The specific embodiment
In order to make the object, technical solutions and advantages of the present invention clearer, below in conjunction with accompanying drawing, the present invention is described in further detail, and obviously, described embodiment is only the present invention's part embodiment, rather than whole embodiment.Embodiment based in the present invention, those of ordinary skills, not making all other embodiment that obtain under creative work prerequisite, belong to the scope of protection of the invention.
In embodiments of the present invention, by deposit spathic silicon rete on base material, and on polycrystalline silicon membrane, form silicon carbide film layer, thereby, form in order to protect the diaphragm of display floater.Because the scratch resistance ability of the silicon carbide film layer of described diaphragm is stronger, explosion-proof ability is better, therefore, can be used as the diaphragm of display floater.
Below by specific embodiment, the solution of the present invention is described in detail, the present invention includes but be not limited to following examples.
As shown in Figure 1, be the first structural representation of a kind of film of providing in the embodiment of the present invention, described film, for being attached to the outermost layer of display floater, plays the effect of protection display floater.Particularly, described film comprises: base material 101; Be arranged on the first rete 102 of the first surface of described base material, wherein, described the first rete 102 comprises: near the first polycrystalline silicon membrane 1021 of described base material, and be positioned on described the first polycrystalline silicon membrane 1021 the first silicon carbide film layer 1022 away from described base material 101.
Preferably, described film is not limited to the structure shown in Fig. 1, can also be the second structure as shown in Figure 2 or the third structure shown in Fig. 3.
As shown in Figure 2, described film comprises: base material 101; Be arranged on the first rete 102 of the first surface of described base material, be arranged on the second rete 103 of the second surface of described base material 101, wherein, described second surface and described first surface are oppositely arranged, described the second rete 103 comprises: near the second polycrystalline silicon membrane 1031 of described base material 101, and be positioned on described the second polycrystalline silicon membrane 1031 the second silicon carbide film layer 1032 away from described base material 101.
As shown in Figure 3, described film comprises: base material 101; Be arranged on the first rete 102 of the first surface of described base material, be arranged on the second rete 104 of the second surface of described base material 101, wherein, described second surface and described first surface are oppositely arranged, and described the second rete 104 is described the second polycrystalline silicon membrane.
In the structure of above three kinds of films, described base material 101 is transparent flexible organic polymer material.In the present embodiment, alternatively, the material of described base material 101 can be polytetrafluoroethylene (PTFE) (PET), but the present invention is not limited to this material.Wherein, optional, the thickness range of described base material 101 is 0.05mm~0.15mm.
Alternatively, in described the first rete 102 and described the second rete 103, described polycrystalline silicon membrane directly contacts with described silicon carbide film layer.
In the structure of above-mentioned three kinds of films, in the first rete 102 on base material 101, described the first polycrystalline silicon membrane 1021 has microprism array structure, and in the second rete 103, described the second polycrystalline silicon membrane 1031 also can have microprism array structure.As shown in Figure 4, first rete 102 of take is example, described in each, micro-prism structure is all that to take the surface self contacting with base material 101 be benchmark, height to self structure highest point is the micro-prism structure of 20~50 microns of left and right, wherein, the cross section figure of each micro-prism structure can be triangle as shown in Figure 4, can be also trapezoidal, semicircle etc., the present invention does not limit the concrete shape of described sectional view, so long as have the effect of reflection or refracted ray; And described micro-prism structure extends along this surperficial horizontal or vertical direction on the surface of base material 101, and then a plurality of adjacent micro-prism structures have formed described microprism array structure jointly.
In embodiments of the present invention, described microprism array structure can be used as optical prism film and uses, especially for OLED display floater, according to geometric optical theory, the circulatory system that emergent ray forms through described film, make light to be converged to greatest extent and to launch, as shown in Figure 5, suppose that light enters described microprism array structure, when emergent ray 1 is during in the outgoing of first micro-prism structure place, due to the refraction action of micro-prism structure, most of light is all refracted between light 1 and light 2; Even if light has skew, emergent ray can also enter another adjacent micro-prism structure as the light 4 in Fig. 5, re-starts the operations such as reflection, refraction of light, thereby reaches the effect of increase display floater brightness.In addition, the first silicon carbide film layer 1022 on described the first polycrystalline silicon membrane 1021, and the second silicon carbide film layer 1032 on described the second polycrystalline silicon membrane 1031; Because the Mohs' hardness of carborundum is 9.5 grades, be only second to the hardest in the world diamond (10 grades), therefore, the hardness of carborundum is very large, has good resistance to marring; And carborundum is a kind of semiconductor, there is good heat conductivility.Comprehensive above factor, the first rete consisting of polycrystalline silicon membrane and silicon carbide film layer has good resistance to marring, and its thinner thickness, is suitable for the outermost diaphragm as display floater.
A kind of film providing based on above-described embodiment, the embodiment of the present invention also provides a kind of display floater, comprises film related in above-described embodiment, in order to as diaphragm, is attached to the outermost of described display floater, with scratch resistance, protection display floater.
Alternatively, described display floater also comprises: first substrate; The second substrate being oppositely arranged with first substrate; Wherein, described film is arranged at described first substrate outside.
Alternatively, described display floater also comprises: be arranged on the polaroid between described film and described first substrate.
Alternatively, described display floater also comprises: be arranged on the liquid crystal layer between described first substrate and described second substrate, or, be arranged on the luminescent device on described second substrate.
Alternatively, described display floater also comprises: touch-screen.Wherein, touch-screen has various structures, can be between two substrates, or be integrated on first substrate or second substrate, or on-cell structure etc.
