CN104146706B - Waveform drawing method and device and medical apparatus - Google Patents
Waveform drawing method and device and medical apparatus Download PDFInfo
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- CN104146706B CN104146706B CN201410385972.7A CN201410385972A CN104146706B CN 104146706 B CN104146706 B CN 104146706B CN 201410385972 A CN201410385972 A CN 201410385972A CN 104146706 B CN104146706 B CN 104146706B
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Abstract
The invention relates to the technical field of waveform drawing, and provides a waveform drawing method and device and a medical apparatus. The waveform drawing method includes the steps of obtaining N waveforms; obtaining waveform features of the N waveforms; setting a piece of drawing cloth; fixing a drawing area of each waveform on the drawing cloth within the range of the drawing cloth, wherein N is a natural number larger than 1, the drawing areas overlap in equal proportion or are evenly distributed at equal intervals; drawing the waveforms in the drawing areas. The drawing areas overlap in equal proportion or are evenly distributed at equal intervals, and therefore the waveforms can be distributed reasonably, and the effect of easily distinguishing the waveforms is achieved.
Description
Technical field
The present invention relates to waveform drawing technical field, more particularly to the method for waveform drawing, equipment and armarium.
Background technology
In electrocardio and monitoring arts, it is basic function that waveform shows and prints.The display of waveform and printing effect, are to comment
Sentence one of good and bad standard of electrocardiograph and monitor.Electrocardiograph detects that the waveform for obtaining on the one hand can be on display interface
Shown, on the other hand also can be recorded by monitor and be exported.Electrocardiograph can be by when drawing waveform on interface
Interface is divided into several waveform display areas, and each viewing area shows respectively the waveform of different leads so that each lead waveform
Between will not overlap, monitor can be recorded according to display interface and exported.This method is only in big display screen and big note
Use in the case of record paper, can just have good effect, because distribute sufficiently large area can to each viewing area.Little
Use in the case of display screen and/small records paper, this waveform drawing method produces many problems.For example, many ripples can be caused
Shape produces cut-off or lower cut-off so as to can not recognize, it is impossible to for medical diagnosiss, cause serious consequence.
The content of the invention
The present invention in order to solve the problems, such as prior art in waveform shut-off technology, there is provided a kind of method and dress of waveform drawing
Put, and a kind of armarium.
According to the first aspect of the embodiment of the present invention, there is provided a kind of method of waveform drawing.The method includes：Obtain N number of
The step of the step of the step of waveform, wave character of acquisition N number of waveform and setting painting canvas, the N is the nature more than 1
Number, wherein, also include：It is limited with the scope of the painting canvas, the step of the drawing area of each waveform is fixed on the painting canvas,
Wherein, the drawing area equal proportion is overlapped or uniformly arranged at equal intervals two-by-two；And, draw waveform in the drawing area
The step of.
Further preferably, the wave character includes waveform height.
Further preferably, the step of drawing area of each waveform is fixed on the painting canvas, including step：
S100, judge whether the painting canvas can place all N number of waveforms, if so, execution step S200；
S200, the drawing area for fixing on the painting canvas each passage waveform, the drawing area is equal at equal intervals two-by-two
Even arrangement.
Further preferably, step S200 includes：
S210, the height for obtaining each waveform, calculate the height summation of N number of waveform；
S220, the height for calculating the painting canvas and the difference of the height summation, obtain being spaced summation；
S230, by it is described interval summation divided by N+1, obtain interval height；
S240, the height according to waveform and the interval height determine the drawing area of each waveform.
Further preferably, the step of drawing area of each waveform is fixed on the painting canvas, including step：
S100, judge whether the painting canvas can place all N number of waveforms, if it is not, execution step S300；
S300, the drawing area for fixing on the painting canvas each waveform, the drawing area equal proportion overlapping arrangement.
Further preferably, the drawing area of waveform includes region top and sections bottom, and the waveform drawing is in the area
Between domain top and sections bottom；Step S300, including step：
S310, the region top TOP for determining first waveform drawing region1；
S320, the region top TOP for determining remaining waveform drawing regioni：TOPi= TOP1+, wherein, F1 is little
N, H are less than or equal to more than or equal to 2 more than 0, i in 1j-1For the height of -1 waveform of jth；
S330, sections bottom is determined according to region top and the height of waveform, fix the drawing area of each waveform.
