CN104111120B - Extraction method based on the phase of the shearing interferometer Ronchi - Google Patents

Extraction method based on the phase of the shearing interferometer Ronchi Download PDF

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CN104111120B
CN104111120B CN201410360070.8A CN201410360070A CN104111120B CN 104111120 B CN104111120 B CN 104111120B CN 201410360070 A CN201410360070 A CN 201410360070A CN 104111120 B CN104111120 B CN 104111120B
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吴飞斌
唐锋
王向朝
李�杰
李永
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中国科学院上海光学精密机械研究所
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Abstract

一种基于朗奇剪切干涉仪的相位提取方法,该方法采用的朗奇剪切干涉仪结构包括光源、聚焦透镜、散射光学元件、一维衍射光栅板、被测光学系统平台、棋盘光栅、二维光电传感器和计算机。 Ronchi phase extraction method based on shearing interferometer, a Ronchi shearing interferometer structure which includes a light source used, a focus lens, the optical scattering element, one-dimensional diffraction grating plate, the optical system under test platform, checkerboard grating, two-dimensional photoelectric sensors and computers. 在被测光学系统物平面和像平面分别放置一维衍射光栅和棋盘光栅,通过采集相移间隔为π/4的9幅干涉条纹图计算相位,消除朗奇剪切干涉中多级衍射光干涉对相位提取精度的影响。 The optical system measured object plane and image plane and placing a checkerboard grating dimensional diffraction grating, respectively, by taking the phase shift interference fringe spacing of FIG. 9 π / 4 phase calculation, eliminating shearing interferometer Ronchi multistage diffracted light interference accuracy of extraction phase. 本发明的相位提取方法,消除0级与±1级以外的较高级次衍射项的影响,降低波像差检测中相位提取的系统误差,提高光学系统的波像差检测精度。 Phase extraction method of the present invention eliminate the influence of other than 0 and ± 1 st order diffracted higher level terms, reducing the system error wavefront aberration detection phase extraction, to improve the detection accuracy of the aberration of the optical system of the wavefront.

Description

基于朗奇剪切干涉仪的相位提取方法 Extraction method based on the phase of the shearing interferometer Ronchi

技术领域 FIELD

[0001] 本发明涉及剪切干涉仪,特别是一种基于朗奇剪切干涉仪的相位提取方法。 [0001] The present invention relates to a shearing interferometer, in particular a Ronchi phase extraction method based on shearing interferometer.

背景技术 Background technique

[0002] 朗奇剪切干涉是一种采用了扩展光源调制光场空间相干性的剪切干涉,具有不需要单独的理想参考波面、易实现共光路干涉、没有空间光程误差、检测精度高、灵敏度高等优点。 [0002] Ronchi shearing interferometry using a shearing interferometer coherence extended light source modulated light field space, with no separate reference wave over the surface, easy to implement common path interferometer, the optical path without an error, the detection accuracy of the high spatial and high sensitivity. 朗奇剪切干涉引入了相移干涉技术,通过横向移动光栅,在剪切波面和〇级波面之间引入稳定的相位差,通过改变相移量得到多幅干涉图,计算被测相位分布,求出被测光学系统波像差。 Lucky shearing interferometer introduces phase-shifting interferometry techniques, by laterally moving grating, between the surface shear wave and a square wave surface level stably introduced phase difference, the phase shift amount obtained by varying the plurality of interferograms, calculating the measured phase distribution, obtaining the wavefront aberration of the optical system under test. 为了获得原始波前,需要对干涉图进行相位提取,相位提取是干涉测量的重要步骤,相位提取精度直接影响到最终的检测精度。 In order to obtain the original wave front, it is necessary to extract interferogram phase, is an important step of extracting phase interferometry, the phase of the final extraction accuracy directly affects the detection accuracy. 常用的干涉图相位提取方法包括两类,分别是频域法和时域法。 FIG conventional interferometric phase extraction method includes two types, namely, a frequency domain method and the time domain method. 频域法主要采用傅里叶变换法,而时域法主要采用相移干涉技术。 Frequency domain method mainly uses a Fourier transform method, the time domain method mainly uses phase-shifting interferometry techniques. 朗奇剪切干涉仪采用相移干涉技术进行相位提取,相移干涉技术计算简单、速度快、精度高,但影响测量精度的误差因素较多:一方面来自外界环境,如空气清洁度、实验平台震动、空气扰动等;另一方面来自干涉仪内部,如相移器压电晶体的标定误差与非线性误差、光学系统的加工误差和装调后的剩余误差、光电传感器的非线性误差等。 Lucky shearing interferometer using phase-shifting interferometry phase extraction, phase-shifting interferometry calculation is simple, fast, high precision, but many factors affecting the measurement accuracy of error: one from the external environment, such as air cleanliness, experimental platform vibration, air turbulence and the like; other from inside the interferometer, such as a calibration error of the phase shifter and the nonlinear error piezoelectric crystal, the manufacturing error of the optical system and the residual error after assembly and adjustment, nonlinear errors photosensor. 对于朗奇剪切干涉仪,当剪切率较小时,剪切光栅除了±1级与〇级发生干涉获得需要的干涉条纹之外,更高级次的衍射项也会与〇级光发生干涉,严重影响相位提取的精度。 For Ronchi shearing interferometer, when the shear rate is small, the shearing grating and square except the ± 1-order interference fringes obtained than desired, higher order terms will be diffracted light interfere with square level occurs, significantly affect the accuracy of the extraction phase. 朗奇剪切干涉仪对相移器的要求不高,光栅位移量在几百nm量级,因此相移误差较小,在保证较好的测量环境的情况下,光栅多级衍射光的相互影响可以看作是朗奇剪切干涉仪的主要误差源,因此消除多级衍射误差是朗奇剪切干涉仪应用于高精度光学系统波像差检测的前提。 Lucky less demanding shearing interferometer phase shifter, the amount of displacement of the grating in the order of several hundreds nm, so the phase shift error is small, in the case ensure better measurement environment, each multi-level grating diffracted light Effects can be regarded as the main source of error Ronchi shearing interferometer, thus eliminating errors are multilevel diffraction Ronchi shearing interferometer accurately applied to wavefront aberration detection optical system premises.

