the first slit pattern, the center that its center is described pixel region.
7) the of the present invention the 6th) a preferred implementation in, at described pixel region, while be square, described the first slit pattern comprises four slit pattern that are positioned at the angle part of described pixel region; Described the second slit pattern is connected to described pixel region and joins with four slit pattern radial circular loop pattern or radial polygon pattern in being.
8) the of the present invention the 6th) or the 7th) a preferred implementation in, described radial circular loop pattern comprises that the pixel electrode line of the annular that the diameter in multiple same centers of circle reduces gradually and two are orthogonal to the rectilinear pixel electrode line in this center of circle.
9) the of the present invention the 6th)-8) in a preferred implementation of any one, the shared Area Ratio of described the second slit pattern is 50%~80%.
10) the of the present invention the 6th)-9) in a preferred implementation of any one, the direction of each of described multiple slit pattern equates with the direction angulation of described sweep trace.
Compared with prior art, the one or more embodiment in such scheme can have the following advantages or beneficial effect by tool:
In embodiments of the present invention, by by the design of pixel electrode in pixel cell for comprising the first slit pattern and the second slit pattern, wherein, the first slit pattern has the multiple slit pattern that are different directions, and the second slit pattern is formed as the radiate pattern joining with the first slit pattern.By adopting the collocation design of these two kinds of patterns, can, in the situation that not sacrificing aperture opening ratio, meet the demand of omnibearing visual angle.
Other features and advantages of the present invention will be set forth in the following description, and, partly from instructions, become apparent, or understand by implementing the present invention.Object of the present invention and other advantages can be realized and be obtained by specifically noted structure in instructions, claims and accompanying drawing.
Brief description of the drawings
Above-mentioned explanation is only the general introduction of technical solution of the present invention, in order to be illustrated more clearly in technical scheme of the present invention, to the accompanying drawing of required use in embodiment or description of the Prior Art be briefly described below, accompanying drawing in description is only corresponding to specific embodiments more of the present invention, to those skilled in the art, do not paying under the prerequisite of creative work, in needs, can also obtain according to these accompanying drawings other accompanying drawing.In the accompanying drawings:
Fig. 1 is the structural representation of pixel cell in TFT-LCD array in prior art;
Fig. 2 is the structural representation of display panel according to an embodiment of the invention;
Fig. 3 is the structural representation of pixel cell according to an embodiment of the invention;
Fig. 4 is the schematic diagram of the pixel electrode of pixel cell according to another embodiment of the present invention;
Fig. 5 is the process flow diagram of the manufacture method of array base palte according to an embodiment of the invention.
Embodiment
Describe embodiments of the present invention in detail below with reference to drawings and Examples, to the present invention, how application technology means solve technical matters whereby, and the implementation procedure of reaching technique effect can fully understand and implement according to this.It should be noted that, only otherwise form conflict, each feature in each embodiment and each embodiment in the present invention can mutually combine, and the technical scheme forming is all within protection scope of the present invention.
The explanation of following embodiment is graphic with reference to what add, can be in order to the specific embodiment of implementing in order to illustrate the present invention.The direction term that the present invention mentions, for example " on ", D score, " left side ", " right side ", " upper left ", " lower-left ", " upper right ", " bottom right " etc., be only the direction with reference to annexed drawings.Therefore, the direction term of use is in order to illustrate and to understand the present invention, but not in order to limit the present invention.
In addition, for clarity, size and the thickness of the each element shown in accompanying drawing illustrate arbitrarily, the invention is not restricted to this.
To the application's embodiment be described on one side on one side with reference to accompanying drawing below.
Please refer to Fig. 2, Fig. 2 is the structural representation of display panel according to an embodiment of the invention.This display panel comprises array base palte 100, source electrode driver 200 and gate drivers 300.Array base palte 100 comprises the array and the multiple pixel 110 that are formed by many data lines (N bar data line DL1~DLN as shown in the figure) and multi-strip scanning line (M bar sweep trace GL1~GLM as shown in the figure) orthogonal configuration.Source electrode driver 200 provided data-signal is provided in array base palte 100 by many data lines that couple with it.Gate drivers 300 provided sweep signal is provided in array base palte 100 by the multi-strip scanning line coupling with it.