Further preferably, the F1 is the height summation of the height divided by N number of waveform of painting canvas.
Further preferably, step S300 also includes step：
S340, drawing area is determined whether beyond the painting canvas, if it is not, terminating；If so, execution step S350；
S350, the region top TOP for determining remaining waveform drawing region againi：TOPi=TOP1+, wherein,
F2 is less than or equal to N, H more than or equal to 2 less than F1 more than 0, ij-1For the height of -1 waveform of jth；
The region top and the height of waveform that S360, basis determine again determines sections bottom, fixes each waveform
Drawing area.
Further preferably, the F2=F1-F3, F3=, wherein, Hei2 is that drawing area exceeds painting canvas most
Big height, HiFor the height of i-th waveform.
According to the second aspect of the embodiment of the present invention, there is provided a kind of waveform drawing device.The device includes：Waveform obtains mould
Block, for obtaining N number of waveform, wherein, the N is the natural number more than 1；The wave character being connected with waveform acquisition module is obtained
Module, for obtaining the wave character of N number of waveform；Painting canvas setting module, for setting painting canvas；Wherein, also include：Draw
Region stuck-module, for being limited with the scope of the painting canvas, fixes the drawing area of each waveform on the painting canvas, its
In, the drawing area equal proportion is overlapped or uniformly arranged at equal intervals two-by-two；And, waveform drawing module, for described
Drawing area draws waveform.
Further preferably, the wave character includes waveform height.
Further preferably, the drawing area stuck-module, including the first judging unit, computing unit and drawing area be true
Order unit；First judging unit is connected respectively with wave character acquisition module and painting canvas setting module, described for judging
Whether painting canvas can place all N number of waveforms；The computing unit is connected with first judging unit, judges first
When unit judges are to be, for counting period height；The drawing area determining unit is connected with the computing unit, for root
Determine the drawing area of each waveform according to the height and the interval height of waveform.
Further preferably, the drawing area of waveform includes region top and sections bottom, and the waveform drawing is in the area
Between domain top and sections bottom；The drawing area stuck-module, including the first judging unit, computing unit and drawing area
Determining unit；First judging unit is connected respectively with wave character acquisition module and painting canvas setting module, for judging
State whether painting canvas can place all N number of waveforms；The computing unit is connected with first judging unit, sentences first
When disconnected unit judges are no, for calculating the region top TOP in each waveform drawing regioni：TOPi= TOP1+ , its
In, TOP1For the region top in first waveform drawing region, more than or equal to 2 less than or equal to N, F1 is more than 0, H less than 1 to ij-1For
The height of -1 waveform of jth；The drawing area determining unit is connected with the computing unit, according to region top and waveform
Height determine sections bottom, fix the drawing area of each waveform.
Further preferably, the second judging unit being connected with computing unit is also included, for judging painting for N number of waveform
Whether region processed exceeds the painting canvas；When second judging unit is judged as YES, the computing unit calculates again waveform
The region top TOP of drawing areai：TOPi= TOP1+, wherein, i is less than or equal to N more than or equal to 2, and F2 is less than F1
More than 0, Hj-1For the height of -1 waveform of jth.
Further preferably, the F1 is the height summation of the height divided by N number of waveform of painting canvas.
Further preferably, the F2=F1-F3, F3=, wherein, Hei2 is maximum of the drawing area beyond painting canvas
Highly, H [i] is the height of i-th waveform.
According to the third aspect of the embodiment of the present invention, there is provided a kind of armarium.The armarium includes above-mentioned waveform
Drawing apparatus.
Present invention has the advantages that：The waveform drawing method is overlapped or equal at equal intervals two-by-two using drawing area equal proportion
Even arrangement, can play makes the rational effect of waveform arrangement, and reaches the effect for making waveform easily differentiate.