[0003] Joseph Braat等提出一种用扩展光源改进的朗奇剪切干涉仪(在先技术[1], Joseph Braat,Augustus J·E·Janssen,“Improved Ronchi test with extended source”,Journal of the Optical Society of America A Vol.16,No. 1,1999,pp:131-140)。 [0003] Joseph Braat with an extended light source and the like to provide a modified Ronchi shearing interferometer (PRIOR ART [1], Joseph Braat, Augustus J · E · Janssen, "Improved Ronchi test with extended source", Journal of the . Optical Society of America A Vol.16, No 1,1999, pp: 131-140). 此干涉仪采用+1级与-I级衍射光的干涉进行提取相位,但没有考虑高次衍射级次的影响,从而引入了一定的系统误差,进而降低了位移的测量精度;并且该方法只适用于数值孔径较小的光学系统中,在对大数值孔径的光学系统的检测过程中会引入大量的测量误差。 This interferometer phase was extracted using the +1 order interference -I order diffracted light, no consideration is given higher diffraction orders influence, thereby introducing some systematic errors, thereby reducing the accuracy of the displacement measurement; and the method only for smaller numerical aperture of the optical system, the detection process of the optical system of large numerical aperture can introduce a large amount of measurement errors.

[0004] Yucong Zhu等提出一种二维光栅相移干涉仪的相位提取算法(在先技术[2], Yucong Zhu,Satoru Odate,Ayako Sugaya,et al·,“Method for designing phase-calculation algorithms for two-dimensional grating phase shifting interferometry”,Applied Optics, 2011,50 (18) : p · 2815-2822)。 [0004] Yucong Zhu et proposed a two-dimensional grating phase shifting interferometer phase extraction algorithm (the prior art [2], Yucong Zhu, Satoru Odate, Ayako Sugaya, et al ·, "Method for designing phase-calculation algorithms for two-dimensional grating phase shifting interferometry ", Applied Optics, 2011,50 (18): p · 2815-2822). 该二维光概干涉仪米用物面光栅作为扩展光源,其周期为像面光栅周期与被测光学系统成像放大倍数的乘积,物面光栅和像面光栅都是正交光栅,算法只采用〇级光与±1级的干涉进行相位提取,通过相移消除不需要的光栅±3级和±5级衍射项的影响。 Almost two-dimensional optical interferometer object plane grating with rice as an extended light source, which is a product of the period of the grating period of the image plane and an imaging magnification of the optical system under test, the object plane and the image plane grating the grating are perpendicular to the grating, using only algorithms billion order light and ± interference phase extraction stage 1, to eliminate the influence of unnecessary grating ± 5 and ± 3 level diffracted by a phase shift term. 但是该方法以正交光栅作为物面光栅, 对光场空间相干性的调制结果复杂,出现了许多X轴和y轴之外的衍射项,从而引入了大量的噪声项,严重影响检测精度。 However, this method was used as the grating plane orthogonal grating, light field spatial modulation of the complex coherence result, diffraction occurs many items other than the X-axis and the y-axis, thereby introducing a large amount of noise term, seriously affect the detection accuracy.

[0005] Matthieu Visser等提出一种应用于EUV光刻物镜波像差检测的扩展光源干涉仪(在先技术[3] ,Matthieu Visser,Martijn K.Dekker, Petra Hegeman,et al. ,“Extended source interferometry for at-wavelength test of EUV-〇ptics”,Emerging Lithographic Technologies Iii,Pts land 2,1999.3676:p.253_263)。 [0005] Matthieu Visser and the like to provide a detectable applied EUV lithography objective aberration extended source wave interferometer (prior art [3], Matthieu Visser, Martijn K.Dekker, Petra Hegeman, et al., "Extended source interferometry for at-wavelength test of EUV-〇ptics ", Emerging Lithographic Technologies Iii, Pts land 2,1999.3676: p.253_263). 该干涉仪物面光栅和像面光栅都是采用一维朗奇光栅,采用5步相移法可以减小±3级与0级衍射光干涉引入的对相位提取的影响,但是难以消除其他较高级次的衍射项与0级的干涉。 The grating interferometer object plane and the image plane using a Weilang Qi gratings are gratings using impact on phase extraction stage 3 and the zero-order diffracted light interference introduced phase shift method step 5 ± be reduced, but it is difficult to eliminate other than 0 items diffraction and interference of higher order.

发明内容 SUMMARY

[0006] 本发明的目的在于克服上述在先技术的不足,提供一种基于朗奇剪切干涉仪的相位提取方法。 [0006] The object of the present invention is to overcome the disadvantages of the prior art, there is provided a Ronchi phase extraction method based on shearing interferometer. 该方法消除朗奇剪切干涉仪检测过程中像面光栅多级衍射光对相位提取精度的影响,提高被测光学系统的波像差检测准确度。 This method eliminates the influence Ronchi shearing interferometer detection process image plane diffraction grating multilevel phase extraction accuracy, improve the detection accuracy of the measured wavefront aberration of the optical system.

[0007] 本发明的技术解决方案如下: [0007] The technical solutions of the present invention are as follows:

[0008] —种基于朗奇剪切干涉仪的相位提取方法,该方法采用的检测装置是朗奇剪切干涉仪,该朗奇剪切干涉仪的结构包括:沿光源输出光束方向依次是聚焦透镜、散射光学元件、一维衍射光栅板、被测光学系统平台、棋盘光栅和二维光电传感器;所述的一维衍射光栅板置于物面光栅位移台上,所述的棋盘光栅置于像方光栅位移台上,所述的二维光电传感器与计算机相连; [0008] - a Ronchi phase extraction methods shearing interferometer based on the detecting means is a Ronchi method using shearing interferometer, the Ronchi shearing interferometer structure comprising: a light source output beam is sequentially focused along a direction lens, the optical scattering element, one-dimensional diffraction grating plate, the optical system under test platform, and two-dimensional photosensor grating board; the one-dimensional diffraction grating surface of grating displacement plate was placed on the stage, said checkerboard grating disposed grating displacement stage image side, the two-dimensional photosensor coupled to the computer;

[0009] 所述的散射光学元件是毛玻璃、微透镜阵列等使照明光束在被测光学系统数值孔径内均匀照明的光学元件; [0009] The scattering optical element is a frosted glass, a microlens array optical element in the illumination beam numerical aperture of the optical system under test uniform illumination;

[0010] 所述的一维衍射光栅板由周期P。 [0010] The one-dimensional diffraction grating plate by a period P. 且占空比为50%的两个物面一维衍射光栅组成, 分别是光栅线沿y方向的第一光栅和光栅线沿X方向的第二光栅。 And a 50% duty cycle of the object plane a two dimensional diffraction grating, namely the y direction of the grating lines of the first grating and the grating lines of the second grating in the X direction.