It should be noted that, the pixel relating to herein comprises multiple pixel cells, and each pixel cell is configured in respectively by data line and the interconnected pixel region forming of sweep trace.In this embodiment, pixel cell can be the pixel cell of the different colours such as red (R) pixel cell, green (G) pixel cell or blueness (B) pixel cell, can be as described in following multiple embodiment for the design of these pixel cells.
Fig. 3 is the structural representation of pixel cell according to an embodiment of the invention.The structure of this pixel cell is described below with reference to Fig. 3.
As shown in Figure 3, this pixel cell comprise sweep trace 21, data line 23, at least one active component 25 and be disposed at sweep trace 21 and pixel region that data line 23 forms in pixel electrode 27.Herein, sweep trace 21 and data line 23 setting interlaced with each other, and there is insulation course between sweep trace 21 and data line 23.The bearing of trend of the bearing of trend of sweep trace 21 and data line 23 is not parallel, and more preferably, the bearing of trend of sweep trace 21 is vertical with the bearing of trend of data line 23.For example, sweep trace 21 is to extend along directions X, and data line 23 is to extend along Y-direction.Based on the consideration of electric conductivity, the general metal material that uses of sweep trace 21 and data line 23.So, the invention is not restricted to this, according to other embodiment, sweep trace 21 and data line 23 also can use other conductive materials.For example, the material such as oxides of nitrogen of the oxide of the nitride of alloy, metal material, metal material, metal material.
And active component 25 can be bottom grid film transistor or top grid type thin film transistor (TFT), it comprises grid, raceway groove, source electrode and drain electrode.Active component 25 and sweep trace 21, data line 23 are electrically connected.In addition, active component 25 is electrically connected by via hole 24 and pixel electrode 27.
Especially, the pattern of pixel electrode 27 is formed as having the first slit pattern and the second slit pattern.These slit pattern are made up of the interval between pixel electrode line (black region in figure) and each pixel electrode line, wherein the first slit pattern comprises the multiple slit pattern separated from one another that are different directions, the second slit pattern is formed as the radiate pattern joining with the first slit pattern, the center that its center is pixel region.
In the time that pixel region is square, the first slit pattern comprises four slit pattern that are positioned at the angle part of pixel region, and the number of the pixel electrode line that each slit pattern comprises is more than 5.Specifically as shown in Figure 3, the first slit pattern comprises the horn shape pattern of upper left in Fig. 3, lower-left, upper right, bottom right, is marked as respectively A, B, C, D.As shown in the figure, A part becomes the first acute angle with the bearing of trend V-arrangement of sweep trace 21, B part becomes the second acute angle with the bearing of trend V-arrangement of sweep trace 21, and C part becomes the 3rd acute angle with the bearing of trend V-arrangement of sweep trace 21, and D part becomes the 4th acute angle with the bearing of trend V-arrangement of sweep trace 21.Preferably, these four acute angles of the first acute angle, the second acute angle, the 3rd acute angle and the 4th acute angle are roughly equal, for example, can be 45 °.
Fig. 3 is a preferred version of the present invention, what need to stress is, in this scheme, pixel region is roughly square, and the second slit pattern is radial circular loop pattern, in this pattern, be connected to pixel region, this radial circular loop pattern comprises that the pixel electrode line of the annular that the diameter in multiple same centers of circle reduces gradually and two are orthogonal to the rectilinear pixel electrode line in this center of circle.And the shared Area Ratio of this second slit pattern is approximately 80%.Under the ON state of additional driving voltage, the liquid crystal molecule in the second slit pattern region can be realized impartial orientation by the vergence direction within the scope of 360 °, thereby can obtain comparatively outstanding wide viewing angle characteristic.
According to the pixel cell structure shown in Fig. 3, the pattern of pixel electrode adopts two types of pattern collocation design, when realizing 360 ° of omnibearing visual angles so, also can not sacrifice aperture opening ratio owing to having designed the first slit pattern by the second slit pattern.
Certainly,, except the example shown in Fig. 3, this pixel cell can also be other structures.Fig. 4 is the schematic diagram of the pixel electrode of pixel cell according to another embodiment of the present invention, and wherein Fig. 4 has omitted the parts such as sweep trace, data line, on-off element, has only drawn briefly pixel region.