Description of the drawings
Fig. 1 is the flow chart of the waveform drawing method of the embodiment of the present invention.
Fig. 2 is the flow chart that the present embodiment determines waveform drawing region.
Fig. 3 is the particular flow sheet of step S200.
Fig. 4 is the particular flow sheet of step S300.
Fig. 5 is the waveform drawing apparatus structure schematic diagram of the embodiment of the present invention.
Fig. 6 is drawing area stuck-module structural representation.
Fig. 7 is the waveform diagram that the method for drafting of the embodiment of the present invention is drawn.
Specific embodiment
In order that the objects, technical solutions and advantages of the present invention become more apparent, it is right below in conjunction with drawings and Examples
The present invention is further elaborated.It should be appreciated that specific embodiment described herein is only to explain the present invention, and
It is not used in the restriction present invention.
The core concept of the present invention is to allow waveform equal proportion to overlap to solve the problems, such as that waveform ends, meanwhile, waveform etc.
Ratio overlaps and may also operate as making waveform arrangement reasonably act on and reach to make the easy effect differentiated of waveform.Waveform equal proportion
Overlap refers in all waveforms that it is consistent that the part that waveform is overlapped accounts for the ratio of its whole waveform height.
Fig. 1 is the flow chart of the waveform drawing method of the embodiment of the present invention.Fig. 1 is refer to, the waveform drawing method includes
Following steps：
The step of S1, acquisition N number of waveform.
This step is the basis of waveform drawing, is obtained for drawn waveform, allows drawing to have object, and what is had puts
Arrow.In this step, the N is the natural number more than 1, and the numerical value of N is not particularly limited in the present invention.For example, ecg wave form
Have 12 to lead at present, 15 lead, these waveforms just have 12 waveforms, 15 waveforms, now N be 12 either 15 or other number
Value.For patient monitor, the N is just to need to show the quantity or other numerical value of physical signs.Typically, the ripple of acquisition
Graphic data is preserved in memory in case drawing needed for ripple.
The step of S2, wave character of acquisition N number of waveform.
Wave character includes crest, trough, Interspace interval, waveform height etc. waveform parameter.The embodiment of the present invention is preferred
The wave character includes the waveform height of N number of waveform.The waveform height is that highest crest deducts minimum trough in the waveform
The difference for being obtained.The waveform height of acquisition is used to determine the drawing area size of each waveform.
The step of S3, setting painting canvas.
A painting canvas is set in this step, for display or wave recording.The painting canvas can be used as display circle of waveform
Face can be used as the recording sheet of waveform recording.For armarium, the size of its painting canvas is fixed, usable range
It is limited.As shown in fig. 7, the painting canvas 100 includes effectively drawing ripple region 110（Abbreviation effective coverage）With other regions（120、
130）.Other regions（120、130）For showing title, information etc. information.Paint for waveform the effective coverage 110
System.
S4, the step of fix the drawing area of each waveform；It is limited with the scope of the painting canvas, on the painting canvas each is fixed
The drawing area of waveform, wherein, the drawing area equal proportion is overlapped or uniformly arranged at equal intervals two-by-two.
Waveform shown by armarium typically adopts roller display mode.Therefore, correspondence is exactly by picture on painting canvas
Cloth is divided into different drawing areas, and each drawing area is used to showing or drawing a waveform（For example show that II leads electrocardio
Waveform）.Drawing area is one-to-one with waveform, and each waveform has corresponding drawing area.Typically, the drafting area
The arrangement in domain be mostly from top to bottom, longitudinal arrangement.Therefore, the height of painting canvas just influences whether number and the row of drawing area
Cloth.So, in the present embodiment, it is limited with the scope of the painting canvas（I.e. using the height of painting canvas as restrictive condition or constraint bar
Part）, certainly in other embodiments, it may be possible to which the width of painting canvas is used as restrictive condition or constraints.Therefore, in this enforcement
In example, the waveform height in wave character just becomes another constraints.The drawing area of the present embodiment is pushed up including region
Portion and sections bottom, the waveform drawing is between region top and sections bottom.The sections bottom is that region top adds
The waveform height of the waveform.The region top is the fixed point whereabouts of the highest comprising the waveform.