[0011] 所述的第一光栅和第二光栅是相位光栅或振幅光栅。 [0011] The first and second gratings are amplitude grating or phase grating.

[0012] 所述的物面一维衍射光栅的周期P。 [0012] The object plane of the one-dimensional diffraction grating period P. 与所述的像面棋盘光栅的周期? The image plane of the checkerboard grating period? ,满足如下关系, Satisfy the following relationship,

[0013] P0 = Pi · M [0013] P0 = Pi · M

[0014] 其中,M为被测光学系统的成像放大倍数; [0014] wherein, M is the magnification of the imaging optical system under test;

[0015] 所述的被测光学系统数值孔径为NA,成像放大倍数为M: 1; [0015] The numerical aperture of the tested optical system represented by NA, the imaging magnification M: 1;

[0016] 所述的棋盘光栅是具有棋盘形布局,透光单元与遮光单元均为大小相同的正方形,每个透光单元周围为4个遮光单元,每个遮光单元周围为4个透光单元;所述的棋盘光栅的周期P1等于正方形的对角线长度;所述的棋盘光栅透光单元和遮光单元的对角线方向平行于X轴和y轴方向;周期P1的大小由光源的波长λ、被测光学系统的数值孔径NA、剪切率s确定, [0016] The grating is a checkerboard having a checkerboard arrangement, the light shielding unit and the light transmitting unit are the same size square, around each light transmitting unit is a light shielding means 4, around each of the light shielding unit light-transmissive units 4 ; said checkerboard grating period P1 equal to the length of the diagonal of the square; checkerboard grating diagonal direction of the light transmitting unit and the light blocking unit parallel to the X-axis and y-axis direction; size of the wavelength of the period P1 of the light source [lambda], the numerical aperture NA of the optical system under test, to determine the shear rate s,

Figure CN104111120BD00041

[0018] 所述的物面光栅位移台是将第一光栅和第二光栅分别移入被测光学系统物方光路的三维位移台; [0018] The object plane of the grating displacement is the first stage and second gratings are transferred three-dimensional displacement test station side of the optical path of the optical system thereof;

[0019] 所述的像面光栅位移台是将棋盘光栅移入被测光学系统的像方光路,并带动像面棋盘光栅沿X方向和沿y方向步进运动的三维位移台; [0019] The image plane is a checkerboard grating displacement units into a raster image side of the optical path of the optical system under test, and three-dimensional displacement drive station checkerboard grating in the X direction of the image plane and the y-direction of the stepping movement;

[0020] 所述的二维光电传感器是照相机、(XD、CM0S图像传感器,或二维光电探测器阵列, 其探测面上接收像面棋盘光栅生成的剪切干涉条纹; [0020] The two-dimensional photosensor is a camera, (XD, CM0S image sensor, or a two-dimensional photodetector array, the board receives the image plane shearing grating generate interference fringes on the detection surface thereof;

[0021] 所述的计算机用于控制波像差检测过程、存储测量数据,并对干涉图进行处理与分析; The computer is used for [0021] controlling the wavefront aberration detection process storing the measured data, and processing and analysis interferogram;

[0022] 利用上述用于消除朗奇剪切干涉仪多级衍射误差的相位提取方法,其特征在于该方法包括步骤如下: [0022] With the above-described extraction method for eliminating phase errors in multilevel diffraction Ronchi shearing interferometer, characterized in that the method comprises the steps of:

[0023] 1)将被测光学系统置于所述的被测光学系统平台上,调整朗奇剪切干涉仪,使所述的光源位于被测光学系统的物面,选择周期等于光源的波长λ除以两倍被测光学系统的数值孔径NA与剪切率s的乘积的像面棋盘光栅,再选择周期为被测光学系统工作距离处的放大倍数乘以像面光栅周期的一维衍射光栅板;一维衍射光栅板置于物面光栅位移台上, 并调整到被测光学系统的物面上,移动物面光栅位移台,将一维衍射光栅板上的第一光栅移入被测光学系统的物方视场点位置;棋盘光栅置于像面光栅位移台上,并调整到被测光学系统的像面上,移动像面光栅位移台,将棋盘光栅移入被测光学系统的像方光路; [0023] 1) an optical system to be tested is placed on the optical system under test platform, adjust Ronchi shearing interferometer, the light source is positioned object plane of the optical system under test, the selection period is equal to the wavelength of the light source λ divided by the numerical aperture NA of the product of the shear rate s is twice the measured optical system image plane checkerboard grating period is then selected working distance magnification of the optical system under test is multiplied by the one-dimensional diffraction grating period of the image plane grating plates; plates were placed in a one-dimensional diffraction grating surface of grating displacement stage thereof, the surface was measured and adjusted to an optical system, the object plane grating displacement mobile station, the first one-dimensional grating of the diffraction grating plate into the test field object side position of the optical system; checkerboard grating placed in the image plane grating displacement turntable and the image plane of the tested optical system, the image plane grating displacement mobile station, the measured checkerboard grating optical system into image side light path;

[0024] 2)调整物面光栅位移台和像面光栅位移平台,对准第一光栅和棋盘光栅,并调整二维光电传感器的位置,使探测面上获得条纹清晰的干涉图; [0024] 2) to adjust the object plane grating displacement table and the grating image plane platform displacements, alignment of the first grating and a checkerboard grating, and adjusts the position of the two-dimensional photosensor, that the detection is obtained on the interference fringe in FIG clear;

[0025] 3)像面光栅位移台沿X方向移动棋盘光栅,移动9次,每次移动1/8光栅周期,每次移动后二维光电传感器采集一幅剪切干涉图Ixk,其中1ί=1,2,3···,9;根据9幅干涉条纹图, 按下列公式计算相位: [0025] 3) the image plane grating displacement in the X-direction moving stage checkerboard grating moves 9 times the grating period 1/8 the mobile, each mobile collection after the two-dimensional photosensor FIG IXK a shearing interferometer, wherein 1ί = 2, 3, ..., 9; 9 according to the fringe pattern, a phase is calculated by the following formula:

Figure CN104111120BD00051

[0027] 其中,A为被测波前沿X方向的相位,代表被测波前在X方向上的梯度信息; [0027] wherein, A is the measured phase of the wave front of the X-direction measured wavefront information representative of the gradient in the X direction;