In Fig. 4, the shared Area Ratio of the second slit pattern is approximately 50%.Compare the embodiment shown in Fig. 3, radial annulus pattern in Fig. 4 is connected to pixel region in not, that is to say, between the outer shroud of diameter maximum of this radial annulus pattern and the four edges of pixel region, also there is certain distance, in addition, four horn shape patterns of this radial annulus pattern and the first slit pattern join.In the case, the area shared due to the second slit pattern reduces, and then the pixel electrode line of the horn shape pattern that forms the first slit pattern is increased, be for example 9 in figure, still, so can not affect aperture opening ratio yet, and, in this example, under the ON state of additional driving voltage, the vergence direction of liquid crystal molecule in the second slit pattern region within the scope of 360 ° realized impartial orientation, thereby also can obtain comparatively desirable wide viewing angle characteristic.
Certainly, above-mentioned two kinds of pixel cells are only two embodiment, as long as can make liquid crystal molecule at 360 ° under the state of additional driving voltage or to approach the scope of 360 ° tilted by the second slit pattern, shape and the area occupied of the second slit pattern are not construed as limiting.In one embodiment, the second slit pattern can also be radial rotund regular polygon that connects.And preferably, the shared Area Ratio of the second slit pattern is 50%~80%.
In addition, in the time that pixel region is roughly rectangle, the second slit pattern is connected to the radial pattern of oval shapes of this pixel region in can being, also can realize the roughly effect at 360 ° of visual angles.
One of value is carried, and in the present invention, the structure of pixel cell is not limited to layout structure as shown in Figure 3.Other pixel cells with He Ci pixel region, main pixel region adopt principle of the present invention can be applied to the present invention with layout type or the framework of real effect of wide angle.In order to explain the present invention, mainly illustrate as an example of the pixel cell structure of Fig. 3 example, but the present invention is not as limit.
Fig. 5 is the manufacture method process flow diagram of array base palte according to an embodiment of the invention, how to describe manufacturing array substrate in detail below with reference to Fig. 5.
Step S510 forms grid, gate insulator, the active layer being made up of amorphous silicon layer and ohmic contact layer, source electrode and drain electrode, passivation layer on active layer and is positioned at the passivation layer via hole forming above drain electrode and on passivation layer on substrate.
Step S520 deposits ito thin film, and be coated with photoresistance on ito thin film on the substrate of completing steps S510, utilize exposure sources by the design transfer on mask plate to photoresistance.
It should be noted that, photoresistance is a kind ofly can irradiate the material that carries out sensitization to ultraviolet ray.When ultraviolet ray by mask plate without visuals, while being irradiated on photoresistance, will there is chemical reaction in the photoresistance being irradiated to, this process is called exposure.The photoresistance that chemical reaction occurs is soaked and removed in imaging liquid, and this process is called development.After overexposure and developing, the figure on mask plate has been transferred on photoresistance, and in this step, the thickness of photoresist layer is at 1.5 μ m ± 0.5 μ m.
Pattern on this mask plate comprises the first slit pattern and the second slit pattern.The first slit pattern comprises the slit pattern that is the multiple directions of different angles with the direction of sweep trace, and the second slit pattern is formed as the radial circular loop pattern of joining with the border of the slit pattern of multiple directions.
S530, utilizes wet etching that the ito thin film not covered by photoresistance is etched away.
This step is the process selectively removing to ito thin film layer.
Generally, etching is divided into the wet etching that uses etching solution and the dry etching that uses etching gas, according to the difference of the material of sedimentary deposit, etching liquid or etching gas is selected.Be wet etching due to what adopt in this step, therefore need to select suitable etching solution to carry out etching.
S540, peels off photoresistance and obtains pixel electrode pattern as shown in Figure 3 or Figure 4, and then completes the making of array base palte.
Photoresistance, as a kind of macromolecular material, helps out in the process that forms metallic pattern, after pattern forms, need to be peeled off.
In sum, the embodiment of the present invention by the design of pixel electrode in pixel cell for comprising the first slit pattern and the second slit pattern, wherein, the first slit pattern has the multiple slit pattern that are different directions, the radiate pattern that is connected to pixel region in the second slit pattern is formed as and joins with the first slit pattern.By adopting the collocation design of these two kinds of patterns, can, in the situation that not sacrificing aperture opening ratio, meet the demand of omnibearing visual angle.