Fig. 2 is the flow chart that the present embodiment determines waveform drawing region.Fig. 2 is refer to, this fixes the drafting of each waveform
The method in region, including step：
S100, judge whether the painting canvas can place all waveforms, if so, execution step S200；If it is not, performing
Step S300.In this step, by the height of the effective coverage of the painting canvas（The height of abbreviation painting canvas）With N number of waveform height summation
It is compared, if the height of the painting canvas is more than the height summation, represents that the painting canvas can place all waveforms, conversely, table
Showing can not place all waveforms.
S200, the drawing area for fixing on the painting canvas each passage waveform, the drawing area is equal at equal intervals two-by-two
Even arrangement.In the case where the painting canvas can place N number of waveform, this step can make waveform arrangement simpler, succinct and whole
Together.Fig. 3 is the particular flow sheet of step S200.Fig. 3 is refer to, step S200 is specifically included：
S210, the height for obtaining each waveform, calculate the height summation of N number of waveform；
S220, the height for calculating the painting canvas and the difference of the height summation, obtain being spaced summation；
S230, by it is described interval summation divided by N+1, obtain interval height；
S240, the height according to waveform and the interval height determine the drawing area of each waveform.In the present embodiment, this
Step first, determines the region top TOP of the drawing area of first waveform1, will first waveform wave tops with should
The top of painting canvas flushes（That is TOP1=0）, then according to the height of first waveform, determine the region of first waveform
Bottom（Determine the drawing area of first waveform）.Secondly, the sections bottom of first waveform is added into interval height
Obtain the region top of Article 2 waveform（TOP2）, after, the region of the Article 2 waveform is determined according to the height of Article 2 waveform
Bottom（Determine the drawing area of Article 2 waveform）；Thus, determining the drawing area of each waveform successively.
S300, the drawing area for fixing on the painting canvas each waveform, the drawing area equal proportion is overlapped.In the picture
In the case that cloth cannot place N number of waveform, this step can make waveform arrangement simpler, succinct and neat, easily identification
And differentiation.Fig. 4 is the particular flow sheet of step S300.Fig. 4 is refer to, step S300 includes step：
S310, determine first waveform drawing area region top TOP1.Fig. 7 is refer to, in the present embodiment, by
The region top TOP of the drawing area of one waveform1Flush with the top of the painting canvas（That is region top TOP1For dotted line
111, the dotted line 111 illustrates under actual environment it is to be not in for the ease of description）, i.e. TOP1=0。
S320, the region top TOP for determining remaining waveform drawing regioni：TOPi= TOP1+ , wherein, F1
It is more than 0, H less than 1iFor the height of i-th waveform.F1 is the ratio during equal proportion is overlapped, and the size of F1 determines overlap
Part, F1 is bigger to represent that lap is less.Preferably, the F1 is the height of painting canvas divided by N number of waveform to the present embodiment
Height summation, so overlap part be minimum, be easiest to for resolution.
S330, sections bottom is determined according to region top and the height of waveform, fix the drawing area of each waveform.Often
The determination of the drawing area of individual waveform, is the region top of the drawing area of the fixed waveform first, then the basis at the top of region
On obtain waveform bottom plus waveform height, finally, the region between region top and sections bottom is the drafting area of waveform
Domain.In this step the drawing area of each waveform has overlap.Illustrate by taking first waveform as an example, first waveform
The sections bottom BOT of drawing area1For region top TOP1Plus its waveform height, the dotted line 112 in specially Fig. 7.Dotted line
Region between 111 and dotted line 112 is the drawing area of first waveform.It can also be seen that first waveform is painted from Fig. 7
Region processed has overlap with the drawing area of second waveform, and other waveforms are as the same.
S340, drawing area is determined whether beyond the painting canvas, if it is not, terminating；If so, execution step S350；This step
Rapid judgement is what is completed by determining whether the top or bottom of drawing area beyond the painting canvas.