[0028] 4)移动所述的物面光栅位移台,将一维衍射光栅板上的第二光栅移入被测光学系统的物方视场点位置,重新调整物面光栅位移台和像面光栅位移平台,对准第二光栅和棋盘光栅; [0028] 4) moving said object plane grating displacement stage, the second one-dimensional diffraction grating of the grating plate into the field of view position to the object side of the optical system under test, re-adjust the object plane and the image plane grating displacement stage grating a displacement platform, aligned with the second gratings and the grating board;

[0029] 5)像面光栅位移台沿y方向移动棋盘光栅,移动9次,每次移动1/8光栅周期,每次移动后二维光电传感器采集一幅剪切干涉图Iyk,其中1ί=1,2,3···,9;根据9幅干涉条纹图, 按下列公式计算相位: [0029] 5) as the grating surface displacement in the y direction checkerboard grating station moves, the mobile 9 times the grating period 1/8 the mobile, each mobile collection after the two-dimensional photosensor FIG IYK a shearing interferometer, wherein 1ί = 2, 3, ..., 9; 9 according to the fringe pattern, a phase is calculated by the following formula:

Figure CN104111120BD00052

[0031] 其中,%为被测波前沿y方向的相位,代表被测波前在y方向上的梯度信息; [0031] where% is the measured phase of the wave front in the y direction, gradient information representative of the measured wave front in the y direction;

[0032] 6)对上述相位提取结果解包裹,分别得到X方向和y方向的差分波前AWx和AWy进行剪切干涉波前重建,获得被测光学系统波前(参见在先技术4,Harbers,G .,PJ Kunst, and G.ff.R.Leibbrandt,Analysis of lateral shearing interferograms by use of Zernike polynomials.Applied Optics,1996.35 (31):p.6162-6172) 〇 [0032] 6) extracted result of unwrapping the phase, respectively the difference-wave X-direction and the y direction and a front AWx AWy shear wave interference reconstruction wavefront of the optical system under test is obtained (see the prior art 4, Harbers , G, PJ Kunst, and G.ff.R.Leibbrandt, Analysis of lateral shearing interferograms by use of Zernike polynomials.Applied Optics, 1996.35 (31):. p.6162-6172) square

[0033] 与在先技术相比,本发明具有以下优点: [0033] Compared with the prior art, the present invention has the following advantages:

[0034] 1.与在先技术[1]相比,考虑了高次衍射级次的影响,提高了光学系统波像差的测量精度,并可以实现大数值孔径光学系统波像差的精确测量。 [0034] 1. the prior art [1], the contemplated higher diffraction orders influence and improve the measurement accuracy of wave aberration of the optical system, and accurate measurement of large numerical aperture optical system's wavefront aberration may be achieved .

[0035] 2.与在先技术[2]相比,本发明采用物面一维朗奇光栅调制光场空间相干性,不存在其他噪声项与〇级和± 1级干涉条纹重叠的问题,误差项少、精度高。 [0035] 2. with the prior art [2], the present invention employs a field Weilang Qi grating modulated light spatial coherence of the object surface, and other items noise level and the level ± 1 square interference fringes overlap problem does not exist, small error term, high precision.

[0036] 3.与在先技术[3]相比,本发明可以较好地消除除了0级与± 1级外的较高级次衍射项,可以很好地消除朗奇剪切干涉中多级衍射光干涉造成的对相位提取精度的影响。 [0036] 3 and the prior art [3], the present invention can be better eliminate higher order diffraction terms except 0 and ± 1 level, and could be eliminated in the multi-stage shearing interferometer Ronchi interference of the diffracted light caused by the phase extraction accuracy.

附图说明 BRIEF DESCRIPTION

[0037] 图1为本发明采用的朗奇剪切干涉仪装置示意图; [0037] FIG. 1 is a schematic Ronchi shearing interferometer apparatus employed in the present invention;

[0038] 图2为物面一维衍射光栅板示意图; [0038] FIG. 2 is a one-dimensional object plane schematic diffraction grating plate;

[0039] 图3 (a)为棋盘光栅的示意图,图3 (b)为棋盘光栅的衍射光强分布图。 [0039] FIG. 3 (a) is a schematic view of a checkerboard grating, FIG. 3 (b) is a checkerboard grating diffraction intensity distribution of FIG.

[0040] 图4 (a)为调制光场空间相干性后的可发生干涉的衍射级次示意图,图4 (b)为剪切干涉示意图。 A schematic view of diffraction orders [0040] FIG. 4 (a) is a modulated light field interference can occur after spatial coherence of FIG. 4 (b) is a shearing interferometer schematic.

具体实施方式 Detailed ways

[0041] 为使本发明的内容、实施过程和优点更加清楚,下面结合实施例和附图对本发明作进一步说明,但不应以此实施例限制本发明的保护范围。 [0041] For the present invention, the implementation process and advantages clearer, the following Examples and accompanying drawings further illustrate the present invention but should not limit the scope of this embodiment of the present invention.

[0042] 本发明采用的朗奇剪切干涉仪装置示意图1所示。 [0042] Ronchi shearing interferometer apparatus of the present invention employed in Scheme 1 below. 由图可见,本发明采用的检测装置是朗奇剪切干涉仪,该朗奇剪切干涉仪的结构包括:沿光源1输出光束方向依次是聚焦透镜2、散射光学元件3、一维衍射光栅板4、被测光学系统平台、棋盘光栅7和二维光电传感器9;所述的一维衍射光栅板4置于物面光栅位移台5上,所述的棋盘光栅7置于像面光栅位移台8上,所述的二维光电传感器9与计算机10相连; Seen from the figure, the detection apparatus of the present invention uses a Ronchi shearing interferometer, the Ronchi shearing interferometer structure comprising: a light source 1 are sequentially output beam direction is a focusing lens 2, the scattering optical element 3, a one-dimensional diffraction grating plate 4, the optical system under test platform, checkerboard grating 7 and 9 the two-dimensional photosensor; the one-dimensional diffraction grating plate 4 is placed on the object plane grating displacement stage 5, the board 7 is placed raster image plane grating displacement on stage 8, the two-dimensional photosensor 9 is connected to the computer 10;

[0043] 所述的散射光学元件3是毛玻璃、微透镜阵列等使照明光束在被测光学系统6数值孔径内均匀照明的光学元件; [0043] The scattering optical element 3 is frosted glass, a microlens array of the illumination beam within the numerical aperture of the tested optical system 6 uniform illumination optical elements;

[0044] 所述的一维衍射光栅板4 (参见图2)由周期P。 [0044] The one-dimensional diffraction grating plate 4 (see FIG. 2) by a period P. 且占空比为50%的两个物面一维衍射光栅组成,分别是光栅线沿y方向的第一光栅401和光栅线沿X方向的第二光栅402。 And a 50% duty cycle of the object plane a two dimensional diffraction gratings, the grating lines are the first grating 401 in the y-direction and the grating lines of the second grating 402 in the X direction.