The above; be only preferably embodiment of the present invention, but protection scope of the present invention is not limited to this, any those skilled in the art are in technical scope disclosed in this invention; the variation that can expect easily or replacement, within all should being encompassed in protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of claim.
Claims (10)
1. an array base palte, comprises multiple pixel cells,
Each described pixel cell comprises:
The pixel region being formed by sweep trace and data line;
Be disposed at the pixel electrode of described pixel region, the pattern of described pixel electrode is formed as having the first slit pattern and the second slit pattern, and described the first slit pattern and described the second slit pattern are made up of the interval between pixel electrode line and pixel electrode line,
Wherein, described the first slit pattern comprises the multiple slit pattern that are different directions, and described the second slit pattern is formed as the radiate pattern joining with described the first slit pattern, the center that its center is described pixel region.
2. array base palte according to claim 1, is characterized in that,
In the time that described pixel region is square, described the first slit pattern comprises four slit pattern that are positioned at the angle part of described pixel region;
Described the second slit pattern is connected to described pixel region and joins with four slit pattern radial circular loop pattern or radial polygon pattern in being.
3. array base palte according to claim 2, is characterized in that,
Described radial circular loop pattern comprises that the pixel electrode line of the annular that the diameter in multiple same centers of circle reduces gradually and two are orthogonal to the rectilinear pixel electrode line in this center of circle.
4. array base palte according to claim 1, is characterized in that,
The shared Area Ratio of described the second slit pattern is 50%~80%.
5. according to the array base palte described in any one in claim 1-4, it is characterized in that,
The direction of each of described multiple slit pattern equates with the direction angulation of described sweep trace.
6. a display panel, is characterized in that, comprises array base palte,
This array base palte comprises multiple pixel cells, and each described pixel cell comprises:
The pixel region being formed by sweep trace and data line;
Be disposed at the pixel electrode of described pixel region, the pattern of described pixel electrode is formed as having the first slit pattern and the second slit pattern, and described the first slit pattern and described the second slit pattern are made up of the interval between pixel electrode line and pixel electrode line,
Wherein, described the first slit pattern comprises the multiple slit pattern that are different directions, and described the second slit pattern is formed as the radiate pattern joining with described the first slit pattern, the center that its center is described pixel region.
7. display panel according to claim 6, is characterized in that,
In the time that described pixel region is square, described the first slit pattern comprises four slit pattern that are positioned at the angle part of described pixel region;
Described the second slit pattern is connected to described pixel region and joins with four slit pattern radial circular loop pattern or radial polygon pattern in being.
8. display panel according to claim 7, is characterized in that,
Described radial circular loop pattern comprises that the pixel electrode line of the annular that the diameter in multiple same centers of circle reduces gradually and two are orthogonal to the rectilinear pixel electrode line in this center of circle.
9. display panel according to claim 6, is characterized in that,
The shared Area Ratio of described the second slit pattern is 50%~80%.
10. according to the display panel described in any one in claim 6-9, it is characterized in that,
The direction of each of described multiple slit pattern equates with the direction angulation of described sweep trace.
Priority Applications (2)
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CN201410443122.8A CN104155816B (en) | 2014-09-02 | 2014-09-02 | Array substrate and display panel with same |
PCT/CN2014/086861 WO2016033834A1 (en) | 2014-09-02 | 2014-09-18 | Array substrate and display panel provided with array substrate |
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CN104714329A (en) * | 2015-03-18 | 2015-06-17 | 深圳市华星光电技术有限公司 | Display panel and display device |
CN105404057A (en) * | 2015-12-25 | 2016-03-16 | 深圳市华星光电技术有限公司 | Liquid crystal display panel |
CN107589602A (en) * | 2017-10-17 | 2018-01-16 | 深圳市华星光电半导体显示技术有限公司 | A kind of liquid crystal display panel with Novel pixel design |
CN108139590A (en) * | 2015-09-12 | 2018-06-08 | 兰斯维克托公司 | Liquid crystal beam control device and manufacturing method |
CN111983856A (en) * | 2020-08-10 | 2020-11-24 | 深圳市华星光电半导体显示技术有限公司 | Liquid crystal display panel and liquid crystal display device |
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