S350, the region top TOP for determining remaining waveform drawing region againi：TOPi=TOP1+, wherein,
F2 is less than or equal to N, H more than or equal to 2 less than F1 more than 0, ij-1For the height of -1 waveform of jth；F2 is to wait ratio when determining again
Ratio in example overlap.Because ratio F1, than larger, causes part drawing area beyond the painting canvas, institute in first time determination process
The size of F2 is less than F1 during determining again, and when expression determines again, the scope of overlap is bigger.The present embodiment preferably F2 is
F1 deducts F3, wherein, F3=, wherein, Hei2 exceeds the maximum height of painting canvas, H for drawing areaiFor i-th waveform
Height.So ensure the requirement for both having met placement, the part in turn ensuring that overlap is minimum, is most held for resolution
Easily.
The region top and the height of waveform that S360, basis determine again determines sections bottom, and each ripple is fixed again
The drawing area of shape.The method of the drawing area of each waveform is fixed again as it was previously stated, repeating no more.What this determined again paints
Region processed will in step s 5 be used to draw waveform as final drawing area.
S5, the drawing area draw N number of waveform the step of.The method of waveform is drawn in drawing area to be into
Ripe prior art, does not elaborate in embodiments of the present invention.
Sequencing between step S3 and step S1, S2 is in embodiments of the present invention it is not strictly necessary that or limit
System, can be adjusted as needed.
The waveform drawing method of the embodiment of the present invention, is overlapped by equal proportion or is arranged at equal intervals, arranges can painting canvas
Cloth is attractive in appearance, easily differentiate between waveform.
Fig. 5 is the waveform drawing apparatus structure schematic diagram of the embodiment of the present invention.Fig. 5 is refer to, the waveform drawing device bag
Include waveform acquisition module 1, wave character acquisition module 2, painting canvas setting module 3, drawing area stuck-module 4 and waveform drawing mould
Block 5.
The waveform acquisition module 1, for obtaining N number of waveform.The shape information of acquisition be used to draw waveform, allow drafting work
Work has object, with a definite target in view.The N is the natural number more than 1, and the concrete numeral of N is not particularly limited in the present invention.Example
Such as, ecg wave form has at present 12 to lead, 15 lead, and these waveforms just have 12 waveforms, 15 waveforms, and now N is 12 or 15
Or it is digital for other.For patient monitor, the N can be the quantity for needing to show physical signs, or according to aobvious
Show that pattern determines.The Wave data of acquisition is preserved in memory in case drawing needed for ripple.
The wave character acquisition module 2 is connected with the waveform acquisition module 1, and the waveform for obtaining N number of waveform is special
Levy.The wave character includes crest, trough, Interspace interval, waveform height etc. waveform parameter.The embodiment of the present invention is preferably obtained
The waveform height of N number of waveform.The waveform height is that highest crest deducts the difference that minimum trough is obtained in the waveform.
Painting canvas setting module 3, for setting painting canvas；Painting canvas setting module 3 sets a painting canvas, for showing or recording
Waveform.The painting canvas can be used as the display interface of waveform or can be used as the recording sheet of waveform recording.For armarium
Speech, the size of its painting canvas is fixed, and usable range is limited.
The drawing area stuck-module 4 is connected respectively with painting canvas setting module 3 and wave character acquisition module 2, for
The scope of the painting canvas is limited, and the drawing area of each waveform is fixed on the painting canvas, wherein, the drawing area equal proportion
Overlap or uniformly arrange at equal intervals two-by-two.
The waveform drawing module 5, is connected with the drawing area stuck-module 4, for drawing waveform in the drawing area.
The waveform drawing module 5 is ripe prior art, is not illustrated in embodiments of the present invention.
Fig. 6 is refer to, the drawing area stuck-module 4, including the first judging unit 41, computing unit 42, drawing area
Determining unit 43 and second judges computing unit 42.First judging unit 41 respectively with wave character acquisition module 2 and draw
Cloth setting 3 connects, and the computing unit 42 is connected with first judging unit 41, the drawing area determining unit 43 and institute
State computing unit 42 to connect, second judging unit 42 is connected with the drawing area determining unit 43 and computing unit 42.