[0045] 所述的第一光栅401和第二光栅402是相位光栅或振幅光栅。 According to [0045] 401 of the first grating and the second grating 402 is a phase grating or an amplitude grating.

[0046] 所述的物面一维衍射光栅的周期P。 [0046] The object plane of the one-dimensional diffraction grating period P. 与所述的棋盘光栅7的周期^满足如下关系, And the period of the checkerboard grating satisfies the following relation ^ 7,

[0047] P0 = Pi · M [0047] P0 = Pi · M

[0048] 其中,M为被测光学系统6的成像放大倍数。 [0048] wherein, M being an imaging magnification of the optical system under test 6.

[0049] 所述的被测光学系统6数值孔径为NA,成像放大倍数为M: 1; [0049] The optical system 6 according to test numerical aperture NA, the imaging magnification M: 1;

[0050] 所述的棋盘光栅7是具有棋盘形布局,透光单元与遮光单元均为大小相同的正方形,每个透光单元周围为4个遮光单元,每个遮光单元周围为4个透光单元。 [0050] The grating board 7 is a checkerboard arrangement, the light shielding unit and the light transmitting unit are of the same size square, around each light transmitting unit is a light shielding means 4, around each light transmissive shielding unit 4 unit. 对于振幅型棋盘光栅,其透射率函数为 For the checkerboard type grating amplitude which is a function of the transmittance

Figure CN104111120BD00061

[0052] 其中,PA光栅沿X和y方向上的周期,N为光栅周期数。 [0052] wherein, PA grating periods in the X-direction and y-direction, N is the number of grating periods.

[0053] 棋盘光栅7在远场的衍射光强函数为 [0053] 7 checkerboard grating in the diffracted light intensity as a function of far field

Figure CN104111120BD00062

[0055] 其中,I (ξ,η)为远场衍射光强函数,Io为〇级衍射光强。 [0055] wherein, I (ξ, η) as a function of far field diffracted light intensity, Io is the square-order diffracted light intensity. 在理想情况下,棋盘光栅只有〇级和奇数衍射级,且光能主要集中于〇级与±1级上,各奇数衍射级在远场与〇级产生干涉。 In the ideal case, only the square checkerboard grating diffraction order and odd stages, and the light focused on the stage and grade square ± 1, each of the odd diffraction orders interfere in the far field with billion level. 受到棋盘光栅的作用,被测波面在重叠区域产生与X轴方向成45°角的剪切波面,在剪切方向上等效光栅的周期为棋盘光栅每个单元结构正方形边长的#倍。 By checkerboard grating effect, the measured surface wave is generated with the X-axis direction of an angle of 45 ° shear wave surface in the overlap region, the grating period is equivalent checkerboard grating # times square side length of each unit structure in a shearing direction.

[0056] 所述的棋盘光栅7放置成透光单元和遮光单元的对角线方向平行于X轴和y轴方向的状态(参见图3 (a)),沿X方向和y方向看都是朗奇光栅,占空比为50%。 [0056] The grating board 7 is placed in the light shielding unit and the light transmitting diagonal direction parallel to the X axis unit and the y-axis direction in the state (see FIG. 3 (a)), is to see in the X direction and the y direction, Ronchi grating 50% duty cycle.

[0057] 实施例: [0057] Example:

[0058] 朗奇剪切干涉仪中,光源1输出光的波长为193nm,被测光学系统6的数值孔径为〇. 75,成像放大倍率为4 X,设置剪切率为1/30,选择棋盘光栅7的周期Pi为3.86μπι,物面一维衍射光栅周期为Ρ。 [0058] Ronchi shearing interferometer, the output wavelength of the source light is 193 nm, the numerical aperture of the tested optical system 6 billion. 75, the imaging magnification of 4 X, a shear rate of 1/30 is provided, selected 7 is a checkerboard grating period Pi is 3.86μπι, the object plane is one-dimensional diffraction grating period Ρ. 为15.44μηι。 As 15.44μηι.

[0059] 所述的物面光栅位移台5是将第一光栅401和第二光栅402分别移入被测光学系统6物方光路的三维位移台; Object surface grid [0059] The displacement stage 5 is the first grating and the second grating 401, respectively, into the three-dimensional displacement of the table 402 side of the optical path optical system 6 was measured;

[0060] 所述的像面光栅位移台8是将棋盘光栅7移入被测光学系统6的像方光路,并带动棋盘光栅7沿X方向和沿y方向的1/8光栅周期步进运动的三维位移台; [0060] The image plane displacement of the grating stage 8 is measured checkerboard grating 7 into the optical path of the optical system on the image side of the 6, 7 and driven by a checkerboard grating in the X direction and 1/8 the grating period of the stepping movement in the y-direction three-dimensional translation stage;

[0061] 所述的二维光电传感器9是照相机、(XD、CM0S图像传感器,或二维光电探测器阵列,其探测面上接收棋盘光栅7生成的剪切干涉条纹; [0061] The two-dimensional photosensor 9 is a camera, (XD, CM0S image sensor, or a two-dimensional photodetector array, receiving a checkerboard grating generated shearing surface 7 which detects the interference fringe;

[0062] 所述的计算机10用于控制波像差检测过程、存储测量数据,并对干涉图进行处理与分析。 [0062] The computer 10 for controlling the wavefront aberration detection process storing the measured data, and processing and analysis of the interferogram.