For example: for display panels, first substrate and second substrate are oppositely arranged; First substrate is array base palte, and second substrate is color membrane substrates, or first substrate is color membrane substrates, and second substrate is array base palte.And the outside of array base palte and color membrane substrates is provided with polaroid.The polaroid in color membrane substrates outside is between color membrane substrates and described film.
Take OLED display floater as example, and first substrate and second substrate are oppositely arranged equally; First substrate is oled substrate, is not provided with colored hair photosphere on described oled substrate, and so described second substrate is color membrane substrates, is provided with colored hair photosphere on described oled substrate, and so described second substrate is encapsulated layer; Or second substrate is oled substrate, is not provided with colored hair photosphere on described oled substrate, so described first substrate is color membrane substrates, is provided with colored hair photosphere on described oled substrate, and so described first substrate is encapsulated layer.And color membrane substrates or encapsulated layer outside can be provided with polaroid, to obtain linearly polarized light.
Described display floater can be the display floaters such as OLED, LCD, and the present invention does not do concrete restriction to the type of the display floater of described film application, in addition, and can also be as the outermost layer diaphragm in other devices.The OLED display floater of take below describes in detail as example.
As shown in Figure 6, structural representation for OLED display floater in the embodiment of the present invention, it should be noted that, following examples are only introduced main functional film layer, the present invention is not described existing other basic retes, but the film layer structure of display floater involved in the present invention is not limited to following content.
In described display floater, mainly comprise: oled substrate 201; Be positioned at the luminescent layer 202 on described oled substrate 201, described luminescent layer 202 does not cover described oled substrate 201 completely, and exposes the non-display area outside viewing area in the surrounding of described oled substrate 201; TP layer 203 between described luminescent layer 202 and described oled substrate 201; Be bundled in the flexible PCB 204 on described oled substrate 201, wherein, described flexible PCB 204 is integrated with TP drive circuit and TFT drive circuit; Be positioned at the encapsulated layer 205 on described TP layer 203, wherein, described encapsulated layer 205 comprises the non-display area outside described viewing area and viewing area, and is coated with sealed plastic box 205 ', and described sealed plastic box 205 ' is for fitting together described encapsulated layer 205 with described oled substrate 201 contrapositions; Be positioned at the polaroid 206 on described encapsulated layer 205; Be positioned at the scratch resistance film 207 on described polaroid 206.Wherein, described scratch resistance film 207 is the film in the embodiment of the present invention, this scratch resistance film 207 consists of three retes, by under upper, comprise: the first rete being formed by silicon carbide film layer and polycrystalline silicon membrane, the base material being formed by transparent PET material, the second rete being formed by polycrystalline silicon membrane and silicon carbide film layer.The first rete consisting of polycrystalline silicon membrane and silicon carbide film layer has good resistance to marring, and its thinner thickness, and thickness that can attenuate display floater, is suitable for the outermost diaphragm as display floater.
In addition, the embodiment of the present invention also provides a kind of display unit, comprises the display floater described in above-described embodiment, and meanwhile, described display unit also comprises existing other apparatus structures, for example, and backlight module etc.
A kind of for the protection of the identical design of the film of display floater based on what provide with above embodiment, the embodiment of the present invention also provides a kind of method of preparing film, below by specific embodiment, be elaborated, but the present invention is not limited to following examples.
As shown in Figure 7, a kind of method flow schematic diagram of preparing film providing for the embodiment of the present invention, shown in method comprise the following steps:
Step 301 a: base material is provided.
Step 302: at least one surface at described base material forms the first rete.Wherein, the process that forms described the first rete is: at least one surface at base material forms polycrystalline silicon membrane; On at least one polycrystalline silicon membrane, form silicon carbide film layer.
Preferably, form the process of described the first rete, be specially: two surfaces at base material form polycrystalline silicon membrane, at least one polycrystalline silicon membrane, form silicon carbide film layer simultaneously; Or form polycrystalline silicon membrane on a wherein surface of base material, on described polycrystalline silicon membrane, form silicon carbide film layer.
Preferably, described formation silicon carbide film layer, specifically comprises: utilize induced with laser chemical vapor deposition method to form described silicon carbide film layer.
In concrete preparation process, can select according to demand suitable membrane structure, for example, preparation membrane structure as shown in Figure 2.First, provide a base material, described base material can be transparent flexible parent metal, for example PET.Then, on the upper and lower surface of described base material, deposit one deck non-crystalline silicon simultaneously, utilize induced with laser or high-temperature annealing process to form polycrystalline silicon membrane; After having formed polycrystalline silicon membrane, take the inert gases such as argon gas as carrier, mixture or the derivative that contains carbon of take is raw material, by laser instrument, it is thermal source heating (temperature is 350 ℃ ± 17 ℃), utilize the absorption of Inert gas molecule to specific wavelength laser, thereby the laser that causes gas molecule decomposes, thereby, utilize pyrolysis, photoactivate and induced with laser chemical vapour deposition (CVD) mode to form silicon carbide film layer.By above induced with laser chemical vapor deposition mode, can accurately control the reacting dose of polysilicon and carbon raw material, and, described in higher, the optical transmittance of the purity of the silicon carbide film layer that is prepared from up to more than 98%, Shao Shi intensity, between 7~9, has good intensity and resistance to marring.
Although described the preferred embodiments of the present invention, once those skilled in the art obtain the basic creative concept of cicada, can make other change and modification to these embodiment.So claims are intended to all changes and the modification that are interpreted as comprising preferred embodiment and fall into the scope of the invention.
Obviously, those skilled in the art can carry out various changes and modification and not depart from the spirit and scope of the present invention the present invention.Like this, if within of the present invention these are revised and modification belongs to the scope of the claims in the present invention and equivalent technologies thereof, the present invention is also intended to comprise these changes and modification interior.