First judging unit 41 is connected respectively with wave character acquisition module 2 and painting canvas setting 3, described for judging
Whether painting canvas can place all N number of waveforms.First judging unit 41 is by the height of the effective coverage of the painting canvas（Referred to as
The height of painting canvas）It is compared with N number of waveform height summation, if the height of the painting canvas is more than the height summation, represents the picture
Cloth can place all waveforms, conversely, representing all waveforms can not be placed.
When first judging unit 41 is judged as YES, the computing unit 42 is used for counting period height；First, the calculating
Unit 42 calculates the height summation of N number of waveform；Then, the difference of the height with the height summation of the painting canvas is calculated,
Obtain being spaced summation；Finally, the interval summation is obtained into interval height divided by N+1.
When first judging unit 41 is judged as YES, the drawing area determining unit 43 be used for according to the height of waveform and
The interval height determines the drawing area of each waveform.The drawing area of waveform includes region top and sections bottom, described
Waveform drawing is between region top and sections bottom.The drawing area determining unit 43 determines first first waveform
The region top of drawing area, will flush at the top of the region of first waveform with the top of the painting canvas（That is TOP1=0）, so
Afterwards according to the height of first waveform, the sections bottom of first waveform is determined（Determine the drafting of first waveform
Region）.Secondly, the sections bottom of first waveform is obtained the region top of Article 2 waveform plus interval height
（TOP2）, after, the sections bottom of the Article 2 waveform is determined according to the height of Article 2 waveform（Determine Article 2 waveform
Drawing area）；Thus, determining the drawing area of each waveform successively.
When first judging unit 41 is judged as NO, the computing unit 42 is used to calculate the region top in each waveform drawing region
Portion TOPi：TOPi= TOP1+ , wherein, F1 is more than 0, H less than 1iFor the height of i-th waveform.F1 as waits ratio
Ratio in example overlap, the size of F1 determines the part of overlap, and F1 is bigger to represent that lap is less.The present embodiment is excellent
Choosing, the F1 for painting canvas height divided by N number of waveform height summation, so overlap part be it is minimum, for divide
It is easiest to for distinguishing.
When first judging unit 41 is judged as NO, the drawing area determining unit 43 is according to region top and waveform
Highly determine sections bottom, fix the drawing area of each waveform.The determination of the drawing area of each waveform, is the fixed ripple first
The region top of the drawing area of shape, then at the top of the region on the basis of obtain waveform bottom, finally, region plus waveform height
Region between top and sections bottom is the drawing area of waveform.In the present embodiment the drawing area of each waveform is that have
Overlap.
The second judging unit 44 can not also be used in certain embodiments, and the waveform so drawn is in some special feelings
Cut-off can be also produced under condition, shows incomplete.The present embodiment preferably uses the second judging unit 44, second judging unit 44 with
Whether the drawing area determining unit 43 and computing unit 42 connect, for judging the drawing area of N number of waveform beyond institute
State painting canvas.Second judging unit 44 is by whether have the region top of drawing area or sections bottom to come beyond the painting canvas
Into what is judged, if having region top or sections bottom to exceed the painting canvas, then it is assumed that have drawing area beyond painting canvas, conversely, then
Think without departing from the painting canvas.When second judging unit 44 is judged as NO, the waveform drawing device terminates to draw.
When second judging unit 44 is judged as YES, the computing unit 42 calculates again the area in waveform drawing region
Domain top TOPi：TOPi=TOP1+, wherein, F2 is less than or equal to N, H more than or equal to 2 less than F1 more than 0, ij-1For
The height of j-1 waveform；F2 is the ratio during equal proportion when determining again is overlapped.Due to ratio F1 in first time determination process
Than larger, cause part drawing area beyond the painting canvas, so the size of F2 is less than F1 when determining again, expression determines again
When, the scope of overlap is bigger.The present embodiment preferably F2 deducts F3 for F1, wherein, F3=, wherein, Hei2 is drafting
Region exceeds the maximum height of painting canvas, HiFor the height of i-th waveform.So ensure the requirement for both having met placement, in turn ensure that
The part of overlap is minimum, is easiest to for resolution.The drawing area determining unit 43 is according to the region for determining again
The height of top and waveform determines sections bottom, and the drawing area of each waveform is fixed again.Each waveform is fixed again
The method of drawing area is as it was previously stated, repeat no more.The drawing area that the waveform drawing module 5 again determines this will be used as most
Whole drawing area carries out drafting waveform.