[0063] 利用上述用于消除朗奇剪切干涉仪多级衍射误差的相位提取方法,其特征在于该方法包含下列步骤: [0063] With the above-described extraction method for eliminating phase errors in multilevel diffraction Ronchi shearing interferometer, characterized in that the method comprises the steps of:

[0064] 1)将被测光学系统6置于所述的被测光学系统平台上,调整朗奇剪切干涉仪,使所述的光源1位于被测光学系统6的物面,选择周期等于光源1的波长λ除以两倍被测光学系统6的数值孔径NA与剪切率s的乘积的棋盘光栅7,再选择周期为被测光学系统6工作距离处的放大倍数乘以棋盘光栅7周期的一维衍射光栅板4; 一维衍射光栅板4置于物面光栅位移台5 上,并调整到被测光学系统6的物面上,移动物面光栅位移台5,将一维衍射光栅板4上的第一光栅401移入被测光学系统6的物方视场点位置;棋盘光栅7置于像面光栅位移台8上,并调整到被测光学系统6的像面上,移动像面光栅位移台8,将棋盘光栅7移入被测光学系统6 的像方光路; [0064] 1) the measured optical system 6 disposed on the optical system under test platform, adjust Ronchi shearing interferometer, the light source 1 is located in the object plane of the optical system under test 6, the selection period is equal to λ is the wavelength of the light source 1 is divided by the product of twice the test optical system with a numerical aperture NA of the shear rate s checkerboard grating 6 of 7, then the selection period of 6 working distance magnification of the optical system under test is multiplied by a checkerboard grating 7 one-dimensional periodic diffraction grating plate 4; one-dimensional diffraction grating plate 4 is placed on the object plane grating displacement stage 5, and adjusted to the measured object plane of the optical system 6, the moving object plane grating displacement stage 5, the one-dimensional diffraction 4 the first grating on the grating plate 401 is moved to the object side field position of the tested optical system 6; checkerboard grating 7 is placed on the image plane grating displacement table 8, and adjusted to the image plane of the tested optical system 6, a mobile image plane grating displacement table 8, the board under test grating 7 into the optical path of the optical system 6 to the image side;

[0065] 2)调整物面光栅位移台5和像面光栅位移台8,对准第一光栅401和棋盘光栅7,并调整二维光电传感器9的位置,使探测面上获得条纹清晰的干涉图; [0065] 2) to adjust the object plane grating displacement stage 5 and the image plane grating displacement table 8, alignment of the first grating 401 and the grating board 7, and adjusts the position of the two-dimensional photosensor 9, that the detection surface of the clear interference fringes obtained Figure;

[0066] 3)像面光栅位移台8沿X方向移动棋盘光栅7,移动9次,每次移动1/8光栅周期,每次移动后二维光电传感器9采集一幅剪切干涉图Ixk,其中1ί=1,2,3···,9;根据9幅干涉条纹图,按下列公式计算相位: [0066] 3) the image plane 8 in the X direction stage moving grating displacement checkerboard grating 7, 9 move times moving grating period 1/8, the two-dimensional photosensor 9 each collecting a shearing interferogram Ixk after moving, wherein 1ί = 1,2,3 ···, 9; 9 according to the fringe pattern, a phase is calculated by the following formula:

Figure CN104111120BD00071

[0068] 其中,K为被测波前沿X方向的相位,代表被测波前在X方向上的梯度信息; [0068] where, K is the measured phase of the wave front of the X-direction measured wavefront information representative of the gradient in the X direction;

[0069] 4)移动所述的物面光栅位移台5,将一维衍射光栅板4上的第二光栅402移入被测光学系统6的物方视场点位置,重新调整物面光栅位移台5和像面光栅位移台8,对准第二光栅402和棋盘光栅7; [0069] 4) moving said object plane grating displacement stage 5, the second one-dimensional grating on the diffraction grating 4 plate 402 into the optical system used in the test field 6 position, re-adjust the object plane grating displacement station 5 and the image plane grating displacement table 8, an alignment grating 402 and the second grating board 7;

[0070] 5)像面光栅位移台8沿y方向移动棋盘光栅7,移动9次,每次移动1/8光栅周期,每次移动后二维光电传感器9采集一幅剪切干涉图Iyk,其中1ί=1,2,3···,9;根据9幅干涉条纹图,按下列公式计算相位: [0070] 5) grating displacement stage 8 moves in the y-direction of the image plane checkerboard grating 7, 9 move times moving grating period 1/8, the two-dimensional photosensor 9 each collecting a shearing interferogram Iyk after moving, wherein 1ί = 1,2,3 ···, 9; 9 according to the fringe pattern, a phase is calculated by the following formula:

Figure CN104111120BD00081

[0072] 其中,心为被测波前沿y方向的相位,代表被测波前在y方向上的梯度信息; [0072] wherein, the heart is the measured phase of the wave front in the y direction, gradient information representative of the measured wave front in the y direction;

[0073] 6)对上述相位提取结果解包裹,分别得到X方向和y方向的差分波前AWx和AWy进行剪切干涉波前重建,获得被测光学系统6波前。 [0073] 6) extracted result of unwrapping the phase, respectively the difference-wave X-direction and the y direction and a front AWx AWy shear wave interference reconstruction optical system 6 to obtain test wavefront.

[0074] 上述相位提取方法消除朗奇剪切干涉仪多级衍射误差的具体理论论述如下: [0074] The extracting phase Ronchi eliminate shearing interferometer multilevel error diffraction particular theory discussed below:

[0075] 根据朗奇剪切干涉仪原理,当不考虑物面一维衍射光栅对空间相干性的调制时, 采用棋盘光栅7,在探测平面上的光强为 When [0075] The shearing interferometer principle Ronchi, when the object plane is not considered a one-dimensional diffraction grating modulation to spatial coherence, checkerboard grating 7, the light intensity on the detection plane is

Figure CN104111120BD00082

[0077] 其中,ao为背景光强,aij为光栅在X轴方向上衍射的第i级与y轴方向上衍射的第j 级的干涉条纹对比度,約J为对应两个衍射级次的相位差;i为沿X轴方向上的第射级,j为沿y轴方向上的第〇、n或V衍射级,都是非零整数。 [0077] wherein, ao is the background light intensity, the i-th stage of aij of the y-axis direction in the X-axis direction of the grating diffraction diffraction interference fringe contrast in the j-th stage, J about two diffraction orders corresponding phase difference; I level for the first shot on the X-axis direction, j is a first square, n, or V on the diffraction order in the y-axis direction are non-zero integers.

[0078] 根据“范西泰特一一泽尼克定理”可知,光场的空间相干性等于光源强度分布的傅里叶变换,因此受到物面一维衍射光栅对空间相干性的调制作用,当物面一维衍射光栅是光栅线沿y方向、占空比为50%的第一光栅401时,X方向上的空间相干性是第一光栅401的傅里叶变换对应值;而y方向上光场仍然是非相干的,所以y方向上不发生干涉(参见图4), 则光强的表达式改写为 [0078] The "fancies Tate eleven Zernike theorem" can be seen, the spatial coherence of the light field is equal to the light intensity distribution of the Fourier transform, so by modulation of the object plane on the one-dimensional diffraction grating space coherence, when the object plane a one-dimensional diffraction grating is the grating lines in the y-direction, the duty ratio is 50% of the first grating 401, the spatial coherence in the X direction of the first grating 401 corresponds to a Fourier transform value; and the y-direction field of glazing still incoherent, it does not interfere (see FIG. 4) occurs in the y direction, the light intensity of the expression is rewritten as

Figure CN104111120BD00083

[0080] 其中,ao为背景光强,amQ为光栅在X方向上衍射的第m级衍射与0级的干涉条纹对比度,乳》〇为光栅在X方向上的第m级衍射与0级间的相位差。 [0080] wherein, ao is the background light intensity, AMQ grating diffraction in the X direction, the m-th order diffraction and 0 interference fringe contrast, milk "square raster of m-order diffraction and 0 in the X direction between the phase difference. 其中相位差分别为 Wherein the phase difference respectively

Figure CN104111120BD00084

[0082] 其中,W(x,y)为波前函数,λ为波长,S为剪切量。 [0082] wherein, W (x, y) is the wavefront function, λ is the wavelength, S is the amount of shear. 考虑相移时,光强表达式可改写为 When considering phase shift, intensity expressions may be rewritten as

Figure CN104111120BD00085

[0084] 其中,δ为相移干涉中棋盘光栅7沿剪切方向移动每一步引起的1级衍射的相移量, 则πιδ表示光栅沿剪切方向移动时第m级衍射的相移量,Ao为在X方向上的第m级衍射与0级间的相位差。 [0084] wherein, [delta] is a phase-shift interference checkerboard grating 7 is moved in a shear direction caused by the phase shift amount per step of the first-order diffraction, the phase shift amount πιδ represents the grating moves in the shearing direction of the m-th order diffraction, Ao is the phase difference between the diffracted X and 0 in the direction of the m-th stage. 由于棋盘光栅衍射第5级以上的衍射光强小于0级光的1 %,基本不影响测量结果,因此可以忽略高于5级衍射光的影响。 Due to the above checkerboard grating diffraction order of diffracted light intensity of less than 1 5% 0 order light, does not substantially affect the measurement result, it is possible to ignore the effect of diffracted light is higher than 5. 光强表达式可以写为 Light intensity of expression can be written as

Figure CN104111120BD00086

[0086] 其中,1^=1,2,3-_,1表示第1^步相移4为总相移步数;死!为在1方向上的第111级衍射与O级间的相位差,m= ±1,±3, ±5;5k为相移量。 [0086] where 1 = 1 ^ _, ^ 1 denotes the first phase shift step 4 is the total number of phases venue; is the phase between the first die 111 with O-level diffraction in a direction! difference, m = ± 1, ± 3, ± 5; 5k relative shift amount.

Figure CN104111120BD00091

[0087] 为了抑制光栅多级衍射光对相位提取精度的影响,采集相移间隔的干涉图,BP 每一步相移量分别为 [0087] In order to suppress multi-order diffracted light on the grating phase extraction affect the accuracy of the collected interferogram phase shift interval, BP phase shift amount of each step are

Figure CN104111120BD00092

的9幅干涉图,其中j = 0,1,2···8。 The nine interferograms, where j = 0,1,2 ··· 8. 则各步光强为 The light intensity of each step

Figure CN104111120BD00093

[0097] 根据式⑶〜(14)可以求出: [0097] The formula ⑶~ (14) can be obtained:

Figure CN104111120BD00101

[0101] 且系数&1和^1等于光场的空间相干度,对于朗奇剪切干涉仪有= ,则被测光学系统6沿X方向的相位A, [0101] and the coefficients & amp; 1 ^ 1 and the spatial coherence of the light field is equal to, for shearing interferometer has Ronchi =, the phase A 6 in the X direction of the optical system under test,

Figure CN104111120BD00102

[0103] 为了恢复被测光学系统6的二维原始波前,将物面一维衍射光栅切换为光栅线沿X 方向的第二光栅402,同理求出被测光学系统6沿y方向的相位6。 [0103] The optical system under test in order to recover the original two-dimensional wave front 6, the one-dimensional diffraction grating object plane is switched to the grating lines of the second grating in the X direction 402, similarly measured to obtain the optical system in the y direction 6 phase 6. 死和A分别代表被测波前在X方向和y方向上的梯度信息。 Dead and A respectively represent the measured wavefront gradient information in the X-direction and y-direction. 对上述相位提取结果解包裹,分别得到X方向和y方向的差分波前A Wx和△ Wy进行剪切干涉波前重建,获得被测光学系统6波前。 Extraction result of unwrapping the phase, respectively the difference-wave X and y directions and front A Wx △ Wy shear wave interference reconstruction optical system 6 to obtain test wavefront.

[0104] 本发明应用于朗奇剪切干涉仪检测被测光学系统的波像差,可以有效消除光栅多级衍射光干涉对相位提取精度的影响,提高了被测光学系统的波像差检测准确度。 [0104] The present invention is applied to shear Ronchi interferometer detecting the test wavefront aberration of the optical system can effectively eliminate the influence of multi-order diffracted light interference grating phase extraction accuracy, improves the measured wavefront aberration detection optical system Accuracy.

[0105] 本技术领域中的普通技术人员应该认识到,以上实施例仅是用来说明本发明,而并非作为对本发明的限定,只要在本发明的实质精神范围内,对以上所述实施例的变化和变形,都属于本发明权利要求书的范围之内。 [0105] in the art of ordinary skill in the art will be appreciated that the above embodiments are merely illustrative of the invention and not limitative of the present invention, as long as within the true spirit of the present invention, the above described embodiments changes and variations are within the claims of the present invention, the scope of the claims.