The waveform drawing device of the embodiment of the present invention, is overlapped by equal proportion or is arranged at equal intervals, arranges can painting canvas
Cloth is attractive in appearance, easily differentiate between waveform.
The armarium of the embodiment of the present invention include ultrasound products, brain electricity product, electrocardiograph, patient monitor, fetus/
Mother's monitor and dynamic ecg etc., these equipment all waveform drawing devices with the embodiment of the present invention.Especially
It is that dynamic ecg uses the waveform drawing device of the embodiment of the present invention better.
Method above to waveform drawing provided by the present invention, device and armarium are described in detail, this
Apply specific case in text to be set forth the principle and embodiment of the present invention, the explanation of above example is only intended to
Help understands the core concept of the present invention；Simultaneously for one of ordinary skill in the art, according to the thought of the present invention, in tool
Will change in body embodiment and range of application, in sum, this specification content should not be construed as to the present invention
Restriction.
Claims (15)
1. a kind of the step of method of waveform drawing, including acquisition N number of waveform, the step of the wave character of acquisition N number of waveform
The step of rapid and setting painting canvas, the N is the natural number more than 1, and it also includes：
It is limited with the scope of the painting canvas, the step of the drawing area of each waveform is fixed on the painting canvas, wherein, it is described to paint
Region equal proportion processed is overlapped or uniformly arranged at equal intervals two-by-two；And
The step of the drawing area draws waveform；Characterized in that, fixing the drafting area of each waveform on the painting canvas
The step of domain, including step：
S100, judge whether the painting canvas can place all N number of waveforms, if so, execution step S200；
S200, the drawing area for fixing on the painting canvas each passage waveform, the drawing area is uniformly arranged at equal intervals two-by-two
Cloth.
2. the method for waveform drawing as claimed in claim 1, it is characterised in that the wave character includes waveform height.
3. the method for waveform drawing as claimed in claim 1, it is characterised in that step S200 includes：
S210, the height for obtaining each waveform, calculate the height summation of N number of waveform；
S220, the height for calculating the painting canvas and the difference of the height summation, obtain being spaced summation；
S230, by it is described interval summation divided by N+1, obtain interval height；
S240, the height according to waveform and the interval height determine the drawing area of each waveform.
4. the method for waveform drawing as claimed in claim 1, it is characterised in that the drafting of each waveform is fixed on the painting canvas
The step of region, including step：
S100, judge whether the painting canvas can place all N number of waveforms, if it is not, execution step S300；
S300, the drawing area for fixing on the painting canvas each waveform, the drawing area equal proportion overlapping arrangement.
5. the method for waveform drawing as claimed in claim 4, it is characterised in that the drawing area of waveform includes region top and area
Domain bottom, the waveform drawing is between region top and sections bottom；Step S300, including step：
S310, the region top TOP for determining first waveform drawing region1；
S320, the region top TOP for determining remaining waveform drawing regioni：TOPi=TOP1+ , wherein, F1 is big less than 1
N, H are less than or equal to more than or equal to 2 in 0, ij-1For the height of -1 waveform of jth；
S330, sections bottom is determined according to region top and the height of waveform, fix the drawing area of each waveform.
6. the method for waveform drawing as claimed in claim 5, it is characterised in that the F1 for painting canvas height divided by described N number of
The height summation of waveform.
7. the method for waveform drawing as claimed in claim 5, it is characterised in that step S300 also includes step：
S340, drawing area is determined whether beyond the painting canvas, if it is not, terminating；If so, execution step S350；
S350, the region top TOP for determining remaining waveform drawing region againi：TOPi=TOP1+ , wherein, F2 is little
N, H are less than or equal to more than or equal to 2 more than 0, i in F1j-1For the height of -1 waveform of jth；
The region top and the height of waveform that S360, basis determine again determines sections bottom, fixes the drafting of each waveform
Region.