Claims (1)

1. 一种基于朗奇剪切干涉仪的相位提取方法,该方法采用的检测装置是朗奇剪切干涉仪,该朗奇剪切干涉仪的结构包括:沿光源(1)输出光束方向依次是聚焦透镜(2)、散射光学元件(3)、一维衍射光栅板(4)、被测光学系统平台、棋盘光栅⑵和二维光电传感器(9);所述的一维衍射光栅板(4)置于物面光栅位移台(5)上,所述的棋盘光栅(7)置于像面光栅位移台⑶上,所述的二维光电传感器⑶与计算机(10)相连;其特征在于该方法的步骤如下: ① 将被测光学系统(6)置于所述的被测光学系统平台上,调整朗奇剪切干涉仪,使所述的光源⑴位于被测光学系统(6)的物方,选择周期等于光源⑴的波长λ除以两倍被测光学系统(6)的数值孔径NA与剪切率s的乘积的像面棋盘光栅(7),再选择周期为被测光学系统(6)工作距离处的放大倍数乘以像面光栅(7)周期的一维衍射光栅板(4); 一维 A Ronchi phase extraction method based on shearing interferometer, the detecting means is a Ronchi method uses shearing interferometer, the Ronchi shearing interferometer structure comprising: a light source sequentially (1) in the direction of the output beam is a focusing lens (2), the optical scattering element (3), one-dimensional diffraction grating plate (4), the optical system under test platform, and two-dimensional checkerboard grating ⑵ photosensor (9); the one-dimensional diffraction grating plate ( 4) placed on the object plane grating displacement stage (5), said checkerboard grating (7) is placed on the image plane grating displacement ⑶ station, connected to the two-dimensional photosensor ⑶ computer (10); characterized in that steps of the method as follows: ① the measured optical system (6) disposed on the optical system under test platform, adjust Ronchi shearing interferometer, the light source is positioned ⑴ the optical system under test (6) object side, the selection period is equal to the wavelength of light λ divided by the product ⑴ numerical aperture NA s and the shear rate is twice the optical system under test (6) is a checkerboard grating image surface (7), then select the optical system under test period magnification (6) multiplied by the working distance of the image plane grating (7) is a one-dimensional periodic diffraction grating plate (4); a one-dimensional 射光栅板⑷置于物面光栅位移台⑶上,并调整到被测光学系统(6)的物面上,移动物面光栅位移台(5),将一维衍射光栅板⑷上的第一光栅(401)移入被测光学系统(6)的物方视场点位置; 棋盘光栅⑵置于像面光栅位移台(8)上,并调整到被测光学系统(6)的像面上,移动像面光栅位移台(8),将棋盘光栅⑵移入被测光学系统(6)的像方光路,所述的一维衍射光栅板由周期P。 ⑷ grating plate disposed on the exit surface of the grating displacement thereof station ⑶, measured and adjusted to an optical system (6) in the object plane, the object plane grating displacement mobile station (5), on the first one-dimensional diffraction grating plate ⑷ a grating (401) under test into the optical system (6) on the object side field position; ⑵ checkerboard grating image surface placed on the image plane grating displacement table (8), and adjusted to an optical system under test (6), image plane grating displacement mobile station (8), the board under test into the optical system ⑵ grating (6) an optical path on the image side, said plate by a one-dimensional diffraction grating period P. 且占空比为50%的两个物面一维衍射光栅组成,分别是光栅线沿y方向的第一光栅(401)和光栅线沿X方向的第二光栅(402),所述的棋盘光栅(701)放置成透光单元和遮光单元的对角线方向平行于X轴和y轴方向的状态,沿X方向和y方向看都是朗奇光栅,占空比为50% ; ② 调整物面光栅位移台(5)和像面光栅位移台(8),对准第一光栅(401)和棋盘光栅(701),并调整二维光电传感器⑶的位置,使探测面上获得条纹清晰的干涉图; ③ 像面光栅位移台(8)沿X方向移动棋盘光栅(701),移动9次,每次移动1/8光栅周期, 每次移动后二维光电传感器(9)采集一幅剪切干涉图Ixk,其中i=l,2, 3..,;根据9幅干涉条纹图,按下列公式计算相位: And a 50% duty cycle of the object plane a two dimensional diffraction gratings, the grating lines are the first grating in the y direction (401) and the grating lines of the second grating (402) in the X direction, the board a grating (701) placed in diagonal direction and shielding light transmissive state of the cell unit parallel to the X-axis and the y-axis direction, see Ronchi gratings are in the X direction and the y direction, the duty ratio is 50%; ② adjustment object plane grating displacement stage (5) and the image plane grating displacement station (8), aligned with a first grating (401) and a checkerboard grating (701), and adjust the position of the two-dimensional photoelectric sensor ⑶, so obtained clear stripes on the detection surface FIG interference; ③ image plane grating displacement station (8) moves in the X direction, a checkerboard grating (701), the mobile 9 times the grating period 1/8 movement, each two-dimensional photosensor (9) after a mobile collection FIG IXK shearing interferometer, where i = l, 2, 3 ..,; according to nine interferograms, the phase is calculated by the following formula:
Figure CN104111120BC00021
其中,A为被测波前沿X方向的相位,代表被测波前在X方向上的梯度信息; ④ 移动所述的物面光栅位移台(5),将一维衍射光栅板(4)上的第二光栅(402)移入被测光学系统(6)的物方视场点位置,重新调整物面光栅位移台⑶和像面光栅位移平台⑶, 对准第二光栅(402)和棋盘光栅(701); ⑤ 像面光栅位移台(8)沿y方向移动棋盘光栅(701),移动9次,每次移动1/8光栅周期, 每次移动后二维光电传感器⑶采集一幅剪切干涉图Iyk,其中λ' = Κ 2. 3..根据9幅干涉条纹图,按下列公式计算相位: Wherein, A is the measured phase of the wave front of the X-direction measured wavefront information representative of the gradient in the X direction; ④ the movement of the object plane grating displacement stage (5), the one-dimensional diffraction grating plate (4) a second grating (402) under test into the optical system (6) on the object side field of view position, readjust the object plane and the image grating displacement stage ⑶ ⑶ plane grating displacement platform, aligned with the second grating (402) and a checkerboard grating (701); ⑤ image plane grating displacement station (8) moves checkerboard grating in the y-direction (701), the mobile 9 times the grating period 1/8 moving, after each movement of the two-dimensional photosensor collect a shear ⑶ IYK interferogram, where λ '= Κ 2. 3 .. The nine interferograms, the phase is calculated by the following formula:
Figure CN104111120BC00022
其中,6为被测波前沿y方向的相位,代表被测波前在y方向上的梯度信息; ⑥ 对上述相位提取结果解包裹,分别得到X方向和y方向的差分波前AWx和AWy进行剪切干涉波前重建,获得被测光学系统(6)波前。 Where 6 is the phase of the measured wave front in the y direction, gradient information representative of the measured wave front in the y direction; ⑥ extraction result of unwrapping the phase, respectively the X-direction and y-direction, and the differential wavefronts AWx be AWy shearing interferometry wavefront reconstruction, to obtain an optical system under test (6) wavefront.
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