8. the method for waveform drawing as claimed in claim 7, it is characterised in that the F2=F1-F3, F3= , wherein,
Hei2 exceeds the maximum height of painting canvas, H for drawing areaiFor the height of i-th waveform.
9. a kind of waveform drawing device, including：
Waveform acquisition module, for obtaining N number of waveform, wherein, the N is the natural number more than 1；
The wave character acquisition module being connected with waveform acquisition module, for obtaining the wave character of N number of waveform；
Painting canvas setting module, for setting painting canvas；
Wherein, also include：
Drawing area stuck-module, for being limited with the scope of the painting canvas, fixes the drafting of each waveform on the painting canvas
Region, wherein, the drawing area equal proportion is overlapped or uniformly arranged at equal intervals two-by-two；And
Waveform drawing module, for drawing waveform in the drawing area；
It is characterized in that：
The drawing area stuck-module, including the first judging unit, computing unit and drawing area determining unit；Described first
Judging unit is connected respectively with wave character acquisition module and painting canvas setting module, for judging whether the painting canvas can be placed
Whole N number of waveforms；The computing unit is connected with first judging unit, when the first judging unit is judged as YES,
For counting period height；The drawing area determining unit is connected with the computing unit, for according to the height of waveform and
The interval height determines the drawing area of each waveform.
10. waveform drawing device as claimed in claim 9, it is characterised in that the wave character includes waveform height.
11. waveform drawing devices as claimed in claim 9, it is characterised in that the drawing area of waveform includes region top and area
Domain bottom, the waveform drawing is between region top and sections bottom；The drawing area stuck-module, including first
Judging unit, computing unit and drawing area determining unit；First judging unit respectively with wave character acquisition module and
Painting canvas setting module connects, for judging whether the painting canvas can place all N number of waveforms；The computing unit and institute
The connection of the first judging unit is stated, when the first judging unit is judged as NO, for calculating the region top in each waveform drawing region
TOPi：TOPi=TOP1+ , wherein, TOP1For the region top in first waveform drawing region, it is little that i is more than or equal to 2
In equal to N, F1 is more than 0, H less than 1j-1For the height of -1 waveform of jth；The drawing area determining unit calculates single with described
Unit's connection, according to the height at region top and waveform sections bottom is determined, fixes the drawing area of each waveform.
12. waveform drawing devices as claimed in claim 11, it is characterised in that also include the second judgement being connected with computing unit
Unit, for judging the drawing area of N number of waveform whether beyond the painting canvas；It is judged as YES in second judging unit
When, the computing unit calculates again the region top TOP in waveform drawing regioni：TOPi=TOP1+ , wherein, i
N is less than or equal to more than or equal to 2, F2 is more than 0, H less than F1j-1For the height of -1 waveform of jth.
13. waveform drawing devices as claimed in claim 11, it is characterised in that the F1 is the height of painting canvas divided by described N number of
The height summation of waveform.
14. waveform drawing devices as claimed in claim 12, it is characterised in that the F2=F1-F3, F3= , wherein,
Hei2 exceeds the maximum height of painting canvas, H for drawing areaiFor the height of i-th waveform.
15. a kind of armarium, it is characterised in that including the waveform drawing device described in any one of claim 9 to 14.
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| CN106821373B (en) * | 2016-12-30 | 2020-01-24 | 武汉明德生物科技股份有限公司 | Method, system and device for locally updating and drawing electrocardiogram |
| CN111959132B (en) * | 2020-08-17 | 2021-11-16 | 厦门纳龙科技有限公司 | Electrocardiogram chest lead halving report printing method, terminal equipment and storage medium |
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| US8482564B2 (en) * | 2007-10-31 | 2013-07-09 | Tektronix, Inc. | Region overlap control for autorange/autoset functions |
| CN102090886B (en) * | 2010-12-02 | 2012-12-05 | 广东宝莱特医用科技股份有限公司 | Method for drawing and overlaying multi-channel electrocardiograph waveforms |
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